Mask plate and evaporation device
By designing a mask plate with a layered structure and support, the problem of poor vapor deposition caused by the deformation of the opening during the mask plate stretching process was solved, achieving higher vapor deposition accuracy and display panel yield.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-01-14
- Publication Date
- 2026-04-10
AI Technical Summary
During the photomask stretching process, aperture deformation leads to poor vapor deposition, making it difficult to ensure precise alignment between the aperture and the pixel aperture area of the OLED display panel, thus affecting vapor deposition accuracy and yield.
Design a mask plate including a first mask layer and a second mask layer stacked together. The first mask layer has multiple openings, and the second mask layer has support portions distributed around the openings. The width of the support portions gradually changes in the boundary extension direction to enhance the strength of the mask plate and reduce deformation.
It improves the precision of vapor deposition, avoids vapor deposition mismatch and scratch particles, enhances the strength of the mask, reduces opening deformation, and improves the yield of display panels.
Smart Images
Figure CN121826593A_ABST
Abstract
Description
Technical Field
[0001] This application relates to the field of display technology, and in particular to a mask and vapor deposition apparatus. Background Technology
[0002] The organic light-emitting layer in an Organic Light-Emitting Diode (OLED) display panel is typically manufactured using a vapor deposition process. For example, a mask with a perforated pattern can be used to form the desired pattern on the substrate to be deposited via vacuum vapor deposition. This mask can be a high-precision metal mask (FMM).
[0003] The photomask can have multiple openings, which correspond to the pixel opening areas in the OLED display panel. When depositing the organic light-emitting layer using the photomask, the photomask needs to be stretched and fixed to a metal frame.
[0004] However, during the photomask stretching process, the openings will deform to varying degrees. It is difficult to ensure that after the photomask is fixed to the metal frame, the openings can be precisely aligned with each pixel opening in the pixel opening area of the OLED display panel. The organic light-emitting layer after evaporation is prone to defects such as color mixing, resulting in a low yield of the OLED display panels manufactured subsequently. Summary of the Invention
[0005] This application provides a photomask and a vapor deposition apparatus. It can solve the problems of color mixing and other defects in existing vapor deposition techniques. The technical solution is as follows: On the one hand, a mask plate is provided, characterized in that the mask plate comprises: a first mask layer and a second mask layer stacked together; The first mask layer has a plurality of openings arranged in an array; each opening has two first boundaries disposed opposite to each other in a first direction and two second boundaries disposed opposite to each other in a second direction; The second mask layer includes a plurality of support portions distributed around the plurality of openings; the plurality of support portions distributed around a single opening includes: two opposing first support portions, the two first support portions respectively corresponding to two first boundaries in the opening, and the first support portions and the corresponding first boundaries being distributed adjacent to each other in the first direction; In the direction of extension of the first boundary, the width of the first support gradually increases and then gradually decreases from one end of the first support to the other end.
[0006] Optionally, the overall extension direction of the first support portion is parallel to the extension direction of the first boundary; in the extension direction of the first boundary, the distance between the maximum width position of the first support portion and one end of the first boundary is equal to the distance between the maximum width position of the first support portion and the other end of the first boundary.
[0007] Optionally, the plurality of support portions distributed around a single opening further include: two opposing second support portions, each of which corresponds to one of the two second boundaries of the opening, and the second support portions and their corresponding second boundaries are distributed adjacent to each other in the second direction; In the extending direction of the second boundary, the width of the second support gradually increases and then gradually decreases from one end of the second support to the other end.
[0008] Optionally, the overall extension direction of the second support portion is parallel to the extension direction of the second boundary; in the extension direction of the second boundary, the distance between the maximum width position of the second support portion and one end of the second boundary is equal to the distance between the maximum width position of the second support portion and the other end of the second boundary.
[0009] Optionally, the plurality of first openings are arranged in multiple rows along the first direction and in multiple columns along the second direction; the second boundaries of two adjacent openings in the first direction are flush. Wherein, the overall extension direction of the first support portion is parallel to the extension direction of the first boundary, and the extension length of the first support portion is greater than or equal to the extension length of the first boundary; the overall extension direction of the second support portion is parallel to the extension direction of the second boundary, and the extension length of the second support portion is greater than or equal to the extension length of the second boundary.
[0010] Optionally, for any one of the openings, the end of the first support portion corresponding to the first boundary of the opening is connected to the end of the second support portion corresponding to the second boundary of the opening.
[0011] Optionally, the plurality of openings are arranged in multiple rows along the first direction and in multiple columns along the second direction; the second boundaries of two adjacent openings in the first direction are staggered in the second direction. Wherein, two adjacent openings in the first direction are respectively a first type of opening and a second type of opening; the extension length of the first support portion distributed adjacent to the first type of opening is greater than the distance between two adjacent second type of openings distributed in the second direction; the extension length of the first support portion distributed adjacent to the second type of opening is less than the extension length of the first boundary in the second type of opening.
[0012] Optionally, the overall extension direction of the first support portion is parallel to the extension direction of the first boundary; the extension length of the first support portion distributed adjacent to the first type of opening is greater than or equal to the extension length of the first boundary of the first type of opening; the extension length of the first support portion distributed adjacent to the second type of opening is less than or equal to the distance between two adjacent first type of openings.
[0013] Optionally, the plurality of support portions distributed around the single opening further include: two opposing second support portions; the ends of the second support portions are connected to the maximum width position of the first support portion.
[0014] On the other hand, a vapor deposition apparatus is provided, characterized in that it includes: a main frame, and a plurality of mask plates connected to the main frame, wherein each of the mask plates is any of the mask plates described above.
[0015] The beneficial effects of the technical solutions provided in this application include at least the following: Because the width of the first support portion gradually increases and then gradually decreases from one end to the other along the extension direction of the first boundary, the width of the first support portion is larger at locations where deformation of the first boundary is likely to occur. This ensures greater strength of the mask and smaller deformation of the opening, thereby improving the evaporation accuracy and avoiding evaporation mismatch. Simultaneously, the width of the first support portion is larger in the middle and smaller at both ends along the extension direction of the first boundary, making the strength at the middle position greater than that at the ends. This effectively prevents the opening from shrinking inward along the extension direction of the first boundary, thus avoiding large wrinkles and waves in the mask that could cause scratches and defects. Attached Figure Description
[0016] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.
[0017] Figure 1This is a partial top view of the mask on the first side; Figure 2 This is a partial top view of the mask on the second side; Figure 3 This is another partial top view of the mask on the second side; Figure 4 This is a schematic diagram of a partial arrangement of pixel openings in a display panel; Figure 5 It is a partial top view of the front of a photomask; Figure 6 This is a partial top view of the front of another type of mask. Figure 7 This is a partial top view of the front of another type of mask. Figure 8 This is a partial schematic diagram of the pixel opening arrangement of another type of display panel; Figure 9 This is a partial top view of the front of another type of mask; Figure 10 This is a partial top view of the back of the mask provided in an embodiment of this application; Figure 11 yes Figure 10 A schematic cross-sectional view of the mask plate at BB' is shown; Figure 12 yes Figure 10 A schematic cross-sectional view of the mask plate at CC' is shown; Figure 13 This is another partial top view of the back of the mask provided in the embodiments of this application; Figure 14 This is another partial top view of the back of the mask provided in the embodiments of this application; Figure 15 This is another partial top view of the back of the mask provided in the embodiments of this application; Figure 16 This is a partial top view of the front of the mask provided in an embodiment of this application; Figure 17 This is another partial top view of the back of the mask provided in the embodiments of this application; Figure 18 yes Figure 14 The diagram shows a cross-sectional view of the mask plate in the AA' direction; Figure 19 This is a partial structural schematic diagram of a vapor deposition apparatus provided in this application. Detailed Implementation
[0018] To make the objectives, technical solutions, and advantages of this application clearer, the embodiments of this application will be described in further detail below with reference to the accompanying drawings.
[0019] Please refer to Figure 1 and Figure 2 , Figure 1 This is a partial top view of the mask on the first side. Figure 2 This is a partial top view of the mask 000 on the second side. The mask 000 may include a first mask layer 001 and a second mask layer 002 stacked together. In the embodiments of this application, the first side of the mask 000 is the side of the first mask layer 001 facing away from the second mask layer 002, which is the front side of the mask 000, and the second side of the mask 000 is the side of the second mask layer 002 facing away from the first mask layer 001, which is the back side of the mask 000.
[0020] The first mask layer 001 in the mask plate 000 has a plurality of openings K, which are arranged in an array. Each opening K has two first boundaries K1 opposite each other in a first direction X, and two second boundaries K2 opposite each other in a second direction Y. Here, both the first direction X and the second direction Y are parallel to the mask plate 000, and the first direction X intersects the second direction Y. The first direction X may be parallel to the extension direction of the second boundary K2 of the opening K, and the second direction Y may be parallel to the extension direction of the first boundary K1 of the opening K.
[0021] The second mask layer 002 in the mask plate 000 includes a plurality of support portions Z distributed around a plurality of openings K. The plurality of support portions Z distributed around a single opening K includes: two opposing first support portions Z1 and two opposing second support portions Z2. The two first support portions Z1 correspond to two first boundaries K1 in the opening K, respectively, and the first support portions Z1 and their corresponding first boundaries K1 are distributed adjacently in the first direction X. The two second support portions Z2 correspond to two second boundaries K2 in the opening K, respectively, and the second support portions Z2 and their corresponding second boundaries K2 are distributed adjacently in the second direction Y. At least a portion of the first support portions Z1 of two adjacent openings K in the first direction X can be reused as the same structure. The second support portions Z2 of two adjacent openings K in the second direction Y can be reused as the same structure. That is, in the mask plate 000, a row of first support portions Z1 is distributed between two rows of adjacent openings K; a column of second support portions Z2 is distributed between two columns of adjacent openings K.
[0022] In related technologies, the width w1 of the first support Z1 is equal at all positions in the extension direction parallel to the first boundary K1, and the width w2 of the second support Z2 is equal at all positions in the extension direction parallel to the second boundary K2. During the mesh stretching process, the deformation of the opening K in the mask 000 is relatively large. For example, when the mesh stretching direction of the mask 000 is parallel to the first direction X, because the length of the first boundary K1 is relatively large, the first boundary K1 is prone to significant deformation under tension.Figure 3 As shown, in this case, the second boundary K2 of the opening K will shrink inwards, ultimately resulting in obvious wrinkles and waves on the mask 000. On the one hand, during the evaporation alignment process, the uneven mask 000 cannot fit tightly with the substrate to be evaporated, easily forming a halo and affecting the evaporation accuracy. Furthermore, the wrinkles and waves of the mask 000 and the relative frictional misalignment with the substrate to be evaporated can easily form scratches, resulting in defects.
[0023] On the other hand, in order to extend the lifespan of products such as display panels, it is necessary to increase the area of the vapor-deposited organic light-emitting layer. Therefore, in some embodiments, one opening K of the mask 000 can simultaneously correspond to multiple pixel openings in the display panel. For example... Figure 4 As shown, Figure 4 This is a schematic diagram showing a partial arrangement of pixel openings in a display panel. The organic light-emitting layer in the display panel may include: multiple red light-emitting units R, multiple green light-emitting units G, and multiple blue light-emitting units B. Please refer to [reference needed]. Figure 5 , Figure 6 and Figure 7 , Figure 5 This is a partial top view of the front of a photomask, which can be used for vapor deposition. Figure 4 The red luminous part R in the display panel shown. Figure 6 This is a partial top view of the front of another type of photomask, which can be used for vapor deposition. Figure 4 The green light-emitting part G in the display panel shown, Figure 7 This is a partial top view of the front of another type of photomask, which can be used for vapor deposition. Figure 4 The blue emitting part B in the display panel is shown. (As shown) Figure 4 and Figure 7 As shown, in some display panels, two adjacent blue emitting elements B can be simultaneously deposited through the same opening K in a mask 000. Alternatively, please refer to... Figure 8 and Figure 9 , Figure 8 This is a partial schematic diagram of the pixel arrangement of another type of display panel. Figure 9 This is a partial top view of the front of another type of photomask, which can be used for vapor deposition. Figure 8 The blue light-emitting part B in the display panel is shown. In some display panels, four adjacent blue light-emitting parts B can be simultaneously vapor-deposited through the same opening K of the mask 000. When multiple light-emitting parts are simultaneously vapor-deposited through the same opening K, the aspect ratio of the opening K is larger, and the deformation of the opening K is also larger during the meshing process of the mask 000, which can easily cause poor vapor deposition mismatch such as color mixing.
[0024] Therefore, this application provides a mask plate 000 that can improve the strength of the mask plate 000 and reduce the deformation of the mask plate 000 during the screen stretching process, thereby improving the evaporation accuracy and avoiding defects such as scratches and evaporation mismatch.
[0025] Please refer to Figure 10 , Figure 11 and Figure 12 , Figure 10 This is a partial top view of the back side of the mask provided in the embodiments of this application, that is, a partial top view of the back side of the mask 000. Figure 11 yes Figure 10 The diagram shown is a cross-sectional view of the mask at BB'. Figure 12 yes Figure 10 The diagram shows a cross-sectional view of the mask at CC'. Because the length of the first boundary K1 is relatively large, and the mesh stretching direction is perpendicular to the extension direction of the first boundary K1, the middle position of the first boundary K1 is more prone to deformation than its two ends. In the extension direction of the first boundary K1, the width w1 of the first support Z1 gradually increases and then gradually decreases from one end to the other. In this case, the width w1 of the first support Z1 is larger at the middle position of the first boundary K1, and smaller at the two ends. That is, the width w1 of the first support Z1 is larger at the locations where the first boundary K1 is prone to deformation. This ensures greater strength of the mask 000 and smaller deformation of the opening K, thereby improving the evaporation accuracy and avoiding evaporation mismatch. Meanwhile, in the extension direction of the first boundary K1, the width of the middle position of the first support Z1 is larger and the width of the two ends is smaller, so that the strength of the middle position of the first support Z1 is greater than that of the two ends. This can effectively prevent the opening K from shrinking inward along the extension direction of the first boundary K1, thereby avoiding the large wrinkles and waves of the mask plate 000 that could cause scratches and defects.
[0026] In summary, the photomask provided in this application includes: a first photomask layer and a second photomask layer stacked together. The first photomask layer has multiple openings, and the second photomask layer includes multiple support portions distributed around the multiple openings. Because the width of the first support portion gradually increases and then gradually decreases from one end to the other in the direction of extension of the first boundary, the width of the first support portion corresponding to the location where deformation of the first boundary is likely is larger. This ensures greater strength of the photomask and smaller deformation of the openings, thereby improving the evaporation accuracy and avoiding evaporation mismatch. Simultaneously, in the direction of extension of the first boundary, the width of the first support portion is larger in the middle and smaller at both ends, making the strength at the middle position greater than the strength at the ends. This effectively prevents the openings from shrinking inward along the direction of extension of the first boundary, thereby avoiding defects caused by large wrinkles and waves in the photomask leading to scratches and particles.
[0027] like Figure 10 As shown, the overall extension direction of the first support portion Z1 is parallel to the extension direction of the first boundary K1. In the extension direction of the first boundary K1, the distance d1 between the position of the first support portion Z1 at its maximum width and one end of the first boundary K1 is equal to the distance d2 between the position of the first support portion Z1 at its maximum width and the other end of the first boundary K1. This ensures that the width w1 of the first support portion Z1 at the location where the first boundary K1 is most prone to deformation is maximized, thereby ensuring a better effect on improving the strength of the mask plate 000.
[0028] Please refer to Figure 13 , Figure 13 This is another partial top view of the back side of the mask provided in this application embodiment. The plurality of support portions Z distributed around the single opening K further include: two opposing second support portions Z2, each corresponding to one of the two second boundaries K2 of the opening K, and the second support portions Z2 and their corresponding second boundaries K2 are distributed adjacent to each other in the second direction Y. In the extending direction of the second boundary K2, the width w2 of the second support portion Z2 gradually increases and then gradually decreases from one end of the second support portion Z2 to the other end.
[0029] That is, at the middle position of the second boundary K2, the width w2 of the corresponding second support part Z2 is larger; at both ends of the second boundary K2, the width w2 of the corresponding second support part Z2 is smaller. In this way, when the mesh stretching direction is perpendicular to the extension direction of the second boundary K2, the second support part Z2 can ensure that the strength of the mask plate 000 is large and the deformation of the opening K is small, thereby improving the evaporation accuracy, avoiding evaporation mismatch, and preventing the mask plate 000 from generating large wrinkles and waves that cause scratches and particles that cause defects.
[0030] The overall extension direction of the second support Z2 is parallel to the extension direction of the second boundary K2. In the extension direction of the second boundary K2, the distance d3 between the maximum width position of the second support Z2 and one end of the second boundary K2 is equal to the distance d4 between the maximum width position of the second support Z2 and the other end of the second boundary K2. This ensures that the width w2 of the second support Z2 is maximized at the location where the second boundary K2 is most prone to deformation, thereby ensuring a better effect on improving the strength of the mask plate 000.
[0031] In some possible implementations, such as Figure 10 and Figure 13 As shown, multiple openings K are arranged in multiple rows along the first direction X and in multiple columns along the second direction Y. The second boundaries K2 of two adjacent openings K in the first direction X are staggered in the second direction Y.
[0032] Wherein, two adjacent openings K in the first direction X are respectively a first type of opening Ka and a second type of opening Kb. The extension length of the first support portion Z1 adjacent to the first type of opening Ka is greater than the distance between two adjacent second type of openings Kb distributed in the second direction Y; the extension length of the first support portion Z1 adjacent to the second type of opening Kb is less than the extension length of the first boundary K1 in the second type of opening Kb. Between two adjacent rows of openings K, the first support portion Z1 adjacent to the first type of opening Ka and the first support portion Z1 adjacent to the second type of opening Kb can be connected.
[0033] The overall extension direction of the first support Z1 is parallel to the extension direction of the first boundary K1. The extension length of the first support Z1 adjacent to the first type of opening Ka is greater than or equal to the extension length of the first boundary K1 of the first type of opening Ka; the extension length of the first support Z1 adjacent to the second type of opening Kb is less than or equal to the distance between two adjacent first type of openings Ka.
[0034] like Figure 13 As shown, when multiple support parts Z also include a second support part Z2, the end of the second support part Z2 is connected to the position of the maximum width of the first support part Z1. In this way, when the tensioning direction is perpendicular to the extension direction of the first boundary K1, since the second support part Z2 connects the two ends of the first support part Z1, the strength of the mask plate 000 can be further improved, resisting the deformation of the opening K under tension.
[0035] For other possible implementations, please refer to Figure 14 and Figure 15 , Figure 14 This is another partial top view of the back side of the mask provided in the embodiments of this application. Figure 15This is another partial top view of the back side of the mask provided in the embodiments of this application. A plurality of first openings K are arranged in multiple rows along the first direction X and in multiple columns along the second direction Y, with the second boundaries K2 of two adjacent openings K being flush with each other in the first direction X.
[0036] like Figure 14 As shown, in the related technology, the width w1 of the first support Z1 is equal at all positions in the extension direction parallel to the first boundary K1, and the width w2 of the second support Z2 is equal at all positions in the extension direction parallel to the second boundary K2, resulting in a lower strength of the mask plate 000.
[0037] like Figure 15 As shown, in the mask 000 provided in this embodiment, in the extension direction of the first boundary K1, the width w1 of the first support Z1 gradually increases and then gradually decreases from one end of the first support Z1 to the other end. In the extension direction of the second boundary K2, the width w2 of the second support Z2 gradually increases and then gradually decreases from one end of the second support Z2 to the other end. The first support Z1 of two adjacent openings K in the first direction X can be reused as the same structure. The second support Z2 of two adjacent openings K in the second direction Y can be reused as the same structure. That is, in the mask 000, a row of first support Z1 is distributed between two rows of adjacent openings K; a column of second support Z2 is distributed between two columns of adjacent openings K.
[0038] When the second boundaries K2 of two adjacent openings K in the first direction X are flush, the extension length of the first support Z1 is greater than or equal to the extension length of the first boundary K1, and the extension length of the second support Z2 is greater than or equal to the extension length of the second boundary K2.
[0039] For any opening K, the end of the first support part Z1 corresponding to the first boundary K1 of the opening K is connected to the end of the second support part Z2 corresponding to the second boundary K2 of the opening K. In this way, the strength of the mask plate 000 can be further increased and the alignment accuracy of the vapor deposition can be improved.
[0040] It should be noted that when the second boundaries K2 of two adjacent openings K in the first direction X are flush, the extension direction of the first direction X, i.e., the extension direction of the second boundary K2, can be parallel to the first side A1 of the mask plate 000, and the extension direction of the second direction Y, i.e., the extension direction of the first boundary K1, can be parallel to the second side A2 of the mask plate 000. Here, the first side A1 and the second side A2 of the mask plate 000 intersect. For example, as shown... Figure 15 As shown.
[0041] Alternatively, please refer to Figure 16 and Figure 17 ,Figure 16 This is a partial top view of the front of the mask provided in an embodiment of this application. Figure 17 This is another partial top view of the back side of the mask provided in this application embodiment. The first direction X, that is, the extension direction of the second boundary K2, may not be parallel to the first side A1 of the mask 000, and the second direction Y, that is, the extension direction of the first boundary K1, may not be parallel to the second side A2 of the mask 000. In this case, the mesh-stretching direction of the mask 000 may be perpendicular to the first side A1 of the mask 000, or the mesh-stretching direction of the mask 000 may be perpendicular to the second side A2 of the mask 000.
[0042] For example, such as Figure 16 As shown, the angle θ1 between the first direction X and the second side A2 of the mask 000 is 135 degrees, and the angle θ2 between the second direction Y and the second side A2 of the mask 000 is 45 degrees. When the meshing direction of the mask 000 is perpendicular to the second side A2 of the mask 000, the tension force will generate a first component force F1 extending along the extension direction of the first boundary K1 of the opening K, and a second component force F2 extending along the extension direction of the second boundary K2 of the opening K around the opening K. This makes the opening K prone to deformation under the action of the tension force, affecting the evaporation accuracy and evaporation effect.
[0043] In multiple support sections Z such Figure 17 In the case shown, the mask plate 000 has greater strength, which can reduce the deformation of the opening K of the mask plate 000 during the screen stretching process, thereby improving the evaporation accuracy and avoiding defects such as scratches and evaporation mismatch.
[0044] In this embodiment, the first mask layer 001 and the second mask layer 002 in the mask plate 000 can be an integral structure. The mask plate 000 is formed by performing one front-side etching and one back-side etching on the mask substrate. For example, the thickness of the mask substrate can be 30 micrometers in the direction perpendicular to the mask substrate. The mask substrate can include: a first mask substrate and a second mask substrate, the thickness of the first mask substrate can be 10 micrometers, and the thickness of the second mask substrate can be 20 micrometers. The first mask layer 001 is formed after performing one front-side etching on the first mask substrate, and the second mask layer 002 is formed after performing one back-side etching on the second mask substrate.
[0045] Please refer to Figure 18 , Figure 18 yes Figure 14The diagram shows a cross-sectional view of the photomask in the AA' direction. Due to the etching process, in the direction perpendicular to the photomask 000, the boundary of the opening K of the first mask layer 001 and the boundary of the support Z of the second mask layer 002 are not straight lines perpendicular to the photomask 000. The opening K of the first mask layer 001 can have a first opening interface M1 and a second opening interface M2. The first opening interface M1 is located on the side of the first mask layer 001 facing away from the second mask layer 002, which is the front side of the photomask 000. The second opening interface M2 is located on the side of the first mask layer 001 facing the second mask layer 002, which is the contact surface between the first mask layer 001 and the second mask layer 002. Furthermore, the area of the first opening interface M1 is larger than the area of the second opening interface M2, and the boundary of the opening K is an arcuate surface connecting the edge of the first opening interface M1 and the edge of the second opening interface M2. The actual vapor deposition area of mask 000 is the area of the second opening interface M2.
[0046] Similarly, the support portion Z of the second mask layer 002 can have a first support surface M3 and a second support surface M4. The first support surface M3 is located on the side of the second mask layer 002 facing away from the first mask layer 001, i.e., the back side of the mask plate 000. The second support surface M4 is located on the side of the second mask layer 002 facing the first mask layer 001, i.e., the contact surface between the first mask layer 001 and the second mask layer 002. Furthermore, the area of the first support surface M3 is smaller than the area of the second support surface M4, and the boundary of the support portion Z is an arcuate surface where the edge of the first support surface M3 connects to the edge of the second support surface M4.
[0047] Typically, in the direction perpendicular to the mask 000, the thickness of the second mask layer 002 is greater than the thickness of the first mask layer 001. Therefore, as... Figure 18 As shown, in the direction perpendicular to the mask plate 000, the support portion Z still has a relatively large thickness near the second opening interface M2, which will form a large evaporation shadow during the evaporation process, affecting the evaporation effect. Here, the thickness h1 of the support portion Z is the vertical distance h1 between the boundary of the support portion Z and the contact surface between the first mask layer 001 and the second mask layer 002. Furthermore, for any opening K, the thickness of the support portion Z corresponding to the corner of the opening K is greater than the thickness of the support portion Z corresponding to the boundary of the opening K. For example, the thickness of the support portion Z corresponding to the corner of the opening K is greater than or equal to 8 micrometers, and the thickness of the support portion Z corresponding to the boundary of the opening K is greater than or equal to 2 micrometers. Here, the corner of the opening K refers to the connection point between the first boundary K1 and the second boundary K2, and the boundary of the opening K refers to either the first boundary K1 or the second boundary K2. Therefore, during the evaporation process, the evaporation shadow at different locations will also have significant differences, resulting in poor evaporation uniformity.
[0048] In the embodiments of this application, such as Figure 15 As shown, in the extension direction of the first boundary K1, the width w1 of the first support Z1 gradually increases and then gradually decreases from one end of the first support Z1 to the other. Similarly, in the extension direction of the second boundary K2, the width w2 of the second support Z2 gradually increases and then gradually decreases from one end of the second support Z2 to the other. Therefore, in the direction parallel to the mask plate 000, the distance between the end of the first support Z1 and the end of the first boundary K1 is relatively large, and the distance between the end of the second support Z2 and the end of the second boundary K2 is also relatively large. This allows for a smaller thickness of the support Z near the second opening interface M2 at the corner of the opening K, ensuring that the thickness of the support Z at the corner of the opening K is similar to the thickness of the support Z at the boundary of the opening K. Consequently, the difference in evaporation shadows at different locations during the evaporation process is also smaller, thereby improving the stability and film uniformity of the evaporation process.
[0049] In summary, the photomask provided in this application includes: a first photomask layer and a second photomask layer stacked together. The first photomask layer has multiple openings, and the second photomask layer includes multiple support portions distributed around the multiple openings. Because the width of the first support portion gradually increases and then gradually decreases from one end to the other in the direction of extension of the first boundary, the width of the first support portion corresponding to the location where deformation of the first boundary is likely is larger. This ensures greater strength of the photomask and smaller deformation of the openings, thereby improving the evaporation accuracy and avoiding evaporation mismatch. Simultaneously, in the direction of extension of the first boundary, the width of the first support portion is larger in the middle and smaller at both ends, making the strength at the middle position greater than the strength at the ends. This effectively prevents the openings from shrinking inward along the direction of extension of the first boundary, thereby avoiding defects caused by large wrinkles and waves in the photomask leading to scratches and particles.
[0050] This application also provides a vapor deposition apparatus; please refer to [reference needed]. Figure 19 , Figure 19 This is a partial structural schematic diagram of a vapor deposition apparatus provided in this application. The vapor deposition apparatus 00 includes: a main frame 01, and a plurality of mask plates 000 connected to the main frame 01, wherein each mask plate 000 is the mask plate 000 described in any of the above embodiments. Each mask plate 000 is welded to the main frame 01 after the mesh is stretched.
[0051] It should be noted that the dimensions of layers and regions may be exaggerated in the accompanying drawings for clarity. Furthermore, it is understood that when an element or layer is referred to as being "on" another element or layer, it can be directly on the other element, or there may be intermediate layers. Additionally, it is understood that when an element or layer is referred to as being "below" another element or layer, it can be directly below the other element, or there may be more than one intermediate layer or element. Furthermore, it is also understood that when a layer or element is referred to as being "between" two layers or two elements, it can be the only layer between the two layers or two elements, or there may be more than one intermediate layer or element. Similar reference numerals throughout indicate similar elements.
[0052] In this application, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance. The term "multiple" refers to two or more unless otherwise expressly defined.
[0053] The above description is merely an optional embodiment of this application and is not intended to limit this application. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.
Claims
1. A photomask, characterized in that, The mask plate includes: a first mask layer and a second mask layer stacked together; The first mask layer has a plurality of openings arranged in an array; each opening has two first boundaries disposed opposite to each other in a first direction and two second boundaries disposed opposite to each other in a second direction; The second mask layer includes a plurality of support portions distributed around the plurality of openings; the plurality of support portions distributed around a single opening includes: two opposing first support portions, the two first support portions respectively corresponding to two first boundaries in the opening, and the first support portions and the corresponding first boundaries being distributed adjacent to each other in the first direction; In the direction of extension of the first boundary, the width of the first support gradually increases and then gradually decreases from one end of the first support to the other end.
2. The mask plate according to claim 1, characterized in that, The overall extension direction of the first support portion is parallel to the extension direction of the first boundary; in the extension direction of the first boundary, the distance between the maximum width position of the first support portion and one end of the first boundary is equal to the distance between the maximum width position of the first support portion and the other end of the first boundary.
3. The mask plate according to claim 1, characterized in that, The plurality of support portions distributed around the single opening further include: two opposing second support portions, each of which corresponds to one of the two second boundaries of the opening, and the second support portions and their corresponding second boundaries are distributed adjacent to each other in the second direction; In the extending direction of the second boundary, the width of the second support gradually increases and then gradually decreases from one end of the second support to the other end.
4. The mask plate according to claim 3, characterized in that, The overall extension direction of the second support portion is parallel to the extension direction of the second boundary; in the extension direction of the second boundary, the distance between the maximum width position of the second support portion and one end of the second boundary is equal to the distance between the maximum width position of the second support portion and the other end of the second boundary.
5. The mask plate according to claim 3, characterized in that, The plurality of first openings are arranged in multiple rows along the first direction and in multiple columns along the second direction; the second boundaries of two adjacent openings in the first direction are flush. Wherein, the overall extension direction of the first support portion is parallel to the extension direction of the first boundary, and the extension length of the first support portion is greater than or equal to the extension length of the first boundary; the overall extension direction of the second support portion is parallel to the extension direction of the second boundary, and the extension length of the second support portion is greater than or equal to the extension length of the second boundary.
6. The mask plate according to claim 5, characterized in that, For any one of the openings, the end of the first support corresponding to the first boundary of the opening is connected to the end of the second support corresponding to the second boundary of the opening.
7. The mask plate according to any one of claims 1-4, characterized in that, The plurality of openings are arranged in multiple rows along the first direction and in multiple columns along the second direction; the second boundaries of two adjacent openings in the first direction are staggered in the second direction. Wherein, two adjacent openings in the first direction are respectively a first type of opening and a second type of opening; the extension length of the first support portion distributed adjacent to the first type of opening is greater than the distance between two adjacent second type of openings distributed in the second direction; the extension length of the first support portion distributed adjacent to the second type of opening is less than the extension length of the first boundary in the second type of opening.
8. The mask plate according to claim 7, characterized in that, The overall extension direction of the first support portion is parallel to the extension direction of the first boundary; the extension length of the first support portion distributed adjacent to the first type of opening is greater than or equal to the extension length of the first boundary of the first type of opening. The extension length of the first support portion distributed adjacent to the second type of opening is less than or equal to the distance between two adjacent first type of openings.
9. The mask plate according to claim 7, characterized in that, The plurality of support portions distributed around the single opening further include: two opposing second support portions; the ends of the second support portions are connected to the maximum width position of the first support portion.
10. A vapor deposition apparatus, characterized in that, include: A main frame, and a plurality of mask plates connected to the main frame, wherein each of the mask plates is a mask plate according to any one of claims 1-9.