Skin cleaning device

Abstract

The invention discloses a skin cleaning device, and relates to the technical field of skin cleaning devices. Comprising an input assembly and an output assembly, the input assembly is connected with the output assembly through an air pipe, the input assembly is composed of a power source, at least one air source, a control valve and a controller, the power source is connected with the controller, and an input section of the air pipe is connected with the air source and the control valve through the controller; the output assembly is composed of at least one transformer, a PCB and at least two resistors, one ends of the two resistors are connected with the transformer respectively, the other ends of the two resistors are connected with the output end of the air pipe respectively, and the PCB is connected with the transformer. Compared with a traditional mode of exciting plasma through high-voltage disruptive discharge between electrodes, the structure realizes plasma excitation and physical separation of energy transfer and a thermal control process through a unipolar constant-resistance excitation and parallel airflow export mode; and a series of problems which influence the stability and the user experience, such as arc sound, electromagnetic radiation interference, transient high voltage instability, ozone accumulation and heat concentration ablation, caused by a traditional high-voltage discharge structure, are avoided.

Description

Technical Field

[0001] This invention relates to the field of skin cleaning device technology, specifically to a skin cleaning device. Background Technology

[0002] Plasma skin cleansing devices are instruments that use low-temperature plasma to act on the skin's surface and pores to achieve cleansing, sterilization, anti-inflammation, and repair. These devices typically generate plasma by electrically exciting air or other gases, which contains particles such as free electrons, negative ions, and reactive oxygen species (ROS). These particles can disrupt microbial structures, promote sebum emulsification, and activate skin metabolism processes, making them widely used in facial cleansing, beauty care, and skin treatments.

[0003] In existing technologies, plasma is often excited using a dual-electrode discharge structure. This involves applying a high-voltage pulsed electric field between two electrodes, causing air or inert gas to break down in the electrode gap, thus forming a transient discharge channel and exciting the plasma. While this type of structure has high plasma generation efficiency, it also has several significant drawbacks: First, the discharge process is accompanied by noticeable arcing and discharge noise, affecting user comfort; second, the high-voltage pulsed electric field easily induces electromagnetic interference, leading to crosstalk between devices and decreased system stability; third, the high local energy density in the discharge region easily causes hot spot ablation or burning sensations on the skin; furthermore, the plasma particle release position is highly coupled with the energy input position in this structure, resulting in a lack of controllability in the spatial distribution and output direction of the plasma, and it is also prone to accumulating byproducts such as ozone at the output end, increasing the risk of respiratory and eye irritation.

[0004] Therefore, how to achieve a plasma output structure that does not require electrode sheet breakdown discharge, avoids high voltage interference, and reduces noise, ozone, and heat concentration risks is a technical problem that urgently needs to be solved in this field. Summary of the Invention

[0005] The purpose of this application is to provide a technical solution to address the problems mentioned in the background section.

[0006] To achieve the above objectives, this application provides the following technical solution:

[0007] A skin cleansing device includes an input component and an output component. The input component is connected to the output component via an air tube. The input component consists of a power supply, at least one air source, a control valve, and a controller. The power supply is connected to the controller. The input section of the air tube is connected to the air source and the control valve respectively via the controller.

[0008] The output component consists of at least one transformer, a PCB, and at least two resistors. One end of each of the two resistors is connected to the transformer, and the other end is connected to the output end of the air tube. The PCB is connected to the transformer.

[0009] Preferably, it also includes a chassis, in which the input component is mounted.

[0010] Preferably, the bottom of the chassis is also provided with several casters.

[0011] Preferably, a touch screen is also provided at any point in the chassis, and the touch screen is electrically connected to the input component and the output component.

[0012] Preferably, the controller is a flow controller.

[0013] Preferably, the gas source consists of a gas cylinder and a gas to be ionized contained in the gas cylinder.

[0014] Preferably, the gas to be ionized is any one or more of helium, argon, and nitrogen.

[0015] Preferably, the gas to be ionized is argon.

[0016] Preferably, it also includes a handle, and the output component is mounted in the handle.

[0017] Preferably, the system also includes an MCU connected to the controller.

[0018] In summary, the technical effects and advantages of this invention are as follows:

[0019] This solution requires only two resistors driven by a low-frequency steady-state voltage output from a transformer under PCB control, forming a stable resistor heating zone and a local electrostatic field. Relying on the superposition of Joule heating and electric field, gas molecules near the outlet of the trachea are weakly ionized to form plasma under non-breakdown discharge conditions. The ionization reaction does not depend on instantaneous high voltage or pulse frequency, and there is no spark discharge process. At the same time, the gas source in the input component provides a continuous low-speed compressed airflow under the flow regulation of the controller and control valve, so that the active particles are directly delivered to the target area for skin action after generation. Compared with the traditional method of high-voltage breakdown discharge between electrodes to excite plasma, this structure achieves physical separation of plasma excitation, energy transfer and thermal control processes through unipolar constant resistance excitation and parallel airflow output mode. This avoids a series of problems that affect stability and user experience caused by traditional high-voltage discharge structures, such as arc noise, electromagnetic radiation interference, transient high voltage instability, ozone accumulation and thermal concentration ablation.

[0020] Furthermore, in the excitation structure of this solution, only two resistors are needed to achieve energy conversion and local electric field formation, without involving inter-electrode discharge behavior. Therefore, there is no need to set up electrode plates for discharge, nor is it necessary to equip the resistors with structural components for maintaining a stable gap between the electrode plates, insulating layers for the electrode plates to withstand high-voltage pulses, shielding components for suppressing high-voltage interference on the electrode plates, or high-voltage drive circuits that match the discharge terminals of the electrode plates. Therefore, the two resistors in this solution can be directly mounted on the PCB as standard electronic components and operate under existing control circuits. While solving the problems raised in the background technology, it also significantly reduces the manufacturing cost. Attached Figure Description

[0021] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 This is a perspective view of the entire machine of the present invention.

[0023] Figure 2 This is a first-view perspective perspective view of the internal structure of the present invention.

[0024] Figure 3 This is a second-view perspective perspective view of the internal structure of the present invention.

[0025] Figure 4 This is a third-view perspective view of the internal structure of the present invention.

[0026] Figure 5 This is an enlarged perspective view of the output component of the present invention.

[0027] In the diagram: Input component 1, power supply 11, air source 12, control valve 13, controller 14, output component 2, transformer 21, PCB 22, resistor 23, air pipe 3, input section 31, output end 32, chassis 4, pulley 5, touch screen 6, handle 7. Detailed Implementation

[0028] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0029] A skin cleaning device includes an input component 1 and an output component 2. The input component 1 is connected to the output component 2 via an air tube 3. The input component 1 consists of a power supply 11, at least one air source 12, a control valve 13, and a controller 14. The power supply 11 is connected to the controller 14. The input section 31 of the air tube 3 is connected to the air source 12 and the control valve 13 respectively via the controller 14.

[0030] The output component 2 consists of at least one transformer 21, a PCB 22, and at least two resistors 23. One end of each of the two resistors 23 is connected to the transformer 21, and the other end is connected to the output terminal 32 of the air pipe 3. The PCB 22 is connected to the transformer 21.

[0031] Working Principle: This solution continuously supplies power to the controller 14 via the power supply 11 in the input component 1. The controller 14 controls the gas source 12 to release high-frequency gas and precisely adjusts the on / off frequency and flow rate of the control valve 13 to achieve rhythmic driving of the compressed gas. The gas is guided and transmitted to the output component 2 via the input section 31 of the air pipe 3. During this process, the PCB 22 in the output component 2 acts as a signal processing and control unit, providing drive signals and voltage stabilization logic to the transformer 21. This allows the transformer 21 to convert the input electrical energy into a high-frequency or pulse voltage suitable for plasma excitation and transmit this electrical energy to at least two resistors 23. One end of the resistor 23 is connected to the transformer 21 and heats up rapidly after receiving current, while a high electric field region is locally formed on the surface of the resistor. The other end is connected to the output end 32 of the air pipe 3 to directly act on the high-speed airflow, causing the compressed gas to generate heat under the heating and electro-excitation effect of the resistor 23. Transient ionization and energy level transitions generate a low-temperature plasma gas flow carrying high-energy electrons, free radicals, ozone, negative ions, and other active particles. This gas flow is ejected from the output port 32 and directly acts on the target area of ​​the skin. While the high-speed air pressure removes dirt and keratin from the skin surface, the active particles released by the plasma penetrate deep into the pores to destroy the bacterial cell wall structure, activate local microcirculation of skin cells, promote collagen synthesis and wound healing. Ultimately, it achieves a complex effect of physical impact cleaning, plasma sterilization and anti-inflammation, and tissue repair promotion through the synergistic completion of multiple sub-modules in input component 1 and output component 2. This improves the removal efficiency of dirt and oil on the skin surface, the inhibition of bacteria and mites and other microorganisms, pore permeability and keratin metabolism rate, and significantly enhances the skin's local self-repair ability and collagen production activity, thereby improving the overall skin purification level, radiance and barrier function stability.

[0032] The structure of this solution isolates the airflow channel from the plasma excitation area and uses a combination of low-temperature plasma and constant-pressure airflow to effectively avoid the burning and stinging sensations that occur when traditional heat energy or high-voltage electric shocks are applied to the skin. This ensures that while achieving deep cleansing and bioactive stimulation, it maintains good comfort and user experience, making it suitable for sensitive skin and long-term use scenarios.

[0033] This solution optimizes the electroexcitation parameters of resistor 23 and controls the output waveform of transformer 21 during plasma generation, thereby limiting the amount of ozone byproducts generated. It also works in conjunction with the constant airflow provided by gas source 12 to rapidly dilute and guide the output gas, effectively suppressing the accumulation and release of ozone at the output port 32 of gas tube 3. This avoids the strong, irritating ozone odor common in traditional plasma devices, further enhancing the safety and comfort of the device in enclosed environments or when used at close range to the face.

[0034] The two resistors 23 in this scheme can adopt a constant resistance non-pulse power supply mode. A stable drive signal is output from PCB 22, and the input electrical energy is converted into low-frequency, low-amplitude DC power by transformer 21 before being delivered to resistor 23. This avoids the noise problems such as "pops," "high-voltage howls," and sharp arc sounds caused by the use of high-voltage pulse power supplies or periodic breakdown discharges in traditional plasma devices. Furthermore, the material of resistor 23 is selected as a resistive element with high heat capacity and low inductance. When powered on, it achieves plasma excitation by heating through stable resistance, without the need for spark discharge or high-voltage oscillation. Therefore, there is no vibration during the excitation process. The device produces a smooth, continuous sound without intermittent electric sparks or harmonic noise caused by energy abrupt changes between the transformer 21 and the load. Since the entire output path is driven by the thermal excitation and electric field primarily by the resistor 23, and does not involve the discharge structure between electrodes, it significantly suppresses the high-voltage electromagnetic sound source while achieving plasma output. Combined with the stable airflow channel provided by the gas source 12, a thermally stable and sound-quiet composite airflow ejection process is finally achieved at the output end 32 of the air tube 3. This results in multiple noise reduction effects throughout the entire operation of the device, including no pulse electric shock sound, no transformer humming sound, and no airflow whistling sound. It is especially suitable for scenarios requiring quiet operation, such as those involving the face or ears.

[0035] In summary, the two resistors 23 in this scheme are driven by the low-frequency steady-state voltage output from the transformer 21 under the control of the PCB 22, forming a stable resistor heating area and a local electrostatic field. Relying on the superposition of Joule heating and electric field, the gas molecules near the output end 32 of the gas tube 3 generate weak ionization to form plasma under non-breakdown discharge conditions. The ionization reaction does not depend on instantaneous high voltage or pulse frequency, and there is no spark discharge process. At the same time, the gas source 12 in the input component 1 provides a continuous low-speed compressed airflow under the flow regulation of the controller 14 and the control valve 13, so that the active particles are directly delivered to the target area for skin action after generation. Compared with the traditional method of high-voltage breakdown discharge between electrodes to excite plasma, this structure achieves physical separation of plasma excitation, energy transfer and thermal control processes through unipolar constant resistance excitation and parallel airflow output mode. This avoids a series of problems that affect stability and user experience caused by traditional high-voltage discharge structures, such as arc noise, electromagnetic radiation interference, transient high voltage instability, ozone accumulation and thermal concentration ablation.

[0036] Preferably, the device also includes a chassis 4, the input component 1 is installed inside the chassis 4, and the bottom of the chassis 4 is provided with several casters 5. The input component 1 is installed inside the chassis 4. The centralized arrangement improves the integration and protection of the overall structure, and the casters 5 at the bottom of the chassis 4 enable the device to move smoothly and be deployed quickly in different locations, improving the flexibility and portability of the device.

[0037] Preferably, a touch screen 6 is also provided at any point in the chassis 4. The touch screen 6 is electrically connected to the input component 1 and the output component 2. The touch screen 6 is provided at any point in the chassis 4 and is electrically connected to the input component 1 and the output component 2. This enables centralized visual operation and parameter adjustment of functions such as gas source control, voltage output, and mode switching, thereby improving the human-machine interaction and operation accuracy of the whole machine.

[0038] Preferably, the controller 14 is a flow controller, used to precisely adjust the gas flow rate output from the gas source 12 to the gas pipe 3, thereby realizing dynamic control of plasma excitation conditions and gas flow transport intensity, and improving the adaptability and stability of the cleaning process.

[0039] Preferably, the gas source 12 consists of a gas cylinder and a gas to be ionized contained in the gas cylinder, by providing a specific type of gas.

[0040] Preferably, the gas to be ionized is composed of any one or more of helium, argon, and nitrogen. Helium, due to its low ionization potential and high thermal conductivity, can efficiently maintain a stable low-temperature plasma sheath structure under the low-temperature constant-pressure electro-excitation conditions of this scheme, and can be used for non-irritating cleaning and sensitive area treatment. In contrast, the ionization process of helium in traditional structures is unstable due to instantaneous arc discharge, resulting in low energy utilization. Argon, as an inert gas, can uniformly form metastable Ar⁺ ions and excited Ar* neutral particles at the outlet under the resistive non-breakdown excitation mode of this scheme. This not only improves the surface energy cleaning effect, but also avoids the generation of ozone byproducts due to the absence of pulsed sparks during the ionization process. This is superior to the argon flash arc and ozone enrichment problems commonly found in electrode discharge schemes. In this scheme, nitrogen, due to its mild excitation method and controllable field strength, can selectively generate nitrogen-containing active particles such as NO• and N2⁺, achieving antibacterial, anti-inflammatory, and vasodilatory functions. This is different from the defect of nitrogen under high-voltage discharge, which easily causes high-temperature side reactions and leads to skin irritation.

[0041] Preferably, the gas to be ionized is argon. In this scheme, since resistor 23, under the control of PCB 22, is driven by the low-frequency steady-state voltage provided by transformer 21 to form a constant Joule heat and a local electrostatic field, a high-voltage, high-voltage pulsed electrode discharge excitation mechanism is not used. Instead, the argon molecules in the vicinity of the output end 32 of gas tube 3 undergo metastable excitation and weak ionization reaction under low-energy conditions by the superposition of constant resistance electrothermal and electrostatic fields. As a typical monatomic inert gas, argon has a stable outer electron structure and is not prone to excessive chemical reactions under normal energy input. Its ionization threshold (15.76 eV) is low, making it particularly suitable for the stable, low-interference, and non-impact electric field environment provided by this structure. Near the surface of resistor 23, under the dual excitation of thermal energy and electric field, argon mainly undergoes the following ionization and excitation reactions:

[0042] Ar(g) + e - (Slow electrons) →

[0043] Ar* (Excited State)

[0044] Ar* + e - → Ar + + 2e -

[0045] Ar + + e - → Ar(g) + hν (photorecombination)

[0046] Ar* + Ar → Ar2* (two-body excited state)

[0047] Ar2* → 2Ar + hν (Near-ultraviolet luminescence)

[0048] Among them, Ar (argon excited state) and Ar+ Argon ions constitute the main plasma component output by this scheme. They possess high surface energy, are non-corrosive chemically, and do not form free radical oxidation chain reactions when applied to the skin. Simultaneously, the released hν (near-ultraviolet photons) have weak bactericidal and dermal stimulating functions, gently activating local skin metabolism. Because this structure's heating region and gas source 12 drive path are independent, argon gas can be immediately discharged to the output end 32 of the gas pipe 3 after the ionization reaction is completed, significantly reducing the Argon gas's emission rate. + The energy waste and particle decay caused by the complex reaction are mitigated, thus maintaining a stable plasma particle density. Furthermore, argon plasma is a non-thermal equilibrium plasma, i.e., Te... Tgas (high electron temperature, low gas temperature) can achieve electron-driven reactions without significant burning sensation on the skin, making it particularly suitable for long-term, low-irritation effects in resistance thermostatic excitation structures.

[0049] Compared to traditional high-voltage electrode discharge devices, where argon ionization often occurs in localized areas between electrodes, easily leading to arc flashes, ozone byproducts, and high-temperature focusing, this solution utilizes a unipolar constant resistance + weak field excitation mechanism. This results in a wider particle excitation distribution range, lower ion energy states, and smoother temperature control. Furthermore, the absence of instantaneous high voltage avoids electrode ablation and electromagnetic interference, making it more suitable for safe care of sensitive areas such as the face, around the eyes, and behind the ears. Therefore, argon is the preferred ionization gas in this solution. It not only exhibits higher plasma stability and biocompatibility under resistance 23 excitation conditions but also, with the assistance of a continuously low-pressure gas flow from gas source 12, produces a stable, uniform, and gentle plasma particle output effect.

[0050] Preferably, the device also includes a handle 7, and the output component 2 is installed in the handle 7, so that the plasma excitation and output module is integrated into a structure that is easy to operate by hand. This not only improves the flexibility and accuracy of the device in operation on the face, local areas, etc., but also reduces the signal transmission path length through structural compactness, thereby enhancing the plasma particle transport efficiency and response stability during use.

[0051] Preferably, the system also includes an MCU, which is connected to the controller 14. The MCU is used to perform logical control and closed-loop adjustment of the operating status of each component in the input component 1, and to dynamically manage the plasma excitation conditions in the output component 2. As a central processing and control unit, the MCU is responsible for: reading sensor inputs (air pressure, voltage, resistance temperature); outputting control signals to the controller 14 to start the gas source 12, regulate the flow, and control the pulse width modulation of the control valve 13; driving the transformer 21 through PWM to achieve stable output to the resistor 23; and realizing plasma excitation control, resistor protection, and airflow / voltage linkage response. The MCU is integrated on the main control board, located between the power supply 11 and the controller 14. Logically, it is the main control core, and structurally, it interacts with sensors, MOSFETs, PWM modules, ADCs, and other modules through multi-channel I / O.

[0052] Resistor 23 is a low-inductance, constant-resistance heating element, and its heating power is expressed by the following formula:

[0053]

[0054] in: The resistance heating power that the MCU needs to control; This is the output voltage of transformer 21 (controlled by MCU PWM). This is the resistance value of resistor 23; This represents the current flowing through the resistor. The MCU indirectly controls the transformer 21 by adjusting the drive cycle via PWM. This allows for the adjustment of the resistance heating intensity, ensuring that the surface temperature remains stable within a range suitable for plasma excitation.

[0055] The MCU performs pulse modulation on the control valve 13 to achieve dynamic control of the output flow of the air source 12:

[0056]

[0057] in For output flow; To control the flow coefficient of the valve; The duty cycle of the pulse output from the MCU to control valve 13; Given the initial pressure of gas source 12, the MCU ensures that the airflow rate matches the ionization efficiency using this formula, i.e., it satisfies:

[0058]

[0059] in: For plasma excitation efficiency; For gas temperature (controlled by resistance); The local electric field strength (across the resistor); This refers to the number of gas molecules per unit volume. The MCU in this solution can utilize its built-in PID module to... and Linked control achieves optimal particle density and efficiency.

[0060] Finally, it should be noted that the above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Although the present invention has been described in detail with reference to the foregoing embodiments, those skilled in the art can still modify the technical solutions described in the foregoing embodiments or make equivalent substitutions for some of the technical features. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the protection scope of the present invention.

Claims

1. A skin cleansing device, comprising an input component and an output component, wherein the input component is connected to the output component via an air tube, characterized in that: The input component consists of a power supply, at least one air source, a control valve, and a controller. The power supply is connected to the controller, and the input section of the air tube is connected to the air source and the control valve respectively through the controller. The output component consists of at least one transformer, a PCB, and at least two resistors. One end of each of the two resistors is connected to the transformer, and the other end is connected to the output end of the air tube. The PCB is connected to the transformer.

2. The skin cleaning device according to claim 1, characterized in that: It also includes a chassis, in which the input components are mounted.

3. The skin cleaning device according to claim 2, characterized in that: The bottom of the chassis is also equipped with several casters.

4. The skin cleaning device according to claim 2, characterized in that: A touch screen is also provided at any point on the chassis, and the touch screen is electrically connected to the input component and the output component.

5. The skin cleaning device according to claim 1, characterized in that: The controller is a flow controller.

6. The skin cleaning device according to claim 1, characterized in that: The gas source consists of a gas cylinder and the gas to be ionized contained in the gas cylinder.

7. The skin cleansing device according to claim 6, characterized in that: The gas to be ionized is any one or more of helium, argon, and nitrogen.

8. The skin cleansing device according to claim 7, characterized in that: The gas to be ionized is argon.

9. The skin cleansing device according to claim 1, characterized in that: It also includes a handle, and the output component is mounted inside the handle.

10. The skin cleansing device according to claim 1, characterized in that: It also includes an MCU, which is connected to the controller.

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