Gas supply device of double-cathode coating mechanism

Abstract

The invention provides a gas supply device of a double-cathode coating mechanism, and relates to the technical field of glass coating equipment, the gas supply device comprises a gas supply box located between two cathode targets, the gas supply box comprises a box body and a gas supply strip inserted in the box body, gas outlet channels are formed between the two side faces of the gas supply strip and the two parallel inner wall faces of the box body respectively, and the gas outlet channels are communicated with the gas supply strip. A flow guide frame is fixedly arranged at the bottom of the air supply strip, air at the tail end of the corresponding air outlet channel is guided to the cathode target on the same side through the flow guide frame, two inner side air grooves are formed in the air supply strip, an outer side air groove is formed in the outer side of each inner side air groove, and the inner side air grooves and the adjacent outer side air grooves are identical through a plurality of first ventilation holes. The outer side air grooves are communicated with the adjacent air outlet channels through a plurality of second vent holes, and the inner side air grooves and the outer side air grooves are respectively connected with an air source. The method has the advantages of being capable of meeting the requirement for double-cathode coating and the like.

Description

Technical Field

[0001] This invention relates to the field of glass coating equipment technology, and more particularly to a gas supply device for a dual-cathode coating mechanism. Background Technology

[0002] Dual-plane cathode magnetron sputtering can improve efficiency, broaden the types of film materials, and simplify the film structure. However, most current gas supply methods are located below the cathode, i.e. below the target. This gas supply method has a long path, and when there are differences in the process gases of the two planar cathodes, it cannot effectively isolate the interference between the different process gases of the two planar cathodes. Therefore, the gas supply method of dual-plane cathode coating mechanism needs to be improved. Summary of the Invention

[0003] To address the shortcomings of existing technologies, this invention proposes a gas supply device capable of adapting to the separate gas supply needs of a dual-cathode coating mechanism.

[0004] To achieve the above objectives, the present invention adopts the following technical solution: a gas supply device for a dual-cathode coating mechanism, characterized in that it includes a gas supply box located between two cathode targets, the gas supply box including a box body and a gas delivery strip inserted into the box body, the two sides of the gas delivery strip forming an outlet channel between the two parallel inner wall surfaces of the box body, a guide frame fixedly provided at the bottom of the gas delivery strip, the guide frame guiding the gas at the end of the corresponding outlet channel to the cathode target on the same side, the gas delivery strip having two inner gas grooves, an outer gas groove having an outer gas groove outside the inner gas groove, the inner gas groove and the adjacent outer gas groove being connected by a plurality of ventilation holes, the outer gas groove and the adjacent outlet channel being connected by a plurality of ventilation holes, and the inner gas groove and the outer gas groove being connected by a gas source respectively.

[0005] Furthermore, the outer side of the air delivery strip has several mixing plates located in the air outlet channel, and the mixing plates are arranged longitudinally alternately.

[0006] Compared with the prior art, the present invention has the following advantages:

[0007] 1. It can provide separate gases to the two cathode targets, including supplying a single gas to each side, supplying a mixed gas to each side, or supplying the same gas to each side. Of course, under the condition of consistent vacuum, the ratio of the mixed gas can also be controlled by the amount of gas supplied.

[0008] 2. Due to the structure of the outer and inner gas slots, plus the disturbance of the mixing plate, the mixing of the gas mixture is more uniform. Attached Figure Description

[0009] Figure 1 This is a schematic diagram showing the location of the gas supply device in the coating system.

[0010] Figure 2 This is a schematic diagram of the gas supply device.

[0011] Figure 3 This is a cross-sectional view of the gas supply device.

[0012] Figure 4 This is an exploded view of the gas supply unit housing and the gas delivery strip.

[0013] Legend: 1. Air supply box; 2. Air supply strip; 3. Air outlet channel; 4. Flow guide; 5. Inner air groove; 6. Outer air groove; 7. Vent hole one; 8. Vent hole two; 9. Mixing plate. Detailed Implementation

[0014] The following are specific embodiments of the present invention, which are described in conjunction with the accompanying drawings. However, the present invention is not limited to these embodiments.

[0015] like Figure 1 , Figure 2 , Figure 3 and Figure 4 As shown, the device includes a gas supply box 1 located between two cathode targets. The gas supply box 1 includes a box body and a gas delivery strip 2 inserted inside the box body. A gas outlet channel 3 is formed between the two sides of the gas delivery strip 2 and the two parallel inner walls of the box body. A guide frame 4 is fixedly installed at the bottom of the gas delivery strip 2. The guide frame 4 guides the gas at the end of the corresponding gas outlet channel 3 to the cathode target on the same side. The gas delivery strip 2 has two inner gas grooves 5 and an outer gas groove 6 on the outside of the inner gas grooves 5. The inner gas grooves 5 and the adjacent outer gas grooves 6 are connected by several ventilation holes 7. The outer gas grooves 6 and the adjacent gas outlet channels 3 are connected by several ventilation holes 8. The inner gas grooves 5 and the outer gas grooves 6 are respectively connected to a gas source.

[0016] The outer side of the air supply strip 2 has several mixing plates 9 located in the air outlet channel 3, and the mixing plates 9 are arranged longitudinally alternately.

[0017] When the coating process of two cathode targets only requires argon, argon can be introduced into the two inner gas grooves 5 respectively. When the coating of the cathode targets on both sides requires a mixture of two gases, the inner gas groove 5 and the outer gas groove 6 on the same side can be introduced into the two gases respectively. The gas supply of the two cathode targets is independent, and the corresponding gas source can be selected at a certain coating station as needed. When mixing process gases, the gases need to enter the outer gas channel 6 through the inner gas channel 5 before reaching the outlet channel 3. Therefore, the gases entering the outlet channel 3 have already been mixed. As the gases enter the coating chamber downwards through the outlet channel, they are affected by multiple mixing plates 9. A throat is formed between the mixing plates 9 and the inner wall of the chamber. The flow velocity increases due to the decrease in cross-section, forming a longitudinal jet. This jet intersects with the flow direction of the gas entering the outlet channel 3 laterally through the vent hole 8, further causing mutual mixing of the two gases. This ensures that the mixed gas entering the coating chamber is uniform. The guide frame 4 can make the gas flow horizontally towards the corresponding target material. Under negative pressure, even if different gases are in the same coating chamber, they can effectively isolate each other from interference.

[0018] The specific embodiments described herein are merely illustrative of the spirit of the invention. Those skilled in the art to which this invention pertains may make various modifications or additions to the described specific embodiments or use similar methods to substitute them, without departing from the spirit of the invention or exceeding the scope defined by the appended claims.

Claims

1. A gas supply device for a dual-cathode coating mechanism, characterized in that, The gas supply box (1) is located between two cathode targets. The gas supply box (1) includes a box body and a gas delivery strip (2) inserted into the box body. The two sides of the gas delivery strip (2) form an outlet channel (3) between the two parallel inner walls of the box body. A guide frame (4) is fixedly installed at the bottom of the gas delivery strip (2). The guide frame (4) guides the gas at the end of the corresponding outlet channel (3) to the cathode target on the same side. The gas delivery strip (2) has two inner gas grooves (5). The outer side of the inner gas groove (5) has an outer gas groove (6). The inner gas groove (5) and the adjacent outer gas groove (6) are connected by several ventilation holes (7). The outer gas groove (6) and the adjacent outlet channel (3) are connected by several ventilation holes (8). The inner gas groove (5) and the outer gas groove (6) are respectively connected to a gas source.

2. The gas supply device for a dual-cathode coating mechanism according to claim 1, characterized in that, The outer side of the air supply strip (2) has several mixing plates (9) located in the air outlet channel (3), and each mixing plate (9) is arranged longitudinally alternately.

Images