Mobile phone camera cover plate and coating method thereof

Abstract

The invention discloses a mobile phone camera cover plate which comprises a glass substrate and a coating layer, and the coating layer is arranged on one surface of the glass substrate. The coating layer comprises an anti-reflection layer, an anti-static layer and a wear-resistant protective layer. Compared with the prior art, the mobile phone camera cover plate and the coating method thereof have the advantages that the mobile phone camera cover plate is convenient to use, high in wear resistance and reliable in process.

Description

Technical Field

[0001] This invention relates to the field of optical functional thin film technology, specifically to a mobile phone camera cover plate and its coating method. Background Technology

[0002] As smartphone camera capabilities continue to improve, users' demands for image quality are increasing. The camera cover, as the last optical interface before light enters the lens, directly affects image clarity, color reproduction, and interference resistance.

[0003] Traditional camera cover plates mostly use single or double anti-reflective films, which can reduce reflectivity to a certain extent, but still have defects such as limited anti-reflection effect, easy electrostatic adsorption, and insufficient surface hardness.

[0004] Therefore, there is an urgent need to develop a camera cover structure that combines excellent optical performance with multiple functions to meet the dual requirements of camera appearance and performance. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to overcome the above-mentioned technical defects and provide a mobile phone camera cover plate and its coating method that is easy to use, highly wear-resistant and reliable in process.

[0006] To solve the above-mentioned technical problems, the technical solution provided by the present invention is: a mobile phone camera cover plate, comprising a glass substrate and a coating layer, wherein the coating layer is disposed on one surface of the glass substrate;

[0007] The coating layer includes an anti-reflective layer, an antistatic layer, and a wear-resistant protective layer.

[0008] Preferably, the antireflective layer is a multilayer dielectric film structure formed by alternating deposition of silicon dioxide and titanium pentoxide, with a total number of 3 to 6 layers.

[0009] Preferably, the innermost and outermost layers of the antireflective layer are both silicon dioxide layers;

[0010] The physical thickness of a single silicon dioxide layer is 20-50 nm;

[0011] The physical thickness of a single titanium pentoxide layer is 10-30 nm.

[0012] Preferably, the antistatic layer is an indium tin oxide layer, a zinc aluminum oxide layer, or an antimony-doped tin dioxide layer;

[0013] Thickness 10-50nm.

[0014] Preferably, the wear-resistant protective layer is any one of a silicon dioxide film or a diamond-like carbon film;

[0015] The thickness is 5-20nm.

[0016] Preferably, the cover plate substrate is made of chemically strengthened glass, sapphire, or transparent microcrystalline glass.

[0017] Another aspect of the present invention discloses a coating method for a mobile phone camera cover, comprising the following steps:

[0018] S1: Ion source cleaning of the glass substrate;

[0019] S2: Place the cleaned cover plate substrate into the vacuum chamber of the magnetron sputtering coating equipment and evacuate it;

[0020] S3: Process gas is introduced to sequentially deposit an anti-reflective layer, an antistatic layer, and a wear-resistant protective layer on the surface of the cover plate substrate to be coated.

[0021] S4: After the coating is completed, allow it to cool naturally to room temperature under an inert atmosphere, and then remove the finished cover plate.

[0022] Preferably, in S3, when depositing the antireflection layer, an alternating sputtering silicon dioxide target and a titanium pentoxide target are used, wherein the deposition thickness of a single silicon dioxide layer is 20–50 nm, the deposition thickness of a single titanium pentoxide layer is 10–30 nm, the total number of layers is 3–6, and the first and last layers are both silicon dioxide layers.

[0023] Preferably, the ion source cleaning in S1 uses an argon ion beam with an ion energy of 300–800 eV and a cleaning time of 60–180 seconds.

[0024] The advantages of this invention compared with the prior art are as follows: This invention constructs a composite functional film system of anti-reflection layer, antistatic layer and wear-resistant protective layer on the surface of glass substrate, and combines it with an optimized magnetron sputtering continuous coating process, thereby achieving a synergistic improvement in optical performance, surface function and structural reliability, and solving the bottleneck problems of single function, performance trade-off or complex process in the prior art. Attached Figure Description

[0025] Figure 1 This is a schematic flowchart of the coating method of the present invention. Detailed Implementation

[0027] The present invention will now be described in further detail with reference to the accompanying drawings.

[0028] Combined with appendix Figure 1 As shown, a mobile phone camera cover includes a glass substrate and a coating layer, wherein the coating layer is disposed on one surface of the glass substrate; the coating layer includes an anti-reflective layer, an antistatic layer and a wear-resistant protective layer.

[0029] When in use, the anti-reflective layer is a multilayer dielectric film structure formed by alternating deposition of silicon dioxide and titanium pentoxide, with a total of 3 to 6 layers, and the innermost and outermost layers of the anti-reflective layer are both silicon dioxide layers;

[0030] The physical thickness of a single silicon dioxide layer is 20-50 nm;

[0031] The physical thickness of a single titanium pentoxide layer is 10-30 nm.

[0032] In one embodiment:

[0033] The antistatic layer is an indium tin oxide layer, a zinc aluminum oxide layer, or an antimony-doped tin dioxide layer, with a thickness of 10–50 nm;

[0034] The wear-resistant protective layer is either a silicon dioxide film or a diamond-like carbon film, with a thickness of 5-20 nm.

[0035] In one embodiment:

[0036] The cover plate substrate is made of chemically strengthened glass, sapphire, or transparent microcrystalline glass.

[0037] In specific implementation of the present invention,

[0038] Includes the following steps:

[0039] S1: Ion source cleaning of the glass substrate;

[0040] S2: Place the cleaned cover plate substrate into the vacuum chamber of the magnetron sputtering coating equipment and evacuate it;

[0041] S3: Process gas is introduced to sequentially deposit an anti-reflective layer, an antistatic layer, and a wear-resistant protective layer on the surface of the cover plate substrate to be coated.

[0042] S4: After the coating is completed, allow it to cool naturally to room temperature under an inert atmosphere, and then remove the finished cover plate.

[0043] In S3, alternating sputtering of silicon dioxide and titanium pentoxide targets is used to deposit the antireflective layer. The deposition thickness of a single silicon dioxide layer is 20–50 nm, and the deposition thickness of a single titanium pentoxide layer is 10–30 nm. The total number of layers is 3–6, and the first and last layers are both silicon dioxide layers. In S1, argon ion beam is used for ion source cleaning with an ion energy of 300–800 eV and a cleaning time of 60–180 seconds.

[0044] in:

[0045] The multilayer dielectric antireflective structure, composed of alternating silicon dioxide and titanium pentoxide, effectively broadens the antireflection band and significantly improves the average transmittance in the visible light range by precisely controlling the material selection and physical thickness of each sublayer and setting low-refractive-index SiO2 layers in both the innermost and outermost layers.

[0046] Integrating a transparent conductive oxide layer on top of the anti-reflective layer serves as an antistatic layer. This not only maintains high light transmittance but also effectively eliminates electrostatic adsorption, preventing the adhesion of contaminants such as dust and fingerprints, reducing the frequency of user cleaning, and maintaining long-term optical stability.

[0047] The outermost layer is made of an ultra-thin but highly dense silicon dioxide or diamond-like carbon wear-resistant protective layer, which significantly improves the hardness and scratch resistance of the cover surface without changing the optical performance, meeting the requirements of the daily use environment of smartphones.

[0048] The contents not described in detail in this specification are existing technologies known to those skilled in the art.

[0049] The working principle of this invention is as follows: by sequentially constructing an anti-reflective layer, an antistatic layer, and a wear-resistant protective layer, synergistic optimization of optical and functional performance is achieved.

[0050] Its working principle is as follows: The anti-reflection layer is a multilayer dielectric film formed by alternating deposition of silicon dioxide and titanium pentoxide. By utilizing the interference cancellation effect of light, it significantly reduces surface reflection and improves light transmittance in the visible light band.

[0051] The antistatic layer is made of transparent conductive oxide, which provides a moderate conductive path to quickly dissipate surface static charge and prevent the adsorption of dust and oil.

[0052] The outermost ultra-thin wear-resistant protective layer resists daily scratches through its high hardness and dense structure, maintaining a smooth surface and optical stability.

[0053] The three-layer film system is continuously deposited in a vacuum environment, ensuring a clean interface and strong adhesion. The overall structure takes into account high light transmittance, low reflection, anti-pollution and durability, effectively improving the imaging quality of the camera and the reliability of the product.

[0054] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0055] The present invention and its embodiments have been described above. This description is not restrictive, and the accompanying drawings are only one embodiment of the present invention; the actual structure is not limited thereto. In conclusion, if those skilled in the art are inspired by this description and design similar structures and embodiments without departing from the spirit of the invention, such designs should fall within the protection scope of the present invention.

Claims

1. A mobile phone camera cover, characterized in that: It includes a glass substrate and a coating layer, wherein the coating layer is disposed on one surface of the glass substrate; The coating layer includes an anti-reflective layer, an antistatic layer, and a wear-resistant protective layer.

2. A mobile phone camera cover plate according to claim 1, characterized in that: The anti-reflective layer is a multilayer dielectric film structure formed by alternating deposition of silicon dioxide and titanium pentoxide, with a total of 3 to 6 layers.

3. A mobile phone camera cover plate according to claim 1, characterized in that: The innermost and outermost layers of the anti-reflective layer are both silicon dioxide layers; The physical thickness of a single silicon dioxide layer is 20-50 nm; The physical thickness of a single titanium pentoxide layer is 10-30 nm.

4. A mobile phone camera cover plate according to claim 1, characterized in that: The antistatic layer is an indium tin oxide layer, a zinc aluminum oxide layer, or an antimony-doped tin dioxide layer; Thickness 10-50nm.

5. A mobile phone camera cover plate according to claim 1, characterized in that: The wear-resistant protective layer is either a silicon dioxide film or a diamond-like carbon film. The thickness is 5-20nm.

6. A mobile phone camera cover plate according to claim 1, characterized in that: The cover plate substrate is made of chemically strengthened glass, sapphire, or transparent microcrystalline glass.

7. A coating method for a mobile phone camera cover plate as described in any one of claims 1-6, characterized in that: Includes the following steps: S1: Ion source cleaning of the glass substrate; S2: Place the cleaned cover plate substrate into the vacuum chamber of the magnetron sputtering coating equipment and evacuate it; S3: Process gas is introduced to sequentially deposit an anti-reflective layer, an antistatic layer, and a wear-resistant protective layer on the surface of the cover plate substrate to be coated. S4: After the coating is completed, allow it to cool naturally to room temperature under an inert atmosphere, and then remove the finished cover plate.

8. The coating method according to claim 7, characterized in that: In the S3 process, the anti-reflection layer is deposited using alternating sputtering of silicon dioxide and titanium pentoxide targets. The deposition thickness of a single silicon dioxide layer is 20–50 nm, and the deposition thickness of a single titanium pentoxide layer is 10–30 nm. The total number of layers is 3–6, and the first and last layers are both silicon dioxide layers.

9. The coating method according to claim 7, characterized in that: The ion source cleaning in S1 uses an argon ion beam with an ion energy of 300–800 eV and a cleaning time of 60–180 seconds.

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