Photoetching system for laser direct writing and micromirror assembly

Abstract

The invention discloses a photoetching system for laser direct writing and a micro-mirror assembly. The photoetching system for laser direct writing comprises a micro-mirror array, a lens and a shaping mechanism, the micro-reflector array comprises a substrate, a plurality of connecting rods and a plurality of reflectors; wherein each reflecting mirror is connected with the base only through one connecting rod; the substrate can be bent towards the reflecting mirror; the lens is arranged on the side, away from the substrate, of the reflector, and the surface, facing the micro-reflector array, of the lens is a first convex face and used for being matched with the micro-reflector array with the bent substrate to form a dot matrix. The shaping mechanism is used for driving the substrate to bend towards the lens. According to the photoetching system for laser direct writing, the precision requirements on assembly and alignment can be reduced.

Description

Technical Field

[0001] This application relates to the field of semiconductor technology, and in particular to a lithography system and micromirror assembly for laser direct writing. Background Technology

[0002] In traditional laser direct writing systems, the alignment between the micromirror array and the microlens array determines the overall system functionality. If there is an alignment deviation, a high-quality dot matrix cannot be achieved. As the wavelength of laser direct writing decreases, especially to <100nm, the requirements for alignment accuracy become increasingly stringent. This necessitates a significant reduction in the fabrication errors (especially the array period) of the micromirror array and the microlens array, as well as a substantial reduction in assembly errors between them. These stringent requirements present a challenge to realizing laser direct writing systems with wavelengths <100nm. Summary of the Invention

[0003] This application discloses a lithography system and micromirror assembly for laser direct writing, which eliminates the need for a microlens array in the laser direct writing system, thereby significantly reducing the precision requirements for assembly and alignment of the lithography system and making it easier to build a short-wavelength (wavelength <100nm) laser direct writing lithography system.

[0004] To achieve the above objectives, this application provides the following technical solution:

[0005] In a first aspect, this application provides a lithography system for laser direct writing, including a micromirror array, a lens, and a shaping mechanism;

[0006] The micromirror array includes a substrate, multiple connecting rods, and multiple mirrors; wherein each mirror is connected to the substrate via only one connecting rod; the substrate can be bent toward the mirror.

[0007] The lens is disposed on the side of the reflector away from the substrate, and the surface of the lens facing the micro-reflector array is a first convex surface, which is used to cooperate with the micro-reflector array after the substrate is bent to form a dot matrix;

[0008] The shaping mechanism is used to drive the substrate to bend toward the lens.

[0009] The aforementioned lithography system for laser direct writing includes a micromirror array, a lens, and a shaping mechanism. The micromirror array comprises a substrate, multiple connecting rods, and multiple mirrors, each mirror connected to the substrate via only one connecting rod. Driven by the shaping mechanism, the substrate can bend and deform towards the mirrors, thus changing the angle of the mirrors connected to the substrate. A lens is located on the side of the mirror facing away from the substrate, and the surface of the lens facing the mirror is a first convex surface. Because the angle of the mirrors changes after the substrate bends, the direction of the reflected light beam also changes. The reflected light beam then forms a focal point after being processed by the first convex surface of the lens. Thus, the multiple mirrors after the substrate bend, in conjunction with the lens, can form a dot matrix. Compared to the traditional combination of micromirror arrays and microlens arrays, the combination of the deformed micromirror array and lens in this application significantly reduces the precision requirements for assembly and alignment in the lithography system, making the construction of short-wavelength (wavelength <100nm) laser direct writing lithography systems easier.

[0010] In some embodiments, the shaping mechanism includes a base disposed on the side of the substrate away from the lens, the surface of the base facing the substrate being a second convex surface, and the substrate being fixed to the second convex surface of the base.

[0011] In some embodiments, the substrate and the base are fixed together by means of bonding and bonding.

[0012] In some embodiments, the shaping mechanism further includes a first driving member for driving the substrate to conform to the second convex surface of the base.

[0013] In some embodiments, the shaping mechanism includes a clamping member and a second driving member; the clamping member is fixed at both ends of the substrate for fixing the substrate; the second driving member is used to drive the substrate to bend toward the lens.

[0014] In some embodiments, both the first and second drive components of the shaping mechanism include motors.

[0015] In some embodiments, the radius of curvature of the bent substrate is 1 cm to 10 m.

[0016] In some embodiments, the image-side surface of the lens is convex near the optical axis; or, the image-side surface of the lens is planar near the optical axis; or, the image-side surface of the lens is concave near the optical axis.

[0017] In some embodiments, the numerical aperture of the lens is 0.1-1.

[0018] Secondly, this application provides a micromirror assembly, including a micromirror array and a lens;

[0019] The micromirror array includes a substrate, multiple connecting rods, and multiple mirrors; wherein each mirror is connected to the substrate via only one connecting rod; the substrate can be bent toward the mirror.

[0020] The lens is located on the side of the reflector away from the substrate, and the surface of the lens facing the micro-reflector array is a first convex surface, which is used to cooperate with the micro-reflector array after the substrate is bent to form a dot matrix. Attached Figure Description

[0021] Figure 1 A schematic diagram of a lithography system for laser direct writing is provided in an embodiment of this application;

[0022] Figure 2 This is a schematic diagram of another lithography system for laser direct writing provided in an embodiment of this application;

[0023] Figure 3 This is a schematic diagram of another lithography system for laser direct writing provided in an embodiment of this application;

[0024] Figure 4 This is a schematic diagram of the structure of a micromirror assembly provided in an embodiment of this application;

[0025] Icons: 1. Micromirror array; 11. Substrate; 12. Connecting rod; 13. Mirror; 2. Lens; 3. Shaping mechanism; 31. Base; 32. First driving component; 33. Clamping component; 34. Second driving component; A. First convex surface; B. Second convex surface. Detailed Implementation

[0026] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application. In the description of the embodiments of this application, unless otherwise stated, " / " means "or", for example, A / B can mean A or B; "and / or" in the text is merely a description of the relationship between related objects, indicating that there can be three relationships, for example, A and / or B can represent: A alone, A and B at the same time, and B alone. In addition, in the description of the embodiments of this application, "multiple" means two or more.

[0027] The terms "first" and "second" are used for descriptive purposes only and should not be construed as implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include one or more of that feature. In the description of the embodiments of this application, unless otherwise stated, "multiple" means two or more.

[0028] First, let's introduce the application scenarios. Laser direct writing is an important technology in the semiconductor manufacturing field. Laser direct writing systems use a combination of micromirror arrays and microlens arrays to achieve a dot matrix. When the laser wavelength is <100nm, laser direct writing technology can be used for high-precision mask manufacturing or wafer fabrication. However, as the wavelength decreases, the entire laser direct writing system places higher demands on the alignment and assembly precision between the micromirror array and the microlens array, posing a greater challenge to the construction of the laser direct writing system.

[0029] Based on the above problems, this application provides a lithography system and micromirror assembly for laser direct writing, which eliminates the need for a microlens array in the laser direct writing system, thereby significantly reducing the precision requirements for assembly and alignment of the lithography system and making it easier to build a short-wavelength (wavelength <100nm) laser direct writing lithography system.

[0030] Firstly, such as Figures 1-3 As shown, this application provides a lithography system for laser direct writing, including a micromirror array 1, a lens 2, and a shaping mechanism 3;

[0031] The micromirror array 1 includes a substrate 11, multiple connecting rods 12, and multiple mirrors 13; wherein each mirror 13 is connected to the substrate 11 via only one connecting rod 12; the substrate 11 can be bent toward the mirror 13;

[0032] Lens 2 is located on the side of reflector 13 away from substrate 11. The surface of lens 2 facing micro-reflector array 1 is a first convex surface A, which is used to cooperate with micro-reflector array 1 after substrate 11 is bent to form a dot matrix.

[0033] The shaping mechanism 3 is used to drive the substrate 11 to bend toward the lens 2.

[0034] The aforementioned lithography system for laser direct writing includes a micromirror array 1, a lens 2, and a shaping mechanism 3. The micromirror array 1 includes a substrate 11, multiple connecting rods 12, and multiple mirrors 13, each mirror 13 being connected to the substrate 11 via only one connecting rod 12. Under the driving action of the shaping mechanism 3, the substrate 11 can be bent and deformed towards the mirrors 13, thereby changing the angle of the mirrors 13 connected to the substrate 11. The lens 2 is located on the side of the mirrors 13 facing away from the substrate 11, and the surface of the lens 2 facing the mirrors 13 is a first convex surface A. Because the angle of the mirrors 13 changes after the substrate 11 bends, the direction of the light beam reflected by the mirrors 13 also changes. Then, the reflected light beam, after being processed by the first convex surface A of the lens 2, forms a focal point. Thus, the multiple mirrors 13 after the substrate 11 is bent, in conjunction with the lens 2, can form a dot matrix. The combination of the deformed micromirror array 1 and lens 2 in this embodiment of the application, compared with the traditional combination of micromirror array and microlens array, can significantly reduce the precision requirements of the lithography system for assembly and alignment, thereby making it easier to build a short-wavelength (wavelength <100nm) laser direct-write lithography system. It is expected to solve the bottleneck problems in high-precision mask manufacturing and wafer manufacturing when lithography machine and electron beam technology are still immature.

[0035] In some embodiments, the shaping mechanism 3 includes a base 31, which is disposed on the side of the substrate 11 away from the lens 2. The surface of the base 31 facing the substrate 11 is a second convex surface B, and the substrate 11 is fixed to the second convex surface B of the base 31.

[0036] One possible way to achieve this is, such as Figure 1 As shown, the base 31 has a second convex surface B facing the lens 2. The base 11 is fixed to the second convex surface B of the base 31, and the surface of the base 11 facing away from the lens 2 is in complete contact with the second convex surface B, so that the base 11 bends towards the lens 2, thereby allowing the multiple reflectors 13 after the base 11 is bent to cooperate with the lens 2 to form a dot matrix. The second convex surface B of the base 31 can be achieved by processing techniques such as polishing.

[0037] In some embodiments, the substrate 11 and the base 31 are fixed by means of bonding and bonding to ensure that the substrate 11 remains bent toward the lens 2.

[0038] In some embodiments, the shaping mechanism 3 further includes a first driving member 32 for driving the base 11 to conform to the second convex surface B of the base 31.

[0039] One possible way to achieve this is, such as Figure 2As shown, the first driving member 32 fixes the surface of the substrate 11 away from the lens 2 with the second convex surface B by means of external force, so as to ensure that the substrate 11 remains in a bent state toward the lens 2.

[0040] In some embodiments, the shaping mechanism 3 includes a clamping member 33 and a second driving member 34; the clamping member 33 is fixed at both ends of the substrate 11 for fixing the substrate 11; the second driving member 34 is used to drive the substrate 11 to bend toward the lens 2.

[0041] One possible way to achieve this is, such as Figure 3 As shown, after the clamping member 33 fixes the two ends of the edge of the base 11, the second driving member 34 fixes the base 11 toward the lens 2 by external force on the side of the base 11 away from the lens 2, and keeps the base 11 in a bent state, so that the multiple reflectors 13 after the base 11 is bent cooperate with the lens 2 to form a dot matrix.

[0042] In some embodiments, both the first drive member 32 and the second drive member 34 of the shaping mechanism 3 include a motor. Pressure is applied to the side of the substrate 11 facing away from the lens 2 by the motor to ensure that the substrate 11 remains bent toward the lens 2. It should be noted that, in addition to pressure applied by the motor, pressure can also be generated through pressure difference or other means.

[0043] In some embodiments, the radius of curvature of the bent substrate 11 is 1cm-10m, for example, the radius of curvature of the bent substrate 11 is 1cm, 2cm, 5cm, 10cm, 15cm, 20cm, 30cm, 40cm, 50cm, 60cm, 70cm, 80cm, 90cm, 1m, etc., and the specific value depends on the actual situation. Without damaging the micromirror array 1, the embodiments of this application can adjust the lattice period finally formed with the lens 2 by adjusting the radius of curvature of the bent substrate 11, thereby achieving high-precision laser direct writing.

[0044] In some embodiments, the image-side surface of lens 2 is convex near the optical axis, i.e., lens 2 is a biconvex lens; or, the image-side surface of lens 2 is flat near the optical axis, i.e., lens 2 is a plano-convex lens; or, the image-side surface of lens 2 is concave near the optical axis, i.e., lens 2 is a concave-convex lens. In the embodiments of this application, lens 2 is a positive lens used to converge light beams to form a dot matrix.

[0045] In some embodiments, the numerical aperture of lens 2 is 0.1-1. For example, the numerical aperture of lens 2 is 0.1, 0.2, 0.3, 0.4, 0.5, 0.6, 0.7, 0.8, 0.9, 1, etc., and the specific value depends on the actual situation. The larger the numerical aperture of lens 2, the smaller the point of convergence, that is, the stronger the ability to collect light.

[0046] Secondly, such as Figure 4 As shown, this application provides a micromirror assembly, including a micromirror array 1 and a lens 2;

[0047] The micromirror array 1 includes a substrate 11, multiple connecting rods 12, and multiple mirrors 13; wherein each mirror 13 is connected to the substrate 11 via only one connecting rod 12; the substrate 11 can be bent toward the mirror 13;

[0048] Lens 2 is located on the side of reflector 13 away from substrate 11. The surface of lens 2 facing micro-reflector array 1 is a first convex surface A, which is used to cooperate with micro-reflector array 1 after substrate 11 is bent to form a dot matrix.

[0049] Obviously, those skilled in the art can make various modifications and variations to this application without departing from the spirit and scope of this application. Therefore, if such modifications and variations fall within the scope of the claims of this application and their equivalents, this application also intends to include such modifications and variations.

Claims

1. A lithography system for laser direct writing, characterized in that, Includes micromirror arrays, lenses, and shaping mechanisms; The micromirror array includes a substrate, multiple connecting rods, and multiple mirrors; wherein each mirror is connected to the substrate via only one connecting rod; the substrate can be bent toward the mirror. The lens is disposed on the side of the reflector away from the substrate, and the surface of the lens facing the micro-reflector array is a first convex surface, which is used to cooperate with the micro-reflector array after the substrate is bent to form a dot matrix; The shaping mechanism is used to drive the substrate to bend toward the lens.

2. The lithography system for laser direct writing according to claim 1, characterized in that, The shaping mechanism includes a base, which is located on the side of the substrate away from the lens. The surface of the base facing the substrate is a second convex surface, and the substrate is fixed to the second convex surface of the base.

3. The lithography system for laser direct writing according to claim 2, characterized in that, The substrate and the base are fixed by means of bonding and bonding.

4. The lithography system for laser direct writing according to claim 2, characterized in that, The shaping mechanism further includes a first driving member for driving the substrate to fit against the second convex surface of the base.

5. The lithography system for laser direct writing according to claim 1, characterized in that, The shaping mechanism includes a clamping component and a second driving component; The clamping members are fixed at both ends of the base and are used to fix the base. The second driving member is used to drive the substrate to bend toward the lens.

6. The lithography system for laser direct writing according to claim 4 or 5, characterized in that, Both the first and second driving components of the shaping mechanism include motors.

7. The lithography system for laser direct writing according to claim 1, characterized in that, The radius of curvature of the bent substrate is 1cm-10m.

8. The lithography system for laser direct writing according to claim 1, characterized in that, The image-side surface of the lens is convex near the optical axis; or, the image-side surface of the lens is flat near the optical axis; or, the image-side surface of the lens is concave near the optical axis.

9. The lithography system for laser direct writing according to claim 1, characterized in that, The numerical aperture of the lens is 0.1-1.

10. A micromirror assembly, characterized in that, Including micromirror arrays and lenses; The micromirror array includes a substrate, multiple connecting rods, and multiple mirrors; wherein each mirror is connected to the substrate via only one connecting rod; the substrate can be bent toward the mirror. The lens is located on the side of the reflector away from the substrate, and the surface of the lens facing the micro-reflector array is a first convex surface, which is used to cooperate with the micro-reflector array after the substrate is bent to form a dot matrix.

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