Device and method for growing silicon carbide single crystals by liquid phase method
By introducing graphite partitions and a unique mechanical structure into the apparatus for growing silicon carbide single crystals in the liquid phase method, the problem of contamination of the seed crystal surface by volatiles during the heating stage was solved, and the growth of high-quality silicon carbide single crystals was achieved.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-17
- Publication Date
- 2026-03-27
AI Technical Summary
During the liquid phase growth of silicon carbide single crystals, volatiles of silicon, aluminum and other components in the raw materials will condense on the surface of the seed crystal during the heating stage, resulting in surface contamination and increased roughness, which affects the crystal quality.
A device for growing silicon carbide single crystals using a liquid phase method is designed, including a graphite crucible, a graphite partition, and a graphite seed crystal holder. By constructing a physical barrier to isolate volatiles during the heating stage and automatically removing the partition during the growth stage to prevent convection interference, a unique mechanical structure and operating method are adopted to ensure the cleanliness of the seed crystal surface.
It effectively isolates the volatiles from contaminating the seed crystal surface, ensuring the cleanliness and flatness of the crystal growth initiation interface, improving crystal quality, and reducing defect density.
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Figure CN121737818A_ABST
Abstract
Citation Information
Patent Citations
A liquid phase method for growing silicon carbide single crystal and a growth method thereof
CN119041010B