Liquid medicine circulation system and wet process equipment
By combining gas purging and suction components, the problem of residual liquid in the chemical circulation system is solved by utilizing the gas output pressure and siphon effect, thus achieving complete emptying of the chemical circulation system and ensuring etching efficiency.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-29
- Publication Date
- 2026-03-13
AI Technical Summary
In existing technologies, residual liquid in the liquid supply pipeline of the pharmaceutical liquid circulation system is difficult to completely drain, which affects the etching efficiency.
By combining a gas purging assembly and a suction assembly, the residual liquid is blown out of the nozzle by controlling the gas output pressure, and the liquid in the supply pipeline is completely emptied by combining the siphon effect and Bernoulli effect.
It effectively reduces the amount of residue in the chemical solution circulation system, ensures the etching efficiency of the new chemical solution, and reduces the adverse effects of the old chemical solution on the substrate treatment.
Smart Images
Figure CN121665944A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of semiconductor manufacturing technology, and in particular to a liquid circulation system and a wet processing equipment. Background Technology
[0002] Wet etching is an essential process in semiconductor manufacturing. The wet etching equipment and etching solution have the greatest impact on the etching results. To achieve better etching results, a chemical circulation system is often required in the wet etching equipment. This system needs to be equipped with various valves to achieve stable control of the chemical flow rate, temperature, and pressure, thereby achieving better etching uniformity.
[0003] As the etching solution is reused more times, its etching rate decreases. Furthermore, the etching solution itself changes over time after initial use, gradually becoming less effective; for example, hydrogen peroxide decomposes over time. Therefore, after a certain number of wafers or a certain time period, the etching solution circulation system needs to be replaced with a new etching solution.
[0004] Before replacing the etching solution, the old solution in the solution circulation system must be completely drained to ensure minimal residue. Otherwise, the old solution will mix with the new solution, ultimately reducing etching efficiency. In wet etching equipment, the chamber used to process the substrate is located at a higher position, while the solution reservoir is located at a lower position. The supply pipeline from the solution reservoir to the nozzles in the chamber has many bends and twists, making it difficult to completely drain residual solution.
[0005] Therefore, it is necessary to propose a liquid circulation system and wet processing equipment that can improve the situation where residual liquid in the liquid supply pipeline is difficult to drain completely. Summary of the Invention
[0006] The purpose of this application is to solve the problem of how to improve the drainage of residual liquid in the liquid supply pipeline in the prior art.
[0007] To address the aforementioned problems, one embodiment of this application proposes a drug circulation system, comprising:
[0008] Nozzles are used to supply liquid medicine to the substrate;
[0009] Storage tank, used to store medicinal solutions;
[0010] Liquid supply piping, connecting the liquid outlet and nozzle of the storage tank; and
[0011] A gas purging assembly includes a purging pipeline and an adjusting element. The purging pipeline is connected to a liquid supply pipeline, and the adjusting element is disposed on the purging pipeline to adjust the output gas pressure of the gas in the purging pipeline.
[0012] The drug circulation system is configured as follows:
[0013] When it is necessary to empty the liquid in the supply line, the gas in the purging line blows the liquid between the gas purging assembly and the nozzle out of the nozzle at a first predetermined output pressure.
[0014] Another embodiment of this application provides a wet processing apparatus, comprising:
[0015] The aforementioned drug circulation system; and
[0016] The chamber is used to process the substrate, and the nozzle is located in the chamber to supply the chemical solution to the substrate.
[0017] In the liquid circulation system proposed in this application, the liquid supply pipeline is connected to the outlet of the liquid storage tank and the nozzle. The gas purging assembly includes a purging pipeline and an adjusting element. The purging pipeline is connected to the liquid supply pipeline. The adjusting element is disposed on the purging pipeline and is used to adjust the output gas pressure of the gas in the purging pipeline so that the gas in the purging pipeline blows the gas in the liquid supply pipeline out of the nozzle at a first predetermined output gas pressure, which is beneficial to drain the residual liquid in the liquid supply pipeline.
[0018] Other features and corresponding beneficial effects of this application will be described in the latter part of the specification, and it should be understood that at least some of the beneficial effects will become obvious from the description in this application. Attached Figure Description
[0019] Figure 1 This is a schematic diagram of the structure of a wet processing device according to an embodiment of this application. Detailed Implementation
[0020] The following specific embodiments illustrate the implementation of this application. Those skilled in the art can easily understand other advantages and effects of this application from the content disclosed in this specification. Although the description of this application is presented in conjunction with preferred embodiments, this does not mean that the features of this application are limited to this embodiment. On the contrary, the purpose of describing the application in conjunction with embodiments is to cover other options or modifications that may be derived based on the claims of this application. To provide a thorough understanding of this application, many specific details will be included in the following description. This application may also be implemented without using these details. Furthermore, to avoid confusion or obscuring the focus of this application, some specific details will be omitted in the description. It should be noted that, unless otherwise specified, the embodiments and features in the embodiments of this application can be combined with each other.
[0021] It should be noted that in this specification, similar reference numerals and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.
[0022] The technical solutions of this application will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this application. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.
[0023] In the description of this application, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this application. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.
[0024] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection between two components. Those skilled in the art can understand the specific meaning of the above terms in this application based on the specific circumstances.
[0025] To make the objectives, technical solutions, and advantages of this application clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.
[0026] Example:
[0027] Figure 1 This is a schematic diagram of the structure of a wet processing device according to an embodiment of this application.
[0028] refer to Figure 1The wet processing equipment proposed in this application includes a chemical circulation system 100 and a chamber 200, the chamber 200 being used to process a substrate. The chemical circulation system 100 of the wet processing equipment includes a nozzle 10, a storage tank 20, a supply pipeline 30, a gas purging assembly 40, and a receiving cup 50. The nozzle 10 is disposed in the chamber 200 and is used to supply chemical solution to the substrate in the chamber 200. The storage tank 20 is used to store the chemical solution, which can be a dilute acid, dilute alkali, or organic liquid, etc. The supply pipeline 30 connects the outlet of the storage tank 20 and the nozzle 10, and is used to transport the chemical solution in the storage tank 20 to the nozzle 10. A supply switch valve 34 is provided on the supply pipeline 30. When the nozzle 10 stops supplying chemical solution to the substrate, it moves above the receiving cup 50. The receiving cup 50 is connected to the storage tank 20 and is used to receive the chemical solution dripping from the nozzle 10 and discharge the received chemical solution into the storage tank 20. The gas purging assembly 40 includes a purging pipe 41 and an adjusting element 43. The purging pipe 41 is connected to the liquid supply pipe 30, and the adjusting element 43 is disposed on the purging pipe 41 to adjust the output gas pressure of the gas in the purging pipe 41. The liquid circulation system 100 is configured such that when it is necessary to empty the liquid in the liquid supply pipe 30, the gas in the purging pipe 41 blows the liquid located between the gas purging assembly 40 and the nozzle 10 in the liquid supply pipe 30 from the nozzle 10 at a first predetermined output gas pressure. Figure 1 The thick line represents the pipeline between the gas purging assembly 40 and the nozzle 10 on the liquid supply pipeline 30. Residual liquid in some dead corners of the liquid supply pipeline 30 is blown out of the nozzle 10 by the gas purging assembly 40. It should be noted that the nozzle 10 should be above the receiving cup 50 at this time, and the liquid blown out of the nozzle 10 will drip into the receiving cup 50. In this embodiment, the liquid in the chamber 200 (e.g., the liquid discharged from the nozzle 10) is returned to the storage tank 20 through the receiving cup 50. In other embodiments, the liquid in the chamber 200 can also be returned to the storage tank 20 in other ways, not limited to the receiving cup 50.
[0029] In this embodiment, if the gas pressure in the purge line 41 is too low, the liquid medicine will not easily be blown out of the nozzle 10; if the gas pressure in the purge line 41 is too high, it will cause severe splashing of liquid from the nozzle 10, thereby affecting the process atmosphere in the chamber 200, causing process abnormalities, or even causing leakage in the pipeline, posing a safety risk. Therefore, this embodiment avoids the above problems by controlling the gas pressure. Specifically, in this embodiment, the range of the first predetermined output gas pressure is 5 PSI to 12 PSI, preferably 10 PSI. The gas in the purge line 41 is, for example, nitrogen.
[0030] In some embodiments, the regulating element 43 includes an electro-proportional valve 431 and may also include a manual valve 432. In this embodiment, the regulating element 43 includes an electro-proportional valve 431 and a manual valve 432, allowing for coarse adjustment of the gas pressure in the purge line 41 via the manual valve 432, followed by fine adjustment via the electro-proportional valve 431. The gas purging assembly 40 also includes a one-way valve 45 and a gas switching valve 47. Along the gas flow direction, the manual valve 432, the gas switching valve 47, the electro-proportional valve 431, and the one-way valve 45 are sequentially arranged on the purge line 41.
[0031] In some embodiments, such as Figure 1 The drug circulation system 100 also includes an internal circulation pipeline 31. The internal circulation pipeline 31 connects the supply pipeline 30 and the storage tank 20, and is used to circulate the drug solution in the storage tank 20. An internal circulation switch valve 32 is provided on the internal circulation pipeline 31. Along the supply direction of the drug solution in the supply pipeline 30, the connection point between the internal circulation pipeline 31 and the supply pipeline 30 is located downstream of the gas purging assembly 40. The drug circulation system 100 is further configured such that when it is necessary to empty the drug solution in the internal circulation pipeline 31, the gas in the purging pipeline 41 purges the drug solution in the internal circulation pipeline 31 to the storage tank 20 at a second predetermined output pressure, wherein the second predetermined output pressure is greater than the first predetermined output pressure. The range of the second predetermined output pressure is 50 PSI to 70 PSI, preferably 60 PSI.
[0032] In some embodiments, the drug circulation system 100 further includes a suction assembly 60. The suction assembly 60 includes a suction line 61, a siphon valve 63, and a fluid line 65. The suction line 61 is connected to the supply line 30. Along the drug supply direction in the supply line 30, the connection point between the suction line 61 and the supply line 30 is located downstream of the gas purging assembly 40 and upstream of the connection point between the internal circulation line 31 and the supply line 30. The siphon valve 63 includes an inlet 631, an outlet 632, and a fluid inlet 633. The inlet 631 and outlet 632 are connected to the suction line 61, and the fluid inlet 633 is connected to the fluid line 65. The fluid line 65 is used to introduce fluid into the siphon valve 63 through the fluid inlet 633 and allow the fluid to flow out from the outlet 632. The Bernoulli effect causes the inlet 631 to draw in the drug from the supply line 30. The suction assembly 60 in this embodiment utilizes the Bernoulli effect. The Bernoulli effect states that in steady flow, pressure is low where flow velocity is high and pressure is high where flow velocity is low. Therefore, when fluid is introduced into the siphon valve 63 through the fluid inlet 633 and flows out through the outlet 632 via the fluid conduit 65, a negative pressure is created at the suction inlet 631, drawing the liquid medicine at the suction inlet 631 into the siphon valve 63, and then discharging it. The suction assembly 60 also includes a suction switch valve 67 and a fluid switch valve 69. Along the suction direction of the liquid medicine, the suction switch valve 67 and the siphon valve 63 are sequentially arranged on the suction conduit 61. The fluid switch valve 69 is arranged on the fluid conduit 65. The fluid in the fluid conduit 65 is, for example, deionized water.
[0033] In some embodiments, the liquid medicine circulation system 100 is further configured such that: when it is necessary to drain the liquid medicine in the supply pipeline 30, it is possible to choose to use only the gas purging assembly 40 to drain the liquid medicine in the supply pipeline 30 without using the suction assembly 60; it is also possible to choose to use only the suction assembly 60 to drain the liquid medicine in the supply pipeline 30 without using the gas purging assembly 40; or, if necessary, it is possible to choose to use both the gas purging assembly 40 and the suction assembly 60 simultaneously, after using the suction assembly 60 to suction the liquid medicine in the supply pipeline 30, and then using the gas purging assembly 40 to purge the supply pipeline 30, so that the liquid medicine in the supply pipeline 30 is discharged more cleanly to meet the actual process requirements.
[0034] In some embodiments, the drug circulation system 100 further includes a filter 71 and a discharge line 73. The filter 71 is disposed in the supply line 30 and is used to filter the drug solution in the supply line 30. Along the supply direction of the drug solution in the supply line 30, the filter 71 is located downstream of the gas purging assembly 40 and upstream of the connection point between the internal circulation line 31 and the supply line 30. The discharge line 73 is connected to the filter 71 and is used to discharge the drug solution from the filter 71. A discharge switch valve 75 is provided on the discharge line 73 to control the opening and closing of the discharge line 73. When it is necessary to empty the drug solution from the filter 71, the discharge switch valve 75 is opened, and the drug solution in the filter 71 is discharged from the discharge line 73. Due to the filter element structure inside the filter 71, if drainage is carried out solely by gravity, there may still be drug solution residue inside the filter element. Therefore, after the liquid medicine in filter 71 is discharged from discharge pipe 73 by gravity, the gas in purge pipe 41 purges the liquid medicine in filter 71 to discharge pipe 73 and discharge it at a third predetermined output pressure. In this embodiment, the third predetermined output pressure is greater than the first predetermined output pressure, and the range of the third predetermined output pressure is 50 PSI to 70 PSI, preferably 60 PSI. The third predetermined output pressure and the second predetermined output pressure may be the same or different.
[0035] In some embodiments, the liquid circulation system 100 further includes a drain pipe 81, a pneumatic pump 83, and a drain valve 85, with the pneumatic pump 83 and drain valve 85 sequentially arranged on the drain pipe 81. The drain pipe 81 is connected to the outlet of the storage tank 20, and the bottom 21 of the storage tank 20 has an inclined surface, with the outlet of the storage tank 20 located at the lowest point of the inclined surface. Through the inclined structure, the liquid can be collected at the outlet by gravity and discharged from the drain pipe 81 under the action of the pneumatic pump 83.
[0036] In some embodiments, the inlet of the liquid supply line 30 is connected to the drain line 81, and the outlet of the liquid supply line 30 is connected to the nozzle 10. A control valve 90 is provided at the inlet of the liquid supply line 30. When the liquid supply line 30 supplies liquid, the control valve 90 is opened; when the liquid supply line 30 empties, the control valve 90 is closed. The connection point between the inlet of the liquid supply line 30 and the drain line 81 is located between the pneumatic pump 83 and the drain switch valve 85. Figure 1 In the example shown, the inlet of the supply line 30 is connected to the drain line 81 via a first tee connector (not shown), and the purge line 41 is connected to the supply line 30 via a second tee connector (not shown). The two ends of the control valve 90 are connected to the first and second tee connectors, respectively. When the drug circulation system 100 is emptied, very little drug remains in the control valve 90, and the portion of the supply line 30 between the first and second tee connectors is very short and can be ignored.
[0037] refer to Figure 1Based on the aforementioned liquid circulation system 100, the specific process for draining the liquid from the circulation system 100 when the liquid's lifespan expires includes:
[0038] Automatic waste discharge of medicine in storage tank 20: close control valve 90, open drain switch valve 85 and pneumatic pump 83, and drain the medicine in storage tank 20 through drain pipe 81.
[0039] Automatic waste removal of the liquid in filter 71: The suction switch valve 67 and fluid switch valve 69 are closed, and the discharge switch valve 75 is opened. The liquid in filter 71 is discharged by gravity through the discharge pipe 73. After a predetermined time, such as 5 minutes, the liquid in filter 71 has been largely removed. In this case, control valve 90, internal circulation switch valve 32, and liquid supply switch valve 34 are closed, and gas switch valve 47 is opened. Adjusting element 43 adjusts the gas pressure in purge pipe 41 to a second predetermined output gas pressure, for example, 60 PSI. This allows high-pressure gas to purge filter 71, and simultaneously purges the liquid in the pipe preceding filter 71, located between gas purge pipe 41 and filter 71, into filter 71, where it is finally discharged. After a predetermined purging time, such as 5 minutes, the liquid in filter 71 has been completely removed, and gas switch valve 47 is closed.
[0040] Automatic waste discharge of the medicine in the internal circulation pipeline 31: Close the control valve 90, the discharge switch valve 75 and the liquid supply switch valve 34, open the internal circulation switch valve 32 and the gas switch valve 47, and adjust the output gas pressure of the gas in the purging pipeline 41 by the regulating element 43, for example, to 60 PSI. The high-pressure gas will purge the medicine in the internal circulation pipeline 31 into the storage tank 20 until the medicine in the internal circulation pipeline 31 is emptied. Then close the gas switch valve 47.
[0041] Automatic waste discharge of the liquid in the supply line 30: Close control valve 90, gas switch valve 47, discharge switch valve 75, and internal circulation switch valve 32; open supply switch valve 34, suction switch valve 67, and fluid switch valve 69. A certain flow rate of fluid, such as deionized water, in the fluid line 65 passes through siphon valve 63. Through the Bernoulli effect, siphon valve 63 generates negative pressure suction on the supply line 30. The suction port 631 of siphon valve 63 draws in the liquid in the supply line 30 located between suction line 61 and nozzle 10. The liquid is then discharged from suction line 61 through suction switch valve 67 and siphon valve 63. After this, according to actual process requirements, gas switch valve 47 can be opened, and adjusting element 43 can adjust the gas pressure in purge line 41 to a first predetermined output gas pressure, for example, adjusted to 10 PSI. The gas then purges the liquid in the supply line 30 out of nozzle 10 and into receiving cup 50. After a predetermined time, such as 2 minutes, the medicine in the supply line 30 has been completely drained. Finally, the pneumatic pump 83 and the drain valve 85 are turned on to drain the medicine in the storage tank 20.
[0042] In other alternative embodiments, the automatic discharge of the liquid medicine in the supply pipeline 30 can also be performed as follows: Close the control valve 90, discharge switch valve 75, internal circulation switch valve 32, suction switch valve 67, and fluid switch valve 69; open the supply switch valve 34 and gas switch valve 47; adjust the gas pressure in the purge pipeline 41 to a first predetermined output pressure, for example, 10 PSI; the gas will purge the liquid medicine in the supply pipeline 30 out of the nozzle 10 and into the receiving cup 50. After a predetermined time, for example, 2 minutes, the liquid medicine in the supply pipeline 30 has been completely drained. Finally, turn on the pneumatic pump 83 and the drain switch valve 85 to drain the liquid medicine from the storage tank 20.
[0043] In summary, in this embodiment, after the liquid medicine in the filter 71 is drained by gravity, the filter 71 is purged by the gas purging assembly 40. The gas purging assembly 40 also purges the internal circulation pipeline 31 and the liquid supply pipeline 30 with different predetermined output gas pressures. If necessary, the suction assembly 60 can be selected to first suction the liquid supply pipeline 30, and then the gas purging assembly 40 can be selected to purge the liquid supply pipeline 30. This ensures that the liquid medicine in the liquid medicine circulation system 100 is completely drained, minimizing the residual liquid in the system. The total residual liquid in the system is less than 100 ml, thus minimizing the adverse effects of residual liquid on the process results.
[0044] The wet processing equipment proposed in this application uses the above-mentioned chemical solution circulation system 100. When replacing the chemical solution, the total residual amount of the old chemical solution in the chemical solution circulation system 100 can be reduced to a minimum. In this way, when using the new chemical solution to process the substrate in the chamber, such as when performing an etching process, the adverse effects of the old chemical solution on the substrate processing effect are minimized, making it easier to meet the process requirements.
[0045] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application, and are not intended to limit them. Although this application has been described in detail with reference to the foregoing embodiments, those skilled in the art should understand that modifications can still be made to the technical solutions described in the foregoing embodiments, or equivalent substitutions can be made to some or all of the technical features therein. Such modifications or substitutions do not cause the essence of the corresponding technical solutions to deviate from the scope of the technical solutions of the embodiments of this application.
Claims
1. A drug solution circulation system, characterized in that, include: Nozzles are used to supply liquid medicine to the substrate; Storage tank, used to store medicinal solutions; A liquid supply pipeline connects the liquid outlet of the liquid storage tank to the nozzle; as well as A gas purging assembly includes a purging pipeline and an adjusting element. The purging pipeline is connected to the liquid supply pipeline, and the adjusting element is disposed on the purging pipeline for adjusting the output gas pressure of the gas in the purging pipeline. The drug circulation system is configured as follows: When it is necessary to empty the liquid in the supply line, the gas in the purging line blows the liquid between the gas purging assembly and the nozzle out of the nozzle with a first predetermined output pressure.
2. The drug circulation system according to claim 1, characterized in that, The range of the first predetermined output pressure is 5 PSI to 12 PSI.
3. The drug circulation system according to claim 1, characterized in that, Also includes: An internal circulation pipeline connects the liquid supply pipeline and the liquid storage tank to circulate the liquid in the liquid storage tank. The internal circulation pipeline is located downstream of the liquid supply pipeline along the liquid supply direction of the liquid in the liquid supply pipeline. The drug circulation system is also configured to: When it is necessary to drain the liquid medicine in the internal circulation pipeline, the gas in the purging pipeline purges the liquid medicine in the internal circulation pipeline to the storage tank at a second predetermined output gas pressure, wherein the second predetermined output gas pressure is greater than the first predetermined output gas pressure.
4. The drug circulation system according to claim 3, characterized in that, The range of the second predetermined output pressure is 50 PSI to 70 PSI.
5. The drug circulation system according to claim 1, characterized in that, Also includes: A suction assembly includes a suction line, a siphon valve, and a fluid line. The suction line is connected to the liquid supply line. The siphon valve includes an inlet, an outlet, and a fluid inlet. The inlet and the outlet are connected to the suction line. The fluid inlet is connected to the fluid line. The fluid line is used to introduce fluid into the siphon valve through the fluid inlet and allow the fluid to flow out from the outlet. The suction inlet draws in the liquid from the liquid supply line through the Bernoulli effect.
6. The drug circulation system according to claim 1, characterized in that, Also includes: A filter is installed in the liquid supply line; A discharge pipe, connected to the filter, is used to discharge the liquid medicine inside the filter; The drug circulation system is also configured to: When it is necessary to empty the liquid medicine in the filter, the gas in the purging pipeline purges the liquid medicine in the filter to the discharge pipeline and discharges it at a third predetermined output pressure; wherein, the third predetermined output pressure is greater than the first predetermined output pressure.
7. The drug circulation system according to claim 6, characterized in that, The range of the third predetermined output pressure is 50 PSI to 70 PSI.
8. The drug circulation system according to claim 1, characterized in that, The bottom surface of the liquid storage tank is inclined, and the outlet of the liquid storage tank is located at the lowest point of the inclined surface. The liquid circulation system also includes a drain pipe connected to the outlet for discharging the liquid from the storage tank.
9. The drug circulation system according to claim 8, characterized in that, The inlet of the liquid supply line is connected to the liquid discharge line, and the outlet of the liquid supply line is connected to the nozzle.
10. The drug circulation system according to claim 1, characterized in that, Also includes: A receiving cup, connected to the liquid storage tank, is used to receive the liquid medicine discharged from the nozzle and discharge the liquid medicine into the liquid storage tank.
11. A wet process equipment, characterized in that, include: The drug circulation system as described in any one of claims 1 to 10; as well as A chamber for processing a substrate, wherein a nozzle is disposed in the chamber for supplying a liquid medicine to the substrate.