Lifting control method and device for base in epitaxial cavity and epitaxial equipment

Abstract

The invention discloses a lifting control method and device for a base in an epitaxial cavity and epitaxial device.The method comprises the steps that lifting motion parameters of the base are obtained, the lifting motion parameters comprise the current lifting speed and the current lifting position, and when it is determined that the base is in an action state according to the current lifting speed, the lifting motion parameters are determined to be the current lifting position; a target lifting segment to which a current lifting position belongs is determined according to a plurality of preset lifting positions corresponding to a base, and then a target preset motor gain corresponding to the target lifting segment is determined according to lifting segment gain mapping information representing a corresponding relation between the lifting segment and a preset motor gain; according to the target preset motor gain, a servo motor is controlled to work so as to drive a lifting mechanism arranged at the bottom of the base to control lifting of the base, and therefore different preset motor gains can be adopted for controlling the servo motor used for driving the lifting mechanism to work according to the actual working conditions for different lifting segments; therefore, staged self-adaptive lifting control of the base is realized, and the stability of wafer transmission is improved.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and in particular to a method, apparatus and epitaxial device for controlling the lifting of a base in an epitaxial cavity. Background Technology

[0002] Epitaxial processes are used to form high-quality epitaxial layers on semiconductor substrates. Epitaxial growth is slow, the process time is long, and the process cost is also high. At the same time, the quality requirements for epitaxial processes are very high.

[0003] Epitaxial growth is performed within the epitaxial cavity of an epitaxial apparatus. This cavity contains a substrate for supporting the wafer, and a lifting mechanism at the bottom of the substrate controls its movement. This mechanism allows the substrate to be raised and lowered between multiple vertical positions, corresponding to different operating conditions. However, in related technologies, the lifting process of the substrate within the epitaxial cavity cannot meet the complex operating conditions, leading to unstable wafer transport. This results in jitter, overspeed, and overload during prolonged operation, adversely affecting the epitaxial growth process. Summary of the Invention

[0004] To address the problems of existing technologies, this application provides a method, apparatus, epitaxial device, and storage medium for controlling the lifting and lowering of a base in an epitaxial cavity. The technical solution is as follows:

[0005] On one hand, a method for controlling the lifting of a base in an extended cavity is provided, wherein the bottom of the base is provided with a lifting mechanism for lifting the base, the lifting mechanism being driven by a servo motor, and the method includes:

[0006] Obtain the lifting motion parameters of the base, including the current lifting speed and the current lifting position;

[0007] When the base is determined to be in an operational state based on the current lifting speed, the target lifting segment to which the current lifting position belongs is determined based on multiple preset lifting positions of the base in the vertical direction; the multiple preset lifting positions are determined based on the operating conditions of the base in the epitaxial growth process, and two adjacent preset lifting positions correspond to one lifting segment.

[0008] Based on the lift segment gain mapping information, the target preset motor gain corresponding to the target lift segment is determined; the lift segment gain mapping information represents the correspondence between the lift segment and the preset motor gain.

[0009] The servo motor is controlled to operate according to the preset motor gain of the target, so as to drive the lifting mechanism to control the lifting of the base.

[0010] In one exemplary embodiment, the lifting segment gain mapping information includes sub-gain mapping information corresponding to each lifting segment, wherein the sub-gain mapping information characterizes the correspondence between the lifting direction and the preset motor gain in the corresponding lifting segment; determining the target preset motor gain corresponding to the target lifting segment based on the lifting segment gain mapping information includes:

[0011] Determine the current lifting direction of the base in the target lifting segment;

[0012] Based on the target sub-gain mapping information corresponding to the target lifting segment in the lifting segment gain mapping information, the preset motor gain corresponding to the current lifting direction in the target sub-gain mapping information is determined, and the target preset motor gain is obtained.

[0013] In one exemplary embodiment, the target preset motor gain includes a first preset motor gain and a second preset motor gain, wherein the first preset motor gain indicates the motor gain in the operating state, and the second preset motor gain indicates the motor gain in the stopped state; controlling the servo motor to operate according to the target preset motor gain to control the lifting and lowering of the base includes:

[0014] For the base in the action state, the servo motor is controlled to work according to the first preset motor gain in the target preset motor gain;

[0015] After the base switches from the active state to the stopped state, the servo motor is controlled to work according to the second preset motor gain in the target preset motor gain.

[0016] In an exemplary embodiment, the second preset motor gain includes a target preset base motor gain corresponding to the target preset lifting position, and a second sub-preset motor gain that is positively correlated with the target preset base motor gain. The target preset lifting position is a preset lifting position in the target lifting segment that matches the current lifting direction. The step of controlling the servo motor to operate according to the second preset motor gain in the target preset motor gain after the base switches from an active state to a stopped state includes:

[0017] During the first preset time period after the base switches from the active state to the stopped state, the servo motor is controlled to work according to the second sub-preset motor gain in the second preset motor gain.

[0018] After the first preset time period, the servo motor is controlled to work according to the target preset base motor gain corresponding to the target preset lifting position in the second preset motor gain.

[0019] In one exemplary embodiment, the preset base motor gain corresponding to the plurality of preset lifting positions is inversely correlated with the vertical height of the corresponding preset lifting position.

[0020] In one exemplary embodiment, the method further includes:

[0021] When it is determined that the base is in a completely stopped state based on the current lifting speed, the current lifting position is determined to be the matching preset lifting position among the plurality of preset lifting positions;

[0022] The servo motor is controlled to operate according to the preset base motor gain corresponding to the preset lifting position.

[0023] In one exemplary embodiment, determining the target lifting segment to which the current lifting position belongs based on a plurality of preset lifting positions corresponding to the base includes:

[0024] Obtain the current starting position of the base;

[0025] If the current starting position belongs to any of the preset lifting positions, the target lifting segment to which the current lifting position belongs is determined according to the multiple preset lifting positions corresponding to the base;

[0026] If the current starting position does not belong to any of the preset lifting positions, the servo motor is controlled to work according to the third preset motor gain; wherein, the third preset motor gain is the average of the preset motor gains in the lifting segment gain mapping information.

[0027] On the other hand, a lifting control device for a base in an extended cavity is provided, wherein the bottom of the base is provided with a lifting mechanism for lifting the base, the lifting mechanism being driven by a servo motor, and the device includes:

[0028] The lifting motion parameter acquisition module is used to acquire the lifting motion parameters of the base, including the current lifting speed and the current lifting position;

[0029] The lifting segment determination module is used to determine the target lifting segment to which the current lifting position belongs based on multiple preset lifting positions of the base in the vertical direction when the base is determined to be in an operating state according to the current lifting speed; the multiple preset lifting positions are determined according to the operating conditions of the base in the epitaxial growth process, and two adjacent preset lifting positions correspond to one lifting segment.

[0030] The motor gain determination module is used to determine the target preset motor gain corresponding to the target lifting segment based on the lifting segment gain mapping information; the lifting segment gain mapping information represents the correspondence between the lifting segment and the preset motor gain.

[0031] The control module is used to control the servo motor to work according to the target preset motor gain, so as to drive the lifting mechanism to control the lifting of the base.

[0032] In one exemplary embodiment, the lifting segment gain mapping information includes sub-gain mapping information corresponding to each lifting segment, wherein the sub-gain mapping information characterizes the correspondence between the lifting direction in the corresponding lifting segment and the preset motor gain; the motor gain determination module includes:

[0033] The lifting direction determination module is used to determine the current lifting direction of the base in the target lifting segment;

[0034] The motor gain determination submodule is used to determine the preset motor gain corresponding to the current lifting direction in the target sub-gain mapping information based on the target sub-gain mapping information corresponding to the target lifting segment in the lifting segment gain mapping information, and obtain the target preset motor gain.

[0035] In one exemplary embodiment, the target preset motor gain includes a first preset motor gain and a second preset motor gain, wherein the first preset motor gain indicates the motor gain in the operating state, and the second preset motor gain indicates the motor gain in the stopped state; the control module includes:

[0036] The first control submodule is used to control the servo motor to work according to the first preset motor gain in the target preset motor gain for the base in the action state;

[0037] The second control submodule is used to control the servo motor to work according to the second preset motor gain in the target preset motor gain after the base switches from the active state to the stop state.

[0038] In one exemplary embodiment, the second preset motor gain includes a target preset base motor gain corresponding to the target preset lifting position, and a second sub-preset motor gain positively correlated with the target preset base motor gain. The target preset lifting position is a preset lifting position in the target lifting segment that matches the current lifting direction. The second control submodule includes:

[0039] The switching control submodule is used to control the servo motor to work according to the second sub-preset motor gain in the second preset motor gain during a first preset time period after the base switches from the action state to the stop state;

[0040] The complete control submodule controls the servo motor to work according to the target preset base motor gain corresponding to the target preset lifting position in the second preset motor gain after the first preset time period.

[0041] In one exemplary embodiment, the apparatus further includes:

[0042] The position matching module is used to determine the matching preset lifting position among a plurality of preset lifting positions when the base is determined to be in a completely stopped state based on the current lifting speed.

[0043] The third control submodule is used to control the servo motor to work according to the preset base motor gain corresponding to the matched preset lifting position.

[0044] In one exemplary embodiment, the elevation segment determination module includes:

[0045] The starting position acquisition module is used to acquire the current starting position of the base;

[0046] The first determining module is used to determine the target lifting segment to which the current lifting position belongs, based on the multiple preset lifting positions corresponding to the base, when the current starting action position belongs to any of the preset lifting positions.

[0047] The fourth control submodule is used to control the servo motor to work according to the third preset motor gain when the current starting position does not belong to any of the preset lifting positions; wherein the third preset motor gain is the average of the preset motor gains in the lifting segment gain mapping information.

[0048] On the other hand, an epitaxial device is provided, comprising:

[0049] epitaxial cavity;

[0050] A base, disposed within the epitaxial cavity, is used to support the wafer;

[0051] A lifting assembly, including a lifting mechanism and a servo motor, wherein the lifting mechanism is disposed at the bottom of the base and is used to control the lifting of the base under the drive of the servo motor; and a lifting control device for the base in the extended cavity as described in claim 8.

[0052] On the other hand, a storage medium is provided that stores at least one instruction or at least one program, which is loaded and executed by a processor to implement the lifting and lowering control method of the base in the epitaxial cavity as described above.

[0053] This application embodiment acquires the lifting motion parameters of the base, including the current lifting speed and the current lifting position. Based on the current lifting speed, it determines that the base is in an operational state. Then, based on multiple preset lifting positions corresponding to the base, it determines the target lifting segment to which the current lifting position belongs. These preset lifting positions are determined according to the operating conditions of the base in the epitaxial growth process. Furthermore, based on the lifting segment gain mapping information characterizing the correspondence between the lifting segment and the preset motor gain, it determines the target preset motor gain corresponding to the target lifting segment. The servo motor is then controlled according to this target preset motor gain to drive the lifting mechanism located at the bottom of the base, controlling the lifting of the base. Thus, different lifting segments can use different preset motor gains to control the servo motor driving the lifting mechanism according to actual operating conditions, achieving phased adaptive lifting control of the base. This effectively meets the complex operating conditions of the base lifting process in the epitaxial cavity, improves the stability of each lifting stage, avoids phenomena such as jitter, overspeed, and overload during long-term operation, and enhances the stability of wafer transfer in the epitaxial growth process. Attached Figure Description

[0054] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0055] Figure 1 This is a flowchart illustrating a method for controlling the lifting of a base in an epitaxial cavity, as provided in an embodiment of this application.

[0056] Figure 2 This is a flowchart illustrating another method for controlling the lifting of a base in an epitaxial cavity, as provided in an embodiment of this application.

[0057] Figure 3 This is a flowchart illustrating another method for controlling the lifting of a base in an epitaxial cavity, as provided in an embodiment of this application.

[0058] Figure 4 This is a flowchart illustrating another method for controlling the lifting of a base in an epitaxial cavity, as provided in an embodiment of this application.

[0059] Figure 5This is an example of the lifting and lowering process of the base provided in the embodiments of this application;

[0060] Figure 6 This is an example of a lifting control method for a base in an epitaxial cavity provided in an embodiment of this application;

[0061] Figure 7 This is a structural block diagram of a lifting control device for a base in an extensional cavity, provided in an embodiment of this application. Detailed Implementation

[0062] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0063] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe specific objects or a sequence. It should be understood that such data can be interchanged where appropriate so that the embodiments of this application described herein can be implemented in sequences other than those illustrated or described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or server that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or devices.

[0064] It should be understood that when an element or layer is referred to as "on," "adjacent to," "connected to," or "coupled to" other elements or layers, it may be directly on, adjacent to, connected to, or coupled to other elements or layers, or there may be intervening elements or layers. Conversely, when an element is referred to as "directly on," "directly adjacent to," "directly connected to," or "directly coupled to" other elements or layers, there are no intervening elements or layers. It should be understood that although the terms first, second, third, etc., may be used to describe various elements, components, areas, layers, and / or portions, these elements, components, areas, layers, and / or portions should not be limited by these terms. These terms are only used to distinguish one element, component, area, layer, or portion from another element, component, area, layer, or portion. Therefore, without departing from the teachings of this application, the first element, component, area, layer, or portion discussed below may be referred to as a second element, component, area, layer, or portion. And the discussion of a second element, component, area, layer, or portion does not imply that the first element, component, area, layer, or portion necessarily exists in this application.

[0065] In the manufacturing process of semiconductor devices, epitaxial growth processes are typically used to form epitaxial films on the surface of wafers, such as germanium-silicon films. Commonly used epitaxial equipment typically includes an epitaxial cavity, a substrate, a lifting assembly, and a controller. The substrate, housed within the epitaxial cavity, supports the wafer undergoing epitaxial growth. The lifting assembly, which controls the lifting of the substrate, includes a lifting mechanism and a servo motor. The lifting mechanism is located at the bottom of the substrate, and the servo motor drives it to move vertically, thus raising and lowering the substrate. Specifically, the servo motor drives a lead screw to rotate, extending vertically. The lifting mechanism, through a mechanism such as a slider threaded into the lead screw, moves up and down with the lead screw, raising and lowering the substrate. The controller controls the operation of the servo motor. In practical applications, epitaxial equipment often also includes a rotation module to rotate the substrate, meeting the process requirements for epitaxial growth of the wafer supported on the substrate.

[0066] In the actual epitaxial growth process (before epitaxial growth - during epitaxial growth - after epitaxial growth), the base in the epitaxial cavity needs to move up and down between multiple preset lifting positions in the vertical direction. These multiple preset lifting positions are determined according to the operating conditions of the base in the epitaxial growth process.

[0067] Taking the operation of the substrate in the epitaxial growth process as an example, including placing the wafer before epitaxial growth, performing epitaxial growth, and retrieving the wafer after epitaxial growth, the wafer placement and retrieval from the substrate can be achieved by a robotic arm that only performs telescopic movements. The substrate is vertically configured with, from bottom to top, a first preset lifting position for placing the wafer (hereinafter referred to as the low position / robotic arm action position), a second preset lifting position for retrieving the wafer (hereinafter referred to as the middle position / robotic arm action position), and a third preset lifting position for performing epitaxial growth (hereinafter referred to as the high position / process position). Therefore, during the epitaxial growth of the wafer... The movement of the substrate during the process can be as follows: the lifting mechanism controls the substrate to a low position (robotic arm operation position) so that the robotic arm can transport the wafer into the epitaxial cavity and place the wafer on the substrate --> the lifting mechanism controls the substrate to rise to a middle position (robotic arm operation position) so that the robotic arm can withdraw from the epitaxial cavity --> the lifting mechanism controls the substrate to rise to a high position (process position) so that the wafer can undergo epitaxial growth --> the lifting mechanism controls the substrate to descend to a middle position so that the robotic arm can extend into the epitaxial cavity --> the lifting mechanism controls the substrate to descend to a low position so that the robotic arm can transport the wafer on the substrate and withdraw it from the epitaxial cavity. In other words, the above-mentioned substrate lifting process includes: from low position (robotic arm operation position) --> middle position (robotic arm operation position) --> high position (process position), and then from high position (process position) --> middle position (robotic arm operation position) --> low position (robotic arm operation position).

[0068] In the process of realizing this invention, the inventors discovered that the lifting process of the base in the epitaxial cavity is subject to the inability to match the operating conditions with the motor gain of the servo motor driving the lifting mechanism in real time. As a result, the lifting process of the base cannot meet the complex operating conditions, and the wafer transfer process cannot be stably transmitted. Long-term operation may result in phenomena such as jitter, overspeed, and overload, which will have an adverse effect on the epitaxial growth process. The inventors further analyzed the movement process of the base during the epitaxial growth process and found that during the movement of the base from high position to middle position to low position, the load torque gradually increases due to the downward vacuum force of the epitaxial chamber, the downward weight of the rotating module used to rotate the base, and the presence of a downward spring force. If the motor rigidity is low during this process, overload and oscillation are likely to occur. Conversely, during the movement of the base from low position to middle position to high position, the load torque gradually decreases due to the upward vacuum force of the epitaxial chamber, the downward weight of the rotating module used to rotate the base, and the presence of an upward spring force. If the motor rigidity is high during this process, overspeed and vibration are likely to occur. In addition, during the operation of the base, if the motor rigidity is high, the motor response is high, and overshoot is likely to occur. Conversely, during the stopping process of the base, if the motor rigidity is low, the motor response is poor, and lag is likely to occur.

[0069] In view of the above, embodiments of this application provide a lifting control method for a base in an extended cavity. This method determines multiple lifting segments for multiple preset lifting positions of the base in the vertical direction, with each pair of adjacent preset lifting positions corresponding to a lifting segment. Lifting segment gain mapping information is pre-configured, representing the correspondence between the lifting segment and a preset motor gain. Different lifting segments can be set with different preset motor gains according to actual working conditions. The controller then acquires the lifting motion parameters of the base, including the current lifting speed and current lifting position, and determines the base is in motion based on the current lifting speed. In this state, the target lifting segment to which the current lifting position belongs is determined based on multiple preset lifting positions of the base in the vertical direction. Then, the target preset motor gain corresponding to the target lifting segment is determined based on the lifting segment gain mapping information. The servo motor is controlled to work according to the target preset motor gain to drive the lifting mechanism to control the lifting of the base. This realizes the staged adaptive lifting control of the base, which well meets the complex working conditions of the base lifting process in the epitaxial cavity, improves the stability of each lifting stage, avoids the occurrence of jitter, overspeed, overload and other phenomena during long-term operation, and improves the stability of wafer transmission in the epitaxial growth process.

[0070] To make the above-mentioned objectives, features and advantages of the embodiments of this application more apparent and understandable, the technical solutions of the embodiments of this application will be described in detail below with reference to the accompanying drawings.

[0071] Please see Figure 1 The diagram shown is a flowchart illustrating a method for controlling the lifting and lowering of a base in an epitaxial cavity, as provided in an embodiment of this application. Figure 1 As shown, the method may include the following steps S101 to S107:

[0072] In step S101: the lifting motion parameters of the base are obtained, including the current lifting speed and the current lifting position.

[0073] Specifically, the controller can acquire the lifting and lowering motion parameters of the base according to a preset time interval. This preset time interval can be set based on actual control needs. Generally, the smaller the preset time interval is set, the stronger the real-time control of the base, which is more conducive to improving the stability of the base lifting and lowering; conversely, the larger the preset time interval is set, the weaker the real-time control of the base.

[0074] In this embodiment, the acquired lifting motion parameters may include the current lifting speed and current lifting position of the base. The current lifting speed indicates whether the base is currently in an active or stationary state. Specifically, if the current lifting speed is greater than 0, it indicates that the base is currently in an active state; conversely, if the current lifting speed is equal to 0, it indicates that the base is currently stationary. The current lifting position is the current vertical position of the base. In specific implementations, the current lifting speed of the base can be obtained through a received speed feedback signal, and the current lifting position can be obtained through a received position feedback signal.

[0075] In step S103: when it is determined that the base is in an active state based on the current lifting speed, the target lifting segment to which the current lifting position belongs is determined based on multiple preset lifting positions of the base in the vertical direction.

[0076] The multiple preset lifting positions of the base are determined according to the operating conditions of the base in the epitaxial growth process. Two adjacent preset lifting positions correspond to a lifting segment, and thus the multiple preset lifting positions can correspond to multiple lifting segments.

[0077] Taking the aforementioned operating conditions of the substrate in the epitaxial growth process, including wafer placement, epitaxial growth, and wafer retrieval, as an example, the substrate has multiple preset lifting positions in the vertical direction, which are arranged from bottom to top as low, middle, and high. The low position corresponds to the robot arm action position for wafer placement, the middle position corresponds to the robot arm action position for wafer retrieval, and the high position corresponds to the process position for epitaxial growth. These multiple preset lifting positions correspond to two lifting segments: the first lifting segment between the low and middle positions, and the second lifting segment between the middle and high positions. This determines the target lifting segment to which the current lifting position belongs. For example, if the current lifting position is at a certain position between the low and middle positions, the target lifting segment can be determined as the first lifting segment; if the current lifting position is at a certain position between the middle and high positions, the target lifting segment can be determined as the second lifting segment.

[0078] In step S105: the target preset motor gain corresponding to the target lifting segment is determined according to the lifting segment gain mapping information.

[0079] Among them, the lifting segment gain mapping information represents the correspondence between the lifting segment and the preset motor gain, so that when a certain lifting segment is specified, its corresponding preset motor gain can be found based on the lifting segment gain mapping information.

[0080] Specifically, the lifting segment gain mapping information may include multiple preset lifting positions of the base corresponding to multiple lifting segments and multiple preset motor gains, with each preset motor gain corresponding to one of the multiple lifting segments. Different lifting segments can correspond to different preset motor gains, thereby ensuring that the preset motor gain of each lifting segment can be matched with the specific operating conditions of that lifting segment.

[0081] Continuing with the example above, the multiple lifting segments can be the first lifting segment between the low and middle positions, and the second lifting segment between the middle and high positions. For example, the lifting segment gain mapping information can be {[first lifting segment, preset motor gain 1], [second lifting segment, preset motor gain 2]}. Thus, if the current lifting position is at a certain position between the low and middle positions, the target lifting segment is the first lifting segment, and the target preset motor gain can be determined to be preset motor gain 1. If the current lifting position is at a certain position between the middle and high positions, the target lifting segment is the second lifting segment, and the target preset motor gain can be determined to be preset motor gain 2.

[0082] In step S107: The servo motor is controlled to work according to the above-mentioned target preset motor gain, so as to drive the lifting mechanism to control the lifting of the base.

[0083] Specifically, the servo motor is controlled to operate according to the target preset motor gain, thereby adjusting the rigidity of the servo motor so that the rigidity of the servo motor matches the load torque generated by the base during the target lifting phase. This avoids overload and swaying of the base during the target lifting phase and improves the stability of the wafer transfer process.

[0084] The above-described implementation method uses the current lifting position of the base to perform phased adaptive lifting control of the base operation, which improves the stability of each lifting stage and avoids phenomena such as jitter, overspeed, and overload during long-term operation, thus helping to improve the stability of wafer transport in the epitaxial growth process.

[0085] Considering the different load torques generated by the base during descent and ascent, typically increasing gradually during descent and decreasing gradually during ascent, to achieve more precise control and further improve the stability of the wafer transfer process, in some exemplary embodiments, the lift-segment gain mapping information includes sub-gain mapping information corresponding to each lift segment. This sub-gain mapping information characterizes the correspondence between the lift direction and the preset motor gain in the corresponding lift segment. For example, the lift-segment gain mapping information is {[first lift segment: (ascent, preset motor gain 1), (descent, preset motor gain 2)], [second lift segment: (ascent, preset motor gain 3), (descent, preset motor gain 4)]}, where "(ascent, preset motor gain 1), (descent, preset motor gain 2)" is the sub-gain mapping information corresponding to the first lift segment, and "(ascent, preset motor gain 3), (descent, preset motor gain 4)" is the sub-gain mapping information corresponding to the second lift segment. Therefore, for the same lifting segment, the motor gain corresponding to the lifting direction can be configured for different lifting directions, so that the motor gain corresponding to the lifting direction is more matched with the load torque generated by the base when the lifting segment is running.

[0086] Based on this, such as Figure 2 As shown, the aforementioned step S105 may include the following during implementation:

[0087] In step S201: Determine the current lifting direction of the base in the target lifting segment.

[0088] In specific implementation, the current lifting direction of the base in the target lifting segment can be determined based on the position difference between the target preset lifting position to which the base is to be moved and the current lifting position. If the position difference between the target preset lifting position and the current lifting position is greater than 0, it indicates that the current lifting direction of the base in the target lifting segment is upward. If the position difference between the target preset lifting position and the current lifting position is less than 0, it indicates that the current lifting direction of the base in the target lifting segment is downward.

[0089] In step S203: Based on the target sub-gain mapping information corresponding to the target lifting segment in the lifting segment gain mapping information, determine the preset motor gain corresponding to the current lifting direction in the target sub-gain mapping information, and obtain the target preset motor gain.

[0090] Continuing with the example above, assuming the target lifting segment is the first lifting segment, the target sub-gain mapping information is "(rising, preset motor gain 1), (falling, preset motor gain 2)". If the current lifting direction is rising, the target preset motor gain can be determined to be preset motor gain 1. If the current lifting direction is falling, the target preset motor gain can be determined to be preset motor gain 2.

[0091] In some exemplary embodiments, the preset motor gain corresponding to each lifting direction in the sub-gain mapping information may include the motor gain corresponding to the operating state and the motor gain corresponding to the stopped state, so that the motor gain can be switched when the base stops moving, so as to perform more precise control and further improve the stability of wafer transmission.

[0092] Based on this, the target preset motor gain may include a first preset motor gain and a second preset motor gain. The first preset motor gain indicates the motor gain in the operating state, and the second preset motor gain indicates the motor gain in the stopped state. Typically, the first preset motor gain needs to be greater than the second preset motor gain, and so on... Figure 2 As shown, the aforementioned step S107 may include the following during implementation:

[0093] In step S205: For the base in the operating state, the servo motor is controlled to work according to the first preset motor gain in the target preset motor gain.

[0094] In step S207: after the base switches from the active state to the stopped state, the servo motor is controlled to work according to the second preset motor gain in the target preset motor gain.

[0095] In the above embodiments, by switching the motor gain when the action stops, the stability of the base movement process can be further improved, thereby improving the stability of wafer transmission.

[0096] In some exemplary embodiments, the motor gain corresponding to the stop state in the sub-gain mapping information can be configured as different motor gains corresponding to multiple stop stages according to the stopping process of the base. Specifically, the motor gain corresponding to the stop state can include the motor gain corresponding to the initial stop state and the motor gain corresponding to the complete stop state. The initial stop state can be within the first preset time period after switching to the stop, and the complete stop state can be after the first preset time period after the stop, thereby achieving more precise control and further improving the stability of wafer transmission.

[0097] For example, a corresponding preset base motor gain can be configured for each of a plurality of preset lifting positions, and the preset base motor gain corresponding to each preset lifting position is inversely correlated with the vertical height of the corresponding preset lifting position. As mentioned earlier regarding low, middle, and high positions, assuming the preset base motor gain for the low position is C, the preset base motor gain for the middle position is B, and the preset base motor gain for the high position is A, then the preset base motor gain C > preset base motor gain B > preset base motor gain A. This can further improve the stability of the base operation, thereby improving the stability of the wafer operation.

[0098] Based on this, the second preset motor gain in the target preset motor gain can include the target preset base motor gain corresponding to the target preset lifting position, and a second sub-preset motor gain that is positively correlated with the target preset base motor gain. For example, the second sub-preset motor gain is an integer multiple of the target preset base motor gain (e.g., 2 times). The target preset lifting position is the preset lifting position in the target lifting segment that matches the aforementioned current lifting direction. Continuing the above example, assuming the target lifting segment is the first lifting segment between the low position and the middle position, and the current lifting direction is upward, then the target preset lifting position is the middle position. Therefore, the target preset base motor gain is the preset base motor gain B, and the second sub-preset motor gain is 2*B. Furthermore, as... Figure 3 As shown, the aforementioned step S207 may include the following during implementation:

[0099] In step S301: During the first preset time period after the base switches from the active state to the stopped state, the servo motor is controlled to work according to the second sub-preset motor gain in the second preset motor gain.

[0100] In step S303: After the first preset time period, the servo motor is controlled to work according to the target preset base motor gain corresponding to the target preset lifting position in the second preset motor gain.

[0101] Specifically, the duration of the first preset time period can be set based on practical experience. For example, the first preset time period can be 1 second, after which it can be considered to have entered a completely stopped state. Continuing the example above, a servo motor based on a 2*B motor gain system can operate for the first second after stopping, and a servo motor based on a B motor gain system can operate after the stop exceeds 1 second. This allows for more precise control of the base during the stopping process, further improving the stability of wafer transmission.

[0102] In some exemplary implementations, such as Figure 4 As shown, the method may further include:

[0103] In step S401: when it is determined that the base is in a completely stopped state based on the current lifting speed, the matching preset lifting position is determined among the plurality of preset lifting positions.

[0104] In step S403: The servo motor is controlled to work according to the preset base motor gain corresponding to the preset lifting position.

[0105] Specifically, the lifting segment gain mapping information includes not only a one-to-one correspondence between multiple lifting segments and multiple preset motor gains, but also a one-to-one correspondence between multiple preset lifting positions and multiple preset base motor gains, and the preset motor gain corresponding to each lifting segment is associated with the preset base motor gain of the preset lifting position involved in that lifting segment.

[0106] When the current lifting speed of the base is 0 and a completion feedback signal is received, it indicates that the base is currently in a completely stopped state. At this time, a preset lifting position that matches the current lifting position can be found from multiple preset lifting positions to determine the specific preset lifting position where the base is currently stopped, i.e., the matching preset lifting position. Then, the correspondence between the preset lifting position and the preset base motor gain in the lifting segment gain mapping information can be found to determine the preset base motor gain corresponding to the matching preset lifting position. The servo motor is then controlled according to the preset base motor gain corresponding to the matching preset lifting position, thereby achieving more precise control, improving the operational stability of the base during the epitaxial growth process, and enhancing the transmission stability of the wafer carried on it.

[0107] Considering that during the process of the servo motor driving the lifting mechanism to control the lifting of the base, a malfunction may cause the base to stop at any lifting position. Therefore, when the base resumes operation after the malfunction is resolved, its starting point will not belong to any preset lifting position. That is, the operating conditions of the base in this scenario differ from those during normal epitaxial growth. To ensure the stability of the base's operation, in some exemplary embodiments, the aforementioned step S103, when determining the target lifting segment to which the current lifting position belongs based on multiple preset lifting positions of the base in the vertical direction, may include:

[0108] Obtain the current starting position of the base;

[0109] If the current starting position belongs to any of the preset lifting positions, the target lifting segment to which the current lifting position belongs is determined according to the multiple preset lifting positions corresponding to the base;

[0110] If the current starting position does not belong to any of the preset lifting positions, the servo motor is controlled to work according to the third preset motor gain; wherein, the third preset motor gain is the average of the preset motor gains in the lifting segment gain mapping information.

[0111] Specifically, in addition to the one-to-one correspondence between multiple lifting segments and multiple preset motor gains, and the one-to-one correspondence between multiple preset lifting positions and multiple preset base motor gains, the lifting segment gain mapping information may also include a third preset motor gain corresponding to any lifting position, and the third preset motor gain is the average of the preset motor gains in the lifting segment gain mapping information.

[0112] In specific implementation, the third preset motor gain may also include a motor gain corresponding to the operating state and a motor gain corresponding to the stopped state, with the motor gain corresponding to the operating state being greater than the motor gain corresponding to the stopped state. Therefore, the motor gain corresponding to the operating state in the third preset motor gain is the average of the motor gains corresponding to the operating state in the preset motor gains for each lifting direction in each lifting segment, and the motor gain corresponding to the stopped state in the third preset motor gain is the average of the motor gains corresponding to the stopped state in the preset motor gains for each lifting direction in each lifting segment.

[0113] For example, a preset base motor gain can also be configured for any lifting position. The preset base motor gain corresponding to any lifting position can be the average of the preset base motor gains of multiple preset lifting positions. Furthermore, the motor gain corresponding to the stop state in the third preset motor gain can also include different motor gains corresponding to two stop stages. Specifically, during the first preset time period when switching from the operating state to the stop state, the servo motor is controlled to work based on an integer multiple (such as 2 times) of the preset base motor gain corresponding to the above-mentioned arbitrary lifting position. After the first preset time period, the servo motor is controlled to work based on the preset base motor gain corresponding to the arbitrary lifting position.

[0114] To facilitate understanding of the technical solutions in the embodiments of this application, the following is combined with... Figure 5 and Figure 6 Let's illustrate this with a specific example. For instance... Figure 5 As shown, in this example, the lifting process of the base includes upward movement from bottom to top: low position (robot operation position) --> middle position (robot operation position) --> high position (process position), and downward movement from top to bottom: high position (process position) --> middle position (robot operation position) --> low position (robot operation position). Specifically:

[0115] ① indicates the transition from the high-position slot 1 (process position) to the middle-position slot 2 (robot action position);

[0116] ② indicates the sequence from the middle slot 2 (robot arm action position) to the lower slot 3 (robot arm action position);

[0117] ③ indicates the sequence from the low slot 3 (robotic arm action position) to the middle slot 2 (robotic arm action position);

[0118] ④ indicates the transition from the middle slot 2 (robot action position) to the high slot 1 (process position);

[0119] ⑤ indicates the movement from any arbitrary lifting position to the target preset lifting position.

[0120] Therefore, the ascending and descending piecewise gain mapping information in this example can be represented as:

[0121] {(high slot1: gain of motor A), (middle slot2: gain of motor B), (low slot3: gain of motor C), (any lifting or lowering position: gain of motor D)};

[0122] {(high slot1, middle slot2), [(rising: a1 motor gain -> 200% A motor gain -> A motor gain); (falling: b1 motor gain -> 200% B motor gain -> B motor gain)]};

[0123] {(Middle slot2, Low slot3), [(Ascending: b1 motor gain -> 200% B motor gain -> B motor gain); (Descending: c1 motor gain -> 200% C motor gain -> C motor gain)]};

[0124] {(arbitrary lifting position, target preset lifting position), (d1 motor gain -> 200% D motor gain -> D motor gain)};

[0125] Among them, ① from the high-position slot 1 (process position) to the middle-position slot 2 (robot operation position):

[0126] Motor gain b1 > Motor gain B

[0127] ②From the middle slot 2 (robotic arm movement position) to the lower slot 3 (robotic arm movement position):

[0128] Motor gain c1 < motor gain C (considering the unstable spring force at the lowest bit).

[0129] ③ From the low slot 3 (robotic arm movement position) to the middle slot 2 (robotic arm movement position):

[0130] Motor gain b2 > Motor gain B

[0131] ④ From the middle slot 2 (robot operation position) to the high slot 1 (process position):

[0132] Motor gain a1 > Motor gain A

[0133] ⑤ From any elevation position to the target preset elevation position:

[0134] Motor gain d1 > Motor gain D

[0135] overall:

[0136] Motor gain c1 > Motor gain b2 > Motor gain b1 > Motor gain a1

[0137] Motor gain C > Motor gain B > Motor gain A

[0138] Motor gain d1 = (motor gain c1 + motor gain b2 + motor gain b1 + motor gain a1) / 4

[0139] Motor gain D = (Motor gain C + Motor gain B + Motor gain A) / 3

[0140] Combining the above-mentioned ascending and descending piecewise gain mapping information, such as Figure 6 The specific control process shown is as follows:

[0141] Determine if the current lifting speed of the base is greater than 0. If the current lifting speed is greater than 0, further determine if the current lifting position of the base belongs to a lifting segment (high slot1, middle slot2) based on the current starting lifting position of the base. If it does, determine if the position difference between the target preset lifting position and the current lifting position is greater than 0. If the position difference is greater than 0, it indicates an upward direction. At this time, it can be based on {(high slot1, middle slot2), [(rising: gain of motor a1 -> 200% gain of motor A -> gain of motor A); (falling: gain of motor b1 -> 200% gain of motor B -> gain of motor B) -> gain of motor B ... The preset motor gain corresponding to the upward direction in {(high slot1, middle slot2), [(upward: a1 motor gain -> 200% A motor gain -> A motor gain); (downward: b1 motor gain -> 200% B motor gain -> B motor gain)]} corresponds to the preset motor gain corresponding to the downward ... B motor gain -> B motor gain);]} corresponds to the preset motor gain corresponding to the downward direction in {(high slot1, middle slot2), [(upward: a1 motor gain -> 200% A motor gain -> A motor gain);]} corresponds to the preset motor gain corresponding to the downward direction in {(high slot1, middle slot2), [(upward: a1 motor gain -> 200% B motor gain -> B motor gain);]} corresponds to the preset motor gain corresponding to the downward direction in {(high slot1, middle slot2), [(upward: a1 motor gain -> 200% B motor gain -> B motor gain);]}

[0142] If it does not belong to the ascending / descending segment (high slot1, middle slot2), then determine if it belongs to the ascending / descending segment (middle slot2, low slot3). If it does, further determine if the position difference between the target preset ascending / descending position and the current ascending / descending position is less than 0. If the position difference is less than 0, it indicates a descending direction. At this time, the corresponding descending direction can be determined based on {(middle slot2, low slot3), [(ascending: b1 motor gain -> 200% B motor gain -> B motor gain); (descending: c1 motor gain -> 200% C motor gain -> C motor gain)]}. The preset motor gain for the direction is c1 motor gain -> 200% C motor gain -> C motor gain to control the servo motor. If the position difference is greater than 0, it indicates an upward direction. The servo motor can be controlled based on the preset motor gain for the upward direction in {(middle slot2, low slot3), [(upward: b1 motor gain -> 200% B motor gain -> B motor gain); (downward: c1 motor gain -> 200% C motor gain -> C motor gain)]}, i.e., b1 motor gain -> 200% B motor gain -> B motor gain.

[0143] If it does not belong to the lifting segment (middle slot2, low slot3), then the servo motor is controlled based on the preset motor gain in {(arbitrary lifting position, target preset lifting position), (d1 motor gain -> 200% D motor gain -> D motor gain)}, i.e., d1 motor gain -> 200% D motor gain -> D motor gain.

[0144] If the current lifting speed is 0 and a completion feedback signal is received, it indicates that the base is currently in a completely stopped state. At this point, it can be determined whether the current lifting position is high slot 1. If it is high slot 1, the servo motor can be controlled based on the preset base motor gain (i.e., motor A gain) of high slot 1 in {(high slot 1: motor A gain), (middle slot 2: motor B gain), (low slot 3: motor C gain), (any lifting position: motor D gain)}. If it is not high slot 1, it is further determined whether the current lifting position is middle slot 2. If it is middle slot 2, the servo motor can be controlled based on the preset base motor gain (i.e., motor A gain) of high slot 1 in {(high slot 1: motor A gain), (middle slot 2: motor B gain), (low slot 3: motor C gain), (any lifting position: motor D gain)}. The preset base motor gain of the middle slot 2, i.e., the gain of motor B, controls the operation of the servo motor. If it is not the middle slot 2, then it is further determined whether the current lifting position is the lower slot 3. If it is the lower slot 3, the servo motor can be controlled based on the preset base motor gain of the lower slot 3, i.e., the gain of motor C, in {(high slot 1: gain of motor A), (middle slot 2: gain of motor B), (low slot 3: gain of motor C), (any lifting position: gain of motor D)}. If it is not the lower slot 3, the servo motor can be controlled based on the preset base motor gain of any lifting position, i.e., the gain of motor D, in {(high slot 1: gain of motor A), (middle slot 2: gain of motor B), (low slot 3: gain of motor C), (any lifting position: gain of motor D)}.

[0145] As can be seen, the above-described implementation method, for the lifting mechanism of the lifting base, by performing phased adaptive control of the motor gain of the servo motor driving the lifting mechanism, meets the complex working conditions of the epitaxial base lifting process, improves the stability of the base in each lifting stage, and avoids the occurrence of phenomena such as shaking, overspeed, and overload during long-term operation. This not only improves the stability of wafer transfer in the epitaxial growth process, but also reduces the equipment failure rate and improves the overall stability of the epitaxial growth process.

[0146] Corresponding to the lifting control methods for the base in the epitaxial cavity provided in the above embodiments, this application also provides a lifting control method apparatus for the base in the epitaxial cavity. Since the lifting control method apparatus for the base in the epitaxial cavity provided in this application corresponds to the lifting control methods for the base in the epitaxial cavity provided in the above embodiments, the implementation methods of the aforementioned lifting control methods for the base in the epitaxial cavity are also applicable to the lifting control method apparatus for the base in the epitaxial cavity provided in this embodiment, and will not be described in detail in this embodiment.

[0147] Please see Figure 7 The diagram shows a structural schematic of a lifting control device for a base in an epitaxial cavity according to an embodiment of this application. This device has the function of implementing the lifting control method for the base in the epitaxial cavity described in the above-described method embodiments. This function can be implemented by hardware or by hardware executing corresponding software. Specifically, a lifting mechanism for raising and lowering the base is provided at the bottom of the base. This lifting mechanism is driven by a servo motor, such as... Figure 7 As shown, the lifting control device 700 of the base in the extended cavity may include:

[0148] The lifting motion parameter acquisition module 710 is used to acquire the lifting motion parameters of the base, including the current lifting speed and the current lifting position;

[0149] The lifting segment determination module 720 is used to determine the target lifting segment to which the current lifting position belongs based on multiple preset lifting positions of the base in the vertical direction when the base is determined to be in an operating state according to the current lifting speed; the multiple preset lifting positions are determined according to the operating conditions of the base in the epitaxial growth process, and two adjacent preset lifting positions correspond to one lifting segment.

[0150] The motor gain determination module 730 is used to determine the target preset motor gain corresponding to the target lifting segment based on the lifting segment gain mapping information; the lifting segment gain mapping information represents the correspondence between the lifting segment and the preset motor gain.

[0151] The control module 740 is used to control the servo motor to work according to the target preset motor gain, so as to drive the lifting mechanism to control the lifting of the base.

[0152] In one exemplary embodiment, the lifting segment gain mapping information includes sub-gain mapping information corresponding to each lifting segment, wherein the sub-gain mapping information characterizes the correspondence between the lifting direction in the corresponding lifting segment and the preset motor gain; the motor gain determination module 730 includes:

[0153] The lifting direction determination module is used to determine the current lifting direction of the base in the target lifting segment;

[0154] The motor gain determination submodule is used to determine the preset motor gain corresponding to the current lifting direction in the target sub-gain mapping information based on the target sub-gain mapping information corresponding to the target lifting segment in the lifting segment gain mapping information, and obtain the target preset motor gain.

[0155] In one exemplary embodiment, the target preset motor gain includes a first preset motor gain and a second preset motor gain, wherein the first preset motor gain indicates the motor gain in the operating state, and the second preset motor gain indicates the motor gain in the stopped state; the control module 740 includes:

[0156] The first control submodule is used to control the servo motor to work according to the first preset motor gain in the target preset motor gain for the base in the action state;

[0157] The second control submodule is used to control the servo motor to work according to the second preset motor gain in the target preset motor gain after the base switches from the active state to the stop state.

[0158] In one exemplary embodiment, the second preset motor gain includes a target preset base motor gain corresponding to the target preset lifting position, and a second sub-preset motor gain positively correlated with the target preset base motor gain. The target preset lifting position is a preset lifting position in the target lifting segment that matches the current lifting direction. The second control submodule includes:

[0159] The switching control submodule is used to control the servo motor to work according to the second sub-preset motor gain in the second preset motor gain during a first preset time period after the base switches from the action state to the stop state;

[0160] The complete control submodule controls the servo motor to work according to the target preset base motor gain corresponding to the target preset lifting position in the second preset motor gain after the first preset time period.

[0161] In one exemplary embodiment, the device 700 further includes:

[0162] The position matching module is used to determine the matching preset lifting position among a plurality of preset lifting positions when the base is determined to be in a completely stopped state based on the current lifting speed.

[0163] The third control submodule is used to control the servo motor to work according to the preset base motor gain corresponding to the matched preset lifting position.

[0164] In one exemplary embodiment, the elevation segment determination module 720 includes:

[0165] The starting position acquisition module is used to acquire the current starting position of the base;

[0166] The first determining module is used to determine the target lifting segment to which the current lifting position belongs, based on the multiple preset lifting positions corresponding to the base, when the current starting action position belongs to any of the preset lifting positions.

[0167] The fourth control submodule is used to control the servo motor to work according to the third preset motor gain when the current starting position does not belong to any of the preset lifting positions; wherein the third preset motor gain is the average of the preset motor gains in the lifting segment gain mapping information.

[0168] It should be noted that the apparatus provided in the above embodiments is only illustrated by the division of the above functional modules when implementing its functions. In actual applications, the above functions can be assigned to different functional modules as needed, that is, the internal structure of the device can be divided into different functional modules to complete all or part of the functions described above. In addition, the apparatus and method embodiments provided in the above embodiments belong to the same concept, and the specific implementation process can be found in the method embodiments, which will not be repeated here.

[0169] This application also provides an epitaxial device, characterized in that it includes:

[0170] epitaxial cavity;

[0171] A base, disposed within the epitaxial cavity, is used to support the wafer;

[0172] A lifting assembly includes a lifting mechanism and a servo motor. The lifting mechanism is disposed at the bottom of the base and is used to lift the base under the drive of the servo motor. Additionally, in this embodiment, a lifting control device for the base in the epitaxial cavity is provided. Specifically, the lifting control device for the base in the epitaxial cavity can be integrated into the controller of the epitaxial device.

[0173] In this embodiment, the lifting control device of the base in the epitaxial cavity realizes the staged adaptive lifting control of the base, which well meets the complex working conditions of the lifting process of the base in the epitaxial cavity, improves the stability of each lifting stage, and avoids the occurrence of phenomena such as shaking, overspeed, and overload during long-term operation. Therefore, the epitaxial equipment in this embodiment can improve the stability of wafer transfer in the epitaxial growth process and has a low equipment failure rate.

[0174] This application embodiment also provides a storage medium, which can be disposed in an epitaxial device to store at least one instruction or at least one program related to implementing a lifting control device method for a base in an epitaxial cavity. The at least one instruction or the at least one program is loaded and executed by the processor to implement any of the lifting control methods for a base in an epitaxial cavity provided in this application embodiment.

[0175] Optionally, in this embodiment, the storage medium may include, but is not limited to, various media capable of storing program code, such as USB flash drives, read-only memory (ROM), random access memory (RAM), portable hard drives, magnetic disks, or optical disks.

[0176] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A method for controlling the lifting and lowering of a base in an extended cavity, characterized in that, The base is provided with a lifting mechanism at its bottom for raising and lowering the base. The lifting mechanism is driven by a servo motor. The method includes: Obtain the lifting motion parameters of the base, including the current lifting speed and the current lifting position; When the base is determined to be in an operational state based on the current lifting speed, the target lifting segment to which the current lifting position belongs is determined based on multiple preset lifting positions of the base in the vertical direction; the multiple preset lifting positions are determined based on the operating conditions of the base in the epitaxial growth process, and two adjacent preset lifting positions correspond to one lifting segment. Based on the lift segment gain mapping information, the target preset motor gain corresponding to the target lift segment is determined; the lift segment gain mapping information represents the correspondence between the lift segment and the preset motor gain. The servo motor is controlled to operate according to the preset motor gain of the target, so as to drive the lifting mechanism to control the lifting of the base.

2. The method according to claim 1, characterized in that, The lifting segment gain mapping information includes sub-gain mapping information corresponding to each lifting segment, and the sub-gain mapping information represents the correspondence between the lifting direction in the corresponding lifting segment and the preset motor gain; The step of determining the target preset motor gain corresponding to the target lifting segment based on the lifting segment gain mapping information includes: Determine the current lifting direction of the base in the target lifting segment; Based on the target sub-gain mapping information corresponding to the target lifting segment in the lifting segment gain mapping information, the preset motor gain corresponding to the current lifting direction in the target sub-gain mapping information is determined, and the target preset motor gain is obtained.

3. The method according to claim 2, characterized in that, The target preset motor gain includes a first preset motor gain and a second preset motor gain, wherein the first preset motor gain indicates the motor gain in the operating state, and the second preset motor gain indicates the motor gain in the stopped state; controlling the servo motor to operate according to the target preset motor gain to control the lifting and lowering of the base includes: For the base in the action state, the servo motor is controlled to work according to the first preset motor gain in the target preset motor gain; After the base switches from the active state to the stopped state, the servo motor is controlled to work according to the second preset motor gain in the target preset motor gain.

4. The method according to claim 3, characterized in that, The second preset motor gain includes the target preset base motor gain corresponding to the target preset lifting position, and the second sub-preset motor gain which is positively correlated with the target preset base motor gain. The target preset lifting position is the preset lifting position in the target lifting segment that matches the current lifting direction. After the base switches from an active state to a stopped state, the servo motor is controlled to operate according to the second preset motor gain in the target preset motor gain, including: During the first preset time period after the base switches from the active state to the stopped state, the servo motor is controlled to work according to the second sub-preset motor gain in the second preset motor gain. After the first preset time period, the servo motor is controlled to work according to the target preset base motor gain corresponding to the target preset lifting position in the second preset motor gain.

5. The method according to claim 4, characterized in that, The preset basic motor gain corresponding to each of the multiple preset lifting positions is inversely correlated with the vertical height of the corresponding preset lifting position.

6. The method according to claim 5, characterized in that, The method further includes: When it is determined that the base is in a completely stopped state based on the current lifting speed, the current lifting position is determined to be the matching preset lifting position among the plurality of preset lifting positions; The servo motor is controlled to operate according to the preset base motor gain corresponding to the preset lifting position.

7. The method according to any one of claims 1 to 6, characterized in that, The step of determining the target lifting segment to which the current lifting position belongs based on multiple preset lifting positions corresponding to the base includes: Obtain the current starting position of the base; If the current starting position belongs to any of the preset lifting positions, the target lifting segment to which the current lifting position belongs is determined according to the multiple preset lifting positions corresponding to the base; If the current starting position does not belong to any of the preset lifting positions, the servo motor is controlled to work according to the third preset motor gain; wherein, the third preset motor gain is the average of the preset motor gains in the lifting segment gain mapping information.

8. A lifting control device for a base in an extended cavity, characterized in that, The base is provided with a lifting mechanism for raising and lowering the base. The lifting mechanism is driven by a servo motor. The device includes: The lifting motion parameter acquisition module is used to acquire the lifting motion parameters of the base, including the current lifting speed and the current lifting position; The lifting segment determination module is used to determine the target lifting segment to which the current lifting position belongs based on multiple preset lifting positions of the base in the vertical direction when the base is determined to be in an operating state according to the current lifting speed; the multiple preset lifting positions are determined according to the operating conditions of the base in the epitaxial growth process, and two adjacent preset lifting positions correspond to one lifting segment. The motor gain determination module is used to determine the target preset motor gain corresponding to the target lifting segment based on the lifting segment gain mapping information; the lifting segment gain mapping information represents the correspondence between the lifting segment and the preset motor gain. The control module is used to control the servo motor to work according to the target preset motor gain, so as to drive the lifting mechanism to control the lifting of the base.

9. An epitaxial device, characterized in that, include: epitaxial cavity; A base, disposed within the epitaxial cavity, is used to support the wafer; A lifting assembly includes a lifting mechanism and a servo motor. The lifting mechanism is located at the bottom of the base and is used to lift the base under the drive of the servo motor. And, as described in claim 8, the lifting control device for the base in the extended cavity.

10. A storage medium, characterized in that, The storage medium stores at least one instruction or at least one program segment, which is loaded and executed by a processor to implement the lifting and lowering control method of the base in the epitaxial cavity as described in any one of claims 1 to 7.

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