Display device

Abstract

A display device is provided, comprising a substrate, an optical region including a first emitting region and a transmissive region, and a general region including a second emitting region and surrounding the optical region. The display device further includes a planarization layer disposed on the substrate and in both the optical region and the general region. The display device also includes a first light-emitting diode disposed on the planarization layer in the second emitting region and including a first electrode, a first organic layer disposed on the first electrode, and a second electrode disposed on the first organic layer. The display device further includes a first deposition stop layer disposed on the second electrode in the second emitting region and at least one second deposition stop layer disposed on the planarization layer in a portion of the transmissive region.

Description

Cross-reference to related applications

[0001] This application claims the benefit and priority of Korean Patent Application No. 10-2024-0196872, filed on December 26, 2024, with the Korean Intellectual Property Office, the entire contents of which are incorporated herein by reference for all purposes. Technical Field

[0002] This disclosure relates to a display device, and more particularly to, for example but not limited to, a display device in which the transmittance of the region where an optoelectronic device is disposed is improved. Background Technology

[0003] The field of display devices that visually express electrical information signals has developed rapidly, and research continues to improve the performance of various display devices, such as thinness, light weight, and low power consumption.

[0004] Representative display devices may include liquid crystal displays (LCDs), field emission displays (FEDs), electrowetting displays (EWDs), and organic light-emitting displays (OLEDs).

[0005] Electroluminescent displays, represented by organic light-emitting display devices, are self-emissive, eliminating the need for a separate light source, unlike liquid crystal displays. Therefore, electroluminescent displays can be manufactured with light weight and thinness. Furthermore, since electroluminescent displays are advantageous not only in terms of power consumption due to low-voltage operation, but also in terms of color reproduction, response speed, viewing angle, and contrast ratio (CR), they are expected to be used in various fields.

[0006] Recently, the multimedia capabilities of mobile terminals have been improved. For example, a display device has been developed in which optical electronics such as cameras or sensors are embedded by default on the front surface. However, the placement of cameras or sensors on the front surface of the display device limits screen design. To reduce the space occupied by cameras or sensors on the front surface of the display device, designs including notches or perforations can be applied. However, screen size remains limited, making full-screen display difficult to achieve.

[0007] To achieve full-screen display, a method is proposed for providing an area in the screen of a display device in which low-resolution pixels are set and for placing a camera and / or various sensors in the area in which the low-resolution pixels are set.

[0008] The description of related art should not be considered merely as prior art, as it is mentioned or associated with this section. The description of related art includes information describing one or more aspects of the subject matter art, and the description in this section does not limit the scope of the invention. Summary of the Invention

[0009] One aspect of this disclosure provides a display device in which transmittance is increased and brightness is enhanced in a transmissive region in which an optical electronic device (such as a camera or sensor) is disposed.

[0010] One aspect of this disclosure provides a display device having improved ultraviolet (UV) reliability in the transmission region in which an optoelectronic device (such as a camera or sensor) is disposed.

[0011] The aspects of this disclosure are not limited to those described above, and other aspects not mentioned above will be clearly understood by those skilled in the art from the following description.

[0012] According to an exemplary embodiment of this disclosure, a display device is provided. The display device includes a substrate, an optical region including a first emitting region and a transmissive region, and a general region including a second emitting region and surrounding the optical region. The display device also includes a planarization layer disposed on the substrate and in both the optical region and the general region. The display device further includes a first light-emitting diode disposed on the planarization layer in the second emitting region and including a first electrode, a first organic layer disposed on the first electrode, and a second electrode disposed on the first organic layer. The display device also includes a first deposition stop layer disposed on the second electrode in the second emitting region and at least one second deposition stop layer disposed on the planarization layer in a portion of the transmissive region.

[0013] Further details of the example embodiments are included in the detailed description and the accompanying drawings.

[0014] According to an example embodiment of this disclosure, a deposition stop layer is disposed in the optical region to improve the transmittance of the optical region.

[0015] According to an example embodiment of this disclosure, the light-emitting diode disposed in the optical region has a microcavity structure to improve the brightness of the optical region, thereby driving the display device with low power to reduce power consumption.

[0016] According to an example embodiment of the present disclosure, the second electrode of the light-emitting diode has a multilayer structure formed in a portion of the optical region, thereby improving the UV reliability of the optical region.

[0017] According to an example embodiment of this disclosure, a deposition stop layer is disposed in the general area to suppress the increase in thickness of the second electrode of the light-emitting diode, thereby suppressing the degradation of brightness in the general area.

[0018] The effects of this disclosure are not limited to those described above, and other effects not mentioned above will be clearly understood by those skilled in the art from the following description.

[0019] The aspects of this disclosure, the means for achieving those aspects, and the effects of this disclosure described above do not specify the essential features of the claims, and therefore the scope of the claims is not limited to the disclosure of this disclosure.

[0020] Additional features, advantages, and aspects of this disclosure are set forth in part in the description which follows, and in part will be apparent from this disclosure, or may be learned by practicing the inventive concepts provided herein. Other features, advantages, and aspects of this disclosure may be realized and obtained from the description provided in or derived from this disclosure, as well as from the claims and drawings of this disclosure. All such features, advantages, and aspects are intended to be included within this specification, within the scope of this disclosure, and protected by the appended claims. Nothing in this section should be construed as limiting these claims. Further features, advantages, and aspects are discussed below in conjunction with embodiments of this disclosure.

[0021] It should be understood that the foregoing description and the following description of this disclosure are examples and are intended to provide further explanation of the claimed disclosure. Attached Figure Description

[0022] The accompanying drawings, which are included to provide a further understanding of this disclosure, are incorporated in and constitute a part of this disclosure. The drawings illustrate aspects and embodiments of this disclosure and, together with the description, serve to explain the principles and examples of this disclosure. In the drawings:

[0023] Figures 1A to 1D This is a schematic plan view of a display device according to an exemplary embodiment of the present disclosure;

[0024] Figure 2 This is a system diagram of a display device according to an exemplary embodiment of the present disclosure;

[0025] Figure 3 This is an equivalent circuit diagram of a sub-pixel in a display panel according to an exemplary embodiment of the present disclosure;

[0026] Figure 4 This is a view illustrating an example of setting sub-pixels of a display area according to an exemplary embodiment of this disclosure;

[0027] Figure 5A This is a view illustrating an example of signal line arrangement in each of a first optical region and a general region according to an exemplary embodiment of the present disclosure;

[0028] Figure 5B This is a view showing an example of signal line arrangement in each of the second optical region and the general region according to an exemplary embodiment of the present disclosure;

[0029] Figure 6This is a schematic plan view of a general area of ​​a display device according to an exemplary embodiment of the present disclosure.

[0030] Figure 7 It is along Figure 6 A cross-sectional view of line AB;

[0031] Figure 8 yes Figure 7 A magnified view of region X;

[0032] Figure 9 This is a schematic plan view of the first optical region of a display device according to an exemplary embodiment of the present disclosure;

[0033] Figure 10 It is along Figure 9 A cross-sectional view taken from line CD;

[0034] Figure 11 yes Figure 10 A magnified view of region Y;

[0035] Figure 12 yes Figure 10 A magnified view of region Z;

[0036] Figure 13 This is a schematic plan view of the mask used to form the second deposition stop layer;

[0037] Figure 14 This is a schematic plan view of the mask used to form the third deposition stop layer;

[0038] Figure 15 This is a table used to compare the efficiency of the light-emitting diode of the display device according to Comparative Example 1 with the efficiency of the light-emitting diode of the display device according to Example 1;

[0039] Figure 16 It is a graph used to compare the transmittance of the second electrode of a light-emitting diode disposed in a normal area and the transmittance of the second electrode of a light-emitting diode disposed in a first optical area of ​​a display device according to an exemplary embodiment of the present disclosure.

[0040] Figure 17 This is a table for comparing the panel transmittance of a normal area and the panel transmittance of a first optical area of ​​a display device according to an example embodiment of the present disclosure;

[0041] Figure 18 This is a schematic plan view of the first optical region of a display device according to another exemplary embodiment of the present disclosure; and

[0042] Figure 19 This is a schematic plan view of the first optical region of a display device according to yet another exemplary embodiment of the present disclosure.

[0043] Throughout the accompanying drawings and detailed embodiments, unless otherwise described, the same reference numerals should be understood to refer to the same elements, features, and structures. For clarity, illustration, and / or convenience, the dimensions, lengths, and thicknesses of layers, regions, and elements, and their depictions, may be exaggerated. Detailed Implementation

[0044] The advantages and features of this disclosure, as well as the methods for achieving these advantages and features, will become clear from the exemplary embodiments described in detail herein in conjunction with the accompanying drawings. However, this disclosure is not limited to the exemplary embodiments disclosed herein, but will be implemented in various forms. The exemplary embodiments are provided by way of example only, enabling those skilled in the art to fully understand the disclosure and scope of this disclosure.

[0045] In the following description, detailed descriptions of well-known methods, functions, structures, or configurations may be omitted for brevity where such descriptions might unnecessarily obscure aspects of this disclosure. Furthermore, repeated descriptions may be omitted for the sake of brevity. The described processing steps and / or the progression of operations are non-limiting examples.

[0046] Apart from steps and / or operations that must occur in a specific order, the order of steps and / or operations is not limited to the order set forth herein and may be changed to occur in an order different from that described herein. In one or more examples, two consecutive operations may be performed substantially simultaneously, or the two operations may be performed in reverse order or in a different order depending on the functions or operations involved.

[0047] Unless otherwise stated, the same reference numerals may always refer to the same elements, even if they are shown in different figures. Unless otherwise stated, the same reference numerals may be used throughout the specification and figures to refer to the same or substantially the same elements. In one or more aspects, unless otherwise stated, the same elements (or elements with the same name) in different figures may have the same or substantially the same function and characteristics. The names of the corresponding elements used in the following explanation are chosen for convenience only and may therefore differ from those used in actual products.

[0048] The advantages and features of this disclosure and its implementation methods are illustrated by referring to the embodiments described in the accompanying drawings. However, this disclosure may be embodied in different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are examples and are provided to make this disclosure thorough and complete, to aid those skilled in the art in understanding the inventive concept, without limiting the scope of protection of this disclosure.

[0049] The shapes, sizes (e.g., dimensions, lengths, widths, heights, thicknesses, positions, radii, diameters, and areas), proportions, ratios, angles, quantities, and number of elements disclosed herein, including those shown in the accompanying drawings, are merely examples, and therefore, this disclosure is not limited to the details shown. However, it should be noted that the relative sizes of the components shown in the accompanying drawings are part of this disclosure.

[0050] When terms such as “comprising,” “having,” “including,” “containing,” “constituting,” “made of,” “formed by,” “composed of,” etc., are used relative to one or more elements (e.g., layers, films, components, electrodes, structures, transistors, segments, members, parts, regions, areas, sections, steps, operations, etc.), one or more additional elements may be added unless terms such as “only” are used. The terminology used in this disclosure is only for describing particular exemplary embodiments and is not intended to limit the scope of this disclosure. Singular terms may include plural forms unless the context clearly indicates otherwise. In one or more examples, an element may be one or more elements unless the context clearly indicates otherwise; and an element may include multiple elements. The word “exemplary” is used to indicate that something is used as an example or illustration. An embodiment is an exemplary embodiment. An aspect is an exemplary aspect. In one or more implementations, “embodiment,” “example,” “aspect,” etc., should not be construed as being preferred or advantageous relative to other implementations. Unless otherwise stated, an embodiment, example, exemplary embodiment, aspect, etc., may refer to one or more embodiments, one or more examples, one or more exemplary embodiments, one or more aspects, etc. Furthermore, the term “may” covers all meanings of the term “can.”

[0051] In one or more respects, unless otherwise expressly stated, components, features, or corresponding information (e.g., grade, range, size, dimension, etc.) are interpreted as including a range of errors or tolerances, even if no explicit description of such a range of errors or tolerances is provided. Ranges of errors or tolerances may be caused by various factors (e.g., process factors, internal or external influences, noise, etc.). When interpreting numerical values, unless otherwise expressly stated, values ​​are interpreted as including a range of errors.

[0052] When any of the terms indicating location or orientation, such as “above,” “on top of,” “over,” “on the top,” “above,” “below,” “above,” “upper part,” “on the upper part,” “on the upper side,” “below,” “lower part,” “on the lower part,” “on the lower side,” “below,” “near,” “adjacent,” “nearby,” “next to,” “at,” or “on one side of,” are used to describe the positional relationship between two elements (e.g., layers, films, components, electrodes, structures, transistors, segments, components, sections, areas, regions, parts, etc.), one or more other elements may be located between the two elements, unless more restrictive terms such as “immediately,” “directly,” or “closely” are used. For example, when any of the foregoing terms are used to describe an element and another element, the description should be interpreted to include cases where the elements are in direct contact with each other and cases where one or more additional elements are positioned or inserted between them. Furthermore, spatial relative terms such as those mentioned above, as well as other terms such as "front," "back," "back," "left," "right," "top," "bottom," "upper," "lower," "downward," "upward," "above," "below," "column," "row," "vertical," "horizontal," and "diagonal," refer to any frame of reference. For example, these terms can be used to illustrate the relative relationships between elements, including any correlations as shown in the figures. However, embodiments of this disclosure are not limited thereto. Spatial relative terms should be understood to include terms related to different orientations of elements in use or operation, in addition to those depicted in the figures or described herein. For example, in the case where a lower element or an element positioned below another element is flipped, that element may be referred to as an upper element or an element positioned above another element. Thus, for example, the terms "below" or "under" can, in meaning, encompass the terms "above" or "above." Example terms such as "below" can include all directions, including "below," "above," and diagonal directions. Similarly, example terms such as "above," "up," and "below" can include all directions, including "above," "up," "below," and diagonal directions.

[0053] When describing temporal relationships, when the temporal order is described as such as "after", "following", "subsequent", "next", "before", "previous", "first", etc., it may include discontinuous or unordered situations, and therefore one or more other events may occur between them, unless more restrictive terms such as "only", "immediately", or "directly" are used.

[0054] It should be understood that although the terms "first," "second," etc., may be used herein to describe various elements (e.g., layer, film, component, electrode, structure, transistor, segment, member, part, region, area, section, step, operation, etc.), these elements should not be limited by these terms, for example, by any particular order, priority, or number of elements. These terms are used only to distinguish one element from another. For example, without departing from the scope of this disclosure, a first element may refer to a second element, and similarly, a second element may refer to a first element. Furthermore, without departing from the scope of this disclosure, first elements, second elements, etc., may be named arbitrarily according to the convenience of those skilled in the art. For clarity, the function or structure of these elements (e.g., first element, second element, etc.) is not limited by the serial number or name preceding the element. Furthermore, a first element may include one or more first elements. Similarly, a second element, etc., may include one or more second elements, etc.

[0055] In describing the elements of this disclosure, the terms “first,” “second,” “A,” “B,” “(a),” “(b),” etc., may be used. These terms are intended to identify the corresponding element from other elements, and are not used to define the nature, basis, order, or number of elements.

[0056] The expression "joined" of an element (e.g., layer, film, component, electrode, structure, transistor, segment, member, part, region, area, section, etc.) with another element can be understood as, for example, that the element can be joined directly or indirectly to the other element. The term "joined" or similar expressions can refer to terms such as "covering," "surrounding," "contacting," "overlapping," "crossing," "intersecting," "connecting," "coupling," "attaching," "adhering," "combining," "linking," "providing," "setting," "interacting," etc. Unless otherwise stated, joining can involve setting or inserting one or more intermediate elements between an element and another element. Furthermore, unless otherwise stated, the element can be joined at least partially or wholly (or completely) with the other element. Additionally, the element can be included in at least one of two or more elements joined together. Similarly, the other element can be included in at least one of two or more elements joined together. When an element joins with another element, at least a portion of the element can be joined with at least a portion of the other element. Depending on the context, the term "having another element" or similar expressions can be understood as "another element" or "having another element, to another element, in another element, or on another element." Similarly, depending on the context, the term "each other" can be understood as "mutual" or "between each other, between each other, mutually".

[0057] The phrase “through” can be understood as, for example, at least partially through or completely through.

[0058] Terms such as “line” or “direction” should not be interpreted solely based on the geometric relationship of the corresponding line or direction relative to each other—that they are parallel, perpendicular, diagonal, or inclined—and may mean a line or direction with a wider range of directional characteristics within the functional scope of the components of this disclosure. For example, terms such as first direction, second direction, row direction, column direction, front direction, back direction, horizontal direction, vertical direction, etc., should not be interpreted solely based on the geometric relationship of the corresponding direction relative to each other—that they are parallel, perpendicular, diagonal, or inclined—and may mean a direction with a wider range of directional characteristics within the functional scope of the components of this disclosure.

[0059] The term “at least one” should be understood to include any and all combinations of one or more of the associated listed items. For example, each of the phrases “at least one of the first, second, or third items” and “at least one of the first, second, and third items” can mean (i) a combination of two or more items provided by the first, second, and third items, or (ii) only one of the first, second, or third items. Furthermore, “at least one of a plurality of elements” can mean (i) one element of a plurality of elements, (ii) some elements of a plurality of elements, or (iii) all elements of a plurality of elements. Additionally, “at least some,” “some,” “at least some parts,” “at least some portions,” “at least a portion,” “at least one or more parts,” “at least one copy,” “at least one copy or more copies,” “at least some elements,” “one or more,” etc., in the context of a plurality of elements can mean (i) one element of a plurality of elements, (ii) a portion (or one copy) of a plurality of elements, (iii) one or more portions (or copies) of a plurality of elements, (iv) one or more elements of a plurality of elements, (v) a plurality of elements of a plurality of elements, or (vi) all a plurality of elements. In addition, the terms “at least some,” “some,” “at least some parts,” “at least some portions,” “at least a portion,” “at least one or more parts,” “at least one copy,” “at least one or more copies,” etc., in the context of an element can mean (i) a part (or copy) of an element, (ii) one or more parts (or copies) of an element, (iii) an element, or (iv) all parts of an element.

[0060] The expressions "first element," "second element," and " / or" "third element" should be understood as any one of the first, second, and third elements, or any or all combinations of the first, second, and third elements. A similar interpretation applies to the use of "and / or" for two or more elements. For example, A, B, and / or C can refer to: only A; only B; only C; any one of A, B, and C (e.g., A, B, or C); some combination of A, B, and C (e.g., A and B; A and C; or B and C); or all of A, B, and C. Furthermore, the expression "A / B" can be understood as A and / or B. For example, the expression "A / B" can refer to: only A; only B; A or B; or A and B.

[0061] In one or more respects, unless otherwise stated, the terms "between" and "among" may be used interchangeably for convenience only. For example, the expression "between multiple elements" can be understood as "among multiple elements." In another example, the expression "among multiple elements" can be understood as "between multiple elements." In one or more examples, the number of elements may be two. In one or more examples, the number of elements may be more than two. Furthermore, when an element is referred to as being "between" at least two elements, the element may be the only element among the at least two elements, or there may be one or more intermediate elements.

[0062] In one or more respects, unless otherwise stated, the phrases “each other” and “mutually” may be used interchangeably for convenience only. For example, the expression “different from each other” can be understood as “different from each other”. In another example, the expression “different from each other” can be understood as “different from each other”. In one or more examples, the number of elements involved in the foregoing expression may be two. In one or more examples, the number of elements involved in the foregoing expression may be more than two.

[0063] In one or more respects, unless otherwise stated, the phrases “one or more of…” and “one or more of…” may be used interchangeably for convenience only. In one or more respects, unless otherwise stated, the term “n” may refer to “the nth” (e.g., the second, where n is 2) or “the nth” (e.g., the third, where n is 3), and n may be a natural number or an integer.

[0064] The term "or" means "inclusive or" rather than "exclusive or." That is, unless otherwise stated or clearly understood from the context, the expression "x uses a or b" implies any of the naturally inclusive permutations. For example, "a or b" could mean "a," "b," or "a and b." Similarly, "a, b, or c" could mean "a," "b," "c," "a and b," "b and c," "a and c," or "a, b, and c."

[0065] The phrases “substantially identical” or “nearly identical” can indicate the degree to which they are considered equivalent, taking into account minor differences caused by errors in the manufacturing process.

[0066] Features of the various embodiments of this disclosure may be partially or completely coupled or combined with each other, may be technically associated with each other, and may operate, link, or drive together in various ways. Embodiments of this disclosure may be implemented or performed independently of each other, or may be implemented or performed together in a mutually dependent or related relationship. In one or more aspects, components of each device and apparatus according to the various embodiments of this disclosure are operatively coupled and configured.

[0067] Unless otherwise defined, the terms used herein (including technical and scientific terms) have the same meaning as commonly understood by one of ordinary skill in the art to which the exemplary embodiments pertain. It should also be understood that terms such as those defined in common dictionaries should be interpreted as having a meaning consistent with, for example, their meaning in the context of the relevant field, and should not be interpreted in an idealized or overly formal sense unless expressly defined herein.

[0068] The terminology used herein has been chosen to be common in the relevant art; however, other terms may exist depending on technological development and / or changes, conventions, the preferences of those skilled in the art, etc. Therefore, the terminology used herein should not be construed as limiting the technical concept, but rather as examples of terms used to describe exemplary embodiments.

[0069] Furthermore, in certain circumstances, the terminology may be arbitrarily chosen by the applicant, and in such cases, its detailed meaning is described herein. Therefore, the terminology used herein should be understood not only based on its name, but also on its meaning and content.

[0070] In the following description, various exemplary embodiments of the present disclosure are described in more detail with reference to the accompanying drawings. Reference numerals for elements in each drawing may indicate the same or similar elements in other drawings, and unless otherwise stated, the same reference numerals may refer to the same or similar elements. The same or similar elements may be represented by the same reference numerals even if they are depicted in different drawings. For brevity, repeated descriptions of the same or similar elements may be omitted, and unless otherwise stated, the descriptions provided for elements in one or more drawings may also apply to elements in other drawings using the same or similar reference numerals. Furthermore, for ease of description, the scale, size, dimensions, and thickness of each element shown in the drawings may differ from the actual scale, size, dimensions, and thickness; therefore, embodiments of the present disclosure are not limited to the scale, size, dimensions, and thickness shown in the drawings.

[0071] Figures 1A to 1D This is a schematic plan view of a display device according to an exemplary embodiment of the present disclosure.

[0072] refer to Figures 1A to 1D The display device 100 according to an example embodiment of the present disclosure may include a display panel DP for displaying images and one or more optical electronic devices 170, 170a and 170b. The optical electronic devices 170, 170a and 170b may include light receiving devices, such as cameras or sensors, for receiving light.

[0073] Display panel (DP) is a panel used to display images to the user.

[0074] A display panel (DP) may include display elements for displaying images, driving elements for driving the display elements, and wiring for transmitting various signals to the display elements and driving elements. The display elements can be defined differently depending on the type of display panel (DP). For example, when the display panel (DP) is an organic light-emitting display panel, the display elements may be organic light-emitting diodes (OLEDs) comprising a first electrode (anode or cathode), an organic layer, and a second electrode (cathode or anode).

[0075] For example, when the display panel DP is a liquid crystal display panel, the display element can be a liquid crystal display element. Furthermore, the display device 100 according to an example embodiment of this disclosure can be a flexible display device.

[0076] In the following text, even if the display panel DP is assumed to be an organic light-emitting display panel, the display panel DP is not limited to organic light-emitting display panels.

[0077] Meanwhile, the display panel DP can be configured to include a substrate, multiple insulating films on the substrate, a transistor layer, and a light-emitting diode layer.

[0078] The display panel (DP) may include multiple sub-pixels for displaying images and various signal lines for driving the multiple sub-pixels.

[0079] The display panel DP can include a display area DA for displaying images and a non-display area NDA for not displaying images.

[0080] Within a display area DA, multiple sub-pixels that constitute multiple pixels and circuitry for driving these sub-pixels can be configured. Multiple sub-pixels are the smallest unit for constructing the display area DA, and display elements can be located within each of these sub-pixels. Multiple sub-pixels can construct a pixel.

[0081] For example, an organic light-emitting diode that may include a first electrode, an organic layer, and a second electrode may be disposed in each of a plurality of sub-pixels, but is not limited thereto.

[0082] Furthermore, the circuitry used to drive multiple sub-pixels may include driving elements and wiring. For example, the circuitry may be configured with thin-film transistors, storage capacitors, gate lines, and data lines, but is not limited to these.

[0083] The non-display area NDA is bent to prevent it from being seen from the front surface or blocked by the housing (not shown), and is also referred to as the border area.

[0084] In the non-display area NDA, various wiring and circuits can be set up to drive the organic light-emitting diodes in the display area DA.

[0085] For example, in the non-display area NDA, multiple sub-pixels and circuitry connecting lines, in-panel gate (GIP) lines, or driver ICs (such as gate driver ICs or data driver ICs) can be provided to transmit signals to the display area DA, but are not limited to these.

[0086] Despite Figures 1A to 1D The image shows a non-display area NDA surrounding a quadrilateral display area DA, but the shape and placement of the display area DA and the non-display area NDA are not limited to these examples. Figures 1A to 1D The example shown. The display area DA and the non-display area NDA can have shapes suitable for the design of an electronic device including the display device 100. For example, an example shape of the display area DA can be a pentagon, hexagon, circle, or ellipse.

[0087] The display device 100 may also include additional elements associated with functions other than driving pixels. For example, the display device 100 may also include additional elements providing touch sensing functions, user authentication functions (e.g., fingerprint recognition), multi-level pressure sensing functions, or haptic feedback functions. The aforementioned additional elements may be located in the non-display area NDA and / or in external circuitry connected to the connection interface.

[0088] refer to Figures 1A to 1D In the display device 100 according to an exemplary embodiment of the present disclosure, one or more optical electronic devices 170, 170a and 170b may be electronic components located below the display panel DP (opposite to the viewing surface).

[0089] Light enters the front surface (viewing surface) of the display panel DP and passes through the display panel DP to be transmitted to one or more optoelectronic devices 170, 170a and 170b located below the display panel DP (opposite to the viewing surface).

[0090] One or more optical electronic devices 170, 170a and 170b may be devices for receiving light passing through the display panel DP to perform a predetermined function according to the received light.

[0091] For example, optical electronic devices 170, 170a and 170b may include one or more of an image capturing device such as a camera (image sensor) and a sensing sensor such as an illumination sensor and a proximity sensor.

[0092] refer to Figures 1A to 1D In a display device 100 according to an example embodiment of the present disclosure, the display area DA may include a normal area NA and one or more optical areas DA1 and DA2.

[0093] One or more optical regions DA1 and DA2 may be regions that overlap with one or more optoelectronic devices 170, 170a and 170b.

[0094] according to Figure 1A For example, the display area DA may include a general area NA and a first optical area DA1. Here, at least a portion of the first optical area DA1 may overlap with the first optoelectronic device 170.

[0095] Despite Figure 1A The diagram shows a circular structure of the first optical region DA1, but the shape of the first optical region DA1 according to an exemplary embodiment of this disclosure is not limited thereto. For example, as shown... Figure 1B As shown, the first optical region DA1 can have an octagonal shape, and can also be formed by various polygonal shapes.

[0096] according to Figure 1C For example, the display area DA can include a normal area NA, a first optical area DA1, and a second optical area DA2. Figure 1C In the example, the general region NA can be located between the first optical region DA1 and the second optical region DA2. Here, at least a portion of the first optical region DA1 can overlap with the first optoelectronic device 170a, and at least a portion of the second optical region DA2 can overlap with the second optoelectronic device 170b.

[0097] according to Figure 1D For example, the display area DA can include a normal area NA, a first optical area DA1, and a second optical area DA2. Figure 1D In the example, the ordinary region NA is not positioned between the first optical region DA1 and the second optical region DA2. That is, the first optical region DA1 and the second optical region DA2 can be in contact with each other. Here, at least a portion of the first optical region DA1 can overlap with the first optoelectronic device 170a, and at least a portion of the second optical region DA2 can overlap with the second optoelectronic device 170b.

[0098] In one or more optical regions DA1 and DA2, an image display structure and an optical transmission structure need to be formed.

[0099] In other words, one or more optical regions DA1 and DA2 are local regions of display region DA, such that sub-pixels for displaying images need to be set in one or more optical regions DA1 and DA2. Light transmission structures for transmitting light to one or more optical electronic devices 170, 170a, and 170b need to be formed in one or more optical regions DA1 and DA2.

[0100] One or more optoelectronic devices 170, 170a and 170b are devices that need to receive light but are located behind (below, on the opposite side of the viewing surface) the display panel DP to receive light passing through the display panel DP.

[0101] One or more optoelectronic devices 170, 170a, and 170b are not exposed on the front surface (viewing surface) of the display panel DP. Therefore, when the user sees the front surface of the display device 100, the user cannot see the optoelectronic devices 170, 170a, and 170b.

[0102] For example, the first optical electronic devices 170 and 170a may be cameras, and the second optical electronic device 170b may be a sensing sensor, such as a proximity sensor or a lighting sensor. For example, the sensing sensor may be an infrared sensor that senses infrared light.

[0103] Conversely, the first optical electronics 170 and 170a can be sensing sensors, and the second optical electronics 170b can be a camera.

[0104] In the following description, for ease of description, examples will be given of first optical electronic devices 170 and 170a being cameras and second optical electronic device 170b being a sensing sensor. Here, the camera may be a camera lens or an image sensor.

[0105] If the first optical electronic devices 170 and 170a are cameras, then the camera can be a front-side camera located behind (below) the display panel DP, but capturing the front direction of the display panel DP. Therefore, the user can take pictures using a camera that is not visible from the viewing surface while looking at the viewing surface of the display panel DP.

[0106] The display area DA includes a general area NA and one or more optical areas DA1 and DA2, which are areas where images can be displayed. The general area NA is an area that does not require the formation of a light transmission structure, while the one or more optical areas DA1 and DA2 are areas that require the formation of a light transmission structure.

[0107] Therefore, one or more optical regions DA1 and DA2 need to have a predetermined level or higher transmittance, while the ordinary region NA has no light transmittance or has a transmittance below the predetermined level.

[0108] For example, one or more optical regions DA1 and DA2 and a general region NA can have different resolutions, subpixel placement structures, number of subpixels per unit area, electrode structures, line structures, electrode placement structures, or line placement structures.

[0109] For example, the number of subpixels per unit area in one or more optical regions DA1 and DA2 can be less than the number of subpixels per unit area in a normal region NA. In other words, the resolution of one or more optical regions DA1 and DA2 can be lower than the resolution of the normal region NA. In this case, the number of subpixels per unit area is a unit of measurement for resolution and can also be referred to as pixels per inch (PPI), which indicates the number of pixels per inch.

[0110] For example, the number of sub-pixels per unit area in the first optical region DA1 can be less than the number of sub-pixels per unit area in the ordinary region NA. Furthermore, the number of sub-pixels per unit area in the second optical region DA2 can be equal to or greater than the number of sub-pixels per unit area in the first optical region DA1.

[0111] The first optical region DA1 can have various shapes, such as circular, elliptical, rectangular, hexagonal, or octagonal. The second optical region DA2 can also have various shapes, such as circular, elliptical, rectangular, hexagonal, or octagonal. The first optical region DA1 and the second optical region DA2 can have the same shape or different shapes.

[0112] refer to Figure 1D When the first optical region DA1 and the second optical region DA2 are in contact with each other, the entire optical region including the first optical region DA1 and the second optical region DA2 can have various shapes, such as circles, ellipses, rectangles, hexagons or octagons.

[0113] In the following text, for ease of description, an example will be given where the first optical region DA1 and the second optical region DA2 are circular.

[0114] In the display device 100 according to an exemplary embodiment of the present disclosure, when the first optical electronic devices 170 and 170b hidden under the display panel DP and not exposed to the outside are cameras, the display device 100 according to the exemplary embodiment of the present disclosure may be referred to as a display applying under-display camera (UDC) technology.

[0115] By doing so, in the display device 100 according to the example embodiment of the present disclosure, it is not necessary to form a notch or camera hole for exposing the camera in the display panel DP, so that the area of ​​the display area DA is not reduced.

[0116] Therefore, there is no need to form notches or camera holes for exposing the camera in the display panel DP, which reduces the size of the bezel area and increases design freedom by eliminating design constraints.

[0117] In the display device 100 according to an exemplary embodiment of the present disclosure, even if one or more optical electronic devices 170, 170a and 170b are hidden behind the display panel DP, the one or more optical electronic devices 170, 170a and 170b still need to receive light normally in order to perform the defined functions normally.

[0118] Furthermore, in the display device 100 according to an example embodiment of the present disclosure, even if one or more optical electronic devices 170, 170a and 170b are hidden behind the display panel DP and overlap with the display area DA, the image needs to be displayed normally in one or more optical areas DA1 and DA2 in the display area DA that overlap with one or more optical electronic devices 170, 170a and 170b.

[0119] Therefore, the display device 100 according to an example embodiment of the present disclosure may have a structure that improves the transmittance of a first optical region DA1 and a second optical region DA2 that overlap with the optoelectronic devices 170, 170a and 170b.

[0120] Figure 2 This is a system diagram of a display device according to an exemplary embodiment of the present disclosure.

[0121] refer to Figure 2 The display device 100 may include a display panel DP and a display driving circuit as components for displaying images. The display driving circuit is a circuit for driving the display panel DP, and may include a data driving circuit DDC, a gate driving circuit GDC, a display controller DCTR, etc.

[0122] The display panel DP can include a display area DA for displaying images and a non-display area NDA for not displaying images.

[0123] The non-display area NDA can be the outer periphery of the display area DA, and can also be referred to as the border area. All or part of the non-display area NDA can be an area visible from the front surface of the display device 100, or an area that is bent so that it cannot be seen from the front surface of the display device 100.

[0124] The display panel DP may include a substrate SUB and multiple sub-pixels SP disposed on the substrate SUB. Furthermore, the display panel DP may also include various types of signal lines to drive the multiple sub-pixels SP.

[0125] The structure of the multiple sub-pixels SP can vary depending on the type of display device 100. For example, when the display device 100 is a self-emitting display device in which the sub-pixels SP emit their own light, each sub-pixel SP may include a self-emitting device, one or more transistors, and one or more capacitors.

[0126] Various types of signal lines can include multiple data lines DL that transmit data signals (also known as data voltages or image signals) and multiple gate lines GL that transmit gate signals (also known as scan signals).

[0127] Multiple data lines DL and multiple gate lines GL may intersect each other. Each of the multiple data lines DL may be configured to extend in a first direction. Each of the multiple gate lines GL may be configured to extend in a second direction. Here, the first direction may be a column direction, and the second direction may be a row direction. Alternatively, the first direction may be a row direction, and the second direction may be a column direction.

[0128] The data driver circuit (DDC) is used to drive multiple data lines (DL) and can output data signals to multiple data lines (DL). The gate driver circuit (GDC) is used to drive multiple gate lines (GL) and can output gate signals to multiple gate lines (GL).

[0129] The display controller DCTR is a device used to control the data drive circuit DDC and the gate drive circuit GDC, and can control the driving timing of multiple data lines DL and multiple gate lines GL.

[0130] The display controller DCTR supplies the data drive control signal DCS, which is used to control the data drive circuit DDC, to the data drive circuit DDC, and can also supply the gate drive control signal GCS, which is used to control the gate drive circuit GDC, to the gate drive circuit GDC.

[0131] The display controller DCTR receives input image data from the host system HSYS, and supplies image data Data to the data drive circuit DDC based on the input image data.

[0132] A display device 100 according to an example embodiment of the present disclosure may include a touch sensor and a touch sensing circuit, thereby providing not only image display functionality but also touch sensing functionality. The touch sensing circuit senses the touch sensor to detect whether a touch object (e.g., a finger or pen) is being touched or to detect the touch location.

[0133] The touch sensing circuit may also include a touch driving circuit and a touch controller. The touch driving circuit drives and senses the touch sensor to generate and output touch sensing data, and the touch controller senses the touch to generate or use the touch sensing data to detect the touch position.

[0134] A touch sensor may include multiple touch electrodes. A touch sensor may also include multiple touch lines that electrically connect the multiple touch electrodes and touch driving circuitry.

[0135] The touch sensor can be placed outside the display panel (DP) as a touch panel, or it can be placed inside the display panel (DP).

[0136] When a touch sensor is positioned externally to the display panel (DP) as a touch panel type, the touch sensor is referred to as an external type. When the touch sensor is external, the touch panel and the display panel (DP) are manufactured separately for assembly during the assembly process. An external type touch panel may include a substrate for the touch panel and multiple touch electrodes on the substrate for the touch panel.

[0137] When a touch sensor is placed in a display panel (DP), the touch sensor can be formed on a substrate (SUB) together with signal lines and electrodes related to display driving during the manufacturing process of the display panel (DP).

[0138] The touch driver circuit and touch controller included in the touch sensing circuit can be implemented as separate devices or as a single device. Furthermore, the touch driver circuit and data driver circuit (DDC) can be implemented as separate devices or as a single device.

[0139] In addition, the display device 100 may also include a power supply circuit that supplies various powers to the display driving circuit and / or touch sensing circuit.

[0140] The display device 100 according to the example embodiments of this disclosure may be a mobile terminal such as a smartphone or tablet computer, or may be a monitor or television of various sizes, but is not limited thereto, and may be a display device of various types or sizes that expresses information or images.

[0141] As described above, in a display panel DP, the display area DA may include a normal area NA and one or more optical areas DA1 and DA2.

[0142] The ordinary region NA and one or more optical regions DA1 and DA2 are regions capable of displaying images. However, the ordinary region NA is a region that does not require the formation of a light transmission structure, while the one or more optical regions DA1 and DA2 are regions that require the formation of a light transmission structure.

[0143] In the following text, for ease of description, it is assumed that the display area DA includes both the first optical area DA1 and the second optical area DA2 (see Figure 1C and Figure 1D ).

[0144] Figure 3 This is an equivalent circuit diagram of a sub-pixel in a display panel according to an exemplary embodiment of the present disclosure.

[0145] Each sub-pixel SP in the display area DA of the display panel DP, including the normal area NA, the first optical area DA1, and the second optical area DA2, may include a light-emitting diode ED, a driving transistor DTR, a scanning transistor SCT, and a storage capacitor Cst. The driving transistor DTR drives the light-emitting diode ED, and the scanning transistor SCT transmits the data voltage VDATA to the first node N1 of the driving transistor DTR. The storage capacitor Cst maintains a constant voltage within one frame.

[0146] The driving transistor DRT may include a first node N1 to which a data voltage is applied, a second node N2 electrically connected to a light-emitting diode ED, and a third node N3 to which a driving voltage ELVDD is applied from the driving voltage line DVL. In the driving transistor DRT, the first node N1 is the gate node, the second node N2 may be a source node or a drain node, and the third node N3 may be a drain node or a source node.

[0147] A light-emitting diode (ED) may include a first electrode 121, an organic layer 122, and a second electrode 123. The first electrode 121 may be an anode electrode disposed in each sub-pixel SP and electrically connected to the second node N2 of the driving transistor DRT of each sub-pixel SP. The second electrode 123 may be a cathode electrode typically disposed in multiple sub-pixels SP and may be subjected to a ground voltage ELVSS.

[0148] The scanning transistor SCT is controlled to be turned on or off by the scanning signal SCAN, which is a gate signal applied through the gate line GL. The scanning transistor SCT can be electrically connected between the first node N1 of the driving transistor DRT and the data line DL.

[0149] The storage capacitor Cst can be electrically connected between the first node N1 and the second node N2 of the driving transistor DRT.

[0150] like Figure 3 As shown, each sub-pixel SP can have a 2T (transistor) 1C (capacitor) structure including two transistors DRT and SCT and a capacitor Cst, and in some cases, it can further include one or more transistors or one or more capacitors.

[0151] Each of the driving transistor DRT and the scanning transistor SCT can be an n-type transistor or a p-type transistor.

[0152] The circuit elements (specifically, light-emitting diodes, EDs) in each sub-pixel SP are susceptible to external moisture or oxygen. Therefore, an encapsulation layer ENCAP, used to suppress the penetration of external moisture or oxygen into the circuit elements (specifically, light-emitting diodes, EDs), can be provided on the display panel DP. The encapsulation layer ENCAP can be configured to cover the light-emitting diodes, EDs.

[0153] Meanwhile, as a method to increase the transmittance of at least one of the first optical region DA1 and the second optical region DA2, a pixel density differential design method can be applied.

[0154] According to the pixel density differential design method, the display panel DP can be designed such that the number of sub-pixels per unit area of ​​at least one of the first optical region DA1 and the second optical region DA2 is less than the number of sub-pixels per unit area of ​​the ordinary region NA.

[0155] Meanwhile, in some cases, instead, as another method to increase the transmittance of at least one of the first optical region DA1 and the second optical region DA2, the pixel size differential design method can be applied.

[0156] According to the pixel size differential design method, the display panel DP can be designed such that the number of sub-pixels per unit area of ​​at least one of the first optical region DA1 and the second optical region DA2 is equal to or similar to the number of sub-pixels per unit area of ​​the normal region NA. However, the size of each sub-pixel SP (i.e., the emission area size) set in at least one of the first optical region DA1 and the second optical region DA2 is smaller than the size of each sub-pixel SP (i.e., the emission area size) set in the normal region NA.

[0157] In the following text, for ease of description, it is assumed that the pixel density differential design method is applied between the two methods (pixel density differential design method and pixel size differential design method) used to increase the transmittance of at least one of the first optical region DA1 and the second optical region DA2.

[0158] Figure 4 This is a view showing an example of setting sub-pixels of a display area according to an exemplary embodiment of this disclosure.

[0159] Figure 4 The placement of subpixels SP in three regions NA, DA1, and DA2 included in the display area DA of a display panel, according to an example embodiment of the present disclosure, is shown.

[0160] refer to Figure 4 Multiple sub-pixels SP can be set in the ordinary area NA, the first optical area DA1, and the second optical area DA2 included in the display area.

[0161] For example, multiple sub-pixels SP may include a red sub-pixel Red SP that emits red light, a green sub-pixel Green SP that emits green light, and a blue sub-pixel Blue SP that emits blue light.

[0162] Therefore, each of the ordinary region NA, the first optical region DA1, and the second optical region DA2 may include the emission region EA of the red sub-pixel Red SP, the emission region EA of the green sub-pixel Green SP, and the emission region EA of the blue sub-pixel Blue SP.

[0163] exist Figure 4 Although the illustration shows multiple green subpixels (Green SPs) with different emission regions (EAs), this disclosure is not limited thereto. For example, all emission regions (EAs) of multiple green subpixels (Green SPs) may have the same orientation.

[0164] refer to Figure 4 The ordinary region NA does not include optical transmission structures, but it may include the transmission region EA.

[0165] Conversely, the first optical region DA1 and the second optical region DA2 include not only the emission region EA, but also the optical transmission structure.

[0166] Therefore, the first optical region DA1 may include the emission region EA and the first transmission region TA1, and the second optical region DA2 may include the emission region EA and the second transmission region TA2.

[0167] The emitting region EA and the transmitting regions TA1 and TA2 can be distinguished based on the amount of light that can be transmitted. For example, the emitting region EA is the region that transmits less light than the transmitting regions TA1 and TA2.

[0168] Furthermore, the emitting region EA and the transmitting regions TA1 and TA2 can be distinguished based on whether a specific metal layer is formed. Additionally, a light-shielding layer is formed in the emitting region EA (if the light-shielding layer is a metal layer), while no light-shielding layer is formed in the transmitting regions TA1 and TA2.

[0169] The first optical region DA1 includes a first transmission region TA1, and the second optical region DA2 includes a second transmission region TA2, such that light can pass through both the first optical region DA1 and the second optical region DA2.

[0170] The transmittance (transmittance) of the first optical region DA1 and the transmittance (transmittance) of the second optical region DA2 can be equal.

[0171] In this case, the first transmission region TA1 of the first optical region DA1 and the second transmission region TA2 of the second optical region DA2 can have the same shape or the same size. Alternatively, even if the first transmission region TA1 of the first optical region DA1 and the second transmission region TA2 of the second optical region DA2 have different shapes or sizes, the ratio of the first transmission region TA1 in the first optical region DA1 and the ratio of the second transmission region TA2 in the second optical region DA2 can be equal.

[0172] Conversely, the transmittance of the first optical region DA1 and the transmittance of the second optical region DA2 can be different from each other.

[0173] In this case, the first transmission region TA1 of the first optical region DA1 and the second transmission region TA2 of the second optical region DA2 can have different shapes or sizes. Alternatively, even if the first transmission region TA1 of the first optical region DA1 and the second transmission region TA2 of the second optical region DA2 have the same shape or size, the ratio of the first transmission region TA1 in the first optical region DA1 and the ratio of the second transmission region TA2 in the second optical region DA2 can be different.

[0174] For example, when the first optical electronic device overlapping the first optical region DA1 is a camera and the second optical electronic device overlapping the second optical region DA2 is a sensing sensor, the amount of light required by the camera may be greater than the amount of light required by the sensing sensor.

[0175] Therefore, the transmittance of the first optical region DA1 can be higher than that of the second optical region DA2.

[0176] In this case, the size of the first transmission region TA1 of the first optical region DA1 can be larger than the size of the second transmission region TA2 of the second optical region DA2. Alternatively, even if the first transmission region TA1 of the first optical region DA1 and the second transmission region TA2 of the second optical region DA2 have the same size, the percentage of the first transmission region TA1 in the first optical region DA1 can be higher than the percentage of the second transmission region TA2 in the second optical region DA2.

[0177] In the following text, for ease of description, an example will be given in which the transmittance of the first optical region DA1 is higher than that of the second optical region DA2.

[0178] In the example embodiments of this disclosure, Figure 4 The transmissive regions TA1 and TA2 shown can also be referred to as transparent regions, and the transmittance can also be referred to as transparency.

[0179] In the example embodiments of this disclosure, such as Figure 4 As shown, it is assumed that the first optical region DA1 and the second optical region DA2 are located at the upper end of the display area of ​​the display panel and are horizontally parallel to each other.

[0180] refer to Figure 4 The horizontal display area having a first optical region DA1 and a second optical region DA2 is referred to as the first horizontal display area HA1. Furthermore, the horizontal display area without the first optical region DA1 and the second optical region DA2 is referred to as the second horizontal display area HA2.

[0181] The first horizontal display area HA1 may include a normal area NA, a first optical area DA1, and a second optical area DA2. Conversely, the second horizontal display area HA2 may include only the normal area NA.

[0182] Figure 5A This is a view illustrating an example of signal line arrangement in each of a first optical region and a general region according to an exemplary embodiment of the present disclosure.

[0183] Figure 5B This is a view showing an example of signal line arrangement in each of the second optical region and the general region according to an exemplary embodiment of the present disclosure.

[0184] Figure 5A The placement of signal lines in each of the first optical region DA1 and the ordinary region NA in a display panel DP according to an example embodiment of the present disclosure is shown. Figure 5B The placement of signal lines in each of the second optical region DA2 and the normal region NA in a display panel DP, according to an example embodiment of the present disclosure, is shown.

[0185] exist Figure 5A The image shows a portion of a first horizontal display area HA1, a portion of a second horizontal display area HA2, and a portion of a first optical area DA1. Figure 5B The image shows a portion of a first horizontal display area HA1, a portion of a second horizontal display area HA2, and a portion of a second optical area DA2. Furthermore, as shown... Figure 5A and Figure 5B As shown, the first horizontal display area HA1 includes a normal area, a first optical area DA1, and a second optical area DA2, and the second horizontal display area HA2 may include the normal area.

[0186] In the display panel DP, various types of horizontal lines HL1 and HL2, as well as vertical lines VLn, VL1, and VL2 can be set.

[0187] In the exemplary embodiments of this disclosure, the horizontal and vertical directions refer to two intersecting directions, and the horizontal and vertical directions can vary depending on the viewing direction. For example, in the exemplary embodiments of this disclosure, the horizontal direction refers to the direction in which a gate line extends to be positioned, and the vertical direction refers to the direction in which a data line extends to be positioned.

[0188] refer to Figure 5A and Figure 5B The horizontal lines set in the display panel DP may include a first horizontal line HL1 set in the first horizontal display area HA1 and a second horizontal line HL2 set in the second horizontal display area HA2. In this case, the first horizontal line HL1 and the second horizontal line HL2 can be gate lines. Depending on the structure of the sub-pixels, the gate lines can include various types of gate lines.

[0189] refer to Figure 5A and Figure 5B The vertical lines set in the display panel DP may include a general vertical line VLn set only in the general area, a first vertical line VL1 passing through both the first optical area DA1 and the general area, and a second vertical line VL2 passing through both the second optical area DA2 and the general area.

[0190] refer to Figure 4 and Figure 5A The first optical region DA1, included in the first horizontal region HA1, may include an emission region EA and a first transmission region TA1. The outer region of the first transmission region TA1 within the first optical region DA1 may include the emission region EA.

[0191] refer to Figure 5A To improve the transmittance of the first optical region DA1, the first horizontal line HL1 passing through the first optical region DA1 can pass through while avoiding the first transmission region TA1 in the first optical region DA1. Therefore, each first horizontal line HL1 passing through the first optical region DA1 may include an arc-shaped segment or a curved segment that detours outside the outer edge of the first transmission region TA1.

[0192] Furthermore, in order to improve the transmittance of the first optical region DA1, the first vertical line VL1 passing through the first optical region DA1 can pass through while avoiding the first transmission region TA1 in the first optical region DA1. Therefore, each first vertical line VL1 passing through the first optical region DA1 may include an arc-shaped segment or a curved segment that detours outside the outer edge of the first transmission region TA1.

[0193] refer to Figure 5A The emission region can be positioned between two adjacent first transmission regions TA1 in the first optical region DA1 within the first horizontal region HA1. The emission region can also be positioned between two adjacent first transmission regions in the first optical region DA1 within the first horizontal region HA1.

[0194] refer to Figure 4 and Figure 5B The second optical region DA2, included in the first horizontal region HA1, may include an emission region EA and a second transmission region TA2. The outer region of the second transmission region TA2 in the second optical region DA2 may include the emission region EA.

[0195] like Figure 5B As shown, the positions and placement of the emission region EA and the second transmission region TA2 in the second optical region DA2 can differ from those of other regions. Figure 5A The position and placement of the emission region EA and the first transmission region TA1 in the first optical region DA1.

[0196] However, in another example, the position and placement of the emission region EA and the second transmission region TA2 in the second optical region DA2 can be equal to... Figure 5A The position and placement of the emission region EA and the first transmission region TA1 in the first optical region DA1.

[0197] Furthermore, in order to improve the transmittance of the second optical region DA2, the second vertical line VL2 passing through the second optical region DA2 can pass through while avoiding the second transmission region TA2 within the second optical region DA2. For example... Figure 5B As shown, the second vertical line VL2 passing through the second optical region DA2 may include an arc-shaped segment or a curved segment that meanders beyond the outer edge of the second transmission region TA2. Therefore, the second vertical line VL2 passing through the second optical region DA2 and the ordinary vertical line VLn that does not pass through the second optical region DA2 and is located in the ordinary region can have different shapes or lengths.

[0198] The first optical region DA1, which at least partially overlaps with the first optical electronic device 170a, includes a plurality of first transmission regions TA1, and the second optical region DA2, which at least partially overlaps with the second optical electronic device 170b, includes a plurality of second transmission regions TA2. Therefore, the number of sub-pixels connected to the first horizontal line HL1 that passes through the first optical region DA1 and the second optical region DA2 is different from the number of sub-pixels connected to the second horizontal line HL2 that does not pass through the first optical region DA1 and the second optical region DA2, but is only located in the ordinary region NA.

[0199] In other words, the number of sub-pixels per unit area in the first optical region DA1 and the second optical region DA2 can be less than that in the ordinary region NA.

[0200] In the following text, reference will be made to Figure 6-12 The planar structure of the ordinary region NA and the first optical region DA1 of the display device 100 according to an exemplary embodiment of the present disclosure is described in detail.

[0201] Figure 6 This is a schematic plan view of a general area of ​​a display device according to an exemplary embodiment of the present disclosure.

[0202] Figure 7 It is along Figure 6 The cross-sectional view taken from line AB.

[0203] refer to Figure 6 and Figure 7 The display device 100 may include a normal area NA.

[0204] A normal region (NA) can include multiple emission regions (EA) and a non-emission region (NEA) that surrounds the multiple emission regions (EA).

[0205] Multiple emission areas EA can include the emission area EA of the red sub-pixel Red SP, the emission area EA of the green sub-pixel Green SP, and the emission area EA of the blue sub-pixel Blue SP.

[0206] Multiple emission regions EA set in the normal region NA and the first optical region DA1 can be set to be spaced apart from each other.

[0207] At least two of the emission regions EA of the red sub-pixel Red SP, the green sub-pixel Green SP, and the blue sub-pixel Blue SP can have different shapes and areas.

[0208] For example, the emission area EA of the red subpixel Red SP and the emission area EA of the blue subpixel Blue SP can have a quadrilateral shape on a flat surface, and the emission area EA of the green subpixel Green SP can have an elliptical shape on a flat surface. However, the shapes of multiple emission areas EA are not limited to these.

[0209] Furthermore, the area of ​​the emission region EA of a blue sub-pixel (Blue SP) can be larger than the area of ​​the emission region EA of a red sub-pixel (Red SP) and the emission region EA of a green sub-pixel (Green SP). The area of ​​the emission region EA of a green sub-pixel (Green SP) can also be larger than the area of ​​the emission region EA of a red sub-pixel (Red SP). However, the areas of multiple emission regions EA are not limited to this.

[0210] Multiple emission zones (EAs) set in the general area can be configured to be spaced apart from each other.

[0211] In multiple emission regions EA set in the normal region NA, the emission region EA set in the nth row can be the emission region EA of multiple blue sub-pixels (Blue SP) and the emission region EA of multiple red sub-pixels (Red SP). The emission region EAs of blue sub-pixels (Blue SP) and red sub-pixels (Red SP) set in each nth row can be alternated. Here, n can be an odd integer of 1 or greater (e.g., n can be 1, 3, 5, etc.). In another equivalent example, n can be an even number of 0 or greater (e.g., n can be 0, 2, 4, etc.).

[0212] Furthermore, the emission area EA set in the (n+1)th row among the multiple emission areas EA set in the normal area NA can be the emission area EA of multiple green sub-pixels (Green SP). Each emission area EA of the multiple green sub-pixels (Green SP) set in the (n+1)th row can be set in the area between the emission area EA of multiple blue sub-pixels (Blue SP) and the emission area EA of multiple red sub-pixels (Red SP) set in the nth row.

[0213] Multiple emission regions EAs set in a normal region NA can have a structure where the nth row and the (n+1)th row are placed alternately. In the example, the emission regions EAs of multiple blue sub-pixels Blue SP and multiple red sub-pixels Red SP are set in odd-numbered rows; and the emission regions EAs of multiple green sub-pixels Green SP are set in even-numbered rows. In another equivalent example, the emission regions EAs of multiple blue sub-pixels Blue SP and multiple red sub-pixels Red SP are set in even-numbered rows; and the emission regions EAs of multiple green sub-pixels Green SP are set in odd-numbered rows.

[0214] The touch electrode 140 can be placed in the non-emission area NEA of the normal area NA.

[0215] Touch electrodes 140 are disposed between and intersect each other in a grid pattern among a plurality of sub-pixels SP. Therefore, user touch input can be sensed on the top surface of the plurality of sub-pixels SP disposed in the general area.

[0216] The first deposition stop layer 175 can be set in multiple emission regions EA and non-emission regions NEA of the normal region NA.

[0217] The first deposition stop layer 175 can be used to prevent the second electrode 123 from being formed during the process of forming the second electrode 123 of the light-emitting diode 120.

[0218] In the general area NA of the display device 100, a plurality of transistors Td and Ts, a light-emitting diode 120, an encapsulation layer 117 and a plurality of touch electrodes 140 may be disposed on the substrate SUB.

[0219] exist Figure 7 As an example, the emission region EA of the green sub-pixel Green SP is shown among the multiple emission regions disposed in the normal region NA. However, sub-pixels SP that emit light of different colors, in addition to the light emitted from the emission stack that constitutes the light-emitting diode 120, also have the same overall structure.

[0220] The substrate SUB is a component used to support various components included in the organic light-emitting display device 100, and may be formed of an insulating material. The substrate SUB may include a first substrate 110a, a second substrate 110b, and an interlayer insulating film 110c. The interlayer insulating film 110c may be disposed between the first substrate 110a and the second substrate 110b.

[0221] As described above, the substrate SUB is configured with a first substrate 110a, a second substrate 110b, and an interlayer insulating film 110c to suppress moisture penetration. For example, the first substrate 110a and the second substrate 110b may be polyimide (PI) substrates.

[0222] In the general area NA, on the substrate SUB, various patterns 131, 132, 133, 134, 131a, 132a, 133a and 134a, various insulating films 111a, 111b, 112, 113a, 113b and 114, and various metal patterns TM, GM and 135 can be provided for forming thin film transistors such as driving transistor Td and at least one switching transistor Ts, as well as at least one capacitor.

[0223] Specifically, a multi-buffer layer 111a is disposed on the second substrate 110b, and an active buffer layer 111b may be disposed on the multi-buffer layer 111a.

[0224] Each of the multi-buffer layer 111a and the active buffer layer 111b may be formed from a single layer of silicon nitride (SiNx) or silicon oxide (SiOx) or a multilayer of silicon nitride (SiNx) and silicon oxide (SiOx), but is not limited thereto.

[0225] The metal layer 135 can be disposed on the multi-buffer layer 111a.

[0226] Here, the metal layer 135 can be used as a light-shielding element and is also referred to as a light-shielding layer. The metal layer 135 can be any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu), or an alloy of two or more of them, or multiple layers thereof, but is not limited thereto.

[0227] An active buffer layer 111b can be disposed on a metal layer 135.

[0228] The first active layer 134 of the driving transistor Td can be disposed on the active buffer layer 111b. The first active layer 134 can be formed of polycrystalline silicon (p-Si), amorphous silicon (a-Si), or oxide semiconductor, but is not limited thereto.

[0229] Meanwhile, the driving transistor Td may include a first active layer 134, a first gate insulating film 112, a first gate electrode 131, a first interlayer insulating film 113a, a second gate insulating film 113c, a third interlayer insulating film 113d, a first source electrode 132, and a first drain electrode 133. The first active layer 134 is formed on the active buffer layer 111b, the first gate insulating film 112 covers the first active layer 134, the first gate electrode 131 is disposed on the first gate insulating film 112, and the first interlayer insulating film 113a covers the first gate electrode 131. The second gate insulating film 113c is disposed on the first interlayer insulating film 113a, the third interlayer insulating film 113d is disposed on the second gate insulating film 113c, and the first source electrode 132 and the first drain electrode 133 are disposed on the third interlayer insulating film 113d.

[0230] The first gate insulating film 112 may be disposed on the first active layer 134. The first gate insulating film 112 may be formed of a single layer of silicon nitride (SiNx) or silicon oxide (SiOx) or a double layer of silicon nitride (SiNx) or silicon oxide (SiOx).

[0231] The first gate electrode 131 of the driving transistor Td can be disposed on the first gate insulating film 112. The first gate electrode 131 can be disposed on the first gate insulating layer 112 so as to overlap with the first active layer 134.

[0232] The first gate electrode 131 can be formed of various conductive materials, such as magnesium (Mg), aluminum (Al), nickel (Ni), chromium (Cr), molybdenum (Mo), tungsten (W), gold (Au), or alloys thereof, but is not limited thereto.

[0233] The gate material layer GM can be disposed on the first gate insulating layer 112 at a location different from the formation location of the driving transistor Td.

[0234] The first interlayer insulating film 113a can be disposed on the first gate electrode 131 and the gate material layer GM.

[0235] The metallic pattern TM can be set on the first interlayer insulating layer 113a.

[0236] The second interlayer insulating film 113b can be configured to cover the metal pattern TM disposed on the first interlayer insulating film 113a.

[0237] The second interlayer insulating film 113b can be used to separate the second active layer 134a from the first active layer 134.

[0238] The second active layer 134a of the switching transistor Ts can be disposed on the second interlayer insulating film 113b. For example, the second active layer 134a can be formed of polycrystalline silicon (p-Si), amorphous silicon (a-Si), or oxide semiconductor, but is not limited thereto.

[0239] The second gate insulating film 113c can be disposed on the second active layer 134a.

[0240] Furthermore, the second gate electrode 131a of the switching transistor Ts can be disposed on the second gate insulating film 113c. The second gate electrode 131a is disposed on the second gate insulating film 113c to overlap with the second active layer 134a.

[0241] The second gate insulating film 113c covers the second active layer 134a of the switching transistor Ts. The second gate insulating film 113c is formed on the second active layer 134a such that the second gate insulating film may include an inorganic insulating material. For example, the second gate insulating film 113c may be formed of a single layer of silicon nitride (SiNx) or silicon oxide (SiOx) or a double layer of silicon nitride (SiNx) or silicon oxide (SiOx).

[0242] The second gate electrode 131a may include a metallic material. For example, the second gate electrode 131a may be formed of a single layer or multiple layers of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu) or their alloys, but is not limited thereto.

[0243] Meanwhile, the switching transistor Ts is formed on the second interlayer insulating film 113b, and may include a second active layer 134a, a second gate insulating film 113c covering the second active layer 134a, a second gate electrode 131a disposed on the second gate insulating film 113c, a third interlayer insulating film 113d covering the second gate electrode 131a, and a second source electrode 132a and a second drain electrode 133a disposed on the third interlayer insulating film 113d.

[0244] The switching transistor Ts may further include a gate material layer GM located below the first interlayer insulating film 113a and overlapping with the second active layer 134a. The gate material layer GM blocks light incident on the second active layer 134a to ensure the reliability of the switching transistor Ts.

[0245] The gate material layer GM is formed of the same material as the first gate electrode 131 and can be formed on the upper surface of the first gate insulating film 112. The gate material layer GM is electrically connected to the second gate electrode 131a to construct a dual gate.

[0246] The first source electrode 132 and the first drain electrode 133 of the driving transistor Td, and the second source electrode 132a and the second drain electrode 133a of the switching transistor Ts can be disposed on the third interlayer insulating film 113d.

[0247] The second source electrode 132a and the second drain electrode 133a are formed simultaneously from the same material as the first source electrode 132 and the first drain electrode 133 on the third interlayer insulating film 113d, so as to reduce the number of mask processes.

[0248] The first source electrode 132 and the first drain electrode 133 can be connected to one side and the other side of the first active layer 134 through contact holes formed in the third interlayer insulating film 113d, the second gate insulating film 113c, the second interlayer insulating film 113b, the first interlayer insulating film 113a and the first gate insulating film 112.

[0249] The second source electrode 132a and the second drain electrode 133a can be connected to one side and the other side of the second active layer 134a through contact holes formed in the third interlayer insulating film 113d and the second gate insulating film 113c.

[0250] The first source electrode 132 and the first drain electrode 133, as well as the second source electrode 132a and the second drain electrode 133a, can be formed of a single layer or multiple layers of various conductive materials, such as magnesium (Mg), aluminum (Al), nickel (Ni), chromium (Cr), molybdenum (Mo), tungsten (W), gold (Au), or alloys thereof, but are not limited thereto.

[0251] The portion of the first active layer 134 that overlaps with the first gate electrode 131 is a channel region. One of the first source electrode 132 and the first drain electrode 133 is connected to one side of the channel region in the first active layer 134, and the other is connected to the other side of the channel region in the first active layer 134.

[0252] The second active layer 134a can be configured to have the same shape as the first active layer 134. When the second active layer 134a is implemented by an oxide semiconductor material, the second active layer 134a may include an intrinsic second channel region that is undoped and a second source region and a second drain region that are doped to conduct electricity.

[0253] Passivation layer 114 may be disposed on the first source electrode 132 and the first drain electrode 133, as well as the second source electrode 132a and the second drain electrode 133a. Passivation layer 114 protects the driving transistor Td and may comprise an inorganic insulating material. For example, passivation layer 114 may be formed as a monolayer of silicon nitride (SiNx) or silicon oxide (SiOx) or a bilayer of silicon nitride (SiNx) or silicon oxide (SiOx).

[0254] Meanwhile, a gate material layer GM and a metal pattern TM are disposed on the first gate insulating film 112 so as to overlap to implement a capacitor Cst.

[0255] The metallic pattern TM can be a single layer or multiple layers formed from any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu) or their alloys, but is not limited thereto.

[0256] The capacitor Cst stores the data voltage applied for a predetermined period of time via the data line DL, and then supplies the data voltage to the light-emitting diode 120. The capacitor Cst may include two corresponding electrodes and a dielectric material disposed therebetween. The first interlayer insulating film 113a may be located between the gate material layer GM and the metal pattern TM.

[0257] The gate material layer GM or metal pattern TM of capacitor Cst can be electrically connected to the second source electrode 132a or the second drain electrode 133a of switching transistor Ts. However, it is not limited to this, and the connection relationship of capacitor Cst can vary depending on the pixel driving circuit.

[0258] In addition, a metal layer 135 is disposed on a multi-buffer layer 111a to further overlap with the gate material layer GM and the metal pattern TM to construct a dual capacitor Cst.

[0259] In an exemplary embodiment of this disclosure, at least one switching transistor Ts uses an oxide semiconductor as the active layer.

[0260] Transistors using oxide semiconductors as the active layer have excellent leakage current blocking effect and relatively lower manufacturing cost compared to transistors using polysilicon as the active layer. Therefore, in order to reduce power consumption and save manufacturing costs, the pixel circuit according to the example embodiments of this disclosure includes a driving transistor or at least one switching transistor using oxide semiconductor materials.

[0261] All transistors in a pixel circuit that includes a driving transistor can be implemented with an active layer using oxide semiconductors, or only some transistors can be implemented with an active layer using oxide semiconductors.

[0262] However, transistors using oxide semiconductors are difficult to guarantee in terms of reliability, while transistors using polysilicon offer faster operating speeds and superior reliability. Therefore, exemplary embodiments of this disclosure include both transistors using oxide semiconductors and transistors using polysilicon.

[0263] However, it is not limited to this, and depending on the design, only transistors using oxide semiconductors or only transistors using polysilicon can be used to construct pixel circuits.

[0264] A planarization layer that protects the driving transistor Td and flattens its upper part can be placed on the driving transistor Td.

[0265] The planarization layer may include a first planarization layer 115a and a second planarization layer 115b. The first planarization layer 115a may be disposed on the passivation layer 114, and the connecting electrode 125 may be disposed on the first planarization layer 115a.

[0266] The connecting electrode 125 can be connected to one of the first source electrode 132 and the first drain electrode 133 through a contact hole provided in the first planarization layer 115a.

[0267] The second planarization layer 115b can be disposed on the connecting electrode 125.

[0268] The light-emitting diode 120 can be located above the second planarization layer 115b.

[0269] The connecting electrode 125 may be a single layer or multiple layers formed of any one of molybdenum (Mo), aluminum (Al), chromium (Cr), gold (Au), titanium (Ti), nickel (Ni), neodymium (Nd) and copper (Cu) or their alloys, but is not limited thereto.

[0270] Each of the first planarization layer 115a and the second planarization layer 115b may include an organic insulating material. For example, the first planarization layer 115a and the second planarization layer 115b may be formed from one of acrylic resin, epoxy resin, phenolic resin, polyamide resin, polyimide resin, unsaturated polyester resin, polyphenylene resin, polyphenylene sulfide resin, benzocyclobutene, and photoresist, but are not limited thereto.

[0271] The first electrode 121 (or the first-1 electrode) of the light-emitting diode 120 can be disposed on the second planarization layer 115b. In this case, the first electrode 121 can be electrically connected to the connecting electrode 125 through a contact hole disposed in the second planarization layer 115b.

[0272] The first electrode 121 may include a metallic material.

[0273] When the display device 100 according to the exemplary embodiment of the present disclosure is such that light emitted from the light-emitting diode 120 is directed toward the top layer (such as) on the substrate SUB, Figure 7 When the polarization layer 160 emits a top emission type, the first electrode 121 may also include a transparent conductive layer and a reflective layer on the transparent conductive layer.

[0274] The transparent conductive layer can be formed of a transparent conductive oxide, such as indium tin oxide (ITO), indium zinc oxide (IZO), or indium gallium zinc oxide (IGZO), and the reflective layer can be formed of silver (Ag), aluminum (Al), gold (Au), molybdenum (Mo), tungsten (W), chromium (Cr), or alloys thereof.

[0275] The embankment 116 can be configured as part of the end portion of the first electrode 121 of the light-emitting diode 120.

[0276] In the region of the sub-pixel SP corresponding to the emission region EA, no embankment 116 is provided. Alternatively, a hole (or opening) in the embankment 116 may be provided in the emission region EA of the sub-pixel SP.

[0277] The hole in the embankment 116 may overlap with a portion of the first electrode 121. That is, a portion of the first electrode 121 does not overlap with the embankment 116.

[0278] At this time, the embankment 116 may be formed of inorganic insulating materials such as silicon nitride (SiNx) or silicon oxide (SiOx) or organic insulating materials such as benzocyclobutene resin, acrylic resin or imide resin, but is not limited thereto.

[0279] The organic layer 122 (or the first organic layer) of the light-emitting diode 120 can be disposed in and around the hole in the dam 116. Therefore, the organic layer 122 can be disposed on the first electrode 121 exposed through the hole in the dam 116.

[0280] Organic layer 122 may include an emitting layer, and in addition to the emitting layer that emits light of a specific color, may also include at least one functional layer selected from a hole transport layer, a hole injection layer, an electron transport layer, and an electron injection layer. Organic layer 122 may include multiple organic films.

[0281] The second electrode 123 (or the second-first electrode) of the light-emitting diode 120 can be disposed on the organic layer 122.

[0282] As described above, the light-emitting diode 120 can be formed from a first electrode 121, an organic layer 122, and a second electrode 123.

[0283] The second electrode 123, which is disposed in the normal region NA, can be formed by multiple layers.

[0284] Specifically, the second electrode 123 of the light-emitting diode 120 disposed in the normal region NA may include a first sub-electrode 123a (or the first-1 sub-electrode) disposed on the organic layer 122 and a second sub-electrode 123b (or the second-1 sub-electrode) disposed on the first sub-electrode 123a.

[0285] Each of the first sub-electrode 123a and the second sub-electrode 123b of the second electrode 123 can be disposed in the entire general area NA of the display device 100.

[0286] The first sub-electrode 123a may include the material included in the electron injection layer.

[0287] Alternatively, each of the first sub-electrode 123a and the second sub-electrode 123b may include a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO), or a metal alloy such as MgAg or ytterbium (Yb) alloys, and may also include a metal doped layer, but is not limited thereto.

[0288] In the normal region NA, the first deposition stop layer 175 can be disposed on the second sub-electrode 123b of the second electrode 123.

[0289] The first deposition stop layer 175 may include a non-metallic material. For example, the first deposition stop layer 175 may include an organic material.

[0290] The first deposition stop layer 175 can be used to suppress the deposition of at least a portion of the second electrode 123 on the substrate SUB. In other words, the second electrode 123 may not be formed in the region where the first deposition stop layer 175 is provided.

[0291] For example, a mask (fine metal mask, FMM) can be used to deposit the first deposition stop layer 175 to correspond to the first transmission region TA1. Specifically, the first deposition stop layer 175 can be formed after the FMM is placed to expose the transmission region TA.

[0292] In the region of the general region NA where the first deposition stop layer 175 is provided, the third sub-electrode of the second electrode 123 may not be provided. The third sub-electrode of the second electrode 123 is a configuration provided in a local region of the transmission region TA, which will be described in further detail below.

[0293] Since the first deposition stop layer 175 is disposed in the entire normal region NA, the third sub-electrode of the second electrode 123 is not disposed, so that the thickness increase of the second electrode 123 can be suppressed in the normal region NA.

[0294] When the thickness of the second electrode 123 in the normal region NA increases, the transmittance decreases, so that a portion of the light emitted from the light-emitting diode 120 does not escape to the outside of the display device 100, which reduces the luminous efficiency of the display device 100.

[0295] However, the first deposition stop layer 175 is disposed throughout the normal region NA, thereby suppressing the increase in the thickness of the second electrode 123 to suppress the decrease in brightness of the display device 100 in the normal region NA.

[0296] The first deposition stop layer 175 can be set in the emission region EA and the non-emission region NEA of the normal region NA.

[0297] The first deposition stop layer 175 can overlap with the light-emitting diode 120 in the emission region EA.

[0298] The first deposition stop layer 175 can overlap with multiple touch electrodes 140 in the non-emission region NEA.

[0299] At least one capping layer 180 may be disposed on the first deposition stop layer 175. The capping layer 180 may include an organic capping layer or an inorganic capping layer, and in some cases, may include at least one of an organic capping layer and an inorganic capping layer.

[0300] Encapsulation layer 117 can be disposed on cover layer 180.

[0301] Encapsulation layer 117 may have a single-layer structure or a multi-layer structure. For example, encapsulation layer 117 may include a first encapsulation layer 117a, a second encapsulation layer 117b, and a third encapsulation layer 117c.

[0302] The first encapsulation layer 117a and the third encapsulation layer 117c are constructed of inorganic membranes, and the second encapsulation layer 117b may be constructed of an organic membrane. Among the first encapsulation layer 117a, the second encapsulation layer 117b, and the third encapsulation layer 117c, the second encapsulation layer 117b is the thickest and can be used as a planarization layer.

[0303] The first encapsulation layer 117a is disposed on the second electrode 123 and can be configured to be closest to the light-emitting diode 120.

[0304] The first encapsulation layer 117a can be formed of an inorganic insulating material on which low-temperature deposition can be performed. For example, the first encapsulation layer 117a can be constructed of silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), or aluminum oxide (Al2O3). The first encapsulation layer 117a is deposited at a low-temperature atmosphere, which suppresses damage to the organic layer 122 of the light-emitting diode 120, which includes organic materials susceptible to high-temperature atmospheres, during the deposition process.

[0305] The second encapsulation layer 117b can be formed from an organic insulating material such as acrylic resin, epoxy resin, polyimide, polyethylene, or silicon carbide (SiOC). For example, the second encapsulation layer 117b can be formed by an inkjet printing method, but is not limited thereto.

[0306] Although not shown, a color filter may be provided on the encapsulation layer 117.

[0307] Furthermore, even if not shown in the figure, a structure can be provided in the non-displayed area NDA to block the flow of the second encapsulation layer 117b that constitutes the encapsulation layer 117. To suppress the collapse of the encapsulation layer 117, one or more structures can be provided at or around the end of the inclined surface of the encapsulation layer 117.

[0308] One or more structures may be disposed in or near the boundary between the display area DA and the non-display area NDA. The structure may be formed of one or more layers of organic material, and may include, for example, a lower layer formed of the same material as the second planarization layer 115b on the same layer as the second planarization layer 115b and an upper layer formed of the same material as the embankment 116 on the same layer as the embankment 116, but is not limited thereto.

[0309] The third encapsulation layer 117c can be formed above the substrate SUB on which the second encapsulation layer 117b is formed, so as to cover the upper and side surfaces of the second encapsulation layer 117b and the first encapsulation layer 117a.

[0310] At this point, the third encapsulation layer 117c can minimize or block external moisture or oxygen from penetrating into the first encapsulation layer 117a and the second encapsulation layer 117b. For example, the third encapsulation layer 117c can be constructed from an inorganic insulating material such as silicon nitride (SiNx), silicon oxide (SiOx), silicon oxynitride (SiON), or aluminum oxide (Al2O3).

[0311] A touch buffer film 118a is disposed on the encapsulation layer 117, and a touch electrode 140 may be disposed on the touch buffer film 118a.

[0312] The touch electrode 140 may include a touch sensor electrode 141 and a bridging electrode 142 located on different layers. An interlayer insulating film 118b may be disposed between the touch sensor electrode 141 and the bridging electrode 142.

[0313] For example, touch sensor electrode 141 may include a first touch sensor electrode, a second touch sensor electrode, and a third touch sensor electrode arranged adjacent to each other.

[0314] For example, the first touch sensor electrode and the second touch sensor electrode are disposed in the first direction, and the third touch sensor electrode may be disposed in the second direction intersecting with the first touch sensor electrode and the second touch sensor electrode.

[0315] The first touch sensor electrode and the second touch sensor electrode are electrically connected. However, when there is a third touch sensor electrode disposed in a second direction intersecting the first direction between the first touch sensor electrode and the second touch sensor electrode disposed in the first direction, the first touch sensor electrode and the second touch sensor electrode can be electrically connected through a bridging electrode 142 on different layers.

[0316] The bridging electrode 142 can be insulated from the third touch sensor electrode through the interlayer insulating film 118b.

[0317] In other words, in order to suppress short circuits of multiple touch electrodes disposed in the first and second directions, in the intersecting region, multiple touch electrodes extending in the first direction can be electrically connected by bridging electrode 142.

[0318] During the process of forming the touch electrode 140, external chemicals (e.g., developer or etchant) or moisture used in the process may be generated.

[0319] Therefore, a touch buffer film 118a is provided and a touch electrode 140 is provided on the touch buffer film 118a, so that the penetration of chemicals or moisture into the organic layer 122 of the light-emitting diode 120, which includes organic materials, is suppressed during the formation of the touch electrode 140, so as to suppress damage to the organic layer 122.

[0320] The touch buffer film 118a can be formed of an organic insulating material formed at a temperature below a predetermined temperature (e.g., 100°C) to suppress damage to the organic layer 122 of the light-emitting diode 120, which includes organic materials susceptible to high temperatures. The organic insulating material has a low dielectric constant of 1 to 3. For example, the touch buffer film 118a can be formed of acrylic, epoxy, or siloxane materials.

[0321] The protective layer 119 can be configured to cover multiple touch electrodes 140, touch routing lines, and grounding lines. The protective layer 119 can be constructed from an organic insulating film.

[0322] The organic layer 150 can be configured as a protective layer 119.

[0323] When only a protective layer 119 formed of an organic insulating film is provided on the uppermost layer of the display device 100, the steps caused by the touch electrodes 140 disposed below the protective layer 119 cannot be completely compensated by the protective layer 119 alone. Therefore, there may be a problem where stains caused by multiple touch electrodes 140 are visible to the user. By adding an organic layer 150 formed of an organic insulating film above the protective layer 119, the steps on the uppermost layer of the display device 100 are suppressed, thereby improving visibility.

[0324] The organic layer 150 can be formed of the same material as the second encapsulation layer 117b of the encapsulation layer 117, and can be formed, for example, of an organic insulating material such as acrylic resin, epoxy resin, polyimide, polyethylene, or silicon carbide (SiOC). The organic layer 150 can be formed by inkjet printing, but is not limited thereto.

[0325] The polarization layer 160 can be disposed on the organic layer 150.

[0326] As described above, in the display device 100 according to an exemplary embodiment of the present disclosure, a first deposition stop layer 175 is provided throughout the general area NA, and a third sub-electrode of the second electrode 123 is not provided. Therefore, the thickness increase of the second electrode 123 is suppressed in the general area NA.

[0327] Figure 8 yes Figure 7 A magnified view of region X.

[0328] refer to Figure 8 In the emission region EA of the normal region NA, the first electrode 121, organic layer 122, second electrode 123, first deposition stop layer 175, capping layer 180 and encapsulation layer 117 of the light-emitting diode 120 can be sequentially stacked.

[0329] The organic layer 122 may have a multilayer structure. For example, the organic layer 122 may include at least one of a hole transport layer 122a, a hole injection layer 122b, an emitter layer 122c, an electron transport layer 122d, and an electron injection layer.

[0330] The second electrode 123 can be disposed on the organic layer 122.

[0331] In the normal region NA, the second electrode 123 may include a first sub-electrode 123a and a second sub-electrode 123b.

[0332] In the normal region NA, the first deposition stop layer 175 can be disposed on the second sub-electrode 123b.

[0333] The capping layer 180 and the encapsulation layer 117 can be sequentially disposed on the first deposition stop layer 175.

[0334] In the display device 100 according to an exemplary embodiment of the present disclosure, a first deposition stop layer 175 is provided in the normal region NA, such that the thickness of the second electrode 123 can be easily adjusted in the normal region NA. Therefore, the decrease in brightness of the display device 100 in the normal region NA due to the thickened second electrode 123 can be suppressed.

[0335] Figure 9This is a schematic plan view of the first optical region of a display device according to an exemplary embodiment of the present disclosure.

[0336] Figure 10 It is along Figure 9 The cross-sectional view taken from line CD.

[0337] Figure 11 yes Figure 10 A magnified view of region Y.

[0338] Figure 12 yes Figure 10 A magnified view of region Z.

[0339] In the following description, for ease of description, the display area DA of the display device 100 is described as including a normal area NA and a first optical area DA1 (i.e., see [link to description]). Figure 1A and Figure 1B Examples of the first optical region DA1 can be given. In one or more aspects, the description of the first optical region DA1 can also be applied in the same manner to the second optical region DA2.

[0340] refer to Figures 9 to 12 The first optical region DA1 may include multiple emission regions EA and a first transmission region TA1.

[0341] The placement of multiple emission regions EA in the first optical region DA1 can differ from the placement of multiple emission regions EA in the ordinary region NA.

[0342] Specifically, among the multiple emission regions EA set in the first optical region DA1, the emission region EA set in the nth row can be the emission region EA of multiple green sub-pixels Green SP. Here, n can be an odd integer of 1 or greater. In another equivalent example, n can be an even integer of 0 or greater.

[0343] In the multiple emission regions EA set in the first optical region DA1, the emission region EA set in the 4kth row can be the emission region EA of multiple blue sub-pixels Blue SP and the emission region EA of multiple red sub-pixels Red SP. The emission region EA of blue sub-pixels Blue SP and the emission region EA of red sub-pixels Red SP set in each 4kth row can be alternated. Here, k can be an integer of 1 or greater. In another example, when n is an even integer of 0 or greater, the 4kth row is the 4j-1th row, where j can be an integer of 1 or greater.

[0344] Multiple emission regions EAs disposed in the first optical region DA1 can have a structure that repeats the placement of the nth row and the 4kth row. In the example, the emission regions EAs of multiple green sub-pixels Green SP are disposed in odd-numbered rows; and the emission regions EAs of multiple blue sub-pixels Blue SP and multiple red sub-pixels Red SP are disposed in multiple fourth rows that do not overlap with the odd-numbered rows. In another equivalent example, the emission regions EAs of multiple green sub-pixels Green SP are disposed in even-numbered rows; and the emission regions EAs of multiple blue sub-pixels Blue SP and multiple red sub-pixels Red SP are disposed in multiple fourth rows that do not overlap with the even-numbered rows.

[0345] The density of multiple emission regions EA set in the first optical region DA1 can be lower than the density of multiple emission regions set in the normal region NA. For example, the density of the emission region EA of the green sub-pixel Green SP set in each nth row of the first optical region DA1 can be lower than the density of the emission region EA of the green sub-pixel Green SP set in each (n+1)th row of the normal region NA. In another example, the emission region EA of multiple blue sub-pixels BlueSP and multiple red sub-pixels RedSP in the first optical region DA1 can be set in every four rows, instead of in every two rows as seen in the normal region NA.

[0346] By doing so, the area of ​​the first transmission region TA1 of the first optical region DA1 is increased, and the transmittance of the first optical region DA1 can be improved.

[0347] exist Figures 9 to 12 Examples have already been described where the placement of the plurality of emission regions EA in the ordinary region NA differs from the placement of the plurality of emission regions EA in the first optical region DA1. However, the placement of the emission regions EA in the display device 100 according to the exemplary embodiments of this disclosure is not limited thereto. For example, the placement of the plurality of emission regions EA in the ordinary region NA and the placement of the plurality of emission regions EA in the first optical region DA1 may be the same.

[0348] Furthermore, the area of ​​each of the plurality of emission regions EA included in the first optical region DA1 and the area of ​​each of the plurality of emission regions EA included in the ordinary region NA are equal to each other or different from each other within a predetermined range.

[0349] At least one second deposition stop layer 171 and at least one third deposition stop layer 172 may be disposed in the first optical region DA1.

[0350] Specifically, at least one second deposition stop layer 171 and at least one third deposition stop layer 172 may be disposed in the first transmission region TA1 of the first optical region DA1.

[0351] At least one second deposition stop layer 171 and at least one third deposition stop layer 172 may be configured to be spaced apart from each other. In addition, at least one second deposition stop layer 171 and at least one third deposition stop layer 172 are also configured to be spaced apart from the plurality of emission regions EA disposed in the first optical region DA1.

[0352] The second deposition stop layer 171 and the third deposition stop layer 172 may comprise non-metallic materials. For example, the second deposition stop layer 171 and the third deposition stop layer 172 may comprise organic materials.

[0353] Multiple second deposition stop layers 171 and multiple third deposition stop layers 172 may be arranged in the same row as the emission region EA that emits at least one color of light.

[0354] For example, a second deposition stop layer 171 is disposed between the emission regions EA of green sub-pixels Green SP disposed every nth row, and a third deposition stop layer 172 may be disposed between the emission regions EA of green sub-pixels Green SP disposed every nth row, which is different from the row occupied by the second deposition stop layer 171.

[0355] Furthermore, each of a second deposition stop layer 171 and a third deposition stop layer 172 is disposed between the two emission regions EA relative to the row direction, and may be disposed between the two emission regions EA relative to the column direction.

[0356] For example, a second deposition stop layer 171 may be disposed between the emission regions EA of different green sub-pixels Green SP relative to the row direction, and may also be disposed between the emission regions EA of green sub-pixels Green SP relative to the column direction. Furthermore, a third deposition stop layer 172 may be disposed between the emission regions EA of different green sub-pixels Green SP relative to the row direction, and may also be disposed between the emission regions EA of green sub-pixels Green SP relative to the column direction.

[0357] Each of the second deposition stop layer 171 and the third deposition stop layer 172 is spaced apart from the emission region EA disposed in the first optical region DA1, and is disposed between the two emission regions EA relative to the row direction and between the two emission regions EA relative to the column direction. By doing so, the transmittance of the first optical region DA1 is improved, and the performance of the optoelectronic device 190 disposed in the first optical region DA1 can be improved.

[0358] For example, if a camera or IR sensor is located in the first optical region DA1, the performance of the electronic device can be determined based on the amount of light escaping from the display device 100 in a specific wavelength band within the first optical region DA1.

[0359] At this time, each of the second deposition stop layer 171 and the third deposition stop layer 172 is spaced apart from the emission region EA disposed in the first optical region DA1, and is disposed between the two emission regions EA relative to the row direction and between the two emission regions EA relative to the column direction. By doing so, the amount of light emitted in a specific wavelength band to the outside of the display device 100 is increased, thereby improving the performance of the optoelectronic device 190 included in the display device 100.

[0360] Multiple emission regions EA of the first optical region DA1 can be included in the low transmission region LTA of the first optical region DA1.

[0361] In the first optical region DA1, in the low transmission region LTA excluding the first transmission region TA1, multiple light-emitting diodes 120 for multiple emission regions EA can be provided.

[0362] Furthermore, multiple pixel circuits for driving the multiple light-emitting diodes 120 can be disposed in the low-transmission region LTA. That is, multiple pixel circuits can be disposed in the optical region OA. The multiple pixel circuits may include driving transistors Td and switching transistors Ts.

[0363] The low-transmission region LTA of the first optical region DA1 may include a portion of the non-emissive region NEA. The non-emissive region NEA disposed in the low-transmission region LTA may include, but is not limited to, a region in which multiple pixel circuits are disposed.

[0364] For example, multiple pixel circuits may not be located in the first optical region DA1, but may be located in an additional border region surrounding the outer periphery of the first optical region DA1.

[0365] In the first optical region DA1, the transmittance of the low-transmission region LTA is lower than that of the first transmission region TA1. However, the transmittance of the low-transmission region LTA in the first optical region DA1 can be higher than that of the normal region NA.

[0366] Figure 10 The low-transmission region LTA of the first optical region DA1 and Figure 7 The ordinary region NA shown has a different structure of the second electrode 123 compared to the ordinary region NA, but other components are basically the same, so redundant descriptions will be omitted.

[0367] The light-emitting diode 120 disposed in the first optical region DA1 may include a first electrode 121 (or the first-second electrode), an organic layer 122 (or the second organic layer), and a second electrode 123 (or the second-second electrode).

[0368] The second electrode 123 of the light-emitting diode 120 disposed in the first optical region DA1 may include a first sub-electrode 123a (or the first-second sub-electrode) disposed on the organic layer 122, a second sub-electrode 123b (or the second-second sub-electrode) disposed on the first sub-electrode 123a, and a third sub-electrode 123c disposed on the second sub-electrode 123b.

[0369] The third sub-electrode 123c may include a transparent conductive material such as indium tin oxide (ITO) or indium zinc oxide (IZO) or a metal alloy such as MgAg or ytterbium (Yb) alloys, and may also include a metal doped layer, but is not limited thereto.

[0370] The second electrode 123 of the light-emitting diode 120 disposed in the normal region NA has a structure including a first sub-electrode 123a and a second sub-electrode 123b. The second electrode 123 of the light-emitting diode 120 disposed in the first optical region DA1 may include a first sub-electrode 123a, a second sub-electrode 123b and a third sub-electrode 123c.

[0371] Specifically, the first sub-electrode 123a and the second sub-electrode 123b of the second electrode 123 are disposed in the normal region NA and the first optical region DA1, and the first deposition stop layer 175 can be disposed on the second sub-electrode 123b in the normal region NA.

[0372] Conversely, the first deposition stop layer 175 is not disposed on the second sub-electrode 123b in the low-transmission region LTA of the first optical region DA1, so that the third sub-electrode 123c can be further disposed on the second sub-electrode 123b in the low-transmission region LTA of the first optical region DA1.

[0373] The third sub-electrode 123c is further disposed on the second sub-electrode 123b in the low-transmission region LTA of the first optical region DA1. Therefore, the thickness of the second electrode 123 of the light-emitting diode 120 disposed in the low-transmission region LTA of the first optical region DA1 can be greater than the thickness of the second electrode 123 of the light-emitting diode 120 disposed in the normal region NA.

[0374] The thickness of the third sub-electrode 123c can be from 1 to 20 Å, but is not limited to this.

[0375] The third sub-electrode 123c of the second electrode 123 is further disposed in the low-transmission region LTA of the first optical region DA1, thereby increasing the thickness of the third sub-electrode 123c compared to the second electrode 123. Therefore, a microcavity effect of the light-emitting diode 120 disposed in the first optical region DA1 can be achieved.

[0376] Specifically, the thickness of the second electrode 123 of the light-emitting diode 120 disposed in the first optical region DA1 is increased by increasing the thickness of the third sub-electrode 123c to increase the intensity of light emitted from the light-emitting diode 120. By doing so, the brightness of the first optical region DA1 is increased.

[0377] The density of the emission region EA disposed in the first optical region DA1 is lower than the density of the emission region EA disposed in the normal region NA, resulting in a lower brightness in the first optical region DA1 compared to the normal region NA. To eliminate this problem, the brightness of the first optical region DA1 is increased by increasing the power consumption of the first optical region DA1. However, this leads to an increase in power consumption when the display device 100 is driven.

[0378] However, the thickness of the second electrode 123 of the light-emitting diode 120 disposed in the first optical region DA1 is greater than the thickness of the second electrode 123 of the light-emitting diode 120 disposed in the ordinary region NA. By doing so, a microcavity effect can be induced in the first optical region DA1, thereby increasing the brightness of the first optical region DA1.

[0379] Furthermore, the brightness of the first optical region DA1 is increased through the microcavity effect, eliminating the need to increase the power consumption of the display device 100. Therefore, compared to display devices 100 that have the same structure for the second electrode 123 of the light-emitting diode 120 disposed in the ordinary region NA and the second electrode 123 of the light-emitting diode 120 disposed in the first optical region DA1, the display device 100 is driven with lower power consumption.

[0380] The substrate SUB and various insulating films 111a, 111b, 112, 113a, 113b, 114, 115a, 115b, 117a, 117b, 117c, 118a, 118b and 119 disposed in the low transmission region LTA of the first optical region DA1 can also be disposed in the first transmission region TA1 of the first optical region DA1 in the same manner.

[0381] At the same time, Figure 10 The diagram has shown a structure in which the embankment 116 can be configured to extend into the first transmission region TA1, but this disclosure is not limited thereto. For example, the embankment 116 may not be provided in the first transmission region TA1, but may be provided only in a local area of ​​the first transmission region TA1.

[0382] Apart from the insulating material disposed in the low-transmission region LTA of the first optical region DA1, a material layer having electrical or opaque properties may not be disposed in the first transmission region TA1 of the first optical region DA1.

[0383] For example, the metal material layers 131, 132, 133, 135, GM, TM, 131a, 132a and 133a associated with the transistor, as well as the active layers 134 and 134a, may not be provided in the first transmission region TA1.

[0384] Furthermore, the touch electrode 140 is disposed in the low-transmission region LTA, but not in the first transmission region TA1. Alternatively, the touch electrode 140 may be disposed in the non-emissive region NEA included in the low-transmission region LTA.

[0385] Furthermore, the first electrode 121 included in the light-emitting diode 120 may not be disposed in the first transmission region TA1.

[0386] The first transmission region TA1 of the first optical region DA1 overlaps with the optoelectronic device 190. Therefore, for the purpose of normal operation of the optoelectronic device 190, opaque components (e.g., metal electrodes) are not disposed in the first transmission region TA1 to increase the transmittance of the first transmission region TA1.

[0387] Furthermore, in the first transmission region TA1 of the first optical region DA1, no components such as metal electrodes are provided, so that the first transmission region TA1 of the first optical region DA1 can be configured solely by a layer having a flat top surface.

[0388] The organic layer 122 included in the light-emitting diode 120 may be disposed in the first transmission region TA1, but is not limited thereto. For example, the organic layer 122 included in the light-emitting diode 120 may not be disposed in the first transmission region TA1, but may be disposed only in a local area of ​​the first transmission region TA1.

[0389] For example, such as Figure 11 As shown, in the first optical region DA1, at least one of the hole transport layer 122a, hole injection layer 122b, emission layer 122c, electron transport layer 122d and electron injection layer included in the organic layer 122 can be provided.

[0390] Specifically, in the emission region EA, which includes the first optical region DA1, and the low transmission region LTA, which includes the non-emission region NEA adjacent to the emission region EA, an organic layer 122 consists of a hole transport layer 122a, a hole injection layer 122b, an emission layer 122c, an electron transport layer 122d, and an electron injection layer.

[0391] In addition, such as Figure 12 As shown, only some of the multiple organic layers 122 included in the light-emitting diode 120 may be configured to extend into the first transmission region TA1. For example, only the remaining layers of the multiple organic layers 122 other than the emitting layer 122c may be provided in the first transmission region TA1.

[0392] To ensure the transmittance of the first transmission region TA1, removing the second electrode 123 may reduce the ultraviolet (UV) reliability of the first transmission region TA1. That is, a pixel shrinkage defect occurs, where the effective emission area of ​​the emission region EA is reduced due to degassing of the organic material caused by the transmission of ultraviolet light.

[0393] The light-emitting layer 122c of the organic layer 122 is not disposed in the first transmission region TA1, thereby reducing the possibility of damage to the first transmission region TA1. However, the position of the light-emitting layer 122c according to the exemplary embodiment of this disclosure is not limited thereto.

[0394] refer to Figures 9 to 12 The second electrode 123 of the light-emitting diode 120 can be disposed only in a local area of ​​the first transmission region TA1.

[0395] Specifically, in the region of the first transmission region TA1 where the second electrode 123 of the light-emitting diode 120 is disposed, the first sub-electrode 123a, the second sub-electrode 123b, and the third sub-electrode 123c of the second electrode 123 are sequentially stacked.

[0396] At least one second deposition stop layer 171 and at least one third deposition stop layer 173 may be disposed in the first transmission region TA1.

[0397] The second deposition stop layer 171 and the third deposition stop layer 172 can be disposed on the same layer in the first transmission region TA1. For example, the second deposition stop layer 171 and the third deposition stop layer 172 can be disposed on the organic layer 122.

[0398] The first sub-electrode 123a, the second sub-electrode 123b, and the third sub-electrode 123c of the second electrode 123 may not be located in the region where the second deposition stop layer 171 and the third deposition stop layer 172 are located.

[0399] The second deposition stop layer 171 and the third deposition stop layer 172 can be used to suppress the deposition of the first sub-electrode 123a, the second sub-electrode 123b and the third sub-electrode 123c of the second electrode 123 on the organic layer 122.

[0400] Therefore, after the second deposition stop layer 171 and the third deposition stop layer 172 are formed on the organic layer 122, if the first sub-electrode 123a, the second sub-electrode 123b and the third sub-electrode 123c of the second electrode 123 are formed sequentially, the first sub-electrode 123a, the second sub-electrode 123b and the third sub-electrode 123c of the second electrode 123 may not be provided in the region where the second deposition stop layer 171 is provided and in the region where the third deposition stop layer 172 is provided.

[0401] Furthermore, the first deposition stop layer 175 is disposed on the second sub-electrode 123b of the second electrode 123 disposed in the normal region NA, so that the third sub-electrode 123c of the second electrode 123 is not deposited in the normal region NA (see Figure 7 ).

[0402] The height H1 of the first deposition stop layer 175 set in the normal region NA can be lower than each of the heights H2 of the second deposition stop layer 171 and H3 of the third deposition stop layer 172 set in the first transmission region TA1 of the first optical region DA1.

[0403] Here, the height of the first deposition stop layer 175 can refer to the shortest length of the first deposition stop layer 175 in the direction in which it is disposed on the second sub-electrode 123b in the normal region NA.

[0404] Furthermore, the height of each of the second deposition stop layer 171 and the third deposition stop layer 172 may refer to the shortest length in the direction in which the corresponding one of the second deposition stop layer 171 and the third deposition stop layer 172 is disposed or stacked on the organic layer 122 in the first transmission region TA1 of the first optical region DA1.

[0405] At the same time, Figure 10 and Figure 12 The diagram shows that the height of each of the second deposition stop layer 171 and the third deposition stop layer 172 is equal to the sum of the heights of the first sub-electrode 123a, the second sub-electrode 123b, and the third sub-electrode 123c; however, this disclosure is not limited thereto. For example, the height of each or at least one of the second deposition stop layer 171 and the third deposition stop layer 172 may be less than the sum of the heights of the first sub-electrode 123a, the second sub-electrode 123b, and the third sub-electrode 123c.

[0406] A mask (fine metal mask, FMM) can be used to deposit the second deposition stop layer 171 and the third deposition stop layer 172 to correspond to the first transmission region TA1.

[0407] The second deposition stop layer 171 and the third deposition stop layer 172 disposed in the first transmission region TA1 may have different areas (or sizes) on a flat surface. However, the areas of the second deposition stop layer 171 and the third deposition stop layer 172 are not limited thereto.

[0408] Furthermore, the shapes of the second deposition stop layer 171 and the third deposition stop layer 172 on the flat surface can be quadrilateral, but are not limited thereto. For example, each of the second deposition stop layer 171 and the third deposition stop layer 172 can be formed into any one of a circular shape, a semi-circular shape, an elliptical shape, or a polygonal shape on the flat surface.

[0409] When the second deposition stop layer 171 and the third deposition stop layer 172 have different areas or shapes, different masks can be used to form the second deposition stop layer 171 and the third deposition stop layer 172. (Refer to...) Figure 13 and Figure 14 The process for forming the second deposition stop layer 171 and the third deposition stop layer 172 is described in more detail.

[0410] The area of ​​the second electrode 123 disposed in the first transmission region TA1 is adjusted by adjusting the area and shape of the second deposition stop layer 171 and the third deposition stop layer 172, thereby adjusting the transmittance of the first transmission region TA1.

[0411] Specifically, in this example, it is assumed that the sum of the percentage of the area of ​​the second electrode 123 disposed in the first optical region DA1, the percentage of the area of ​​the second deposition stop layer 171 disposed in the first optical region DA1, and the percentage of the area of ​​the third deposition stop layer 172 disposed in the first optical region DA1 is 100%. In this example, the percentage of the area where the second deposition stop layer 171 and the third deposition stop layer 172 are disposed can be from 4% to 26%. For example, the percentage of the area where the second deposition stop layer 171 and the third deposition stop layer 172 are disposed can be from 6.9% to 9.9%.

[0412] In other words, the percentage of the area in the first optical region DA1 where the second electrode 123 is not disposed can be from 4% to 26%.

[0413] If the percentage of the area in the first optical region DA1 where the second electrode 123 is not disposed is less than 4%, the transmittance of the first transmission region TA1 may be significantly reduced.

[0414] Furthermore, if the percentage of the area in the first optical region DA1 where the second electrode 123 is not located exceeds 26%, UV reliability may be compromised. That is, the transmission of ultraviolet light causes degassing of the organic material, potentially leading to pixel shrinkage defects in the emitting unit.

[0415] In other words, the second electrode 123 is used to improve the UV reliability of the first transmission region TA1. The percentage of the area of ​​the first transmission region TA1 occupied by the second deposition stop layer 171 and the third deposition stop layer 172 is adjusted so that even if the second electrode 123 is not placed in a local area of ​​the first transmission region TA1, the reduction in UV reliability can be suppressed.

[0416] As described above, at least one second deposition stop layer 171 and at least one third deposition stop layer 172 are disposed in a portion of the first transmission region TA1 included in the first optical region DA1. Therefore, the second electrode 123 of the light-emitting diode 120 may not be disposed in the region where the second deposition stop layer 171 and the third deposition stop layer 172 are disposed. By doing so, the transmittance of the first transmission region TA1 can be improved.

[0417] Furthermore, in the remaining portion of the first transmission region TA1 of the first optical region DA1, the first sub-electrode 123a, the second sub-electrode 123b, and the third sub-electrode 123c of the second electrode 123 of the light-emitting diode 120 are sequentially stacked to improve the UV reliability of the first transmission region TA1.

[0418] Furthermore, the second electrode 123 of the light-emitting diode 120 disposed in the low-transmission region LTA of the first optical region DA1 includes a third sub-electrode 123c, so that the luminous efficiency of the light-emitting diode 120 can be improved by the microcavity effect of the light-emitting diode 120.

[0419] Therefore, it is not necessary to increase power consumption to improve the brightness of the first optical region DA1, where the density of the emission region EA of the first optical region DA1 is lower than that of the emission region EA of the ordinary region NA. Thus, even with low power, a high level of brightness characteristics can be maintained in both the ordinary region NA and the first optical region DA1.

[0420] Next, we will refer to Figure 13 and Figure 14 The following describes the process for forming a second deposition stop layer 171 and a third deposition stop layer 172 of a display device 100 according to an example embodiment of the present disclosure.

[0421] Figure 13 This is a schematic plan view of the mask used to form the second deposition stop layer.

[0422] Figure 14 This is a schematic plan view of the mask used to form the third deposition stop layer.

[0423] refer to Figure 13 and Figure 14The mask 210 (hereinafter referred to as the first mask) used to form the second deposition stop layer 171 in the first transmission region TA1 of the first optical region DA1 and the mask 220 (hereinafter referred to as the second mask) used to form the third deposition stop layer 172 in the first transmission region TA1 of the first optical region DA1 can be different masks.

[0424] In the first body 211 of the first mask 210, at least one first pattern 171a for forming the second deposition stop layer 171 can be prepared.

[0425] In the second body 212 of the second mask 220, at least one second pattern 172a for forming the third deposition stop layer 172 can be prepared.

[0426] The first pattern 171a and the second pattern 172a may have different sizes. However, this disclosure is not limited thereto, and the first pattern 171a and the second pattern 172a may have the same size.

[0427] The first pattern 171a and the second pattern 172a may have a quadrilateral shape on a flat surface. However, this disclosure is not limited thereto, and the shapes of the first pattern 171a and the second pattern 172a on the flat surface may be any one of a circle, a semicircle, an ellipse or a polygon.

[0428] The second deposition stop layer 171 and the third deposition stop layer 172 can be disposed between multiple emission regions EA disposed in the first optical region DA1. In order to place the second deposition stop layer 171 and the third deposition stop layer 172 uniformly at the desired position with the desired size, a margin between the first pattern 171a and the second pattern 172a is necessary.

[0429] Patterns of the same size are uniformly arranged on the entire surface of a mask used to form multiple emission regions EA disposed in the first optical region DA1, making it easy to align the mask and substrate by pulling the mask up, down, left and right.

[0430] Conversely, the patterns of the masks used to form the second deposition stop layer 171 and the third deposition stop layer 172 are different in size or shape, and specifically, the first optical region DA1 in which the second deposition stop layer 171 and the third deposition stop layer 172 are disposed is located in the upper edge of the display device 100. Therefore, it is difficult to align the mask and the substrate by pulling the mask up, down, left, and right.

[0431] Therefore, when forming the second deposition stop layer 171 and the third deposition stop layer 172, if different masks are used, the second deposition stop layer 171 and the third deposition stop layer 172 can be uniformly placed at the desired location with the desired size.

[0432] Figure 15 This is a table used to compare the efficiency of the light-emitting diodes of the display device according to Comparative Example 1 with the efficiency of the light-emitting diodes of the display device according to Example 1.

[0433] exist Figure 15 In the display device according to Comparative Example 1, the light-emitting diode includes a first electrode, an organic layer, and a single-layer second electrode. The light-emitting diode of the display device according to Example 1 has a [missing information - likely a component or element] disposed [missing information - likely a component or element]. Figure 10 The first optical region DA1 has the same structure as the light-emitting diode 120.

[0434] refer to Figure 15 According to Comparative Example 1, the light-emitting diodes of the display device showed 100% luminous efficiency for white (W), red (R), green (G), and blue (B).

[0435] In contrast, the light-emitting diode of the display device according to Example 1 shows an efficiency of 106% for white (W), 107% for red (R), 107% for green (G), and 107% for blue (B). Therefore, it should be understood that the luminous efficiency of the light-emitting diode of Example 1 for all colors of light is higher than that of the light-emitting diode of Comparative Example 1.

[0436] That is, in the display device according to an exemplary embodiment of the present disclosure, the light-emitting diode 120 disposed in the low-transmission region LTA of the first optical region DA1 includes a second electrode 123, and the second electrode 123 includes first to third sub-electrodes 123a, 123b and 123c to realize a microcavity effect. Therefore, high luminous efficiency can be achieved without increasing power consumption.

[0437] Figure 16 This is a graph, according to an exemplary embodiment of the present disclosure, used to compare the transmittance of the second electrode of a light-emitting diode disposed in a general area of ​​a display device with the transmittance of the second electrode of a light-emitting diode disposed in a first optical area of ​​the display device.

[0438] Figure 17 This is a table used to compare the panel transmittance of a normal area and the panel transmittance of a first optical area of ​​a display device according to an example embodiment of the present disclosure.

[0439] refer to Figure 16 and Figure 17It should be understood that the transmittance of the second electrode 123 of the light-emitting diode 120 disposed in the normal region NA is higher than that of the second electrode 123 of the light-emitting diode 120 disposed in the first optical region DA1.

[0440] Compared to the second electrode 123 of the LED 120 disposed in the normal region NA, the second electrode 123 of the LED 120 disposed in the first optical region DA1 further includes a third sub-electrode 123c. Therefore, the thickness of the second electrode 123 of the LED 120 disposed in the first optical region DA1 can be greater than the thickness of the second electrode 123 of the LED 120 disposed in the normal region NA.

[0441] By doing so, the second electrode 123 disposed in the normal region NA and the second electrode 123 disposed in the first optical region DA1 can have different transmittances.

[0442] However, as Figure 17 As shown, the panel transmittance of the first optical region DA1 to which a light-emitting diode including a second electrode 123 further including a third sub-electrode 123c is applied can be equal to the panel transmittance of the ordinary region NA to which a light-emitting diode including a second electrode 123 excluding the third sub-electrode 123c is applied.

[0443] Even though a light-emitting diode including a second electrode 123 with a third sub-electrode 123c is disposed in the first optical region DA1, and the second electrode 123 including the third sub-electrode 123c is disposed in a local region of the first transmission region TA1 of the first optical region DA1, the second deposition stop layer 171 and the third deposition stop layer 172 are also disposed in another local region of the first transmission region TA1. Therefore, it is possible for a region to exist in which the second electrode 123 including the third sub-electrode 123c is not disposed.

[0444] In other words, there exists a region in the first transmission region TA1 of the first optical region DA1 where the second electrode 123, including the third sub-electrode 123c, is not disposed. Therefore, even if the second electrode 123, including the third sub-electrode 123c, is disposed in a local region of the first optical region DA1, the panel transmittance of the first optical region DA1 can be improved.

[0445] The panel transmittance of the first optical region DA1 is equal to that of the ordinary region NA, so that no increase in power consumption is required to increase the amount of light emitted from the first optical region DA1.

[0446] Figure 18 This is a schematic plan view of the first optical region of a display device according to another exemplary embodiment of the present disclosure.

[0447] Apart from the areas of the second depositional stop layer 271 and the third depositional stop layer 272 Figure 18 The display device 200 and Figure 9 The display device 100 is basically the same as the display device 100, so repeated descriptions will be omitted.

[0448] refer to Figure 18 At least one second deposition stop layer 271 and at least one third deposition stop layer 272 may be disposed in the first transmission region TA1 of the first optical region DA1.

[0449] The area of ​​the second depositional stopping layer 271 can be equal to the area of ​​the third depositional stopping layer 272.

[0450] Furthermore, the shape of the second deposition stop layer 271 can be the same as the shape of the third deposition stop layer 272.

[0451] In this case, the second deposition stop layer 271 and the third deposition stop layer 272 can be formed using the same mask, or they can be formed using different masks.

[0452] like Figure 18 As shown, the transmittance of the first transmission region TA1 included in the first optical region DA1 is adjusted by adjusting the area and shape of the second deposition stop layer 271 and the area and shape of the third deposition stop layer 272, and UV reliability is ensured.

[0453] Figure 19 This is a schematic plan view of the first optical region of a display device according to yet another exemplary embodiment of the present disclosure.

[0454] In addition to the placement of the emission region EA of the green sub-pixel Green SP, the placement of multiple second deposition stop layers 371 and multiple third deposition stop layers 372, Figure 19 The display device 300 and Figure 9 The display device 100 is basically the same as the display device 100, so redundant descriptions will be omitted.

[0455] refer to Figure 19 The emission region EA set in the first optical region DA1, specifically the emission region EA set in the nth row, can be the emission region EA of multiple green sub-pixels Green SP. Here, n can be an odd integer of 1 or greater. In another equivalent example, n can be an even integer of 0 or greater (e.g., n can be 0, 2, 4, etc.).

[0456] Among the multiple emission areas EA set in the first optical region DA1, the emission area EA set in the (n+1)th row can be the emission area EA of multiple blue sub-pixels Blue SP and the emission area EA of multiple red sub-pixels Red SP. The emission area EA of blue sub-pixels Blue SP and the emission area EA of red sub-pixels Red SP set in each (n+1)th row can be set alternately.

[0457] Multiple emission regions EA set in the first optical region DA1 can have a structure that repeats the placement of the nth row and the placement of the (n+1)th row.

[0458] For example, when assuming that the placement of the first row in the nth row and the first row in the (n+1)th row is the first group G1, and the placement of the second row in the nth row and the second row in the (n+1)th row is the second group G2, the first group G1 and the second group G2 can be alternated relative to the row direction.

[0459] Furthermore, at least one second deposition stop layer 371 and at least one third deposition stop layer 372 may be disposed in the region between the first group G1 and the second group G2. For convenience, the region between the first group G1 and the second group G2 is not considered to constitute one of the nth or n+1th rows.

[0460] The second deposition stop layer 371 and the third deposition stop layer 372, located between the first group G1 and the second group G2, can be located in the same row. In this case, the second deposition stop layer 371 and the third deposition stop layer 372 can be arranged alternately, but are not limited to this.

[0461] Furthermore, the second deposition stop layer 371 can be set in the same column as the emission region EA of the green sub-pixel Green SP set in the first group G1 and the second group G2.

[0462] The third deposition stop layer 372 can be set in the same column as the emission region EA of another green sub-pixel Green SP, which is set in the first group G1 and the second group G2.

[0463] The second deposition stop layer 371 and the third deposition stop layer 372, which are set in the same row, can be set to be spaced apart from each other.

[0464] The second depositional stopping layer 371 and the third depositional stopping layer 372 have different areas, but are not limited thereto.

[0465] Furthermore, the second deposition stop layer 371 and the third deposition stop layer 372 may have a quadrilateral shape on a flat surface, but are not limited thereto.

[0466] As described above, the process for forming the second deposition stop layer 371 and the third deposition stop layer 372 disposed in the first optical region DA1 can be easily performed by changing the positions of the plurality of emission regions EA disposed in the first optical region DA1.

[0467] Specifically, at least one second deposition stop layer 371 and at least one third deposition stop layer 372 are disposed in the region between the first group G1 and the second group G2 in the first optical region DA1. Therefore, the mask used in the process of forming the second deposition stop layer 371 and the third deposition stop layer 372 can ensure a margin area.

[0468] Therefore, the reliability of the process used to form the second deposition stop layer 371 and the third deposition stop layer 372 in the first optical region DA1 can be improved.

[0469] Furthermore, at least one second deposition stop layer 371 and at least one third deposition stop layer 372 are disposed in a portion of the first transmission region TA1 included in the first optical region DA1. Therefore, the second electrode 123 of the light-emitting diode 120 may not be disposed in the region where the second deposition stop layer 371 and the third deposition stop layer 372 are disposed. By doing so, the transmittance of the first transmission region TA1 can be improved.

[0470] Furthermore, in the remaining portion of the first transmission region TA1 of the first optical region DA1, the first sub-electrode 123a, the second sub-electrode 123b, and the third sub-electrode 123c of the second electrode 123 of the light-emitting diode 120 are sequentially stacked to improve the UV reliability of the first transmission region TA1.

[0471] Furthermore, the second electrode 123 of the light-emitting diode 120 disposed in the low-transmission region LTA of the first optical region DA1 includes a third sub-electrode 123c, so that the luminous efficiency of the light-emitting diode 120 can be improved by the microcavity effect of the light-emitting diode 120.

[0472] Terms such as element 1-1, element 2-1, element 1-2, element 2-2, etc., may be referred to as first-first element, second-first element, first-second element, second-second element, etc. These terms are intended to identify corresponding elements from other elements, and are not used to define the nature, basis, order, or number of elements. In the example, an element may be an electrode, a sub-electrode, or something else.

[0473] Unless the context explicitly states otherwise, an element may include multiple elements. Unless the context explicitly indicates otherwise, a line may include multiple lines; a first horizontal line HL1 may include multiple first horizontal lines HL1; a second horizontal line HL2 may include multiple second horizontal lines HL2; a first vertical line VL1 may include multiple first vertical lines VL1; a second vertical line VL2 may include multiple second vertical lines VL2; and a general vertical line VLn may include multiple general vertical lines VLn.

[0474] Unless the context clearly indicates otherwise, a region may include multiple regions; a transmission area (EA) may include multiple transmission areas (EAs).

[0475] Various examples and aspects of this disclosure are described below. These are provided by way of example and do not limit the scope of this disclosure.

[0476] According to one or more exemplary embodiments of this disclosure, a display device is provided. The display device includes a substrate, an optical region including a first emitting region and a transmissive region, and a general region including a second emitting region and surrounding the optical region. The display device further includes a planarization layer disposed on the substrate and in both the optical region and the general region. The display device also includes a first light-emitting diode disposed on the planarization layer in the second emitting region and including a first electrode, a first organic layer disposed on the first electrode, and a second electrode disposed on the first organic layer. The display device further includes a first deposition stop layer disposed on the second electrode in the second emitting region and at least one second deposition stop layer disposed on the planarization layer in a portion of the transmissive region.

[0477] The second-first electrode disposed in the second emission region may include a first-first sub-electrode disposed on the first organic layer and a second-first sub-electrode disposed on the first-first sub-electrode.

[0478] The first deposition stop layer can be set on the second-first sub-electrode.

[0479] The display device may further include a second light-emitting diode disposed on a planarization layer in the first emitting region, and including a first second electrode, a second organic layer disposed on the first second electrode, and a second-second electrode disposed on the second organic layer. The second organic layer disposed in the first emitting region may extend to a local area of ​​the transmissive region.

[0480] The second organic layer disposed in the first emission region may include a hole injection layer, a hole transport layer disposed on the hole injection layer, an emission layer disposed on the hole transport layer, an electron transport layer disposed on the emission layer, and an electron injection layer disposed on the electron transport layer, and at least one of the hole injection layer, hole transport layer, electron transport layer and electron injection layer may be disposed in the transmission region.

[0481] The second-second electrode disposed in the first emission region may include a first-second sub-electrode disposed on the second organic layer, a second-second sub-electrode disposed on the first-second sub-electrode, and a third sub-electrode disposed on the second-second sub-electrode.

[0482] The thickness of the second-second electrode disposed in the first emission region can be greater than the thickness of the second-first electrode disposed in the second emission region.

[0483] The display device may also include at least one third deposition stop layer disposed on a planarization layer in another portion of the transmission region and spaced apart from the second deposition stop layer.

[0484] The second-second electrode disposed in the first emission region may include a first-second sub-electrode disposed on the second organic layer, a second-second sub-electrode disposed on the first-second sub-electrode, and a third sub-electrode disposed on the second-second sub-electrode, and the first-second sub-electrode, the second-second sub-electrode, and the third sub-electrode may be sequentially stacked in the remaining region except for the region of the transmission region in which the second deposition stop layer and the third deposition stop layer are disposed.

[0485] The height of the second depositional stopping layer can be equal to the height of the third depositional stopping layer.

[0486] The height of the first depositional stopping layer can be lower than the height of the second and third depositional stopping layers.

[0487] The first deposition stop layer can be located on a different layer than the second and third deposition stop layers, and the second deposition stop layer can be located on the same layer as the third deposition stop layer.

[0488] Multiple first emission regions may include multiple first color emission regions, multiple second color emission regions, and multiple third color emission regions. In the optical region, the multiple first color emission regions may be arranged in the nth row (where n is an odd integer of 1 or greater) and may be spaced apart from each other. The multiple second color emission regions and the multiple third color emission regions may be arranged in the 4kth row (where k is an integer of 1 or greater). The second color emission regions and the third color emission regions may be arranged alternately in each of the 4kth rows.

[0489] In the example, within the optical region, multiple first-color emitting regions can be arranged in an odd number of rows and can be spaced apart from each other. Within the optical region, multiple second-color emitting regions and multiple third-color emitting regions can be arranged in some rows, and the second-color and third-color emitting regions can be arranged alternately in each of the rows. Some rows can exclude rows occupied by multiple first-color emitting regions.

[0490] The second deposition stop layer can be disposed between the corresponding first color emission regions in the corresponding odd-numbered rows. The third deposition stop layer can be disposed between the corresponding first color emission regions in the corresponding odd-numbered rows.

[0491] The second deposition stop layer can be disposed between two corresponding first color emission regions in the row direction and between two corresponding first color emission regions in the column direction. The third deposition stop layer can be disposed between two corresponding first color emission regions in the row direction and between two corresponding first color emission regions in the column direction.

[0492] The first group may include: a first color emission region disposed in the first row; and a second color emission region and a third color emission region disposed in the second row. The second group may include a first color emission region disposed in the third row; and a second color emission region and a third color emission region disposed in the fourth row. A second deposition stop layer and a third deposition stop layer may be disposed in the region between the first and second groups. Multiple first color emission regions may include the first color emission regions included in the first group and the first color emission regions included in the second group. Multiple second color emission regions may include the second color emission regions included in the first group and the second color emission regions included in the second group. Multiple third color emission regions may include the third color emission regions included in the first group and the third color emission regions included in the second group.

[0493] The second deposition stop layer can be positioned between two corresponding first color emission regions in the column direction. The third deposition stop layer can also be positioned between two corresponding first color emission regions in the column direction.

[0494] The general region may include a non-emission region surrounding the second emission region, and the first deposition stop layer may be disposed in the non-emission region.

[0495] According to one or more exemplary embodiments of this disclosure, a display device is provided. The display device includes a substrate, an optical region including a first emitting region and a transmissive region, and a general region including a second emitting region. The display device further includes: a first light-emitting diode disposed in the second emitting region and including a first-first electrode, a first organic layer disposed on the first-first electrode, and a second-first electrode disposed on the first organic layer; and a second light-emitting diode disposed in the first emitting region and including a first-second electrode, a second organic layer disposed on the first-second electrode, and a second-second electrode disposed on the second organic layer. The thickness of the second-second electrode of the second light-emitting diode may be greater than the thickness of the second-first electrode of the first light-emitting diode.

[0496] The display device may further include: a dam; a first deposition stop layer disposed on a second-first electrode in a second emission region; and at least one second deposition stop layer disposed in a portion of a transmission region. The dam may have a first opening for a first light-emitting diode and a second opening for a second light-emitting diode. The second-second electrode may be disposed in a second portion of the transmission region, rather than in the aforementioned portion of the transmission region.

[0497] The first deposition stop layer can be set throughout the general area.

[0498] In one or more examples, the first deposition stop layer is not set in the optical region.

[0499] The first deposition stop layer can be disposed on the second-first electrode of the first light-emitting diode.

[0500] In one or more examples, the first deposition stop layer is not disposed on the second-second electrode of the second light-emitting diode.

[0501] In one or more examples, at least the top layer of the second-second electrode is not disposed on the first deposition stop layer.

[0502] The description herein has been presented to enable any person skilled in the art to make, use, and practice the technical features of this disclosure, and has been provided in the context of one or more particular example applications and their example requirements. Although exemplary embodiments of this disclosure have been described in detail with reference to the accompanying drawings, this disclosure is not limited thereto and may be embodied in many different forms without departing from the technical concept of this disclosure. Therefore, the exemplary embodiments of this disclosure are provided for illustrative purposes only and are not intended to limit the technical concept of this disclosure. The scope of the technical concept of this disclosure is not limited thereto. Therefore, it should be understood that the above exemplary embodiments are illustrative in all respects and do not limit this disclosure. All technical concepts within the equivalent scope of this disclosure should be construed as falling within the scope of this disclosure.

Claims

1. A display device, comprising: substrate; An optical region, the optical region comprising a first emitting region and a transmitting region; A general region, which includes a second emission region and surrounds the optical region; A planarization layer is disposed on the substrate and in the optical region and the general region; A first light-emitting diode is disposed on the planarization layer in the second emission region, and includes a first electrode, a first organic layer disposed on the first electrode, and a second electrode disposed on the first organic layer; A first deposition stop layer is disposed on the second-first electrode in the second emission region; as well as At least one second deposition stop layer is disposed on the planarization layer in a portion of the transmission region.

2. The display device according to claim 1, wherein, The second-first electrode disposed in the second emission region includes a first-first sub-electrode disposed on the first organic layer and a second-first sub-electrode disposed on the first-first sub-electrode.

3. The display device according to claim 2, wherein, The first deposition stop layer is disposed on the second-first sub-electrode.

4. The display device according to claim 1, further comprising: The second light-emitting diode is disposed on the planarization layer in the first emission region, and includes a first-second electrode, a second organic layer disposed on the first-second electrode, and a second-second electrode disposed on the second organic layer. The second organic layer disposed in the first emission region extends into a local area of ​​the transmission region.

5. The display device according to claim 4, wherein, The second organic layer disposed in the first emission region includes a hole injection layer, a hole transport layer disposed on the hole injection layer, an emission layer disposed on the hole transport layer, an electron transport layer disposed on the emission layer, and an electron injection layer disposed on the electron transport layer. In this embodiment, at least one of the hole injection layer, the hole transport layer, the electron transport layer, and the electron injection layer is disposed in the transmission region.

6. The display device according to claim 4, wherein, The second-second electrode disposed in the first emission region includes a first-second sub-electrode disposed on the second organic layer, a second-second sub-electrode disposed on the first-second sub-electrode, and a third sub-electrode disposed on the second-second sub-electrode.

7. The display device according to claim 4, wherein, The thickness of the second-second electrode disposed in the first emission region is greater than the thickness of the second-first electrode disposed in the second emission region.

8. The display device according to claim 4, further comprising: At least one third deposition stop layer is disposed on the planarization layer in another portion of the transmission region and spaced apart from the at least one second deposition stop layer.

9. The display device according to claim 8, wherein, The second-second electrode disposed in the first emission region includes a first-second sub-electrode disposed on the second organic layer, a second-second sub-electrode disposed on the first-second sub-electrode, and a third sub-electrode disposed on the second-second sub-electrode. The first and second sub-electrodes, the second and third sub-electrodes, and the third sub-electrode are sequentially stacked in the remaining region of the transmission region, and The remaining area of ​​the transmission region does not include the area of ​​the transmission region in which the at least one second deposition stop layer is disposed, nor does it include the area of ​​the transmission region in which the at least one third deposition stop layer is disposed.

10. The display device according to claim 8, wherein, The height of the at least one second deposition stop layer is equal to the height of the at least one third deposition stop layer.

11. The display device according to claim 8, wherein, The height of the first deposition stop layer is less than the height of the at least one second deposition stop layer and less than the height of the at least one third deposition stop layer.

12. The display device according to claim 8, wherein, The first deposition stop layer and the layer on which at least one second deposition stop layer and at least one third deposition stop layer are disposed on different layers, and The at least one second deposition stop layer and the at least one third deposition stop layer are disposed on the same layer.

13. The display device according to claim 8, wherein, The multiple first emission regions include multiple first color emission regions, multiple second color emission regions, and multiple third color emission regions. In the optical region, the plurality of first color emission regions are arranged in an odd number of rows and spaced apart from each other, and In the optical region, the plurality of second color emitting regions and the plurality of third color emitting regions are arranged in rows, and the second color emitting regions and the third color emitting regions are alternately arranged in each of the rows. Some of the rows do not include the rows occupied by the plurality of first color emission regions.

14. The display device according to claim 13, wherein, The at least one second deposition stop layer is disposed between the corresponding first color emission regions disposed in the corresponding odd-numbered rows, and The at least one third deposition stop layer is disposed between the corresponding first color emission regions disposed in the corresponding odd-numbered rows.

15. The display device according to claim 14, wherein, The at least one second deposition stop layer is disposed between two corresponding first color emission regions in the row direction and between two corresponding first color emission regions in the column direction. The at least one third deposition stop layer is disposed between two corresponding first color emission regions in the row direction and between two corresponding first color emission regions in the column direction.

16. The display device according to claim 13, wherein, The first group includes: Set the first color emission region in the first row; And the second and third color emission regions set in the second row, The second group includes: a first color emission region set in the third row; and a second and third color emission regions set in the fourth row. The at least one second deposition stop layer and the at least one third deposition stop layer are disposed in the region between the first group and the second group. The plurality of first color emission regions include the first color emission regions included in the first group and the first color emission regions included in the second group. Wherein, the plurality of second color emission regions include the second color emission regions included in the first group and the second color emission regions included in the second group, and The plurality of third color emission regions include the third color emission regions included in the first group and the third color emission regions included in the second group.

17. The display device according to claim 16, wherein, The at least one second deposition stop layer is disposed in the column direction between two corresponding first color emission regions, and The at least one third deposition stop layer is disposed between two corresponding first color emission regions in the column direction.

18. The display device according to claim 1, wherein, The general area includes the non-emission area surrounding the second emission area, and The first deposition stop layer is disposed in the non-emission region.

19. A display device, comprising: substrate; An optical region, the optical region comprising a first emitting region and a transmitting region; A general area, which includes a second transmission area; A first light-emitting diode, the first light-emitting diode being disposed in the second emission region and including a first electrode, a first organic layer disposed on the first electrode, and a second electrode disposed on the first organic layer; as well as The second light-emitting diode is disposed in the first emitting region and includes a first-second electrode, a second organic layer disposed on the first-second electrode, and a second-second electrode disposed on the second organic layer. The thickness of the second-second electrode of the second light-emitting diode is greater than the thickness of the second-first electrode of the first light-emitting diode.

20. The display device according to claim 19, further comprising: Dike section; A first deposition stop layer is disposed on the second-first electrode in the second emission region; as well as At least one second deposition stop layer is disposed in a portion of the transmission region. The embankment has a first opening for the first light-emitting diode and a second opening for the second light-emitting diode. The second electrode is disposed in the second part of the transmission region, but not in the first part of the transmission region.

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