Chemical vapor deposition equipment with uniform product adhesion

Abstract

The invention relates to the technical field of vapor deposition, in particular to chemical vapor deposition equipment with uniform product adhesion, which comprises a chemical vapor deposition coating box and a uniform gas inlet system, and the uniform gas inlet system comprises a first-stage uniform gas mixing assembly, a second-stage uniform gas mixing assembly and a third-stage uniform gas mixing assembly; the first-stage uniform gas mixing assembly comprises a closing-in cylinder, a second structural disc is installed at the upper end of the closing-in cylinder in a threaded connection mode, a servo motor is fixedly installed on the upper side of the second structural disc, the output end of the servo motor rotationally penetrates to the lower side of the second structural disc, a middle rotating shaft is fixedly installed at the output end of the servo motor, and upper gas mixing fan blades are fixedly installed on the upper side of the middle rotating shaft; and three groups of middle gas mixing fan blades are fixedly mounted in the middle of the middle rotating shaft. The uniform gas inlet system is used for uniformly mixing various reaction gases of the precursor, and three groups of uniform gas mixing assemblies for progressive gas mixing are arranged in the uniform gas inlet system, so that the mixing uniformity of the reaction gases is greatly improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of vapor deposition technology, in particular to a chemical vapor deposition equipment with uniform product adhesion. BACKGROUND

[0002] As a key technology for material surface modification and thin film preparation, chemical vapor deposition technology is widely used in high-end manufacturing fields such as semiconductors, optical devices, precision machinery, etc. Its core requirement is to ensure the uniformity of the adhesion of the deposited film on the product surface, which directly determines the performance stability and service life of the product.

[0003] However, the existing part of the chemical vapor deposition equipment has insufficient precursor mixing uniformity in the gas inlet mixing link, which leads to uneven distribution of the concentration of each component in the gas flow, and further causes differences in the reaction rate on the product surface during the deposition process, resulting in problems such as uneven film thickness and large adhesion difference, which seriously restricts the manufacturing precision and quality improvement of high-end products. Secondly, the existing gas mixing driving system adopts a multi-power source independent control mode, which not only increases the structural complexity and operation and maintenance cost of the equipment, but also easily causes gas mixing rhythm disorder due to the lack of coordination of each power source, further aggravating the problem of uneven gas mixing.

[0004] In order to improve the uniformity of the film, we propose a chemical vapor deposition equipment with uniform product adhesion. SUMMARY

[0005] The purpose of the present application is to solve the shortcomings in the prior art and provide a chemical vapor deposition equipment with uniform product adhesion.

[0006] In order to achieve the above purpose, the technical scheme adopted by the present application is as follows: A chemical vapor deposition equipment with uniform product adhesion, comprising a chemical vapor deposition film coating box and a uniform gas inlet system, the uniform gas inlet system comprising a first uniform gas mixing assembly, a second uniform gas mixing assembly and a third uniform gas mixing assembly; the first uniform gas mixing assembly comprising a closed cylinder, a second structure disc being screw-connected and installed on the upper end of the closed cylinder, a servo motor being fixedly installed on the upper side of the second structure disc, the output end of the servo motor rotating through the lower side of the second structure disc and a middle shaft being fixedly installed on the output end of the servo motor, an upper gas mixing fan blade being fixedly installed on the upper side of the middle shaft, three groups of middle gas mixing fan blades being fixedly installed on the middle of the middle shaft, and three groups of lower gas pushing fan blades being fixedly installed on the lower side of the middle shaft, the middle gas mixing fan blades being arranged in an inverse inclination angle, a plurality of precursor inlet pipes being fixedly and communicatively installed on the upper side wall of the closed cylinder, and a second mass flow controller being fixedly installed on the precursor inlet pipe.

[0007] Further, the secondary uniform gas mixing assembly comprises a plurality of groups of gas mixing elbow pipes and a plurality of groups of lateral rotating shafts, the lateral rotating shafts rotate through the side wall of the closing cylinder, the lateral rotating shafts are fixedly installed with structure cylinders at the outer side ends, a plurality of groups of first spiral flow guide foils and a plurality of groups of second spiral flow guide foils are fixedly connected in sequence on the outer wall of the structure cylinder, the first spiral flow guide foils are provided with air holes at intervals, the air holes penetrate into the inner side of the structure cylinder, and built-in spiral flow guide foils are fixedly installed on the inner side of the structure cylinder.

[0008] Further, the tertiary uniform gas mixing assembly comprises a box plate, a box cover is screwedly installed on the side edge of the box plate, turbulence protrusions are densely arranged on the surfaces of the box plate and the box cover, a plurality of first hemispherical grooves are uniformly and openly arranged on the inner side of the box plate, elastic ball beads are movably placed in the inner side of the first hemispherical grooves, and abutting stop rods are fixedly connected on the side wall of the box plate.

[0009] Further, the chemical vapor deposition film coating box is internally provided with a film coating chamber, a tray is fixedly installed on the inner wall of the film coating chamber, an air inlet is arranged on the upper side of the film coating chamber, an exhaust pipe is communicatively installed at the bottom of the film coating chamber, an air suction pump is fixedly installed at the end of the exhaust pipe, a first mass flow controller matched valve is fixedly installed on the exhaust pipe, and a heating resistance wire, a B / S type thermocouple temperature sensor and a silicon resonant pressure sensor are arranged in the film coating chamber.

[0010] Further, a sealing door is rotatably installed on the front side of the chemical vapor deposition film coating box, a safety lock is arranged on the sealing door, a transparent vacuum temperature insulation observation window is fixedly installed on the sealing door, and a controller is fixedly installed on the side wall of the chemical vapor deposition film coating box.

[0011] Further, the primary uniform gas mixing assembly further comprises an air inlet cylinder, the lower end of the air inlet cylinder is in communication with the air inlet, a mounting plate seat is fixedly connected on the outer wall of the air inlet cylinder, the mounting plate seat is screwedly installed on the upper side of the chemical vapor deposition film coating box, a first structure disc is fixedly connected on the outer wall of the closing cylinder, the first structure disc is screwedly installed on the upper end of the air inlet cylinder, a sieve plate is fixedly installed at the lower end of the air inlet cylinder, and a plurality of micropores are densely arranged on the sieve plate.

[0012] Further, an inner screw pipe is fixedly installed at the port of the precursor inlet pipe, a middle sealing plate is fixedly installed on the inner wall of the closing cylinder, a bottom sealing plate is screwedly installed at the bottom of the closing cylinder, the middle rotating shaft rotates through the middle sealing plate and the bottom sealing plate from top to bottom, a linkage bevel gear and a plurality of groups of lateral bevel gears are arranged between the middle sealing plate and the bottom sealing plate, the linkage bevel gear is fixedly installed on the outer wall of the middle rotating shaft, the lateral bevel gears are fixedly installed on the inner side ends of the lateral rotating shafts, and the lateral bevel gears are engaged with the linkage bevel gear.

[0013] Further, the mixed gas elbow pipe side is fixedly connected with an arc plate seat, a communication elbow pipe is communicated and installed between the mixed gas elbow pipe upper side and the close cylinder, the arc plate seat is screw connected and installed on the close cylinder outer wall, the transverse rotating shaft outer side end is rotationally arranged in the mixed gas elbow pipe inner side, the first spiral flow guide sheet and the second spiral flow guide sheet are arranged in an interlaced manner.

[0014] Further, the V-shaped baffle is arranged at the vent hole outer side port, the end cover plate is screw connected and installed at the structure cylinder end, the stop block is fixedly installed on the end cover plate, and the air holes are uniformly arranged on the end cover plate.

[0015] Further, the second half-sphere groove is uniformly arranged in the box cover inner side, the first half-sphere groove and the second half-sphere groove are consistent in size and correspond in position, the first half-sphere groove inner diameter and the elastic ball outer diameter are in a ratio of 1.15, the spring is fixedly connected to the box plate side wall, the inner arc plate is fixedly connected to the spring end, and the inner arc plate is screw connected and installed on the mixed gas elbow pipe inner wall.

[0016] Compared with the related art, the chemical vapor deposition equipment with uniform product adhesion has the following beneficial effects: In the application, the chemical vapor deposition equipment with uniform product adhesion is provided with a uniform gas inlet system, which is used for uniformly mixing the precursor reaction gases, wherein three groups of uniform gas mixing components for progressive gas mixing are arranged in the uniform gas inlet system, a plurality of precursor inlet pipes are arranged on the close cylinder side in the first-stage uniform gas mixing component, which are used for introducing the precursor reaction gases of each component, the upper gas mixing fan blades on the middle shaft inside the close cylinder are used for stirring the introduced various gases, so as to perform primary mixing, the lower part of the close cylinder is arranged in a close manner, which has a gas gathering effect, and the stirring effect of the middle gas mixing fan blades further improves the gas mixing and stirring effect, the middle gas mixing fan blades in the middle group are designed to have a reverse inclination angle with the upper and lower middle gas mixing fan blades, so that when synchronously rotating, the middle gas mixing fan blades in the middle part generate a reverse flow effect, so that turbulence appears in the gas flow in the lower part of the close cylinder, the gas mixing efficiency is improved, and the uniformity of the mixed gas is preliminarily established, the driving system used in the first-stage uniform gas mixing component is directly connected to the second-stage and third-stage gas mixing components, a single servo motor is used for driving, the mechanical structure is closely matched, the reliability is high, and the practicability is improved.

[0017] The product uniform chemical vapor deposition equipment provided by the present application comprises a secondary gas mixing assembly, a power source is introduced into the secondary gas mixing assembly through a lateral bevel gear at the end of a transverse rotating shaft, a structure cylinder is rotated in the inner side of a gas mixing curve pipe, the gas mixing curve pipe introduces the gas flow from the lower side of a collecting pipe, the outer side of the structure cylinder is provided with a first spiral flow guide sheet and a second spiral flow guide sheet, the gas flow passing through the outer side of the structure cylinder is subjected to multiple shearing and stirring actions, the gas flow mixing uniformity is greatly improved, the inner side of the structure cylinder is provided with an embedded spiral guide sheet for stirring and mixing the gas flow passing through the inner side of the structure cylinder, the gas flow is again subjected to shunting, mixing and stirring in the gas mixing curve pipe, then the mixed gas flows out through the gas holes in the end cover plate at the end of the structure cylinder, the gas flow mixed by the first spiral flow guide sheet and the second spiral flow guide sheet on the outer side of the structure cylinder is again combined, secondary mixing is formed, and the gas flow mixing uniformity is further improved.

[0018] The product uniform chemical vapor deposition equipment provided by the present application comprises a secondary gas mixing assembly, a power source is introduced into the secondary gas mixing assembly through a lateral bevel gear at the end of a transverse rotating shaft, a structure cylinder is rotated in the inner side of a gas mixing curve pipe, the gas mixing curve pipe introduces the gas flow from the lower side of a collecting pipe, the outer side of the structure cylinder is provided with a first spiral flow guide sheet and a second spiral flow guide sheet, the gas flow passing through the outer side of the structure cylinder is subjected to multiple shearing and stirring actions, the gas flow mixing uniformity is greatly improved, the inner side of the structure cylinder is provided with an embedded spiral guide sheet for stirring and mixing the gas flow passing through the inner side of the structure cylinder, the gas flow is again subjected to shunting, mixing and stirring in the gas mixing curve pipe, then the mixed gas flows out through the gas holes in the end cover plate at the end of the structure cylinder, the gas flow mixed by the first spiral flow guide sheet and the second spiral flow guide sheet on the outer side of the structure cylinder is again combined, secondary mixing is formed, and the gas flow mixing uniformity is further improved. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 A three-dimensional structure diagram of the product uniform chemical vapor deposition equipment Figure One ; Figure 2 A three-dimensional structure diagram of the product uniform chemical vapor deposition equipment Figure Two ; Figure 3 A three-dimensional structure diagram of the uniform gas inlet system Figure One ; Figure 4 A three-dimensional structure diagram of the uniform gas inlet system Figure Two ; Figure 5 A three-dimensional structure diagram of the uniform gas inlet system Figure 6 Figure 6 is a perspective view of a cross-section of the uniform intake system; Figure 7 Figure 7 is a perspective view of the central pivot; Figure 8 Figure 8 is a perspective view of a portion of the uniform intake system Figure One ; Figure 9 Figure 9 is a perspective view of a portion of the uniform intake system Figure Two ; Figure 10 Figure 10 is a perspective view of a split of a portion of the uniform intake system; Figure 11 Figure 11 is a perspective view of a cross-section of the mixing elbow; Figure 12 Figure 12 is a perspective view of a two-stage uniform mixing assembly; Figure 13 Figure 13 is a perspective view of a split of the two-stage uniform mixing assembly; Figure 14 Figure 14 is a perspective view of a cross-section of the two-stage uniform mixing assembly; Figure 15 Figure 15 is a perspective view of a three-stage uniform mixing assembly; Figure 16 Figure 16 is a perspective view of a split of the three-stage uniform mixing assembly Figure One ; Figure 17 Figure 17 is a perspective view of a split of the three-stage uniform mixing assembly Figure Two .

[0020] In the figure: 1, chemical vapor deposition coating box; 2, coating chamber; 3, tray; 4, sealed door; 5, exhaust pipe; 6, first mass flow controller matching valve; 7, air pump; 8, gas inlet; 9, uniform gas inlet system; 91, mounting plate; 92, gas inlet cylinder; 93, first structure disc; 94, closing cylinder; 95, second structure disc; 96, servo motor; 97, precursor inlet pipe; 98, second mass flow controller matching valve; 99, internal threaded pipe; 910, sieve plate; 911, middle shaft; 912, upper mixing fan blade; 913, middle mixing fan blade; 914, linkage bevel gear; 915, lower push fan blade; 916, bottom sealing plate; 917, middle sealing plate; 918, arc plate; 919, gas mixing elbow pipe; 920, communication elbow pipe; 921, lateral bevel gear; 922, transverse shaft; 923, structure cylinder; 924, end cover plate; 925, stop block; 926, first spiral guide sheet; 927, second spiral guide sheet; 928, air hole; 929, V-shaped baffle; 930, built-in spiral guide; 931, inner arc plate; 932, spring; 933, box plate; 934, box cover; 935, turbulent protrusion; 936, first half-sphere groove; 937, elastic ball; 938, second half-sphere groove; 939, abutting stop rod; 10, controller. DETAILED DESCRIPTION

[0021] The application will be further described below in conjunction with the drawings and embodiments.

[0022] First embodiment: please refer to Figures 1-10 In the first embodiment of the present application, a chemical vapor deposition equipment with uniform product adhesion: comprising a chemical vapor deposition coating box 1 and a uniform gas inlet system 9, the uniform gas inlet system 9 comprising a first-stage uniform gas mixing assembly, a second-stage uniform gas mixing assembly and a third-stage uniform gas mixing assembly; the first-stage uniform gas mixing assembly comprising a closing cylinder 94, the second structure disc 95 being screwed and mounted on the upper end of the closing cylinder 94, the servo motor 96 being fixedly installed on the upper side of the second structure disc 95, the middle shaft 911 being rotatably penetrated through the lower side of the second structure disc 95 and fixedly installed on the output end of the servo motor 96, the upper mixing fan blade 912 being fixedly installed on the upper side of the middle shaft 911, the three groups of middle mixing fan blades 913 being fixedly installed on the middle part of the middle shaft 911, the three groups of lower push fan blades 915 being fixedly installed on the lower side of the middle shaft 911, the middle mixing fan blades 913 being arranged in an inverse inclination angle, the precursor inlet pipe 97 being fixedly and communicatively installed on the upper side wall of the closing cylinder 94, and the second mass flow controller matching valve 98 being fixedly installed on the precursor inlet pipe 97.

[0023] By means of the above arrangement, the precise introduction and initial efficient mixing of multi-component precursor gas can be achieved by the cooperation of various components. The second mass flow controller matched valve 98 can precisely control the gas flow rate of each precursor into the pipe 97, ensuring that the initial gas ratio meets the process requirements; the servo motor 96 drives the middle shaft 911 to drive the upper mixing fan blade 912 and the middle mixing fan blade 913 to rotate synchronously, the upper mixing fan blade 912 can preliminarily stir and disperse the gas just introduced from the precursor inlet pipe 97, avoiding the initial aggregation of the gas; the three groups of middle mixing fan blades 913 cooperate with the closing structure of the closing cylinder 94 to form the dual effects of gas gathering and stirring, and the middle mixing fan blades 913 of the middle group with the reverse inclination angle can produce a push flow direction opposite to the upper and lower groups, promoting the formation of strong turbulence in the closing cylinder 94, and greatly improving the primary mixing uniformity; at the same time, the lower push fan blade 915 below the middle shaft 911 pushes the reaction gas after three-stage mixing into the coating chamber 2 through the gas inlet cylinder 92.

[0024] Specifically, the inside of the chemical vapor deposition coating box 1 is provided with a coating chamber 2, a tray 3 is fixedly installed on the inner wall of the coating chamber 2, an air inlet 8 is arranged on the upper side of the coating chamber 2, an exhaust pipe 5 is communicatively installed at the bottom of the coating chamber 2, an exhaust pump 7 is fixedly installed at the end of the exhaust pipe 5, a first mass flow controller matched valve 6 is fixedly installed on the exhaust pipe 5, and a heating resistance wire, a B / S type thermocouple temperature sensor and a silicon resonant pressure sensor are arranged inside the coating chamber 2.

[0025] Through the above arrangement, the tray 3 on the inner wall of the coating chamber 2 is used to stably support the products to be coated, ensuring that the products are fixed in position during the entire coating process and avoiding uneven coating caused by product displacement; the exhaust pump 7 at the end of the exhaust pipe 5 cooperates with the first mass flow controller matched valve 6 on the pipeline (a second mass flow controller matched valve 98 is arranged at the inlet end, and the inlet speed is a constant value according to production requirements, so that the gas output speed can be controlled to control the internal gas pressure value), which can precisely control the gas pressure in the coating chamber 2, realize the stable maintenance of low vacuum or specific pressure environment, and meet the requirements of different processes for gas pressure; the heating resistance wire inside the coating chamber 2 provides the required stable temperature for the coating reaction, the B / S type thermocouple temperature sensor can collect the temperature data inside the coating chamber 2 in real time and feed back to the controller 10, ensuring that the temperature is accurately controlled within the process threshold; the silicon resonant pressure sensor monitors the gas pressure change in the coating chamber 2 in real time, further improving the accuracy of environmental parameter control, and providing reliable environmental protection for uniform coating. It should be noted that the B / S type thermocouple temperature sensor and the silicon resonant pressure sensor are existing high-temperature resistant detection units for detecting temperature and pressure, which are widely used in chemical vapor deposition equipment, and will not be described here.

[0026] Specifically, the front side of the chemical vapor deposition coating box 1 is rotatably provided with a sealing door 4, the sealing door 4 is provided with a safety lock, the sealing door 4 is fixedly provided with a transparent vacuum temperature insulation observation window, and the side wall of the chemical vapor deposition coating box 1 is fixedly provided with a controller 10.

[0027] Through the above-mentioned arrangement, the sealing door 4 on the front side of the chemical vapor deposition coating box 1 cooperates with the safety lock thereon, which can not only guarantee the sealing performance of the coating chamber 2 to prevent gas leakage from affecting the coating effect, but also avoid the opening of the door in a non-operation state to cause safety hazards; the transparent vacuum temperature insulation observation window on the sealing door 4 is designed in a vacuum temperature insulation manner, which allows the operator to observe the reaction in the coating chamber 2 in real time, facilitates the timely discovery of abnormalities, and reduces the temperature loss in the coating chamber 2; the controller 10 on the side wall of the chemical vapor deposition coating box 1 as the control core of the equipment can receive the signals fed back by the B / S type thermocouple temperature sensor, the silicon resonant pressure sensor and the like, synchronously control the operation of the components such as the servo motor 96, the first mass flow controller matching valve 6, the second mass flow controller matching valve 98 and the heating resistance wire, realize automatic and precise control of the equipment, and reduce the difficulty of manual operation.

[0028] Specifically, the first uniform gas mixing assembly further comprises an air inlet cylinder 92, the lower end of the air inlet cylinder 92 is in communication with the air inlet port 8, the outer wall of the air inlet cylinder 92 is fixedly connected with a mounting plate seat 91, the mounting plate seat 91 is screw-connected and mounted on the upper side of the chemical vapor deposition coating box 1, the outer wall of the closing cylinder 94 is fixedly connected with a first structure disc 93, the first structure disc 93 is screw-connected and mounted on the upper end of the air inlet cylinder 92, a sieve plate 910 is fixedly mounted at the lower end of the air inlet cylinder 92, and a plurality of micropores are densely arranged on the sieve plate 910.

[0029] Through the above-mentioned arrangement, the mounting plate seat 91 on the outer wall of the air inlet cylinder 92 is fixed on the upper side of the chemical vapor deposition coating box 1 by screwing, and the first structure disc 93 on the outer wall of the closing cylinder 94 is screw-connected and mounted on the upper end of the air inlet cylinder 92, which facilitates the overall disassembly, maintenance and repair of the uniform gas inlet system 9; the air inlet cylinder 92 serves as a transition channel for the gas entering the coating chamber 2, the sieve plate 910 and the dense micropores at the lower end thereof can finally uniformly flow the gas mixed by three stages, disperse the gas flow into a uniform planar gas flow, and enter the coating chamber 2 through the air inlet port 8, thereby effectively avoiding the non-uniform coating caused by too fast or too slow local gas flow velocity and directly improving the uniformity of product adhesion.

[0030] Specifically, the inner threaded pipe 99 is fixedly installed at the port of the precursor inlet pipe 97, the middle sealing plate 917 is fixedly installed on the inner wall of the closing cylinder 94, the bottom sealing plate 916 is screwedly installed at the bottom of the closing cylinder 94, the middle rotating shaft 911 is sequentially and rotatably arranged through the middle sealing plate 917 and the bottom sealing plate 916 from top to bottom, the linkage bevel gear 914 is fixedly installed on the outer wall of the middle rotating shaft 911, and the lateral bevel gear 921 is fixedly installed on the inner side of the horizontal rotating shaft 922 and is engaged with the linkage bevel gear 914.

[0031] Through the above arrangement, the inner threaded pipe 99 at the port of the precursor inlet pipe 97 is convenient for quick and sealed connection with the external gas source pipeline, so that the gas conveying process is ensured to be leakproof; the middle sealing plate 917 on the inner wall of the closing cylinder 94 and the bottom sealing plate 916 screwedly installed at the bottom divide the inside of the closing cylinder 94 into a gas mixing area and a power transmission area, so that the gas is prevented from entering the transmission area to affect the gear transmission effect, and meanwhile the sealing performance of the gas mixing process is ensured; the linkage bevel gear 914 on the middle rotating shaft 911 is engaged with the lateral bevel gear 921 at the inner side of the horizontal rotating shaft 922, so that when the servo motor 96 drives the middle rotating shaft 911 to rotate, the plurality of horizontal rotating shafts 922 can be synchronously driven to rotate, a power source needs not to be separately arranged for the secondary gas mixing assembly, the equipment structure is greatly simplified, and the equipment manufacturing cost and operation and maintenance cost are reduced; meanwhile, the linkage design ensures that the driving rhythms of the primary and secondary gas mixing assemblies are completely coordinated, the gas mixing disorder caused by different steps of the multiple power sources is avoided, and the gas mixing stability is improved.

[0032] The second embodiment will be described below in combination with the drawings. Figures 11-14 In this embodiment, the secondary uniform gas mixing assembly includes a plurality of groups of gas mixing curved pipes 919 and a plurality of groups of horizontal rotating shafts 922, the horizontal rotating shaft 922 is rotatably arranged through the side wall of the closing cylinder 94, the structural cylinder 923 is fixedly installed at the outer side of the horizontal rotating shaft 922, a plurality of groups of first spiral flow guide foils 926 and a plurality of groups of second spiral flow guide foils 927 are sequentially and fixedly connected on the outer wall of the structural cylinder 923, the air holes 928 are arranged at intervals in the first spiral flow guide foils 926 and extend to the inner side of the structural cylinder 923, and the built-in spiral guide foil 930 is fixedly installed at the inner side of the structural cylinder 923.

[0033] Through the above manner, the V-shaped baffle 929 at the outer port of the ventilation hole 928 on the first spiral flow guide sheet 926 can guide part of the airflow outside the structure cylinder 923 to enter the inside of the structure cylinder 923 through the ventilation hole 928, so as to realize the internal and external flow distribution of the airflow; the built-in spiral guide sheet 930 inside the structure cylinder 923 can stir and mix the airflow entering the inside again, and then the mixed gas flows out through the air holes on the end cover plate 924 at the end of the structure cylinder 923, and recombines with the airflow mixed by the first spiral flow guide sheet 926 and the second spiral flow guide sheet 927 outside the structure cylinder 923, so as to form secondary mixing and further improve the mixing effect. The first spiral flow guide sheet 926 and the second spiral flow guide sheet 927 are fixed on the outer wall of the structure cylinder 923, which not only has the function of shearing and stirring the gas, but also enhances the structural strength of the structure cylinder 923.

[0034] Specifically, the arc-shaped plate seat 918 is fixedly connected to the side of the gas mixing elbow pipe 919, the communication elbow pipe 920 is installed in communication between the upper side of the gas mixing elbow pipe 919 and the closing cylinder 94, the arc-shaped plate seat 918 is screw-connected to the outer wall of the closing cylinder 94, the outer end of the horizontal rotating shaft 922 is rotatably arranged inside the gas mixing elbow pipe 919, and the first spiral flow guide sheet 926 and the second spiral flow guide sheet 927 are arranged in a staggered manner.

[0035] Through the above manner, the arc-shaped plate seat 918 at the side of the gas mixing elbow pipe 919 is screw-connected to the outer wall of the closing cylinder 94, so as to facilitate the disassembly, assembly and positioning of the gas mixing elbow pipe 919; the upper side of the gas mixing elbow pipe 919 is communicated with the closing cylinder 94 through the communication elbow pipe 920, so as to guide the mixed gas in the closing cylinder 94 to enter the gas mixing elbow pipe 919 stably, and avoid the stratification of the preliminarily mixed gas components caused by airflow impact; the outer end of the horizontal rotating shaft 922 is rotatably arranged inside the gas mixing elbow pipe 919, so as to improve the stability of the rotation of the horizontal rotating shaft 922; the first spiral flow guide sheet 926 and the second spiral flow guide sheet 927 are arranged in a staggered manner on the outer wall of the structure cylinder 923 at the outer end of the horizontal rotating shaft 922, so as to form multiple shearing and stirring effects on the airflow flowing outside the structure cylinder 923, greatly improve the uniformity of the airflow mixing, and the staggered structure can prolong the residence time of the gas in the gas mixing elbow pipe 919, so as to ensure more sufficient gas mixing.

[0036] Specifically, the V-shaped baffle 929 is arranged at the outer port of the ventilation hole 928, the end cover plate 924 is screw-connected to the end of the structure cylinder 923, the stopper 925 is fixedly installed on the end cover plate 924, and the air holes are uniformly arranged on the end cover plate 924.

[0037] Through the above setting, when the stop block 925 on the end cover plate 924 rotates with the structure cylinder 923, it can collide with the abutting stop rod 939 of the three-stage gas mixing assembly intermittently, and cooperate with the elastic action of the spring 932 to provide power for the shaking of the three-stage gas mixing assembly, realize the full linkage of the first-stage, second-stage and third-stage gas mixing assemblies, and do not need to additionally set a power source, further simplifying the equipment structure.

[0038] Third embodiment: please refer to Figures 15-17 In this embodiment, the three-stage uniform gas mixing assembly includes a box plate 933, the box plate 933 is screw-connected with a box cover 934 on the side edge, the surface of the box plate 933 and the box cover 934 is densely provided with turbulent protrusions 935, a plurality of first hemispherical grooves 936 are evenly arranged on the inner side of the box plate 933, and elastic ball beads 937 are movably placed in the first hemispherical grooves 936; the box plate 933 is fixedly connected with an abutting stop rod 939 on the side wall; a plurality of second hemispherical grooves 938 are evenly arranged on the inner side of the box cover 934; the first hemispherical grooves 936 and the second hemispherical grooves 938 are consistent in size and one-to-one corresponding in position; the ratio of the inner diameter of the first hemispherical groove 936 to the outer diameter of the elastic ball bead 937 is 1.15; the spring 932 is fixedly connected with an inner arc plate 931 on the end portion, and the inner arc plate 931 is screw-connected on the inner wall of the gas mixing elbow pipe 919.

[0039] Through the above setting, the three-stage turbulent mixing can be realized, and the gas mixing uniformity is further improved. The first hemispherical grooves 936 on the inner side of the box plate 933 and the second hemispherical grooves 938 on the inner side of the box cover 934 are consistent in size and one-to-one corresponding in position, which provides a stable movement space for the elastic ball beads 937, and the design that the ratio of the inner diameter of the first hemispherical groove 936 to the outer diameter of the elastic ball bead 937 is 1.15 ensures that the elastic ball beads 937 can move flexibly in the groove without falling off; when the stop block 925 on the end cover plate 924 collides with the abutting stop rod 939 on the side wall of the box plate 933, the box plate 933 drives the elastic ball beads 937 to shake between the first hemispherical grooves 936 and the second hemispherical grooves 938, and the elastic action of the spring 932 on the side wall of the box plate 933 and the shaking action of the elastic ball beads 937 enable the box plate 933 and the box cover 934 to produce high-frequency shaking, the turbulent protrusions 935 on the surface of the box plate 933 and the box cover 934 cooperate with the shaking action to form strong turbulent disturbance to the airflow in the gas mixing elbow pipe 919, break the possible small concentration gradient in the airflow, and realize the ultimate uniform mixing of the gas; the box plate 933 is screw-connected with the inner arc plate 931 on the inner wall of the gas mixing elbow pipe 919 through the spring 932, which facilitates the disassembly and assembly of the three-stage gas mixing assembly, and the spring 932 can buffer the impact force, protect the components and maintain the shaking stability.

[0040] It should be noted that the rotating through each of the uniform gas inlet system 9 in the application is provided with a sealing ring, and the threaded installation is laid with a sealing pad, which meets the sealing requirement, and the sealing ring and the sealing pad are made of high-temperature resistant material.

[0041] The working principle of the chemical vapor deposition equipment with uniform product attachment provided by the application is as follows: After the equipment is started, the controller 10 triggers the servo motor 96 to start, and the servo motor 96 outputs a torque to drive the middle shaft 911 to rotate at a constant speed. At the same time, each group of precursor gas is introduced into the equipment through the corresponding precursor inlet pipe 97, and the second mass flow controller matched with the valve 98 on the precursor inlet pipe 97 can accurately control the flow and rate of each gas according to the preset process parameters, so as to ensure that the initial gas ratio meets the film coating requirements. After each group of precursor gas is introduced into the closed cylinder 94, the upper mixing fan blade 912 rotating with the middle shaft 911 first stirs and disperses the dispersed gas to avoid the situation that the gas is gathered at the inlet position and the local concentration is too high. Then the gas flows downward to the area of the three groups of middle mixing fan blades 913. Since the middle group of middle mixing fan blades 913 adopts an inverse inclination angle design, the flow direction is opposite to that of the upper and lower groups of middle mixing fan blades, and combined with the gradually narrowing structure characteristics of the lower side of the closed cylinder 94, a strong airflow turbulence is formed inside the closed cylinder 94, which greatly improves the uniformity of gas mixing. In this process, the fixed linkage bevel gear 914 on the middle shaft 911 rotates synchronously, and through the meshing transmission with multiple groups of lateral bevel gears 921, the horizontal shaft 922 is driven to rotate synchronously, realizing the linkage effect of driving the first and second gas mixing components to rotate with a single servo motor as the power source, and effectively avoiding the problem of insufficient coordination of multiple power sources.

[0042] The gas after the first stage mixing is smoothly introduced into the multi-group gas mixing elbow pipes 919 through the communicating elbow pipe 920 under the pushing action of the push fan blade 915 below the middle rotating shaft 911, enters the second stage mixing, the lateral rotating shaft 922 is synchronously rotated under the meshing transmission action of the linkage bevel gear 914 and the lateral bevel gear 921 at the end thereof, drives the structure cylinder 923 fixed at the outside end to rotate at a constant speed inside the gas mixing elbow pipe 919, the first spiral flow guide louver 926 and the second spiral flow guide louver 927 staggered distributed on the outer wall of the structure cylinder 923 will form multiple shearing and flow guide stirring actions on the gas flowing along the inner wall of the gas mixing elbow pipe 919, break the laminar flow state possibly formed in the gas flow process; at the same time, the air holes 928 arranged at intervals between the first spiral flow guide louver 926 will guide part of the gas to enter the inside cavity of the structure cylinder 923, the built-in spiral guide blade 930 fixed in the inside cavity rotates with the structure cylinder 923, spirally stirs and mixes the entered gas again, the gas after the inside mixing finally flows out through the air holes uniformly distributed on the end cover plate 924 at the end of the structure cylinder 923, re-converges with the gas outside the structure cylinder 923 stirred by the double spiral louver, completes the secondary reinforced mixing; in addition, the stop block 925 fixed on the end cover plate 924 will synchronously rotate with the structure cylinder 923, in the rotating process, intermittently collides with the abutting rod 939 of the side wall of the box plate 933 in the third stage gas mixing assembly, provides driving force for the shaking action of the third stage gas mixing assembly.

[0043] In the process of the secondary mixed gas continuously flowing through the mixed gas elbow pipe 919, the intermittent collision of the stop block 925 and the abutting stop rod 939, combined with the elastic reset action of the box plate 933 side wall spring 932, causes the cavity composed of the box plate 933 and the box cover 934 to produce high-frequency reciprocating shaking. The elastic ball 937 placed uniformly inside the cavity flexibly rolls and collides between the first hemispherical groove 936 of the box plate 933 and the second hemispherical groove 938 of the box cover 934 under the shaking action, further intensifying the turbulence degree of the airflow in the cavity. At the same time, the turbulence protrusions 935 densely arranged on the surface of the box plate 933 and the box cover 934 will form multi-point turbulence to the flowing gas, finally completing the three-stage ultimate mixing, ensuring that the component gases are completely and uniformly mixed. The uniformly mixed gas after three-stage mixing enters the air inlet cylinder 92, and then is subjected to the final flow uniformization treatment by the screen plate 910 (the surface densely distributed micropores can disperse the airflow into a uniform planar airflow) under the pushing action of the three groups of downward pushing gas fan blades 915, and then enters the plating chamber 2 of the chemical vapor deposition plating box 1 through the air inlet port 8. During this period, the controller 10 receives the signals fed back by the B / S type thermocouple temperature sensor and the silicon resonant pressure sensor inside the plating chamber 2 in real time, cooperatively controls the heating power of the heating resistance wire and the air exhaust rate of the air exhaust pump 7 (precisely controlled by the first mass flow controller and the valve 6), ensures that the plating chamber 2 maintains a stable process temperature and air pressure environment, enables the surface of the product to be plated placed on the tray 3 to uniformly undergo a gas phase deposition reaction, and finally forms a uniformly attached film. The exhaust gas after the reaction is discharged from the equipment in a timely manner through the exhaust pipe 5.

[0044] The above only describes the embodiments of the present application, and does not limit the patent scope of the present application. Any equivalent structure or equivalent process transformation, or direct or indirect application in other related technical fields, as described in the specification and drawings of the present application, are also included in the patent protection scope of the present application.

Claims

1. A chemical vapor deposition apparatus for uniform product attachment, characterized by, Including chemical vapor deposition coating box (1) and uniform gas inlet system (9), the uniform gas inlet system (9) includes primary uniform gas mixing assembly, secondary uniform gas mixing assembly and tertiary uniform gas mixing assembly; The primary uniform gas mixing assembly includes a closed cylinder (94), a second structure disc (95) is screw-connected and installed on the upper end of the closed cylinder (94), a servo motor (96) is fixedly installed on the upper side of the second structure disc (95), the output end of the servo motor (96) penetrates through the lower side of the second structure disc (95) and is fixedly installed with a middle rotating shaft (911) on the output end, an upper gas mixing fan blade (912) is fixedly installed on the upper side of the middle rotating shaft (911), three groups of middle gas mixing fan blades (913) are fixedly installed on the middle of the middle rotating shaft (911), and three groups of lower gas pushing fan blades (915) are fixedly installed on the lower side of the middle rotating shaft (911), the middle gas mixing fan blades are arranged in an inverse inclination angle, a plurality of precursor inlet pipes (97) are fixedly and communicatively installed on the upper side wall of the closed cylinder (94), and a second mass flow controller matching valve (98) is fixedly installed on the precursor inlet pipe (97).

2. The chemical vapor deposition apparatus for uniform product attachment according to claim 1, wherein The secondary uniform gas mixing assembly includes a plurality of groups of gas mixing elbow pipes (919) and a plurality of groups of transverse rotating shafts (922), the transverse rotating shafts (922) rotate through the side wall of the closed cylinder (94), a structure cylinder (923) is fixedly installed on the outer side end of the transverse rotating shaft (922), a plurality of groups of first spiral guide lathes (926) and a plurality of groups of second spiral guide lathes (927) are sequentially fixedly connected on the outer wall of the structure cylinder (923), the first spiral guide lathes (926) are provided with air holes (928) at intervals, the air holes (928) penetrate to the inner side of the structure cylinder (923), and an inner spiral guide blade (930) is fixedly installed on the inner side of the structure cylinder (923).

3. The chemical vapor deposition apparatus for uniform product attachment according to claim 1, wherein The tertiary uniform gas mixing assembly includes a box plate (933), a box cover (934) is screw-connected and installed on the side edge of the box plate (933), a plurality of turbulent convexes (935) are densely arranged on the surfaces of the box plate (933) and the box cover (934), a plurality of first hemispherical grooves (936) are uniformly and formed on the inner side of the box plate (933), elastic ball beads (937) are movably placed in the first hemispherical grooves (936), and abutting stop rods (939) are fixedly connected on the side wall of the box plate (933).

4. The chemical vapor deposition apparatus for uniform product attachment according to claim 1, wherein The chemical vapor deposition coating box (1) is provided with a coating chamber (2) on the inner side, a tray (3) is fixedly installed on the inner wall of the coating chamber (2), an air inlet (8) is arranged on the upper side of the coating chamber (2), an exhaust pipe (5) is communicatively installed at the bottom of the coating chamber (2), an exhaust pump (7) is fixedly installed at the end of the exhaust pipe (5), a first mass flow controller matching valve (6) is fixedly installed on the exhaust pipe (5), and a heating resistance wire, a B / S type thermocouple temperature sensor and a silicon resonant pressure sensor are arranged in the coating chamber (2).

5. The chemical vapor deposition apparatus for uniform product attachment according to claim 1, wherein The chemical vapor deposition film coating box (1) is provided with a sealing door (4) on the front side, the sealing door (4) is provided with a safety lock, the sealing door (4) is fixedly provided with a transparent vacuum temperature insulation observation window, and the chemical vapor deposition film coating box (1) is fixedly provided with a controller (10) on the side wall.

6. The chemical vapor deposition apparatus for uniform product attachment according to claim 1, wherein The first uniform gas mixing assembly further comprises an air inlet cylinder (92) in communication with the air inlet opening (8) at the lower end, an installation plate seat (91) fixedly connected to the outer wall of the air inlet cylinder (92), the installation plate seat (91) being screw-connected and installed on the upper side of the chemical vapor deposition film coating box (1), a first structure disc (93) fixedly connected to the outer wall of the air inlet cylinder (92), the first structure disc (93) being screw-connected and installed on the upper end of the air inlet cylinder (92), a sieve plate (910) fixedly installed at the lower end of the air inlet cylinder (92), and a plurality of micropores being densely arranged on the sieve plate (910).

7. The chemical vapor deposition apparatus for uniform product attachment according to claim 1, wherein The precursor inlet pipe (97) is fixedly provided with an inner threaded pipe (99) at the port, a middle sealing plate (917) is fixedly installed on the inner wall of the air inlet cylinder (94), a bottom sealing plate (916) is screw-connected and installed at the bottom of the air inlet cylinder (94), the middle shaft (911) is rotatably arranged through the middle sealing plate (917) and the bottom sealing plate (916) from top to bottom, the linkage bevel gear (914) and a plurality of groups of lateral bevel gears (921) are arranged between the middle sealing plate (917) and the bottom sealing plate (916), the linkage bevel gear (914) is fixedly installed on the outer wall of the middle shaft (911), the lateral bevel gears (921) are fixedly installed on the inner side of the horizontal shaft (922), and the lateral bevel gears (921) are engaged with the linkage bevel gear (914).

8. The chemical vapor deposition apparatus for uniform product attachment according to claim 2, wherein The air inlet cylinder (92) is fixedly provided with an installation plate seat (91) on the outer wall, the installation plate seat (91) is screw-connected and installed on the upper side of the chemical vapor deposition film coating box (1), the first structure disc (93) is fixedly connected to the outer wall of the air inlet cylinder (92), the first structure disc (93) is screw-connected and installed on the upper end of the air inlet cylinder (92), the sieve plate (910) is fixedly installed at the lower end of the air inlet cylinder (92), and a plurality of micropores are densely arranged on the sieve plate (910).

9. The chemical vapor deposition apparatus for uniform product attachment according to claim 2, wherein The air inlet cylinder (92) is fixedly provided with an installation plate seat (91) on the outer wall, the installation plate seat (91) is screw-connected and installed on the upper side of the chemical vapor deposition film coating box (1), the first structure disc (93) is fixedly connected to the outer wall of the air inlet cylinder (92), the first structure disc (93) is screw-connected and installed on the upper end of the air inlet cylinder (92), the sieve plate (910) is fixedly installed at the lower end of the air inlet cylinder (92), and a plurality of micropores are densely arranged on the sieve plate (910). The air inlet cylinder (92) is fixedly provided with an installation plate seat (91) on the outer wall, the installation plate seat (91) is screw-connected and installed on the upper side of the chemical vapor deposition film coating box (1), the first structure disc (93) is fixedly connected to the outer wall of the air inlet cylinder (92), the first structure disc (93) is screw-connected and installed on the upper end of the air inlet cylinder (92), the sieve plate (910) is fixedly installed at the lower end of the air inlet cylinder (92), and a plurality of micropores are densely arranged on the sieve plate (910).

10. The chemical vapor deposition apparatus for uniform product attachment according to claim 3, wherein The second hemisphere groove (938) is uniformly arranged in the box cover (934), the first hemisphere groove (936) and the second hemisphere groove (938) are consistent in size, the first hemisphere groove (936) and the second hemisphere groove (938) are one-to-one corresponding in position, the ratio of the inner diameter of the first hemisphere groove (936) to the outer diameter of the elastic ball (937) is 1.15, the spring (932) is fixedly connected to the side wall of the box plate (933), the end of the spring (932) is fixedly connected with the inner arc plate (931), and the inner arc plate (931) is screwed on the inner wall of the gas mixing bend pipe (919).

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