Alternating suspension supporting device for chemical vapor deposition and process method thereof

Abstract

The invention relates to an alternate suspension supporting device for chemical vapor deposition, which relates to the field of semiconductor growth, and comprises a suspension assembly comprising an air tap, an air disc, an air inlet pipe and an air inlet valve, one end of the air tap is fixed with the upper side surface of the air disc, an air channel is arranged in the air disc, the air tap is communicated with the air channel, the lower side surface of the air disc is fixed with one end of the air inlet pipe, and the air inlet valve is arranged in the air disc; the other end of the intake pipe is fixed with the intake valve; the rotating assembly comprises an ejector pin, a bottom plate, a rotating table, a rotating shaft and a rotating motor, the lower side face of the disc-shaped workpiece abuts against the upper end face of the ejector pin, the lower end of the ejector pin is fixed to the upper side face of the bottom plate, the lower side face of the bottom plate is fixed to the rotating table, the rotating table is fixed to the rotating shaft, and the output end of the rotating motor is fixed to the rotating shaft. The rotating motor can drive the rotating shaft, the rotating table, the rotating bottom plate and the ejector pin to rotate by a preset angle, the air inlet pipe penetrates through the air disc, the bottom plate, the rotating table and the rotating shaft, and therefore the problem that a traditional lifting structure damages a surface coating of a disc-shaped workpiece is solved.

Description

Technical Field

[0001] This invention relates to the field of semiconductor growth, and in particular to an alternating suspension support apparatus and its process for chemical vapor deposition. Background Technology

[0002] Chemical vapor deposition (CVD) is an advanced materials preparation technology that refers to the process of depositing solid thin films or coatings on the surface of a specific substrate through chemical reactions under gas-phase conditions. With its significant advantages such as high film quality, wide applicability, and strong controllability, this technology has become one of the core processes in modern materials science, microelectronics, optical engineering, and aerospace.

[0003] In chemical vapor deposition processes for disc-shaped workpieces, ejector pins are typically used to alternately support the workpiece. However, existing technologies use a motor-driven lifting structure for graphite material to move up and down at regular intervals to achieve alternating support of the disc-shaped workpiece by ejector pins. When the lifting structure lifts the disc-shaped workpiece, it can cause damage or scratches to the coating on the surface of the workpiece, thus affecting the coating's lifespan. Summary of the Invention

[0004] This invention provides an alternating suspension support device and its process for chemical vapor deposition, which avoids damage to the coating on the surface of a disc-shaped workpiece caused by traditional lifting structures. The device and its process have the characteristics of increasing the service life of the coating and have good applicability.

[0005] To achieve the above objectives, the present invention adopts the following technical solution: An alternating suspension support device for chemical vapor deposition, used for alternatingly supporting a disk-shaped workpiece, comprising: A suspension assembly includes an air nozzle, an air plate, an air inlet pipe, and an air inlet valve. One end of the air nozzle is fixed to the upper side of the air plate. An air passage is provided inside the air plate, and the air nozzle is connected to the air passage. The lower side of the air plate is fixed to one end of the air inlet pipe, and the other end of the air inlet pipe is fixed to the air inlet valve. The rotating assembly includes an ejector pin, a base plate, a rotating table, a rotating shaft, and a rotating motor. The lower side of the disc-shaped workpiece abuts against the upper end face of the ejector pin. The lower end of the ejector pin is fixed to the upper side of the base plate. The lower side of the base plate is fixed to one end of the rotating table. The other end of the rotating table is fixed to one end of the rotating shaft. The output end of the rotating motor is fixed to the other end of the rotating shaft. The rotating motor can drive the rotating shaft, the rotating table, the base plate, and the ejector pin to rotate by a preset angle. The air inlet pipe passes through the air plate, the base plate, the rotating table, and the rotating shaft.

[0006] Preferably, there are multiple air passages, one end of each air passage is connected to the air inlet pipe, and the other end of each air inlet pipe is connected to the air nozzle. The multiple air passages are equidistantly distributed inside the air plate. This ensures that the raw material gas is evenly distributed on the air plate to form a uniform air film, thereby lifting and lowering the disc-shaped workpiece more evenly and avoiding damage caused by excessive local pressure.

[0007] Preferably, the lower side of the air plate and the upper side of the base plate are spaced apart in the vertical direction, with a spacing of at least two millimeters; this ensures that when the rotary motor drives the base plate to rotate, the base plate can rotate normally without interfering with the air plate, thereby ensuring the smoothness and reliability of the device operation.

[0008] Preferably, at least three ejector pins are provided, arranged evenly around the upper side of the base plate along the circumferential direction of the bottom; in the vertical direction, the height of the top of the ejector pin is greater than the height of the top of the air nozzle; this ensures the stability of the support for the disc-shaped workpiece, avoids workpiece tilting or uneven force, ensures that the air film can completely lift the workpiece, and allows the suspension component and the rotating component to work alternately without mechanical interference, thereby preventing damage to the coating caused by traditional lifting structures.

[0009] Preferably, the edges of the plurality of ejector pins near one end of the disc-shaped workpiece are arranged in an arc shape; this allows the clamping force applied by the ejector pins to be evenly distributed over a larger contact area, effectively reducing local pressure, preventing the formation of permanent indentations on the workpiece surface, and avoiding sharp edges from scratching the workpiece surface coating during contact or relative movement, thereby further protecting the integrity of the coating.

[0010] An alternating suspension support process for chemical vapor deposition includes the following steps: S1, a disc-shaped workpiece is placed on the top of multiple ejector pins, and the central axis of the disc-shaped workpiece is collinear with the central axis of the base plate, thus sealing the high-temperature furnace; S2, under a preset vacuum level and temperature, the raw material gas grows a solid film or coating on the surface of the disc-shaped workpiece; S3, open the air inlet valve to introduce the raw material gas, the raw material gas is sprayed out from the air nozzle, the gas film formed by the raw material gas lifts the disc-shaped workpiece, the rotary motor can drive the base plate and the ejector pin to rotate at a preset angle, close the air inlet valve, the gas film lowers the disc-shaped workpiece to the top of the ejector pin; S4, repeat step S3 at least once, until a uniform and complete solid film or coating grows on the surface of the disc-shaped workpiece. S5, after the high-temperature furnace is depressurized to atmospheric pressure and the temperature drops to room temperature, the disc-shaped workpiece is taken out.

[0011] Preferably, in step S3, during the intermittent time, the air film lifts the disc-shaped workpiece; during the preset time, the rotary motor drives the ejector pin to rotate at a preset angle; and during the intermittent time, the air film lowers the disc-shaped workpiece.

[0012] Preferably, in step S3, the raw material gas passes through the inlet pipe and the air passage in sequence, and finally, the raw material gas is ejected from the nozzle and forms an air film.

[0013] Preferably, in step S3, the raw material gas ejected from the nozzle is directed toward the lower side of the disc-shaped workpiece.

[0014] Compared with the prior art, the beneficial effects of the present invention are as follows: The aforementioned device, in conjunction with the process method, firstly initiates a chemical vapor deposition reaction, where a solid film or coating grows on the surface of a disc-shaped workpiece. Then, the inlet valve is opened, allowing raw material gas to be introduced. This gas is ejected from the nozzle and forms a gas film. The gas film lifts the disc-shaped workpiece, and a rotary motor drives the ejector pin to rotate at a preset angle. The inlet valve is then closed, and the gas film lowers the disc-shaped workpiece. Finally, the chemical vapor deposition reaction continues, and the above process is repeated as necessary until a uniform and complete solid film or coating grows on the surface of the disc-shaped workpiece. Both lifting and lowering the disc-shaped workpiece are indirect operations; the equipment does not directly contact the disc-shaped workpiece, thus solving the problem of damage to the coating on the surface of the disc-shaped workpiece caused by traditional lifting structures. Attached Figure Description

[0015] To more clearly illustrate the specific embodiments of the present invention or the technical solutions in the prior art, the drawings used in the description of the specific embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are some embodiments of the present invention. For those skilled in the art, other drawings can be obtained from these drawings without creative effort.

[0016] Figure 1 A schematic diagram of an alternating suspension support device for chemical vapor deposition provided in an embodiment of the present invention; Figure 2 A schematic diagram of an alternating suspension support device for chemical vapor deposition provided in an embodiment of the present invention; Figure 3 This is a top view of an alternating suspension support device for chemical vapor deposition provided in an embodiment of the present invention; Figure 4 This is a cross-sectional view of a partial chemical vapor deposition alternating suspension support device provided in an embodiment of the present invention; Figure 5 This is a cross-sectional view of the gas disc provided in an embodiment of the present invention.

[0017] Explanation of reference numerals in the attached figures: 1. Base plate; 2. Ejector pin; 3. Air plate; 4. Air nozzle; 5. Rotary table; 6. Rotary shaft; 7. Rotary motor; 8. Air inlet pipe; 9. Air inlet valve; 10. Disc-shaped workpiece; 11. High-temperature furnace; 12. Air passage. Detailed Implementation

[0018] The technical solution of the present invention will now be clearly and completely described with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0019] In the description of this invention, it should be noted that the terms "center," "upper," "lower," "left," "right," "vertical," "horizontal," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing the invention and for simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on the invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and should not be construed as indicating or implying relative importance.

[0020] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.

[0021] Please read carefully. Figures 1 to 5 This invention provides an alternating suspension support device for chemical vapor deposition, used for alternating suspension support of a disc-shaped workpiece 10, comprising: a suspension component and a rotation component. Specifically, the suspension component includes an air plate 3, an air nozzle 4, an air inlet pipe 8, and an air inlet valve 9. One end of the air nozzle 4 is fixed to the upper side of the air plate 3. The air plate 3 has multiple air channels 12 inside, the number of which is the same as the number of air nozzles 4. One end of each of the multiple air channels 12 is connected to the air inlet pipe 8, and the other end of each of the multiple air channels 12 is connected to the air nozzle 4 in a corresponding manner. The multiple air channels 12 are distributed in the air plate 3 with the same central angle. The lower side of the air plate 3 is fixed to one end of the air inlet pipe 8. The fixing method can be a threaded connection, and no limitation is made on the fixing method used in this document. The other end of the air inlet pipe 8 is fixed to the air inlet valve 9.

[0022] The rotating assembly includes a base plate 1, an ejector pin 2, a rotating table 5, a rotating shaft 6, and a rotating motor 7. The rotating shaft 6, the rotating table 5, and the base plate 1 are all hollow at their centers. The lower side of the disc-shaped workpiece 10 abuts against the upper end of the ejector pin 2. The edge of the ejector pin 2 near the end of the disc-shaped workpiece 10 is rounded to prevent sharp edges from scratching the coating on the surface of the disc-shaped workpiece 10 during contact or relative movement. The lower end of the ejector pin 2 is fixed to the upper side of the base plate 1. The lower side of the base plate 1 is fixed to one end of the rotating table 5. The other end of the rotating table 5 is fixed to one end of the rotating shaft 6. The output end of the rotating motor 7 is fixed to the other end of the rotating shaft 6. The rotating motor 7 can drive the rotating shaft 6, the rotating table 5, the base plate 1, and the ejector pin 2 to rotate by a preset angle. The air inlet pipe 8 passes through the air plate 3, the base plate 1, the rotating table 5, and the rotating shaft 6. The outer side of the air inlet pipe 8 only has contact with the inner side of the rotating shaft 6, the inner side of the rotating table 5, and the inner side of the base plate 1. When the rotating motor 7 drives the ejector pin 2 to rotate, the suspension component does not rotate. At this time, the air inlet valve 9 is opened to introduce raw material gas into the air inlet pipe 8. The raw material gas ejected from the air nozzle 4 forms an air film, which lifts the disc-shaped workpiece 10. The rotating component and the suspension component work together, and the ejector pin 2 and the air nozzle 4 alternate in sequence, thereby solving the problem of damage to the surface coating of the disc-shaped workpiece 10 caused by the lifting structure.

[0023] In the vertical direction, the lower side of the air plate 3 is spaced apart from the upper side of the base plate 1, with a spacing of at least two millimeters, to ensure that the base plate 1 can rotate normally when the rotary motor 7 drives it. At least three ejector pins 2 are provided, evenly arranged around the upper side of the base plate 1 along its circumference. During the chemical vapor deposition reaction, the rotary motor 7 needs to rotate at least once. For example, assuming one ejector pin 2 is named ejector pin 2, its position after rotation must be offset from its initial position, and it must not coincide with the initial positions of other ejector pins 2, ensuring a complete coating on the surface of the disc-shaped workpiece 10. In the vertical direction, the height of the ejector pin 2 tip is greater than the height of the air nozzle 4 tip. The air film ejected from the air nozzle 4 lifts the disc-shaped workpiece 10, allowing the equipment to lift it directly without contact with the workpiece, thus solving the problem of damage to the surface coating of the disc-shaped workpiece 10 caused by traditional lifting structures.

[0024] An alternating suspension support process for chemical vapor deposition includes the following steps: S1, the disc-shaped workpiece 10 is placed on the top of multiple ejector pins 2, and the central axis of the disc-shaped workpiece 10 is collinear with the central axis of the base plate 1, thus sealing the high-temperature furnace 11; S2, under a preset vacuum level and temperature, the raw material gas grows a solid film or coating on the surface of the disc-shaped workpiece 10. S3, open the air inlet valve 9 to introduce raw material gas, the raw material gas is sprayed out from the air nozzle 4, the gas film formed by the raw material gas lifts the disc-shaped workpiece 10, the rotary motor 7 can drive the base plate 1 and the ejector pin 2 to rotate at a preset angle, close the air inlet valve 9, and the gas film lowers the disc-shaped workpiece 10 to the top of the ejector pin 2. S4, repeat step S3 at least once, until a complete solid film or coating grows on the surface of the disk-shaped workpiece 10; S5. After the high-temperature furnace 11 is depressurized to atmospheric pressure and the temperature drops to room temperature, the disc-shaped workpiece 10 is taken out.

[0025] Chemical vapor deposition (CVD) is a key method for preparing high-performance functional thin layers. The raw material gas and the resulting coating material vary depending on the application field. In the anti-oxidation protection of hot-end components of aero-engines, propylene or methane is used as the carbon source gas, and trichloromethylsilane is used as the silicon source gas to generate pyrolytic carbon and silicon carbide ceramic coatings, respectively. For the wafer carrier and electrostatic chuck surfaces used in the core processes of silicon carbide substrate epitaxy for third-generation semiconductors and integrated circuit manufacturing, in order to meet the requirements of high purity, high temperature resistance, and plasma etching resistance, silane or the aforementioned trichloromethylsilane reacts with hydrocarbon gases to prepare high-purity silicon carbide coatings. In applications requiring even better plasma resistance, tantalum pentachloride or other tantalum source gases react with hydrocarbons to generate hard and durable tantalum carbide coatings. The appropriate raw material gas can be introduced according to the application field of the disc-shaped workpiece 10.

[0026] In step S3, during the intermittent time, the gas film lifts the disc-shaped workpiece 10, causing the lower side of the disc-shaped workpiece 10 to separate from the upper end face of the ejector pin 2. During the preset time, the rotary motor 7 drives the ejector pin 2 to rotate at a preset angle. During the intermittent time, the gas film lowers the disc-shaped workpiece 10, causing the lower side of the disc-shaped workpiece 10 to abut against the upper end face of the ejector pin 2 again. The intermittent time and the preset time can be set according to the needs of the chemical vapor deposition reaction.

[0027] In step S3, the raw material gas passes through the inlet pipe 8 and the air passage 12 in sequence. Finally, the raw material gas is ejected from the nozzle 4 and forms a gas film.

[0028] In step S3, the raw material gas ejected from the nozzle 4 is directed toward the lower side of the disc-shaped workpiece 10. This ensures that the gas film can lift or lower the disc-shaped workpiece 10.

[0029] The above embodiments are merely preferred embodiments of the present invention and should not be construed as limiting the scope of protection of the present invention. Any non-substantial changes and substitutions made by those skilled in the art based on the present invention shall fall within the scope of protection claimed by the present invention.

Claims

1. An alternating suspension support device for chemical vapor deposition, used for alternating suspension support of a disc-shaped workpiece (10), characterized in that, include: The suspension assembly includes an air disc (3), an air nozzle (4), an air inlet pipe (8), and an air inlet valve (9). One end of the air nozzle (4) is fixed to the upper side of the air disc (3). An air passage (12) is provided inside the air disc (3). The air nozzle (4) is connected to the air passage (12). The lower side of the air disc (3) is fixed to one end of the air inlet pipe (8), and the other end of the air inlet pipe (8) is fixed to the air inlet valve (9). The rotating assembly includes a base plate (1), a ejector pin (2), a rotating table (5), a rotating shaft (6), and a rotating motor (7). The lower side of the disc-shaped workpiece (10) abuts against the upper end of the ejector pin (2). The lower end of the ejector pin (2) is fixed to the upper side of the base plate (1). The lower side of the base plate (1) is fixed to one end of the rotating table (5). The other end of the rotating table (5) is fixed to one end of the rotating shaft (6). The output end of the rotating motor (7) is fixed to the other end of the rotating shaft (6). The rotating motor (7) can drive the rotating shaft (6), the rotating table (5), the base plate (1), and the ejector pin (2) to rotate by a preset angle. The air inlet pipe (8) passes through the air plate (3), the base plate (1), the rotating table (5), and the rotating shaft (6).

2. The alternating suspension support device for chemical vapor deposition according to claim 1, characterized in that, The air passage (12) is provided in multiple ways. One end of each of the multiple air passages (12) is connected to the air inlet pipe (8), and the other end of each of the multiple air inlet pipes (8) is connected to the air nozzle (4) in a corresponding manner. The multiple air passages (12) are equidistantly distributed inside the air plate (3).

3. The alternating suspension support device for chemical vapor deposition according to claim 1, characterized in that, In the vertical direction, the lower side of the air plate (3) is spaced apart from the upper side of the base plate (1), and the distance between them is at least two millimeters.

4. The alternating suspension support device for chemical vapor deposition according to claim 1, characterized in that, At least three ejector pins (2) are provided, arranged around the circumference of the base plate (1), and the multiple ejector pins (2) are evenly arranged around the upper side of the base plate (1); in the vertical direction, the height of the top of the ejector pin (2) is greater than the height of the top of the air nozzle (4).

5. The alternating suspension support device for chemical vapor deposition according to claim 1, characterized in that, The edges of the plurality of ejector pins (2) near one end of the disc-shaped workpiece (10) are arranged in an arc.

6. A chemical vapor deposition process with alternating suspension support, characterized in that, The alternating suspension support device for chemical vapor deposition as described in any one of claims 1-5 is used. Includes the following steps: S1, a disc-shaped workpiece (10) is placed on the top of multiple ejector pins (2), and the central axis of the disc-shaped workpiece (10) is collinear with the central axis of the base plate (1), and the high-temperature furnace (11) is sealed. S2, under a preset vacuum and temperature, the raw material gas grows a solid film or coating on the surface of the disc-shaped workpiece (10); S3, open the air inlet valve (9) to introduce the raw material gas, the raw material gas is sprayed out from the air nozzle (4), the gas film formed by the raw material gas lifts the disc-shaped workpiece (10), the rotary motor (7) can drive the base plate (1) and the ejector pin (2) to rotate at a preset angle, close the air inlet valve (9), the gas film lowers the disc-shaped workpiece (10) to the top of the ejector pin (2); S4, repeat step S3 at least once until a uniform and complete solid film or coating grows on the surface of the disc-shaped workpiece (10); S5, after the high-temperature furnace (11) is depressurized to atmospheric pressure and the temperature drops to room temperature, the disc-shaped workpiece (10) is taken out.

7. The alternating suspension support process for chemical vapor deposition according to claim 6, characterized in that, In step S3, during the intermittent time, the air film lifts the disc-shaped workpiece (10), and during the preset time, the rotary motor (7) drives the ejector pin (2) to rotate at a preset angle. During the intermittent time, the air film lowers the disc-shaped workpiece (10).

8. The alternating suspension support process for chemical vapor deposition according to claim 6, characterized in that, In step S3, the raw material gas passes through the inlet pipe (8) and the air passage (12) in sequence. Finally, the raw material gas is ejected from the nozzle (4) and forms an air film.

9. The alternating suspension support process for chemical vapor deposition according to claim 6, characterized in that, In step S3, the raw material gas ejected by the nozzle (4) is directed toward the lower side of the disc-shaped workpiece (10).

Images