Electro-optical modulator and preparation method thereof
By 3D printing ferroelectric resin ridge waveguides on ferroelectric thin film substrates and combining them with BTO and PVDF materials, the problems of complicated and high-cost electro-optic modulator fabrication processes have been solved, realizing the fabrication of efficient and low-cost electro-optic modulators suitable for optical communication and optical computing applications.
Patent Information
- Application Number
- CN202511646725.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-11
- Publication Date
- 2026-02-06
AI Technical Summary
Existing electro-optic modulators have complicated fabrication processes, high costs, and high optical losses. Traditional etching processes result in rough waveguides, making it difficult to reduce costs and improve modulation efficiency.
Ferroelectric resin ridge waveguides are formed on ferroelectric thin film substrates using 3D printing technology, and electrodes are set on one side of the waveguides. By combining BTO ferroelectric thin films and PVDF photosensitive resin, the synergistic effect of the two ferroelectric materials is achieved, simplifying the process steps and reducing costs.
It reduces the difficulty of fabricating electro-optic modulators, simplifies the process steps, lowers costs, enhances modulation efficiency through dual electro-optic coefficients, is compatible with flexible substrates and low-temperature integration, and is suitable for mass production.
Smart Images
Figure CN121477514A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the fields of optoelectronic materials, optoelectronic devices and micro-nano photonics, specifically to an electro-optic modulator and its fabrication method. Background Technology
[0002] Currently, electro-optic modulators are core devices for optical communication and optical computing, which modulate optical signals by controlling the refractive index of materials through an electric field.
[0003] In related technologies, the current mainstream solution for electro-optic modulators relies on multiple semiconductor processes such as photolithography and etching, which are complicated, require large equipment investment, and are difficult to reduce costs; moreover, etching can easily lead to waveguide roughness and increase optical loss.
[0004] Therefore, it is necessary to design a new electro-optic modulator and its fabrication method to overcome the above problems. Summary of the Invention
[0005] This application provides an electro-optic modulator and its fabrication method, which can solve the technical problems of cumbersome steps, high cost and high optical loss in related technologies.
[0006] In a first aspect, embodiments of this application provide an electro-optic modulator, comprising: a ferroelectric thin film substrate, on which a ferroelectric resin ridge waveguide is 3D printed, and electrodes are fixed on the ferroelectric thin film substrate, the electrodes being spaced apart on one side of the ferroelectric resin ridge waveguide.
[0007] In conjunction with the first aspect, in one embodiment, the ferroelectric thin film substrate includes a substrate and a BTO ferroelectric thin film fixed to the substrate, wherein the ferroelectric resin ridge waveguide and the electrode are both fixed to the BTO ferroelectric thin film. In this embodiment, the substrate serves as a supporting substrate, and the BTO ferroelectric thin film serves as a high electro-optic response layer. Under an applied electric field, the BTO ferroelectric thin film provides the main electro-optic response with a high electro-optic coefficient >1000 pm / V.
[0008] In conjunction with the first aspect, in one embodiment, the ferroelectric resin ridge waveguide is made of PVDF-based photosensitive resin. This PVDF ferroelectric resin ridge waveguide can guide the transmission of incident light signals, and simultaneously, under an applied electric field, it assists the BTO ferroelectric thin film in enhancing the overall modulation efficiency through its own electro-optic coefficient of ~100 pm / V. Combining the PVDF-based photosensitive resin ridge waveguide with the BTO ferroelectric thin film achieves a solution of "synergistic use of dual ferroelectric materials + simplified process".
[0009] In conjunction with the first aspect, in one embodiment, the cross-section of the ferroelectric resin ridge waveguide is rectangular ridge, elliptical ridge, or trapezoidal ridge.
[0010] In conjunction with the first aspect, in one embodiment, the width of the ferroelectric resin ridge waveguide ranges from 0.1 to 0.5 μm; the height of the ferroelectric resin ridge waveguide ranges from 100 to 500 nm.
[0011] In conjunction with the first aspect, in one embodiment, the electrodes are symmetrically distributed on opposite sides of the ferroelectric resin ridge waveguide.
[0012] In conjunction with the first aspect, in one embodiment, the spacing between the electrode and the ferroelectric resin ridge waveguide ranges from 1 to 10 μm.
[0013] Secondly, embodiments of this application provide a method for fabricating an electro-optic modulator, which includes the following steps: Ferroelectric resin ridge waveguides are formed on ferroelectric thin film substrates using 3D printing, and electrodes are deposited on the ferroelectric thin film substrates, with the electrodes spaced apart on one side of the ferroelectric resin ridge waveguides.
[0014] In conjunction with the second aspect, in one embodiment, prior to molding the ferroelectric resin ridge waveguide, the method further includes: The width and height of the ferroelectric resin ridge waveguide were determined by analyzing the time transmission modes using finite element simulation.
[0015] In conjunction with the second aspect, in one embodiment, after molding the ferroelectric resin ridge waveguide, the method further includes: ultraviolet curing the ferroelectric resin ridge waveguide.
[0016] The beneficial effects of the technical solutions provided in this application include: Ferroelectric resin ridge waveguides are formed on ferroelectric thin film substrates using 3D printing, allowing the ferroelectric resin ridge waveguides to be formed on one side of the electrode. 3D printing can reduce the difficulty of fabrication, simplify the process steps of electro-optic modulators, and reduce costs. At the same time, the use of this method to form ferroelectric resin ridge waveguides is less likely to cause waveguide roughness, solving the technical problems of complicated steps, high cost, and high optical loss in related technologies for electro-optic modulators. Attached Figure Description
[0017] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0018] Figure 1 This is a schematic diagram of an electro-optic modulator provided in an embodiment of this application.
[0019] In the picture: 1. Ferroelectric thin film substrate; 11. Substrate; 12. BTO ferroelectric thin film; 2. Ferroelectric resin ridge waveguide; 3. Electrodes. Detailed Implementation
[0020] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of the present application.
[0021] Electro-optic modulators are core components in optical communication and optical computing, achieving optical signal modulation by controlling the refractive index of materials using an electric field. Current mainstream electro-optic modulator solutions suffer from the following significant shortcomings: Complex processes and high costs: Traditional modulators (such as lithium niobate and silicon-based modulators) rely on multiple semiconductor processes such as photolithography and etching, which are cumbersome, require large equipment investments, and are difficult to reduce costs; moreover, etching can easily lead to waveguide roughness and increase optical loss. Although conventional silicon nitride ridge waveguides have very low loss, they sacrifice the ability of the thin film to modulate the optical field, resulting in a decrease in device performance.
[0022] Current modulation materials are mostly single-system materials - lithium niobate has an electro-optic coefficient of about 30 pm / V, and silicon-based materials have an electro-optic coefficient of <10 pm / V, both of which are difficult to achieve high-sensitivity modulation; among ferroelectric materials, BTO (barium titanate) thin films have an electro-optic coefficient of over 1000 pm / V, but traditional preparation requires pulsed laser deposition and high-temperature annealing (>800℃), which is not compatible with flexible or low-temperature processes; PVDF (polyvinylidene fluoride) has an electro-optic coefficient of about 100 pm / V, but it is difficult to precisely process ridge waveguide structures. Furthermore, most current 3D printing inks for photonic devices are made of ordinary polymers, which either lack ferroelectric / electro-optic properties or require high-temperature sintering (>1000℃). Composite inks for BTO films and PVDF are scarce, and direct printing is prone to interlayer delamination and low forming accuracy (waveguide size error >10%), failing to leverage the synergistic performance of the two.
[0023] This application provides an electro-optic modulator and its fabrication method, which can solve the technical problems of cumbersome steps, high cost and high optical loss in related technologies.
[0024] See Figure 1As shown, this application provides an electro-optic modulator, which includes: a ferroelectric thin film substrate 1, a ferroelectric resin ridge waveguide 2 3D printed on the ferroelectric thin film substrate 1, and an electrode 3 fixed on the ferroelectric thin film substrate 1, the electrode 3 being spaced apart on one side of the ferroelectric resin ridge waveguide 2.
[0025] In this embodiment, see Figure 1 As shown, the ferroelectric resin ridge waveguide 2 is located above the ferroelectric thin film substrate 1 and is directly fixed to the top surface of the ferroelectric thin film substrate 1. The electrode 3 has a positive electrode and a negative electrode. The positive electrode is located on one side of the ferroelectric resin ridge waveguide 2, and the negative electrode is located on the other side of the ferroelectric resin ridge waveguide 2. Both the positive electrode and the negative electrode are spaced apart from the ferroelectric resin ridge waveguide 2 by a certain distance.
[0026] In this embodiment, a ferroelectric resin ridge waveguide 2 is formed on a ferroelectric thin film substrate 1 using 3D printing. Both the electrode 3 and the ferroelectric resin ridge waveguide 2 are located above the ferroelectric thin film substrate 1, with the ferroelectric resin ridge waveguide 2 formed on one side of the electrode 3. The direct 3D printing of the ferroelectric resin ridge waveguide 2 in this embodiment reduces fabrication difficulty, avoids complex photolithography etching, simplifies the electro-optic modulator process, and reduces costs. Furthermore, this method of forming the ferroelectric resin ridge waveguide 2 minimizes waveguide roughness, solving the technical problems of cumbersome steps, high costs, and high optical loss in related technologies. The electro-optic modulator in this embodiment reduces process complexity while enabling low-temperature integration (<80℃) of the ferroelectric resin ridge waveguide 2, and is compatible with flexible substrate 11 and integrated manufacturing.
[0027] Further, in one embodiment, the ferroelectric thin film substrate 1 includes a substrate 11 and a BTO ferroelectric thin film 12 fixed to the substrate 11, wherein the ferroelectric resin ridge waveguide 2 and the electrode 3 are both fixed to the BTO ferroelectric thin film 12. See also Figure 1 As shown, the ferroelectric thin film substrate 1 of this embodiment includes a substrate 11 and a BTO ferroelectric thin film 12 fixed on the substrate 11. The substrate 11 is preferably a silicon-based substrate 11, including a bottom layer of silicon and silicon dioxide above the bottom layer of silicon. Of course, in other embodiments, the substrate 11 can be made of other materials, not limited to silicon, as long as it can serve as a substrate 11 for an electro-optic modulator. Furthermore, the ferroelectric thin film in this embodiment is preferably BTO (barium titanate). Among ferroelectric materials, BTO (barium titanate) thin films have an electro-optic coefficient exceeding 1000 pm / V, indicating a high electro-optic coefficient. The BTO ferroelectric thin film 12 serves as the core material for electro-optic modulation. Under an applied electric field, BTO dominates the refractive index regulation, directly determining the modulation efficiency and providing the foundation for core performance.
[0028] In this embodiment, substrate 11 serves as a supporting substrate, and BTO ferroelectric thin film 12 serves as a high electro-optic response layer. The thickness (i.e., height) of BTO ferroelectric thin film 12 is preferably 200~300nm. The height of substrate 11 is much greater than the height of other layers to ensure the structural stability of the entire electro-optic modulator. Under an applied electric field, BTO ferroelectric thin film 12 provides the main electro-optic response with a high electro-optic coefficient of >1000pm / V.
[0029] In other embodiments, the ferroelectric thin film substrate 1 may also be selected from other ferroelectric thin films with an electro-optic coefficient of around 1000 pm / V or a higher electro-optic coefficient, and is not limited to BTO ferroelectric thin film 12.
[0030] Furthermore, in some optional embodiments, the ferroelectric resin ridge waveguide 2 is made of PVDF-based photosensitive resin. In this embodiment, PVDF, or polyvinylidene fluoride, has an electro-optic coefficient of approximately 100 pm / V. The PVDF-based photosensitive resin ridge waveguide serves as the core light transmission and modulation layer, a key structure for direct 3D printing. This PVDF ferroelectric resin ridge waveguide 2 can guide the transmission of incident light signals and, under an applied electric field, assists the BTO ferroelectric thin film in enhancing the overall modulation efficiency through its own electro-optic coefficient of approximately 100 pm / V. In related technologies, PVDF-based photosensitive resin is difficult to precisely fabricate ridge waveguide structures. This embodiment uses 3D printing to precisely fabricate ridge waveguides and combines the PVDF-based photosensitive resin ridge waveguide with the BTO ferroelectric thin film 12 to achieve a "dual ferroelectric material synergy + simplified process" solution. The ridge waveguide is 3D printed on the BTO ferroelectric thin film using PVDF-based photosensitive resin. The dual electro-optic coefficients of BTO and PVDF enhance performance while reducing fabrication difficulty, minimizing device size, and making it convenient, easy to process, and suitable for mass production. In this embodiment, the electro-optic modulator BTO ferroelectric thin film 12 and the PVDF-based photosensitive resin ridge waveguide form a "dual electro-optic synergy," possessing dual electro-optic coefficients that enhance modulation efficiency. Furthermore, combining the high electro-optic performance of BTO with the advantages of PVDF technology, high-performance modulation can be achieved.
[0031] Preferably, the ferroelectric resin ridge waveguide 2 described above can be cured under ultraviolet light after 3D printing (crosslinking degree > 90%), taking into account both low optical loss (loss of less than 0.8dB / cm in the 1.55μm band) and molding accuracy (dimensional error < 3%).
[0032] Furthermore, in some embodiments, the cross-section of the ferroelectric resin ridge waveguide 2 is rectangular, elliptical, or trapezoidal. In this embodiment, the cross-section of the ferroelectric resin ridge waveguide 2 is preferably rectangular. In other embodiments, the cross-section of the ferroelectric resin ridge waveguide 2 can also be elliptical, trapezoidal, or other regular or irregular shapes, and is not limited here. Using 3D printing allows for flexible adjustment of the size and shape of the ferroelectric resin ridge waveguide 2, thereby adapting to the needs of different integrated optoelectronic devices.
[0033] Further, in one embodiment, the width of the ferroelectric resin ridge waveguide 2 ranges from 0.1 to 0.5 μm; the height of the ferroelectric resin ridge waveguide 2 ranges from 100 to 500 nm; and the ferroelectric resin ridge waveguide 2 is for single-mode transmission. See also Figure 1 As shown in the figure, the left-right direction represents the width, and the up-down direction represents the height. The width of the ferroelectric resin ridge waveguide 2 in the figure can be set to 0.1~0.5μm, and the height can be set to 100~500nm. The width and height can be any value within the corresponding range. When determining the width and height of the ferroelectric resin ridge waveguide 2, the width and height are determined through finite element simulation analysis of the optical transmission mode. In this embodiment, the cross-sectional width of the rectangular ridge ferroelectric resin ridge waveguide 2 is 0.1μm, and the height is 200nm.
[0034] Based on the above technical solution, in one embodiment, the electrodes 3 are symmetrically distributed on opposite sides of the ferroelectric resin ridge waveguide 2. See also... Figure 1 As shown, electrode 3 is divided into positive and negative electrodes, which are symmetrically distributed on both sides of the ferroelectric resin ridge waveguide 2. The width of each electrode 3 ranges from 1 to 10 μm, facilitating the connection of an external driving circuit. When an external DC / AC driving voltage is applied, a uniform electric field (the electric field strength is positively correlated with the voltage) is formed between the ferroelectric resin ridge waveguide 2 and the substrate 11. By adjusting the refractive indices of BTO and PVDF, optical signal modulation can be achieved.
[0035] In this embodiment, electrode 3 is preferably a coplanar silver electrode 3 (in other embodiments, other metals can also be used as electrode 3, which is not limited here, such as gold). The electrode 3 on the top surface serves as an electric field application layer, and its thickness is preferably 100~1000nm. This thickness ensures that electrode 3 is thin and has good conductivity, the electro-optic field overlap modulation efficiency is the highest, and the sheet resistance is <5Ω. The spacing between electrode 3 and ferroelectric resin ridge waveguide 2 is preferably 4μm, which is completely matched with the width of PVDF ferroelectric resin ridge waveguide 2. The electric field directly acts on the core region of "ferroelectric resin ridge waveguide 2 + BTO ferroelectric thin film 12 substrate 1".
[0036] Furthermore, in some optional embodiments, the spacing between the electrode 3 and the ferroelectric resin ridge waveguide 2 is in the range of 1~10μm, which can balance loss and modulation efficiency.
[0037] Secondly, this application also provides a method for fabricating an electro-optic modulator, which may include the following steps: forming a ferroelectric resin ridge waveguide 2 on a ferroelectric thin film substrate 1 by 3D printing, and depositing electrodes 3 on the ferroelectric thin film substrate 1, such that the electrodes 3 are spaced apart on one side of the ferroelectric resin ridge waveguide 2.
[0038] The fabrication method provided in this application embodiment can obtain the electro-optic modulator provided in any of the above embodiments and realize the corresponding functions. In this embodiment, the ferroelectric resin ridge waveguide 2 is located above the ferroelectric thin film substrate 1 and is directly fixed to the top surface of the ferroelectric thin film substrate 1 by 3D printing. The electrode 3 has a positive electrode and a negative electrode. The positive electrode is located on one side of the ferroelectric resin ridge waveguide 2, and the negative electrode is located on the other side of the ferroelectric resin ridge waveguide 2. Both the positive electrode and the negative electrode are spaced apart from the ferroelectric resin ridge waveguide 2 by a certain distance.
[0039] In this embodiment, a ferroelectric resin ridge waveguide 2 is formed on a ferroelectric thin film substrate 1 using 3D printing. Both the electrode 3 and the ferroelectric resin ridge waveguide 2 are located above the ferroelectric thin film substrate 1, with the ferroelectric resin ridge waveguide 2 formed on one side of the electrode 3. The direct 3D printing of the ferroelectric resin ridge waveguide 2 in this embodiment reduces fabrication difficulty, avoids complex photolithography etching, simplifies the electro-optic modulator process, and reduces costs. Furthermore, this method of forming the ferroelectric resin ridge waveguide 2 minimizes waveguide roughness, solving the technical problems of cumbersome steps, high costs, and high optical loss in related technologies. The electro-optic modulator in this embodiment reduces process complexity while enabling low-temperature integration (<80℃) of the ferroelectric resin ridge waveguide 2, and is compatible with flexible substrate 11 and integrated manufacturing.
[0040] Furthermore, in some embodiments, before molding the ferroelectric resin ridge waveguide 2, the method may further include: determining the width and height of the ferroelectric resin ridge waveguide 2 by analyzing the light transmission mode through finite element simulation.
[0041] In this embodiment, the width of the ferroelectric resin ridge waveguide 2 ranges from 0.1 to 0.5 μm; the height of the ferroelectric resin ridge waveguide 2 ranges from 100 to 500 nm. See also... Figure 1As shown in the figure, the left-right direction represents the width, and the up-down direction represents the height. The width of the ferroelectric resin ridge waveguide 2 in the figure can be set to 0.1~0.5μm, and the height can be set to 100~500nm. The width and height can be any value within the corresponding range. When determining the width and height of the ferroelectric resin ridge waveguide 2, the width and height are determined through finite element simulation analysis of the optical transmission mode. In this embodiment, the cross-sectional width of the rectangular ridge ferroelectric resin ridge waveguide 2 is 0.1μm, and the height is 200nm.
[0042] Furthermore, in some optional embodiments, after molding the ferroelectric resin ridge waveguide 2, the process may further include: ultraviolet curing the ferroelectric resin ridge waveguide 2. In this embodiment, the ferroelectric resin ridge waveguide 2, after being 3D printed, can be ultraviolet cured (crosslinking degree > 90%), achieving both low optical loss (loss less than 0.8 dB / cm in the 1.55 μm band) and molding accuracy (dimensional error < 3%).
[0043] Further, in one embodiment, the ferroelectric thin film substrate 1 includes a substrate 11 and a BTO ferroelectric thin film 12 fixed on the substrate 11. The ferroelectric resin ridge waveguide 2 and the electrode 3 are both fixed on the BTO ferroelectric thin film 12. In this embodiment, the substrate 11 serves as a supporting substrate, and the BTO ferroelectric thin film 12 serves as a high electro-optic response layer. The thickness (i.e., height) of the BTO ferroelectric thin film 12 is preferably 200~300nm. The height of the substrate 11 is much greater than the height of other layers, ensuring the structural stability of the entire electro-optic modulator. Under an applied electric field, the BTO ferroelectric thin film 12 provides the main electro-optic response with a high electro-optic coefficient >1000pm / V.
[0044] Furthermore, in one embodiment, the ferroelectric resin ridge waveguide 2 is made of PVDF-based photosensitive resin. In this embodiment, the electro-optic coefficient of PVDF is approximately 100 pm / V, forming a PVDF-based photosensitive resin ridge waveguide, which serves as the core light transmission and modulation layer and is a key structure for direct 3D printing. This PVDF ferroelectric resin ridge waveguide 2 can guide the transmission of incident light signals, and simultaneously, under an applied electric field, it assists the BTO ferroelectric thin film in enhancing the overall modulation efficiency through its own electro-optic coefficient of ~100 pm / V.
[0045] 3D printing can precisely fabricate ridge waveguides, and combining PVDF-based photosensitive resin ridge waveguides with BTO ferroelectric thin films can achieve a "dual ferroelectric material synergy + simplified process" solution. Ridge waveguides are 3D printed on BTO ferroelectric thin films using PVDF-based photosensitive resin. The dual electro-optic coefficients of BTO and PVDF are used to improve performance, while reducing fabrication difficulty, shrinking device size, making it convenient to use, easy to process, and suitable for mass production.
[0046] Furthermore, in one embodiment, the cross-section of the ferroelectric resin ridge waveguide 2 is rectangular, elliptical, or trapezoidal. Using 3D printing allows for flexible adjustment of the size and shape of the ferroelectric resin ridge waveguide 2, thereby adapting to the needs of different integrated optoelectronic devices.
[0047] Furthermore, in one embodiment, the electrodes 3 are symmetrically distributed on opposite sides of the ferroelectric resin ridge waveguide 2. In this embodiment, the electrodes 3 are divided into positive and negative electrodes, which are symmetrically distributed on both sides of the ferroelectric resin ridge waveguide 2. The width of each electrode 3 ranges from 1 to 10 μm, facilitating the connection of an external driving circuit. When an external DC / AC driving voltage is applied, a uniform electric field (the electric field strength is positively correlated with the voltage) is formed between the ferroelectric resin ridge waveguide 2 and the substrate 11. By adjusting the refractive indices of BTO and PVDF, optical signal modulation can be achieved.
[0048] Electrode 3 is preferably a coplanar silver electrode 3 (in other embodiments, other metals can also be used as electrode 3, which is not limited here, such as gold). The top electrode 3 serves as an electric field application layer with a thickness of preferably 500 nm. This thickness ensures that electrode 3 is thin and has excellent conductivity, the electro-optic field overlap modulation efficiency is the highest, and the sheet resistance is <5Ω. The spacing between electrode 3 and ferroelectric resin ridge waveguide 2 is preferably 4 μm, which is completely matched with the width of PVDF ferroelectric resin ridge waveguide 2. The electric field directly acts on the core region of "ferroelectric resin ridge waveguide 2 + BTO ferroelectric thin film 12 substrate 1".
[0049] Furthermore, in one embodiment, the distance between the electrode 3 and the ferroelectric resin ridge waveguide 2 is in the range of 1~10μm.
[0050] The electro-optic modulator and its fabrication method provided in this application embodiment enhance modulation efficiency with dual electro-optic coefficients, combining the high electro-optic performance of BTO with the advantages of PVDF process to achieve high-performance modulation; and the fabrication difficulty is low, with ridge waveguides directly formed by 3D printing, avoiding complex photolithography and etching; the process complexity is reduced, low-temperature integration (<80℃) is possible, and it is compatible with flexible substrates and integrated manufacturing; taking into account both material properties and structural flexibility, the waveguide size and shape can be flexibly adjusted to meet the needs of different integrated optoelectronic devices.
[0051] In the description of this application, it should be noted that the terms "upper," "lower," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Unless otherwise expressly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two elements. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.
[0052] It should be noted that in this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.
[0053] The above description is merely a specific embodiment of this application, enabling those skilled in the art to understand or implement this application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Therefore, this application is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.
Claims
1. An electro-optic modulator, characterized in that, It includes: A ferroelectric thin film substrate (1) is provided with a ferroelectric resin ridge waveguide (2) 3D printed on the ferroelectric thin film substrate (1), and an electrode (3) is fixed on the ferroelectric thin film substrate (1), with the electrode (3) spaced apart on one side of the ferroelectric resin ridge waveguide (2).
2. The electro-optic modulator as described in claim 1, characterized in that, The ferroelectric thin film substrate (1) includes a substrate (11) and a BTO ferroelectric thin film (12) fixed on the substrate (11). The ferroelectric resin ridge waveguide (2) and the electrode (3) are both fixed on the BTO ferroelectric thin film (12).
3. The electro-optic modulator as described in claim 1, characterized in that, The ferroelectric resin ridge waveguide (2) is made of PVDF-based photosensitive resin.
4. The electro-optic modulator as described in claim 3, characterized in that, The cross-section of the ferroelectric resin ridge waveguide (2) is rectangular ridge, elliptical ridge, or trapezoidal ridge.
5. The electro-optic modulator as described in claim 4, characterized in that, The width of the ferroelectric resin ridge waveguide (2) ranges from 0.1 to 0.5 μm; the height of the ferroelectric resin ridge waveguide (2) ranges from 100 to 500 nm.
6. The electro-optic modulator as described in claim 1 or 2, characterized in that, The electrodes (3) are symmetrically distributed on opposite sides of the ferroelectric resin ridge waveguide (2).
7. The electro-optic modulator as described in claim 6, characterized in that, The distance between the electrode (3) and the ferroelectric resin ridge waveguide (2) is 1~10μm.
8. A method for fabricating an electro-optic modulator, characterized in that, It includes the following steps: Ferroelectric resin ridge waveguide (2) is formed on ferroelectric thin film substrate (1) by 3D printing, and electrodes (3) are deposited on ferroelectric thin film substrate (1) such that the electrodes (3) are spaced apart on one side of ferroelectric resin ridge waveguide (2).
9. The preparation method according to claim 8, characterized in that, Before molding the ferroelectric resin ridge waveguide (2), the following are also included: The width and height of the ferroelectric resin ridge waveguide (2) were determined by analyzing the time transmission mode through finite element simulation.
10. The preparation method according to claim 8, characterized in that, Following the molding of the ferroelectric resin ridge waveguide (2), the following is also included: The ferroelectric resin ridge waveguide (2) was cured with ultraviolet light.