Multi-condition compensator parameter calculation method, system, medium and program product

Abstract

The application discloses a multi-condition compensator parameter calculation method, system, medium and program product. Mainly related to the field of lithography technology, by reconstructing the discrete measurement data, it can meet the stability needs of the compensator transmittance solution, and ensure the comparability of the light intensity after mapping to the unified grid under the multi-condition condition. Then the compensating transmittance distribution considering all conditions is calculated according to the transmittance distribution under the multi-condition. Different from the traditional single-condition compensation design, the application regards multiple conditions as coupling constraints, so that the designed compensator can maintain high uniformity improvement effect under different conditions. Further, the application also proposes to use a clamping tool assembly with elastic positioning blocks, which can effectively reduce the imaging error caused by assembly stress and temperature change, and the stress interference caused by different working conditions, and maintain the geometric stability of the compensator in the optical system.

Description

Technical Field

[0001] This invention relates to the field of photolithography technology, and in particular to a method, system, medium, and program product for calculating parameters of a multi-condition compensator. Background Technology

[0002] As a core process in semiconductor manufacturing, photolithography directly affects the control of chip critical dimensions, imaging quality, and process yield due to the uniformity of its illumination system. Existing technologies mostly improve uniformity by adjusting the illuminance distribution by setting compensation devices (such as transmittance plates, mask homogenization elements, etc.) in the illumination optical path. However, these compensator design methods are mostly designed to optimize the illuminance distribution under a single operating condition. When process conditions or light source parameters change, the compensation effect will decrease significantly, making it difficult to meet the uniformity requirements under multiple operating conditions. Summary of the Invention

[0003] To address the aforementioned issues, this invention provides a method, system, medium, and program product for calculating parameters of a multi-condition compensator, thereby enabling the compensator to adapt and provide stable compensation under multiple conditions, significantly improving design efficiency and system imaging stability.

[0004] The first aspect discloses a method for calculating parameters of a multi-condition compensator, the method being applied to a photolithography illumination system, comprising:

[0005] Acquire illuminance data of the lithography illumination system under n preset operating conditions, where n is greater than or equal to 2, and different operating conditions represent different working states under changes in key process parameters of the lithography illumination system; perform continuous processing on the illuminance data under each operating condition to obtain the light intensity distribution of the imaging surface under each operating condition; calculate the required transmittance distribution under each operating condition based on the light intensity distribution of the compensation plane obtained by projecting the target light intensity distribution onto the light intensity distribution of the imaging surface; calculate the transmittance distribution of the compensator based on the transmittance distribution under the n operating conditions.

[0006] As one possible implementation, the method includes the following: the illuminance data includes measurement points and illuminance values ​​corresponding to each measurement point; the measurement point is the center point of a grid cell; the grid cell is obtained by dividing the light transmission plane of the compensator; the step of performing continuous processing on the illuminance data under any operating condition to obtain the light intensity distribution of the imaging surface under each operating condition includes: numerical reconstruction based on the illuminance value of each measurement point using a Kriging interpolation algorithm to obtain the continuous light intensity distribution of the imaging surface under each operating condition.

[0007] As one possible implementation, obtaining the required transmittance distribution under each operating condition based on the compensation plane light intensity distribution obtained by projecting the target light intensity distribution onto the light intensity distribution of the imaging surface includes:

[0008] The light intensity distribution of the imaging surface is projected onto the compensation plane to obtain the light intensity distribution of the compensation plane under each working condition; the ratio of the light intensity distribution of the compensation plane to the target light intensity distribution under each working condition is calculated; the ratio results are normalized to obtain the transmittance distribution under each working condition.

[0009] As one possible implementation, the step of projecting the light intensity distribution of the imaging surface onto the compensation plane to obtain the light intensity distribution of the compensation plane under various operating conditions includes: calculating the geometric scaling relationship of the light intensity projected from the imaging surface to the compensation plane based on the pupil radius of the compensation plane and the effective radius of the imaging surface under various operating conditions; and calculating the light intensity distribution of the compensation plane under various operating conditions based on the geometric scaling relationship.

[0010] As one possible implementation, the method further includes: calculating the transmittance distribution of the compensator based on the transmittance distribution under n operating conditions, which includes: obtaining the transmittance distribution of the compensator by taking the arithmetic mean of the transmittance distribution under n operating conditions.

[0011] As one possible implementation, the method further includes: calculating the number of light-blocking points in each grid unit based on the light transmittance distribution of the compensator; calculating the light-blocking point spacing of each grid unit based on the number of light-blocking points and the area of ​​the corresponding grid unit, and then using the number of light-blocking points and the light-blocking point spacing of each grid unit as parameters of the compensator for production.

[0012] As one possible implementation, the method further includes: collecting light intensity data of applying the transmittance distribution to the compensation plane and mapping it back to the imaging plane under various operating conditions; calculating whether the light intensity uniformity index under each operating condition meets the requirements based on the light intensity data; and if it does, using the transmittance distribution in the production of the compensator.

[0013] The second aspect discloses a photolithography illumination system, the system including a compensator 2, the transmittance distribution of the compensator 2 being obtained by the above-mentioned multi-condition compensator parameter calculation method, including: the compensator 2 being installed in the compensator base 1 through the compensator mounting groove 101 and being pressed and fixed by an elastic block 3, the elastic block 3 being installed in the elastic block mounting groove 102 through the countersunk screw mounting hole 301 and the elastic block mounting threaded hole 103, wherein the elastic block 3 includes a U-shaped groove 302, the U-shaped groove 302 being used to disperse the stress on the four corners of the compensator 2.

[0014] The third aspect discloses an electronic device including a processor and a memory, the memory storing a computer program that, when executed, implements the multi-condition compensator parameter calculation method disclosed in the first aspect or any possible implementation thereof.

[0015] The fourth aspect discloses a computer-readable storage medium storing a computer program or computer instructions that, when executed, implement the multi-condition compensator parameter calculation method disclosed in the first aspect or any possible implementation thereof.

[0016] The fifth aspect discloses a computer program product that, when run on a computer, causes the computer to execute the multi-condition compensator parameter calculation method disclosed in the first aspect or any possible implementation of the first aspect.

[0017] As can be seen from the above technical solutions, the embodiments of the present invention have the following advantages:

[0018] By collecting illuminance data under multiple operating conditions, and processing the illuminance data under each condition continuously, the light intensity distribution of the imaging surface under each condition is obtained. This reconstructs the discrete and sparse measurement data, ensuring the stability of the compensator's transmittance calculation and the comparability of light intensity mapped to a unified grid under multiple operating conditions. Furthermore, based on the light intensity distribution of the compensation plane obtained by projecting the target light intensity distribution onto the imaging surface, the required transmittance distribution under each operating condition is calculated. The transmittance distribution of the compensator is then calculated based on the transmittance distributions under n operating conditions, resulting in a comprehensive compensation transmittance distribution that considers all operating conditions. Unlike traditional single-condition compensation designs, this invention treats multiple operating conditions as coupled constraints, ensuring that the designed compensator maintains a high degree of uniformity improvement under different operating conditions. Moreover, this invention proposes using a clamping fixture assembly with elastic positioning blocks, which effectively reduces imaging errors caused by assembly stress and temperature changes, as well as stress interference under different operating conditions, maintaining the geometric stability of the compensator in the optical system. In addition, this invention establishes a direct correspondence between the output transmittance distribution matrix and the board manufacturing data, achieving seamless integration from design results to manufacturing processes. It enables unified adaptation through a single design under various working conditions, avoiding repeated design due to changing conditions. Attached Figure Description

[0019] Figure 1 The present invention provides a flowchart of a multi-condition compensator parameter calculation method.

[0020] Figure 2 The compensator structure diagram provided by the present invention.

[0021] Figure 3 This is an assembly diagram of the compensator provided by the present invention.

[0022] Figure 4 The diagram shows the structure of the elastic pressure block provided by this invention.

[0023] Figure 5 The light field illuminance distribution before and after compensation for condition 1.

[0024] Figure 6 The light field illuminance distribution before and after compensation for operating condition 2 is shown.

[0025] The components include: compensator base 1, compensator 2, elastic pressure block 3, compensator mounting groove 101, elastic pressure block mounting groove 102, elastic pressure block mounting threaded hole 103, countersunk screw mounting hole 301, and U-shaped groove 302. Detailed Implementation

[0026] To make the objectives, features, and advantages of the present invention more apparent and understandable, specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. While several embodiments of the present invention have been given herein, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. Rather, these embodiments are provided so that the disclosure of the present invention will be more thorough and complete.

[0027] The terms “first,” “second,” “third,” “fourth,” etc. (if present) in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a particular order or sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments described herein can be implemented in a sequence other than that illustrated or described herein. Furthermore, the terms “comprising” and “having,” and any variations thereof, are intended to cover a non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0028] In this invention, unless otherwise explicitly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal communication between two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances. The term "and / or" as used herein includes any and all combinations of one or more of the related listed items.

[0029] In advanced lithography manufacturing, the uniformity of illumination in the lighting system directly affects critical dimension control and yield. As process nodes advance, the illuminance distribution of the lithography machine often varies under different operating conditions. Insufficient uniformity can lead to imaging distortion, critical dimension drift, and even a decrease in yield. To address this, a common approach is to introduce a transmittance plate into the lithography illumination system to improve light intensity uniformity under a single operating condition. However, existing compensator designs are often optimized only for a specific operating condition. When light source conditions, mask characteristics, or process parameters change, their compensation effect rapidly diminishes, failing to meet the uniformity requirements under multiple operating conditions. This necessitates the redesign and fabrication of new compensators, which is both time-consuming and costly. Based on these shortcomings, this invention proposes a method for calculating compensator parameters in lithography illumination systems applicable to multiple operating conditions. By collaboratively optimizing data from multiple operating conditions, a unified transmittance distribution is generated, thereby achieving compensator adaptation and stable compensation under multiple operating conditions, significantly improving design efficiency and system imaging stability.

[0030] In one embodiment, the present invention provides a method for calculating parameters of a multi-condition compensator, such as... Figure 1 As shown, the specific steps include:

[0031] S101. Obtain illuminance data of the lithography illumination system under preset n operating conditions, wherein n is greater than or equal to 2, and different operating conditions represent different working states of the lithography illumination system under changes in key process parameters.

[0032] Specifically, different operating conditions refer to the different working states of the lithography illumination system under changes in key process parameters, including but not limited to changes in light source energy, changes in light source shape or distribution, changes in partial coherence factor σ, changes in mask optical properties, and changes in the light field caused by temperature drift of the projection lens. The preset n operating conditions can be understood as adjusting key process parameters to construct n different working states of the lithography illumination system based on actual and commonly used lithography process conditions in production; these n operating conditions constitute multiple operating conditions. n is any integer greater than 2, and the specific value of n can be determined according to actual production needs.

[0033] It should be explained that, under the same photolithography illumination system, the numerical aperture NA and the projection magnification M of the objective lens are different. po Parameters such as the axial distance Δz from the compensation surface to the imaging surface remain constant and can be directly used as the data required for calculations under various operating conditions. However, the different parameters corresponding to different operating conditions need to be measured under the current operating conditions. Furthermore, unified parameter files are constructed based on the system parameters and illuminance data corresponding to different operating conditions, serving as the data basis for subsequent transmittance distribution calculations.

[0034] S102. Perform continuous processing on the illuminance data under each working condition to obtain the light intensity distribution of the imaging surface under each working condition.

[0035] Specifically, the illuminance data includes measuring points and the corresponding illuminance values ​​for each measuring point. Measuring points can be selected using a regularized or irregular method. In one embodiment, the measuring point is the center point of a grid cell, and the grid cell is obtained by dividing the light-transmitting plane of the compensator. For example... Figure 2 As shown, photolithography illumination systems typically use square compensators, which are divided into grids according to requirements. X represents the width and Y represents the length.

[0036] Considering the efficiency of actual illuminance data measurement, a limited number of measuring points are generally selected to measure the corresponding illuminance values. The measuring points can be determined in a regular or irregular order. Optionally, the illuminance value of the center point of the grid cell can be measured, and the center coordinates (x, y) of each grid cell are the measuring point coordinates (x, y).

[0037] However, discrete and sparse measurement data cannot meet the stability requirements of the compensator transmittance solution, nor can they ensure the comparability of light intensity mapped to a unified grid under multiple operating conditions. Therefore, it is necessary to numerically reconstruct the discrete measurement point data under each operating condition, transforming the illuminance data into a continuous light intensity distribution on a regular grid. Specific data reconstruction algorithms can employ existing technologies, and this invention does not impose any specific limitations.

[0038] In a preferred embodiment, the illuminance value at each measuring point is numerically reconstructed using the Kriging interpolation algorithm to obtain the continuous light intensity distribution under the corresponding grid cell. The Kriging interpolation method enables optimal linear unbiased estimation of the light field distribution under sparse measuring point illuminance data conditions, effectively reducing the impact of measurement noise on the interpolation results and obtaining a two-dimensional light intensity distribution with higher accuracy and better continuity. This method can better preserve the local characteristics of the light intensity distribution, which is beneficial to improving the stability of the compensator transmittance solution and ensuring the comparability of light intensity mapped to a unified grid under multiple operating conditions. Its application significantly enhances the reliability and robustness of light field reconstruction during compensator design, providing key technical support for improving the compensation effect and the consistency of transmittance distribution under multiple operating conditions.

[0039] Specifically, the Kriging interpolation formula for discrete measurement point data under a single operating condition is as follows:

[0040] (1)

[0041] Where (u,v) are uniform grid coordinates, and I[·] denotes the Kriging interpolation operator. For discrete measurement point data, the subscript G indicates the Kriging model used for interpolation calculation. Based on the above algorithm, illuminance data can be predicted and reconstructed, making the discrete data continuous, thereby obtaining relatively continuous illuminance data under a unified grid coordinate system. This standardizes the original measurement data into a comparable and computable two-dimensional light intensity field, ensuring the comparability of light intensity mapped to a unified grid under multiple operating conditions, and meeting the stability requirements for compensator transmittance calculation.

[0042] S103. Calculate the required transmittance distribution under each working condition based on the compensation plane light intensity distribution obtained by projecting the target light intensity distribution onto the light intensity distribution of the imaging surface.

[0043] Specifically, the light intensity distribution of the imaging surface is projected onto the compensation plane to obtain the light intensity distribution of the compensation plane under various operating conditions.

[0044] First, the geometric scaling relationship of light intensity projected from the imaging plane to the compensation plane is calculated based on the pupil radius of the compensation plane and the effective radius of the imaging plane under various operating conditions. Specifically, this is achieved through the following method:

[0045] The formula for calculating the radius of the compensation plane pupil is:

[0046] (2)

[0047] Where Δz is the axial distance between the compensation plane and the imaging plane (also called the mask plane), and Θ k Let be the aperture half-angle for each operating condition. Let k represent the k-th operating condition, where k belongs to [1, n]. The radius of the pupil, This represents the pupil radius under the k-th operating condition.

[0048] Optionally, the formula for calculating the aperture half-angle for each operating condition is as follows:

[0049] (3)

[0050] Where NA is the numerical aperture of the objective lens, and M... po σ is the projection magnification of the objective lens. k This represents the partial coherence factor of the light source.

[0051] Optionally, the light intensity of the imaging surface (mask surface) can be adjusted. Project onto the compensation plane to satisfy the geometric scaling relationship:

[0052] (4)

[0053] Among them, R img Let r be the effective radius of the imaging surface, and r represent any grid cell. , Represents the coordinates of a grid cell.

[0054] Furthermore, based on the principle of energy conservation, the compensation plane light intensity distribution can be calculated as follows:

[0055] (5)

[0056] This yields the compensation plane light intensity distribution corresponding to each operating condition. .

[0057] Furthermore, after obtaining the light intensity distribution of the compensation plane, the ratio of the light intensity distribution of the compensation plane to the target light intensity distribution under each working condition is calculated; then the ratio results are normalized to ensure that the transmittance is within a reasonable range of 0 and 1, and finally the transmittance distribution under each working condition is obtained.

[0058] In one example, the formula for calculating the local transmittance of each grid cell r under a single operating condition is:

[0059] (6)

[0060] in, To compensate for the actual light intensity on the surface, To compensate for the ideal light intensity on the surface.

[0061] It needs to be explained that the target light intensity distribution is a distribution matrix composed of the ideal light intensity of each grid cell corresponding to the compensation surface. The target light intensity distribution is the ideal light intensity distribution illuminating the compensation plane. It can be understood that the light intensity distribution mapped back to the imaging surface or mask surface based on the target light intensity distribution meets the uniformity requirement.

[0062] In one example, the normalized transmittance calculation formula for each operating condition is as follows:

[0063] (7)

[0064] The aforementioned normalized transmittance t(r) is expressed in the grid cell A corresponding to the initial measurement point (x,y). ij If we take the area average, the transmittance per unit area is:

[0065] (8)

[0066] Among them, A cell For grid cell A ij The area is then determined. The transmittance distribution matrix for each operating condition can be obtained through the above steps.

[0067] S104. The transmittance distribution of the compensator is calculated based on the transmittance distribution under n working conditions.

[0068] The normalized transmittance distributions under all operating conditions are synthesized by arithmetic mean to obtain a final transmittance distribution that takes into account different operating conditions, so that the compensator can function under multiple operating conditions.

[0069] In one example, optionally, the formula for calculating the arithmetic mean of the multi-condition normalized transmittance distribution is:

[0070] (9)

[0071] Where n is the total number of working conditions, and k represents a certain working condition.

[0072] The arithmetic mean of the normalized transmittance distribution for all operating conditions is calculated to obtain a final transmittance distribution that takes into account different operating conditions. The arithmetic mean can achieve equal weighting for each operating condition while maintaining the continuity and optical stability of the final transmittance distribution. At the same time, this method does not require additional weighting parameters, is simple and reliable to calculate, and is suitable for automated design processes of uniformity compensation for multiple operating conditions, thereby significantly improving the stability, adaptability, and engineering feasibility of uniformity compensator design.

[0073] Furthermore, to verify the effectiveness of the transmittance distribution calculated by the above method, the calculation results are validated. Specifically, this includes:

[0074] Under various working conditions, light intensity data is collected by applying the transmittance distribution to the light intensity of the compensation plane and mapping it back to the imaging plane.

[0075] Based on the light intensity data, calculate whether the light intensity uniformity index under each working condition meets the requirements;

[0076] The light intensity uniformity index is obtained by the difference method, and the calculation formula is as follows:

[0077] (10)

[0078] in, and These represent the maximum and minimum light intensity, respectively. This is an index of light intensity uniformity.

[0079] If satisfied, the transmittance distribution will be used in the production of the compensator.

[0080] If not, return to the steps above to check whether the data in each working condition parameter file is correct, and check whether the forward and reverse mapping relationship between the imaging surface or mask surface and the compensation plane is consistent. By correcting each parameter under each working condition, ensure that the transmittance distribution obtained by recalculation meets the uniformity requirement.

[0081] Furthermore, to meet the requirements of compensator production parameters, in another embodiment, the method further includes:

[0082] S201. Calculate the number of light-blocking points in each grid cell based on the light transmittance distribution of the compensator.

[0083] S202. The spacing between the light-blocking points of each grid cell is calculated based on the number of light-blocking points and the area of ​​the corresponding grid cell. Here, a light-blocking point is a local shading unit arranged on the compensator to reduce the transmittance of the corresponding area.

[0084] In one embodiment, the number of light-blocking points is determined by the transmittance of the grid cells, and the calculation formula is as follows:

[0085] (11)

[0086] Where, N blk (r) represents the number of light-blocking points within grid cell r, N max () represents the maximum number of light-blocking points that this grid cell can accommodate.

[0087] Furthermore, the formula for calculating the spacing between light-blocking points is as follows:

[0088] (12)

[0089] Among them, A cell This represents the area of ​​each grid cell. Based on the number and spacing of light-blocking points corresponding to each grid cell, a PCB fabrication file suitable for the manufacturing process is generated, serving as the specific parameters for the compensator during production.

[0090] Therefore, this invention collects illuminance distribution data under multiple operating conditions and processes it within a unified computational framework. It then utilizes a multi-condition collaborative optimization algorithm to calculate a compensated transmittance distribution that considers all operating conditions. Unlike traditional single-condition compensation designs, this invention treats multiple operating conditions as coupled constraints and solves them iteratively, ensuring that the designed compensator maintains a high degree of uniformity improvement under different operating conditions. Simultaneously, it establishes a direct correspondence between the output transmittance distribution matrix and the board manufacturing data, achieving seamless integration from design results to the manufacturing process. This invention enables unified adaptation under multiple operating conditions through a single design, avoiding repeated design due to changing conditions.

[0091] In another embodiment, the existing rigid clamping method of the compensator is prone to generating assembly and thermal expansion stress under different operating conditions, causing micro-deformation and thus affecting the compensation effect and system imaging stability. In order to further ensure the stability of the compensation function of the compensator with the same transmittance distribution obtained according to the above method under different operating conditions, the present invention discloses a photolithography illumination system, which includes a compensator 2. The transmittance distribution of the compensator 2 is obtained by any of the multi-condition compensator parameter calculation method embodiments described above.

[0092] To ensure the stability of the compensator performance obtained by the above method under various working conditions, this application further improves the clamping tooling assembly of the compensator.

[0093] Specifically, such as Figure 3 , Figure 4 As shown, the compensator 2 is installed in the compensator base 1 through the compensator mounting groove 101 and is pressed and fixed by the elastic pressure block 3. The elastic pressure block 3 is installed in the elastic pressure block mounting groove 102 through the elastic pressure block mounting thread hole 103. Further, the elastic pressure block 3 includes a U-shaped groove 302, which is used to distribute the stress on the four corners of the compensator 2. There are multiple elastic pressure blocks 3. Optionally, eight elastic pressure blocks 3 are evenly arranged around the rectangular light-transmitting window of the compensator base 1.

[0094] The clamping fixture assembly includes: a compensator base 1 with a rectangular light-transmitting window at its center and a compensator mounting groove 101. Optionally, the compensator mounting groove 101 has four rounded grooves at its four corners to accommodate the four corners of the compensator 2, avoiding localized stress concentration at sharp corners and reducing micro-deformation caused by mechanical assembly. Figure 4 As shown, the elastic pressure block 3 is installed in the elastic pressure block mounting groove 102 through the countersunk screw mounting hole 301. The side of the elastic pressure block 3 facing the compensator 2 is provided with a U-shaped groove 302 structure, which is used to disperse the stress on the four corners of the compensator 2. It can absorb the dimensional changes and some assembly stress caused by temperature changes under temperature fluctuations or mechanical disturbances, and ensure that the compensator maintains the design state in the optical system for a long time.

[0095] This invention proposes a clamping fixture assembly with elastic positioning blocks, which can effectively reduce imaging errors caused by assembly stress and temperature changes, as well as stress interference caused by different working conditions, and maintain the geometric stability of the compensator 2 in the optical system.

[0096] To further illustrate the beneficial effects achieved by the present invention, engineering experiments were conducted to verify the photolithography illumination system obtained according to the method and system of the present invention. The results are as follows: Figure 5 , Figure 6 As shown, under operating condition 1, the non-uniformity of illuminance distribution before compensation was 7.61%, and the non-uniformity after compensation was 0.27%. Under operating condition 2, the non-uniformity of illuminance distribution before compensation was 6.31%, and the non-uniformity after compensation was 0.27%. This demonstrates that the compensation significantly improves the uniformity of illuminance distribution under both operating conditions. These results indicate that the method and system proposed in this invention enable the designed compensator to maintain a high level of uniformity improvement under different operating conditions.

[0097] This application also provides an electronic device, which includes a processor and a memory. The memory stores at least one instruction or at least one program, which is loaded and executed by the processor using the multi-condition compensator parameter calculation method provided in the above-described method embodiments.

[0098] Furthermore, an electronic device is provided for implementing the method provided in the embodiments of this application. This device can participate in constituting or including the apparatus or system provided in the embodiments of this application. The electronic device may include one or more processors (processors may include, but are not limited to, processing devices such as microprocessors (MCUs) or programmable logic devices (FPGAs), a memory for storing data, and a transmission device for communication functions. In addition, it may also include: a display, an input / output interface (I / O interface), a universal serial bus (USB) port (which may be included as one of the ports of the I / O interface), a network interface, a power supply, and / or a camera.

[0099] It should be noted that the aforementioned one or more processors and / or other data processing circuits are generally referred to herein as "data processing circuits". These data processing circuits can be implemented wholly or partially as software, hardware, firmware, or any other combination. Furthermore, the data processing circuits can be a single, independent processing module, or wholly or partially integrated into any other element within a device (or mobile device). As involved in the embodiments of this application, the data processing circuit serves as a processor control mechanism (e.g., selection of a variable resistor termination path connected to an interface).

[0100] The memory can be used to store software programs and modules of application software, such as the program instructions / data storage device corresponding to the method described in the embodiments of this application. The processor executes various functional applications and data processing by running the software programs and modules stored in the memory, thereby realizing the above-mentioned data processing method. The memory may include high-speed random access memory, and may also include non-volatile memory, such as one or more magnetic storage devices, flash memory, or other non-volatile solid-state memory. In some instances, the memory may further include memory remotely located relative to the processor, and these remote memories can be connected to electronic devices via a network. Examples of the above-mentioned networks include, but are not limited to, the Internet, corporate intranets, local area networks, mobile communication networks, and combinations thereof.

[0101] The transmission device is used to receive or send data via a network. Specific examples of the network described above may include a wireless network provided by the device's communication provider. In one example, the transmission device includes a Network Interface Controller (NIC), which can connect to other network devices via a base station to communicate with the Internet. In another example, the transmission device may be a Radio Frequency (RF) module, used for wireless communication with the Internet.

[0102] The display can be, for example, a touchscreen liquid crystal display (LCD), which allows users to interact with the user interface of an electronic device (or mobile device).

[0103] This application also provides a computer storage medium storing at least one instruction or at least one program, which is loaded and executed by a processor to implement the multi-condition compensator parameter calculation method provided in the above method embodiments.

[0104] Optionally, in this embodiment, the aforementioned computer storage medium may be located at at least one of the multiple network servers in a computer network. Optionally, in this embodiment, the aforementioned storage medium may include, but is not limited to, various media capable of storing program code, such as USB flash drives, read-only memory (ROM), random access memory (RAM), portable hard drives, magnetic disks, or optical disks.

[0105] This application also provides a computer program product or computer program, which includes computer instructions stored in a computer storage medium. The processor of an electronic device reads the computer instructions from the computer storage medium and executes the computer instructions, causing the electronic device to perform the multi-condition compensator parameter calculation method provided in the above-described method embodiments.

[0106] It should be noted that the order of the embodiments described above is merely for descriptive purposes and does not represent the superiority or inferiority of the embodiments. Furthermore, specific embodiments have been described above. Other embodiments are within the scope of the appended claims. In some cases, the actions or steps described in the claims can be performed in a different order than that shown in the embodiments and still achieve the desired result. Additionally, the processes depicted in the drawings do not necessarily require a specific or sequential order to achieve the desired result. In some embodiments, multitasking and parallel processing are also possible or may be advantageous.

[0107] It should be understood that the above description of the preferred embodiments is quite detailed, but it should not be considered as a limitation on the scope of protection of this invention. Those skilled in the art, under the guidance of this invention, can make substitutions or modifications without departing from the scope of protection of the claims of this invention, and all such substitutions or modifications fall within the scope of protection of this invention. The scope of protection of this invention should be determined by the appended claims.

Claims

1. A method of calculating parameters of a multi-condition compensator, the method being applied to a lithographic illumination system, characterized in that, The method includes: Acquire illuminance data of the lithography illumination system under n preset operating conditions, where n is greater than or equal to 2, and different operating conditions represent different working states of the lithography illumination system under changes in key process parameters; The illuminance data under each working condition were processed into a continuous data set to obtain the light intensity distribution of the imaging surface under each working condition. Based on the compensation plane light intensity distribution obtained by projecting the target light intensity distribution onto the light intensity distribution of the imaging surface, calculate the required transmittance distribution under each working condition. The transmittance distribution of the compensator is calculated based on the transmittance distribution under n operating conditions, wherein the calculation of the transmittance distribution of the compensator based on the transmittance distribution under n operating conditions includes: obtaining the transmittance distribution of the compensator by taking the arithmetic mean of the transmittance distribution under n operating conditions.

2. The method of claim 1, wherein, The illuminance data includes measurement points and corresponding illuminance values ​​for each measurement point. Each measurement point is the center point of a grid cell, and the grid cell is obtained by dividing the light-transmitting plane of the compensator. The illuminance data under each operating condition is processed continuously to obtain the light intensity distribution of the imaging surface under each operating condition, including: Numerical reconstruction is performed using the Kriging interpolation algorithm based on the illuminance value at each measurement point to obtain the continuous light intensity distribution of the imaging surface under each working condition.

3. The method of claim 1, wherein, The process of obtaining the required transmittance distribution under each operating condition by projecting the target light intensity distribution onto the light intensity distribution of the imaging surface, and then using the compensation plane light intensity distribution, includes: The light intensity distribution of the imaging surface is projected onto the compensation plane to obtain the light intensity distribution of the compensation plane under various working conditions. Calculate the ratio of the compensation plane light intensity distribution to the target light intensity distribution under each working condition; The ratio results were normalized to obtain the transmittance distribution under each operating condition.

4. The method of claim 3, wherein, The step of projecting the light intensity distribution of the imaging surface onto the compensation plane to obtain the light intensity distribution of the compensation plane under various operating conditions includes: The geometric scaling relationship of light intensity projected from the imaging plane to the compensation plane is calculated based on the pupil radius of the compensation plane and the effective radius of the imaging plane under various working conditions. The compensation plane light intensity distribution under each working condition is calculated based on the geometric scaling relationship.

5. The method according to claim 1, characterized in that, The method further includes: The number of light-blocking points in each grid cell is calculated based on the light transmittance distribution of the compensator. The spacing between the light-blocking points of each grid cell is calculated based on the number of light-blocking points and the area of ​​the corresponding grid cell. Then, a board manufacturing file adapted to the processing technology is generated based on the number of light-blocking points and the spacing between the light-blocking points of each grid cell, which serves as the specific parameters for the compensator during production.

6. The method according to claim 1, characterized in that, The method further includes: Under various working conditions, light intensity data is collected by applying the transmittance distribution to the light intensity of the compensation plane and mapping it back to the imaging plane. Based on the light intensity data, calculate whether the light intensity uniformity index under each working condition meets the requirements; If satisfied, the transmittance distribution will be used in the production of the compensator.

7. A photolithography illumination system, the system comprising a compensator (2), the transmittance distribution of the compensator (2) being obtained by any one of claims 1-6, characterized in that, include: The compensator (2) is installed in the compensator base (1) through the compensator mounting groove (101) and is pressed and fixed by the elastic pressure block (3). The elastic pressure block (3) is installed in the elastic pressure block mounting groove (102) through the countersunk screw mounting hole (301) and the elastic pressure block mounting threaded hole (103). The elastic pressure block (3) includes a U-shaped groove (302), which is used to disperse the stress on the four corners of the compensator (2).

8. A computer device, characterized in that, The computer device includes a processor and a memory, the memory storing a computer program that is loaded and executed by the processor to implement the method as claimed in any one of claims 1 to 6.

9. A computer-readable storage medium, characterized in that, The computer-readable storage medium stores a computer program, which is loaded and executed by a processor to implement the method as described in any one of claims 1 to 6.

10. A computer program product, characterized in that, The computer program product includes a computer program stored in a computer-readable storage medium, which a processor reads from and executes to implement the method as described in any one of claims 1 to 6.

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