A reaction chamber and plasma processing equipment

Abstract

This invention relates to the field of wafer processing equipment technology, and more particularly to a reaction chamber and plasma processing equipment, comprising a quartz tube, an induction coil, and a shielding component. The quartz tube is located at the top of the processing chamber. The induction coil is arranged around the outside of the quartz tube and includes several annular segments spaced apart along the axial direction of the quartz tube, and several connecting segments disposed between adjacent annular segments for connecting adjacent annular segments. The shielding component is arranged around the quartz tube and the induction coil, and includes several annular shielding portions arranged along the axial direction of the quartz tube, and several arc-shaped shielding portions disposed between adjacent annular shielding portions for connecting adjacent annular shielding portions. A slit is provided between adjacent annular shielding portions. This invention can significantly block the concentrated bombardment of the inner wall of the quartz tube by high-energy ions, thereby effectively reducing the erosion of the quartz tube, reducing particulate matter generation, and improving machine life and process yield.

Description

Technical Field

[0001] This invention relates to the field of wafer processing equipment technology, and more particularly to a reaction chamber and plasma processing equipment. Background Technology

[0002] In ICP-type plasma resist stripping or etching equipment used in high-hydrogen processes, although the high-frequency electromagnetic field generated by the induction coil can effectively excite the plasma, the unavoidable capacitive coupling between the induction coil and the gas in the reaction chamber causes the plasma (especially hydrogen plasma) to bombard the quartz dielectric window, resulting in erosion. Although placing a Faraday shield between the induction coil and the quartz tube can alleviate this problem to some extent, the intersection of the slit opening area and the induction coil will still be subject to concentrated bombardment by hydrogen ions. After long-term use, this will still lead to erosion of the quartz tube and the shedding of particulate matter, which will then contaminate the wafer, affecting the equipment life and process yield. Summary of the Invention

[0003] This invention proposes a reaction chamber and plasma processing equipment, which aims to ensure that the alternating magnetic field can enter the chamber normally to maintain plasma excitation, while significantly blocking the concentrated bombardment of high-energy ions on the inner wall of the quartz tube, thereby effectively reducing the erosion of the quartz tube, reducing the generation of particulate matter, and improving the machine life and process yield.

[0004] To achieve the above objectives, the present invention provides a reaction chamber, comprising:

[0005] Quartz tubes are located at the top of the processing chamber;

[0006] An induction coil, surrounding the outside of the quartz tube and connected to an external radio frequency power supply, is used to generate an alternating magnetic field that can enter the quartz tube to induce an eddy current electric field for accelerating free electrons to collide with process gas to generate plasma. The induction coil includes several annular segments spaced apart along the axial direction of the quartz tube, and several connecting segments disposed between adjacent annular segments for connecting adjacent annular segments.

[0007] A shielding component is arranged in a ring between the quartz tube and the induction coil. The shielding component includes several annular shielding portions arranged along the axial direction of the quartz tube, and several arc-shaped shielding portions disposed between adjacent annular shielding portions for connecting adjacent annular shielding portions. A slit is provided between adjacent annular shielding portions to allow the alternating magnetic field to enter the quartz tube. The structure formed by the orthographic projection of the annular shielding portions on the circumferential wall of the quartz tube covers the structure formed by the orthographic projection of the annular segments on the circumferential wall of the quartz tube, and the structure formed by the orthographic projection of the arc-shaped shielding portions on the circumferential wall of the quartz tube covers the structure formed by the orthographic projection of the connecting segments on the circumferential wall of the quartz tube, so as to physically isolate the electric field path between the low-potential ionized ions in the quartz tube and the induction coil which is at a high potential when energized, thereby blocking the plasma from bombarding the inner wall of the quartz tube.

[0008] Optionally, the shielding member further includes a support extending along the axial direction of the quartz tube, the bottom of the support being fixed to the top of the processing chamber, and the top of the support being connected to the annular shield near the top of the processing chamber.

[0009] Optionally, the support member includes a support portion and a first driver;

[0010] The top of the support is connected to the annular shield near the top of the processing chamber;

[0011] The first driver is fixedly mounted on the top of the processing chamber, and the driving end of the first driver is connected to the support. When the first driver is powered on, it drives the support to move toward or away from the top of the processing chamber, thereby driving the shielding member to move along the axial direction of the quartz tube, so that the shielding member is adapted to the installation position of the induction coil.

[0012] Optionally, the annular shielding portion includes a first shielding ring, a second shielding ring, and a mating ring;

[0013] The first shielding ring is disposed on the top of the second shielding ring, and the opposite end faces of the two form a first mating portion;

[0014] The first docking portion of either the first shielding ring or the second shielding ring is provided with the docking ring;

[0015] The first docking portion of the first shielding ring and the second shielding ring is provided with a first receiving groove adapted to the docking ring. The docking ring is at least partially movably inserted into the first receiving groove and can move relative to the first receiving groove along the axial direction of the first receiving groove to adjust the overall axial height of the annular shielding portion.

[0016] Optionally, the annular shield further includes a second driver and a connector;

[0017] The second driver is fixedly mounted on either the first shielding ring or the second shielding ring;

[0018] One end of the connector is fixedly connected to the drive end of the second driver, and the other end is fixed to the other of the first shielding ring and the second shielding ring;

[0019] When the second driver is powered on, it drives the connector to move toward or away from the top of the processing chamber, causing the second shielding ring and the first shielding ring to move toward or away from each other, thereby adjusting the overall axial height of the annular shielding portion and the axial height of the slit adjacent to the second shielding ring or the first shielding ring.

[0020] Optionally, the top and / or bottom of the annular shielding part is recessed with a mounting groove, and the end of the arc-shaped shielding part is slidably disposed in the mounting groove along the axial direction, so that when the axial height of the slit changes, the arc-shaped shielding part can slide axially in the cavity of the mounting groove.

[0021] Optionally, the arc-shaped shielding part includes a first arc-shaped shielding plate, a second arc-shaped shielding plate, and an arc-shaped mating plate;

[0022] The first arc-shaped shielding plate is disposed on one side of the second arc-shaped shielding plate in the circumferential direction, and the opposite end faces of the two form a second mating part;

[0023] The second mating portion of either the first arc-shaped shielding plate or the second arc-shaped shielding plate is provided with the arc-shaped mating plate;

[0024] The second docking portion of the first arc-shaped shielding plate and the second arc-shaped shielding plate is provided with a second receiving groove adapted to the arc-shaped docking plate. The arc-shaped docking plate is at least partially movably inserted into the second receiving groove and can move relative to the second receiving groove in the circumferential direction to adjust the overall circumferential width of the arc-shaped shielding portion.

[0025] Optionally, the arc-shaped shielding part further includes an elastic element; the two ends of the elastic element are respectively connected to the first arc-shaped shielding plate and the second arc-shaped shielding plate.

[0026] Optionally, the bottom of the mounting groove is provided with an abutting protrusion extending toward the opening end of the mounting groove. The circumferential width of the abutting protrusion in the axial section decreases toward the opening end of the mounting groove. The second arc-shaped shielding plate is slidably disposed with one side wall of the mounting groove. The abutting protrusion abuts against one side of the first arc-shaped shielding plate. When the axial height of the slit changes, the deformation of the elastic element is adjusted by changing the abutting position of the first arc-shaped shielding plate and the abutting protrusion, thereby changing the circumferential width of the arc-shaped shielding part.

[0027] To achieve the above objectives, the present invention also provides a plasma processing apparatus, comprising:

[0028] The aforementioned reaction chamber;

[0029] A process gas supply system is connected to a quartz tube to supply process gas into the quartz tube;

[0030] A vacuum system, connected to the quartz tube, is used to extract gas from the quartz tube and maintain the required vacuum level in the quartz tube;

[0031] The radio frequency power supply is electrically connected to the induction coil.

[0032] The beneficial effects of this invention are as follows:

[0033] This invention precisely covers the annular and arc-shaped shielding sections projected onto the circumferential wall of the quartz tube by the annular segment and connecting segment of the induction coil, respectively. A slit is left between adjacent annular shielding sections to allow the alternating magnetic field to enter, thus physically isolating the electric field path between the low-potential ionized ions inside the quartz tube and the high-potential induction coil. This ensures the alternating magnetic field can enter the cavity normally to maintain plasma excitation while significantly blocking the concentrated bombardment of the quartz tube's inner wall by high-energy ions, effectively reducing quartz tube erosion, decreasing particulate matter generation, and improving machine lifespan and process yield. Attached Figure Description

[0034] Figure 1 This is a schematic diagram of the structure of the plasma processing device according to an embodiment of the present invention;

[0035] Figure 2 For the present invention Figure 1 Enlarged schematic diagram of structure A in the embodiment;

[0036] Figure 3 For the present invention Figure 1 Example structural schematic diagrams of the annular shield and the arc-shaped shield in the embodiments.

[0037] Explanation of reference numerals in the attached figures:

[0038] 1. Quartz tube; 2. Processing chamber; 3. Induction coil; 31. Annular segment; 4. Shielding component; 41. Annular shielding part; 411. First shielding ring; 412. Second shielding ring; 413. Docking ring; 414. First receiving groove; 42. Arc-shaped shielding part; 421. First arc-shaped shielding plate; 422. Second arc-shaped shielding plate; 423. Arc-shaped docking plate; 424. Second receiving groove; 43. Support member; 431. Support part; 432. First actuator; 44. Second actuator; 45. Connector; 46. Elastic member; 47. Abutting protrusion; 5. Slit; 6. Mounting groove. Detailed Implementation

[0039] To make the objectives, technical solutions, and advantages of this invention clearer, the technical solutions in the embodiments of this invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of this invention. All other embodiments obtained by those skilled in the art based on the embodiments of this invention without inventive effort are within the scope of protection of this invention. Unless otherwise defined, the technical or scientific terms used herein should have the ordinary meaning understood by those skilled in the art. The terms "comprising" and similar expressions used herein mean that the element or object preceding the word covers the element or object listed following the word and its equivalents, but do not exclude other elements or objects.

[0040] To address the problems existing in the prior art, embodiments of the present invention provide a reaction chamber, such as... Figure 1 As shown, the reaction chamber includes a quartz tube 1, an induction coil 3, and a shielding component 4.

[0041] In one embodiment, such as Figure 1 As shown, the quartz tube 1 is located at the top of the processing chamber 2; it is worth noting that the quartz tube 1 contains a cavity for generating plasma; the processing chamber 2 is a chamber for processing wafers.

[0042] In one embodiment, such as Figure 1 As shown, the induction coil 3 is arranged around the outside of the quartz tube 1 and connected to an external radio frequency power supply. It is used to generate an alternating magnetic field that can enter the quartz tube 1 to induce an eddy current electric field for accelerating free electrons to collide with the process gas to generate plasma. The induction coil 3 includes a plurality of annular segments 31 arranged at intervals along the axial direction, and a connecting segment connecting two adjacent annular segments 31.

[0043] In this application, the axial direction is the direction parallel to the central axis of the quartz tube 1.

[0044] In one embodiment, such as Figure 1 and Figure 3 As shown, the shielding member 4 is arranged in a ring between the quartz tube 1 and the induction coil 3. The shielding member 4 includes a plurality of annular shielding parts 41 arranged along the axial direction, and an arc-shaped shielding part 42 connecting two adjacent annular shielding parts 41. There is a slit 5 between two adjacent annular shielding parts 41 to allow the alternating magnetic field to enter the quartz tube 1. The orthographic projection structure of the annular shielding part 41 on the circumferential wall of the quartz tube 1 covers the orthographic projection structure of the annular segment 31 on the circumferential wall of the quartz tube 1, and the orthographic projection structure of the arc-shaped shielding part 42 on the circumferential wall of the quartz tube 1 covers the orthographic projection structure of the connecting segment on the circumferential wall of the quartz tube 1, so as to physically block the electric field path between the low potential ionized ions in the quartz tube 1 and the induction coil 3 which is at a high potential when energized, thereby blocking the plasma from bombarding the inner wall of the quartz tube 1.

[0045] This embodiment effectively blocks the concentrated bombardment of the inner wall of the quartz tube 1 by setting a shielding component 4 with precise projection coverage between the quartz tube 1 and the induction coil 3, thereby significantly reducing the erosion of the quartz tube 1 and the generation of particulate matter. At the same time, the slit 5 between adjacent annular shielding parts 41 ensures that the alternating magnetic field can enter the reaction chamber of the quartz tube 1 normally to maintain the stable excitation of plasma, thereby improving the service life of the equipment and the process yield while ensuring process performance.

[0046] In one embodiment, such as Figure 1 and Figure 2 As shown, the shielding component 4 also includes a support member 43 extending axially. The bottom of the support member 43 is fixed to the top of the processing chamber 2, and the top of the support member 43 is connected to the annular shielding portion 41 near the top of the processing chamber 2. By setting the support member 43 extending axially along the quartz tube 1 and fixing its bottom to the top of the processing chamber 2, with its top connected to the lowest annular shielding portion 41, this configuration provides stable and reliable mechanical support for the entire shielding component 4, ensuring that it maintains precise positioning during equipment operation. This ensures that the annular shielding portion 41 and the arc-shaped shielding portion 42 can continuously and accurately cover the projection of the induction coil 3 on the quartz tube 1, effectively playing the role of physically isolating the electric field path and blocking plasma bombardment, while enhancing the structural stability and anti-interference capability of the entire shielding component 4.

[0047] In one embodiment, such as Figure 1As shown, the number of support members 43 can be set to one. Setting the number of support members 43 to one can be understood as a single support rod, which can provide a centralized and stable support point for the shielding component 4, making its structure simpler and more compact, and reducing the complexity of installation and maintenance. At the same time, a single support member 43 helps to ensure that the shielding component 4 maintains overall synchronization and stability during axial movement. Of course, in other embodiments, when there is only one support member 43, its structure can also be ring-shaped, which will not be elaborated here.

[0048] In another embodiment, the number of the support members 43 is set to several, all of which are cylindrical rod-shaped structures, and the several support members 43 are arranged in an equally spaced ring around the quartz tube 1; so as to provide uniform and stable multi-point support for the shielding component 4, effectively preventing the component from shifting or deforming due to its own weight or equipment vibration, and ensuring that the annular shielding part 41 and the arc-shaped shielding part 42 always maintain a precise projection coverage relationship with the annular segment 31 and the connecting segment of the induction coil 3, thereby reliably playing the protective role of physically isolating the electric field and blocking plasma bombardment of the inner wall of the quartz tube 1, while enhancing the rigidity and balance of the entire shielding structure.

[0049] In one embodiment, such as Figure 1 and Figure 2 As shown, the support member 43 includes a support portion 431 and a first driver 432.

[0050] In one embodiment, such as Figure 2 As shown, the top end of the support 431 is connected to the annular shield 41 near the top of the processing chamber 2; the first driver 432 is fixedly disposed on the top of the processing chamber 2, and the driving end of the first driver 432 is connected to the support 431. When the first driver 432 is energized, it drives the support 431 to move toward or away from the top of the processing chamber 2, thereby driving the shielding member 4 to move axially, so that the shielding member 4 is adapted to the installation position of the induction coil 3. By setting the first driver 432 to drive the support part 431, the entire shielding component 4 can move along the axial direction of the quartz tube 1, thereby flexibly adjusting the axial position of the shielding component 4. This allows the annular shielding part 41 and the arc-shaped shielding part 42 to accurately correspond to the actual installation positions of the annular segment 31 and the connecting segment of the induction coil 3 of different specifications. This effectively compensates for misalignment caused by processing or assembly errors, ensuring the accuracy of the projection coverage. As a result, it can be quickly adapted after coil replacement or maintenance, and always reliably plays the protective role of physically isolating the electric field and blocking plasma bombardment, improving the versatility and maintenance efficiency of the equipment.

[0051] In one embodiment, the support 431 can be a cylindrical rod, a rectangular column, or a ring with specific reinforcing ribs. Its material can be a material with good mechanical strength and resistance to plasma environment, such as stainless steel or aluminum alloy with anodized surface treatment.

[0052] In one embodiment, the structure of the first driver 432 can be a linear motion mechanism such as a linear motor, servo electric cylinder, hydraulic cylinder or pneumatic cylinder, and its driving end can be rigidly connected to the support part 431 through threads, flanges or couplings. The first driver 432 can be fixedly installed on the mounting base on the top of the processing chamber 2, and can accurately drive the support part 431 and the entire shielding and blocking component 4 connected thereto to move up and down along the axial direction of the quartz tube 1 by receiving external control signals, thereby realizing the rapid adaptation of the shielding and blocking component 4 to different specifications of induction coils 3 and their installation positions, improving the versatility and maintenance convenience of the equipment.

[0053] In one embodiment, such as Figure 2 As shown, the annular shielding portion 41 includes a first shielding ring 411, a second shielding ring 412, and a mating ring 413; the first shielding ring 411 is disposed on the top of the second shielding ring 412, and their opposite end faces form a first mating portion; the first mating portion of either the first shielding ring 411 or the second shielding ring 412 is provided with the mating ring 413; the first mating portion of the other of the first shielding ring 411 and the second shielding ring 412 is provided with a first receiving groove 414 adapted to the mating ring 413, and the mating ring 413 is at least partially movably inserted into the first receiving groove 414, and can move relative to the first receiving groove 414 along its axial direction to adjust the overall axial height of the annular shielding portion 41. By setting the annular shielding part 41 as a retractable structure composed of a first shielding ring 411, a second shielding ring 412, and a docking ring 413, and utilizing the sliding fit between the docking ring 413 and the first receiving groove 414, the axial height of the entire annular shielding part 41 can be flexibly and precisely adjusted according to the axial height of the annular segment and connecting segment in the induction coil 3 and the corresponding actual installation position. This ensures that the orthogonal projection of the annular shielding part 41 on the circumferential wall of the quartz tube 1 can always completely cover the annular segment 31 of the induction coil 3, effectively blocking the electric field path to block plasma bombardment, while improving the adaptability and installation tolerance of the shielding component 4 to induction coils 3 of different specifications or with installation errors.

[0054] Furthermore, the retractable structure composed of the first shielding ring 411, the second shielding ring 412, and the docking ring 413 can change the axial height of the slit 5 adjacent to the annular shielding part 41 while adjusting the overall axial height of the annular shielding part 41, thereby controlling the intensity and distribution of the alternating magnetic field entering the quartz tube 1. In this way, the density uniformity of the plasma in the quartz tube 1 can be flexibly adjusted by adjusting the axial height of the slit 5, effectively compensating for the non-uniformity of the plasma caused by the structure or process conditions of the induction coil 3, and improving the uniformity and process accuracy of wafer processing.

[0055] In one embodiment, the material of the docking ring 413 is the same as that of the first shielding ring 411 and the second shielding ring 412. The docking ring 413 can also play an effective electromagnetic shielding role during the axial extension and contraction adjustment process, ensuring that within the relative movement range of the first shielding ring 411 and the second shielding ring 412, the annular shielding part 41 always forms a continuous and complete projection coverage of the annular segment 31 of the induction coil 3, avoiding electric field leakage due to structural gaps, thereby reliably blocking the electric field path between low potential ionized ions and high potential induction coil, and maintaining a uniform protective effect on the inner wall of the quartz tube 1.

[0056] In one embodiment, the docking ring 413 is disposed at the bottom of the first shielding ring 411, and the first receiving groove 414 is disposed at the top of the second shielding ring 412.

[0057] In another embodiment, the docking ring 413 is disposed on the top of the second shielding ring 412, and the first receiving groove 414 is disposed on the bottom of the first shielding ring 411.

[0058] In one embodiment, such as Figure 2 As shown, the annular shielding part 41 further includes a second driver 44 and a connector 45; the second driver 44 is fixedly disposed on either the first shielding ring 411 or the second shielding ring 412; one end of the connector 45 is fixedly connected to the driving end of the second driver 44, and the other end is fixed to the other of the first shielding ring 411 and the second shielding ring 412; when the second driver 44 is energized, it drives the connector 45 to move toward or away from the top of the processing chamber 2, causing the second shielding ring 412 and the first shielding ring 411 to move toward or away from each other, so as to adjust the overall axial height of the annular shielding part 41, and to adjust the axial height of the slit 5 adjacent to the second shielding ring 412 or the first shielding ring 411.

[0059] This embodiment sets up a second driver 44 and a connector 45 in the annular shielding part 41, and fixes its two ends to the first shielding ring 411 and the second shielding ring 412 respectively. In this way, the second driver 44 can actively and adjustably drive the first shielding ring 411 and the second shielding ring 412 to move in opposite directions or in opposite directions along the axial direction through precise control. This allows for flexible and continuous adjustment of the overall axial height of the annular shielding part 41 and the axial height of the adjacent slits 5, so as to achieve dynamic control of the intensity and distribution of the alternating magnetic field entering the quartz tube 1, optimize plasma uniformity, and ensure that the shielding component 4 can accurately adapt to the induction coil 3 of different specifications or installation positions, and always effectively play its physical shielding role.

[0060] In one embodiment, the connecting member 45 can be a rigid connecting rod, lead screw, or slide rail assembly. One end of the connecting member 45 can be rigidly connected to the driving end of the second driver 44 via a thread, pin, or flange, while the other end is fixed to the first shielding ring 411 or the second shielding ring 412 via a similar connection method. The connecting member 45 can perform precise linear motion under the drive of the second driver 44, thereby reliably transmitting the thrust or pull of the second driver 44 to the first shielding ring 411 or the second shielding ring 412 fixed thereto, realizing active and controllable adjustment of the axial distance between the two shielding rings.

[0061] In one embodiment, the structure of the second driver 44 can be a precision linear drive device such as a servo motor, stepper motor, linear motor, hydraulic cylinder or pneumatic cylinder. Its drive end can be rigidly connected to the connector 45 through a coupling, lead screw or linkage mechanism, and can accurately drive the first shielding ring 411 and the second shielding ring 412 to move in opposite directions or away from each other along the axial direction by receiving external control signals, thereby realizing dynamic and controllable adjustment of the overall axial height of the annular shielding part 41 and the axial height of the adjacent slits 5.

[0062] In one embodiment, the second driver 44 and the connector 45 disposed on the annular shield 41 are positioned in the same location, that is, the second driver 44 is disposed on the first shield ring 411 and the connector 45 is disposed on the second shield ring 412; or the second driver 44 is disposed on the second shield ring 412 and the connector 45 is disposed on the first shield ring 411. By disposing the second driver 44 and the connector 45 on the first shield ring 411 and the second shield ring 412 respectively, and ensuring their positions always correspond, the linear movement of the second driver 44 can be directly and efficiently converted into precise axial movement between the first shield ring 411 and the second shield ring 412, thereby achieving stable and controllable adjustment of the overall axial height of the annular shield 41 and the axial height of adjacent slits 5. It can be understood that, assuming no axial adjustment operation is performed between two adjacent annular shields 41, the axial height of the slit 5 is at a preset threshold. In this embodiment, regardless of the adjustment, the adjusted axial height of the slit 5 is always less than the preset threshold.

[0063] In another embodiment, the positions of the second driver 44 and the connector 45 on two adjacent annular shielding portions 41 are not consistent. Specifically, in the first annular shielding portion 41, the second driver 44 is located on the second shielding ring 412 of the first annular shielding portion, and the connector 45 is located on the first shielding ring 411 of the first annular shielding portion; in the second annular shielding portion 41, the second driver 44 is located on the first shielding ring 411 of the second annular shielding portion, and the connector 45 is located on the second shielding ring 412 of the second annular shielding portion. By using an alternating arrangement of the second driver 44 and the connector 45 on two adjacent annular shielding portions 41, the adjacent annular shielding portions 41 can generate driving forces in opposite directions when adjusting their axial height. This allows for differentiated or complementary adjustment of the axial height of the two adjacent slits 5, effectively optimizing the distribution of the alternating magnetic field entering the quartz tube 1. This compensates for plasma inhomogeneity caused by the structure or process conditions of the induction coil 3, improving the dynamic control accuracy of plasma homogeneity and the stability of the equipment. It can be understood that, in this embodiment, the axial height of the adjusted slit 5 can be less than or greater than a preset threshold.

[0064] In one embodiment, such as Figure 3As shown, the top and / or bottom of the annular shielding part 41 are recessed with mounting grooves 6. The end of the arc-shaped shielding part 42 is slidably disposed within the mounting groove 6 along the axial direction, so that when the axial height of the slit 5 changes, the arc-shaped shielding part 42 can slide axially within the cavity of the mounting groove 6. By providing mounting grooves 6 at the top and / or bottom of the annular shielding part 41 (i.e., the top of the first shielding ring 411 and / or the bottom of the second shielding ring 412 are provided with mounting grooves 6), and by sliding the end of the arc-shaped shielding part 42 axially within the mounting groove 6, when the axial height of the adjacent slit 5 is changed by adjusting the axial height of the annular shielding part 41, the arc-shaped shielding part 42 can automatically slide freely axially within the cavity of the mounting groove 6. This adaptively compensates for the axial displacement difference caused by the change in the axial height of the slit 5, ensuring that the arc-shaped shielding part 42 always maintains a reliable connection with the annular shielding part 41, maintaining a complete shielding coverage effect, while avoiding structural interference and ensuring the smoothness and stability of the overall adjustment of the shielding component 4.

[0065] In one embodiment, the top and bottom of the annular shielding part 41 are both recessed with mounting grooves 6, that is, the top of the first shielding ring 411 and the bottom of the second shielding ring 412 are both provided with mounting grooves 6. The two ends of the arc-shaped shielding part 42 are respectively movably disposed in the two mounting grooves 6, so that when the axial height of the slit 5 between adjacent annular shielding parts 41 changes due to adjustment needs, the arc-shaped shielding part 42, which is slidably inserted into the upper and lower mounting grooves 6 at both ends, can slide adaptively along the axial direction, thereby better and more effectively compensating for the axial displacement difference caused by the change in slit height.

[0066] In another embodiment, the top or bottom of the annular shielding part 41 is recessed with a mounting groove 6, that is, the top of the first shielding ring 411 or the bottom of the second shielding ring 412 is provided with a mounting groove 6, and one end of the arc-shaped shielding part 42 is movably disposed in the mounting groove 6; in this embodiment, the end of the arc-shaped shielding part 42 located outside the mounting groove 6 is fixedly connected to another annular shielding part 41.

[0067] In one embodiment, such as Figure 3As shown, the arc-shaped shielding portion 42 includes a first arc-shaped shielding plate 421, a second arc-shaped shielding plate 422, and an arc-shaped mating plate 423. The first arc-shaped shielding plate 421 is disposed on one side (which can be understood as the left side) of the second arc-shaped shielding plate 422 in the circumferential direction, and the opposite end faces of the two form a second mating portion; the second mating portion of either the first arc-shaped shielding plate 421 or the second arc-shaped shielding plate 422 is provided with the arc-shaped mating plate 423; the second mating portion of the other arc-shaped shielding plate 421 or the second arc-shaped shielding plate 422 is provided with a second receiving groove 424 adapted to the arc-shaped mating plate 423, and the arc-shaped mating plate 423 is at least partially movably inserted into the second receiving groove 424, and can move relative to the second receiving groove 424 in the circumferential direction to adjust the overall circumferential width of the arc-shaped shielding portion 42.

[0068] This embodiment sets the arc-shaped shielding part 42 as a retractable structure composed of a first arc-shaped shielding plate 421, a second arc-shaped shielding plate 422, and an arc-shaped docking plate 423. By utilizing the circumferential sliding fit between the arc-shaped docking plate 423 and the second receiving groove 424, the overall circumferential width of the arc-shaped shielding part 42 can be flexibly and precisely adjusted according to the actual circumferential size or installation position of the connection section of the induction coil 3. This ensures that the orthogonal projection of the arc-shaped shielding part 42 on the circumferential wall of the quartz tube 1 can always completely cover the connection section of the induction coil 3, effectively blocking the electric field path in this area to block plasma bombardment. At the same time, it improves the adaptability of the shielding component 4 to coils of different specifications or those with circumferential installation errors.

[0069] In one embodiment, such as Figure 3 As shown, the arc-shaped docking plate 423 is disposed on the first arc-shaped shielding plate 421, and the second receiving groove 424 is disposed on the second arc-shaped shielding plate 422.

[0070] In another embodiment, the arc-shaped docking plate 423 is disposed on the second arc-shaped shielding plate 422, and the second receiving groove 424 is disposed on the first arc-shaped shielding plate 421.

[0071] In one embodiment, the structure of the arc-shaped docking plate 423 and the second receiving groove 424 can be a T-shaped slide rail and T-shaped slide groove or a boss and groove insertion form. The arc-shaped docking plate 423 can be designed as a slider with an arc-shaped outward protrusion, and the second receiving groove 424 is an arc-shaped groove that matches its shape. The two achieve circumferential relative movement through sliding cooperation. This can ensure that the arc-shaped docking plate 423 slides smoothly and accurately in the second receiving groove 424, thereby flexibly adjusting the overall circumferential width of the arc-shaped shielding part 42 so that it always completely covers the projection of the induction coil 3 connection section, effectively blocking the electric field path and blocking the plasma from bombarding the inner wall of the quartz tube 1.

[0072] In one embodiment, both ends of the arc-shaped docking plate 423 are respectively disposed in the mounting groove 6. When the axial height of the slit 5 is adjusted, it can effectively prevent the gap between the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422, which are not shielded by the arc-shaped docking plate 423, from moving outside the mounting groove 6 when the arc-shaped shielding part 42 moves axially. In this way, it cannot effectively shield the part of the induction coil 3 that overlaps with the gap, maintain the complete coverage of the projection of the connection section of the induction coil 3, effectively block the electric field path, and prevent the connection section of the induction coil 3 from being unable to be effectively shielded due to the positional displacement of the arc-shaped docking plate 423, thereby reliably blocking the plasma from bombarding the inner wall of the quartz tube 1.

[0073] In one embodiment, such as Figure 3 As shown, the arc-shaped shielding part 42 also includes an elastic element 46; the two ends of the elastic element 46 are respectively connected to the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422 and are in a compressed state. By being in a compressed state, the elastic element 46 provides an elastic resistance force to the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422, causing them to move in opposite directions. This ensures that the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422 remain connected during circumferential width adjustment, ensuring a stable sliding fit between the arc-shaped mating plate 423 and the second receiving groove 424. This compensates for gaps that may be caused by thermal expansion or mechanical vibration, maintains complete coverage of the arc-shaped shielding part 42 over the projection of the connection section of the induction coil 3, reliably isolates the electric field path, and effectively blocks the bombardment of plasma onto the inner wall of the quartz tube 1. Simultaneously, the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422 are integrated into one unit.

[0074] In one embodiment, the elastic element 46 can be a coil spring, wave spring, or elastic rubber ring, etc., which has good elastic restoring force. Its two ends can be connected to the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422 respectively by means of hooks, slots, or adhesives. This provides a continuous elastic preload during the adjustment process of the circumferential width of the arc-shaped shielding part 42 widening, ensuring that the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422 always maintain a tight fit. This avoids incomplete projection coverage of the connection section of the induction coil 3 due to mechanical gaps, so as to reliably isolate the electric field path and effectively block the plasma from bombarding the inner wall of the quartz tube 1.

[0075] In one embodiment, such as Figure 3As shown, the bottom of the mounting groove 6 is provided with an abutting protrusion 47 extending toward the opening end of the mounting groove 6. The circumferential width of the abutting protrusion 47 in the axial section decreases toward the opening end of the mounting groove 6. The second arc-shaped shielding plate 422 is slidably disposed with one side wall of the mounting groove 6. The abutting protrusion 47 abuts against one side of the first arc-shaped shielding plate 421. When the axial height of the slit 5 changes, the deformation of the elastic member 46 is adjusted by changing the abutting position of the first arc-shaped shielding plate 421 and the abutting protrusion 47, thereby changing the circumferential width of the arc-shaped shielding part 42. Specifically, when the arc-shaped shielding part 42 moves downward relative to the contact protrusion 47, under the action of the elastic force of the elastic member 46, the second arc-shaped shielding plate 422 and the first arc-shaped shielding plate 421 move away from each other; when the arc-shaped shielding part 42 moves upward relative to the contact protrusion 47, the second arc-shaped shielding plate 422 and the first arc-shaped shielding plate 421 move closer to each other. During this process, the elastic member 46 is continuously compressed.

[0076] By setting abutment protrusions 47 with decreasing circumferential width at the bottom of the mounting groove 6, and having them abut against the first arc-shaped shielding plate 421, when the axial height of the slit 5 changes, the first arc-shaped shielding plate 421 will slide along the inclined surface of the abutment protrusions 47, thereby changing its relative position with the second arc-shaped shielding plate 422. Consequently, when the first arc-shaped shielding plate 421 and the second arc-shaped shielding plate 422 move circumferentially away from or closer together, the elastic element 46 automatically adjusts to extend or shorten. This achieves dynamic and adaptive adjustment of the circumferential width of the arc-shaped shielding part 42, ensuring that the arc-shaped shielding part 42 always completely covers the projection of the connection section of the induction coil 3, effectively blocking the electric field path and reliably preventing plasma from bombarding the inner wall of the quartz tube 1.

[0077] In one embodiment, the structure of the abutting protrusion 47 can be a wedge-shaped block, a conical platform, or a trapezoidal protrusion with an inclined guide surface. Its material can be the same plasma-resistant material as the annular shield 41 (such as stainless steel or aluminum alloy), and it is fixed to the bottom of the mounting groove 6 by welding, bolting, or integral processing. The circumferential width of the abutting protrusion 47 in the axial section decreases along the opening end of the mounting groove 6 to form an inclined or conical structure, so that when the axial height of the slit 5 changes, the first arc-shaped shield 421 can slide along the inclined or conical structure. By changing the abutting position, the deformation of the elastic element 46 can be precisely adjusted, thereby achieving adaptive control of the circumferential width of the arc-shaped shield 42.

[0078] To address the problems existing in the prior art, embodiments of the present invention also provide a plasma processing device, including: the aforementioned reaction chamber, a process gas supply system, a vacuum system, and a radio frequency power supply. The process gas supply system is connected to the quartz tube 1 to supply process gas into the quartz tube 1; the vacuum system is connected to the quartz tube 1 to extract gas from the quartz tube 1 and maintain the required vacuum level in the quartz tube 1; the radio frequency power supply is electrically connected to the induction coil 3. This embodiment integrates the reaction chamber, process gas supply system, vacuum system, and radio frequency power supply into a complete plasma processing device. This enables the stable supply of process gas, precise maintenance of the vacuum level in the reaction chamber, and efficient excitation of the alternating magnetic field, thereby ensuring the formation of a uniform and stable plasma within the quartz tube 1. Combined with the effective protection of the quartz tube 1 by the shielding component 4, this improves the process uniformity, repeatability, and yield of wafer processing, while extending the service life of key components of the equipment.

[0079] In one embodiment, the plasma processing equipment can be a chemical vapor deposition equipment, a plasma etching equipment, or a plasma photoresist removal equipment, etc. A specific process gas (such as hydrogen-containing gas) is introduced into the quartz tube 1 through a process gas supply system, and an alternating magnetic field is generated by driving the induction coil 3 with a radio frequency power supply to excite the plasma, thereby realizing processes such as thin film deposition, pattern etching, or photoresist removal on the wafer surface. At the same time, thanks to the protective effect of the shielding component 4, the bombardment and erosion of the quartz tube 1 by the plasma is effectively reduced, improving process stability and equipment life.

[0080] While embodiments of the present invention have been described in detail above, it will be apparent to those skilled in the art that various modifications and variations can be made to these embodiments. However, it should be understood that such modifications and variations fall within the scope and spirit of the present invention. Furthermore, the present invention described herein may have other embodiments and can be implemented or carried out in various ways.

Claims

1. A reaction chamber, characterized in that, include: Quartz tubes are located at the top of the processing chamber; An induction coil, surrounding the outside of the quartz tube and connected to an external radio frequency power supply, is used to generate an alternating magnetic field that can enter the quartz tube to induce an eddy current electric field for accelerating free electrons to collide with process gas to generate plasma. The induction coil includes several annular segments arranged at intervals along the axial direction, and a connecting segment connecting two adjacent annular segments. A shielding component is arranged in a ring between the quartz tube and the induction coil. The shielding component includes several annular shielding parts arranged along the axial direction, and an arc-shaped shielding part connecting two adjacent annular shielding parts. There is a slit between two adjacent annular shielding parts to allow the alternating magnetic field to enter the quartz tube. The orthographic projection of the annular shield on the circumferential wall of the quartz tube covers the orthographic projection of the annular segment on the circumferential wall of the quartz tube, and the orthographic projection of the arc-shaped shield on the circumferential wall of the quartz tube covers the orthographic projection of the connecting segment on the circumferential wall of the quartz tube, so as to physically block the electric field path between the low-potential ionized ions in the quartz tube and the induction coil which is at a high potential when energized, thereby preventing the plasma from bombarding the inner wall of the quartz tube.

2. The reaction chamber according to claim 1, characterized in that, The shielding component further includes a support member extending axially, the bottom of which is fixed to the top of the processing chamber, and the top of which is connected to the annular shielding portion near the top of the processing chamber.

3. The reaction chamber according to claim 2, characterized in that, The support member includes a support portion and a first driver; The top of the support is connected to the annular shield near the top of the processing chamber; The first driver is fixedly mounted on the top of the processing chamber, and the driving end of the first driver is connected to the support. When the first driver is powered on, it drives the support to move toward or away from the top of the processing chamber, thereby driving the shielding member to move along the axial direction of the quartz tube, so that the shielding member is adapted to the installation position of the induction coil.

4. The reaction chamber according to claim 1, characterized in that, The annular shielding part includes a first shielding ring, a second shielding ring, and a mating ring; The first shielding ring is disposed on the top of the second shielding ring, and the opposite end faces of the two form a first mating portion; The first docking portion of either the first shielding ring or the second shielding ring is provided with the docking ring; The first docking portion of the first shielding ring and the second shielding ring is provided with a first receiving groove adapted to the docking ring. The docking ring is at least partially movably inserted into the first receiving groove and can move relative to the first receiving groove along the axial direction of the first receiving groove to adjust the overall axial height of the annular shielding portion.

5. The reaction chamber according to claim 4, characterized in that, The annular shield also includes a second driver and a connector; The second driver is fixedly mounted on either the first shielding ring or the second shielding ring; One end of the connector is fixedly connected to the drive end of the second driver, and the other end is fixed to the other of the first shielding ring and the second shielding ring; When the second driver is powered on, it drives the connector to move toward or away from the top of the processing chamber, causing the second shielding ring and the first shielding ring to move toward or away from each other, thereby adjusting the overall axial height of the annular shielding portion and the axial height of the slit adjacent to the second shielding ring or the first shielding ring.

6. The reaction chamber according to claim 1, characterized in that, The top and / or bottom of the annular shielding part are recessed with mounting grooves, and the end of the arc-shaped shielding part is axially slidably disposed in the mounting groove so that when the axial height of the slit changes, the arc-shaped shielding part can slide axially within the groove cavity of the mounting groove.

7. The reaction chamber according to claim 6, characterized in that, The arc-shaped shielding part includes a first arc-shaped shielding plate, a second arc-shaped shielding plate, and an arc-shaped mating plate; The first arc-shaped shielding plate is disposed on one side of the second arc-shaped shielding plate in the circumferential direction, and the opposite end faces of the two form a second mating part; The second mating portion of either the first arc-shaped shielding plate or the second arc-shaped shielding plate is provided with the arc-shaped mating plate; The second docking portion of the first arc-shaped shielding plate and the second arc-shaped shielding plate is provided with a second receiving groove adapted to the arc-shaped docking plate. The arc-shaped docking plate is at least partially movably inserted into the second receiving groove and can move relative to the second receiving groove in the circumferential direction to adjust the overall circumferential width of the arc-shaped shielding portion.

8. The reaction chamber according to claim 7, characterized in that, The arc-shaped shielding part also includes an elastic element; the two ends of the elastic element are respectively connected to the first arc-shaped shielding plate and the second arc-shaped shielding plate.

9. The reaction chamber according to claim 8, characterized in that, The bottom of the mounting groove is provided with an abutting protrusion extending toward the opening end of the mounting groove. The circumferential width of the abutting protrusion in the axial section decreases toward the opening end of the mounting groove. The second arc-shaped shielding plate is slidably disposed with one side wall of the mounting groove. The abutting protrusion abuts against one side of the first arc-shaped shielding plate. When the axial height of the slit changes, the deformation of the elastic element is adjusted by changing the abutting position of the first arc-shaped shielding plate and the abutting protrusion, thereby changing the circumferential width of the arc-shaped shielding part.

10. A plasma processing device, characterized in that, include: The reaction chamber as described in any one of claims 1 to 9; A process gas supply system is connected to a quartz tube to supply process gas into the quartz tube; A vacuum system, connected to the quartz tube, is used to extract gas from the quartz tube and maintain the required vacuum level in the quartz tube; The radio frequency power supply is electrically connected to the induction coil.

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