Laser galvanometer scanning device and laser printing apparatus

Abstract

The application provides a laser galvanometer scanning device and a laser printing device, and relates to the technical field of laser processing. The laser galvanometer scanning device comprises a lens group and a plurality of laser units, and the lens group is located on the light emitting side of the laser units; the plurality of laser units are used for respectively emitting light beams to the lens group so that the light beams are converged by the lens group to form a plurality of converged light beams. The laser galvanometer scanning device and the laser printing device are used to solve the problem of low scanning speed of the laser galvanometer scanning device.

Description

Technical Field

[0001] This application relates to the field of laser processing technology, and in particular to a laser galvanometer scanning device and a laser printing equipment. Background Technology

[0002] In a laser galvanometer scanning device, a focusing lens (also known as an F-theta field lens) is used in conjunction with the galvanometer. When a collimated laser beam is incident on the galvanometer, its incident angle is changed by the galvanometer's reflector, and then it enters the focusing lens. The focusing lens can precisely focus the beam onto the workpiece surface, thereby enabling laser processing of the workpiece within a specific area.

[0003] However, existing laser galvanometer scanning devices suffer from low scanning speed. Summary of the Invention

[0004] This application provides a laser galvanometer scanning device to solve the problem of low scanning speed in laser galvanometer scanning devices.

[0005] In a first aspect, this application provides a laser galvanometer scanning device, including a lens group and multiple laser units;

[0006] The lens group is located on the light-emitting side of the laser unit;

[0007] Multiple laser units are used to emit light beams to the lens group respectively, so that the light beams are converged by the lens group to form multiple converged beams.

[0008] As an optional implementation, the laser unit includes a laser emitter and an aperture;

[0009] The aperture is located between the laser emitter and the lens group, and the laser emitter can emit a beam of light toward the aperture.

[0010] As an alternative implementation, the axis of the aperture is offset from the axis of the lens group.

[0011] As an optional implementation, the plurality of apertures are spaced apart around the axis of the lens group.

[0012] As an optional implementation, the lens group has a first reference axis and a second reference axis, the first reference axis and the second reference axis are perpendicular to each other, and both the first reference axis and the second reference axis pass through the axis of the lens group;

[0013] In the plane containing the first reference axis and the second reference axis, the axes of the plurality of apertures are equidistant from the first reference axis;

[0014] And / or, in the plane containing the first reference axis and the second reference axis, the axes of the plurality of apertures are equidistant from the second reference axis.

[0015] As an optional implementation, in the plane containing the first reference axis and the second reference axis, the distance between the axis of the aperture and the first reference axis is equal to the distance between the axis of the aperture and the second reference axis.

[0016] As an optional implementation, the number of laser units is four.

[0017] As an optional implementation, the laser unit further includes a galvanometer;

[0018] The galvanometer is located between the laser emitter and the aperture. The laser emitter can emit a light beam toward the galvanometer, and the galvanometer is used to guide the light beam emitted by the laser emitter to the aperture.

[0019] As an optional implementation, the lens group includes a first lens, a second lens, a third lens, a fourth lens, and a fifth lens arranged coaxially along the direction of beam propagation.

[0020] The first lens has a first incident surface and a first exit surface disposed opposite to each other, the first incident surface is a concave curved surface, and the first exit surface is a convex curved surface or a plane;

[0021] The second lens has a second incident surface and a second exit surface that are arranged opposite to each other. The second incident surface is a concave curved surface and the second exit surface is a convex curved surface.

[0022] The third lens has a third incident surface and a third exit surface that are arranged opposite to each other, and both the third incident surface and the third exit surface are convex curved surfaces;

[0023] The fourth lens has a fourth incident surface and a fourth exit surface that are arranged opposite to each other, and both the fourth incident surface and the fourth exit surface are convex curved surfaces;

[0024] The fifth lens has a fifth incident surface and a fifth exit surface arranged opposite to each other. The fifth incident surface is a concave curved surface, and the fifth exit surface is a concave curved surface or a plane.

[0025] As an optional implementation, the radius of curvature of the first incident surface is in the range of -141.4 mm ± 10%.

[0026] The radius of curvature of the first exit surface ranges from -1412.9 mm ± 10%.

[0027] The radius of curvature of the second incident surface ranges from -336.0 mm ± 10%.

[0028] The radius of curvature of the second exit surface ranges from -187.6 mm ± 10%.

[0029] The radius of curvature of the third incident surface is in the range of 2007.9 mm ± 10%.

[0030] The radius of curvature of the third exit surface is in the range of -245.3mm ± 10%.

[0031] The radius of curvature of the fourth incident surface is in the range of 701.7 mm ± 10%.

[0032] The radius of curvature of the fourth exit surface ranges from -623.7 mm ± 10%.

[0033] The radius of curvature of the fifth incident surface ranges from -369.0 mm ± 10%.

[0034] As an optional implementation, the fifth exit surface is a plane;

[0035] And / or, the first exit surface is a plane.

[0036] As an optional implementation, the absolute values ​​of the radius of curvature of the fourth incident surface and the radius of curvature of the fourth exit surface are equal.

[0037] As an optional implementation, the center thickness of the first lens ranges from 11.6 mm ± 10%.

[0038] The center thickness of the second lens ranges from 50.1 mm ± 10%.

[0039] The center thickness of the third lens is in the range of 51.4 mm ± 10%.

[0040] The center thickness of the fourth lens is in the range of 31.7mm ± 10%.

[0041] The center thickness of the fifth lens ranges from 20.9 mm ± 10%.

[0042] As an optional implementation, the refractive index of the first lens ranges from 1.458 ± 5%; the Abbe number of the first lens ranges from 67.8 ± 5%.

[0043] The refractive index of the second lens ranges from 1.458±5%, and the Abbe number of the second lens ranges from 67.8±5%.

[0044] The refractive index of the third lens ranges from 1.458±5%, and the Abbe number of the third lens ranges from 67.8±5%.

[0045] The refractive index of the fourth lens is in the range of 1.458±5%, and the Abbe number of the fourth lens is in the range of 67.8±5%.

[0046] The refractive index of the fifth lens is in the range of 1.458±5%, and the Abbe number of the fifth lens is in the range of 67.8±5%.

[0047] Secondly, this application provides a laser printing device, including a focusing plane and any of the above-mentioned laser galvanometer scanning devices;

[0048] The focusing plane is disposed on the light-emitting side of the lens group, and the focusing plane is provided with multiple processing areas. The converging light is correspondingly irradiated within the processing areas, and at least a portion of the processing areas corresponding to the converging light are at least partially overlapped.

[0049] The laser galvanometer scanning device and laser printing equipment provided in this application include a lens group and multiple laser units. The lens group is located on the light-emitting side of the laser units. The multiple laser units emit laser beams to the lens group, which then converges the beams to form multiple converged beams. By setting multiple laser units, each laser unit can independently emit a laser beam, which is then converged by the lens group to form a converged beam. Multiple converged beams can then act simultaneously on the processing area, achieving simultaneous processing. Compared to the traditional one-to-one pairing of a single galvanometer and a field lens, this multi-beam parallel processing method effectively improves scanning speed and processing efficiency. Attached Figure Description

[0050] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this application and, together with the description, serve to explain the principles of this application.

[0051] Figure 1 This is a schematic diagram of the lens group and aperture in the laser galvanometer scanning device provided in the embodiments of this application;

[0052] Figure 2 This is a schematic diagram of the optical path of a laser printing device provided in an embodiment of this application;

[0053] Figure 3 for Figure 1 Left view of the laser galvanometer scanning device Figure 1 ;

[0054] Figure 4 for Figure 1 Left view of the laser galvanometer scanning deviceFigure 2 ;

[0055] Figure 5 for Figure 1 Left view of the laser galvanometer scanning device Figure 3 ;

[0056] Figure 6 Schematic diagram of the simulation points of the laser galvanometer scanning device provided in the embodiments of this application. Figure 1 ;

[0057] Figure 7 Schematic diagram of the simulation points of the laser galvanometer scanning device provided in the embodiments of this application. Figure 2 .

[0058] Explanation of reference numerals in the attached figures:

[0059] 100. Lens group; 101. First reference axis; 102. Second reference axis; 103. Axis;

[0060] 110. First lens; 111. First incident surface; 112. First exit surface;

[0061] 120. Second lens; 121. Second incident surface; 122. Second exit surface;

[0062] 130. Third lens; 131. Third incident surface; 132. Third exit surface;

[0063] 140. Fourth lens; 141. Fourth incident surface; 142. Fourth exit surface;

[0064] 150. Fifth lens; 151. Fifth incident surface; 152. Fifth exit surface;

[0065] 200. Laser unit;

[0066] 210. Laser emitter;

[0067] 220. Aperture stop; 221. First aperture stop; 222. Second aperture stop; 223. Third aperture stop; 224. Fourth aperture stop;

[0068] 230. Galvanometer;

[0069] 300, beam;

[0070] 400, Converging Light;

[0071] 900, focal plane.

[0072] The accompanying drawings illustrate specific embodiments of this application, which will be described in more detail below. These drawings and descriptions are not intended to limit the scope of the concept in any way, but rather to illustrate the concept of this application to those skilled in the art through reference to particular embodiments. Detailed Implementation

[0073] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the embodiments of this application, and not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the protection scope of the embodiments of this application.

[0074] In the embodiments of this application, the terms "upper," "lower," "inner," "middle," "outer," "front," and "rear," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are mainly for better describing the embodiments of this application and their implementations, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation. Furthermore, some of the above terms may be used to indicate other meanings besides orientation or positional relationship; for example, the term "upper" may also be used in some cases to indicate a certain dependency or connection relationship. For those skilled in the art, the specific meaning of these terms in the embodiments of this application can be understood according to the specific circumstances.

[0075] Furthermore, the terms "set up," "connect," and "fix" should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral structure; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, or it can be an internal connection between two devices, components, or parts. Those skilled in the art can understand the specific meaning of the above terms in the embodiments of this disclosure according to the specific circumstances.

[0076] The terms "first," "second," "third," "fourth," etc. (if present) in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate so that embodiments of the present application described herein can be implemented, for example, in orders other than those illustrated or described herein.

[0077] In this application, the terms "exemplarily" or "for example" are used to indicate examples, illustrations, or descriptions. Any embodiment or design described as "exemplarily" or "for example" in this application should not be construed as being more preferred or advantageous than other embodiments or designs. Specifically, the use of terms such as "exemplarily" or "for example" is intended to present the relevant concepts in a specific manner.

[0078] As described in the background section, in a laser galvanometer scanning device, a focusing lens (also known as an F-theta field lens) is used in conjunction with the galvanometer. When a collimated laser beam is incident on the galvanometer, its incident angle is changed by the galvanometer's reflector, and then it enters the focusing lens. The focusing lens can precisely focus the beam onto the workpiece surface, thereby enabling laser processing of the workpiece within a specific area.

[0079] Related technologies incorporate a four-galvanometer system in laser galvanometer scanning devices. This multi-galvanometer, multi-field mirror scanning scheme increases the scanning area, facilitating large-spot laser processing over wider areas. However, within a single area, scanning still relies on a one-to-one pairing of a single galvanometer and a field mirror, resulting in no increase in scanning speed. Furthermore, this multi-galvanometer, multi-field mirror structure increases the size of the laser galvanometer scanning device, making it difficult to adapt to industrial robots or compact processing platforms.

[0080] In view of this, embodiments of this application provide a laser galvanometer scanning device and a laser printing device, wherein the laser galvanometer scanning device includes a lens group and multiple laser units, the lens group being located on the light-emitting side of the laser units; the multiple laser units are used to emit light beams to the lens group respectively, so that the light beams are converged by the lens group to form multiple converged light beams.

[0081] By setting up multiple laser units, each of which can independently emit a laser beam, which is then converged by a lens group to form a focused beam, multiple focused beams can simultaneously act on the processing area, achieving simultaneous processing. Compared to the traditional one-to-one pairing of a single galvanometer and a field lens, this multi-beam parallel processing method can effectively improve scanning speed and processing efficiency.

[0082] Furthermore, by employing a design with multiple laser units and a lens group, the laser galvanometer scanning device of this application reduces the need for multiple lens groups. Compared with the structure of multiple galvanometers paired with multiple field mirrors, it simplifies the complexity of the structure, reduces the overall size, and can improve adaptability while retaining high-efficiency processing capabilities, making it suitable for integration into industrial robots or compact processing platforms.

[0083] The technical solution of this application will be described in detail below with reference to the accompanying drawings and specific embodiments. The following specific embodiments can be combined with each other, and the same or similar concepts or processes may not be described again in some embodiments.

[0084] Combination Figure 1 and Figure 2 As shown, the first aspect of this application provides a laser galvanometer scanning device, including a lens group 100 and a plurality of laser units 200. The lens group 100 is located on the light-emitting side of the laser units 200, and the plurality of laser units 200 are used to emit light beams 300 to the lens group 100 respectively, so that the light beams 300 are converged by the lens group 100 to form multiple converged light beams 400.

[0085] By setting up multiple laser units 200, each capable of independently emitting a laser beam 300, multiple laser beams can be generated simultaneously, instead of relying on a single laser beam 300 for scanning and processing. The parallel operation of multiple laser units 200 significantly increases the total output of the laser beams 300, thereby increasing the processing capacity per unit time.

[0086] The lens group 100 is located on the light-emitting side of the laser unit 200 and can converge the beams 300 from multiple laser units 200. Compared with the traditional single-beam 300 scanning method, the converging function of the lens group 100 allows multiple converged beams 400 to act on the processing area simultaneously, realizing parallel processing and thus improving the scanning speed.

[0087] By combining multiple laser units 200 with the lens group 100, the beam 300 of each laser unit 200 can reach the lens group 100 through an independent optical path and be effectively converged. This design improves the flexibility of the laser galvanometer scanning device, helps ensure that each beam 300 can participate in the processing in the best way, and improves the overall processing efficiency.

[0088] It should be noted that in the multiple converging beams 400, at least a portion of the beams overlap. In the overlapping areas, the energy of the beams 300 can be superimposed, increasing the light energy density. Partial processing areas can be configured to correspond to the overlapping areas of the converging beams 400, utilizing the high energy density resulting from the superposition of the beams 300 to achieve more efficient material processing, thereby enabling faster or more thorough cutting, welding, or other forms of processing.

[0089] Specifically, the laser galvanometer scanning device provided in this application embodiment, by employing multiple laser units 200 and a lens group 100, can realize parallel processing of multiple beams 300. Compared with the traditional one-to-one pairing of a single galvanometer 230 and a field lens, it significantly improves scanning speed and processing efficiency.

[0090] Meanwhile, by employing multiple laser units 200 and a lens group 100, the laser galvanometer scanning device of this application embodiment reduces the need for multiple lens groups 100. Compared with the structure of multiple galvanometers 230 paired with multiple field mirrors, it simplifies the structure of the device, reduces the overall size, and improves the adaptability of the device, making it suitable for integration into industrial robots or compact processing platforms.

[0091] In some embodiments, the laser unit 200 includes a laser emitter 210 and an aperture 220; the aperture 220 is located between the laser emitter 210 and the lens group 100, and the laser emitter 210 can emit a light beam 300 toward the aperture 220.

[0092] Understandably, the laser emitter 210 is the initial source of the laser beam 300, responsible for generating the laser beam 300 and guiding it to the aperture 220. By precisely controlling the output of the laser emitter 210, the stability and consistency of the laser beam 300 can be ensured, providing a high-quality light source for subsequent optical processing.

[0093] For example, the laser emitter 210 can have a wavelength of 1064nm, suitable for processing scenarios such as metal marking, welding, and cutting (e.g., stainless steel, aluminum alloy). Correspondingly, the surface of the lens group 100 is coated with a high-reflectivity film layer for the 1064nm wavelength to ensure maximum laser transmittance while suppressing stray light of other wavelengths.

[0094] The function of the aperture 220 is to limit and shape the optical path and spot size of the laser beam 300. By adjusting the size and shape of the aperture 220, the characteristics of the beam 300 entering the lens group 100, such as the beam diameter and divergence angle, can be controlled. This helps to optimize the focusing effect of the beam 300, improving processing accuracy and efficiency.

[0095] Specifically, by combining the laser emitter 210, the aperture 220, and the lens group 100, it can be ensured that the beam 300 can be effectively guided and processed, so that the beam 300 of each laser unit 200 can be precisely controlled and focused to participate in the processing in the best way, thereby improving the overall processing efficiency.

[0096] Combination Figure 1 As shown, in some embodiments, the axis of aperture 220 is offset from the axis 103 of lens group 100.

[0097] If the axis of aperture 220 deviates from the axis 103 of lens group 100, the beam 300 will be incident on lens group 100 in an off-center manner. Different incident angles will cause optical path differences. Lens group 100 can compensate for this optical path difference, so that no matter from which angle the beam 300 is incident, it can be focused on the processing area, achieving efficient material processing.

[0098] Understandably, multiple laser units 200 share multiple apertures 220. By off-centering the apertures 220 with the lens group 100, the incident position of the beam 300 is ensured while facilitating a compact layout between the multiple apertures 220 and the lens group 100. For example, in miniaturized laser processing equipment, the off-center design can reduce the physical distance between the apertures 220 and the lens group 100, reduce the size of the equipment, and also reserve more space for other components (such as the laser emitter 210 and the beam expander).

[0099] It should be noted that the axis of the aperture stop 220 may be parallel to the axis 103 of the lens group 100 but not coincident or at an angle. That is, when the light beam 300 passes through the aperture stop 220 and enters the lens group 100, its incident direction may be parallel to the axis 103 of the lens group 100 or at an angle.

[0100] Combination Figure 3 As shown, in some embodiments, multiple apertures 220 are spaced apart around the axis 103 of the lens group 100.

[0101] By using a spaced distribution, the aperture 220 can effectively manage and guide the beams 300 from different laser units 200, ensuring they propagate along the optimal path within the lens group 100. This arrangement helps to maximize the optical performance of the lens group 100, achieving more uniform and flexible beam 300 coverage and improving the uniformity and efficiency of the processing area.

[0102] Specifically, by distributing multiple aperture stops 220 at intervals around the axis 103 of the lens group 100, each aperture stop 220 can independently control the path of the beam 300 of a laser unit 200. This interval distribution allows the beam 300 to enter the lens group 100 at different incident angles and positions, optimizing the spatial distribution of the beam 300. By controlling the interval and position of the aperture stops 220, interference and overlap between beams 300 can be reduced, and uniform coverage of the converged light 400 within the processing area can be achieved.

[0103] Combination Figure 4 and Figure 5 As shown, in some embodiments, the lens group 100 has a first reference axis 101 and a second reference axis 102, which are perpendicular to each other and both pass through the axis 103 of the lens group 100. By defining two mutually perpendicular reference axes, a standard coordinate system can be provided for the lens group 100 to accurately describe the setting position of the aperture stop 220.

[0104] It should be noted that when there is an angle between the axis of the aperture 220 and the axis 103 of the lens group 100, the minimum distance between the axis of the aperture 220 near the laser emitter 210 and the first reference axis 101, and the minimum distance between the axis of the aperture 220 away from the laser emitter 210 and the first reference axis 101, can be taken as the distance between the axis of the aperture 220 and the first reference axis 101. Similarly, the minimum distance between the axis of the aperture 220 near the laser emitter 210 and the second reference axis 102, and the minimum distance between the axis of the aperture 220 away from the laser emitter 210 and the second reference axis 102, can be taken as the distance between the axis of the aperture 220 and the second reference axis 102.

[0105] Combination Figure 5 As shown, in some embodiments, in the plane containing the first reference axis 101 and the second reference axis 102, the axes of the plurality of apertures 220 are equidistant from the first reference axis 101.

[0106] By setting the distance between the axis of the aperture 220 and the first reference axis 101 to be equal, the beam 300 can be uniformly distributed on both sides of the extension direction of the first reference axis 101, reducing the overlap and interference of the beams 300 of each laser unit 200 in the extension direction of the second reference axis 102, and improving the uniformity and consistency of the processing area.

[0107] Combination Figure 4 As shown, in some embodiments, in the plane containing the first reference axis 101 and the second reference axis 102, the axes of the plurality of apertures 220 are equidistant from the second reference axis 102.

[0108] By setting the distance between the axis of the aperture 220 and the second reference axis 102 to be equal, the beam 300 can be uniformly distributed on both sides of the extension direction of the second reference axis 102, reducing the overlap and interference of the beams 300 of each laser unit 200 in the extension direction of the first reference axis 101, and improving the uniformity and consistency of the processing area.

[0109] For example, when there are four laser units 200, the apertures 220 in the four laser units 200 can be the first aperture 221, the second aperture 222, the third aperture 223 and the fourth aperture 224, respectively.

[0110] The distance between the axis of the first aperture 221 and the first reference axis 101 is M1, the distance between the axis of the second aperture 222 and the first reference axis 101 is M2, the distance between the axis of the third aperture 223 and the first reference axis 101 is M3, and the distance between the axis of the fourth aperture 224 and the first reference axis 101 is M4. Therefore, M1 = M2 = M3 = M4.

[0111] The distance between the axis of the first aperture 221 and the second reference axis 102 is N1, the distance between the axis of the second aperture 222 and the second reference axis 102 is N2, the distance between the axis of the third aperture 223 and the second reference axis 102 is N3, and the distance between the axis of the fourth aperture 224 and the second reference axis 102 is N4. Then N1 = N2 = N3 = N4.

[0112] Combination Figure 4 and Figure 5 As shown, in some embodiments, in the plane containing the first reference axis 101 and the second reference axis 102, the distance between the axis of the aperture 220 and the first reference axis 101 is equal to the distance between the axis of the aperture 220 and the second reference axis 102.

[0113] It is understandable that the distance between the multiple aperture stops 220 and the first reference axis 101 is equal to the distance between the multiple aperture stops 220 and the second reference axis 102, so M1=M2=M3=M4=N1=N2=N3=N4.

[0114] By setting the distances between the aperture 220 and the first and second reference axes 102 to be equal, the multiple apertures 220 are distributed at equal intervals around the axis 103 of the lens group 100. This configuration ensures that the distances between the beams 300 in each laser unit 200 are equal, avoiding overlap and interference between the beams 300 of each laser unit 200. Furthermore, the propagation paths of the beams 300 in each laser unit 200 within the lens group 100 are more uniform, optimizing the beam converging effect and contributing to uniform coverage of each converged beam 400 within the processing area.

[0115] Specifically, the values ​​of M1, M2, M3, M4, N1, N2, N3, and N4 are all greater than 0. For example, M1, M2, M3, M4, N1, N2, N3, and N4 can all be 20 mm. This setting ensures that there is no interference between the beams 300 of each laser unit 200, and that each converging beam 400 can be completely focused on the processing area on the focusing plane 900. At the same time, it also achieves a compact layout of multiple laser units 200 and lens group 100.

[0116] Combination Figure 3 As shown, in some embodiments, the number of laser units 200 can be four.

[0117] Understandably, the apertures 220 of the four laser units 200 are evenly distributed around the lens group 100, forming a symmetrical geometric layout. This ensures that the propagation path of the beam 300 within the lens group 100 is uniform and symmetrical, optimizing the focusing effect of the beam 300, thereby optimizing the coverage and uniformity of the processing area.

[0118] Furthermore, the integration of four laser units 200 with a lens group 100 helps to reduce the overall size of the laser galvanometer scanning device as much as possible while setting up a large number of laser units 200, so that the device can achieve flexible control and optimization of the characteristics of the beam 300 without increasing complexity.

[0119] It should be noted that the number of laser units 200 can also be two, three, or even more than four. By controlling the number of laser units 200, the output power and processing capability of the device can be changed to adapt to different application requirements. In specific arrangement, the apertures 220 of each laser unit 200 can be distributed in a centrally symmetrical manner with a point on the axis of the lens group 100 as the center. This centrally symmetrical layout can ensure that the beam 300 has a uniform distribution and a consistent optical path when entering the lens group 100, which helps to optimize the focusing and shaping of the beam 300 and improve the optical performance and processing accuracy of the device.

[0120] Combination Figure 1 and Figure 2 As shown, in some embodiments, the laser unit 200 further includes a galvanometer 230; the galvanometer 230 is located between the laser emitter 210 and the aperture 220, the laser emitter 210 can emit a beam 300 toward the galvanometer 230, and the galvanometer 230 is used to guide the beam emitted by the laser emitter 210 to the aperture 220.

[0121] It should be noted that the galvanometer 230 can rapidly change the reflection angle, thereby altering the path of the laser beam 300. This dynamic adjustment capability allows the system to flexibly control the scanning path of the beam 300 during processing, improving processing flexibility and accuracy. The use of the galvanometer 230 enables rapid positioning and movement of the beam 300, adapting to complex processing patterns and paths.

[0122] Placing the galvanometer 230 on the incident side of the aperture 220 ensures that the laser beam 300 can be precisely guided and adjusted before entering the aperture 220. This setup helps optimize the incident angle and position of the beam 300, improving the beam shaping effect and the overall efficiency of the system.

[0123] Multiple laser units 200 generate beams 300 using their respective laser emitters 210. A galvanometer 230 adjusts the direction of the beams 300, an aperture 220 shapes the beams 300, and a lens group 100 converges the beams 300, thereby forming multiple converged beams 400 to achieve efficient parallel processing.

[0124] Combination Figure 1As shown, in some embodiments, the lens group 100 includes a first lens 110, a second lens 120, a third lens 130, a fourth lens 140, and a fifth lens 150 arranged coaxially along the propagation direction of the beam 300; the first lens 110 has a first incident surface 111 and a first exit surface 112 arranged opposite to each other, the first incident surface 111 being a concave surface and the first exit surface 112 being a convex surface or a plane; the second lens 120 has a second incident surface 121 and a second exit surface 122 arranged opposite to each other, the second incident surface 121 being a concave surface, the third incident surface 130 being a concave surface, the fourth lens 140 being a convex surface, the fifth lens 150 being a convex surface, the sixth lens 150 being a convex surface, the seventh lens 150 being a convex surface, the eleventh lens 110 being a convex surface, the eleventh lens 15 ... The second exit surface 122 is a convex surface; the third lens 130 has a third incident surface 131 and a third exit surface 132 arranged opposite to each other, both of which are convex surfaces; the fourth lens 140 has a fourth incident surface 141 and a fourth exit surface 142 arranged opposite to each other, both of which are convex surfaces; the fifth lens 150 has a fifth incident surface 151 and a fifth exit surface 152 arranged opposite to each other, the fifth incident surface 151 is a concave surface, and the fifth exit surface 152 is a concave surface or a plane.

[0125] The lens group 100 includes five lenses arranged coaxially in sequence along the propagation direction of the beam 300: a first lens 110, a second lens 120, a third lens 130, a fourth lens 140, and a fifth lens 150. Each lens plays a specific role in the optical path and works together to adjust the focus, divergence, and path of the beam 300.

[0126] The first lens 110 is either a plano-concave lens or a concave-convex lens. The concave incident surface helps to initially converge the light beam 300, while the convex or planar exit surface can adjust the divergence or parallelism of the light beam 300, laying the foundation for the subsequent processing of the light beam 300 by the lens.

[0127] The second lens 120 is a concave-convex lens. The second lens 120 can further converge the light beam 400 300, making it more focused, and the convex curved exit surface can reduce the divergence of the light beam 300 and improve the focusing ability of the light beam 300.

[0128] Both the third lens 130 and the fourth lens 140 are biconvex lenses. Biconvex lenses are typically used to further focus the beam 300, increasing its energy density so that the resulting converging light 400 has the required energy density and focal size when it reaches the workpiece surface.

[0129] The fifth lens 150 is a plano-concave lens or a biconcave lens. The fifth lens 150 can be used to make final adjustments to the beam 300 to ensure that the resulting converging light 400 has the required characteristics when it finally reaches the target.

[0130] In some embodiments, the radius of curvature of the first incident surface 111 ranges from -141.4 mm ± 10%; the radius of curvature of the first exit surface 112 ranges from -1412.9 mm ± 10%; the radius of curvature of the second incident surface 121 ranges from -336.0 mm ± 10%; the radius of curvature of the second exit surface 122 ranges from -187.6 mm ± 10%; and the radius of curvature of the third incident surface 131... The radius ranges as follows: 2007.9 mm ± 10%; the radius of curvature of the third exit surface 132 ranges as follows: -245.3 mm ± 10%; the radius of curvature of the fourth incident surface 141 ranges as follows: 701.7 mm ± 10%; the radius of curvature of the fourth exit surface 142 ranges as follows: -623.7 mm ± 10%; the radius of curvature of the fifth incident surface 151 ranges as follows: -369.0 mm ± 10%.

[0131] Understandably, the radius of curvature of each lens surface directly affects the focusing, divergence, and path of the beam 300. By controlling the radius of curvature of the incident and exit surfaces of each lens, the path and characteristics of the beam 300 within the lens group 100 can be optimized, ensuring high-precision and high-efficiency processing within the processing area.

[0132] It should be noted that the error value of "±10%" in the range of the curvature radius of the incident and exit surfaces of each lens is based on the set value.

[0133] Taking the first incident surface 111 as an example, its radius of curvature is set to -1412.9 mm, with an error range of "±10%". Here, "±10%" is calculated based on the set value of -1412.9 mm. Therefore, the actual range of the radius of curvature of the first incident surface 111 is: [-1412.9×(1+10%) mm, -1412.9×(1-10%) mm], that is, [-1554.9 mm, -1217.61 mm].

[0134] In some embodiments, the fifth exit surface 152 is a plane.

[0135] After the beam 300 has been adjusted through the entire lens group 100, the fifth exit surface 152 can be used to finally shape the beam 300 to ensure that the beam 300 maintains the required characteristics when leaving the lens group 100. This helps to achieve high-precision beam 300 control during the processing and ensures uniform coverage of the beam 300 on the target surface.

[0136] In some embodiments, the first exit surface 112 is a plane.

[0137] Planar exit surfaces are typically used to maintain the direction and shape of the beam 300, thereby simplifying subsequent optical processing. By designing the first exit surface 112 as a plane, the collimation of the initial beam 300 can be ensured, providing a stable input for subsequent lens optical processing.

[0138] In some embodiments, the absolute values ​​of the radius of curvature of the fourth incident surface 141 and the radius of curvature of the fourth exit surface 142 are equal.

[0139] The absolute values ​​of the curvature radius of the fourth incident surface 141 and the curvature radius of the fourth exit surface 142 are set to be equal, that is, the curvature radius of the front and rear surfaces of the fourth lens 140 is consistent. This can avoid the problem of lens being installed backwards because the curvature of the surfaces is similar and not easily distinguishable by the naked eye. It has a foolproof function and facilitates the installation of the fourth lens 140.

[0140] In some embodiments, the center thickness of the first lens 110 ranges from 11.6 mm ± 10%; the center thickness of the second lens 120 ranges from 50.1 mm ± 10%; the center thickness of the third lens 130 ranges from 51.4 mm ± 10%; the center thickness of the fourth lens 140 ranges from 31.7 mm ± 10%; and the center thickness of the fifth lens 150 ranges from 20.9 mm ± 10%.

[0141] Understandably, the center thickness of a lens directly affects its optical path length and optical performance. By controlling the lens thickness, the propagation characteristics of the beam 300 within the lens group 100 can be optimized, ensuring optimal optical performance within the processing area.

[0142] It should be noted that the error value of "±10%" in the center thickness range of each lens is based on the set value.

[0143] Taking the first lens 110 as an example, its center thickness is set to 11.6 mm, with an error range of "±10%". Here, "±10%" is calculated based on the set value of 11.6 mm. Therefore, the actual range of the center thickness of the first lens 110 is: [11.6×(1-10%) mm, 11.6×(1+10%) mm], that is, [10.44 mm, 12.76 mm].

[0144] In some embodiments, the refractive index of the first lens 110 ranges from 1.458±5%; the Abbe coefficient of the first lens 110 ranges from 67.8±5%; the refractive index of the second lens 120 ranges from 1.458±5%; the Abbe coefficient of the second lens 120 ranges from 67.8±5%; the refractive index of the third lens 130 ranges from 1.458±5%; the Abbe coefficient of the third lens 130 ranges from 67.8±5%; the refractive index of the fourth lens 140 ranges from 1.458±5%; the Abbe coefficient of the fourth lens 140 ranges from 67.8±5%; and the refractive index of the fifth lens 150 ranges from 1.458±5%; the Abbe coefficient of the fifth lens 150 ranges from 67.8±5%.

[0145] Among them, the first lens 110, the second lens 120, the third lens 130, the fourth lens 140 and the fifth lens 150 can all be made of ultraviolet fused silica (SILICA), which is a high-purity amorphous silicon dioxide material with high transmittance in the ultraviolet band.

[0146] It should be noted that the error value of ±5% in the refractive index range of each lens is based on the set value; the error value of ±5% in the Abbe coefficient range of each lens is based on the set value.

[0147] Taking the first lens 110 as an example, its refractive index is set to 1.458, with an error range of "±5%". Here, "±5%" is calculated based on the set value of 1.458. Therefore, the actual refractive index of the first lens 110 is: [1.458×(1-5%), 1.458×(1+5%)], that is, [1.385, 1.531].

[0148] Taking the first lens 110 as an example, its Abbe coefficient is set to 67.8, with an error range of "±5%". Here, "±5%" is calculated based on the set value of 67.8. Therefore, the actual Abbe coefficient of the first lens 110 is: [67.8×(1-5%), 67.8×(1+5%)], that is, [64.41, 71.19].

[0149] It should also be noted that the scanning range of the field lens is related to the focal length of the lens group 100, the diameter of the incident beam 300, and the deflection angle of the galvanometer 230.

[0150] Specifically, when the focal length of the lens group 100 is designed to be 650mm, in order to achieve a scanning range of 400mm×400mm or greater, the diameter of the incident beam 300 of the incident lens group 100 is not less than 15mm, the deflection angle of the galvanometer 230 is not less than ±18°, and the distance between the aperture stop 220 and the center of the first incident surface 111 of the first lens 110 is 62mm to 66mm.

[0151] The distance between the aperture 220 and the center of the first incident surface 111 of the first lens 110 can be determined based on factors such as the propagation path of light, the magnitude and distribution of aberrations, and the ease of installation and adjustment of the device.

[0152] Specifically, for Embodiment 1, the curvature radius, center thickness and material of each lens in the lens group 100 are detailed in Table 1 - Design parameters of lens group 100 (hereinafter referred to as Table 1).

[0153] The first incident surface 111 of the first lens 110 has a radius of curvature of -141.4 mm, the first exit surface 112 of the first lens 110 has a radius of curvature of -1412.9 mm, the center thickness of the first lens 110 is 11.6 mm, the distance between the center of the first exit surface 112 of the first lens 110 and the center of the second incident surface 121 of the second lens 120 is 7.1 mm, and the material of the first lens 110 is SILICA.

[0154] The second incident surface 121 of the second lens 120 has a radius of curvature of -336.0 mm, the second exit surface 122 of the second lens 120 has a radius of curvature of -187.6 mm, the center thickness of the second lens 120 is 50.1 mm, the distance between the center of the second exit surface 122 of the second lens 120 and the center of the third incident surface 131 of the third lens 130 is 4.1 mm, and the material of the second lens 120 is SILICA.

[0155] The radius of curvature of the third incident surface 131 of the third lens 130 is 2007.9 mm, the radius of curvature of the third exit surface 132 of the third lens 130 is -245.3 mm, the center thickness of the second lens 120 is 51.4 mm, the distance between the center of the third exit surface 132 of the third lens 130 and the center of the third incident surface 131 of the third lens 130 is 1.2 mm, and the material of the third lens 130 is SILICA.

[0156] The radius of curvature of the fourth incident surface 141 of the fourth lens 140 is 701.7 mm, the radius of curvature of the fourth exit surface 142 of the fourth lens 140 is -623.7 mm, the center thickness of the fourth lens 140 is 31.7 mm, the distance between the center of the fourth exit surface 142 of the fourth lens 140 and the center of the fifth incident surface 151 of the fifth lens 150 is 57.7 mm, and the material of the fourth lens 140 is SILICA.

[0157] The fifth incident surface 151 of the fifth lens 150 has a radius of curvature of -369.0 mm, the fifth exit surface 152 of the fifth lens 150 is a plane, the center thickness of the fifth lens 150 is 20.9 mm, the distance between the fifth exit surface 152 of the fifth lens 150 and the focusing plane 900 is 650 mm, and the material of the fifth lens 150 is SILICA.

[0158] Table 1 - Design parameters of lens group 100

[0159]

[0160] Figure 6 Schematic diagram of the simulation points of the laser galvanometer scanning device provided in the embodiments of this application. Figure 1 Combining Figure 6 As shown in Table 1, when the radius of curvature, center thickness and material of each lens in the lens group 100 of the laser galvanometer scanning device of Example 1 are as shown, the image quality of the lens group 100 is well corrected and reaches the diffraction limit.

[0161] For Embodiment 2, the curvature radius, center thickness and material of each lens in the lens group 100 are detailed in Table 2 - Design parameters of lens group 100 II (hereinafter referred to as Table 2).

[0162] Table 2 - Design parameters of lens group 100 II

[0163]

[0164] The first incident surface 111 of the first lens 110 has a radius of curvature of -141.4 mm, the first exit surface 112 of the first lens 110 is a plane, the center thickness of the first lens 110 is 10.45 mm, the distance between the center of the first exit surface 112 of the first lens 110 and the center of the second incident surface 121 of the second lens 120 is 7.845 mm, and the material of the first lens 110 is SILICA.

[0165] The second incident surface 121 of the second lens 120 has a radius of curvature of -369.1 mm, the second exit surface 122 of the second lens 120 has a radius of curvature of -198.9 mm, the center thickness of the second lens 120 is 50.823 mm, the distance between the center of the second exit surface 122 of the second lens 120 and the center of the third incident surface 131 of the third lens 130 is 0.054 mm, and the material of the second lens 120 is SILICA.

[0166] The radius of curvature of the third incident surface 131 of the third lens 130 is 1808 mm, the radius of curvature of the third exit surface 132 of the third lens 130 is -228.3 mm, the center thickness of the second lens 120 is 52.117 mm, the distance between the center of the third exit surface 132 of the third lens 130 and the center of the third incident surface 131 of the third lens 130 is 15.023 mm, and the material of the third lens 130 is SILICA.

[0167] The radius of curvature of the fourth incident surface 141 of the fourth lens 140 is 665.1 mm, the radius of curvature of the fourth exit surface 142 of the fourth lens 140 is -665.1 mm, the center thickness of the fourth lens 140 is 31.989 mm, the distance between the center of the fourth exit surface 142 of the fourth lens 140 and the center of the fifth incident surface 151 of the fifth lens 150 is 61.328 mm, and the material of the fourth lens 140 is SILICA.

[0168] The fifth incident surface 151 of the fifth lens 150 has a radius of curvature of -405mm, the fifth exit surface 152 of the fifth lens 150 is a plane, the center thickness of the fifth lens 150 is 23.01mm, the distance between the fifth exit surface 152 of the fifth lens 150 and the focusing plane 900 is 650mm, and the material of the fifth lens 150 is SILICA.

[0169] Figure 7 Schematic diagram of the simulation points of the laser galvanometer scanning device provided in the embodiments of this application. Figure 2 Combining Figure 7 As shown in Table 2, when the radius of curvature, center thickness and material of each lens in the lens group 100 of the laser galvanometer scanning device of Embodiment 2 are as shown in Table 2, the image quality of the lens group 100 is well corrected and reaches the diffraction limit.

[0170] A second aspect of this application provides a laser printing apparatus, including a focusing plane 900 and a laser galvanometer scanning device provided in any of the above embodiments. The focusing plane 900 is disposed on the light-emitting side of the lens group 100, and the focusing plane 900 is provided with a plurality of processing areas. Converging light 400 is correspondingly irradiated in the processing areas, and at least a portion of the processing areas corresponding to the converging light 400 are at least partially overlapped.

[0171] The laser galvanometer scanning device has been described in detail in the above embodiments and will not be repeated here.

[0172] Setting the focusing plane 900 on the light-emitting side of the lens group 100 ensures that the beam 300, after being adjusted by the lens group 100, can be accurately focused to the predetermined position, and ensures that the energy distribution of the beam 300 in the processing area meets the design requirements.

[0173] The fact that at least some of the processing areas corresponding to the converged beam 400 are at least partially overlapped allows for the superposition and concentration of energy of the beam 300 during processing. This arrangement leverages the high energy density resulting from the superposition of the beam 300 to achieve more efficient material processing. Furthermore, the overlapping area design helps reduce defects at the processing edges, improving overall processing quality.

[0174] Finally, it should be noted that those skilled in the art, upon considering the specification and practicing the application disclosed herein, will readily conceive of other embodiments of the present application. The embodiments of this application are intended to cover any variations, uses, or adaptations of the embodiments of this application that follow the general principles of the embodiments of this application and include common knowledge or customary technical means in the art not disclosed in the embodiments of this application. The specification and embodiments are to be considered exemplary only, and the true scope and spirit of the embodiments of this application are indicated by the following claims.

[0175] It should be understood that the embodiments of this application are not limited to the precise structures described above and shown in the accompanying drawings, and various modifications and changes can be made without departing from their scope. The scope of the embodiments of this application is limited only by the appended claims.

Claims

1. A laser galvanometer scanning device, characterized in that, It includes a lens group (100) and multiple laser units (200); The lens group (100) is located on the light-emitting side of the laser unit (200); Multiple laser units (200) are used to emit beams (300) to the lens group (100) respectively, so that the beams (300) are converged by the lens group (100) to form multiple converged beams (400).

2. The laser galvanometer scanning device according to claim 1, characterized in that, The laser unit (200) includes a laser emitter (210) and an aperture (220); The aperture (220) is located between the laser emitter (210) and the lens group (100), and the laser emitter (210) can emit a beam (300) toward the aperture (220).

3. The laser galvanometer scanning device according to claim 2, characterized in that, The axis of the aperture (220) is offset from the axis (103) of the lens group (100).

4. The laser galvanometer scanning device according to claim 3, characterized in that, The plurality of aperture stops (220) are spaced apart around the axis (103) of the lens group (100).

5. The laser galvanometer scanning device according to claim 4, characterized in that, The lens group (100) has a first reference axis (101) and a second reference axis (102), the first reference axis (101) and the second reference axis (102) are perpendicular to each other, and both the first reference axis (101) and the second reference axis (102) pass through the axis (103) of the lens group (100); In the plane containing the first reference axis (101) and the second reference axis 102, the axes of the plurality of aperture stops (220) are equidistant from the first reference axis (101); And / or, in the plane containing the first reference axis (101) and the second reference axis 102, the axes of the plurality of aperture stops (220) are equidistant from the second reference axis 102.

6. The laser galvanometer scanning device according to claim 5, characterized in that, In the plane containing the first reference axis (101) and the second reference axis 102, the distance between the axis of the aperture (220) and the first reference axis (101) is equal to the distance between the axis of the aperture (220) and the second reference axis 102.

7. The laser galvanometer scanning device according to claim 5, characterized in that, The number of laser units (200) is four.

8. The laser galvanometer scanning apparatus according to any one of claims 2-7, characterized in that, The laser unit (200) also includes a galvanometer (230); The galvanometer (230) is located between the laser emitter (210) and the aperture (220). The laser emitter (210) can emit a beam (300) toward the galvanometer (230), and the galvanometer (230) is used to guide the beam emitted by the laser emitter (210) to the aperture (220).

9. The laser galvanometer scanning apparatus according to any one of claims 1-7, characterized in that, The lens group (100) includes a first lens (110), a second lens (120), a third lens (130), a fourth lens (140), and a fifth lens (150) arranged coaxially along the propagation direction of the light beam (300); The first lens (110) has a first incident surface (111) and a first exit surface (112) disposed opposite to each other. The first incident surface (111) is a concave curved surface, and the first exit surface (112) is a convex curved surface or a plane. The second lens (120) has a second incident surface (121) and a second exit surface (122) disposed opposite to each other, the second incident surface (121) being a concave curved surface and the second exit surface (122) being a convex curved surface; The third lens (130) has a third incident surface (131) and a third exit surface (132) arranged opposite to each other, both of which are convex curved surfaces; The fourth lens (140) has a fourth incident surface (141) and a fourth exit surface (142) arranged opposite to each other, both of which are convex curved surfaces; The fifth lens (150) has a fifth incident surface (151) and a fifth exit surface (152) arranged opposite to each other. The fifth incident surface (151) is a concave curved surface, and the fifth exit surface (152) is a concave curved surface or a plane.

10. The laser galvanometer scanning device according to claim 9, characterized in that, The radius of curvature of the first incident surface (111) ranges from -141.4 mm ± 10%. The radius of curvature of the first exit surface (112) ranges from -1412.9 mm ± 10%. The radius of curvature of the second incident surface (121) ranges from -336.0 mm ± 10%. The radius of curvature of the second exit surface (122) ranges from -187.6 mm ± 10%. The radius of curvature of the third incident surface (131) ranges from 2007.9 mm ± 10%. The radius of curvature of the third exit surface (132) is in the range of -245.3mm ± 10%. The radius of curvature of the fourth incident surface (141) ranges from 701.7 mm ± 10%. The radius of curvature of the fourth exit surface (142) ranges from -623.7 mm ± 10%. The radius of curvature of the fifth incident surface (151) ranges from -369.0 mm ± 10%.

11. The laser galvanometer scanning device according to claim 9, characterized in that, The fifth exit surface (152) is a plane; And / or, the first exit surface (112) is a plane.

12. The laser galvanometer scanning device according to claim 9, characterized in that, The absolute values ​​of the radius of curvature of the fourth incident surface (141) and the radius of curvature of the fourth exit surface (142) are equal.

13. The laser galvanometer scanning device according to claim 9, characterized in that, The center thickness of the first lens (110) ranges from 11.6 mm ± 10%. The center thickness of the second lens (120) ranges from 50.1 mm ± 10%. The center thickness of the third lens (130) is in the range of 51.4 mm ± 10%. The center thickness of the fourth lens (140) is in the range of 31.7 mm ± 10%. The center thickness of the fifth lens (150) is in the range of 20.9 mm ± 10%.

14. The laser galvanometer scanning device according to claim 9, characterized in that, The refractive index of the first lens (110) ranges from 1.458 ± 5%; the Abbe number of the first lens (110) ranges from 67.8 ± 5%. The refractive index of the second lens (120) ranges from 1.458±5%, and the Abbe number of the second lens (120) ranges from 67.8±5%. The refractive index of the third lens (130) ranges from 1.458±5%, and the Abbe number of the third lens (130) ranges from 67.8±5%. The refractive index of the fourth lens (140) ranges from 1.458±5%, and the Abbe number of the fourth lens (140) ranges from 67.8±5%. The refractive index of the fifth lens (150) ranges from 1.458 ± 5%, and the Abbe number of the fifth lens (150) ranges from 67.8 ± 5%.

15. A laser printing device, characterized in that, Includes a focusing plane (900) and a laser galvanometer scanning device as described in any one of claims 1-14; The focusing plane (900) is disposed on the light-emitting side of the lens group (100). The focusing plane (900) is provided with multiple processing areas. The converging light (400) is irradiated in the processing areas. At least a portion of the processing areas corresponding to the converging light (400) are at least partially overlapped.

Images