A method of preparing an alloy resistant to ion sputtering

By preparing a vanadium alloy coating resistant to helium ion sputtering, the problem of device damage caused by helium ion sputtering in the prior art was solved, and the long-term stable operation of the device was achieved.

CN122406004APending Publication Date: 2026-07-17SAE TECH DELEVOPMENT DONGGUAN
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
SAE TECH DELEVOPMENT DONGGUAN
Filing Date
2025-01-17
Publication Date
2026-07-17

AI Technical Summary

Technical Problem

Existing protective measures are insufficient to resist helium ion sputtering, resulting in severe surface damage to nuclear fusion devices and affecting their service life.

Method used

To prepare vanadium alloy materials with high resistance to helium ion sputtering, vanadium raw materials are mixed with preset alloying elements in a specific ratio, and then subjected to vacuum pretreatment, melting, and cooling to obtain vanadium alloy coating materials for use on the device wall.

Benefits of technology

It effectively resists helium ion sputtering, extends the service life of the device, and enhances the damage resistance of the device surface.

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Abstract

本发明公开了一种抗离子溅射的合金制备方法，包括：将钒原料和预设合金元素的原料按照预设比例进行混合，获得合金原料；将所述合金原料置于真空炉中，并在预设温度下对所述合金原料进行预处理；将预处理后的合金原料置于熔炼炉中进行熔炼，使所述预处理后的合金原料熔化并混合均匀；对熔炼后的合金原料进行冷却及脱模处理，获得抗氦离子溅射的钒合金材料，以用作装置壁面的涂层材料。采用本发明的技术方案通过制备具有高抗氦离子溅射性能的钒合金材料，并采用制得的钒合金材料作为装置壁面的涂层材料，能够有效抵抗氦离子的溅射对装置壁面造成的损伤，从而延长装置的使用寿命。
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