An atomic layer thin film deposition process apparatus

Abstract

The application discloses an atomic layer thin film deposition process equipment and relates to the technical field of atomic layer thin film deposition.The equipment comprises a box body and an adjusting assembly, a jet head is arranged at the back side of the box body, an exhaust pipe is fixed to the lower part of the box body, a partition plate is arranged in the box body, the adjusting assembly penetrates into the box body, and the adjusting assembly comprises an electric cylinder.The reaction space is physically separated into a precursor cavity, a purge cavity and a reaction cavity through the partition plate and a sealing plate, the moving seat is used for accurately moving the carrier, products are sequentially introduced into different cavities for special treatment, each cavity can long-term maintain its special atmosphere such as a precursor, inert gas and reaction gas, the cross contamination among different gases is reduced, the most time-consuming link of "emptying, cavity washing and air filling" in the traditional process is completely saved, only a small amount of inert gas is used for interface purging when the products are transferred, and the exhaust pipe is used for discharging, and the circulation period is greatly shortened.

Description

Technical Field

[0001] This invention relates to the field of atomic layer thin film deposition technology, specifically to an atomic layer thin film deposition process equipment. Background Technology

[0002] Atomic layer deposition (ALD) is an advanced thin film preparation technology that deposits materials layer by layer onto a substrate surface in the form of single-atom films. This process makes full use of surface saturation reactions, that is, when a precursor is adsorbed to saturation on the substrate surface, the adsorption process will automatically stop. By adsorbing precursors layer by layer and reacting them, precise control of film thickness can be achieved, improving the uniformity and stability of the film. It plays an irreplaceable role in cutting-edge fields such as nanotechnology and semiconductor manufacturing, and its application scope continues to expand with technological advancements.

[0003] Currently, the core process of atomic layer thin film deposition involves a four-step cyclic operation: first, a precursor is introduced to form a monomolecular adsorption layer on the substrate surface; then, an inert gas is introduced to purge the reaction chamber and remove residual precursors; subsequently, a reaction gas is introduced to complete the surface chemical reaction and generate the target film; finally, the reaction byproducts are removed by purging again. By repeating this cyclic process, atomic-level precision thin film growth can be achieved. However, this process requires interrupting the reaction for chamber cleaning in each deposition cycle, resulting in long preparation time and low production efficiency. Summary of the Invention

[0004] The purpose of this invention is to provide an atomic layer thin film deposition process apparatus to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, the present invention provides the following technical solution: an atomic layer thin film deposition process apparatus, comprising a housing and an adjustment assembly, wherein a jet nozzle is disposed on the rear side of the housing and an exhaust pipe is fixed to the lower part of the housing, a partition is disposed inside the housing, the adjustment assembly extends through the interior of the housing, and the adjustment assembly includes an electric cylinder, a push rod is fixed to the output end of the electric cylinder, and a movable seat is sleeved on the outer side of the end of the push rod, a platform is rotatably connected to the top of the movable seat, guide rods are disposed on both sides of the movable seat, and drive frames are symmetrically fixed on the other two sides of the movable seat, a compression spring is abutted inside the partition, and a sealing plate is abutted at one end of the compression spring, and roller seats are disposed on both sides of the sealing plate and both sides of the interior of the housing.

[0006] Furthermore, the guide rod is slidably connected to the housing, and the housing is fixedly connected to the electric cylinder.

[0007] Furthermore, the side of the drive frame is pointed, and the drive frame abuts against the roller seat.

[0008] Furthermore, the sealing plate is slidably connected to the partition plate, and the curvature of the groove on one side of the sealing plate matches the curvature of the outer side of the guide rod.

[0009] Furthermore, the end of the push rod is connected to a rotating assembly, and the rotating assembly includes a connecting frame. The two sides of the connecting frame abut against buffer springs, and a toothed block is provided on one side of the middle of the connecting frame. A central gear is meshed on one side of the toothed block, and a rotating shaft is fixed inside the central gear. The rotating shaft is fixedly connected to the platform, and a stop block is fixed on the inner bottom surface of the movable seat.

[0010] Furthermore, the connecting frame is C-shaped and is fixedly connected to the push rod.

[0011] Furthermore, the buffer spring abuts against the movable seat, and the movable seat is slidably connected to the connecting frame.

[0012] Furthermore, a clamping assembly is installed at the bottom of the platform, and the clamping assembly includes a motor. The motor is fixed at the bottom of the platform, and the output end of the motor is connected to a drive gear. A rack meshes with one side of the drive gear, and the rack is arc-shaped. A synchronizing ring is fixedly connected to the top of the rack. A guide groove is opened at the top of the synchronizing ring, and the guide groove is arc-shaped. A sliding column is slidably connected inside the guide groove. A sliding seat is installed at the top of the sliding column, and a connecting rod is rotatably connected to one side of the sliding seat. A clamping block is rotatably connected to one end of the connecting rod, and protruding columns are symmetrically fixed on both sides of the clamping block. A limiting groove is opened at the top of the platform, and the protruding columns are slidably connected to the platform through the limiting groove.

[0013] Furthermore, the slide is slidably connected to the platform, and the platform is rotatably connected to the synchronization ring.

[0014] Furthermore, the clamping blocks are equidistantly distributed circumferentially along the top of the platform, and the cross-section of the clamping blocks is L-shaped.

[0015] This invention provides an atomic layer thin film deposition process apparatus, which has the following beneficial effects:

[0016] 1. This invention physically divides the reaction space into a precursor chamber, a purging chamber, and a reaction chamber using partitions and sealing plates. A moving platform precisely moves the stage, allowing the product to sequentially enter different chambers for specialized processing. This design enables each chamber to maintain its own exclusive atmosphere, such as the precursor, inert gas, and reactant gas, reducing cross-contamination between different gases. It completely eliminates the most time-consuming step in traditional processes—"emptying, purging, and filling"—requiring only a small amount of inert gas for interface purging during product transfer, which is then discharged through an exhaust pipe. This significantly shortens the cycle time. Furthermore, the opening and closing of the sealing plates are intelligently linked to product transfer. This purely mechanical linkage design eliminates the need for separate drivers and sensors for each sealing plate, simplifying control, reducing costs, and ensuring the reliability and consistency of the operation, while guaranteeing the independence of the atmosphere in each chamber.

[0017] 2. When the movable seat is located in the precursor cavity, the electric cylinder pushes the push rod to apply pressure to the movable seat through the connecting frame and the buffer spring. Since the spring force of the compression spring is much greater than that of the buffer spring, the movable seat remains stationary. The toothed block drives the central gear to drive the stage and product to rotate slowly, ensuring that the precursor or reaction gas is uniformly adsorbed during the coating process, improving the consistency of the film. At the same time, this process does not require an additional drive source, reducing the cost of use. When it is necessary to move the cavity, the push rod continues to move so that the connecting frame contacts the stop block, switching to a rigid connection, providing sufficient thrust to push open the sealing plate, realizing the transmission switch of "elastic first and then rigid", which ensures both smooth rotation and reliable cavity movement.

[0018] 3. This invention uses a motor-driven gear rack to rotate a synchronous ring, causing the sliding column to slide along the guide groove. This synchronously drives all the sliding blocks to move centrally, and the connecting rod pushes the clamping block to evenly clamp the product, achieving multi-point synchronous clamping. At the same time, the clamping area is the non-coated area of ​​the product, which does not affect the coating quality. After the coating is completed, the motor reverses, drives the sliding blocks to move outward, and the connecting rod pulls the clamping block to release the product. When the protrusion moves to the end of the limiting groove, the clamping block rotates around the protrusion as a fulcrum, and its lower end lifts the product. This creates sufficient operating space for operators to use clamps to pick up and put down the product, thereby improving the convenience of product unloading. Attached Figure Description

[0019] Figure 1 This is a schematic diagram of the overall three-dimensional structure of an atomic layer thin film deposition process equipment according to the present invention;

[0020] Figure 2 This is a schematic diagram of the adjustment component structure of an atomic layer thin film deposition process equipment according to the present invention;

[0021] Figure 3 This is a three-dimensional structural diagram of a sealing plate in an atomic layer thin film deposition process apparatus according to the present invention;

[0022] Figure 4This is a schematic diagram of the internal structure of the movable base of an atomic layer thin film deposition process apparatus according to the present invention;

[0023] Figure 5 This is a bottom view of the stage structure of an atomic layer thin film deposition process apparatus according to the present invention;

[0024] Figure 6 This is a three-dimensional structural diagram of the clamping component of an atomic layer thin film deposition process apparatus according to the present invention;

[0025] Figure 7 This is a schematic diagram of the limiting groove structure of an atomic layer thin film deposition process equipment according to the present invention.

[0026] In the diagram: 1. Housing; 2. Jet nozzle; 3. Exhaust pipe; 4. Baffle; 5. Adjustment assembly; 501. Electric cylinder; 502. Push rod; 503. Moving seat; 504. Platform; 505. Guide rod; 506. Drive frame; 507. Compression spring; 508. Sealing plate; 509. Roller seat; 6. Rotating assembly; 601. Connecting frame; 602. Buffer spring; 603. Tooth block; 604. Central gear; 605. Rotating shaft; 606. Stop block; 7. Clamping assembly; 701. Motor; 702. Drive gear; 703. Rack; 704. Synchronizing ring; 705. Guide groove; 706. Sliding column; 707. Sliding seat; 708. Connecting rod; 709. Clamping block; 710. Protruding column; 711. Limiting groove. Detailed Implementation

[0027] Please see Figures 1 to 3 This invention provides a technical solution: an atomic layer thin film deposition process apparatus, comprising a housing 1 and an adjustment assembly 5. A jet nozzle 2 is mounted on the rear side of the housing 1, and an exhaust pipe 3 is fixed to the lower part of the housing 1. A partition 4 is provided inside the housing 1. The adjustment assembly 5 penetrates the interior of the housing 1 and includes an electric cylinder 501. A push rod 502 is fixed to the output end of the electric cylinder 501, and a movable seat 503 is sleeved on the outer side of the end of the push rod 502. A platform 504 is rotatably connected to the top of the movable seat 503, and guide rods 505 are mounted on both sides of the movable seat 503. On the other two sides of 03, drive frames 506 are symmetrically fixed. Guide rods 505 are slidably connected to housing 1, and housing 1 is fixedly connected to electric cylinder 501. A compression spring 507 is abutted inside the partition 4, and one end of the compression spring 507 abuts against a sealing plate 508. Roller seats 509 are installed on both sides of the sealing plate 508 and both sides inside the housing 1. The side of the drive frame 506 is pointed, and the drive frame 506 abuts against the roller seat 509. The sealing plate 508 is slidably connected to the partition 4, and the arc of the groove on one side of the sealing plate 508 matches the arc of the outer side of the guide rod 505.

[0028] The specific operation is as follows: the interior of the chamber 1 is divided into three chambers by the partition 4 and the sealing plate 508. The jet nozzle 2 in the middle chamber can spray inert gas, while the jet nozzles 2 in the other two chambers are used to spray the precursor and the reaction gas, respectively. Therefore, when coating the product, the moving seat 503 can be moved by the electric cylinder 501 and the push rod 502 to move the product on the stage 504 to the designated chamber. First, the precursor is sprayed to form a monomolecular adsorption layer on the surface of the product substrate. At this time, the corresponding chamber will also be filled with the precursor. Then, the stage 504 is moved to the middle chamber filled with inert gas. At this time, the inert gas is sprayed by the middle jet nozzle 2 to blow the gas. This design cleverly utilizes the inert gas continuously ejected from the jet nozzle 2 in the central chamber to form a positive pressure air curtain, effectively preventing the gas in the precursor chamber from diffusing into the purge chamber. Simultaneously, any small amount of residual precursor adhering to the product can be efficiently blown away in the purge chamber and rapidly discharged through the exhaust pipe 3. This strictly prevents the precursor from being carried into the reaction chamber, thus ensuring the uniformity, density, and purity of the film. Compared to traditional ALD equipment, which requires "precursor adsorption, inert gas..." to be completed in a single chamber, this design achieves significantly better results. The previous method involved a cycle of "purging, reacting with reactive gas, and purging again," with each cycle requiring a large amount of inert gas to flush the entire chamber, which was time-consuming and gas-intensive. This application effectively saves a significant amount of time. After purging away residual precursors, the stage 504 is moved into the reactive gas chamber. Since there is also some reactive gas in the reactive gas chamber, the subsequent purging time can be reduced, thereby accelerating the reaction rate. Then, the stage 504 is moved back into the inert gas chamber, and the above operation is repeated to complete the coating. Therefore, during use, there is no need to purge and refill the chamber, which can reduce a significant amount of time and improve the efficiency of atomic layer thin film deposition. In operation, the sealing plate 508 achieves sealing by providing greater pressure through the compression spring 507. As the moving seat 503 moves, it also drives the drive frame 506 to move synchronously, causing its inclined surface to press against the roller seat 509. This generates a vertical force to compress the compression spring 507, thus automatically driving the sealing plate 508 to make room during the movement of the moving seat 503. This purely mechanical linkage design eliminates the need for separate drivers and sensors for each sealing plate 508, simplifying control, reducing operating costs, and ensuring the reliability and consistency of the operation, while guaranteeing the independence of the atmosphere in each chamber.

[0029] Please see Figure 4The end of the push rod 502 is connected to a rotating component 6, and the rotating component 6 includes a connecting frame 601. The two sides of the connecting frame 601 abut against buffer springs 602, and a toothed block 603 is provided on one side of the middle part of the connecting frame 601. A central gear 604 is meshed on one side of the toothed block 603, and a rotating shaft 605 is fixed inside the central gear 604. The rotating shaft 605 is fixedly connected to the platform 504. A stop block 606 is fixed on the inner bottom surface of the movable seat 503. The connecting frame 601 is C-shaped and is fixedly connected to the push rod 502. The buffer spring 602 abuts against the movable seat 503, and the movable seat 503 is slidably connected to the connecting frame 601.

[0030] The specific operation is as follows: When the movable seat 503 is located in the precursor chamber, the jet head 2 can spray the precursor to form a monomolecular adsorption layer on the surface of the product substrate. At this time, when the electric cylinder 501 drives the push rod 502 to move, it will apply pressure to the movable seat 503 through the connecting frame 601 and the buffer spring 602. During this process, since the drive frame 506 abuts against the roller seat 509, and the elastic force provided by the compression spring 507 is much greater than the elastic force of the buffer spring 602, the movable seat 503 remains stationary, while the buffer spring 602 undergoes compression deformation. The toothed block 603 drives the central gear 604 to rotate, and the stage 504 causes the product to rotate slowly. This ensures that the precursor evenly covers the entire surface of the product, effectively avoiding uneven coating thickness caused by airflow shadowing effect, and significantly improving film consistency and quality. At the same time, this process does not require an additional drive source, reducing operating costs. When it is necessary to change the position of the moving seat 503 in different chambers, as the push rod 502 continues to move, it will cause the connecting frame 601 to contact the stop block 606, so that the push rod 502 and the moving seat 503 are elastically connected. The connection becomes rigid, thus allowing a larger thrust to be applied to the drive frame 506, driving the sealing plate 508 to open and make way. This "elastic-to-rigid" transmission switching design ensures both smooth start-up of the product's rotation and sufficient thrust during cavity movement, resulting in reliable operation. Simultaneously, because the bottom of the roller seat 509 located on the upper part of the partition 4 is lower than the sealing plate 508, it ensures that the roller seat 509 remains in contact with the drive frame 506, converting sliding friction into rolling friction. This significantly reduces wear during transmission, improving the service life and reliability of the mechanism. In addition to reliability, when the roller seat 509 moves to the other end of the drive frame 506, the sealing plate 508 will quickly push the moving seat 503 into the inert gas chamber under the limit of the compression spring 507. During this process, the buffer spring 602 can buffer the connection between the connecting frame 601 and the moving seat 503. At the same time, since the push rod 502 and the moving seat 503 are slidably connected through the dynamic seal, there is a certain frictional damping force between them, which can suppress the vibration of the buffer spring 602, thereby enhancing the stability of the moving seat 503 during the movement process.

[0031] Please see Figures 5 to 7 A clamping assembly 7 is mounted on the bottom of the stage 504, and the clamping assembly 7 includes a motor 701. The motor 701 is fixed to the bottom of the stage 504, and the output end of the motor 701 is connected to a drive gear 702. A rack 703 meshes with one side of the drive gear 702, and the rack 703 is arc-shaped. A synchronizing ring 704 is fixedly connected to the top of the rack 703. A guide groove 705 is formed on the top of the synchronizing ring 704, and the guide groove 705 is arc-shaped. A sliding column 706 is slidably connected inside the guide groove 705. The top of the sliding column 706... The slide 707 is mounted on the part, and a connecting rod 708 is rotatably connected to one side of the slide 707. The slide 707 is slidably connected to the platform 504, and the platform 504 is rotatably connected to the synchronous ring 704. A clamping block 709 is rotatably connected to one end of the connecting rod 708, and protruding columns 710 are symmetrically fixed on both sides of the clamping block 709. The clamping blocks 709 are equidistantly distributed in a circle along the top of the platform 504, and the cross section of the clamping blocks 709 is L-shaped. A limiting groove 711 is opened on the top of the platform 504, and the protruding columns 710 are slidably connected to the platform 504 through the limiting groove 711.

[0032] The specific operation is as follows: After placing the product on the platform 504, the motor 701 can be started, which drives the synchronous ring 704 to rotate through the drive gear 702 and rack 703. This allows the sliding column 706 to slide within the guide groove 705. At the same time, the platform 504 limits and guides the sliding block 707, thus simultaneously driving all the sliding blocks 707 to move in the center. The connecting rod 708 then pushes the clamping block 709 to clamp the product's exterior. This multi-point synchronous clamping mechanism ensures uniform force on the product, avoiding potential offset or deformation caused by unilateral clamping, greatly improving the stability of subsequent transfer and coating processes. Furthermore, during processing, only the top of the product needs to be coated; the rest is covered by a pre-installed protective sleeve. Therefore, the clamping block 709... 9. The clamping mechanism does not affect the film-coated area. When the product needs to be removed after film coating, simply control the motor 701 to drive the drive gear 702 to rotate in the opposite direction. This will drive all the slides 707 to slide outward, causing the connecting rod 708 to pull the clamping block 709 to release the product. At the same time, the connecting rod 708 will also drive the protrusion 710 to slide in the limiting groove 711. When the protrusion 710 moves to the end of the limiting groove 711, as the connecting rod 708 continues to pull the clamping block 709, the clamping block 709 will rotate around the protrusion 710. Its lower end acts as a lever to smoothly lift the product from the platform 504. This creates ample operating space for operators to use clamps to pick up and put down products, thereby improving the convenience of product unloading.

[0033] In summary, this atomic layer thin film deposition equipment is used as follows:

[0034] First, open the door of the housing 1, place the product on the platform 504, and start the motor 701. This will drive the synchronous ring 704 to rotate through the drive gear 702 and rack 703, allowing the slide column 706 to slide in the guide groove 705. At the same time, the platform 504 will limit and guide the slide 707, thus driving all the slides 707 to move in the center at the same time. The connecting rod 708 will push the clamping block 709 to clamp the outside of the product. This multi-point synchronous clamping mechanism ensures that the product is subjected to uniform force and avoids the deviation or deformation that may be caused by unilateral clamping. This greatly improves the stability of the subsequent transfer and coating process. At the same time, only the top of the product needs to be coated during processing, and the rest of the product is covered by the pre-set protective sleeve. Therefore, the clamping block 709 will not affect the coating area when clamping. Then, close the door and perform vacuuming and heating-related pretreatment.

[0035] Secondly, the interior of the housing 1 is divided into three chambers by the partition 4 and the sealing plate 508. The jet nozzle 2 in the middle chamber can spray inert gas, while the jet nozzles 2 in the other two chambers are used to spray the precursor and the reaction gas, respectively. Therefore, when coating the product, the moving seat 503 can be moved by the electric cylinder 501 and the push rod 502 to move the product on the stage 504 to the designated chamber. The precursor is sprayed first to form a monomolecular adsorption layer on the surface of the product substrate. At this time, when the electric cylinder 501 drives the push rod 502 to move, it will apply pressure to the moving seat 503 through the connecting frame 601 and the buffer spring 602. During this process, because the drive frame 506 abuts against the roller seat 509, and the elastic force provided by the compression spring 507 is much greater than the elastic force of the buffer spring 602, the moving seat 503 remains stationary, while the buffer spring 602 undergoes compression deformation. At this stage, the tooth block 603 can drive the central gear 604 to rotate, and the stage 504 will drive the product to rotate slowly. This ensures that the precursor uniformly covers the entire surface of the product, effectively avoiding uneven coating thickness caused by airflow shadow effect, significantly improving film consistency and quality. At the same time, this process does not require an additional drive source, reducing usage costs.

[0036] Next, when the position of the movable seat 503 needs to be changed in different chambers, as the push rod 502 continues to move, it will cause the connecting frame 601 to contact the stop block 606, changing the elastic connection between the push rod 502 and the movable seat 503 into a rigid connection. This allows a larger thrust to be applied to the drive frame 506, causing its inclined surface to press against the roller seat 509. This generates a vertical force to compress the spring 507, thus automatically driving the sealing plate 508 to make room during the movement of the movable seat 503. This purely mechanical linkage design eliminates the need for separate drivers and sensors for each sealing plate 508, simplifying control, reducing operating costs, and ensuring the reliability and consistency of the operation. It also guarantees the independence of the atmosphere in each chamber. Furthermore, because it is located on the upper part of the partition 4... The bottom of the roller seat 509 is lower than the sealing plate 508, ensuring that the roller seat 509 can always be in contact with the drive frame 506, converting sliding friction into rolling friction, which greatly reduces wear during transmission and improves the service life and reliability of the mechanism. In addition, when the roller seat 509 moves to the other end of the drive frame 506, the sealing plate 508 will quickly push the moving seat 503 into the inert gas chamber under the limit of the compression spring 507. During this process, the buffer spring 602 can buffer the connection between the connecting frame 601 and the moving seat 503. At the same time, since the push rod 502 and the moving seat 503 are slidably connected through the dynamic seal, there is a certain frictional damping force between them, which can suppress the vibration of the buffer spring 602, thereby enhancing the stability of the moving seat 503 during movement.

[0037] Then, when the product is transferred between chambers, the brief opening of the sealing plate 508 will cause a slight air cross-contamination. At this time, the inert gas continuously sprayed by the jet head 2 in the middle chamber forms a positive pressure air curtain, which effectively prevents the gas in the precursor chamber from diffusing into the purge chamber. At the same time, a small amount of residual precursor adhering to the product can be efficiently blown away in the purge chamber and quickly discharged through the exhaust pipe 3. This strictly prevents the precursor from being carried into the reaction chamber and causing gas phase parasitic reaction, thereby ensuring the uniformity, density and purity of the film. After the residual precursor is blown away, the stage 504 is moved to the reaction gas chamber. Since there is also a certain amount of reaction gas in the reaction gas chamber, the subsequent jetting time can be reduced, thereby accelerating the reaction speed. Then, the stage 504 is moved back to the inert gas chamber, and the above operation is repeated to complete the coating. Therefore, during use, there is no need to empty and refill the chamber throughout the process, which can reduce a lot of time and improve the efficiency of atomic layer film deposition.

[0038] Finally, when the product needs to be removed after lamination, simply control the motor 701 to drive the drive gear 702 to rotate in the opposite direction, which in turn drives all the slide blocks 707 to slide outward, causing the connecting rod 708 to pull the clamping block 709 to release the product. At the same time, the connecting rod 708 will also drive the protrusion 710 to slide in the limiting groove 711. When the protrusion 710 moves to the end of the limiting groove 711, as the connecting rod 708 continues to pull the clamping block 709, the clamping block 709 will rotate around the protrusion 710. Its lower end acts as a lever to smoothly lift the product from the platform 504. This creates ample operating space for operators to use clamps to pick up and put down products, thereby improving the convenience of product unloading.

[0039] It should be noted that, in this document, the terms “comprising,” “including,” or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus.

[0040] This article uses specific examples to illustrate the principles and implementation methods of the present invention. The above examples are only for the purpose of helping to understand the method and core ideas of the present invention. The above descriptions are only preferred embodiments of the present invention. It should be noted that due to the limitations of textual expression, while there are objectively infinite specific structures, those skilled in the art can make several improvements, modifications, or changes without departing from the principles of the present invention, and can also combine the above technical features in an appropriate manner. These improvements, modifications, changes, or combinations, or the direct application of the inventive concept and technical solution to other situations without modification, should all be considered within the scope of protection of the present invention.

Claims

1. An atomic layer thin film deposition process apparatus, characterized by, The utility model provides a kind of air injection head and exhaust pipe, including box (1) and adjusting assembly (5), the rear side of the box (1) is arranged with air injection head (2), and the lower part of box (1) is fixed with exhaust pipe (3), the inside of the box (1) is provided with baffle (4), adjusting assembly (5) is penetrated in the inside of box (1), and adjusting assembly (5) includes electric cylinder (501), the output end of electric cylinder (501) is fixed with push rod (502), and the end outer side of push rod (502) is equipped with moving seat (503), the top of moving seat (503) is rotatably connected with platform (504), and moving seat (503) both sides are arranged with guide rod (505), and another two sides of moving seat (503) are fixed with drive frame (506) symmetrically, the inside of baffle (4) is abutted with compression spring (507), and one end of compression spring (507) is abutted with sealing plate (508), the both sides of sealing plate (508) and the both sides of the inside of box (1) are arranged with gyro wheel seat (509), the end of push rod (502) is connected with rotating assembly (6), and rotating assembly (6) includes connecting frame (601), the both sides of connecting frame (601) are abutted with buffer spring (602), and the middle one side of connecting frame (601) is provided with gear block (603), the side of gear block (603) is engaged with center gear (604), and the inside of center gear (604) is fixed with rotating shaft (605), and rotating shaft (605) is fixedly connected with platform (504), the inside bottom of moving seat (503) is fixed with stop block (606), the bottom of platform (504) is arranged with clamping assembly (7), and clamping assembly (7) includes motor (701), the bottom of platform (504) is fixed with motor (701), and the output end of motor (701) is connected with driving gear (702), the side of driving gear (702) is engaged with rack (703), and rack (703) is arc-shaped, and the top of rack (703) is fixedly connected with synchronous ring (704), the top of synchronous ring (704) is provided with guide groove (705), and guide groove (705) is arc-shaped, and the inside of guide groove (705) is slidably connected with slide column (706), the top of slide column (706) is arranged with slide seat (707), and the side of slide seat (707) is rotatably connected with connecting rod (708), the end of connecting rod (708) is rotatably connected with clamping block (709), and the both sides of clamping block (709) are fixed with convex column (710) symmetrically, the top of platform (504) is provided with limiting groove (711), and convex column (710) is slidably connected with platform (504) through limiting groove (711).

2. The atomic layer thin film deposition process apparatus according to claim 1, wherein The guide rod (505) is slidably connected with the box (1), and the box (1) is fixedly connected with the electric cylinder (501).

3. The atomic layer thin film deposition process apparatus according to claim 1, wherein The side of the drive frame (506) is sharp, and the drive frame (506) is abutted with the gyro wheel seat (509).

4. The atomic layer thin film deposition process apparatus according to claim 1, wherein The sealing plate (508) is in sliding connection with the partition plate (4), and the side groove arc of the sealing plate (508) is matched with the outside arc of the guide rod (505).

5. The atomic layer thin film deposition process apparatus according to claim 1, wherein The connecting frame (601) is in C-shaped, and the connecting frame (601) is fixedly connected with the push rod (502).

6. The atomic layer thin film deposition process apparatus according to claim 1, wherein The buffer spring (602) is in abutment with the moving seat (503), and the moving seat (503) is in sliding connection with the connecting frame (601).

7. The atomic layer thin film deposition process apparatus according to claim 1, wherein The sliding seat (707) is in sliding connection with the carrier (504), and the carrier (504) is in rotary connection with the synchronous ring (704).

8. The atomic layer thin film deposition process apparatus according to claim 1, wherein, The clamping blocks (709) are equidistantly and circumferentially distributed along the top of the carrier (504), and the cross section of the clamping block (709) is in L-shaped.

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