Nano ultralow-reflection AR glass and manufacturing method thereof

Abstract

The invention is suitable for the technical field of AR glass manufacturing, provides a nanometer ultralow-reflection AR glass manufacturing method, and is applied to a nanometer ultralow-reflection AR glass manufacturing control system. Comprising a sputtering thickness module, a sputtering rate module, a sputtering time module, a coating control module, a curing and cooling module, an image acquisition module, a wireless communication module, a memory, an alarm, a processing center and a mobile terminal, the sputtering thickness module, the sputtering rate module, the sputtering time module, the coating control module, the curing and cooling module, the image acquisition module, the wireless communication module, the memory and the alarm are respectively connected with the processing center; the mobile terminal comprises an intelligent mobile phone, a tablet personal computer or an intelligent remote controller, and is in wireless network connection with the wireless communication module in the range of the Internet of Things or the Internet. According to the invention, the sputtering thickness, speed and time can be automatically calculated, the magnetron sputtering coating can be automatically and accurately positioned, and automatic detection is realized.

Description

Technical Field

[0001] This invention belongs to the field of AR glass manufacturing technology, and more specifically, relates to a nano-ultra-low reflective AR glass and its manufacturing method. Background Technology

[0002] AR glass, also known as anti-reflective glass or eye glass, is a new type of glass that utilizes the most advanced magnetron sputtering coating technology in the world. In a near-vacuum state, a target material is sputtered onto the glass through magnetic poles to form an anti-reflective film. This increases the light transmittance, thereby reducing the reflection on the glass surface and making the colors that originally passed through the glass more vivid and realistic. It is used in various fields such as museums, displays, luxury goods window display cases, lighting fixtures, building curtain walls and interior partitions, picture frames, solar photovoltaic modules and greenhouses.

[0003] Currently, sputtering coating is carried out using traditional manual or machine-assisted methods without accurate calculation of sputtering time, sputtering rate, and sputtering thickness. As a result, the thickness is uneven; if it is too thin, it will not achieve the reflection effect, and if it is too thick, it will waste costs. Furthermore, there is no intelligent control. Summary of the Invention

[0004] To address the shortcomings of existing technologies, the present invention aims to provide a nano-ultra-low reflectance AR glass and its manufacturing method. By setting up a sputtering thickness module, a sputtering rate module, a sputtering time module, a coating control module, a curing and cooling module, and an image acquisition module, the sputtering thickness, rate, and time can be automatically calculated, and the tempered glass can be automatically and accurately positioned for magnetron sputtering coating. Automatic detection is also achieved, realizing automated, intelligent, and networked processing management, improving processing efficiency, and reducing processing costs.

[0005] To achieve the above objectives, the technical solution adopted by the present invention is as follows: A method for fabricating nano-ultra-low reflectance AR glass is disclosed, which is applied to a control system for fabricating nano-ultra-low reflectance AR glass. The system includes a sputtering thickness module, a sputtering rate module, a sputtering time module, a coating control module, a curing and cooling module, an image acquisition module, a wireless communication module, a memory, an alarm, a processing center, and a mobile terminal. The sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, memory, and alarm are all connected to the processing center. The mobile terminal includes a smartphone, tablet, or smart remote control, which is wirelessly connected to the wireless communication module within the range of the Internet of Things (IoT) or the Internet. The wireless communication module is equipped with an Internet of Things (IoT) unit, which is responsible for transmitting and receiving wireless signals and automatically forming a network connection with the mobile terminal within the effective network range. The processing center is responsible for transmitting information from the sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, memory, and alarm. It also compares the actual image information of the thin film with the thin film standard of the tempered glass to be coated stored in the memory: if they match, nano-ultra-low reflective AR glass is obtained; if they do not match, the information is transmitted to the alarm and a readjustment and rework are notified. When the actual image information of the film is inconsistent with the film standard of the tempered glass to be coated stored in the memory, the alarm will automatically sound an alarm and notify the user to readjust and rework. The memory is responsible for storing information from the sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, alarm, and the thin film standard of the tempered glass to be coated. The sputtering rate module obtains the values ​​of J, η, h, and m through sensors and calculates the sputtering rate of the low-reflection film according to the sputtering rate calculation formula "υ=J×η×h / m, where υ is the sputtering rate, J is the ion beam flux, η is the atomic or molecular escape efficiency of the target surface, h is the binding energy of each atom or molecule, and m is the mass of the target atom or molecule", and then transmits the sputtering rate to the sputtering time module. The sputtering time module obtains the sputtering time of the coating according to the low-reflection film sputtering time calculation formula "△T=△S / υ, where △T is the time taken for the low-reflection film to travel the distance during sputtering, △S is the distance traveled during sputtering, and υ is the sputtering rate of the low-reflection film", and transmits it to the coating control module.

[0006] Furthermore, the coating control module includes a parameter setting unit, a position verification unit, a sputtering control unit, a material preparation unit, a dust-free cleaning unit, a vacuum pumping unit, a heating control unit, and a material deposition unit. Based on the calculated sputtering parameters such as sputtering time, rate, and thickness, the prepared target material is deposited on the tempered glass using a prepared coating solution on a coating machine via magnetic pole sputtering, and then transferred to the curing and cooling module. The curing and cooling module includes a high-temperature curing unit, a cooling control unit, and a polishing unit. It is responsible for performing wet film leveling treatment on the coated tempered glass, curing the film layer at a predetermined temperature for a predetermined time, and continuing to cool it to a predetermined temperature to obtain nano-ultra-low reflective AR glass, which is then transmitted to the image acquisition module. The image acquisition module obtains image information such as the thickness, bonding strength, surface morphology, and optical properties of the thin film on the sputtered nano-ultra-low reflective AR glass through a high-definition camera and transmits it to the processing center.

[0007] This invention provides a method for fabricating nano-ultra-low reflectance AR glass, comprising the following steps: S20. The sputtering rate module obtains the values ​​of J, η, h, and m through sensors and calculates the sputtering rate of the low-reflection film according to the sputtering rate calculation formula "υ=J×η×h / m, where υ is the sputtering rate, J is the ion beam flux, η is the atomic or molecular escape efficiency on the target surface, h is the binding energy of each atom or molecule, and m is the mass of the target atom or molecule". This information is then transmitted to the sputtering time module. S30, the sputtering time module obtains the sputtering time of the coating according to the low-reflection film sputtering time calculation formula "△T=△S / υ, △T is the time taken for the low-reflection film to travel the distance during sputtering, △S is the distance traveled during sputtering, and υ is the sputtering rate of the low-reflection film", and transmits it to the coating control module. S40, the coating control module uses the prepared coating solution to coat the prepared target material on the tempered glass through magnetic pole sputtering on the coating machine according to the calculated sputtering parameters such as sputtering time, rate, and thickness, and then transmits the coating to the curing and cooling module. S50, the curing and cooling module performs wet film leveling treatment on the coated tempered glass, cures the film layer at a predetermined temperature for a predetermined time, and continues to cool to a predetermined temperature to obtain nano-ultra-low reflective AR glass, which is then transmitted to the image acquisition module. S60: The image acquisition module obtains image information such as the thickness, bonding strength, surface morphology, and optical properties of the thin film on the sputtered nano-ultra-low reflective AR glass through a high-definition camera and transmits it to the processing center. S70: The processing center compares the actual image information of the thin film with the thin film standard stored in the memory. If they match, the nano-ultra-low reflective AR glass is obtained. If they do not match, the information is transmitted to the alarm and a notification is sent for readjustment.

[0008] Furthermore, before step S40, "coating the prepared target material on tempered glass by magnetic sputtering," the following steps are included: S401, The material preparation unit notifies the substrate material, target material, auxiliary materials and other materials required for coating to be prepared through the processing list, as well as the vacuum coating machine, and then passes them to the dust-free cleaning unit. S402, the dust-free cleaning unit cleans and disinfects the coating chamber to ensure a clean and dust-free environment, and then passes the cleaning to the vacuum pumping unit. S403, the vacuum extraction unit puts the prepared substrate material into the vacuum coating machine and starts vacuum extraction to remove air and impurities from the coating chamber, ensuring that the coating process is oxygen-free and dust-free, and then passes the information to the heating control unit. S404 The heating control unit selects a suitable target material, installs it in the coating chamber, and heats it in a specific way to bring the target material surface to the required sputtering temperature, which is then transferred to the material deposition unit. S405, the material deposition unit controls the sputtering direction and rate on the target surface to control the deposition of sputtered material on the substrate material by adjusting the magnetic field.

[0009] Furthermore, step S40, "coating the prepared target material on tempered glass by magnetic sputtering," includes the following steps: S41. The parameter setting unit adds the prepared coating solution into the vacuum coating machine and sets the sputtering parameters such as time, rate, thickness, temperature, pressure, and power, and transmits them to the position verification unit. S42, The position verification unit performs precise position calibration of the target and substrate using laser to ensure accurate sputtering position and transmits the data to the sputtering control unit; S43. The sputtering control unit starts the vacuum coating machine to perform uniform magnetron sputtering on the tempered glass according to the set sputtering parameters to ensure the uniformity of sputtering.

[0010] Furthermore, step S50, which involves "performing a wet film leveling treatment on the coated tempered glass, curing the film at a predetermined temperature for a predetermined time, and continuing to cool it to a predetermined temperature to obtain nano-ultra-low reflectance AR glass," includes the following steps: S51, the high-temperature curing unit cleans the coated tempered glass and then puts it into a baking oven at 200-390℃ for curing for 15-65 seconds, and then transmits the curing to the cooling control unit. S52, the cooling control unit sends the cured low-reflection AR glass into the cooling device to cool it down to below 105°C, and then passes it to the polishing unit; S53, the polishing unit polishes the cooled low-reflection AR glass according to customer requirements and cleans the magnetron sputtering equipment thoroughly.

[0011] The present invention provides a control system for the fabrication of nano-ultra-low reflective AR glass, which further includes computer-aided equipment and a computer-readable storage medium. The computer-aided equipment includes a memory, a processing center and its functional modules. The memory stores a computer program, and when the functional modules execute the computer program, they implement the steps of the nano-ultra-low reflective AR glass fabrication method described above. The computer-readable storage medium stores a computer program, and when the computer program is executed by the functional modules, it implements the steps of the nano-ultra-low reflective AR glass fabrication method described above.

[0012] The present invention provides a nano-ultra-low reflectance AR glass manufacturing control system, and also includes a nano-ultra-low reflectance AR glass manufacturing control device, which is implemented by the above-described nano-ultra-low reflectance AR glass manufacturing method.

[0013] The present invention also provides a nano-ultra-low reflectance AR glass preparation, which is realized by the above-described method for manufacturing nano-ultra-low reflectance AR glass.

[0014] By setting up modules for sputtering thickness, sputtering rate, sputtering time, coating control, curing and cooling, and image acquisition, the system can automatically calculate the sputtering thickness, rate, and time, and automatically and accurately position the tempered glass for magnetron sputtering coating. It also features automatic detection, achieving automated, intelligent, and networked processing management, which improves processing efficiency and reduces processing costs. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of this application, the drawings used in the description of the embodiments or exemplary technologies will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a schematic diagram of the system module configuration of the present invention; Figure 2 This is a schematic diagram of the coating control module of the present invention; Figure 3 This is a schematic diagram of the curing and cooling module of the present invention; Figure 4 This is a schematic diagram of the method flow control program of the present invention; Figure 5 This is a schematic diagram of the process before step S40 in the method flow of the present invention; Figure 6 This is a schematic diagram of step S40 in the method flow of the present invention; Figure 7 This is a schematic diagram of step S50 in the method flow of the present invention. Implementation

[0017] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention.

[0018] The specific implementation of the present invention will be described in detail below with reference to specific embodiments: To make the technical problems, technical solutions, and beneficial effects to be solved by this application clearer, the following detailed description is provided in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and are not intended to limit the scope of this application.

[0019] It should be noted that when a module is said to be "set on" another module, it can be directly on that other module or indirectly on that other module. When a module is said to be "connected to" another module, it can be directly connected to that other module or indirectly connected to that other module.

[0020] In the description of this application, "multiple" means two or more, unless otherwise expressly and specifically defined. "Several" means one or more, unless otherwise expressly and specifically defined.

[0021] In the description of this application, it should be noted that, unless otherwise expressly specified and limited, the terms "connected" and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two elements or the interaction between two elements. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances. The terms "comprising," "including," "having," and their variations all mean "including but not limited to," unless otherwise specifically emphasized.

[0022] Please see Figure 1 As shown, this invention provides a method for fabricating nano-ultra-low reflectance AR glass, applied to a control system for fabricating nano-ultra-low reflectance AR glass. The system includes a sputtering thickness module, a sputtering rate module, a sputtering time module, a coating control module, a curing and cooling module, an image acquisition module, a wireless communication module, a memory, an alarm, a processing center, and a mobile terminal. The sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, memory, and alarm are all connected to the processing center. The mobile terminal includes a smartphone, tablet, or smart remote control, and is wirelessly connected to the wireless communication module within the range of the Internet of Things or the Internet.

[0023] The wireless communication module is equipped with an Internet of Things (IoT) unit, which is responsible for transmitting and receiving wireless signals and automatically forming a network connection with the mobile terminal within the effective network range.

[0024] The processing center is responsible for transmitting information from the sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, memory, and alarm. It also compares the actual image information of the thin film with the thin film standard of the tempered glass to be coated stored in the memory: if they match, nano-ultra-low reflective AR glass is obtained; if they do not match, the information is transmitted to the alarm and a readjustment and rework are notified.

[0025] The alarm will automatically sound an alarm and notify the user to readjust and rework if the actual image information of the film is inconsistent with the film standard of the tempered glass to be coated stored in the memory.

[0026] The memory is responsible for storing information from the sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, alarm, and the thin film standard of the tempered glass to be coated.

[0027] Furthermore, the tempered glass refers to a type of spare glass that is tempered through conventional processes, cleaned, and then preheated to room temperature.

[0028] Furthermore, the medium 1 is a gas, a liquid, or the tempered glass to be coated; the medium 2 is a gas, a liquid, or the tempered glass to be coated; when the medium changes, n1 and n2 take different values.

[0029] The sputtering rate module obtains the values ​​of J, η, h, and m through sensors and calculates the sputtering rate of the low-reflection film according to the sputtering rate calculation formula "υ=J×η×h / m, where υ is the sputtering rate, J is the ion beam flux, η is the atomic or molecular escape efficiency of the target surface, h is the binding energy of each atom or molecule, and m is the mass of the target atom or molecule", and then transmits the result to the sputtering time module.

[0030] The sputtering time module obtains the sputtering time of the coating according to the low-reflection film sputtering time calculation formula "△T=△S / υ, where △T is the time taken for the low-reflection film to travel the distance during sputtering, △S is the distance traveled during sputtering, and υ is the sputtering rate of the low-reflection film", and transmits it to the coating control module.

[0031] Furthermore, the "△T=△S / υ" is calculated based on the low-reflection film sputtering rate calculation formula "υ=△S / △T".

[0032] Please see Figure 2 As shown, the coating control module includes a parameter setting unit, a position verification unit, a sputtering control unit, a material preparation unit, a dust-free cleaning unit, a vacuum pumping unit, a heating control unit, and a material deposition unit. Based on the calculated sputtering parameters such as sputtering time, rate, and thickness, the prepared target material is deposited on the tempered glass using a prepared coating liquid on a coating machine via magnetic pole sputtering, and then transferred to the curing and cooling module.

[0033] Furthermore, the parameter setting unit is responsible for adding the prepared coating solution into the vacuum coating machine, setting the sputtering parameters such as time, rate, thickness, temperature, pressure, and power, and transmitting them to the position verification unit.

[0034] Furthermore, the position verification unit performs precise position calibration of the target and substrate using laser to ensure accurate sputtering position and transmits the result to the sputtering control unit.

[0035] Furthermore, the sputtering control unit activates the vacuum coating machine to perform uniform magnetron sputtering on the tempered glass according to the set sputtering parameters, so as to ensure the uniformity of sputtering.

[0036] Furthermore, before the step of "coating the prepared target material on tempered glass by magnetic sputtering", the process includes: the material preparation unit notifying the required substrate material, target material, auxiliary materials, and vacuum coating machine to be prepared according to the processing list, and passing this information to the cleanroom unit; the cleanroom unit is responsible for cleaning and disinfecting the coating chamber to ensure a clean and dust-free environment, and passing this information to the vacuum extraction unit; the vacuum extraction unit is responsible for placing the prepared substrate material into the vacuum coating machine and starting vacuum extraction to remove air and impurities from the coating chamber, ensuring an oxygen-free and dust-free environment during coating, and passing this information to the heating control unit; the heating control unit selects a suitable target material, installs it in the coating chamber, and heats it in a specific way to bring the target surface to the required sputtering temperature, and passes this information to the material deposition unit; the material deposition unit controls the sputtering direction and rate on the target surface using a magnetic field to control the deposition of sputtered material on the substrate material.

[0037] Furthermore, the sputtering parameters include sputtering time, rate, thickness, temperature, pressure, and power.

[0038] Furthermore, the tempered glass coating process involves placing a homogenized coating solution into a storage tank, pumping it into the coating solution chamber of the coating reactor using a pressure pump, and then atomizing the coating solution through an atomizing nozzle using the high pressure generated by the pressure pump. This atomizes the coating solution and sprays it onto the glass surface, forming an anti-reflective film layer. The principle is as follows: incident particles undergo a complex scattering process in the target, colliding with target atoms and transferring some momentum to them. These target atoms then collide with other target atoms, forming a cascade process. In this cascade process, some target atoms near the surface gain sufficient momentum to move outward and are sputtered away from the target.

[0039] Please see Figure 3 As shown, the curing and cooling module includes a high-temperature curing unit, a cooling control unit, and a polishing unit. It is responsible for performing wet film leveling treatment on the coated tempered glass, curing the film layer at a predetermined temperature for a predetermined time, and continuing to cool it to a predetermined temperature to obtain nano-ultra-low reflective AR glass, which is then transmitted to the image acquisition module.

[0040] Furthermore, the high-temperature curing unit is responsible for cleaning the coated tempered glass and then curing it in a baking oven at 200-390°C for 15-65 seconds, and then transmitting the result to the cooling control unit.

[0041] Furthermore, the cooling control unit is responsible for sending the cured low-reflection AR glass into the cooling device to cool it down to below 105°C, and then passing it to the polishing unit.

[0042] Furthermore, the polishing unit is responsible for polishing the cooled low-reflection AR glass according to customer requirements and cleaning the magnetron sputtering equipment thoroughly.

[0043] The image acquisition module obtains image information such as the thickness, bonding strength, surface morphology, and optical properties of the thin film on the sputtered nano-ultra-low reflective AR glass through a high-definition camera and transmits it to the processing center.

[0044] System working principle: Before "coating the prepared target material onto tempered glass via magnetic sputtering," the process includes: a material preparation unit notifying the required substrate material, target material, auxiliary materials, and vacuum coating machine via a processing list, and passing this information to a cleanroom unit; the cleanroom unit cleaning and disinfecting the coating chamber to ensure a clean and dust-free environment, and then passing this information to a vacuum extraction unit; the vacuum extraction unit placing the prepared substrate material into the vacuum coating machine and initiating vacuum extraction to remove air and impurities from the coating chamber, ensuring an oxygen-free and dust-free coating process, and then passing this information to a heating control unit; the heating control unit selecting a suitable target material, installing it in the coating chamber, and heating it in a specific manner to bring the target surface to the required sputtering temperature, and then passing this information to a material deposition unit; and the material deposition unit controlling the sputtering direction and rate on the target surface using a magnetic field to control the deposition of sputtered material onto the substrate material. The coated tempered glass undergoes wet film leveling treatment via a curing and cooling module, followed by film curing at a predetermined temperature for a predetermined time. It is then cooled to a predetermined temperature to obtain nano-ultra-low reflectance AR glass, which is then transmitted to the image acquisition module. This process includes: cleaning the coated tempered glass in a high-temperature curing unit and then curing it in a 200–390°C oven for 15–65 seconds, before transmitting the result to a cooling control unit; controlling the cooling control unit to cool the cured low-reflectance AR glass to below 105°C in a cooling device, before transmitting it to a polishing unit; and polishing the cooled low-reflectance AR glass according to customer requirements and thoroughly cleaning the magnetron sputtering equipment. The image acquisition module obtains image information such as the thickness, bonding strength, surface morphology, and optical properties of the thin film on the sputtered nano-ultra-low reflective AR glass through a high-definition camera and transmits it to the processing center. The processing center compares the actual image information of the thin film with the thin film standard stored in the memory: if they match, the nano-ultra-low reflective AR glass is obtained; if they do not match, the information is transmitted to the alarm and a notification is sent for readjustment.

[0045] When operators or managers are outdoors or traveling, they can use smartphones or tablets to automatically connect to the wireless communication module within an effective network, enabling wireless or remote monitoring of magnetron sputtering and allowing enterprises to achieve networked and intelligent production management.

[0046] Please see Figure 4 As shown, the present invention provides a method for fabricating nano-ultra-low reflectance AR glass, comprising the following steps: S20. The sputtering rate module obtains the values ​​of J, η, h, and m through sensors and calculates the sputtering rate of the low-reflection film according to the sputtering rate calculation formula "υ=J×η×h / m, where υ is the sputtering rate, J is the ion beam flux, η is the atomic or molecular escape efficiency on the target surface, h is the binding energy of each atom or molecule, and m is the mass of the target atom or molecule". This information is then transmitted to the sputtering time module. S30, the sputtering time module obtains the sputtering time of the coating according to the low-reflection film sputtering time calculation formula "△T=△S / υ, △T is the time taken for the low-reflection film to travel the distance during sputtering, △S is the distance traveled during sputtering, and υ is the sputtering rate of the low-reflection film", and transmits it to the coating control module. S40, the coating control module uses the prepared coating solution to coat the prepared target material on the tempered glass through magnetic pole sputtering on the coating machine according to the calculated sputtering parameters such as sputtering time, rate, and thickness, and then transmits the coating to the curing and cooling module. S50, the curing and cooling module performs wet film leveling treatment on the coated tempered glass, cures the film layer at a predetermined temperature for a predetermined time, and continues to cool to a predetermined temperature to obtain nano-ultra-low reflective AR glass, which is then transmitted to the image acquisition module. S60: The image acquisition module obtains image information such as the thickness, bonding strength, surface morphology, and optical properties of the thin film on the sputtered nano-ultra-low reflective AR glass through a high-definition camera and transmits it to the processing center. S70: The processing center compares the actual image information of the thin film with the thin film standard stored in the memory. If they match, the nano-ultra-low reflective AR glass is obtained. If they do not match, the information is transmitted to the alarm and a notification is sent for readjustment.

[0047] Please see Figure 5 As shown, before step S40, "depositing the prepared target material onto tempered glass by magnetic sputtering," the following steps are included: S401, The material preparation unit notifies the substrate material, target material, auxiliary materials and other materials required for coating to be prepared through the processing list, as well as the vacuum coating machine, and then passes them to the dust-free cleaning unit. S402, the dust-free cleaning unit cleans and disinfects the coating chamber to ensure a clean and dust-free environment, and then passes the cleaning to the vacuum pumping unit. S403, the vacuum extraction unit puts the prepared substrate material into the vacuum coating machine and starts vacuum extraction to remove air and impurities from the coating chamber, ensuring that the coating process is oxygen-free and dust-free, and then passes the information to the heating control unit. S404 The heating control unit selects a suitable target material, installs it in the coating chamber, and heats it in a specific way to bring the target material surface to the required sputtering temperature, which is then transferred to the material deposition unit. S405, the material deposition unit controls the sputtering direction and rate on the target surface to control the deposition of sputtered material on the substrate material by adjusting the magnetic field.

[0048] Please see Figure 6 As shown, step S40, "coating the prepared target material on tempered glass by magnetic sputtering," includes the following steps: S41. The parameter setting unit adds the prepared coating solution into the vacuum coating machine and sets the sputtering parameters such as time, rate, thickness, temperature, pressure, and power, and transmits them to the position verification unit. S42, The position verification unit performs precise position calibration of the target and substrate using laser to ensure accurate sputtering position and transmits the data to the sputtering control unit; S43. The sputtering control unit starts the vacuum coating machine to perform uniform magnetron sputtering on the tempered glass according to the set sputtering parameters to ensure the uniformity of sputtering.

[0049] Please see Figure 7 As shown, step S50, which involves "performing a wet film leveling treatment on the coated tempered glass, curing the film at a predetermined temperature for a predetermined time, and continuing to cool to a predetermined temperature to obtain nano-ultra-low reflectance AR glass," includes the following steps: S51, the high-temperature curing unit cleans the coated tempered glass and then puts it into a baking oven at 200-390℃ for curing for 15-65 seconds, and then transmits the curing to the cooling control unit. S52, the cooling control unit sends the cured low-reflection AR glass into the cooling device to cool it down to below 105°C, and then passes it to the polishing unit; S53, the polishing unit polishes the cooled low-reflection AR glass according to customer requirements and cleans the magnetron sputtering equipment thoroughly.

[0050] The present invention provides a control system for the fabrication of nano-ultra-low reflective AR glass, which further includes computer-aided equipment and a computer-readable storage medium. The computer-aided equipment includes a memory, a processing center and its functional modules. The memory stores a computer program, and when the functional modules execute the computer program, they implement the steps of the nano-ultra-low reflective AR glass fabrication method described above. The computer-readable storage medium stores a computer program, and when the computer program is executed by the functional modules, it implements the steps of the nano-ultra-low reflective AR glass fabrication method described above.

[0051] The present invention provides a nano-ultra-low reflectance AR glass manufacturing control system, and also includes a nano-ultra-low reflectance AR glass manufacturing control device, which is implemented by the above-described nano-ultra-low reflectance AR glass manufacturing method.

[0052] To further explain, the present invention is described in accordance with the software program of a nano-ultra-low reflectance AR glass manufacturing control system. Each method implemented by the control system is divided into several modules or units to implement the software program instructions generated in each step. The software program instructions include the above-described nano-ultra-low reflectance AR glass manufacturing method.

[0053] To further clarify, the above description of the present invention is based on the content implemented by the software copyrights applied for by our company, namely "Glass Processing Management Software (Version No.: V1.0, Registration Date: March 19, 2018)" and "Safety Tempered Glass Testing System Software (Version No.: V1.0, Registration Date: March 19, 2018)".

[0054] The present invention also provides a nano-ultra-low reflectance AR glass preparation, which is realized by the above-described method for manufacturing nano-ultra-low reflectance AR glass.

[0055] It will be apparent to those skilled in the art that this application is not limited to the details of the exemplary embodiments described above, and that this application can be implemented in other specific forms without departing from the spirit or essential characteristics of this application. Therefore, the embodiments should be regarded as exemplary and non-limiting in all respects, and the scope of this application is defined by the appended claims rather than the foregoing description. Thus, all variations falling within the meaning and scope of equivalents of the claims are intended to be embraced within this application.

[0056] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of this application and are not intended to limit it. Although this application has been described in detail with reference to preferred embodiments, those skilled in the art should understand that modifications or equivalent substitutions can be made to the technical solutions of this application, and all such modifications or substitutions should be included within the protection scope of this application.

Claims

1. A method for fabricating nano-ultra-low reflectance AR glass, characterized in that: A control system for fabricating nano-ultra-low reflectance AR glass includes a sputtering thickness module, a sputtering rate module, a sputtering time module, a coating control module, a curing and cooling module, an image acquisition module, a wireless communication module, a memory, an alarm, a processing center, and a mobile terminal. The sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, memory, and alarm are all connected to the processing center. The mobile terminal includes a smartphone, tablet, or smart remote control, which is wirelessly connected to the wireless communication module within the range of the Internet of Things or the Internet. The wireless communication module is equipped with an Internet of Things (IoT) unit, which is responsible for transmitting and receiving wireless signals and automatically forming a network connection with the mobile terminal within the effective network range. The processing center is responsible for transmitting information from the sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, memory, and alarm. It also compares the actual image information of the thin film with the thin film standard of the tempered glass to be coated stored in the memory: if they match, nano-ultra-low reflective AR glass is obtained; if they do not match, the information is transmitted to the alarm and a readjustment and rework are notified. The alarm will automatically sound an alarm and notify the user to readjust and rework if the actual image information of the film is inconsistent with the film standard of the tempered glass to be coated stored in the memory. The memory is responsible for storing information from the sputtering thickness module, sputtering rate module, sputtering time module, coating control module, curing and cooling module, image acquisition module, wireless communication module, alarm, and the thin film standard of the tempered glass to be coated. The sputtering rate module obtains the values ​​of J, η, h, and m through sensors and calculates the sputtering rate of the low-reflection film according to the formula "υ=J×η×h / m, where υ is the sputtering rate, J is the ion beam flux, η is the atomic or molecular escape efficiency on the target surface, h is the binding energy of each atom or molecule, and m is the mass of the target atom or molecule". The sputtering rate module then transmits the result to the sputtering time module. The sputtering time module obtains the sputtering time of the coating according to the low-reflection film sputtering time calculation formula "△T=△S / υ, where △T is the time taken for the low-reflection film to travel the distance during sputtering, △S is the distance traveled during sputtering, and υ is the sputtering rate of the low-reflection film", and transmits it to the coating control module.

2. The method for fabricating nano-ultra-low reflectance AR glass according to claim 1, characterized in that: The coating control module includes a parameter setting unit, a position verification unit, a sputtering control unit, a material preparation unit, a dust-free cleaning unit, a vacuum pumping unit, a heating control unit, and a material deposition unit. Based on the calculated sputtering parameters such as sputtering time, rate, and thickness, the prepared target material is deposited onto the tempered glass using a prepared coating liquid on a coating machine via magnetic pole sputtering, and then transferred to the curing and cooling module. The curing and cooling module includes a high-temperature curing unit, a cooling control unit, and a polishing unit. It is responsible for performing wet film leveling treatment on the coated tempered glass, curing the film layer at a predetermined temperature for a predetermined time, and continuing to cool it to a predetermined temperature to obtain nano-ultra-low reflective AR glass, which is then transmitted to the image acquisition module. The image acquisition module obtains image information such as the thickness, bonding strength, surface morphology, and optical properties of the thin film on the sputtered nano-ultra-low reflective AR glass through a high-definition camera and transmits it to the processing center.

3. A method for fabricating nano-ultra-low reflectance AR glass according to claims 1 and 2, characterized in that: Includes the following steps: S20. The sputtering rate module obtains the values ​​of J, η, h, and m through sensors and calculates the sputtering rate of the low-reflection film according to the formula "υ=J×η×h / m, where υ is the sputtering rate, J is the ion beam flux, η is the atomic or molecular escape efficiency on the target surface, h is the binding energy of each atom or molecule, and m is the mass of the target atom or molecule". This information is then transmitted to the sputtering time module. S30, the sputtering time module obtains the sputtering time of the coating according to the low-reflection film sputtering time calculation formula "△T=△S / υ, where △T is the time taken for the low-reflection film to travel the distance during sputtering, △S is the distance traveled during sputtering, and υ is the sputtering rate of the low-reflection film", and transmits it to the coating control module. S40, the coating control module uses the prepared coating solution to coat the prepared target material on the tempered glass through magnetic pole sputtering on the coating machine according to the calculated sputtering parameters such as sputtering time, rate, and thickness, and then transmits the coating to the curing and cooling module. S50, the curing and cooling module performs wet film leveling treatment on the coated tempered glass, cures the film layer at a predetermined temperature for a predetermined time, and continues to cool to a predetermined temperature to obtain nano-ultra-low reflective AR glass, which is then transmitted to the image acquisition module. S60: The image acquisition module obtains image information such as the thickness, bonding strength, surface morphology, and optical properties of the thin film on the sputtered nano-ultra-low reflective AR glass through a high-definition camera and transmits it to the processing center. S70: The processing center compares the actual image information of the thin film with the thin film standard stored in the memory. If they match, the nano-ultra-low reflective AR glass is obtained. If they do not match, the information is transmitted to the alarm and a notification is sent for readjustment.

4. A method for fabricating nano-ultra-low reflectance AR glass according to claim 3, characterized in that: Before step S40, "coating the prepared target material on tempered glass by magnetic sputtering", the following steps are included: S401, The material preparation unit notifies the substrate material, target material, auxiliary materials and other materials required for coating to be prepared through the processing list, as well as the vacuum coating machine, and then passes them to the dust-free cleaning unit. S402, the dust-free cleaning unit cleans and disinfects the coating chamber to ensure a clean and dust-free environment, and then passes the cleaning to the vacuum pumping unit. S403, the vacuum extraction unit puts the prepared substrate material into the vacuum coating machine and starts vacuum extraction to remove air and impurities from the coating chamber, ensuring that the coating process is oxygen-free and dust-free, and then passes the information to the heating control unit. S404 The heating control unit selects a suitable target material, installs it in the coating chamber, and heats it in a specific way to bring the target material surface to the required sputtering temperature, which is then transferred to the material deposition unit. S405, the material deposition unit controls the sputtering direction and rate on the target surface to control the deposition of sputtered material on the substrate material by adjusting the magnetic field.

5. A method for fabricating nano-ultra-low reflectance AR glass according to claim 3, characterized in that: Step S40, "coating the prepared target material on tempered glass by magnetic sputtering," includes the following steps: S41. The parameter setting unit adds the prepared coating solution into the vacuum coating machine and sets the sputtering parameters such as time, rate, thickness, temperature, pressure, and power, and transmits them to the position verification unit. S42. The position verification unit performs precise position calibration of the target and substrate using laser to ensure accurate sputtering position and transmits the data to the sputtering control unit. S43. The sputtering control unit starts the vacuum coating machine to perform uniform magnetron sputtering on the tempered glass according to the set sputtering parameters to ensure the uniformity of sputtering.

6. A method for fabricating nano-ultra-low reflectance AR glass according to claim 3, characterized in that: Step S50, which involves "performing a wet film leveling treatment on the coated tempered glass, curing the film at a predetermined temperature for a predetermined time, and continuing to cool to a predetermined temperature to obtain nano-ultra-low reflectance AR glass," includes the following steps: S51, the high-temperature curing unit cleans the coated tempered glass and then sends it to a baking oven at 200-390℃ for curing for 15-65 seconds, and then transmits the curing to the cooling control unit. S52, The cooling control unit sends the cured low-reflection AR glass into the cooling device to cool it down to below 105°C, and then passes it to the polishing unit; S53, the polishing unit polishes the cooled low-reflection AR glass according to customer requirements and cleans the magnetron sputtering equipment thoroughly.

7. A method for fabricating nano-ultra-low reflectance AR glass according to claims 1 and 2, characterized in that: The nano-ultra-low reflectance AR glass fabrication control system further includes computer-aided equipment and a computer-readable storage medium; the computer-aided equipment includes a memory, a processing center and its functional modules, the memory stores a computer program, and the functional modules execute the computer program to implement the steps of the nano-ultra-low reflectance AR glass fabrication method according to any one of claims 1 to 6; the computer-readable storage medium stores a computer program, and the computer program, when executed by the functional modules, implements the steps of the nano-ultra-low reflectance AR glass fabrication method according to any one of claims 1 to 6.

8. A method for fabricating nano-ultra-low reflectance AR glass according to claims 1 and 2, characterized in that: The nano-ultra-low reflectance AR glass manufacturing control system further includes a nano-ultra-low reflectance AR glass manufacturing control device, which is implemented by the nano-ultra-low reflectance AR glass manufacturing method described in claims 1 to 7.

9. A nano-ultra-low reflectance AR glass device, characterized in that: This is achieved by the method for manufacturing nano-ultra-low reflectance AR glass as described in claims 1 to 8.

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