Display panel and display device

CN122803544APending Publication Date: 2026-09-22BOE TECHNOLOGY GROUP CO LTD +1
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Patent Information

Application Number
CN202611142674.4
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-07-29
Publication Date
2026-09-22

AI Technical Summary

Technical Problem

[0003]然而,现有光子晶体彩膜技术仍存在以下共性缺陷:角度依赖性问题未得到根本解决,单一粒径光子晶体结构对入射光角度高度敏感,大视角下色偏严重;大面积均匀性不足,在G6及以上代线显示基板上自组装缺陷率高,难以满足量产需求;折射率对比度低,实心SiO2微球与常规聚合物填充材料之间的折射率差较小,导致光子带隙深度不足,结构色的色饱和度和亮度难以达到显示要求

Benefits of technology

本申请实施例提供一种显示面板以及显示装置,所述显示面板包括:衬底基板;像素定义层,设置于所述衬底基板的一侧,包括多个像素开口,所述像素开口内设置有发光器件,所述发光器件用于发射光线;彩膜层,设置于所述像素定义层远离所述衬底基板的一侧,所述彩膜层在所述衬底基板上的正投影与所述发光器件在所述衬底基板上的正投影至少部分交叠;其中,所述彩膜层包括多个微结构以及多个纳米柱,多个所述微结构与多个所述纳米柱均沿行方向和列方向阵列排布,每个所述纳米柱在所述行方向上位于相邻两个所述微结构之间,且在所述列方向上同时位于相邻两个所述微结构之间,多个所述纳米柱在所述衬底基板上的正投影与多个所述微结构在所述衬底基板上的正投影无交叠;所述纳米柱的折射率大于所述微结构的折射率,且所述微结构与所述纳米柱的折射率之差大于0.6。

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Abstract

The present disclosure relates to the technical field of display, and in particular to a display panel and a display device. The display panel comprises: a substrate; a pixel definition layer arranged on one side of the substrate and comprising a plurality of pixel openings, a light emitting device arranged in each pixel opening, the light emitting device being configured to emit light; and a color film layer arranged on the side of the pixel definition layer away from the substrate, a projection of the color film layer on the substrate at least partially overlapping a projection of the light emitting device on the substrate. The color film layer comprises a plurality of microstructures and a plurality of nanocolumns, the plurality of microstructures and the plurality of nanocolumns are arranged in a row direction and a column direction, each nanocolumn is located between two adjacent microstructures in the row direction and between two adjacent microstructures in the column direction, and a projection of the nanocolumn on the substrate does not overlap a projection of the microstructure on the substrate. The refractive index of the nanocolumn is greater than the refractive index of the microstructure, and the difference between the refractive index of the microstructure and the refractive index of the nanocolumn is greater than 0.6.
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Description

Technical Field

[0001] This application relates to the field of display technology, and more specifically, to a display panel and a display device. Background Technology

[0002] With the continuous development of display technology, consumers are increasingly demanding higher color performance from display panels. As a key component in display panels for achieving color display, the color filter layer directly determines the color gamut, brightness efficiency, and viewing angle characteristics of the display panel. In recent years, color filter technology based on photonic crystal structure has become a research hotspot, achieving selective modulation of specific wavelengths of light through periodically arranged dielectric structures.

[0003] However, existing photonic crystal color filter technologies still suffer from the following common drawbacks: the angle dependence problem remains unresolved, with single-size photonic crystal structures being highly sensitive to the incident light angle, resulting in severe color shift at large viewing angles; insufficient large-area uniformity leads to high self-assembly defect rates on G6 and higher generation display substrates, making it difficult to meet mass production requirements; and low refractive index contrast, with a small refractive index difference between solid SiO2 microspheres and conventional polymer filler materials, resulting in insufficient photonic bandgap depth and difficulty in achieving the required color saturation and brightness for structural colors. Therefore, there is an urgent need to develop a color filter structure with low angle dependence, high refractive index contrast, and the ability to be fabricated uniformly over a large area. Summary of the Invention

[0004] This application provides a display panel and a display device, aiming to provide a color filter structure with low angle dependence, high refractive index contrast, and the ability to be uniformly fabricated over a large area.

[0005] A first aspect of this application provides a display panel, the display panel comprising: Substrate; A pixel definition layer is disposed on one side of the substrate and includes multiple pixel openings. A light-emitting device is disposed within each pixel opening, and the light-emitting device is used to emit light. A color filter layer is disposed on the side of the pixel definition layer away from the substrate, wherein the orthographic projection of the color filter layer on the substrate at least partially overlaps with the orthographic projection of the light-emitting device on the substrate; wherein... The color filter layer includes multiple microstructures and multiple nanopillars. The multiple microstructures and multiple nanopillars are arranged in an array along the row direction and the column direction. Each nanopillar is located between two adjacent microstructures in the row direction and simultaneously between two adjacent microstructures in the column direction. The orthographic projections of the multiple nanopillars on the substrate and the orthographic projections of the multiple microstructures on the substrate do not overlap. The refractive index of the nanopillar is greater than that of the microstructure, and the difference between the refractive indices of the microstructure and the nanopillar is greater than 0.6.

[0006] In one alternative embodiment, the particle size of the microstructure is larger than the particle size of the nanopillar.

[0007] In one alternative implementation, the spacing between adjacent microstructures along the row direction is smaller than the spacing between adjacent microstructures along the column direction.

[0008] In one optional embodiment, the difference between the spacing of adjacent microstructures along the row direction and the spacing of adjacent microstructures along the column direction is greater than or equal to 10 nm and less than or equal to 15 nm.

[0009] In one alternative embodiment, the material of the microstructure includes SiO2.

[0010] In one alternative embodiment, the nanopillars are made of at least one of the following: Ge2Sb2Se5, silicon nitride.

[0011] In one alternative implementation, the spacing between adjacent microstructures along the row direction is equal to the spacing between adjacent microstructures along the column direction; The display panel further includes an optical compensation layer, which is disposed on the side of the color filter layer away from the substrate.

[0012] In one optional embodiment, the color filter layer includes a plurality of filter units, the filter units including a red filter unit, a green filter unit and a blue filter unit; The particle size of the microstructure in the red filter unit, the microstructure in the green filter unit, and the microstructure in the blue filter unit decreases sequentially.

[0013] In one optional embodiment, the particle size of the microstructure in the red filter unit is greater than or equal to 280 nm and less than or equal to 290 nm. The particle size of the microstructure in the green filter unit is greater than or equal to 230 nm and less than or equal to 240 nm. The particle size of the microstructure in the blue filter unit is greater than or equal to 200 nm and less than or equal to 210 nm.

[0014] A second aspect of this application provides a display device, the display device including a display panel as described in any one of the first aspects of this application.

[0015] Beneficial effects: This application provides a display panel and a display device. The display panel includes: a substrate; a pixel definition layer disposed on one side of the substrate, including a plurality of pixel openings, wherein a light-emitting device is disposed within each pixel opening for emitting light; and a color filter layer disposed on the side of the pixel definition layer away from the substrate, wherein the orthographic projection of the color filter layer on the substrate at least partially overlaps with the orthographic projection of the light-emitting device on the substrate. The color filter layer includes a plurality of microstructures and a plurality of nanopillars, wherein the plurality of microstructures and nanopillars are arranged in an array along both row and column directions. Each nanopillar is located between two adjacent microstructures in the row direction and simultaneously between two adjacent microstructures in the column direction. The orthographic projections of the nanopillars on the substrate do not overlap with the orthographic projections of the microstructures on the substrate. The refractive index of the nanopillars is greater than the refractive index of the microstructures, and the difference in refractive index between the microstructures and the nanopillars is greater than 0.6.

[0016] This application constructs a two-dimensional photonic crystal structure by incorporating microstructures and nanopillars within the color filter layer. This enhances the Bragg scattering intensity of incident light by periodic refractive index modulation, effectively suppressing the sensitivity of the photonic crystal structure to the incident light angle, reducing color shift of the display panel at wide viewing angles, and improving viewing angle characteristics and color fidelity. Simultaneously, by setting the refractive index of the nanopillars to be greater than that of the microstructures, with a refractive index difference greater than 0.6, a strong photonic bandgap is formed in the photonic crystal. This significantly enhances the bandgap depth and selectivity for specific wavelengths of light, thereby achieving higher saturation of structural color output with the same film thickness while maintaining high transmittance, which is beneficial for improving the brightness and color gamut coverage of the display panel.

[0017] The above description is merely an overview of the technical solution disclosed herein. In order to better understand the technical means of this disclosure and to implement it in accordance with the contents of the specification, and to make the above and other objects, features and advantages of this disclosure more apparent and understandable, specific embodiments of this disclosure are described below. Attached Figure Description

[0018] To more clearly illustrate the technical solutions of the embodiments of this application, the drawings used in the description of the embodiments of this application will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0019] Figure 1 This is a schematic diagram of a display panel structure according to an embodiment of this application; Figure 2This is a schematic diagram of the microstructure and array arrangement of nanopillars of a color filter layer according to an embodiment of this application; Figure 3 This is a schematic diagram of a display panel structure with an optical compensation layer according to an embodiment of this application.

[0020] Explanation of reference numerals in the attached figures: 10, substrate; 11, pixel definition layer; 12, first insulating layer; 13, interlayer dielectric layer; 14, second insulating layer; 15, first buffer layer; 16, optical modulation layer; 17, color filter layer; 171, filter unit; 18, optical compensation layer; 21, cover plate; 22, light-emitting device; 23, capping layer; 31, microstructure; 32, nanopillar. Detailed Implementation

[0021] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0022] To make the objectives, technical solutions, and advantages of the embodiments of this disclosure clearer, the technical solutions of the embodiments of this disclosure will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this disclosure, and not all embodiments. Based on the embodiments of this disclosure, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this disclosure.

[0023] With the continuous development of display technology, consumers have increasingly higher requirements for the color performance of display panels. Wide color gamut, high brightness, and low power consumption have become important development directions for display products. As a key component in display panels that enables color display, the performance of the color filter directly determines the color gamut, brightness efficiency, and viewing angle characteristics of the display panel.

[0024] Currently, traditional color filter technology mainly relies on organic dyes or quantum dot materials to achieve red, green, and blue (RGB) color filtering. Organic dye-based color filters are mature and relatively inexpensive, but they have inherent drawbacks: organic dyes have poor thermal stability, typically withstanding temperatures below 150°C, making them prone to thermal decomposition or fading during light-emitting device manufacturing or high-brightness displays, limiting their application in high-temperature processes or high-power-density displays; organic dyes also have a large spectral half-width and insufficient color purity, resulting in low color gamut coverage for display panels, typically only 70%–85% of the NTSC standard, failing to meet the requirements of wide color gamut standards such as BT.2020. While quantum dot materials offer advantages such as narrow emission spectra and wide color gamut (NTSC greater than 110%), they are expensive, and the blue light component in quantum dot materials is prone to photo-oxidation and fluorescence quenching under light and oxygen conditions, resulting in insufficient long-term stability and limiting their widespread application in large-scale commercial products.

[0025] In recent years, color filter technology based on photonic crystal structural colors has become a research hotspot to replace traditional color filters due to its advantages such as being environmentally friendly, highly stable, and requiring no chemical dyes. Photonic crystals generate photonic band gaps through periodically arranged dielectric structures, achieving selective reflection or transmission of light at specific wavelengths, thus presenting structural colors. For example, the vertical deposition self-assembly method can prepare photonic crystal color filters of different colors by controlling the particle size of SiO2 microspheres (206nm~286nm), achieving structural color display. However, this technology uses a close-packed structure of single-size SiO2 microspheres, whose photonic band gap is highly sensitive to the incident light angle. When the viewing angle shifts, the center wavelength of the reflection peak drifts significantly, with a chromaticity shift Δu'v' greater than 0.02, resulting in a severe viewing angle color shift problem in the display panel, affecting color fidelity at large viewing angles.

[0026] To address the angle-dependent problem, researchers have proposed various improvement schemes. However, the mechanical stability of the elastomers in existing schemes is poor, and they are prone to cracking and delamination during long-term use or bending of display panels, affecting product yield and lifespan. Furthermore, it is difficult to achieve uniform arrangement on large-area substrates (such as G6 and above generation lines), resulting in a self-assembly defect rate of more than 5%.

[0027] In summary, existing SiO2 photonic crystal color filter technologies still suffer from the following common defects: angle dependence remains unresolved, the close-packed structure exhibits significant iridescence, and color shift is severe at wide viewing angles; large-area uniformity is insufficient, resulting in high self-assembly defect rates on G6 and higher generation display substrates, making it difficult to meet mass production requirements; and refractive index contrast is low, with the refractive index difference Δn between solid SiO2 microspheres (refractive index n≈1.45) and conventional polymer-filled materials (refractive index n≈1.5) being less than 0.1, leading to insufficient photonic bandgap depth and difficulty in meeting display requirements for color saturation and brightness. Therefore, there is an urgent need to develop a SiO2 photonic crystal color filter structure and display panel that exhibits low angle dependence, high refractive index contrast, can be uniformly fabricated over large areas, and is compatible with existing display panel manufacturing processes.

[0028] In view of this, embodiments of this application provide a display panel, Figure 1 A schematic diagram of a display panel structure according to an embodiment of this application is shown, as follows: Figure 1 As shown, the display panel includes a substrate 10 and a pixel definition layer 11 disposed on one side of the substrate 10. The substrate 10 serves as a support base, providing support for the fabrication of each functional layer of the display panel. The pixel definition layer 11 has multiple pixel openings, each containing a light-emitting device 22. The light-emitting device 22 emits light under electrical signal drive and is the core component for realizing the display panel's light-emitting display function. By defining each pixel opening, the pixel definition layer 11 effectively avoids optical crosstalk and electrical interference between adjacent light-emitting devices 22, ensuring that each sub-pixel emits light independently.

[0029] In this embodiment, the display panel further includes a color filter layer 17, which is disposed on the side of the pixel definition layer 11 away from the substrate 10. The orthographic projection of the color filter layer 17 onto the substrate 10 at least partially overlaps with the orthographic projection of the light-emitting device 22 onto the substrate 10. The color filter layer 17 is used to filter the light emitted by the light-emitting device 22, so that sub-pixels of different colors emit light of corresponding colors, thereby achieving color display. Specifically, the color filter layer 17 includes multiple filter units 171, the orthographic projection of the filter units 171 onto the substrate 10 at least partially overlapping with the orthographic projection of the light-emitting device 22 onto the substrate 10, to ensure that the light emitted by the light-emitting device 22 can be filtered by the corresponding filter units 171 before being emitted, avoiding crosstalk between different colors of light and ensuring the color purity and display quality of the display panel.

[0030] Specifically, Figure 2 This illustration shows a schematic diagram of the microstructure and array arrangement of nanopillars of a color filter layer according to an embodiment of this application, as shown below. Figure 2As shown, the color filter layer 17 includes multiple microstructures 31 and multiple nanopillars 32, which are arranged in an array along both the row and column directions. In the row direction, each nanopillar 32 is located between two adjacent microstructures 31; similarly, in the column direction, each nanopillar 32 is located between two adjacent microstructures 31, meaning that the nanopillars 32 are disposed within the four-coordinated voids formed by four adjacent microstructures 31. Furthermore, the orthographic projection of the nanopillars 32 onto the substrate 10 does not overlap with the orthographic projection of the microstructures 31 onto the substrate 10.

[0031] Through this four-coordinated void-filling structure, the nanopillars 32 are surrounded by four adjacent microstructures 31, making the nanopillars 32 and microstructures 31 tightly coupled in the horizontal direction, forming a uniform and continuous periodic refractive index modulation unit. When incident light propagates to the color filter layer 17, the periodically arranged microstructures 31 and nanopillars 32 generate Bragg scattering of the light waves, achieving structural color display by selectively reflecting or transmitting light of specific wavelengths. The nanopillars 32 are precisely filled in the four-coordinated voids, which can effectively increase the filling ratio of high refractive index material in each periodic unit, improve the scattering intensity and bandgap depth of the photonic crystal for incident light, and enable the color filter layer 17 to achieve high-saturation structural color output with a relatively thin thickness. At the same time, the microstructures 31 and nanopillars 32 are arranged in a two-dimensional periodic pattern in both the row and column directions, so that the photonic crystal structure has a relatively uniform bandgap response in different directions, which is beneficial to reducing the color shift of the display panel at a large viewing angle and improving viewing angle characteristics and color fidelity.

[0032] In this embodiment, the refractive index of the nanopillars 32 is greater than that of the microstructure 31, and the difference in refractive index between the microstructure 31 and the nanopillars 32 is greater than 0.6. In this embodiment, by filling the spaces between the high-refractive-index nanopillars 32 and the low-refractive-index microstructures 31, and controlling the refractive index difference between the nanopillars 32 and the microstructures 31 to be within a relatively high range, a periodic refractive index distribution with alternating high and low refractive indices is constructed within the color filter layer 17. The abrupt change in refractive index between adjacent media significantly enhances the Bragg scattering intensity of the photonic crystal on incident light, forming a high-intensity photonic bandgap. When the refractive index difference is greater than 0.6, both the depth and width of the photonic bandgap are effectively improved, allowing the color filter layer to achieve more precise selection and control of light in specific wavelength bands, thereby improving the color purity and color gamut coverage of the structural colors. By increasing the refractive index contrast, this application enables the color filter layer 17 to have stronger light control capabilities at the same film thickness, which is beneficial for improving the brightness efficiency and color performance of the display panel.

[0033] In some optional embodiments, the particle size of microstructure 31 is configured to be larger than that of nanopillars 32. Microstructure 31, as the main scattering unit of the photonic crystal, has a particle size that determines the lattice period and the center wavelength of the band gap; the particle size of nanopillars 32 is smaller than that of microstructure 31, thus enabling them to fill the four-coordinate voids formed by four adjacent microstructures 31. Optionally, the particle size of microstructure 31 is greater than or equal to 210 nm and less than or equal to 290 nm, and the particle size of nanopillars 32 is greater than or equal to 50 nm and less than or equal to 70 nm. By setting the particle size of the microstructure 31 within the aforementioned range, the photonic bandgap of the color filter layer 17 can cover the visible light band, achieving effective control of the red, green, and blue structural colors. At the same time, by controlling the particle size of the nanopillars 32 within the aforementioned smaller range, it is ensured that they can be smoothly embedded into the four-coordinate gaps between the microstructures 31 without causing spatial interference. Furthermore, the addition of the nanopillars 32 does not disrupt the original periodic arrangement order of the microstructures 31, allowing the color filter layer 17 to maintain a good two-dimensional periodic structure and stable photonic bandgap characteristics.

[0034] In some optional embodiments, the color filter layer 17 includes multiple filter units 171, including red, green, and blue filter units. In the filter units of different colors, the particle size of the microstructure 31 increases with the increase of the corresponding color wavelength. Specifically, the particle size of the microstructure 31 is largest in the red filter unit, followed by the green filter unit, and smallest in the blue filter unit; that is, the particle size of the microstructure 31 in the red filter unit is larger than that in the green filter unit, and the particle size of the microstructure 31 in the green filter unit is larger than that in the blue filter unit. Thus, by adjusting the particle size of the microstructure 31 within each color filter unit, the photonic bandgap center wavelength of each sub-pixel region can be independently controlled, matching it to the wavelength ranges of red, green, and blue light respectively, thereby achieving complete structural color display covering the visible light band in the display panel.

[0035] Optionally, the particle size of the microstructure 31 in the red filter unit is 280nm to 290nm, the particle size of the microstructure 31 in the green filter unit is 230nm to 240nm, and the particle size of the microstructure 31 in the blue filter unit is 200nm to 210nm. By controlling the particle size of the microstructure 31 in each color filter unit within the above range, the photonic band gap of each filter unit can accurately correspond to the wavelengths of red, green, and blue light, respectively, achieving high color purity of the three primary colors, which is beneficial to improving the color gamut coverage and color performance of the display panel.

[0036] In some alternative implementations, the spacing a between adjacent microstructures 31 along the row direction x The spacing a along the column direction of the adjacent microstructure is less than 31 yThat is, the color filter layer 17 has different lattice periods in the row and column directions, forming an asymmetric lattice structure. Optionally, the row spacing a x Spacing a in the column direction y The difference is greater than or equal to 10nm and less than or equal to 15nm.

[0037] In traditional symmetric lattice photonic crystals, the lattice period is the same in different directions. When incident light is at an oblique angle, the Bragg diffraction conditions in different azimuth angles shift to varying degrees, causing the center wavelength of the reflection or transmission peak to drift with the viewing angle, resulting in a significant iridescent effect. This application's embodiment creates anisotropy in the band structure of the photonic crystal in two dimensions by setting different lattice periods in the row and column directions. When light is incident obliquely, the rate of change of optical path difference in the row and column directions differs. The additional phase change introduced by the asymmetric lattice compensates for the optical path difference introduced by oblique incidence, keeping the photonic bandgap relatively stable in different directions and effectively reducing the sensitivity of color shift to viewing angle. By controlling the x / y axis lattice difference within the range of 10nm to 15nm, the compensation effect can be matched with the oblique incidence optical path difference in the visible light band, thereby reducing the 60° viewing angle color shift Δu'v' to below 0.0028, a reduction of 89%, significantly eliminating the iridescent effect and improving the color fidelity of the display panel at wide viewing angles.

[0038] In some optional embodiments, the material of the microstructure 31 includes SiO2. SiO2 has advantages such as stable refractive index (approximately 1.45 in the visible light band), high optical transmittance, stable chemical properties, low cost, and ease of preparation into monodisperse microspheres via sol-gel or emulsion polymerization methods. Therefore, it is a preferred material for the microstructure 31 in this embodiment. Using SiO2 as the material for the microstructure 31 ensures that the color filter layer 17 has high light transmittance and stable optical performance, while also helping to reduce the manufacturing cost and process difficulty of the display panel.

[0039] In some alternative embodiments, the nanopillars 32 can be made of high-refractive-index materials, such as chalcogenide glasses (e.g., Ge2Sb2Se5, with a refractive index of approximately 2.1) or silicon nitride (with a refractive index of approximately 2.0). These materials possess high refractive indices and good light transmittance in the visible light band and can be filled into the four-coordinate gaps between microstructures 31 using mature deposition processes (e.g., chemical vapor deposition, sputtering, or thermal evaporation), forming nanopillars 32 with a refractive index much higher than that of the SiO2 microstructure (n≈1.45). This creates a refractive index difference greater than 0.6 between the nanopillars 32 and the microstructures 31, thereby constructing a strongly scattering photonic crystal structure with alternating high and low refractive indices within the color filter layer 17. This significantly enhances the photonic bandgap depth and the selective control capability for specific wavelengths of light, which is beneficial for improving the color saturation of structural colors and the color gamut coverage of the display panel. Simultaneously, these materials exhibit good thermal and chemical stability, ensuring the reliability of the color filter layer 17 during display panel manufacturing and long-term use.

[0040] This application embodiment combines a dual-scale microstructure 31 with selectively filled high-refractive-index nanopillars 32 to enhance the refractive index contrast to Δn > 0.6, significantly improving the photonic bandgap depth and achieving a color filter layer transmittance of over 90%. It also achieves an ultra-high NTSC color gamut coverage of 122%, surpassing the color gamut level of quantum dot materials. Simultaneously, a large-area ordered arrangement with a defect rate of less than 1% is achieved on a G8.6 generation line substrate using nanoimprint-assisted airflow self-assembly technology, resulting in an 80% yield improvement compared to traditional self-assembly processes. Furthermore, the asymmetric lattice design, through dynamic optical path compensation of 10nm to 15nm x / y axis lattice difference, reduces the 60° viewpoint lattice deviation Δu'v' to below 0.0028, a reduction of 89%, effectively eliminating the iridescent effect. Based on this, the nanopillar 32 filling structure formed from chalcogenide glass also endows the color filter layer with superior mechanical stability, exhibiting a bending life exceeding 50,000 cycles and an elastic modulus higher than 15 GPa. The end-to-end low-temperature process (≤150℃) enables this application to be well compatible with flexible OLED manufacturing processes and reduces costs by approximately 40%. In summary, this application achieves high light transmittance (>92%) and excellent thermal stability (>300℃) while systematically overcoming the three major bottlenecks of existing photonic crystal color filter technologies: angle sensitivity, insufficient color gamut, and low yield. This provides a color filter solution with superior overall performance for display panels.

[0041] To enable those skilled in the art to better understand the technical solutions of this application, the display panel provided in the embodiments of this application will be described in detail below with reference to specific embodiments.

[0042] In embodiments of this application, the color filter layer 17 includes a red filter unit, a green filter unit, and a blue filter unit. Each filter unit comprises a microstructure 31 formed of SiO2 and a nanopillar 32 formed of Ge2Sb2Se5, wherein the nanopillar 32 has a diameter of approximately 60 nm and a refractive index of approximately 2.1, forming a refractive index difference of approximately 0.65 between it and the SiO2 microstructure with a refractive index of approximately 1.45.

[0043] For the red filter unit, the particle size of microstructure 31 is 280 nm to 290 nm, and the spacing a between adjacent microstructures along the row direction is... x The spacing a along the column direction is 285nm. y The wavelength is 298 nm, and the x / y axis lattice difference is 13 nm. Under these parameters, the transmission peak of the red filter unit is located at 652 nm, the full width at half maximum (FWHM) is 28 nm, the color shift Δu'v' at a 60° viewing angle is 0.0027, the transmittance reaches 92.3%, and the color coordinates are (0.680, 0.320), which are highly consistent with the Rec.2020 standard.

[0044] For the green filter unit, the particle size of microstructure 31 is 230 nm to 240 nm, and the spacing a between adjacent microstructures along the row direction is... x The spacing a along the column direction is 220 nm. y The wavelength is 233nm, and the lattice difference is also 13nm. The transmission peak of this green filter unit is located at 538nm, the full width at half maximum (FWHM) is 25nm, the color shift Δu'v' at a 60° viewing angle is 0.0025, the transmittance is 93.1%, and the color coordinates are (0.210, 0.719), which are also highly consistent with the Rec.2020 standard.

[0045] For the blue filter unit, the particle size of microstructure 31 is 200 nm to 210 nm, and the spacing a between adjacent microstructures along the row direction is... x The spacing a along the column direction is 210 nm. y The wavelength is 223 nm, and the lattice difference is 13 nm. The transmission peak of this blue filter unit is located at 482 nm, the full width at half maximum (FWHM) is 22 nm, the color shift Δu'v' at a 60° viewing angle is 0.0023, the transmittance is 91.7%, and the color coordinates are (0.140, 0.050), which are highly consistent with the Rec.2020 standard.

[0046] The above embodiments show that, by adopting an asymmetric lattice design, the 60° viewing angle color deviation Δu'v' of each red, green, and blue filter unit is controlled below 0.003, the transmittance reaches above 91%, and the color coordinates of each filter unit can be highly matched with the Rec.2020 standard, possessing excellent wide viewing angle color fidelity, high brightness, and wide color gamut characteristics.

[0047] In some alternative embodiments, the color filter layer 17 in the specific embodiments described above can be prepared by the following method: First, on SiN... x A hydrophilic template is formed on the encapsulation layer using a nanoimprinting process. Different color filter units correspond to different diameters of hydrophilic dots: the red filter unit has a diameter of 300 nm, the green filter unit has a diameter of 246 nm, and the blue filter unit has a diameter of 216 nm. Then, SiO2 microspheres (microstructure 31) are dispersed in ethanol to form a 10 wt% dispersion, which is applied to the surface of the hydrophilic template via drop casting. With the assistance of a horizontal airflow of 1.5 m / s, the microstructure 31 is guided to oriented and accurately positioned at the hydrophilic dots. Next, atomic layer deposition (ALD) is used to selectively deposit high-refractive-index material within the four-coordinate voids between the microstructures 31, forming nanopillars 32 with a diameter of 60 nm, a refractive index of 2.1, and a fill factor of 35%. Finally, annealing and curing are performed at 130 °C to obtain the color filter layer 17.

[0048] This fabrication method predefines the location and size of hydrophilic points using nanoimprinting technology, and then combines this with airflow-assisted self-assembly to guide the positioning of microspheres. This effectively avoids defects caused by the random arrangement of microspheres in traditional self-assembly processes, ensuring that the microstructure forms an ordered and uniform two-dimensional periodic array on large-area substrates such as G8.6 generation lines. Through ALD selective deposition, the size and filling position of nanopillars can be precisely controlled without destroying the original arrangement order of the microstructure, ensuring the uniformity of gap filling and structural consistency between the nanopillars and the microstructure. The low-temperature annealing process is well compatible with flexible OLED processes, which is beneficial for its application and promotion in flexible display panels.

[0049] In some alternative implementations, Figure 3 This illustration shows a schematic diagram of a display panel structure with an optical compensation layer according to an embodiment of this application, wherein the spacing 'a' between adjacent microstructures along the row direction is... x It can also be equal to the adjacent microstructures along the column direction a. y The spacing, at this time, such as Figure 3 As shown, the display panel may also be provided with an optical compensation layer 18, which is disposed on the side of the color filter layer 17 away from the substrate 10. Optionally, the thickness of the optical compensation layer 18 is greater than or equal to 20 μm and less than or equal to 40 μm. For example, the thickness of the optical compensation layer 18 may be 300 μm.

[0050] When the color filter layer 17 has a symmetrical lattice structure, the optical path difference of obliquely incident light varies relatively consistently in different directions. By adding an optical compensation layer 18, the phase delay or optical path difference generated after the obliquely incident light passes through the color filter layer 17 can be compensated, thereby mitigating color shift at large viewing angles to some extent. This solution does not require asymmetric design of the photonic crystal lattice and is well compatible with traditional symmetrical lattice self-assembly processes, reducing the difficulty of process adjustment and manufacturing costs, and providing an alternative implementation scheme for actual mass production.

[0051] In some optional embodiments, the display panel further includes an optical modulation layer 16, which is disposed between the color filter layer 17 and the pixel definition layer 11, i.e., on the side of the color filter layer 17 facing the light-emitting device 14. The optical modulation layer 16 is used to adjust the optical path and match the refractive index of the light emitted from the light-emitting device 14, reduce the reflection loss of light at different film layer interfaces, improve the transmittance of light of specific wavelengths entering the color filter layer 17, and thus improve the light extraction efficiency of the display panel.

[0052] Optionally, the material of the optical modulation layer 16 can be magnesium fluoride (MgF2). Magnesium fluoride has a low refractive index (approximately 1.38) and good light transmittance in the visible light band, and can serve as a refractive index matching layer to effectively reduce the refractive index difference between the film layer containing the light-emitting device 14 and the color filter layer 17, thereby reducing interface reflection loss and improving the efficiency of light coupling from the light-emitting device 14 into the color filter layer 17. The thickness of the optical modulation layer 16 can be set according to the target modulation wavelength and refractive index matching conditions. Optionally, the thickness of the optical modulation layer 16 is greater than or equal to 130 nm and less than or equal to 170 nm. For example, the thickness of the optical modulation layer 16 can be 150 nm. By controlling the thickness of the optical modulation layer 16 within the above range, a better destructive interference condition can be formed between the optical modulation layer 16 and the adjacent film layers, further reducing the interface reflectivity and improving the overall light extraction efficiency of the display panel.

[0053] In some alternative implementations, such as Figure 1 As shown, the display panel further includes a first insulating layer 12, an interlayer dielectric layer 13, a second insulating layer 14, and a first buffer layer 15, which are sequentially stacked between the pixel definition layer 11 and the color filter layer 17, wherein the first insulating layer 12 is disposed close to the pixel definition layer 11. Among the above layers, the first insulating layer 12 and the second insulating layer 14 are used to achieve electrical isolation between different conductive layers to avoid signal crosstalk; the interlayer dielectric layer 13 is disposed between the first insulating layer 12 and the second insulating layer 14 for further isolation and support; the first buffer layer 15 is disposed below the color filter layer 17 to provide a flat substrate for the color filter layer 17, while also serving as stress buffer and insulation protection.

[0054] In some optional embodiments, the display panel further includes a cover layer 23 and a cover plate 21. The cover layer 23 is disposed on the side of the color filter layer 17 away from the substrate 10, i.e., covering the color filter layer 17, and serves to planarize and protect the color filter layer 17, preventing damage to the structure of the color filter layer 17 in subsequent processes. The cover plate 21 is disposed on the side of the cover layer 23 away from the substrate 10, serving as the outermost protective structure of the display panel, used to block external water and oxygen erosion and mechanical scratches, while providing users with a flat touch interface.

[0055] This application provides a display panel comprising: a substrate; a pixel definition layer disposed on one side of the substrate, including a plurality of pixel openings, wherein a light-emitting device is disposed within each pixel opening for emitting light; and a color filter layer disposed on the side of the pixel definition layer away from the substrate, wherein the orthographic projection of the color filter layer on the substrate at least partially overlaps with the orthographic projection of the light-emitting device on the substrate; wherein the color filter layer includes a plurality of microstructures and a plurality of nanopillars, wherein the plurality of microstructures and the plurality of nanopillars are arranged in an array along both row and column directions, wherein each nanopillar is located between two adjacent microstructures in the row direction and simultaneously between two adjacent microstructures in the column direction, and the orthographic projections of the plurality of nanopillars on the substrate do not overlap with the orthographic projections of the plurality of microstructures on the substrate; wherein the refractive index of the nanopillars is greater than the refractive index of the microstructures, and the difference between the refractive indices of the microstructures and the nanopillars is greater than 0.6.

[0056] This application constructs a two-dimensional photonic crystal structure by incorporating microstructures and nanopillars within the color filter layer. This enhances the Bragg scattering intensity of incident light by periodic refractive index modulation, effectively suppressing the sensitivity of the photonic crystal structure to the incident light angle, reducing color shift of the display panel at wide viewing angles, and improving viewing angle characteristics and color fidelity. Simultaneously, by setting the refractive index of the nanopillars to be greater than that of the microstructures, with a refractive index difference greater than 0.6, a strong photonic bandgap is formed in the photonic crystal. This significantly enhances the bandgap depth and selectivity for specific wavelengths of light, thereby achieving higher saturation of structural color output with the same film thickness while maintaining high transmittance, which is beneficial for improving the brightness and color gamut coverage of the display panel.

[0057] Based on the same inventive concept, embodiments of this application disclose a display device, which includes a display panel as described in embodiments of this application.

[0058] In this embodiment, the display device is a product with image display functionality. Optionally, the display device can be used to display static images, such as pictures and photographs; the display device can also be used to display dynamic images, such as videos and game screens.

[0059] In some alternative implementations, the display device includes, but is not limited to, laptops, mobile phones, wireless devices, personal data assistants (PDAs), handheld or portable computers, GPS receivers / navigators, cameras, MP4 video players, camcorders, game consoles, watches, clocks, calculators, television monitors, flat panel displays, computer monitors, car displays, navigators, cockpit controllers and / or displays, displays of camera views, electronic photographs, electronic billboards or signs, projectors, packaging and aesthetic structures, etc.

[0060] It should be noted that, in addition to the display panel, the display device also includes other necessary components and parts. Taking a monitor as an example, the display device may also include a housing, circuit board, power cord, etc. Those skilled in the art can make corresponding additions according to the specific usage requirements of the display device, which will not be elaborated here.

[0061] The various embodiments in this specification are described in a progressive manner, with each embodiment focusing on the differences from other embodiments. The same or similar parts between the various embodiments can be referred to each other.

[0062] In the description of this specification, it should be understood that the terms "center," "thickness," "upper," "lower," "front," "rear," "horizontal," "top," "bottom," "inner," "outer," "axial," "radial," and "circumferential," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this disclosure and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this disclosure.

[0063] In this disclosure, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection, an electrical connection, or a communication connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0064] In this disclosure, unless otherwise expressly specified and limited, "above" or "below" the second feature can include direct contact between the first and second features, or contact between the first and second features through another feature between them. Furthermore, "above," "over," and "on top" of the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature includes the first feature being directly above or diagonally above the second feature, or simply indicates that the first feature is at a lower horizontal level than the second feature.

[0065] The foregoing application provides many different implementations or examples for carrying out different structures of this disclosure. To simplify this disclosure, the components and arrangements of specific examples are described above. Of course, these are merely examples and are not intended to limit this disclosure. Furthermore, reference numerals and / or reference letters may be repeated in different examples; such repetition is for simplification and clarity and does not in itself indicate a relationship between the various implementations and / or arrangements discussed.

[0066] The terms "an embodiment," "embodiment," or "one or more embodiments" as used herein mean that a particular feature, structure, or characteristic described in connection with an embodiment is included in at least one embodiment of this disclosure. Furthermore, please note that the examples of the phrase "in one embodiment" do not necessarily all refer to the same embodiment.

[0067] Numerous specific details are set forth in the specification provided herein. However, it will be understood that embodiments of this disclosure may be practiced without these specific details. In some instances, well-known methods, structures, and techniques have not been shown in detail so as not to obscure the understanding of this specification.

[0068] Finally, it should be noted that in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or terminal device that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or terminal device. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or terminal device that includes said element.

[0069] The above provides a detailed description of a display panel and display device provided by this disclosure. Specific examples have been used to illustrate the principles and implementation methods of this disclosure. The description of the above embodiments is only for the purpose of helping to understand the method and core ideas of this disclosure. At the same time, for those skilled in the art, there will be changes in the specific implementation methods and application scope based on the ideas of this disclosure. Therefore, the content of this specification should not be construed as a limitation of this disclosure.

Claims

1. A display panel, characterized in that, The display panel includes: Substrate; A pixel definition layer is disposed on one side of the substrate and includes multiple pixel openings. A light-emitting device is disposed within each pixel opening, and the light-emitting device is used to emit light. A color filter layer is disposed on the side of the pixel definition layer away from the substrate, wherein the orthographic projection of the color filter layer on the substrate at least partially overlaps with the orthographic projection of the light-emitting device on the substrate; wherein... The color filter layer includes multiple microstructures and multiple nanopillars. The multiple microstructures and multiple nanopillars are arranged in an array along the row direction and the column direction. Each nanopillar is located between two adjacent microstructures in the row direction and simultaneously between two adjacent microstructures in the column direction. The orthographic projections of the multiple nanopillars on the substrate and the orthographic projections of the multiple microstructures on the substrate do not overlap. The refractive index of the nanopillar is greater than that of the microstructure, and the difference between the refractive indices of the microstructure and the nanopillar is greater than 0.

6.

2. The display panel according to claim 1, characterized in that, The particle size of the microstructure is larger than that of the nanopillar.

3. The display panel according to claim 1, characterized in that, The spacing between adjacent microstructures along the row direction is smaller than the spacing between adjacent microstructures along the column direction.

4. The display panel according to claim 3, characterized in that, The difference between the spacing of adjacent microstructures along the row direction and the spacing of adjacent microstructures along the column direction is greater than or equal to 10 nm and less than or equal to 15 nm.

5. The display panel according to claim 1, characterized in that, The material of the microstructure includes SiO2.

6. The display panel according to claim 1, characterized in that, The materials of the nanopillars include at least one of the following: Ge2Sb2Se5, silicon nitride.

7. The display panel according to claim 1, characterized in that, The spacing between adjacent microstructures along the row direction is equal to the spacing between adjacent microstructures along the column direction; The display panel further includes an optical compensation layer, which is disposed on the side of the color filter layer away from the substrate.

8. The display panel according to claim 1, characterized in that, The color filter layer includes multiple filter units, including a red filter unit, a green filter unit, and a blue filter unit; The particle size of the microstructure in the red filter unit, the microstructure in the green filter unit, and the microstructure in the blue filter unit decreases sequentially.

9. The display panel according to claim 8, characterized in that, The particle size of the microstructure in the red filter unit is greater than or equal to 280 nm and less than or equal to 290 nm. The particle size of the microstructure in the green filter unit is greater than or equal to 230 nm and less than or equal to 240 nm. The particle size of the microstructure in the blue filter unit is greater than or equal to 200 nm and less than or equal to 210 nm.

10. A display device, characterized in that, The display device includes a display panel as described in any one of claims 1-9.