Polishing equipment and method for cylindrical wear-resisting strip production

Abstract

The invention belongs to the technical field of wear-resisting strip polishing, and relates to a polishing device and method for cylindrical wear-resisting strip production. The polishing device comprises a polishing machine body, a sliding table base and a polishing wheel are installed on the polishing machine body, a guide wheel is fixedly connected to the sliding table base, and an auxiliary assembly is arranged on the polishing machine body and comprises a centering component and a guide component; the centering component is used for restraining the wear-resisting strip and aligning the wear-resisting strip to a polishing area; the guiding component is used for restraining the wear-resisting strip to prevent movement and assisting in discharging the wear-resisting strip; through operation of the auxiliary assembly, an aligning and clamping structure at an inlet of a polishing area is designed, the axis of a to-be-polished wear-resisting strip can be actively and accurately aligned to the middle position of a polishing wheel and a guide wheel, meanwhile, the device can adapt to the wear-resisting strips with different diameters and complete positioning and clamping, and the problem of axis deviation caused by the diameter difference of the wear-resisting strips is solved; unification of the polishing machining standard of the wear-resisting strip is achieved.

Description

Technical Field

[0001] This invention belongs to the field of wear-resistant strip polishing technology, specifically a polishing equipment and method for producing cylindrical wear-resistant strips. Background Technology

[0002] Cylindrical wear-resistant strips are critical and vulnerable components in industrial applications. The quality of the machining of their outer cylindrical surface directly determines the product's wear resistance, service life, and operational reliability. Therefore, the outer cylindrical polishing machine, as a key piece of equipment for achieving surface finishing, is an indispensable step in the production process of such parts.

[0003] Under current technological conditions, V-shaped or arc-shaped guide plates are commonly used for the initial guidance and rough positioning of cylindrical wear-resistant strips during loading and unloading. The principle is based on the workpiece's own weight sliding downwards along an inclined plane to achieve automatic centering. However, this centering method, relying on passive constraints, makes it difficult to accurately and stably guide and maintain the workpiece's axis at the optimal processing position between the polishing wheel and the guide wheel. Especially when processing wear-resistant strips of different diameters, the vertical height of the workpiece's axis will shift within the V-groove due to the diameter variation, resulting in inconsistent processing datum and directly affecting polishing uniformity.

[0004] Furthermore, this guiding structure has significant shortcomings in terms of dynamic stability during processing. The V-shaped plate mainly provides static, unidirectional support, which cannot effectively suppress workpiece vibration, jumping, or even axial movement caused by frictional cutting forces when the polishing wheel rotates at high speed. At the same time, existing V-shaped or arc-shaped guide plates are mostly fixed designs, or are quite cumbersome to adjust, lacking self-adaptability and making it difficult to quickly adapt to changes in the distance between the polishing wheel and the guide wheel, or the processing requirements of workpieces of different specifications, thus affecting the flexibility and efficiency of production. Summary of the Invention

[0005] A polishing device for producing cylindrical wear-resistant strips includes a polishing machine body, a slide table and a polishing wheel installed on the polishing machine body, a guide wheel fixedly connected to the slide table, and a centering component and a guiding component on the polishing machine body. The centering component is used to constrain the wear-resistant strip and align it with the polishing area, and the guiding component is used to constrain the wear-resistant strip and assist in the discharge of the wear-resistant strip. The centering components include a support plate and a threaded rod. A rotating ring is rotatably connected to the support plate. Both the support plate and the rotating ring have through holes. The support plate is used to adjust and align the polishing areas of the polishing wheel and the guide wheel. The threaded rod is used to adapt to wear-resistant strips of different diameters by adjustment. The guide component includes two support bars and two abutment frames. The two support bars are symmetrically fixed to the side of the support plate away from the rotating ring, and the side of the two abutment frames near the support plate is set as an inclined surface.

[0006] Furthermore, the centering component also includes a guide groove, which is opened on the top of the polishing machine body. The support plate is slidably connected in the guide groove, and a gear is rotatably connected to the support plate. The outer shell of the polishing wheel and the outer shell of the guide wheel are respectively fixedly connected to a rack and a rack. The bottoms of rack one and rack two are offset and bent towards each other, and rack one and rack two are both meshed with the gear.

[0007] Furthermore, an adjusting block one is rotatably connected to the top side of the support plate, an adjusting block two is rotatably connected to the top of the rotating ring, a threaded rod is rotatably connected to the adjusting block one, the threaded rod is threadedly connected to the adjusting block two, and nuts are threadedly connected to both sides of the threaded rod located on the adjusting block two.

[0008] Furthermore, three rotating blocks are rotatably connected in a circular array on the rotating ring. Each of the three rotating blocks is slidably connected to a rotating rod. The ends of the three rotating rods that are far apart from each other are rotatably connected to a support plate. The ends of the three rotating rods that are close to each other are rotatably connected to a rotating wheel. Each of the three rotating wheels is rotatably connected in a circular array to multiple rotating beads.

[0009] Furthermore, the two through holes are coaxially arranged, and the ball is connected to the upper limit of the rotating wheel in a rotating manner.

[0010] Furthermore, the two support bars are symmetrically distributed vertically around the through hole of the support plate. Each of the two support bars has multiple guide rods slidably connected in a linear array. The two abutment frames are fixedly connected to multiple guide rods on the adjacent support bars. The two abutment frames are located on the side where the two support bars are close to each other. Each guide rod is fitted with a spring, and the two ends of the spring are fixedly connected to the corresponding support bar and guide rod, respectively.

[0011] Furthermore, each of the two abutment frames, located close to each other, is rotatably connected in a linear array with multiple ball bearings, and the abutment frame located below, away from the support plate, is fixedly connected to a discharge plate.

[0012] Furthermore, the ball bearings are connected to the upper limit of the frame in a rotating manner, the unloading plate is tilted downward on the side away from the frame, and the inner surface of the unloading plate is set as an arc surface.

[0013] A method for polishing cylindrical wear-resistant strips, using the aforementioned polishing equipment for producing cylindrical wear-resistant strips, includes the following steps: Step 1, Adjust the distance between the polishing wheel and the guide wheel: According to the diameter of the wear-resistant strip, adjust the distance between the guide wheel and the polishing wheel by moving the slide base. After adjustment, lock the slide base. During this process, the slide base drives the support plate to slide, so that the slide base is always in the center position between the polishing wheel and the guide wheel. Step 2, clamp and center the wear-resistant strip: Loosen the nut on the threaded rod, rotate the threaded rod to move the adjusting block 2 away from the adjusting block 1, drive the rotating ring to rotate, so that the three rotating rods drive the rotating wheel and the rotating ball 1 to move towards the center at the same time. Put one end of the wear-resistant strip into the through hole of the rotating ring, continue to rotate the threaded rod until the rotating ball 1 on the three rotating wheels clamps the wear-resistant strip, and then tighten the nut to fix it. Step 3, feed in the wear-resistant strip and start the guide: push the clamped wear-resistant strip towards the polishing area of ​​the polishing wheel and guide wheel. The wear-resistant strip will slide along the axis. When it passes the inclined surface of the two abutment frames, it will open the abutment frames and compress the spring, so that the upper and lower rows of balls will evenly contact the surface of the wear-resistant strip, providing restraint to prevent it from moving during polishing. Step 4, Polishing and Continuous Feeding: Start the polishing machine body, the polishing wheel and guide wheel start to rotate, polish the wear-resistant strip and move it along the axis. After the previous wear-resistant strip is completely fed out of the rotating ring, the next wear-resistant strip of the same diameter is directly loaded to realize continuous polishing operation. The polished wear-resistant strip leaves the polishing area under the push of the subsequent workpiece and slides out along the inclined arc surface of the unloading plate to complete the automatic material discharge.

[0014] Compared with the prior art, the beneficial effects of the present invention are: Firstly, existing technologies use V-shaped or arc-shaped guide plates, relying on the workpiece's own weight for passive centering, which cannot accurately and stably guide the axis of the wear-resistant strip to the optimal processing position of the polishing wheel and guide wheel; and when processing wear-resistant strips of different diameters, the vertical height of the workpiece's axis will shift within the V-groove as the diameter changes, resulting in inconsistent processing references.

[0015] This invention, through the operation of the centering and guiding components, designs an alignment and clamping structure at the entrance of the polishing area. This structure can actively and accurately align the axis of the wear-resistant strip to be polished with the center position of the polishing wheel and the guide wheel. At the same time, it can adapt to wear-resistant strips of different diameters and complete the positioning and clamping, solving the problem of axis offset caused by the difference in wear-resistant strip diameter and realizing the unification of the polishing processing benchmark for wear-resistant strips.

[0016] Secondly, existing V-shaped or arc-shaped guide plates are mostly fixed designs, or have cumbersome adjustment processes, making it difficult to quickly adapt to changes in the distance between the polishing wheel and the guide wheel, and also difficult to flexibly meet the processing needs of different specifications of wear-resistant strips, thus restricting the flexibility and efficiency of production.

[0017] This invention, through the operation of the centering and guiding components, designs an alignment clamping structure capable of moving with the distance between the polishing wheel and the guide wheel. It can adaptively adjust its own position, always maintaining alignment with the center position of the polishing wheel and the guide wheel, eliminating the need for tedious manual adjustments and ensuring the adaptability of the equipment to different processing conditions and workpiece specifications.

[0018] Third, existing V-shaped or arc-shaped guide plates can only provide static, unidirectional support and cannot resist the frictional cutting force generated when the polishing wheel rotates at high speed. This can easily cause workpiece vibration, jumping, or even axial movement, affecting the processing quality.

[0019] This invention utilizes the operation of the centering and guiding components, along with a pushing structure that applies pressure from both above and below at the polishing and discharge positions. This structure actively applies constraint force to the wear-resistant strip without affecting the polishing operation, effectively counteracting dynamic interference during the polishing process. It solves the problems of vibration, jumping, and axial movement of the wear-resistant strip throughout the polishing, feeding, and discharging process, ensuring the dynamic stability of the wear-resistant strip polishing. This ensures that the polishing machine body applies a uniform and stable polishing effect to the outer surface of the wear-resistant strip, ultimately improving the precision and surface quality consistency of the outer surface polishing of the wear-resistant strip. Attached Figure Description

[0020] Figure 1 This is a three-dimensional schematic diagram of the overall device of the present invention; Figure 2 This is a schematic diagram showing the positions of the wear-resistant strip, polishing wheel, guide wheel, and other structures of the present invention; Figure 3 This is a cross-sectional schematic diagram of the polishing wheel, guide wheel, support plate, and other structures of the present invention. Figure 4 This is a schematic diagram showing the positions of the support plate, toothed rod one, toothed rod two, and other structures of the present invention. Figure 5 This is a cross-sectional schematic diagram of the rotating ring, support plate, and other structures of the present invention; Figure 6 For the present invention Figure 5 Enlarged view of point A in the middle; Figure 7 This is a partial cross-sectional schematic diagram of the adjusting block, rotating rod, and other structures of the present invention; Figure 8 This is an exploded view of the support plate, gear, swivel ring, and other structures of the present invention; Figure 9 This is a cross-sectional schematic diagram of the support plate, abutment frame, and other structures of the present invention; Figure 10 For the present invention Figure 9 Enlarged view of point B in the middle; In the picture: 1. Wear-resistant strip; 11. Polishing machine body; 12. Slide table; 13. Polishing wheel; 14. Guide wheel; 21. Guide groove; 22. Support plate; 23. Gear; 24. Gear rack one; 25. Gear rack two; 26. Rotary ring; 27. Adjusting block one; 28. Adjusting block two; 29. ​​Threaded rod; 210. Rotating sleeve block; 211. Rotating rod; 212. Rotating wheel; 213. Rotating ball one; 214. Support strip; 215. Guide rod; 216. Support frame; 217. Spring; 218. Rolling ball two; 219. Unloading plate. Detailed Implementation

[0021] To further illustrate the technical means and effects of the present invention in achieving its intended purpose, the following detailed description of the specific implementation methods, structure, features and effects of the present invention, in conjunction with the accompanying drawings and preferred embodiments, is provided below. Example 1

[0022] Reference Figures 1 to 10 As shown, a polishing device for producing cylindrical wear-resistant strips includes a polishing machine body 11. The polishing machine body 11 mainly includes a base and two motors. One motor is fixed on the base, and a polishing wheel 13 is fixedly connected to the output end of the other motor. A slide base 12 is also installed on the base. The slide base 12 can slide on the top of the base and is tightened by a locking mechanism (bolt) after sliding to a designated position. The other motor is fixed on the slide base 12, and a guide wheel 14 is fixedly connected to the output end of the other motor.

[0023] The polishing machine body 11, slide base 12, polishing wheel 13, and guide wheel 14 are all existing technologies. The slide base 12 is mounted on the polishing machine body 11 via an existing linear guide rail structure. The slide base 12 is used to drive the guide wheel 14 to move, thereby adjusting the distance between the polishing wheel 13 and the guide wheel 14 to accommodate the polishing operation of wear-resistant strips 1 of different diameters.

[0024] Wherein: polishing wheel 13 is used to polish wear-resistant strip 1, and guide wheel 14 is used to guide wear-resistant strip 1 to move along the axial direction. This is existing known technology and will not be described in detail here.

[0025] Both the polishing wheel 13 and the guide wheel 14 have outer shells, and the outer shells remain stationary while the polishing wheel 13 and the guide wheel 14 are rotating.

[0026] The polishing machine body 11 is equipped with auxiliary components, including a centering component and a guiding component.

[0027] The centering component is used to constrain and align the wear-resistant strip 1 with the polishing area.

[0028] The guiding component is used to constrain the wear-resistant strip 1, prevent it from moving around, and assist in the discharge of the wear-resistant strip 1.

[0029] The centering component includes a guide groove 21, which is located on the top of the polishing machine body 11. A support plate 22 is slidably connected inside the guide groove 21. A gear 23 is rotatably connected to the middle of the support plate 22. A gear 24 is fixedly connected to the side of the polishing wheel 13 facing the guide groove 21. A gear 25 is fixedly connected to the side of the guide wheel 14 facing the guide groove 21. A rotating ring 26 is rotatably connected to the upper part of the support plate 22. An adjusting block 27 is rotatably connected to the top of the support plate 22. An adjusting block 28 is rotatably connected to the top of the rotating ring 26. A threaded rod 29 is rotatably connected to the adjusting block 27. The threaded rod 29 is threadedly connected to the adjusting block 28. Nuts are threadedly connected to both sides of the adjusting block 28 on the threaded rod 29. Three rotating sleeve blocks 210 are rotatably connected in a circular array on the rotating ring 26. Each of the three rotating sleeve blocks 210 is slidably connected to a rotating rod 211. The ends of the three rotating rods 211 that are far apart from each other are rotatably connected to the support plate 22. The ends of the three rotating rods 211 that are close to each other are rotatably connected to a rotating wheel 212. Each of the three rotating wheels 212 is rotatably connected in a circular array to multiple rotating beads 213.

[0030] Among them, the upper part of the support plate 22 and the rotating ring 26 are both provided with through holes, and the rotating ring 26 and the through holes of the support plate 22 are coaxially arranged.

[0031] Specifically, the bottoms of rack 1 24 and rack 25 are bent and offset towards each other, and the bottoms of rack 1 24 and rack 25 are both engaged with gear 23.

[0032] It should be noted that the bottoms of rack 1 24 and rack 2 25 are of equal length, and in the initial state, gear 23 is meshed in the middle position between rack 1 24 and rack 2 25.

[0033] The nut threaded onto the threaded rod 29 is used to lock the adjusting block 28 to the threaded rod 29.

[0034] Among them, the rotating ball 213 is connected to the upper limit of the rotating wheel 212 in a rotating manner, and its function is to enable the rotating ball 213 to assist the wear-resistant strip 1 to move along the axial direction.

[0035] The guiding component includes two support bars 214, which are symmetrically and fixedly connected to the side of the support plate 22 away from the guide groove 21. Each of the two support bars 214 has multiple guide rods 215 slidably connected in a linear array. The multiple guide rods 215 on the same support bar 214 are fixedly connected to a stop frame 216. The two stop frames 216 are located on the side of the two support bars 214 that are close to each other. Each guide rod 215 is fitted with a spring 217. The two ends of the spring 217 are fixedly connected to the corresponding support bar 214 and the guide rod 215 respectively. The spring 217 is located on the side of the corresponding support bar 214 away from the stop frame 216. The side of the two stop frames 216 that are close to each other has multiple ball bearings 218 rotatably connected in a linear array. The bottom stop frame 216 away from the support plate 22 is fixedly connected to a discharge plate 219.

[0036] Among them, the two support bars 214 are symmetrically distributed vertically with the through hole of the support plate 22 as the center.

[0037] The function of spring 217 is to apply pressure to wear-resistant strip 1, but this pressure will not affect the polishing of wear-resistant strip 1 by polishing wheel 13 and guide wheel 14 or its axial movement.

[0038] Among them, the two abutment frames 216 are both set as inclined surfaces on the side near the support plate 22, and the inclined surfaces are both inclined to the side away from the support plate 22.

[0039] Among them, the ball bearing 218 is connected to the upper limit of the frame 216 in a rotating manner, which serves to prevent excessive friction from affecting the polishing and movement of the wear-resistant strip 1.

[0040] Specifically, the unloading plate 219 is inclined downward on the side away from the abutment frame 216, and the inner surface of the unloading plate 219 is set as an arc surface, which serves to guide the discharge of the wear-resistant strip 1. The bottom surface of the inner surface of the unloading plate 219 is flush with the ball bearing 218 located on the bottom abutment frame 216, which serves to ensure that the wear-resistant strip 1 can move smoothly into the unloading plate 219.

[0041] In the initial state of the auxiliary component, i.e. before polishing of the wear-resistant strip 1, the internal structure of the auxiliary component is as follows: Adjusting block 28 is located on the threaded rod 29, near adjusting block 27. The threaded rod 29 is fastened to adjusting block 28 by a nut, thus fixing the positions of adjusting block 28 and adjusting block 27. At this time, the rotating sleeve 210 is located on the corresponding rotating rod 211 near the end of the rotating ball 213. The ends of the three rotating rods 211 inside the rotating ring 26 are separated to their furthest positions. The multiple springs 217 do not undergo elastic deformation, and the multiple balls 218 on the two abutment frames 216 abut against each other.

[0042] When the auxiliary component is running, i.e. when polishing of wear-resistant strip 1 is required, the auxiliary component operates as follows: The user first adjusts the slide base 12, polishing wheel 13, and guide wheel 14 to match the distance between the polishing wheel 13 and the guide wheel 14 to the diameter of the wear-resistant strip 1 that needs to be polished. Specifically, the user controls the slide base 12 to move, which in turn moves the guide wheel 14, thereby adjusting the distance between the polishing wheel 13 and the guide wheel 14. After adjustment, the slide base 12 is locked to fix the position between the polishing wheel 13 and the guide wheel 14.

[0043] As the guide wheel 14 moves, it synchronously drives the rack 25 to move as well. This causes the rack 25 to mesh with the rotating gear 23 while moving. Since the rack 24 is fixedly connected to the housing of the polishing wheel 13, and the polishing wheel 13 is fixed in position on the polishing machine body 11, the gear 23 rotates while meshing with the rack 24, causing the gear 23 to move synchronously in the direction of the guide wheel 14. During the rotation and movement of the gear 23, the support plate 22 is slidably limited by the guide groove 21, allowing it to slide only linearly along the guide groove 21. Therefore, the rotation and movement of the gear 23 causes the support plate 22 to move linearly along the guide groove 21. Since gear 23 is initially positioned centered between rack 1 24 and rack 25, the support plate 22 moves as rack 25 and rack 24 mesh with gear 23. This ensures that regardless of how the guide wheel 14 adjusts its distance from the polishing wheel 13, the support plate 22 remains centered between the polishing wheel 13 and the guide wheel 14. This guarantees that the support plate 22 is always directly facing the polishing area of ​​the polishing wheel 13 and the guide wheel 14.

[0044] After completion, the user loosens the bolt on the threaded rod 29, so that the threaded rod 29 is no longer limited on the adjusting block 28. Then, the user rotates the threaded rod 29 on the adjusting block 27. As the threaded rod 29 rotates, the adjusting block 28 tends to deflect with the rotation of the threaded rod 29. However, since the adjusting block 28 is rotatably connected to the rotating ring 26, the adjusting block 28 can only move linearly along the axis of the threaded rod 29. At this time, as the threaded rod 29 rotates, the adjusting block 28 moves away from the adjusting block 27. At the same time, the adjusting block 28 pushes the rotating ring 26 to rotate on the support plate 22. During this process, since the adjusting block 27 is rotatably connected to the support plate 22, the adjusting block 28 and the rotating ring 26 rotate. As the rotating ring 26 rotates, the threaded rod 29 will deflect accordingly. The rotation setting of the adjusting blocks 27 and 28 ensures that the deflection of the threaded rod 29 does not affect the rotation of the rotating ring 26.

[0045] As the rotating ring 26 rotates, it synchronously drives the three rotating sleeve blocks 210 to rotate as well. This causes the three rotating sleeve blocks 210 to slide away from the rotating wheel 212 on their corresponding rotating rods 211. The rotating sleeve blocks 210, along with the rotating ring 26, apply a deflecting thrust to their respective rotating rods 211, pushing the rods 211 onto the support plate 22. This causes the ends of the three rotating rods 211 inside the rotating ring 26 to move closer together. At this point, the user inserts one end of the wear-resistant strip 1 into the through hole of the rotating ring 26. As the three rotating wheels 212 are driven closer together by their corresponding rotating rods 211, the rotating beads 213 on the three rotating wheels 212 all abut against the wear-resistant strip 1, pushing the wear-resistant strip 1 to the center position on the rotating ring 26. As the threaded rod 29 continues to rotate, the wear-resistant strip 1 is subjected to an inward thrust, thereby clamping the wear-resistant strip 1 within the rotating ring 26. At this time, the user fixes the threaded rod 29 to the adjusting block 28 with a nut, thus securing the clamped state of the wear-resistant strip 1. At this point, one end of the wear-resistant strip 1 is limited and fixed, while the other end is located on the side of the support plate 22 away from the polishing area of ​​the polishing wheel 13 and the guide wheel 14. That is, the wear-resistant strip 1 does not pass entirely through the support plate 22.

[0046] At this time, the user pushes the wear-resistant strip 1 towards the polishing area of ​​the polishing wheel 13 and the guide wheel 14. The periphery of the wear-resistant strip 1 is then abutted by multiple rotating balls 213. Since the rotating balls 213 can rotate flexibly on their corresponding rotating wheels 212, the wear-resistant strip 1 can slide along its axial direction. The wear-resistant strip 1 then moves towards the polishing wheel 13 within the rotating ring 26. As the wear-resistant strip 1 moves, it abuts against the inclined surfaces of the two abutment frames 216, causing them to separate vertically. The two abutment frames 216 then move towards the corresponding support bar 214, pushing the guide rod 215 to slide synchronously on the support bar 214, while simultaneously stretching the elastic spring 217. This continues until multiple rolling balls 218 abut against the upper and lower sides of the wear-resistant strip 1. At this point, the wear-resistant strip 1 is subjected to inward pushing force by the abutment frames 216 on both its upper and lower sides, and its left and right sides abut against the polishing wheel 13 and the guide wheel 14, respectively. As the polishing machine body 11 starts operating, the polishing wheel 13 and guide wheel 14 rotate. Simultaneously, the polishing wheel 13 and guide wheel 14 polish the wear-resistant strip 1, causing the wear-resistant strip 1 to rotate between the two support frames 216 while moving away from the guide groove 21. Furthermore, since the ball bearings 218 can rotate freely on the support frames 216, they do not affect the rotation and movement of the wear-resistant strip 1. The two support frames 216 consistently provide support to the wear-resistant strip 1 from the top and bottom, thus preventing the wear-resistant strip 1 from shifting during polishing.

[0047] It should be noted that the abutment frame 216, support strip 214 and other structures are respectively set on the upper and lower sides of the polishing area of ​​the polishing wheel 13 and guide wheel 14, and the abutment frame 216 is long and narrow, so it will not interfere with the polishing wheel 13 and guide wheel 14, thus not affecting the normal polishing operation of the wear-resistant strip 1.

[0048] It should be noted that as the wear-resistant strip 1 is polished and moved—specifically, at the beginning and end of polishing when it is being discharged—when the wear-resistant strip 1 partially enters or leaves the polishing area, the end of the wear-resistant strip 1 within the polishing area is affected by the rotation of the polishing wheel 13 and the guide wheel 14, causing localized stress on the wear-resistant strip 1 and making it prone to shifting. However, at the feeding position within the polishing area, the wear-resistant strip 1 is clamped by the rotating rod 211, preventing shifting caused by localized stress. (Refer to...) Figure 3 As shown, the abutment frame 216 extends away from the polishing area of ​​the polishing wheel 13 and the guide wheel 14. Its function is to always apply vertical clamping force to the wear-resistant strip 1 at the discharge position of the polishing area to prevent movement caused by local force.

[0049] As the wear-resistant strip 1 passes through the polishing area of ​​the polishing wheel 13 and guide wheel 14 from the rotating ring 26, it gradually exits from the rotating ring 26. At this point, the wear-resistant strip 1 is no longer opposed by the multiple rotating beads 213. However, since the threaded rod 29 is now limited, the positions of the rotating rod 211, rotating wheel 212, and other structures are fixed. That is, the clamping state formed by the three rotating wheels 212 and the corresponding rotating beads 213 to match the current diameter of the wear-resistant strip 1 is fixed. After one wear-resistant strip 1 exits the rotating ring 26, the user can continue to insert wear-resistant strips 1 of the same diameter into the three rotating wheels 212 to continue the polishing operation. This achieves continuous polishing of wear-resistant strips 1 of equal diameter.

[0050] After the wear-resistant strip 1 leaves the polishing area of ​​the polishing wheel 13 and the guide wheel 14, the wear-resistant strip 1 is no longer subject to the moving action provided by the guide wheel 14. However, since the polishing operation of the wear-resistant strip 1 is continuous, multiple wear-resistant strips 1 continue to move into the polishing area for polishing. This allows the newly entering wear-resistant strip 1 to push the previous wear-resistant strip 1 to move, pushing the polished wear-resistant strip 1 into the unloading plate 219 position. The polished wear-resistant strip 1 is then discharged along the inclined surface of the unloading plate 219.

[0051] The auxiliary component has now completed its operation. During its operation, the following beneficial effects were achieved: Firstly, existing technologies use V-shaped or arc-shaped guide plates, relying on the workpiece's own weight for passive centering, which cannot accurately and stably guide the axis of the wear-resistant strip 1 to the optimal processing position of the polishing wheel 13 and guide wheel 14; and when processing wear-resistant strips 1 of different diameters, the vertical height of the workpiece's axis will shift within the V-groove as the diameter changes, resulting in inconsistent processing references.

[0052] By operating the auxiliary components, an alignment and clamping structure was designed at the inlet of the polishing area. This structure can actively and accurately align the axis of the wear-resistant strip 1 to be polished with the middle position of the polishing wheel 13 and the guide wheel 14. It can also adapt to wear-resistant strips 1 of different diameters and complete the positioning and clamping, thus solving the problem of axis offset caused by the difference in workpiece diameter and realizing the unification of the polishing processing benchmark of the wear-resistant strip 1.

[0053] Secondly, existing V-shaped or arc-shaped guide plates are mostly fixed designs, or the adjustment process is cumbersome. They cannot quickly adapt to the changes in the spacing between the polishing wheel 13 and the guide wheel 14, and they are also difficult to flexibly meet the processing requirements of different specifications of wear-resistant strips 1, which restricts the flexibility and efficiency of production.

[0054] Through the operation of the auxiliary components, the designed alignment and clamping structure has the ability to move with the distance between the polishing wheel 13 and the guide wheel 14. It can adaptively adjust its own position and always maintain the alignment state with the middle position of the polishing wheel 13 and the guide wheel 14. No tedious manual adjustment is required, which ensures the adaptability of the equipment to different processing conditions and workpiece specifications.

[0055] Thirdly, existing V-shaped or arc-shaped guide plates can only provide static, unidirectional support, which cannot resist the frictional cutting force generated when the polishing wheel 13 rotates at high speed. This can easily cause workpiece vibration, jumping, or even axial movement, affecting the processing quality.

[0056] Through the operation of auxiliary components, the pushing device that applies pressure from both above and below to the center at the polishing and discharge positions can actively apply constraint force to the wear-resistant strip 1 without affecting the polishing operation. This effectively counteracts dynamic interference during the polishing process and solves the problems of vibration, jumping, and axial movement of the wear-resistant strip 1 throughout the polishing, feeding, and discharging process. It ensures the dynamic stability of the polishing of the wear-resistant strip 1 and ensures that the polishing action of the polishing machine body 11 on the outer circular surface of the wear-resistant strip 1 is uniform and stable, ultimately improving the precision and surface quality consistency of the outer circular polishing of the wear-resistant strip 1. Example 2

[0057] A polishing method for producing cylindrical wear-resistant strips includes the following steps: Step 1, adjust the distance between polishing wheel 13 and guide wheel 14: According to the diameter of wear-resistant strip 1, adjust the distance between guide wheel 14 and polishing wheel 13 by moving slide base 12. After adjustment, lock slide base 12. During this process, support plate 22 slides in guide groove 21, automatically keeping it always in the center position between polishing wheel 13 and guide wheel 14.

[0058] Step 2, clamp and center wear-resistant strip 1: Loosen the nut on the threaded rod 29, rotate the threaded rod 29 to move the adjusting block 28 away from the adjusting block 27, drive the rotating ring 26 to rotate, so that the three rotating rods 211 drive the rotating wheel 212 and the rotating ball 213 to move towards the center synchronously. Put one end of the wear-resistant strip 1 into the through hole of the rotating ring 26, continue to rotate the threaded rod 29 until the rotating ball 213 on the three rotating wheels 212 clamps the wear-resistant strip 1, and then tighten the nut to fix it.

[0059] Step 3, feed in the wear-resistant strip 1 and start the guide: push the clamped wear-resistant strip 1 towards the polishing area of ​​the polishing wheel 13 and the guide wheel 14. The wear-resistant strip 1 will slide along the axis. When it passes the inclined surfaces of the two abutment frames 216, it will open the abutment frames 216 and compress the spring 217, so that the upper and lower rows of ball bearings 218 will evenly contact the surface of the wear-resistant strip 1, providing restraint to prevent it from moving during polishing.

[0060] Step 4, Polishing and continuous feeding: Start the polishing machine body 11, the polishing wheel 13 and guide wheel 14 start to rotate, polish the wear-resistant strip 1 and make it move along the axial direction. After the previous wear-resistant strip 1 is completely fed out from the rotating ring 26, since the clamping structure is fixed, the next wear-resistant strip 1 of the same diameter can be directly loaded to realize continuous polishing operation. The polished wear-resistant strip 1 leaves the polishing area under the push of the subsequent workpiece and slides out along the inclined arc surface of the unloading plate 219 to complete the automatic material discharge.

[0061] The above description is merely a preferred embodiment of the present invention and is not intended to limit the present invention in any way. Although the present invention has been disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can make some modifications or alterations to the above-disclosed technical content to create equivalent embodiments without departing from the scope of the present invention. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present invention without departing from the scope of the present invention shall still fall within the scope of the present invention.

Claims

1. A polishing device for producing cylindrical wear-resistant strips, comprising a polishing machine body (11), a slide base (12) and a polishing wheel (13) mounted on the polishing machine body (11), and a guide wheel (14) fixedly connected to the slide base (12), characterized in that: The polishing machine body (11) is also provided with a centering component and a guiding component. The centering component is used to constrain the wear-resistant strip (1) and align it with the polishing area. The guiding component is used to constrain the wear-resistant strip (1) and assist the wear-resistant strip (1) in discharging material. The centering components include a support plate (22) and a threaded rod (29). A rotating ring (26) is rotatably connected to the support plate (22). Both the support plate (22) and the rotating ring (26) have through holes. The support plate (22) is used to adjust the polishing area of ​​the polishing wheel (13) and the guide wheel (14). The threaded rod (29) is used to adapt to wear-resistant strips (1) of different diameters by adjustment. The guide component includes two support bars (214) and two abutment frames (216). The two support bars (214) are symmetrically fixedly connected to the side of the support plate (22) away from the rotating ring (26). The side of the two abutment frames (216) near the support plate (22) is set as an inclined surface.

2. The polishing equipment for producing cylindrical wear-resistant strips according to claim 1, characterized in that: The centering component also includes a guide groove (21), which is located on the top of the polishing machine body (11). A support plate (22) is slidably connected in the guide groove (21). A gear (23) is rotatably connected to the support plate (22). A rack one (24) and a rack two (25) are fixedly connected to the outer shell of the polishing wheel (13) and the outer shell of the guide wheel (14), respectively. The bottoms of rack one (24) and rack two (25) are offset and bent towards each other, and rack one (24) and rack two (25) are both meshed with the gear (23).

3. The polishing equipment for producing cylindrical wear-resistant strips according to claim 2, characterized in that: The top side of the support plate (22) is rotatably connected to the first adjustment block (27), the top of the swivel ring (26) is rotatably connected to the second adjustment block (28), the threaded rod (29) is rotatably connected to the first adjustment block (27), the threaded rod (29) is threadedly connected to the second adjustment block (28), and nuts are threadedly connected to both sides of the threaded rod (29) located on the second adjustment block (28).

4. The polishing equipment for producing cylindrical wear-resistant strips according to claim 3, characterized in that: Three rotating blocks (210) are rotatably connected in a ring array on the rotating ring (26). Each of the three rotating blocks (210) is slidably connected to a rotating rod (211). The ends of the three rotating rods (211) that are far apart from each other are rotatably connected to the support plate (22). Each of the ends of the three rotating rods (211) that are close to each other is rotatably connected to a rotating wheel (212). Multiple rotating beads (213) are rotatably connected in a ring array on the three rotating wheels (212).

5. The polishing equipment for producing cylindrical wear-resistant strips according to claim 4, characterized in that: The two through holes are coaxially arranged, and the ball (213) is connected to the upper limit of the rotating wheel (212).

6. The polishing equipment for producing cylindrical wear-resistant strips according to claim 5, characterized in that: Two support bars (214) are symmetrically distributed vertically around the through hole of the support plate (22). Multiple guide rods (215) are slidably connected in a straight line array on each of the two support bars (214). Two abutment frames (216) are fixedly connected to multiple guide rods (215) on adjacent support bars (214). The two abutment frames (216) are located on the side where the two support bars (214) are close to each other. A spring (217) is sleeved on each guide rod (215). The two ends of the spring (217) are fixedly connected to the corresponding support bar (214) and guide rod (215) respectively.

7. The polishing equipment for producing cylindrical wear-resistant strips according to claim 6, characterized in that: The two abutment frames (216) are connected to each other in a linear array with multiple ball bearings (218) on their sides. The abutment frame (216) located below is fixedly connected to the unloading plate (219) on the side away from the support plate (22).

8. The polishing equipment for producing cylindrical wear-resistant strips according to claim 7, characterized in that: The ball bearing 2 (218) is in a rotatable upper limit connection with the abutment frame (216), the unloading plate (219) is tilted downward on the side away from the abutment frame (216), and the inner surface of the unloading plate (219) is set as an arc surface.

9. A method for polishing cylindrical wear-resistant strips, characterized in that: The polishing equipment for producing cylindrical wear-resistant strips as described in claim 8 includes the following steps: Step 1, adjust the distance between the polishing wheel (13) and the guide wheel (14): According to the diameter of the wear-resistant strip (1), adjust the distance between the guide wheel (14) and the polishing wheel (13) by moving the slide base (12). After adjustment, lock the slide base (12). During this process, the slide base (12) drives the support plate (22) to slide, so that the slide base (12) is always in the center position between the polishing wheel (13) and the guide wheel (14). Step 2, clamp and center the wear-resistant strip (1): Loosen the nut on the threaded rod (29), rotate the threaded rod (29) to move the second adjusting block (28) away from the first adjusting block (27), drive the rotating ring (26) to rotate, so that the three rotating rods (211) drive the rotating wheel (212) and the first rotating ball (213) to move towards the center simultaneously. Put one end of the wear-resistant strip (1) into the through hole of the rotating ring (26), continue to rotate the threaded rod (29) until the first rotating ball (213) on the three rotating wheels (212) clamps the wear-resistant strip (1), and then tighten the nut to fix it. Step 3, feed in the wear-resistant strip (1) and start the guide: push the clamped wear-resistant strip (1) towards the polishing area of ​​the polishing wheel (13) and the guide wheel (14). The wear-resistant strip (1) will slide along the axis. When it passes the inclined surface of the two abutment frames (216), it will open the abutment frames (216) and compress the spring (217), so that the upper and lower rows of ball bearings (218) will evenly contact the surface of the wear-resistant strip (1) to provide restraint and prevent it from moving during polishing. Step 4, perform polishing and continuous feeding: Start the polishing machine body (11), the polishing wheel (13) and guide wheel (14) start to rotate, polish the wear-resistant strip (1) and make it move along the axial direction. After the previous wear-resistant strip (1) is completely sent out from the rotating ring (26), the next wear-resistant strip (1) of the same diameter is directly loaded to realize continuous polishing operation. The polished wear-resistant strip (1) leaves the polishing area under the push of the subsequent workpiece and slides out along the inclined arc surface of the unloading plate (219) to complete automatic material discharge.

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