Fluid device, method for manufacturing same, and electrophoresis device using same

Abstract

The invention provides a fluid device which has a flow path resistance smaller than that of the prior art and can more reliably prevent air bubbles from adhering to the inner wall surface of the flow path. This fluid device is a resin fluid device mounted on an analysis device, and is characterized by having, in the interior thereof, a tubular flow path having a circular cross-sectional shape and an aspect ratio, which is the ratio of the length to the diameter, of 10 or more, the arithmetic average of the roughness of the inner wall surface of the flow path being 0.5 [mu] m or less, and the standard deviation being 0.1 [mu] m or less.

Description

Technical Field

[0001] This invention relates to a fluid device, a method for manufacturing the same, and an electrophoresis apparatus using the fluid device. Background Technology

[0002] Conventionally, fluid devices installed within analytical apparatuses include those that involve pressing and transferring a metal mold, mimicking the shape of a fine flow path, onto a resin substrate softened by heat, followed by attaching a plate-shaped cap to the resin substrate (see, for example, Patent Document 1). These fluid devices struggle to create flow paths with minimal resistance due to their approximately circular cross-sectional shape, and require a bonding strength exceeding the internal pressure of the flow path. Fluid devices that form approximately circular flow paths on a resin substrate through machining or through a 3D printer have also been considered. However, these devices often result in fine irregularities on the inner wall surface of the flow path due to cutting marks and scanning marks. When such irregularities exist in the flow path, problems arise such as impeded fluid flow or air bubbles adhering to the inner wall surface.

[0003] On the other hand, a technique has been disclosed in the past to smooth the unevenness of the substrate surface by applying an organic solvent or resin varnish to the surface of the resin substrate (for example, see Patent Document 2 and Patent Document 3).

[0004] Therefore, it is also considered to apply substrate planarization technology to fluid devices manufactured by machining or 3D printing (for example, see Patent Document 2 and Patent Document 3).

[0005] Existing technical documents

[0006] Patent documents

[0007] Patent Document 1: Japanese Patent Publication No. 2017-538416

[0008] Patent Document 2: Japanese Patent Application Publication No. 6-128398

[0009] Patent Document 3: Japanese Patent Application Publication No. 5-198952 Summary of the Invention

[0010] The problem that the invention aims to solve

[0011] However, even when the smoothing techniques disclosed in Patent Documents 2 and 3 are applied to fluid devices manufactured through machining or 3D printing, the problem remains that organic solvents and other entrained substances have difficulty penetrating the fine flow paths. Furthermore, it has been considered to forcibly introduce organic solvent vapors into the flow paths under pressure. However, a portion of the organic solvent introduced into the flow paths under pressure liquefies within the flow paths. The liquefied organic solvent adheres to multiple locations along the length of the flow path's inner wall. This creates an uneven, rough surface along the length of the flow path in the fluid device. Consequently, air bubbles are more likely to adhere to the inner wall of the flow path.

[0012] The objective of this invention is to provide a fluid device with lower flow path resistance and more reliable prevention of air bubbles adhering to the inner wall of the flow path, a method for manufacturing the same, and an electrophoresis apparatus using the fluid device.

[0013] Solution for solving the problem

[0014] The present invention provides a fluid device, which is a resin-made fluid device mounted on an analytical apparatus. The device is characterized in that it has a tubular flow path inside, with a length-to-diameter ratio (i.e., an aspect ratio of 10 or more) and a circular cross-sectional shape. The arithmetic mean roughness of the inner wall surface of the flow path is 0.5 μm or less, and the standard deviation is 0.1 μm or less.

[0015] Furthermore, in the manufacturing method of the fluid device of the present invention, the fluid device has a tubular flow path with a length-to-diameter ratio (i.e., an aspect ratio of 10 or more) and a circular cross-sectional shape inside, and the arithmetic mean roughness of the inner wall surface of the flow path is 0.5 μm or less and the standard deviation is 0.1 μm or less. The manufacturing method of the fluid device is characterized by having the following steps: forming a through hole with a circular cross-sectional shape in a resin block; and drawing in vapor of an organic solvent from one end of the through hole while introducing it from the other end.

[0016] Furthermore, the electrophoresis apparatus of the present invention is characterized in that it includes the above-described fluid device, wherein the flow path of the fluid device constitutes part of the flow path of the electrophoresis apparatus.

[0017] Invention Effects

[0018] According to the present invention, a fluid device with lower flow path resistance than before and preventing air bubbles from adhering to the inner wall surface of the flow path is provided, as well as a method for manufacturing the same and an electrophoresis apparatus using the fluid device. Attached Figure Description

[0019] Figure 1 This is a structural illustration of the fluid device according to the first embodiment of the present invention.

[0020] Figure 2 Symbols 201 to 204 in the text are Figure 1The diagram illustrates the process of manufacturing the fluid device.

[0021] Figure 3 The symbol 301 in the text is Figure 2 The figure with symbol 204 is a cross-sectional view of IIIa-IIIa. The figure with symbol 302 is a cross-sectional view of a modified example of the flow path of the figure with symbol 301.

[0022] Figure 4 This is a structural illustration of the fluid device according to the second embodiment of the present invention.

[0023] Figure 5 Symbols 501 to 504 in the text are Figure 4 The diagram illustrates the process of manufacturing the fluid device.

[0024] Figure 6 This is a structural illustration of the fluid device according to the third embodiment of the present invention.

[0025] Figure 7 Symbols 701 to 704 in the text are Figure 6 The diagram illustrates the process of manufacturing the fluid device.

[0026] Figure 8 It was used Figure 6 A structural diagram illustrating the electrophoresis apparatus of a fluid processing device.

[0027] Figure 9 This is a graph showing the results of verifying the effect of the fluid device in the embodiments of the present invention. Detailed Implementation

[0028] Hereinafter, embodiments for carrying out the present invention will be described in detail with appropriate reference to the accompanying drawings. The fluid device of this embodiment is used in an analytical apparatus. As an analytical apparatus, it can be used in all analytical apparatuses, except for the electrophoresis apparatus described in detail later. Furthermore, the fluid device of this embodiment can function as a reagent delivery unit, an optical unit, a microreactor, etc., in such an analytical apparatus.

[0029] <First Implementation Method>

[0030] (Fluid device)

[0031] Figure 1 This is a structural illustration of the fluid device 1A according to the first embodiment of the present invention.

[0032] like Figure 1 As shown, the fluid device 1A, also referred to as a polymer block, is a rectangular parallelepiped made of resin. In this embodiment, the fluid device 1A, as described below, is based on a resin substrate 11 (see reference 11). Figure 3The resin substrate 11 is formed by forming flow paths 23A on the substrate. The resin substrate 11 is equivalent to a "resin block".

[0033] The flow path 23A is tubular and has a circular cross-sectional shape. Furthermore, in this embodiment, the inner diameter of the flow path 23A is assumed to be 0.5 mm or more and 5 mm or less. However, the inner diameter of the flow path 23A is not limited to this and can be appropriately varied depending on the characteristics of the fluid flowing in the flow path 23A.

[0034] In addition, the aspect ratio (length / inner diameter) of the inner diameter of flow path 23A relative to its length is 10 or more.

[0035] Furthermore, the roughness of the inner wall surface of the entire region along the length of flow path 23A, measured by the arithmetic mean roughness (Ra) according to ISO 4287-1997, is 0.5 μm or less. Additionally, the standard deviation of the roughness of the inner wall surface of the entire region along the length of flow path 23A, measured by the root mean square height (Sq) according to ISO 25178, is 0.1 μm or less.

[0036] The technical significance of the surface roughness of the inner wall surface of the flow path 23A of the fluid device 1A in this embodiment, together with the effects of the fluid device 1A described later, will be explained in detail.

[0037] The resin constituting the fluid device 1A in this embodiment is assumed to be an acrylic resin. However, the resin constituting the fluid device 1A is not limited to this, and a rigid transparent resin can be used.

[0038] Examples of rigid transparent resins include, but are not limited to, polycarbonate, polyarylate, polysulfone, polyimide, polyetherimide, norbornene resin, etc.

[0039] (Manufacturing method)

[0040] Next, the fluid device 1A (refer to...) Figure 1 The manufacturing method of ) will be explained.

[0041] Figure 2 Symbols 201 to 204 in the text are Figure 1 A process diagram illustrating the manufacturing method of the fluid device 1A shown.

[0042] The manufacturing method of this embodiment includes the following steps: preparation Figure 2 The resin substrate 11 (resin block) shown in the figure with symbol 201; as Figure 2 As shown in the figure with symbol 202, a through hole 20A with a circular cross-sectional shape is formed in the resin substrate 11 (resin block); and as shown in the figure... Figure 2 As shown in the figure with symbol 203, the vapor of organic solvent is drawn from one end 21a of the through hole 20A and introduced from the other end 21b.

[0043] Therefore, in Figure 2 In the diagram of symbol 203, such as symbol V IN As indicated by the arrow, the vapor of the organic solvent flows at a predetermined flow rate within the through-hole 20A under reduced pressure (lower than atmospheric pressure), and as shown by the symbol V. OUT As indicated by the arrow, it exits from the resin substrate 11. At this time, the organic solvent vapor does not liquefy, and dissolves or softens the fine resin protrusions (not shown) constituting the rough surface of the through-hole 20A, making the protrusions uniform along the flow direction of the vapor. Thus, the rough surface of the through-hole 20A formed by the fine protrusions is smoothed, thereby completing... Figure 2 The figure shows a fluid device 1A with a flow path 23A, indicated by symbol 204.

[0044] As the resin substrate 11 (resin block) in this embodiment, it is envisioned to be a rectangular cuboid shape when viewed in plan view. However, it is not limited to this as long as the flow path 23A can be formed inside. Resin substrates with other three-dimensional shapes such as polygonal prisms, cylinders, disks, and spheres can also be used.

[0045] As a method for forming the through hole 20A in the resin substrate 11 (resin block) in this embodiment, a machining method is envisioned. Specifically, the following method is envisioned: using a tool such as a drill bit, a hole (through hole 20A) of a predetermined inner diameter is formed in a straight line through the resin substrate 11 (resin block).

[0046] The cross-sectional shape of the through hole 20A is determined by... Figure 1 The cross-sectional shape of the flow path 23A shown is near-net-shape, with an aspect ratio of 10 or more.

[0047] However, the method for forming the through hole 20A in the resin substrate 11 (resin block) is not limited to a mechanical processing method. As will be explained later, the resin substrate 11 (resin block) with the through hole 20A can also be formed by a 3D printer.

[0048] As for the through hole 20A (refer to) Figure 2 The method of introducing organic solvent vapor (symbol 203) can be exemplified by the following method: retaining the organic solvent vapor in the gas phase of a bath in which the organic solvent is stored at the bottom, and introducing the organic solvent vapor into the through hole 20A.

[0049] At this time, it is preferable to generate saturated vapor of organic solvent in the vapor phase of the bath at a temperature lower than the temperature inside the through hole 20A, i.e., the temperature of the resin substrate 11 (resin block).

[0050] Then, as Figure 2As shown in the figure with symbol 203, while a vacuum pump or the like is used to draw in the organic solvent from one end 21a of the through hole 20A, saturated vapor of the organic solvent is introduced from the other end 21b. This, combined with the fact that the internal pressure of the through hole 20A becomes lower than atmospheric pressure, more reliably prevents the liquefaction of the organic solvent vapor within the through hole 20A.

[0051] Furthermore, in this embodiment Figure 2 The temperature of the resin substrate 11 (resin block) in the process shown in the figure with symbol 203 is assumed to be room temperature (25°C), but it can also be set to be higher than room temperature (25°C). In this case, the temperature of the vapor phase of the organic solvent bath can also be set below the temperature of the resin substrate 11 (resin block) and above room temperature (25°C).

[0052] As the organic solvent in this embodiment, dichloromethane, which can dissolve or soften the acrylic resin constituting the resin substrate 11 (resin block), is envisioned, but it is not limited to this. Therefore, as the organic solvent, the vapor that can dissolve or soften the resin can be selected depending on the type of resin forming the resin block, and preferably an organic solvent that generates vapor at atmospheric pressure and at room temperature (25°C).

[0053] Examples of such organic solvents include, but are not limited to, halogenated hydrocarbons with a low number of carbon atoms, ketones with a low number of carbon atoms (e.g., acetone), and cyclic ethers (e.g., tetrahydrofuran).

[0054] Figure 3 The symbol 301 is a diagram. Figure 2 The symbol 204 is the sectional view of figure IIIa-IIIa. Figure 3 The symbol 302 is a diagram representing Figure 3 The cross-sectional view of a modified example of the flow path of the symbol 301.

[0055] According to this manufacturing method, through hole 20A (refer to...) Figure 2 The inner wall surface of the symbol 203 (Figure 203) is smoothed along its entire length. Figure 2 The resin substrate 11 (resin block) shown in the figure with symbol 204 has a flow path 23A with a circular cross-sectional shape and an aspect ratio of 10 or more formed inside.

[0056] Moreover, Figure 3 For the flow path 23A shown in the figure with symbol 301, the arithmetic mean of the roughness of its inner wall surface 23A1 is less than 0.5 μm and the standard deviation is less than 0.1 μm.

[0057] In addition, such as Figure 3 As shown in the figure with symbol 302, it is envisioned that a covering layer L composed of SiO2 film is formed on the inner wall surface 23A1 of the flow path 23A.

[0058] The SiO2 film covering such an inner wall surface 23A1 is formed by applying a dispersion of SiO2 particles and a silanol solution to the smoothed inner wall surface 23A1.

[0059] The SiO2 film using a dispersion of SiO2 particles is formed by evaporating the dispersion of SiO2 particles applied to the inner wall surface 23A1. The SiO2 film using a silanolate solution is formed by the hydrolysis reaction of the silanolate in the inner wall surface 23A1. Furthermore, examples of silanolates include tetramethoxysilane, tetraethoxysilane, tetraisopropoxysilane, and tetrapropoxysilane, but the SiO2 film is not limited to these.

[0060] (Effects)

[0061] Next, the effects of the fluid device 1A and its manufacturing method in this embodiment will be explained.

[0062] The fluid device 1A of this embodiment has a tubular flow path 23A with a length-to-diameter ratio (i.e., an aspect ratio of 10 or more) and a circular cross-sectional shape. The arithmetic mean roughness of the inner wall surface 23A1 of the flow path 23A is 0.5 μm or less, and the standard deviation is 0.1 μm or less.

[0063] With an aspect ratio of 10 or higher, the fluid device 1A can extend the residence time of reagents and samples in the flow path 23A. As a result, the fluid device 1A can ensure thorough mixing and reaction of reagents and samples within the flow path 23A. This effect is advantageous when the fluid device 1A functions as a liquid delivery unit or a microreactor in an analytical apparatus.

[0064] Furthermore, the cross-sectional shape of the flow path 23A in the fluid device 1A is circular, unlike existing fluid devices (for example, see Patent Document 1), where there are no corners in the flow path 23A. Therefore, the fluid device 1A can reduce the flow resistance when the fluid flows in the flow path 23A. In addition, since there are no corners in the flow path 23A in the fluid device 1A, it does not affect the flow of the fluid and suppresses the adhesion of air bubbles to the inner wall surface.

[0065] Furthermore, in the fluid apparatus 1A, the arithmetic mean roughness of the inner wall surface of the flow path 23A is 0.5 μm or less, and the standard deviation is 0.1 μm or less. This not only suppresses the adhesion of air bubbles to the inner wall surface of the flow path 23A, but also suppresses the adhesion of compounds contained in the reagent or biological substances contained in the sample. Therefore, according to this fluid apparatus 1A, the decrease in the reliability of analytical results caused by the gradual accumulation of compounds and biological substances on the inner wall surface of the flow path 23A can be prevented. In addition, according to the fluid apparatus 1A, the gradual accumulation of compounds and biological substances that could clog the flow path 23A can be prevented more reliably.

[0066] Furthermore, unlike the fluid apparatus 1A of this embodiment, even if the surface roughness of the inner wall of the flow path is locally large, compounds and biological substances can easily adhere to that part. The gradual accumulation of compounds and biological substances leads to a decrease in the reliability of analytical results and blockage of the flow path.

[0067] These effects are advantageous when enabling the fluid device 1A to function as a feed section of an analytical apparatus or a microreactor.

[0068] Furthermore, in the fluid device 1A, the arithmetic mean roughness of the inner wall surface of the flow path 23A is less than 0.5 μm, thereby reducing light scattering at the surface of the flow path 23A. As a result, the reaction efficiency of the photochemical reaction of the reagent and the sample within the flow path 23A of the fluid device 1A is improved.

[0069] In addition, in the fluid device 1A, the arithmetic mean roughness of the inner wall surface of the flow path 23A is less than 0.5 μm, thereby improving the photodetection sensitivity of the luminescence reaction in the flow path 23A.

[0070] These effects are advantageous in enabling the fluid device 1A to function as the optical unit of an analytical apparatus.

[0071] Furthermore, in such a fluid device 1A, it is preferable that the resin is an acrylic resin.

[0072] According to the fluid device 1A, the resin substrate 11 (resin block) that serves as the matrix exhibits excellent moldability, and the machining for forming through holes 20A in the resin substrate 11 becomes easier. Furthermore, according to the fluid device 1A, the range of organic solvents that can be introduced into the through holes 20A is broadened.

[0073] Furthermore, in such a fluid device 1A, it is preferable that the inner wall surface 23A1 of the flow path 23A is covered with a SiO2 film.

[0074] According to the fluid device 1A, the surface energy of the flow path 23A is increased, and the adhesion of bubbles can be suppressed more reliably.

[0075] Furthermore, in the manufacturing method of such a fluid device 1A, the fluid device 1A has a tubular flow path 23A with a length-to-diameter ratio (i.e., an aspect ratio of 10 or more) and a circular cross-sectional shape inside. The arithmetic mean roughness of the inner wall surface of the flow path 23A is 0.5 μm or less, and the standard deviation is 0.1 μm or less. The manufacturing method of the fluid device 1A includes the following steps: forming a through hole 20A with a circular cross-sectional shape in a substrate made of a resin substrate 11 (resin block); and introducing vapor of organic solvent from one end 21a side of the through hole 20A while drawing it in from the other end 21b side.

[0076] According to this manufacturing method, the vapor of organic solvent is introduced into the through hole 20A by drawing it from one end 21a side. Therefore, even for through holes 20A with a high aspect ratio of 10 or more, the vapor of organic solvent can be easily introduced.

[0077] Furthermore, according to this manufacturing method, organic solvent vapor is introduced into the through-hole 20A by suction from one end 21a side, thus introducing the organic solvent vapor into the through-hole 20A under reduced pressure (lower than atmospheric pressure). This suppresses the liquefaction of the organic solvent vapor within the through-hole 20A. The flow path 23A is smoothed without deformation throughout its entire length.

[0078] Furthermore, according to this manufacturing method, a fluid device 1A can be reliably and efficiently manufactured, which has a tubular flow path 23A with an aspect ratio of 10 or more and a circular cross-sectional shape, and the arithmetic mean roughness of the inner wall surface of the flow path 23A is 0.5 μm or less and the standard deviation is 0.1 μm or less.

[0079] Furthermore, in the manufacturing method of such a fluid device 1A, it is preferable to form the through hole 20A by machining the resin substrate 11 (resin block).

[0080] According to this manufacturing method, through holes 20A with a predetermined aspect ratio can be easily and accurately formed on the resin substrate 11 (resin block).

[0081] Furthermore, in the manufacturing method of such a fluid device 1A, it is preferable that the resin constituting the resin substrate 11 (resin block) is an acrylic resin and the aforementioned organic solvent is dichloromethane.

[0082] According to this manufacturing method, a flow path 23A is formed on the resin substrate 11 (resin block) with an arithmetic mean roughness of 0.5 μm or less and a standard deviation of 0.1 μm or less.

[0083] Furthermore, in the manufacturing method of such a fluid device 1A, it is preferable to have a step of forming a SiO2 film on the inner wall surface of the through hole 20A after the step of introducing the vapor of organic solvent into the through hole 20A.

[0084] According to this manufacturing method, a flow path 23A with high surface energy can be formed through a SiO2 film. This more reliably prevents bubbles from adhering to the flow path 23A of the fluid device 1A.

[0085] <Second Implementation Method>

[0086] (Fluid device)

[0087] Next, the fluid device according to the second embodiment of the present invention will be described.

[0088] Furthermore, in this embodiment, the fluid device 1A of the first embodiment described above (refer to...) Figure 1 The same constituent elements are marked with the same symbols and their detailed descriptions are omitted.

[0089] Figure 4 This is a structural illustration of the fluid device 1B according to the second embodiment of the present invention.

[0090] like Figure 4 As shown, in the fluid device 1B, the flow path 23B formed inside the resin substrate 11 (resin block) made of acrylic resin is formed in a flexural manner. However, the resin substrate 11 is not limited to acrylic resin, and the above-mentioned rigid transparent resin can be used.

[0091] The flow path 23B is composed of a first flow path portion 23B1 extending in a straight line and a second flow path portion 23B2 extending in a straight line. These first flow path portions 23B1 and second flow path portions 23B2 are connected inside the resin substrate 11 (resin block) at an angle to each other. Thus, the first flow path portion 23B1 and the second flow path portion 23B2 of the flow path 23B become integrated, forming a hole penetrating the resin substrate 11 (resin block).

[0092] Furthermore, the angle between the first flow path portion 23B1 and the second flow path portion 23B2 can be set in the range of more than 0 degrees and less than 180 degrees, but in this embodiment, the angle between the first flow path portion 23B1 and the second flow path portion 23B2 is set to 120 degrees.

[0093] The cross-sectional shape of such flow path 23B is circular. Furthermore, in this embodiment, the inner diameter of flow path 23B is assumed to be 0.5 mm or more and 5 mm or less. However, the inner diameter of flow path 23B is not limited to this and can be appropriately changed according to the properties of the fluid flowing in flow path 23B.

[0094] In addition, the aspect ratio (length / inner diameter) of the inner diameter of flow path 23B relative to its length is 10 or more.

[0095] Furthermore, the roughness of the inner wall surface of the entire region along the length of flow path 23B, measured according to the arithmetic mean roughness (Ra) of ISO 4287-1997, is 0.5 μm or less. Additionally, the standard deviation of the roughness of the inner wall surface of the entire region along the length of flow path 23B, measured according to the root mean square height (Sq) of ISO 25178, is 0.1 μm or less.

[0096] Additionally, it is envisioned that a covering layer L composed of a SiO2 film be provided on the inner wall surface of flow path 23B (refer to...) Figure 3 (Figure of symbol 302).

[0097] (Manufacturing method)

[0098] Next, the fluid device 1B (refer to...) Figure 4 The manufacturing method of ) will be explained.

[0099] Figure 5 Symbols 501 to 504 are Figure 4 A process diagram illustrating the manufacturing method of the fluid device 1B shown.

[0100] The manufacturing method of this embodiment includes the following steps: preparation Figure 5 The resin substrate 11 (resin block) shown in the figure with symbol 501; as Figure 5 As shown in the figure with symbol 502, a through hole 20B with a circular cross-sectional shape is formed in the resin substrate 11 (resin block); and as shown in the figure... Figure 5 As shown in the figure with symbol 503, the vapor of organic solvent is drawn from one end 21c side of the through hole 20B and introduced from the other end 21d side.

[0101] exist Figure 5 In the process of forming the through hole 20B as shown in the figure with symbol 502, the through hole 20B is formed by drilling from both ends 21c and 21d of the through hole 20B using a drill bit or other processes.

[0102] In addition, in the process of introducing organic solvent vapor into the through hole 20B, such as Figure 5 The symbol V in the diagram of symbol 503 IN As indicated by the arrow, the vapor of the organic solvent flows at a predetermined flow rate within the through-hole 20B under reduced pressure (lower than atmospheric pressure), and as shown by the symbol V. OUT As indicated by the arrow, the vapor exits from the resin substrate 11. At this time, the organic solvent vapor does not liquefy, but dissolves or softens the fine resin protrusions (not shown) constituting the rough surface of the through-hole 20B, and makes the protrusions uniform along the flow direction of the vapor. Thus, the rough surface of the through-hole 20B formed by the fine protrusions is smoothed, thereby completing the process. Figure 5 The figure shown by symbol 504 is a fluid device 1B with flow path 23B.

[0103] (Effects)

[0104] Next, the effects of the fluid device 1B and its manufacturing method in this embodiment will be explained.

[0105] The fluid device 1B of this embodiment has a tubular flow path 23B with a length-to-diameter ratio (i.e., an aspect ratio of 10 or more) and a circular cross-sectional shape. The arithmetic mean roughness of the inner wall surface of the flow path 23B is 0.5 μm or less, and the standard deviation is 0.1 μm or less, thereby achieving the same effect as the fluid device 1A of the first embodiment described above.

[0106] In addition, the flow path 23B of the fluid device 1B in this embodiment is buckled.

[0107] According to the fluid device 1B and its manufacturing method, by changing the angle between the first flow path portion 23B1 and the second flow path portion 23B2, the positions of the fluid outlet and inlet of the flow path 23B of the fluid device 1B can be changed.

[0108] According to the fluid device 1B and its manufacturing method, a fluid device with increased freedom of configuration within an analytical apparatus can be obtained.

[0109] <Third Implementation Method>

[0110] (Fluid device)

[0111] Next, the fluid device according to the third embodiment of the present invention will be described.

[0112] Furthermore, in this embodiment, the fluid device 1A of the first embodiment described above (refer to...) Figure 1 The same constituent elements are marked with the same symbols and their detailed descriptions are omitted.

[0113] Figure 6 This is a structural illustration of the fluid device 1C according to the third embodiment of the present invention.

[0114] like Figure 6 As shown, the fluid device 1C has a flow path 23C formed inside a resin substrate 11 (resin block) made of acrylic resin. However, the resin substrate 11 is not limited to acrylic resin, and the above-described rigid transparent resin can be used.

[0115] In this embodiment, the resin substrate 11 (resin block) is formed as a cuboid.

[0116] Flow path 23C consists of multiple flow paths, including flow path 23C1, flow path 23C2, flow path 23C3 and flow path 23C4.

[0117] Furthermore, the fluid device 1C has recesses 24 and 25 that open onto the surface of the resin substrate 11 (resin block). These two recesses 24 and 25 are formed by cylindrical spaces with bottoms. Moreover, the open sides of recesses 24 and 25 are in a mutually orthogonal positional relationship.

[0118] The flow path 23C1 extends in a straight line from one side of the resin substrate 11 toward the interior of the resin substrate 11.

[0119] The flow path 23C2 takes the end of the flow path 23C1 formed inside the resin substrate 11 as its base end and extends in an L-shape with the flow path 23C1. The front end of the flow path 23C2 is connected to the bottom surface of the recess 25.

[0120] The flow path 23C3 extends in a straight line from one end connected to the bottom surface of the recess 24 toward the interior of the resin substrate 11. The other end of the flow path 23C3 is connected to the inner peripheral surface of the recess 24.

[0121] The flow path 23C4 extends in a straight line from one side of the resin substrate 11 toward the interior of the resin substrate 11 in a manner parallel to the flow path 23C1, and is connected to the inner peripheral surface of the recess 24.

[0122] That is, in the fluid device 1C, among the multiple flow paths constituting flow path 23C, including flow path 23C1, flow path 23C2, flow path 23C3 and flow path 23C4, flow path 23C2 and flow path 23C3 are connected via recess 25, and flow path 23C3 and flow path 23C4 are connected via recess 24.

[0123] The cross-sectional shape of such flow path 23C is circular. Furthermore, in this embodiment, the inner diameter of flow path 23B is assumed to be 0.5 mm or more and 5 mm or less. However, the inner diameter of flow path 23C is not limited to this and can be appropriately changed according to the properties of the fluid flowing in flow path 23C.

[0124] In addition, the aspect ratio (length / inner diameter) of the inner diameter of flow path 23C relative to its length is 10 or more.

[0125] Furthermore, the roughness of the inner wall surface of the entire region along the length of flow path 23C, measured according to the arithmetic mean roughness (Ra) of ISO 4287-1997, is 0.5 μm or less. Additionally, the standard deviation of the roughness of the inner wall surface of the entire region along the length of flow path 23C, measured according to the root mean square height (Sq) of ISO 25178, is 0.1 μm or less.

[0126] In addition, the arithmetic mean roughness (Ra) of the inner wall surfaces of the recesses 24 and 25 is less than 0.5 μm, and their root mean square height (Sq) is less than 0.1 μm.

[0127] Furthermore, it is envisioned that a covering layer L composed of a SiO2 film be provided on the inner wall surface of the flow path 23C and the inner wall surfaces of the recesses 24 and 25 (see reference). Figure 3 (Figure of symbol 302).

[0128] (Manufacturing method)

[0129] Next, the fluid device 1C (refer to...) Figure 6 The manufacturing method of ) will be explained.

[0130] Figure 7 Symbols 701 to 704 are Figure 6 A process diagram illustrating the manufacturing method of the fluid device 1C shown.

[0131] The manufacturing method of this embodiment includes the following steps: preparation Figure 7 The resin substrate 11 (resin block) shown in the figure with symbol 701; as Figure 7 As shown in the figure with symbol 702, a through hole 20C with a circular cross-sectional shape is formed in the resin substrate 11 (resin block); and as shown in the figure... Figure 7 As shown in the figure with symbol 703, the vapor of organic solvent is introduced into the through hole 20C while being drawn from one end 21e, 21f, 21g of the through hole 20C.

[0132] In this manufacturing method, recesses 24 and 25 are formed on the resin substrate 11 using a drill bit or the like. Then, through holes 20C with a circular cross-sectional shape are formed by machining.

[0133] exist Figure 7 In the process of forming the through hole 20C shown in the figure with symbol 702, the through hole 20C1 is formed by drilling from one end 21h side using a drill bit or other tool. The through hole 20C2 is formed by drilling from one end 21e side using a drill bit or other tool. The through hole 20C3 is formed by drilling from one end 21f side using a drill bit or other tool. The through hole 20C4 is formed by drilling from one end 21g side using a drill bit or other tool.

[0134] In addition, in the process of introducing organic solvent vapor into the through-hole 20C, such as Figure 7 As shown in the figure with symbol 703, through holes 20C1, 20C2, and 20C3 are attracted via a recess 25 where one end 21e of through hole 20C1 and one end 21f of through hole 20C3 are connected. Through hole 20C4 is attracted via one end 21g. Thus, as... Figure 7 The symbol V in the diagram of symbol 703 IN As shown, the vapor of the organic solvent is introduced from one end 21h of the recess 24 and the through hole 20C1 under reduced pressure (below atmospheric pressure), and as indicated by the symbol V OUT As shown, it is discharged from one end 21g of the recess 25 and the through hole 20C4.

[0135] At this point, the vapor of the organic solvent will not liquefy, but will instead form the through-hole 20C (refer to...). Figure 7The rough surface of the figure (symbol 702) with fine resin protrusions (illustration omitted) is dissolved or softened, and the protrusions are made uniform along the direction of vapor flow. Thus, the through-holes 20C formed by the fine protrusions (see figure 702) are formed. Figure 7 The rough surface of the symbol 702 (Figure 702) is smoothed, thus completing the process. Figure 7 The figure of symbol 704 shows a fluid device 1C with flow path 23C (see reference). Figure 6 ).

[0136] (Electrophoresis apparatus)

[0137] Next, the fluid device 1C using this embodiment (refer to...) Figure 6 The electrophoresis apparatus will be described.

[0138] Figure 8 This is a structural diagram of a capillary electrophoresis apparatus Ap (hereinafter referred to as "electrophoresis apparatus Ap"), which is used as an example of an analytical device. This electrophoresis apparatus Ap is used in DNA sequencers, DNA fragment analysis devices, etc.

[0139] like Figure 8 As shown, the electrophoresis apparatus Ap mainly consists of a fluid device 1C, a capillary tube 26, a reagent bottle 31, a container 32, a container 33, a high-voltage power supply 50, and a laser light source 60.

[0140] The capillary 26 has a sample injection end 26a and a capillary body 26b having the sample injection end 26a at one end. The other end of the capillary body 26b is immersed in a reagent, described later, filling the container 32. The sample injection end 26a is mounted in the recess 25 of the fluid device 1C. Furthermore, a cathode 52 is disposed within the container 32.

[0141] The reagent bottle 31 is installed at one end 21g of the flow path 23C4 of the fluid device 1C via valve 41. In this embodiment, the reagent bottle 31 is envisioned as a reagent bottle for storing a buffer gel as a reagent.

[0142] Container 33 is installed at one end 21h of flow path 23C1 via valve 43.

[0143] As will be described later, the container 33 is filled with the reagent from the reagent bottle 31.

[0144] An anode 53 is disposed inside such a container 33.

[0145] The high-voltage power supply 50 applies a voltage between the cathode 52 and the anode 53.

[0146] The laser source 60 irradiates a laser beam 61 at a predetermined position 62 of the capillary body 26b.

[0147] Next, mainly refer to Figure 8The operation of the electrophoresis apparatus Ap is explained.

[0148] The fluid device 1C of the electrophoresis apparatus Ap functions as a liquid delivery device for the reagent stored in the reagent bottle 31.

[0149] A motor-driven plunger pump (not shown) is installed at the opening of the recess 24 of the fluid device 1C.

[0150] In the electrophoresis apparatus Ap, after the sample injection end 26a is set to the closed state, the valve 43 is set to the closed state, and the valve 41 is set to the open state, when the plunger pump is driven in a suction manner, the reagent bottle 31 fills the recess 24 with reagent.

[0151] Next, after closing valve 41 and opening sample injection end 26a, the reagent in recess 24 is transferred to container 32 via capillary 26 when the plunger pump is driven in an ejecting manner. By repeating this operation as needed, the reagent fills container 32 to the extent that the tip of capillary 26 is immersed. The cathode 52 is immersed in the reagent. Furthermore, the hollow portion of capillary 26 is entirely filled with reagent.

[0152] Next, in the electrophoresis apparatus Ap, after the sample injection end 26a is set to the closed state, the valve 43 is set to the closed state, and the valve 41 is set to the open state, when the plunger pump is driven in a suction manner, the reagent bottle 31 fills the recess 24 with reagent.

[0153] Next, after valve 41 is set to the closed state and valve 43 is set to the open state, when the plunger pump is driven in an ejecting manner, the reagent in recess 24 is transferred to container 33 via flow path 23C3, flow path 23C2, and flow path 23C1 and via capillary tube 26. By repeating this action as needed, at least container 33, flow paths 23C1, 23C2, and recess 25 are filled with reagent.

[0154] Then, valve 43 and sample injection end 26a are opened, thereby forming an electrophoresis path through the reagent between cathode 52 and anode 53.

[0155] In analytical methods using this electrophoresis apparatus Ap, for example, a sample containing multiple components (DNA fragments, etc.) labeled with multiple fluorescent agents is injected into the sample injection end 26a.

[0156] Then, when a voltage is applied between the negative electrode 52 and the positive electrode 53, the negatively charged components (such as DNA fragments) contained in the sample are electrophoresed from the sample injection end 26a to the container 32 side in the capillary body 26b.

[0157] Due to differences in migration rates caused by electrophoresis, the various components contained in the sample gradually separate. A laser beam 61 emitted from a laser source 60 is irradiated onto a position 62 on the capillary body 26b that has been electrophoresed at a certain distance. The laser beam 61 causes various phosphors identified by the components that sequentially pass through position 62 to emit fluorescence. The fluorescence that changes over time as electrophoresis proceeds is measured by a multicolor detection device (illustrated but not shown) that performs optical detection in multiple wavelengths.

[0158] (Effects)

[0159] Next, the fluid device 1C of this embodiment, its manufacturing method, and the effects of the electrophoresis apparatus using the fluid device 1C will be explained.

[0160] The fluid device 1C of this embodiment is a resin-based fluid device mounted on an analytical apparatus. It has multiple tubular flow paths 23C1, 23C2, 23C3, and 23C4 with a length-to-diameter ratio (i.e., an aspect ratio) of 10 or more and a circular cross-sectional shape. The arithmetic mean roughness of the inner wall surfaces of the flow paths 23C1, 23C2, 23C3, and 23C4 is 0.5 μm or less, and the standard deviation is 0.1 μm or less.

[0161] The fluid device 1C has a tubular flow path 23C with a length-to-diameter ratio (i.e., an aspect ratio of 10 or more) and a circular cross-sectional shape. The arithmetic mean roughness of the inner wall surface of the flow path 23C is 0.5 μm or less, and the standard deviation is 0.1 μm or less, thereby achieving the same effect as the fluid device 1A of the first embodiment described above.

[0162] In addition, the fluid device 1C has multiple flow paths 23C1, 23C2, 23C3, and 23C4 inside, thereby enabling the diversification of the flow path of the fluid within the fluid device 1C.

[0163] Furthermore, in such a fluid device 1C, it is preferable that the resin is an acrylic resin.

[0164] According to this fluid device 1C, the resin substrate 11 (resin block) that serves as the matrix exhibits excellent moldability, and the machining for forming through holes 20C in the resin substrate 11 becomes easier. Furthermore, according to this fluid device 1C, the range of selectable organic solvents introduced into the through holes 20C is broadened.

[0165] Furthermore, in such a fluid device 1C, it is envisioned that the inner wall surface of the flow path 23C is covered with a SiO2 film.

[0166] According to the fluid device 1C, the surface energy of the inner wall of the flow path 23C can be increased, and the adhesion of bubbles can be suppressed more reliably.

[0167] Furthermore, in such a fluid device 1C, it is envisioned that the inner wall surfaces of the recesses 24 and 25 are covered with a SiO2 film.

[0168] According to the fluid device 1C, the surface energy of the inner wall surfaces of the recesses 24 and 25 can be increased, and the adhesion of bubbles can be suppressed more reliably.

[0169] Furthermore, in such a fluid device 1C, the flow path 23C is formed by a hole penetrating the resin substrate 11 (resin block), and the resin substrate 11 (resin block) has recesses 24 and 25 opening on the surface of the resin substrate 11 (resin block). At least two of the aforementioned flow paths 23C, namely flow path 23C2 and flow path 23C3, are connected via the recesses 25. In addition, flow path 23C3 and flow path 23C4 are connected via the recesses 24.

[0170] According to this fluid device 1C, a longer flow path length can be ensured within the resin substrate 11 (resin block). This extends the residence time of the fluid within the resin substrate 11 (resin block).

[0171] Furthermore, in such a fluid device 1C, a plurality of recesses (recesses 24, 25) are formed on the resin substrate 11 (resin block).

[0172] According to the fluid device 1C, various components and devices such as pumps and capillaries can be easily installed via the recesses 24 and 25.

[0173] In addition, the manufacturing method of such a fluid device 1C includes the following steps: preparing a resin substrate 11 (resin block); forming a through hole 20C with a circular cross-sectional shape on the resin substrate 11 (resin block); and introducing vapor of organic solvent into the through hole 20C while drawing it from one end 21e, 21f, 21g of the through hole 20C.

[0174] In addition, in this manufacturing method, through holes 20C are formed by machining the resin substrate 11 (resin block).

[0175] In this manufacturing method, recesses 24 and 25 are formed on the resin substrate 11 using a drill bit or the like. Then, through holes 20C with a circular cross-sectional shape are formed by machining.

[0176] Furthermore, drill marks are formed on the inner wall surfaces of the through hole 20C and the recesses 24 and 25. If fluid is allowed to flow through the through hole 20C under these conditions, air bubbles are likely to adhere to the inner wall surfaces.

[0177] Therefore, in the manufacturing method of this embodiment, organic solvent vapor is introduced into the through-hole 20C while being drawn from one end 21e, 21f, 21g. Additionally, drawing from one end 21e, 21f is performed via the recess 25. Organic solvent vapor is introduced into the through-holes 20C3, 20C4 via the recess 24.

[0178] As a result, the inner wall surfaces of the flow path 23C and the recesses 24 and 25 dissolve and become smooth. According to this manufacturing method, it is possible to manufacture a fluid device 1C having a flow path 23C with a small surface roughness.

[0179] Furthermore, in such a manufacturing method, it is preferable that the resin constituting the resin block is an acrylic resin, and the aforementioned organic solvent is dichloromethane.

[0180] According to this manufacturing method, a flow path 23C is formed on the resin substrate 11 (resin block) with an arithmetic mean roughness of less than 0.5 μm and a standard deviation of less than 0.1 μm.

[0181] Furthermore, in such a manufacturing method, it is preferable that after forming the flow path 23C by introducing organic solvent vapor into the through hole 20C, a step of forming a SiO2 film on the inner wall surface of the flow path 23C is also performed.

[0182] According to this manufacturing method, a flow path 23C with a high surface energy can be formed through a SiO2 film. This more reliably prevents bubbles from adhering to the flow path 23C of the fluid device 1C.

[0183] In addition, the electrophoresis apparatus Ap of this embodiment includes a fluid device 1C, and the flow paths 23C1 and 23C2 of the fluid device 1C constitute part of the flow path of the electrophoresis apparatus.

[0184] After using Figure 7 In the electrophoresis apparatus Ap of the machined resin substrate 11 (resin block) shown in the figure with symbol 702, air bubbles mixed in during reagent attraction adhere to the inner wall surface of the through-hole 20C, which forms the flow path. As a result, electrophoresis through the through-hole 20C is hindered. In addition, if the attached air bubbles are large and the through-hole 20C is blocked, the cathode 52 and anode 53 may be damaged.

[0185] In contrast, the fluid device 1C used in the electrophoresis apparatus Ap of this embodiment does not adhere to the inner wall of the flow path 23C. Even large air bubbles entering the flow path 23C are pushed out to the containers 32 and 33.

[0186] Furthermore, the electrophoresis apparatus Ap, which uses a fluid device 1C with a SiO2 film on the inner wall surface of the flow path 23C, recesses 24, and 25, can increase the surface energy of their inner wall surfaces and more effectively suppress bubble adhesion. Therefore, the electrophoresis apparatus Ap can perform better electrophoresis.

[0187] Example

[0188] Next, the results of verifying the effects of the fluid device according to the embodiments of the present invention will be explained.

[0189] (Example 1)

[0190] In Example 1, acrylic resin was used for manufacturing. Figure 4 The fluid device 1B shown.

[0191] First, on the prepared resin substrate 11 (refer to...) Figure 5 The symbol 501 (see figure) is used to form a buckled through hole 20B by machining with a drill bit (see figure 501). Figure 5 (See the diagram with symbol 502). The length of the through hole 20B is 50mm, and the inner diameter is 0.8mm. The aspect ratio (length / inner diameter) of the through hole 20B is 62.5.

[0192] Next, as Figure 5 As shown in the figure with symbol 503, dichloromethane vapor is drawn in from one end 21c of the through hole 20B while being introduced from the other end 21d. This results in a flow path 23B with a smoothed inner wall surface (see figure 503). Figure 5 Fluid apparatus 1B (see figure 504) Figure 5 (The symbol 504 is shown in the image).

[0193] Then, the roughness of the inner wall surface at the length of the flow path 23B from the end that becomes the steam inlet and at the position corresponding to that length was determined using the arithmetic mean roughness (Ra) according to ISO 4287-1997. The results are shown in... Figure 9 The chart.

[0194] Figure 9 The horizontal axis sets the position of one end of flow path 23B, i.e. the inlet of dichloromethane vapor, to 0mm, and the position of the other end of flow path 23B to 50mm. Figure 9 The vertical axis represents the measured surface roughness [μm] of the inner wall surface (arithmetic mean roughness (Ra)).

[0195] exist Figure 9In the diagram, the surface roughness [μm] of Example 1, indicated by the circular mark, is concentrated at approximately 0.1 μm or less throughout the entire length of flow path 23B. Although a maximum value of surface roughness [μm] (0.4 μm]) is shown within a portion of the inlet end that becomes part of the dichloromethane vapor inlet with a length of 5 mm or less, the surface roughness [μm] is 0.5 μm or less. Furthermore, the standard deviation of the roughness of the inner wall surface of the entire length of flow path 23B, expressed as root mean square height (Sq) according to ISO 25178, is 0.1 μm or less.

[0196] (Comparative Example 1)

[0197] In Comparative Example 1, for Figure 5 The resin substrate 11 with through holes 20B, as shown in the figure with symbol 502, is exposed to dichloromethane vapor in a bath without being drawn from one end 21 of the through holes 20B, thereby obtaining a fluid device.

[0198] For this fluid device, the surface roughness [μm] of the inner wall surface of the flow path was measured in the same manner as in Example 1. The results were used... Figure 9 The square markers on the chart represent the graph.

[0199] like Figure 9 As shown, the surface roughness [μm] of the flow path of the fluid apparatus in Comparative Example 1 is 0.5 μm or more over the entire length direction. That is, the inner wall surface of the flow path was not smoothed. In addition, the root mean square height (Sq) according to ISO 25178 also exceeds 0.1 μm.

[0200] (Comparative Example 2)

[0201] In Comparative Example 2, for Figure 5 The resin substrate 11 with through holes 20B, as shown in the figure with symbol 502, is reamed to grind the inner wall surface of the through holes 20B. In this comparative example 2, the fluid device is fabricated by reaming only the through holes 20B without exposing the resin substrate 11 to dichloromethane vapor.

[0202] For this fluid device, the surface roughness [μm] of the inner wall surface of the flow path was measured in the same manner as in Example 1. The results were used... Figure 9 The triangle markers on the chart represent...

[0203] like Figure 9 As shown, the surface roughness [μm] of the flow path of the fluid device in Comparative Example 2 also has sections with a surface roughness of 0.5 μm or less, but the surface roughness [μm] deviation is relatively large, with a standard deviation of 0.2 μm or more. In particular, starting from a length of 8 mm with an aspect ratio exceeding 10, the deviations in surface roughness and standard deviation become larger.

[0204] (Evaluation Results)

[0205] The fluid device of Comparative Example 1 was manufactured by simply exposing the resin substrate 11 to dichloromethane vapor, thus confirming that the inner wall surface of the through hole 20B could not be smoothed.

[0206] In addition, the fluid device of Comparative Example 1 formed the flow path only by mechanical grinding of the through hole 20B, thus confirming that the surface roughness [μm] deviation was large.

[0207] In contrast, the fluid device 1B of Embodiment 1 of the present invention (see reference) Figure 5 The figure (symbol 504) verifies that by drawing in organic solvent vapor from one end of the through hole while introducing it from the other end, the arithmetic mean roughness of the inner wall surface of the flow path 23B is less than 0.5 μm and the standard deviation is less than 0.1 μm.

[0208] The embodiments of the present invention have been described above, but the present invention is not limited to the above embodiments, and various modifications can be made without departing from the spirit of the present invention.

[0209] In the first to third embodiments described above, fluid devices 1A, 1B, and 1C with through holes 20A, 20B, and 20C formed on a resin substrate 11 (resin block) by mechanical processing are described. However, fluid devices 1A, 1B, and 1C with through holes 20A, 20B, and 20C can be manufactured by a 3D printer.

[0210] Furthermore, the electrophoresis apparatus Ap of this embodiment describes the case where the flow path 23C of the fluid device 1C of the third embodiment is used as part of the flow path for electrophoresis, but the flow paths 23A and 23B of the fluid devices 1A and 1B can also be used as part of the flow path for electrophoresis.

[0211] Symbol Explanation

[0212] 1A, 1B, 1C—fluid device; 20A, 20B, 20C—through hole; 23A, 23B, 23C—flow path; 11—resin substrate (resin block); 24, 25—recess; Ap—electrophoresis device.

Claims

1. A fluid device, which is a resin-made fluid device mounted on an analytical apparatus, characterized in that, It has a tubular flow path with an internal length-to-diameter ratio (i.e., an aspect ratio of 10 or higher) and a circular cross-sectional shape. The arithmetic mean of the roughness of the inner wall surface of the flow path is less than 0.5 μm, and the standard deviation is less than 0.1 μm.

2. The fluid device according to claim 1, characterized in that, The resin is an acrylic resin.

3. The fluid device according to claim 1, characterized in that, The inner wall of the flow path is covered with a SiO2 film.

4. A fluid device, which is a resin-made fluid device mounted on an analytical apparatus, characterized in that, It has multiple tubular flow paths inside, with a length-to-diameter ratio (i.e., an aspect ratio of 10 or higher) and a circular cross-sectional shape. The arithmetic mean of the roughness of the inner wall surface of the flow path is less than 0.5 μm, and the standard deviation is less than 0.1 μm.

5. The fluid device according to claim 4, characterized in that, The resin is an acrylic resin.

6. The fluid device according to claim 4, characterized in that, The inner wall of the flow path is covered with a SiO2 film.

7. The fluid device according to claim 4, characterized in that, The flow path is formed by holes penetrating the resin block. The resin block has a recess with an opening on its surface. At least two of the plurality of flow paths are connected via the recess.

8. The fluid device according to claim 7, characterized in that, The resin block has a plurality of recesses formed thereon.

9. An electrophoresis apparatus, characterized in that, Equipped with the fluid device as described in claim 1 or 4, The flow path of the fluid device constitutes part of the flow path for electrophoresis.

10. The electrophoresis apparatus according to claim 9, characterized in that, The resin is an acrylic resin.

11. The electrophoresis apparatus according to claim 9, characterized in that, The inner wall of the flow path is covered with a SiO2 film.

12. The electrophoresis apparatus according to claim 7, characterized in that, The inner wall of the recess is covered with a SiO2 film.

13. A method for manufacturing a fluid device, the fluid device having an internal tubular flow path with an aspect ratio of 10 or more and a circular cross-sectional shape, wherein the arithmetic mean roughness of the inner wall surface of the flow path is 0.5 μm or less, and the standard deviation is 0.1 μm or less. The manufacturing method of this fluid device is characterized by having the following steps: A through hole with a circular cross-sectional shape is formed in the resin block; and While drawing in organic solvent vapor from one end of the through hole, it is introduced from the other end.

14. The method for manufacturing a fluid device according to claim 13, characterized in that, The through hole is formed by machining the resin block.

15. The method for manufacturing a fluid device according to claim 13, characterized in that, The resin constituting the resin block is acrylic resin, and the organic solvent is dichloromethane.

16. The method for manufacturing a fluid device according to claim 13, characterized in that, After the step of introducing organic solvent vapor into the through hole, there is also a step of forming a SiO2 film on the inner wall surface of the through hole.

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