Optical film layer and electronic device
By setting up a stacked structure of high and low refractive index films in LCOS technology, the problem of low light transmittance caused by the increase of film layers is solved, thereby improving light transmittance and enhancing optical effects.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- SHENZHEN LAIBAO HI TECH
- Filing Date
- 2024-10-28
- Publication Date
- 2026-04-28
AI Technical Summary
In automotive projection, the increased film layers in LCOS technology affect light transmittance, resulting in poor light effects.
A first optical layer is placed between the substrate layer and the air. The reflection effect of incident light from the substrate layer is reduced by stacking high and low refractive index films. A second optical layer is placed between the substrate layer and the electrode layer. The reflection effect of incident light from the electrode layer is reduced by stacking high and low refractive index films, thereby improving the overall light transmittance.
By optimizing the optical layer structure, the light transmittance was significantly improved, thus enhancing the optical effect.
Smart Images
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Abstract
Description
Technical Field
[0001] This invention relates to the field of display technology, and more particularly to an optical film and an electronic device. Background Technology
[0002] Currently, the mainstream automotive projection technologies include LCOS, DLP, and TFT. Among them, Liquid Crystal on Silicon (LCOS) technology is a new type of reflective projection technology. It forms a sandwich-like structure by injecting liquid crystal material between a surface glass and a CMOS silicon wafer with a transparent electronic film. Compared to TFT and DLP, LCOS technology offers advantages in automotive projection such as smaller pixel size, higher contrast ratio, higher aperture ratio, lower power consumption, mature manufacturing processes, a controllable supply chain, cost advantages, compatibility with various light sources, and high reliability. These advantages make LCOS an ideal choice for automotive projection technology.
[0003] However, in practical applications, LCOS technology usually requires the addition of ITO or other film layers as electrode layers, and the increase in the number of film layers will affect its light transmittance. Summary of the Invention
[0004] The present invention aims to solve at least one problem in the prior art. To this end, the present invention provides an optical film and an electronic device, the optical film being capable of improving light transmittance.
[0005] An optical film layer according to a first aspect of the present invention includes a substrate layer, a first optical layer, a second optical layer, an electrode layer, and a liquid crystal layer. The substrate layer has a first surface and a second surface. The first optical layer includes a first low-refractive-index layer and a first high-refractive-index layer alternately disposed in sequence. The first surface of the substrate layer is provided with the first high-refractive-index layer, and the number of the first low-refractive-index layer and the first high-refractive-index layer is 1-3. The second optical layer includes a second low-refractive-index layer and a second high-refractive-index layer alternately disposed in sequence. The second surface of the substrate layer is provided with the second high-refractive-index layer, and the thickness of the first low-refractive-index layer is less than the thickness of the second low-refractive-index layer. The electrode layer is disposed on the side surface of the second low-refractive-index layer away from the substrate layer. The liquid crystal layer is disposed on the side surface of the electrode layer away from the substrate layer.
[0006] Therefore, this solution sets a first optical layer between the substrate layer and the air. By stacking high and low refractive index films, the reflection effect of incident light on the substrate layer is reduced, and the transmittance of incident light on the substrate layer is improved. At the same time, a second optical layer is set between the substrate layer and the electrode layer. By stacking high and low refractive index films, the reflection effect of incident light on the electrode layer is reduced, and the transmittance of incident light on the electrode layer is improved, thereby improving the overall light transmittance.
[0007] According to another embodiment of the present invention, the number of the first low refractive index layer and the first high refractive index layer is one layer, the thickness of the first low refractive index layer is between 30-60 nm, and the thickness of the first high refractive index layer is between 0-20 nm.
[0008] According to another embodiment of the present invention, the first low-refractive-index layer and the first high-refractive-index layer have the same number of layers.
[0009] According to another embodiment of the present invention, both the first low-refractive-index layer and the second low-refractive-index layer are silicon oxide layers.
[0010] According to another embodiment of the present invention, the first high refractive index layer and the second high refractive index layer are one of niobium oxide layer, silicon nitride layer and titanium oxide layer.
[0011] According to another embodiment of the present invention, the thickness of the second low refractive index layer is between 50-150 nm, and the thickness of the second high refractive index layer is between 0-20 nm.
[0012] According to another embodiment of the present invention, the electrode layer is an indium tin oxide layer.
[0013] According to another embodiment of the present invention, the thickness of the electrode layer is between 10-20 nm.
[0014] According to another embodiment of the present invention, the substrate layer is a glass layer.
[0015] An electronic device according to a second aspect of the present invention includes any of the optical films described above.
[0016] Compared with the prior art, the present invention has the following beneficial effects:
[0017] This invention discloses an optical film layer, comprising a substrate layer, a first optical layer, a second optical layer, an electrode layer, and a liquid crystal layer. The substrate layer has a first surface and a second surface. The first optical layer includes a first low-refractive-index layer and a first high-refractive-index layer alternately arranged in sequence. The first surface of the substrate layer is provided with a first high-refractive-index layer, and the number of the first low-refractive-index layer and the first high-refractive-index layer is 1-3. The second optical layer includes a second low-refractive-index layer and a second high-refractive-index layer alternately arranged in sequence. The second surface of the substrate layer is provided with a second high-refractive-index layer, and the thickness of the first low-refractive-index layer is smaller than that of the second low-refractive-index layer. The thickness of the electrode layer is as follows: the electrode layer is disposed on the surface of the second low refractive index layer away from the substrate layer; the liquid crystal layer is disposed on the surface of the electrode layer away from the substrate layer. This solution provides a first optical layer between the substrate layer and the air. By superimposing high and low refractive index films, the reflection effect of incident light on the substrate layer is reduced, and the transmittance of incident light on the substrate layer is improved. At the same time, a second optical layer is disposed between the substrate layer and the electrode layer. By superimposing high and low refractive index films, the reflection effect of incident light on the electrode layer is reduced, and the transmittance of incident light on the electrode layer is improved, thereby improving the overall light transmittance.
[0018] Additional aspects and advantages of the invention will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. Attached Figure Description
[0019] The accompanying drawings are for illustrative purposes only and are not intended to limit the invention. Furthermore, the same reference numerals denote the same parts throughout the drawings. In the drawings:
[0020] Figure 1 This is a cross-sectional schematic diagram of an embodiment of an optical layer in the prior art;
[0021] Figure 2 A cross-sectional schematic diagram of an embodiment of the optical film layer provided in this application;
[0022] Figure 3 A cross-sectional schematic diagram of an embodiment of the electronic device provided in this application;
[0023] The markings in the diagram mean:
[0024] 1. Optical layer; 2. Substrate layer; 3. Common electrode layer; 4. Liquid crystal display layer;
[0025] 10. Electronic devices;
[0026] 100. Optical coatings;
[0027] 110. Substrate layer; 111. First surface; 112. Second surface;
[0028] 120. First optical layer; 121. First low refractive index layer; 122. First high refractive index layer;
[0029] 130. Second optical layer; 131. Second low-refractive-index layer; 132. Second high-refractive-index layer;
[0030] 140. Electrode layer;
[0031] 150. Liquid crystal layer. Detailed Implementation
[0032] Embodiments of the present invention are described in detail below. Examples of these embodiments are shown in the accompanying drawings, wherein the same or similar reference numerals denote the same or similar elements or elements having the same or similar functions throughout. The embodiments described below with reference to the accompanying drawings are exemplary and are only used to explain the present invention, and should not be construed as limiting the present invention.
[0033] In the description of this invention, it should be understood that features specified as "first" or "second" may explicitly or implicitly include one or more of those features. In the description of this invention, unless otherwise stated, "a plurality of" means two or more.
[0034] In the description of this invention, it should be noted that, unless otherwise explicitly specified and limited, the terms "installation," "connection," and "linking" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; and they can refer to the internal connection of two components. Those skilled in the art can understand the specific meaning of the above terms in this invention based on the specific circumstances.
[0035] To illustrate the optical film and electronic device provided in this application, a detailed description is provided below in conjunction with the accompanying drawings and textual descriptions of the embodiments.
[0036] Please refer to Figure 1 The optical layer 1 according to an embodiment of the prior art is described as follows: Figure 1 As shown, the optical layer 1 includes a substrate layer 11, a common electrode layer 12, and a liquid crystal display layer 13. External light directly enters the substrate layer 11 from the air. Since the refractive index of air is different from that of the substrate layer 11, the reflectivity of the incident light is high, resulting in low transmittance of the final incident light and poor optical effect.
[0037] The following is for reference. Figure 2 The optical film layer 100 according to an embodiment of the first aspect of the present invention is described as follows: Figure 2As shown, the optical film layer 100 includes a substrate layer 110, a first optical layer 120, a second optical layer 130, an electrode layer 140, and a liquid crystal layer 150. Specifically, the substrate layer 110 has corresponding first surface 111 and second surface 112. The first surface 111 is the surface closer to the external space of the optical film layer 100. Further, the first optical layer 120 includes a first low refractive index layer 121 and a first high refractive index layer 122 alternately disposed in sequence. Specifically, the first surface 111 of the substrate layer 110... The first high refractive index layer 122 is provided, and the number of the first low refractive index layer 121 and the first high refractive index layer 122 is 1-3 layers. By alternately setting the first high refractive index layer 122 and the first low refractive index layer 121, the effect of light transmission enhancement and light reflection reduction is achieved. Further, the second optical layer 130 includes a second low refractive index layer 131 and a second high refractive index layer 132 alternately set in sequence. The second surface 112 of the substrate layer 110 is provided with the second high refractive index layer 132. The thickness of the low-refractive-index layer 121 is less than the thickness of the second low-refractive-index layer 131. It is understood that, after matching optical parameters, when the thickness of the first low-refractive-index layer 121 is less than the thickness of the second low-refractive-index layer 131, the effect of increasing light transmission and reducing light reflection will be more obvious. Furthermore, the electrode layer 140 is disposed on the surface of the second low-refractive-index layer 131 away from the substrate layer 110. Furthermore, the liquid crystal layer 150 is disposed on the surface of the electrode layer 140 away from the substrate layer 110. This solution reduces the reflection effect of incident light from the substrate layer 110 and improves the transmittance of incident light from the substrate layer 110 by distributing the first optical layer 120 between the substrate layer 110 and the air and stacking the high and low refractive-index films. At the same time, the second optical layer 130 is disposed between the substrate layer 110 and the electrode layer 140. By stacking the high and low refractive-index films, the reflection effect of incident light from the electrode layer 140 is reduced and the transmittance of incident light from the electrode layer 140 is improved, thereby improving the overall light transmittance.
[0038] It should be noted that, in order to reduce the loss of light reflection, a first optical layer 120 with a refractive index lower than that of glass can be deposited on the surface of the substrate layer 110. When the refractive index and thickness of the first optical layer 120 are correctly selected, for a specific wavelength, the light reflected from the upper and lower surfaces of the first optical layer 120 can interfere destructively, thereby increasing the transmitted light energy.
[0039] It should be noted that the number of the first low-refractive-index layer 121 and the first high-refractive-index layer 122 is 1 to 3. For example, the number of the first low-refractive-index layer 121 and the first high-refractive-index layer 122 is 1, or the number of the first low-refractive-index layer 121 and the first high-refractive-index layer 122 is 2, or the number of the first low-refractive-index layer 121 and the first high-refractive-index layer 122 is 3. It is understandable that when the number of the first low-refractive-index layer 121 and the first high-refractive-index layer 122 exceeds 3, the effect on improving the overall light transmittance is not significant, and the manufacturing cost and manufacturing difficulty will increase.
[0040] According to one embodiment of the present invention, such as Figure 2 As shown, there is one first low-refractive-index layer 121 and one first high-refractive-index layer 122. The thickness of the first low-refractive-index layer 121 is between 30-60 nm, and the thickness of the first high-refractive-index layer 122 is between 0-20 nm, thereby improving the light transmission effect.
[0041] It should be noted that the thickness of the first low-refractive-index layer 121 can be 30 nm, or 35 nm, or 40 nm, or 45 nm, or 50 nm, or 55 nm, or 60 nm. It can be understood that the thickness of the first high-refractive-index layer 122 can be 1 nm, or... The thickness of the first high refractive index layer 122 can be 2 nm, or the thickness of the first high refractive index layer 122 can be 3 nm, or the thickness of the first high refractive index layer 122 can be 5 nm, or the thickness of the first high refractive index layer 122 can be 8 nm, or the thickness of the first high refractive index layer 122 can be 10 nm, or the thickness of the first high refractive index layer 122 can be 12 nm, or the thickness of the first high refractive index layer 122 can be 15 nm, or the thickness of the first high refractive index layer 122 can be 18 nm, or the thickness of the first high refractive index layer 122 can be 20 nm.
[0042] According to one embodiment of the present invention, such as Figure 2 As shown, the first low refractive index layer 121 and the first high refractive index layer 122 have the same number of layers. It can be understood that since the refractive index of the substrate layer 110 is usually low, it is necessary to avoid direct contact between the first low refractive index layer 121 and the substrate layer 110. Therefore, it is necessary to set the number of layers of the first low refractive index layer 121 and the first high refractive index layer 122 to be the same, so that the first high refractive index layer 122 is in direct contact with the substrate layer 110.
[0043] According to one embodiment of the present invention, such as Figure 2 As shown, both the first low refractive index layer 121 and the second low refractive index layer 131 are silicon oxide layers. It is understood that silicon oxide layers are commonly used low refractive index layers, which have the advantages of stable performance and low price, and can appropriately reduce production costs.
[0044] According to one embodiment of the present invention, such as Figure 2 As shown, the first high refractive index layer 122 and the second high refractive index layer 132 are one of niobium oxide layer, silicon nitride layer and titanium oxide layer. Specifically, niobium oxide is a general term for various oxides of niobium, including niobium monoxide, niobium dioxide, niobium trioxide and niobium pentoxide. Preferably, niobium pentoxide has the characteristics of chemical stability and high thermal stability, and can be used as the first high refractive index layer 122 and the second high refractive index layer 132.
[0045] According to one embodiment of the present invention, such as Figure 2 As shown, the thickness of the second low-refractive-index layer 131 is between 50-150 nm, and the thickness of the second high-refractive-index layer 132 is between 0-20 nm, thereby improving the light transmission effect.
[0046] It should be noted that the thickness of the second low-refractive-index layer 131 can be 50 nm, or 55 nm, or 60 nm, or 70 nm, or 80 nm, or 90 nm, or 100 nm, or 110 nm, or 120 nm, or 130 nm, or 140 nm, or 150 nm.
[0047] It should be noted that the thickness of the second high refractive index layer 132 can be 1 nm, or 2 nm, or 3 nm, or 5 nm, or 8 nm, or 10 nm, or 12 nm, or 15 nm, or 18 nm, or 20 nm.
[0048] According to one embodiment of the present invention, such as Figure 2 As shown, electrode layer 140 is an indium tin oxide (ITO) layer. It is understood that indium tin oxide layer is a commonly used optical material layer with the advantages of stable performance and low price, which can appropriately reduce production costs.
[0049] According to one embodiment of the present invention, such as Figure 2 As shown, the thickness of the electrode layer 140 is between 10-20 nm. For example, the thickness of the electrode layer 140 can be 10 nm, or 12 nm, or 15 nm, or 18 nm, or 20 nm.
[0050] According to one embodiment of the present invention, such as Figure 2 As shown, the substrate layer 110 is a glass layer.
[0051] The following is for reference. Figure 3 An electronic device 10 according to an embodiment of a second aspect of the present invention is described, such as... Figure 3As shown, the electronic device 10 includes an optical film layer 100. Specifically, the optical film layer 100 includes a substrate layer 110, a first optical layer 120, a second optical layer 130, an electrode layer 140, and a liquid crystal layer 150. Specifically, the substrate layer 110 has corresponding first surfaces 111 and second surfaces 112. The first surface 111 is the surface closer to the external space of the optical film layer 100. Further, the first optical layer 120 includes a first low-refractive-index layer 121 and a first high-refractive-index layer 122 alternately arranged in sequence. Specifically, the first surface 111 of the substrate layer 110 is provided with a first high-refractive-index layer 122, and the number of first low-refractive-index layers 121 and first high-refractive-index layers 122 is 1-3 layers. Further, the second optical layer 130 includes a second low-refractive-index layer 131 and a second high-refractive-index layer 132 alternately arranged in sequence. The substrate layer 110... The second surface 112 is provided with a second high refractive index layer 132. The thickness of the first low refractive index layer 121 is less than the thickness of the second low refractive index layer 131. Further, an electrode layer 140 is provided on the surface of the second low refractive index layer 131 away from the substrate layer 110. Further, a liquid crystal layer 150 is provided on the surface of the electrode layer 140 away from the substrate layer 110. A first optical layer 120 is provided between the substrate layer 110 and the air. By superimposing high and low refractive index films, the reflection effect of incident light on the substrate layer 110 is reduced, and the transmittance of incident light on the substrate layer 110 is improved. At the same time, a second optical layer 130 is provided between the substrate layer 110 and the electrode layer 140. By superimposing high and low refractive index films, the reflection effect of incident light on the electrode layer 140 is reduced, and the transmittance of incident light on the electrode layer 140 is improved, thereby improving the overall light transmittance.
[0052] The optical film and electronic device provided in this application are preferred embodiments and should not be construed as limiting the scope of protection of this application. Those skilled in the art should know that various improvements or substitutions can be made without departing from the concept of this application. All improvements or substitutions should be within the scope of protection of this application, that is, the scope of protection of this application should be determined by the claims.
[0053] Where there is no conflict, the above embodiments and features described herein can be combined with each other.
Claims
1. An optical film layer, characterized in that, include: A substrate layer having a first surface and a second surface; The first optical layer includes a first low refractive index layer and a first high refractive index layer arranged alternately in sequence. The first surface of the substrate layer is provided with the first high refractive index layer. The number of the first low refractive index layer and the first high refractive index layer is 1-3. The second optical layer includes a second low-refractive-index layer and a second high-refractive-index layer arranged alternately in sequence. The second surface of the substrate layer is provided with the second high-refractive-index layer, and the thickness of the first low-refractive-index layer is less than the thickness of the second low-refractive-index layer. An electrode layer is disposed on the surface of the second low-refractive-index layer away from the substrate layer; A liquid crystal layer is disposed on the side surface of the electrode layer away from the substrate layer.
2. The optical film layer as described in claim 1, characterized in that, The number of the first low-refractive-index layer and the first high-refractive-index layer is one. The thickness of the first low-refractive-index layer is between 30-60 nm, and the thickness of the first high-refractive-index layer is between 0-20 nm.
3. The optical film layer as described in claim 1, characterized in that, The first low-refractive-index layer and the first high-refractive-index layer have the same number of layers.
4. The optical film layer as described in claim 1, characterized in that, Both the first low-refractive-index layer and the second low-refractive-index layer are silicon oxide layers.
5. The optical film layer as described in claim 1, characterized in that, The first high refractive index layer and the second high refractive index layer are one of niobium oxide layer, silicon nitride layer and titanium oxide layer.
6. The optical film layer as described in claim 1, characterized in that, The thickness of the second low-refractive-index layer is between 50-150 nm, and the thickness of the second high-refractive-index layer is between 0-20 nm.
7. The optical film layer as described in claim 1, characterized in that, The electrode layer is an indium tin oxide layer.
8. The optical film layer as described in claim 1, characterized in that, The thickness of the electrode layer is between 10 and 20 nm.
9. The optical film layer as claimed in claim 1, characterized in that, The substrate layer is a glass layer.
10. An electronic device, characterized in that, Includes the optical film layer as described in any one of claims 1-9.