Precise gantry motion platform for wafer detection

Abstract

The invention provides a precise gantry motion platform for wafer detection, and relates to the technical field of gantry motion platforms, the precise gantry motion platform comprises an installation main platform, two sides of the installation main platform are provided with support brackets; a positioning platform I is mounted at the top of the supporting bracket; the side face of the rotary carrying table is rotationally installed on the outer side of the guide wheel, and an aluminum sheet is installed on one side of the bottom of the rotary carrying table. A connecting side plate is mounted at the bottom of the outer side of the rotating sleeve; an electromagnet assembly is mounted at the side end of the connecting side plate; the electromagnet assembly is rotatably installed on the side face of the aluminum sheet in a closed mode. By using the Lenz's law between aluminum and the magnet, the moving speed of the aluminum sheet is gradually slowed down, so that the rotating speed of the rotary carrying table is reduced, the position deviation caused by large inertia is reduced, the wafer angle adjustment accuracy is improved, the wafer position adjustment is rapidly completed, and the problem that when the wafer rotates to an angle at a high speed due to the inertia factor, the wafer cannot be accurately adjusted is solved. And continuous forward movement deviating from a preset angle can be solved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of gantry motion platform, and particularly relates to a precise gantry motion platform for wafer detection. BACKGROUND

[0002] Wafer detection is a core link in semiconductor manufacturing, through high-precision detection technology to ensure wafer quality, reduce defect rate, and improve chip yield, and the precise gantry motion platform is a kind of high-precision linear motion mechanism, which is named as gantry because of its similar shape, and has the characteristics of high rigidity, high precision and high speed, through the precise gantry motion platform, the wafer can be clamped and fixed, and the detection probe clamped by the gantry assembly above the platform can complete the detection of the wafer.

[0003] In the prior art, when the gantry motion platform is used, the wafer is placed on the motion platform, and the angle of the wafer needs to be adjusted to match the specific angle of subsequent detection. In order to improve the overall work efficiency, the rotation speed of the wafer is appropriately increased during the angle adjustment process. However, due to the influence of inertia, when the wafer rotates at high speed to the angle, it will continue to move forward and deviate from the preset angle. This angle deviation will directly interfere with the accuracy of wafer detection. In order to ensure the accuracy of angle adjustment, the rotation speed of the wafer needs to be slowed down. However, when facing large-scale wafer detection tasks, the overall work efficiency will be seriously affected. SUMMARY

[0004] In view of the defects of the prior art, the present application provides a precise gantry motion platform for wafer detection to solve the problems mentioned in the background.

[0005] To solve the above technical problems, the present application is realized by the following technical scheme: The application discloses a precision gantry motion platform for wafer detection, which comprises a mounting main platform, two supporting supports, two positioning platforms, two X-axis guide rails, two driving pulley assemblies, a bearing platform, a Y-axis guide rail, two driving pulley assemblies, two positioning mounting plates, a positioning cover, a rotating platform, a rotating sleeve, a connecting side plate, an electromagnet assembly and a mounting main platform.

[0006] Further, the bottom of the driving pulley assembly is provided with a power transmission support, the outer side of the bearing platform is provided with a Y-axis guide rail, and the Y-axis guide rail is provided with two driving pulley assemblies.

[0007] Further, the top of the driving pulley assembly is provided with a gantry mounting plate, the bottom of the driving pulley assembly is provided with a power transmission support, and the top of the mounting main platform is provided with a positioning platform.

[0008] Further, the top of the positioning platform is provided with a magnetic preloading steel strip slide rail, and the magnetic preloading steel strip slide rail is provided with a fine adjustment pulley.

[0009] Further, the inner side of the fine adjustment platform is provided with a movable push plate, the movable push plate is slidably arranged on the outer side of the bearing platform, the outer side of the fine adjustment platform is provided with a magnetic preloading steel strip slide rail, and the magnetic preloading steel strip slide rail is provided with two fine adjustment pulleys.

[0010] Further, the top of the second fine adjustment trolley is provided with a fine adjustment push plate, and the bottom of the second fine adjustment trolley is provided with a power transmission support.

[0011] Further, the bottom of the rotating sleeve is provided with a gear, and the rotating sleeve is rotatably provided with a rotating rod inside.

[0012] Further, the bottom of the positioning cover is provided with two servo motors, and the output ends of the two servo motors are provided with gears; the gear on the output end of one servo motor is engaged with the gear at the bottom of the rotating sleeve, and the gear on the output end of the other servo motor is engaged with the gear at the bottom of the rotating rod.

[0013] Further, the top of the rotating rod is connected with the bottom of a rotating table; the top of the rotating table is provided with a rectangular wafer storage groove; the four sides of the wafer storage groove are provided with lateral storage grooves; the outer side of the rotating table is provided with a gas pump assembly; and the output end of the gas pump assembly is provided with a circulation pipe.

[0014] Further, the circulation pipe is inside the rotating table and has a ring structure, and the side of the circulation pipe is provided with four shunt pipes; the four shunt pipes are inserted into the lateral storage grooves and are provided with telescopic expansion capsules; the outer end of the telescopic expansion capsule is provided with a clamping plate; and the telescopic expansion capsule and the clamping plate are inside the lateral storage grooves.

[0015] The present application provides a precise gantry motion platform for wafer detection, which has the following advantages: In use, the bottom of the positioning cover is provided with two servo motors, one servo motor drives the rotating sleeve to move the connecting side plate, the position of the electromagnet assembly can be flexibly adjusted according to the pre-adjusted position of the wafer, the other servo motor drives the rotating rod to rotate the rotating table, the rotating angle of the rotating table can be accurately controlled, when the rotating table drives the wafer to quickly move close to the electromagnet assembly, the law of Lenz between aluminum and magnet is used to gradually slow down the moving speed of the aluminum sheet, thereby reducing the rotating speed of the rotating table, effectively reducing the position deviation caused by large inertia, significantly improving the accuracy of wafer angle adjustment, quickly completing wafer position adjustment, reducing adjustment time, improving the overall efficiency of wafer detection, and reducing detection cost.

[0016] In addition, the magnetic force on the magnetic preloading steel strip slide rail one and the magnetic preloading steel strip slide rail two respectively enables the fine adjustment trolley one and the fine adjustment trolley two to realize precise movement, thereby driving the bearing platform one and the driving trolley assembly two to move precisely, effectively ensuring the precision of the wafer position fine adjustment, the fine adjustment platform is driven by the two fine adjustment trolleys one to push the bearing platform one to move precisely along the X axis, and the fine adjustment trolley two drives the fine adjustment push plate and the movable guide cover to push the positioning mounting plate to move in the X axis direction, the magnetic force on the magnetic preloading steel strip slide rail one and the magnetic preloading steel strip slide rail two not only plays a precise guiding role, but also generates a buffering effect during movement, effectively preventing the problem of excessive movement distance caused by inertia and other factors, and improving the precision and reliability of the wafer position fine adjustment. BRIEF DESCRIPTION OF DRAWINGS

[0017] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings of the embodiments will be briefly introduced below.

[0018] The drawings described in the following description only relate to some embodiments of the present application, and are not a limitation of the present application.

[0019] In the drawings: Figure 1 A schematic diagram showing the overall structure of the present application is shown; Figure 2 A schematic diagram showing the X axis guide rail structure of the present application is shown; Figure 3 A schematic diagram showing the bearing platform one structure of the present application is shown; Figure 4 A schematic diagram showing the bearing platform two structure of the present application is shown; Figure 5 A schematic diagram showing the fine adjustment push plate structure of the present application is shown; Figure 6 A schematic diagram showing the fine adjustment trolley two structure of the present application is shown; Figure 7 A schematic diagram showing the positioning cover bottom structure of the present application is shown; Figure 8 A schematic diagram showing the positioning cover cross-sectional structure of the present application is shown; Figure 9 A schematic diagram showing the rotary table cross-sectional structure of the present application is shown.

[0020] List of reference signs 1, installation main platform; 101, positioning platform one; 102, X-axis guide rail; 103, drive pulley assembly one; 104, bearing platform one; 105, Y-axis guide rail one; 106, drive pulley assembly two; 107, positioning installation plate; 108, power transmission support one; 109, bearing platform two; 1010, Y-axis guide rail two; 1011, drive pulley assembly three; 1012, gantry installation plate; 1013, power transmission support two; 1014, support support; 2, positioning platform two; 201, magnetic preloaded steel strip slide rail one; 202, fine adjustment pulley one; 203, fine adjustment platform; 204, movable push plate; 205, magnetic preloaded steel strip slide rail two; 206, fine adjustment pulley two; 207, fine adjustment push plate; 208, movable guide cover; 209, power transmission support three; 3, positioning cover; 301, guide wheel; 302, rotary stage; 303, aluminum sheet; 304, rotary sleeve; 305, connecting side plate; 306, electromagnet assembly; 307, rotary rod; 308, wafer storage groove; 309, lateral storage groove; 3010, air pump assembly; 3011, circulating pipe; 3012, shunt pipe; 3013, telescopic expansion capsule; 3014, clamp plate. DETAILED DESCRIPTION

[0021] In order to make the objects, technical solutions and advantages of the embodiments of the present application clearer, the technical solutions of the embodiments of the present application will be described clearly and completely below with reference to the drawings of the embodiments of the present application. Obviously, the described embodiments are some but not all of the embodiments of the present application. Based on the described embodiments of the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort belong to the scope of protection of the present application.

[0022] Please refer to Figures 1 to 9 : Embodiment one: the application provides a precision gantry motion platform for wafer detection, comprising: a mounting main platform 1, the mounting main platform 1 is of rectangular structure, and the bottom of the mounting main platform 1 is provided with fixed supporting legs, and both sides of the mounting main platform 1 are provided with supporting supports 1014; the top of the two supporting supports 1014 is provided with a positioning platform one 101; the top of the two positioning platforms one 101 is provided with X-axis guide rails 102; the two X-axis guide rails 102 are slidably provided with two driving trolley assemblies one 103; the two driving trolley assemblies one 103 at the side end position are provided with a bearing platform one 104, and the two driving trolley assemblies one 103 at the other side end position are provided with a bearing platform two 109; the outside of the bearing platform one 104 is provided with a Y-axis guide rail one 105; the Y-axis guide rail one 105 is slidably provided with two driving trolley assemblies two 106; the top of the two driving trolley assemblies two 106 is provided with a positioning mounting plate 107; the bottom of the driving trolley assemblies two 106 is provided with a power transmission support one 108; the outside of the bearing platform two 109 is slidably provided with a Y-axis guide rail two 1010; the Y-axis guide rail two 1010 is slidably provided with two driving trolley assemblies three 1011; the top of the two driving trolley assemblies three 1011 is provided with a gantry mounting plate 1012, wherein the top of the gantry mounting plate 1012 is provided with a fixed seat, and the bottom of the driving trolley assemblies three 1011 is provided with a power transmission support two 1013; the top of both sides of the mounting main platform 1 is provided with a positioning platform two 2.

[0023] In the embodiment of the present application, when the gantry motion platform is working, the gantry assembly with integrated detection probe is installed on the fixed seat at the top of the gantry mounting plate 1012 through the fixing bolt, the support bracket 1014 positions the position of the two positioning platforms 101, the two driving trolley assemblies 103 at one end of the side end move along the X-axis guide rail 102, so that the driving trolley assembly 103 drives the carrying platform 104 to move in the X-axis direction, the two driving trolley assemblies 106 move along the Y-axis guide rail 1 105, the driving trolley assembly 106 drives the positioning mounting plate 107 above to move in the Y-axis direction, the bottom of the power transmission bracket 108 provides the power required for movement through the cable, so that the positioning mounting plate 107 drives the positioning cover 3 to adjust the position, so that the position of the wafer is accurately adjusted, and the two driving trolley assemblies 103 at the other side end move along the X-axis guide rail 102, the two driving trolley assemblies 103 drive the carrying platform 109 to move in the X-axis direction, the driving trolley assembly 1011 drives the gantry mounting plate 1012 at the top to move in the Y-axis direction along the Y-axis guide rail 2 1010, the bottom of the power transmission bracket 2 1013 provides the power required for the movement of the driving trolley assembly 1011, so that the gantry mounting plate 1012 drives the gantry assembly installed above to move in position, so that the detection probe on the gantry assembly is in the position of explanation, and the wafer is convenient for detection.

[0024] In the embodiment two, on the basis of the embodiment one, the top of the two positioning platforms two 2 are installed with magnetic preloading steel strip slide rails one 201; the two magnetic preloading steel strip slide rails one 201 are slidably installed with fine adjustment trolleys one 202; the top of the fine adjustment trolleys one 202 is installed with fine adjustment platforms 203; the inner sides of the two ends of the fine adjustment platforms 203 are installed with movable push plates 204; the movable push plates 204 are slidably installed on the outer sides of the two ends of the bearing platform one 104; the outer sides of the fine adjustment platforms 203 are installed with magnetic preloading steel strip slide rails two 205; the magnetic preloading steel strip slide rails two 205 are slidably installed with two fine adjustment trolleys two 206; the top of the two fine adjustment trolleys two 206 are installed with fine adjustment push plates 207, and the bottom of the fine adjustment trolleys two 206 is installed with power transmission supports three 209; the fine adjustment push plates 207 are L-shaped structures, and the side ends of the fine adjustment push plates 207 are installed with movable guide covers 208, wherein the movable guide covers 208 are movably installed on the side of the positioning installation plate 107; when the gantry motion platform is working, after the driving trolley assembly two 106 and the bearing platform one 104 are moved to the predetermined position, the positioning platform two 2 is between the two positioning platforms one 101, the two fine adjustment trolleys one 202 respectively drive the fine adjustment platforms 203 to move along the magnetic preloading steel strip slide rails one 201, the cable on one side of the fine adjustment trolley one 202 provides the power for the movement, the movable push plates 204 at the two ends of the inner side of the fine adjustment platforms 203 push the bearing platform one 104 to move, due to the magnetic force on the magnetic preloading steel strip slide rails one 201, the fine adjustment trolleys one 202 move accurately, and the movable push plates 204 push the bearing platform one 104 to move accurately along the X axis, the bottom of the power transmission support three 209 provides the power for the movement of the fine adjustment trolleys two 206 through the cable, the fine adjustment trolleys two 206 drive the fine adjustment push plates 207 on the top to move along the magnetic preloading steel strip slide rails two 205, the movable guide covers 208 on the side ends of the fine adjustment push plates 207 push the positioning installation plate 107 to drive the driving trolley assembly two 106 to move, under the magnetic force on the magnetic preloading steel strip slide rails two 205, the fine adjustment trolleys two 206 move accurately, and under the magnetic force, the movement distance will not be too large, and thus the positioning installation plate 107 moves accurately, the position of the wafer is fine adjusted, and the accuracy of the movement position is ensured.

[0025] The embodiment three is based on the embodiment one, two positioning covers 3 are installed on the side ends of the positioning installation plate 107; the top edge of the positioning cover 3 is provided with a protrusion, the top and bottom of the protrusion are rotatably installed with guide wheels 301, and the inner top of the positioning cover 3 is rotatably installed with a rotary table 302; the side of the rotary table 302 is rotatably installed outside the guide wheel 301, and the bottom side of the rotary table 302 is installed with an aluminum sheet 303; the bottom of the positioning cover 3 is rotatably installed with a rotary sleeve 304; the bottom outside of the rotary sleeve 304 is installed with a connecting side plate 305; the side end of the connecting side plate 305 is installed with an electromagnet assembly 306; the electromagnet assembly 306 is rotatably closed and installed on the side of the aluminum sheet 303; the bottom of the rotary sleeve 304 is installed with a gear, and the inside of the rotary sleeve 304 is rotatably installed with a rotary rod 307, wherein the bottom of the rotary rod 307 is installed with a gear; the bottom of the positioning cover 3 is installed with two servo motors, the output ends of the two servo motors are both installed with gears, the gear on the output end of one servo motor is engaged with the gear at the bottom of the rotary sleeve 304, and the gear on the output end of the other servo motor is engaged with the gear at the bottom of the rotary rod 307; the top of the rotary rod 307 is connected with the bottom of the rotary table 302; the top of the rotary table 302 is installed with a rectangular wafer storage groove 308; the four sides of the wafer storage groove 308 are provided with lateral storage grooves 309; the outside of the rotary table 302 is installed with a gas pump assembly 3010; the output end of the gas pump assembly 3010 is installed with a circulation pipe 3011; the circulation pipe 3011 is inside the rotary table 302, the circulation pipe 3011 is an annular structure, and the side of the circulation pipe 3011 is installed with four shunt pipes 3012; the four shunt pipes 3012 are inserted into the inside of the lateral storage groove 309 and installed with telescopic inflatable capsules 3013; the outer end of the telescopic inflatable capsule 3013 is installed with a clamping plate 3014;The telescopic expansion bag 3013 and the clamping plate 3014 are inside the lateral storage groove 309, when the gantry motion platform is working, the wafer to be detected is placed in the wafer storage groove 308 on the top of the rotating table 302, the air pump assembly 3010 works to generate airflow which is transported to the inside of the circulating pipe 3011 through the output end, and then the airflow flows into the telescopic expansion bag 3013 through the shunt pipe 3012, the telescopic expansion bag 3013 expands outward in the lateral storage groove 309, so that the telescopic expansion bag 3013 drives the clamping plate 3014 to move outward, so that the four clamping plates 3014 move outward at the same time to clamp and fix the wafer, the position of the electromagnet assembly 306 is adjusted according to the predetermined position of the wafer, the electromagnet assembly 306 is connected with a matched control module to control the size of the magnetic force, the gear at the output end of the servo motor at the bottom of the positioning cover 3 drives the gear at the bottom of the rotating sleeve 304 to rotate, the rotating sleeve 304 drives the connecting side plate 305 to move, the connecting side plate 305 drives the electromagnet assembly 306 to move to the predetermined position, the gear at the output end of the servo motor at the other place of the bottom of the positioning cover 3 drives the rotating rod 307 to move, the rotating rod 307 drives the rotating table 302 to rotate at the top inside of the positioning cover 3, the guide wheel 301 reduces the friction of the rotating table 302, when the aluminum sheet 303 at the bottom moves quickly and is about to contact the electromagnet assembly 306, the moving speed of the aluminum sheet 303 gradually slows down due to the effect of the Lenz law between aluminum and magnet, and then the rotating speed of the rotating table 302 gradually decreases to gradually approach the aluminum sheet 303, so that the rotating table 302 drives the wafer to rotate to the appropriate angle, the wafer placed in the rotating table 302 adjusts the speed quickly, and the moving speed is slowed down through the force between the aluminum sheet 303 and the electromagnet assembly 306, thereby reducing the position deviation caused by large inertia, improving the precision of wafer angle adjustment, and improving the efficiency of wafer detection.

[0026] The working principle of the embodiment is as follows: the wafer is placed in the wafer storage groove 308 on the top of the rotating platform 302, the airflow generated by the air pump assembly 3010 is transported into the circulating pipe 3011 and then flows into the telescopic inflatable capsule 3013 through the shunt pipe 3012, the telescopic inflatable capsule 3013 expands outward to drive the clamping plate 3014 to clamp and fix the wafer, the gear at the output end of a servo motor at the bottom of the positioning cover 3 drives the rotating sleeve 304 to rotate, the rotating sleeve 304 drives the electromagnet assembly 306 at the side end of the connecting side plate 305 to move to a predetermined position, the gear at the output end of another servo motor at the bottom of the positioning cover 3 drives the rotating rod 307 to drive the rotating platform 302 to rotate, the rotating platform 302 drives the aluminum sheet 303 to move quickly, and when the aluminum sheet 303 is about to contact the electromagnet assembly 306, the moving speed of the aluminum sheet 303 gradually slows down due to the effect of the Lenz law between aluminum and magnet, the rotating speed of the rotating platform 302 is reduced, and the aluminum sheet 303 moves to a suitable angle, the two driving pulley assemblies one 103 at one side end move along the X-axis guide rail 102, the driving pulley assembly one 103 drives the bearing platform one 104 to move in the X-axis direction, the two driving pulley assemblies two 106 move along the Y-axis guide rail one 105 in the Y-axis direction, the positioning mounting plate 107 drives the positioning cover 3 to adjust the position, the two driving pulley assemblies one 103 at the other side end move along the X-axis guide rail 102, the two driving pulley assemblies one 103 drive the bearing platform two 109 to move in the X-axis direction, the driving pulley assembly three 1011 drives the gantry mounting plate 1012 at the top to move along the Y-axis guide rail two 1010 in the Y-axis direction, the gantry mounting plate 1012 drives the gantry assembly installed above to move, after the driving pulley assembly two 106 and the bearing platform one 104 move to a predetermined position, the two fine adjustment pulleys one 202 drive the fine adjustment platforms 203 to move along the magnetic preloading steel strip guide rail one 201 respectively, the movable push plates 204 at the two ends inside the fine adjustment platform 203 push the bearing platform one 104 to move, the fine adjustment pulley one 202 is fine adjusted under the action of the magnetic force on the magnetic preloading steel strip guide rail one 201, the fine adjustment pulley two 206 drives the movable guide cover 208 at the side end of the fine adjustment push plate 207 top to push the positioning mounting plate 107 to drive the driving pulley assembly two 106 to move and fine adjust, and the precision of wafer position adjustment is improved.

[0027] In this document, the following points need to be noted: 1. The drawings of the embodiment of the present application only relate to the structures involved in the embodiment of the present application, and other structures can refer to the general design.

[0028] 2. In the case of no conflict, the embodiments of the present application and the features in the embodiments can be combined with each other to obtain new embodiments.

[0029] The above merely illustrates the specific embodiments of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art can easily think of the changes or replacements within the technical range disclosed by the present application, which should be covered in the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A precision gantry motion platform for wafer inspection, comprising: The main mounting platform (1) is equipped with fixed legs at its bottom and support brackets (1014) on both sides of the main mounting platform (1). The platform is characterized by having a positioning platform (101) mounted on the top of each of the two support brackets (1014); an X-axis guide rail (102) mounted on the top of each of the two positioning platforms (101); two drive trolley assemblies (103) slidably mounted on each of the two X-axis guide rails (102); a bearing platform (104) mounted on the two drive trolley assemblies (103) at the side end, and a bearing platform (109) mounted on the two drive trolley assemblies (103) at the other side end; a Y-axis guide rail (105) mounted on the outer side of the bearing platform (104); and two drive trolley assemblies (106) slidably mounted on the Y-axis guide rail (105). Positioning mounting plates (107) are installed on the top of both of the two drive-type trolley assemblies (106); positioning covers (3) are installed on the side ends of the two positioning mounting plates (107); a protrusion is provided at the top edge of the positioning cover (3), and guide wheels (301) are rotatably mounted on the top and bottom of the protrusion, and a rotating platform (302) is rotatably mounted on the top inner side of the positioning cover (3); the side of the rotating platform (302) is rotatably mounted on the outside of the guide wheels (301), and an aluminum sheet (303) is mounted on one side of the bottom of the rotating platform (302); a rotating sleeve (304) is rotatably mounted on the bottom of the positioning cover (3); a connecting side plate (305) is installed on the bottom outer side of the rotating sleeve (304); an electromagnet assembly (306) is installed on the side end of the connecting side plate (305); the electromagnet assembly (306) is rotatably closed and mounted on the side of the aluminum sheet (303).

2. The precision gantry motion platform for wafer inspection according to claim 1, characterized in that, The bottom of each of the two drive trolley components (106) is equipped with a power transmission bracket (108); the outer side of the second bearing platform (109) is slidably equipped with a Y-axis guide rail (1010); and two drive trolley components (1011) are slidably equipped on the second Y-axis guide rail (1010).

3. The precision gantry motion platform for wafer inspection according to claim 2, characterized in that, The top of both of the drive trolley assembly three (1011) is equipped with a gantry mounting plate (1012), wherein the top of the gantry mounting plate (1012) is equipped with a fixed seat, and the bottom of the drive trolley assembly three (1011) is equipped with a power transmission bracket two (1013); the top two sides of the main mounting platform (1) are equipped with positioning platforms two (2).

4. A precision gantry motion platform for wafer inspection according to claim 3, characterized in that, The top of both positioning platforms (2) is equipped with magnetic preload steel bar slide rail (201); fine adjustment trolley (202) is slidably installed on both magnetic preload steel bar slide rails (201); fine adjustment platform (203) is installed on the top of fine adjustment trolley (202).

5. A precision gantry motion platform for wafer inspection according to claim 4, characterized in that, The fine-tuning platform (203) has movable push plates (204) installed at both ends of its inner side; the movable push plates (204) can be slidably installed on both ends of the outer side of the bearing platform (104); the fine-tuning platform (203) has magnetic preload steel bar slide rail (205) installed on its outer side; and two fine-tuning trolleys (206) are slidably installed on the magnetic preload steel bar slide rail (205).

6. A precision gantry motion platform for wafer inspection according to claim 5, characterized in that, Both of the fine-tuning trolleys 2 (206) are equipped with fine-tuning push plates (207) on their tops and power transmission brackets 3 (209) are equipped with power transmission brackets 3 (209) on their bottoms. The fine-tuning push plates (207) are equipped with movable guide covers (208) on their sides. The movable guide covers (208) are movably mounted on the side of the positioning mounting plate (107).

7. A precision gantry motion platform for wafer inspection according to claim 6, characterized in that, The bottom of the rotating sleeve (304) is equipped with a gear, and a rotating rod (307) is rotatably installed inside the rotating sleeve (304), wherein the bottom of the rotating rod (307) is equipped with a gear.

8. A precision gantry motion platform for wafer inspection according to claim 7, characterized in that, Two servo motors are installed at the bottom of the positioning cover (3). Gears are installed on the output ends of the two servo motors. The gear on the output end of one servo motor meshes with the gear at the bottom of the rotating sleeve (304), and the gear on the output end of the other servo motor meshes with the gear at the bottom of the rotating rod (307).

9. A precision gantry motion platform for wafer inspection according to claim 8, characterized in that, The top of the rotating rod (307) is connected to the bottom of the rotating stage (302); a rectangular wafer storage slot (308) is installed on the top of the rotating stage (302); lateral storage slots (309) are provided on the four sides of the wafer storage slot (308); an air pump assembly (3010) is installed on the outside of the rotating stage (302); a circulation pipe (3011) is installed on the output end of the air pump assembly (3010).

10. A precision gantry motion platform for wafer inspection according to claim 9, characterized in that, The circulation pipe (3011) is located inside the rotating platform (302), and four branch pipes (3012) are installed on the side of the circulation pipe (3011); the four branch pipes (3012) are inserted into the side receiving groove (309) and a telescopic expansion bladder (3013) is installed; a clamp (3014) is installed at the outer end of the telescopic expansion bladder (3013); the telescopic expansion bladder (3013) and the clamp (3014) are located inside the side receiving groove (309).

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