A magnetron sputtering film coating target angle adjusting device and method

Abstract

This invention relates to the field of coating technology, and more particularly to a magnetron sputtering coating target angle adjustment device and method, comprising a movable frame body, a mounting box mounted on the top of the movable frame body, a rotating component mounted inside the mounting box, an angle adjustment component mounted between the movable frame body and the mounting box, and a limit locking component mounted on the inner side of the mounting box; the rotating component includes a telescopic rod embedded in the bottom of the mounting box, and a rotating disk rotatably mounted on the outer wall of the top of the telescopic rod; this invention uses a rotating component, which allows for precise rotation of the coating target, facilitating rotating coating of the workpiece, resulting in higher utilization of the coating target and improving the equipment's performance; the angle adjustment component allows for pitch adjustment of the coating target, thereby changing the particle incident orientation, facilitating bypassing structural obstructions, resulting in uniform deposition in the shadow area, and ultimately achieving conformal coating across the entire surface, thus improving the coating effect.

Description

Technical Field

[0001] This invention relates to the field of coating technology, and in particular to a magnetron sputtering target angle adjustment device and method. Background Technology

[0002] Magnetron sputtering targets are the core consumables of magnetron sputtering vacuum coating equipment. In the high-density plasma generated by the orthogonal electromagnetic field of the equipment, they are bombarded by high-energy inert gas ions. Surface atoms / molecules are sputtered out due to momentum transfer, depositing as a gaseous phase on the substrate surface for nucleation and growth, ultimately forming a continuous and dense functional thin film. The material, purity, and structure of the target directly determine the composition, microstructure, and physicochemical properties of the coating. However, magnetron sputtering targets require an angle adjustment device for auxiliary adjustment during coating; but existing angle adjustment devices… Precise rotation of the coating target is generally not easy, and it is also difficult to rotate the workpiece for coating, resulting in low utilization of the coating target and reduced equipment performance. Furthermore, it is generally not easy to adjust the pitch of the coating target, making it impossible to change the particle incident direction, avoid structural obstructions, and achieve uniform deposition in the shaded area to achieve conformal coating across the entire surface, thus reducing the coating effect. In addition, it is generally not easy to quickly install the coating target, requiring screw structures for auxiliary installation, which increases the installation burden and reduces the installation effect of the coating target. Summary of the Invention

[0003] The problem solved by this invention is to provide a magnetron sputtering target angle adjustment device and method, which can precisely rotate the coating target, facilitating the workpiece to be rotated for coating, resulting in a high utilization rate of the coating target and improving the efficiency of the equipment. Moreover, the target can be tilted to change the particle incident orientation, making it easier to bypass structural obstructions, thereby achieving uniform deposition in the shadow area and realizing conformal coating on the entire surface, improving the coating effect. Furthermore, the target can be quickly installed without the need for screw structures, reducing the installation burden and improving the installation effect of the coating target.

[0004] To achieve the above objectives, the present invention adopts the following technical solution: a magnetron sputtering target angle adjustment device, comprising a movable frame body, an installation box installed at the top of the movable frame body, a rotating component installed inside the installation box, an angle adjustment component installed between the movable frame body and the installation box, and a limit locking component installed on the inner side of the installation box; The rotating assembly includes a telescopic rod embedded in the bottom of the mounting box. A rotating disk is rotatably mounted on the outer wall of the top of the telescopic rod. A first spring is connected to the inner wall of the bottom of the mounting box, and the top of the first spring is fitted against the outer wall of the bottom of the rotating disk. A worm gear ring is connected to the outer wall of the bottom of the rotating disk. A first servo motor is embedded in the inner wall of one side of the mounting box. One end of the output shaft of the first servo motor is connected to a worm gear, and the other end of the worm gear is rotatably mounted on the inner wall of the mounting box. The outer side of the worm gear is meshed with the outer wall of the worm gear ring. Positioning rods are distributed and connected to the outer side of the rotating disk. A mounting base is installed inside the mounting box. Positioning grooves are distributed at the bottom of the mounting base corresponding to the positions of the positioning rods. A coating target is installed at the top of the mounting base.

[0005] Preferably, the angle adjustment component includes a spherical hinge connected to the bottom end of the movable frame body. A spherical groove is provided on the inner wall of the bottom end of the mounting box corresponding to the position of the spherical hinge. A magnetic adsorption guide rail is installed on the inner wall of the bottom end of the mounting box. An arc-shaped slide plate is slidably installed in the magnetic adsorption guide rail. A rotating shaft is symmetrically connected to the bottom end of the arc-shaped slide plate. An adjusting rod is rotatably installed at one end of the rotating shaft. A lead screw is rotatably installed at the bottom end of the adjusting rod. A fixing ring is installed through the bottom end of the movable frame body, and the lead screw is installed through the inner wall of the fixing ring. A first slip ring is slidably installed on the fixing ring. A second gear is connected to the outer wall of the bottom end of the first slip ring. A threaded hole is provided in the middle of the second gear corresponding to the position of the lead screw.

[0006] Preferably, the first gear is meshed with the outer side of the second gear, the second servo motor is embedded in the bottom of the movable frame body, and the bottom end of the output shaft of the second servo motor is connected to the outer wall of the first gear.

[0007] Preferably, the limiting engagement assembly includes an annular groove formed inside the main body of the movable frame. A second sliding ring is slidably installed in the annular groove. A connecting ring is connected to the inner side of the second sliding ring. Sleeves are distributed and connected to the inner side of the connecting ring. A limiting rod is sleeved inside the sleeve. A connecting plate is connected to the outer wall of one end of the limiting rod. A second spring is connected to the outer wall of one side of the connecting plate, and the other end of the second spring is connected to the inner wall of the sleeve.

[0008] Preferably, a limiting groove is provided on the outer side of the mounting base corresponding to the position of the limiting rod, and the bottom end of the limiting groove is provided with an inlet and outlet.

[0009] Preferably, a connecting plate is distributed and connected to the bottom outer side of the main body of the movable frame, and bolts are sleeved inside the connecting plate.

[0010] Preferably, a sealing cover is rotatably mounted on the top of the mounting box, and a magnetron sputtering source is mounted on the inner wall of the top of the sealing cover.

[0011] Preferably, an angular displacement sensor is installed on the bottom outer wall of the mounting box.

[0012] Preferably, the second spring is sleeved on the outer wall of the limiting rod, and the number of second springs is four.

[0013] A method for adjusting the angle of a magnetron sputtering coating target involves first installing a connecting plate on the main body of the movable frame to a designated position, then fixing the connecting plate to the main body of the movable frame with bolts. Next, the positioning groove on the mounting base engages with the positioning rod on the rotating disk, and the coating target is pressed down, causing the telescopic rod on the rotating disk to descend. This allows the limiting rod to enter the limiting slot along the inlet / outlet on the coating target. The coating target is then rotated to allow the limiting rod to enter the limiting slot's limit position, causing the limiting rod on the connecting disk to move along the sleeve, putting the second spring under tension and fixing the limiting rod to the limiting slot's limit position. At this point, the coating target is released, and under the action of the first spring, the rotating disk presses the coating target on the mounting base upwards, fixing the coating target at that position. The workpiece is then placed above the coating target. The sealing cover is rotated to seal the top of the mounting box. Finally, the magnetron sputtering source is activated to emit particles from the coating target. The particles emitted by the magnetron sputtering... The target atoms on the coating target are deposited onto the workpiece to form a coating. When the coating target needs to be rotated, the first servo motor is started to rotate the worm gear. Then, under the action of the worm ring, and with the cooperation of the positioning rod and the positioning groove, the rotating disk drives the coating target on the mounting base to rotate to the designated position. Then, under the action of the limiting slot and the limiting rod, and with the cooperation of the sleeve, the second slip ring on the connecting ring rotates along the annular sliding groove, so that the limiting structure continuously limits the coating target. Then, under the control of the angular displacement sensor, the second servo motor is started to rotate the first gear, which drives the first slip ring on the second gear to rotate along the fixed ring. Then, under the action of the threaded hole, the lead screw rotates along the adjusting rod, which in turn drives the adjusting rod to rise and fall. Then, under the action of the rotating shaft, and through the arc-shaped sliding plate, it is attracted to the inside of the magnetic adsorption guide rail, so that the spherical groove on the mounting box is adjusted along the spherical hinge, so that the coating target can be tilted in the designated direction.

[0014] The beneficial effects of this invention are: the use of a rotating component allows for precise rotation of the coating target, facilitating the rotational coating of the workpiece, resulting in a higher utilization rate of the coating target and improving the efficiency of the equipment. An angle adjustment component is adopted, which can adjust the pitch of the coating target, thereby changing the particle incident orientation, making it easier to bypass structural obstructions, so as to achieve uniform deposition in the shadow area, and thus achieve conformal coating on the whole surface, improving the coating effect. The use of a limiting locking assembly allows for quick installation of the coating target without the need for screws, reducing the installation burden and improving the installation effect of the coating target. Attached Figure Description

[0015] Figure 1 This is a three-dimensional structural diagram of the present invention; Figure 2 This is a front sectional view of the present invention; Figure 3 For the present invention Figure 2 Enlarged view of the structure of region A in the middle; Figure 4 This is a bottom-view perspective view of the rotating component of the present invention; Figure 5 This is a partial three-dimensional structural diagram of the rotating component of the present invention; Figure 6 This is a bottom-view perspective view of the angle adjustment component of the present invention; Figure 7 This is a top sectional view of the limiting engagement assembly of the present invention; Figure 8 This is a partial three-dimensional structural diagram of the limiting engagement component of the present invention.

[0016] Legend: 1. Main body of the movable frame; 2. Mounting box; 3. Rotating assembly; 4. Angle adjustment assembly; 5. Limiting and engaging assembly; 6. Connecting plate; 7. Bolt; 8. Sealing cover; 9. Magnetron sputtering source; 10. Angular displacement sensor; 301. First servo motor; 302. Worm gear; 303. Telescopic rod; 304. First spring; 305. Rotating disk; 306. Positioning rod; 307. Turbine ring; 308. Mounting base; 309. Positioning groove; 3010. Coating target; 401. Second servo motor; 402. First... Gear; 403, Fixed ring; 404, First slip ring; 405, Second gear; 406, Threaded hole; 407, Lead screw; 408, Adjusting rod; 409, Rotating shaft; 4010, Arc-shaped sliding plate; 4011, Spherical hinge; 4012, Magnetic adsorption guide rail; 4013, Spherical groove; 501, Annular groove; 502, Second slip ring; 503, Connecting ring; 504, Sleeve; 505, Connecting disc; 506, Limiting rod; 507, Second spring; 508, Limiting slot; 509, Inlet / outlet. Detailed Implementation

[0017] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention. Example

[0018] See Figures 1-5 A magnetron sputtering target angle adjustment device includes a movable frame body 1, an mounting box 2 installed at the top of the movable frame body 1, a rotating component 3 installed inside the mounting box 2, an angle adjustment component 4 installed between the movable frame body 1 and the mounting box 2, and a limit locking component 5 installed on the inner side of the mounting box 2; connecting plates 6 are distributed and connected to the bottom outer side of the movable frame body 1, and bolts 7 are sleeved inside the connecting plates 6. The connecting plates 6 on the movable frame body 1 are installed in a designated position, and then the connecting plates 6 on the movable frame body 1 are fixedly installed by the bolts 7; a sealing cover 8 is rotatably installed at the top of the mounting box 2, and a magnetron sputtering source 9 is installed on the inner wall of the top of the sealing cover 8. The sealing cover 8 is rotated to seal and install above the mounting box 2, and then the magnetron sputtering source 9 is activated to emit particles to the coating target 3010. The target atoms on the coating target 3010 are deposited onto the workpiece by the magnetron sputtered particles, thereby forming a coating. The rotating assembly 3 includes a telescopic rod 303 embedded in the bottom of the mounting box 2. A rotating disk 305 is rotatably mounted on the outer wall of the top of the telescopic rod 303. A first spring 304 is connected to the inner wall of the bottom of the mounting box 2, and the top of the first spring 304 is fitted to the outer wall of the bottom of the rotating disk 305. A turbine ring 307 is connected to the outer wall of the bottom of the rotating disk 305. A first servo motor 301 is embedded in the inner wall of one side of the mounting box 2. One end of the output shaft of the first servo motor 301 is connected to a worm gear 302, and the other end of the worm gear 302 is rotatably mounted on the inner wall of the mounting box 2. The outer side of the worm gear 302 is meshed with the outer wall of the turbine ring 307. Positioning rods 306 are distributed and connected to the outer side of the rotating disk 305. A mounting seat 308 is installed inside the mounting box 2. A positioning groove 309 is opened at the bottom of the mounting seat 308 corresponding to the position of the positioning rod 306. A coating target 3010 is installed at the top of the mounting seat 308.

[0019] Working principle: The positioning groove 309 on the mounting base 308 is engaged with the positioning rod 306 on the rotating disk 305, and the coating target 3010 is pressed down, causing the telescopic rod 303 on the rotating disk 305 to descend. The limiting structure limits the coating target 3010. Then, the coating target 3010 is released. Under the action of the first spring 304, the rotating disk 305 presses the coating target 3010 on the mounting base 308 upward, fixing the coating target 3010 at that position. At this time, the sealing cover 8 is rotated to seal and install the sealing cover 8 above the mounting box 2. Then, the magnetron sputtering source 9 is started to spray the coating target 3010. 010 performs particle emission, using magnetron sputtering to deposit target atoms from the coating target 3010 onto the workpiece, thus forming a coating. When the coating target 3010 needs to be rotated, the first servo motor 301 is started to rotate the worm gear 302. Then, under the action of the turbine ring 307, and with the cooperation of the positioning rod 306 and the positioning groove 309, the rotating disk 305 drives the coating target 3010 on the mounting base 308 to rotate to the designated position. This allows for precise rotation of the coating target 3010, facilitating the rotational coating of the workpiece. This results in a high utilization rate of the coating target 3010 and improves the efficiency of the equipment. Example

[0020] See Figure 2 and Figure 6The angle adjustment component 4 includes a spherical hinge 4011 connected to the bottom of the movable frame body 1. A spherical groove 4013 is provided on the inner wall of the bottom of the mounting box 2 corresponding to the position of the spherical hinge 4011. A magnetic adsorption guide rail 4012 is installed on the inner wall of the bottom of the mounting box 2. An arc-shaped slide plate 4010 is slidably installed in the magnetic adsorption guide rail 4012. A rotating shaft 409 is symmetrically connected to the bottom of the arc-shaped slide plate 4010. An adjusting rod 408 is rotatably installed at one end of the rotating shaft 409. A lead screw 407 is rotatably installed at the bottom of the adjusting rod 408. A fixing ring 403 is installed through the bottom of the movable frame body 1, and the lead screw 407 is installed through the inner wall of the fixing ring 403. A first slip ring 404 is slidably installed on the fixing ring 403. A second gear 405 is connected to the outer wall of the bottom of the first slip ring 404. The second gear 405 has a threaded hole 406 at the middle corresponding to the position of the lead screw 407; the first gear 402 is meshed on the outer side of the second gear 405; the second servo motor 401 is embedded in the bottom of the movable frame body 1, and the bottom end of the output shaft of the second servo motor 401 is connected to the outer wall of the first gear 402. The second servo motor 401 is started to make the first gear 402 rotate, and then the first slip ring 404 on the second gear 405 rotates along the fixed ring 403. Then, under the action of the threaded hole 406, the lead screw 407 is conveniently rotated along the adjusting rod 408; an angular displacement sensor 10 is installed on the bottom outer wall of the mounting box 2. Under the control of the angular displacement sensor 10, the second servo motor 401 is started to make the first gear 402 rotate to a specified angle.

[0021] Under the control of the angular displacement sensor 10, the second servo motor 401 is started to rotate the first gear 402, which then drives the first slip ring 404 on the second gear 405 to rotate along the fixed ring 403. Then, under the action of the threaded hole 406, the lead screw 407 rotates along the adjusting rod 408, which in turn drives the adjusting rod 408 to rise and fall. Then, under the action of the rotating shaft 409, and through the arc-shaped sliding plate 4010, it is attracted to the inside of the magnetic adsorption guide rail 4012, so that the spherical groove 4013 on the mounting box 2 is angled along the spherical hinge 4011, so that the coating target 3010 can be tilted in the specified direction. The tilt of the coating target 3010 can be adjusted to change the particle incident orientation, so as to avoid structural obstruction and thus obtain uniform deposition in the shadow area, thereby achieving conformal coating of the entire surface and improving the coating effect.

[0022] See Figure 3 , Figure 7 and Figure 8The limiting engagement assembly 5 includes an annular groove 501 formed inside the movable frame body 1. A second slip ring 502 is slidably installed in the annular groove 501. A connecting ring 503 is connected to the inner side of the second slip ring 502. A sleeve 504 is distributed and connected to the inner side of the connecting ring 503. A limiting rod 506 is sleeved inside the sleeve 504. A connecting plate 505 is connected to the outer wall of one end of the limiting rod 506. A second spring 507 is connected to the outer wall of one side of the connecting plate 505, and the other end of the second spring 507 is connected to the inner wall of the sleeve 504. A limiting slot 508 is formed on the outer side of the mounting base 308 corresponding to the position of the limiting rod 506. The bottom end of the limiting slot 508... An inlet / outlet 509 is provided, allowing the limiting rod 506 to enter the limiting slot 508 along the inlet / outlet 509 on the coating target 3010. Then, the coating target 3010 is rotated to allow the limiting rod 506 to enter the limiting position of the limiting slot 508, facilitating the limiting treatment of the coating target 3010. The second spring 507 is sleeved on the outer wall of the limiting rod 506, and there are four second springs 507. This allows the limiting rod 506 on the connecting plate 505 to move along the sleeve 504, putting the second springs 507 in a stretched state. Through the reaction force of the second springs 507, the limiting rod 506 is easily fixed to the limiting position of the limiting slot 508. Example

[0023] This application also discloses a method for adjusting the angle of a magnetron sputtering coating target, specifically: First, the connecting plate 6 on the movable frame body 1 is installed in the designated position. Then, the connecting plate 6 on the movable frame body 1 is fixedly installed using bolts 7. Next, the positioning groove 309 on the mounting base 308 is engaged with the outside of the positioning rod 306 on the rotating disk 305, and the coating target 3010 is pressed down, causing the telescopic rod 303 on the rotating disk 305 to descend, so that the limiting rod 506 enters the interior of the limiting slot 508 along the inlet and outlet 509 on the coating target 3010. Then, the coating target 3010 is rotated so that the limiting rod 506 enters the limiting position of the limiting slot 508, causing the limiting rod 506 on the connecting disk 505 to move along the sleeve 504, so that the second spring 507 is in a stretched state, and the limiting rod 506... 06 is fixed to the limiting position of the limiting slot 508. At this time, the coating target 3010 is released. Under the action of the first spring 304, the rotating disk 305 presses the coating target 3010 on the mounting base 308 upward, fixing the coating target 3010 at that position. Then, the workpiece is placed above the coating target 3010. When the coating target 3010 is rotated and adjusted, under the action of the limiting slot 508 and the limiting rod 506, and with the cooperation of the sleeve 504, the second slip ring 502 on the connecting ring 503 rotates along the annular slide groove 501, so that the limiting structure continuously limits the coating target 3010. The coating target 3010 can be quickly installed without the need for screw structure to assist in the installation, reducing the installation burden and improving the installation effect of the coating target 3010.

[0024] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any equivalent substitutions or modifications made by those skilled in the art within the scope of the technology disclosed in the present invention, based on the technical solution and inventive concept of the present invention, should be covered within the scope of protection of the present invention.

Claims

1. A magnetron sputtering target angle adjustment device, comprising a movable frame body (1), wherein a mounting box (2) is mounted on the top of the movable frame body (1), characterized in that, The mounting box (2) is equipped with a rotating component (3), the movable frame body (1) is equipped with an angle adjustment component (4) between the mounting box (2), and the mounting box (2) is equipped with a limit locking component (5). The rotating assembly (3) includes a telescopic rod (303) embedded in the bottom of the mounting box (2). A rotating disk (305) is rotatably mounted on the outer wall of the top end of the telescopic rod (303). A first spring (304) is connected to the inner wall of the bottom end of the mounting box (2), and the top end of the first spring (304) is fitted onto the outer wall of the bottom end of the rotating disk (305). A turbine ring (307) is connected to the outer wall of the bottom end of the rotating disk (305). A first servo motor (301) is embedded in the inner wall of one side of the mounting box (2). One end of the output shaft of 301 is connected to a worm gear (302), and the other end of the worm gear (302) is rotatably mounted on the inner wall of the mounting box (2). The outer side of the worm gear (302) is meshed with the outer wall of the turbine ring (307). The outer side of the rotating disk (305) is connected to a positioning rod (306). The mounting box (2) is equipped with a mounting seat (308). The bottom end of the mounting seat (308) is provided with a positioning groove (309) corresponding to the position of the positioning rod (306). The top end of the mounting seat (308) is equipped with a coating target material (3010).

2. The magnetron sputtering target angle adjustment device according to claim 1, characterized in that, The angle adjustment component (4) includes a spherical hinge (4011) connected to the bottom end of the movable frame body (1). A spherical groove (4013) is provided on the inner wall of the bottom end of the mounting box (2) corresponding to the position of the spherical hinge (4011). A magnetic adsorption guide rail (4012) is installed on the inner wall of the bottom end of the mounting box (2). An arc-shaped slide plate (4010) is slidably installed in the magnetic adsorption guide rail (4012). A rotating shaft (409) is symmetrically connected to the bottom end of the arc-shaped slide plate (4010). One end of the rotating shaft (409) rotates. An adjusting rod (408) is installed, and a lead screw (407) is rotatably installed at the bottom end of the adjusting rod (408). A fixing ring (403) is installed through the bottom end of the movable frame body (1), and the lead screw (407) is installed through the inner wall of the fixing ring (403). A first slip ring (404) is slidably installed on the fixing ring (403). A second gear (405) is connected to the outer wall of the bottom end of the first slip ring (404). A threaded hole (406) is opened in the middle of the second gear (405) corresponding to the position of the lead screw (407).

3. The magnetron sputtering target angle adjustment device according to claim 1, characterized in that, The second gear (405) is meshed with the first gear (402) on its outer side. The bottom end of the movable frame body (1) is inlaid with the second servo motor (401), and the bottom end of the output shaft of the second servo motor (401) is connected to the outer wall of the first gear (402).

4. The magnetron sputtering target angle adjustment device according to claim 1, characterized in that, The limiting engagement assembly (5) includes an annular groove (501) opened inside the movable frame body (1). A second slip ring (502) is slidably installed in the annular groove (501). A connecting ring (503) is connected to the inner side of the second slip ring (502). A sleeve (504) is distributed and connected to the inner side of the connecting ring (503). A limiting rod (506) is sleeved inside the sleeve (504). A connecting plate (505) is connected to the outer wall of one end of the limiting rod (506). A second spring (507) is connected to the outer wall of one side of the connecting plate (505), and the other end of the second spring (507) is connected to the inner wall of the sleeve (504).

5. The magnetron sputtering target angle adjustment device according to claim 1, characterized in that, The mounting base (308) has a limiting groove (508) on its outer side corresponding to the position of the limiting rod (506), and the bottom end of the limiting groove (508) has an inlet and outlet (509).

6. The magnetron sputtering target angle adjustment device according to claim 1, characterized in that, Connecting plates (6) are distributed and connected to the bottom outer side of the main body (1) of the movable frame, and bolts (7) are sleeved inside the connecting plates (6).

7. The magnetron sputtering target angle adjustment device according to claim 1, characterized in that, A sealing cover (8) is rotatably mounted on the top of the mounting box (2), and a magnetron sputtering source (9) is mounted on the inner wall of the top of the sealing cover (8).

8. The magnetron sputtering target angle adjustment device according to claim 1, characterized in that, An angular displacement sensor (10) is installed on the bottom outer wall of the mounting box (2).

9. The magnetron sputtering target angle adjustment device according to claim 4, characterized in that, The second spring (507) is sleeved on the outer wall of the limiting rod (506), and there are four second springs (507).

10. A method for using a magnetron sputtering target angle adjustment device as described in any one of claims 2-9, characterized in that, First, engage the positioning groove (309) on the mounting base (308) with the positioning rod (306) on the rotating disk (305), and press down on the coating target (3010) to lower the telescopic rod (303) on the rotating disk (305), causing the limiting rod (506) to enter the limiting slot (508) along the inlet and outlet (509) on the coating target (3010). Then, rotate the coating target (3010) to allow the limiting rod (506) to enter the limiting slot (508). At the limit position, the limit rod (506) on the connecting plate (505) moves along the sleeve (504), so that the second spring (507) is in a stretched state, and the limit rod (506) is fixed at the limit position of the limit slot (508). At this time, the coating target (3010) is released, and under the action of the first spring (304), the rotating plate (305) presses the coating target (3010) on the mounting base (308) upward, so that the coating target (3010) is fixed at that position. Then the workpiece is placed above the coating target (3010), and the coating target (3010) is subjected to particle emission. The target atoms on the coating target (3010) are deposited onto the workpiece by the magnetron sputtering particles, thereby forming a coating. When it is necessary to rotate the coating target (3010), the first servo motor (301) is started to make the worm gear (302) rotate. Then, under the action of the turbine ring (307), and with the cooperation of the positioning rod (306) and the positioning groove (309), the rotating disk (305) drives the coating target (3010) on the mounting base (308) to rotate to the designated position. Then the limiting structure continuously limits the coating target (3010), and the arc-shaped sliding plate (4010) is adsorbed into the interior of the magnetic adsorption guide rail (4012), so that the spherical groove (4013) on the mounting box (2) is adjusted along the spherical hinge (4011) so that the coating target (3010) is tilted in the specified direction.

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