The invention relates to an alternate suspension supporting device for
chemical vapor deposition, which relates to the field of
semiconductor growth, and comprises a suspension
assembly comprising an air tap, an air disc, an air inlet
pipe and an air
inlet valve, one end of the air tap is fixed with the upper side surface of the air disc, an
air channel is arranged in the air disc, the air tap is communicated with the
air channel, the lower side surface of the air disc is fixed with one end of the air inlet
pipe, and the air
inlet valve is arranged in the air disc; the other end of the intake
pipe is fixed with the intake valve; the rotating
assembly comprises an ejector pin, a bottom plate, a rotating table, a rotating shaft and a rotating motor, the lower side face of the disc-shaped workpiece abuts against the upper end face of the ejector pin, the lower end of the ejector pin is fixed to the upper side face of the bottom plate, the lower side face of the bottom plate is fixed to the rotating table, the rotating table is fixed to the rotating shaft, and the output end of the rotating motor is fixed to the rotating shaft. The rotating motor can drive the rotating shaft, the rotating table, the rotating bottom plate and the ejector pin to rotate by a preset angle, the air inlet pipe penetrates through the air disc, the bottom plate, the rotating table and the rotating shaft, and therefore the problem that a traditional lifting structure damages a
surface coating of a disc-shaped workpiece is solved.