A device for removing impurities from desulfurized gypsum

CN123024353APending Publication Date: 2026-11-03SHAOYANG JIN TUO DEV OF SCI & TECH CO LTD
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Patent Information

Application Number
CN202410795276.7
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-06-19
Publication Date
2026-11-03

AI Technical Summary

Technical Problem

In existing technologies, during the settling and stratification process of desulfurized gypsum, the denser residues accumulate at the bottom, while the less dense floating impurities rise to the top. This causes the impurities to re-mix into the slurry after settling and stratification, increasing the workload of impurity removal. Furthermore, the gypsum components adhering to large pieces of slag are difficult to separate, resulting in serious resource waste.

Method used

A device for removing impurities from desulfurized gypsum is adopted, including a sedimentation treatment system and a washing and filtration system. The slurry separation is controlled by a first and a second partition. Combined with a filter assembly and a filter chamber, the stable separation of impurities in the slurry and the recovery of gypsum components are achieved. The rotation of the filter chamber and the cleaning mechanism are used to accelerate the separation of impurities and the recovery of gypsum.

Benefits of technology

It improves the yield of desulfurized gypsum, reduces resource waste, enhances the purification efficiency of impurity separation, reduces environmental pollution, and achieves efficient impurity removal and full utilization of resources for gypsum slurry.

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Abstract

The application belongs to the technical field of gypsum impurity removal, and particularly relates to a desulfurization gypsum impurity removal device, which comprises a precipitation treatment system and a washing and filtering system. The desulfurization gypsum slurry is subjected to preliminary impurity removal treatment by the precipitation treatment system, and the desulfurization gypsum slurry treated by the precipitation treatment system is subjected to washing and filtering treatment by the washing and filtering system. The first and second partitions in the sedimentation tank can separate the impurities from the slurry more stably in the process of extracting the slurry, reduce the mixing of the impurities in the process of stirring the slurry, and reduce the adverse effects of the impurities on the subsequent deep purification. The amount of the gypsum slurry in the separated impurities is less, the separation of the impurities is more sufficient, and the impurity removal and purification efficiency of the desulfurization gypsum slurry is improved.
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Description

Technical Field

[0001] This invention belongs to the field of gypsum impurity removal technology, specifically a device for removing impurities from desulfurized gypsum. Background Technology

[0002] Desulfurized gypsum, also known as flue gas desulfurization gypsum, sulfur gypsum, or FGD gypsum, has the same main component as natural gypsum: calcium sulfate dihydrate (CaSO4·2H2O), with a content ≥93%. Desulfurized gypsum is a byproduct of the FGD process, a technology that uses lime-limestone to recover sulfur dioxide from flue gas from coal or oil combustion. This technology involves grinding limestone into a slurry, which is then used to remove SO2 from the dust-treated flue gas containing SO2. The lime slurry reacts with SO2 to produce calcium sulfate and calcium sulfite. Calcium sulfite is oxidized back to calcium sulfate, yielding the industrial byproduct gypsum, known as desulfurized gypsum, widely used in building materials and other industries. Its processing and utilization are of great significance. It not only strongly promotes the further development of the national environmental protection and circular economy but also significantly reduces the amount of gypsum mined, thus protecting resources.

[0003] The purification of desulfurized gypsum mainly involves processes such as washing, sedimentation, and filtration to remove impurities and improve its purity. During washing, multiple rinses with water can be used to remove impurities from the gypsum. Sedimentation and filtration separate suspended solids and particles from the gypsum, achieving the removal of impurities and yielding a more purified desulfurized gypsum slurry. However, during the settling and stratification process, the denser residues accumulate at the bottom, while the less dense floating impurities rise to the surface. When separating the gypsum slurry located in the middle, it is inevitable that the entire sediment will be agitated, causing impurities of different densities at the surface and bottom to mix back into the slurry, increasing the workload of the subsequent impurity removal process. Furthermore, in the sludge and residue accumulated at the bottom, large pieces of gypsum are adhered to, making it difficult to separate them from the residue using conventional filtration methods. They can usually only be recycled as waste along with the sludge, which results in a waste of resources and insufficient recycling of gypsum. Summary of the Invention

[0004] To overcome the shortcomings of existing technologies and solve the aforementioned technical problems, this invention proposes a device for removing impurities from desulfurized gypsum.

[0005] The technical solution adopted by this invention to solve its technical problem is as follows: This invention proposes a device for removing impurities from desulfurized gypsum, including a sedimentation treatment system and a washing and filtration system. The sedimentation treatment system performs preliminary impurity removal treatment on the desulfurized gypsum slurry, and the washing and filtration system performs washing and filtration treatment on the desulfurized gypsum slurry after the sedimentation treatment system. Its characteristics are as follows: The sedimentation treatment system includes a sedimentation tank, and the sedimentation tank is provided with a first partition and a second partition from top to bottom. The first partition and the second partition divide the internal area of ​​the sedimentation tank into a floating zone, a recovery zone and a sedimentation zone from top to bottom. The opening and closing of the first partition and the second partition is controlled by a controller. A recovery tank is provided on one side of the sedimentation tank, and a sewage discharge tank is provided on the other side. The recovery tank is connected to the recovery area through a recovery pipe, and the sewage discharge tank is connected to the floating area through a sewage discharge pipe. A filtration chamber is provided in the inner wall of one side of the sedimentation tank. The filtration chamber is connected to the sedimentation zone through a sewage pump. A filtration assembly is provided inside the filtration chamber. A recovery tank is provided at the bottom of the filtration chamber. The recovery tank is connected to the recovery tank through a recovery pump.

[0006] Preferably, the filter assembly includes a fixed base connected to a driving device disposed at the end of the filter chamber. A filter chamber is disposed on the side surface of the fixed base near the sedimentation zone. The vertical cross-section of the filter chamber is annular. Filter holes are uniformly disposed on the side wall of the filter chamber, and annular filter elements are disposed on the inner wall of the filter chamber. A treatment pipe is rotatably installed at the center of the end of the filter chamber near the sedimentation zone. The treatment pipe communicates with the filter cavity, and the sewage pump is installed in the middle of the treatment pipe. A discharge pipe is also provided on the side wall of the filter chamber. A control valve is installed inside the discharge pipe, and the discharge pipe passes through the filter element and communicates with the area surrounded by the filter element.

[0007] Preferably, a limiting rod is provided inside the filter chamber, and the limiting rod is arranged in a ring around the center of the fixed seat; and the limiting rod is in contact with the inner ring surface of the filter element.

[0008] Preferably, one end of the limiting rod is connected to a rotating device inside the fixed base, and the other end is rotatably connected to the inner wall of the filter chamber end. The rotating device is controlled by a controller.

[0009] Preferably, a limiting ring is uniformly provided on the inner surface of the annular filter element. The limiting ring is located in the gap between the limiting rod and the filter element, and the limiting ring is fixedly connected to the filter element.

[0010] Preferably, an impact block is provided on the limiting rod at the part corresponding to the limiting ring, the end of the impact block is arc-shaped, and the limiting rod is made of elastic material.

[0011] Preferably, a cleaning plate is provided on the upper side of the filter chamber, the cleaning plate is connected to the inner wall of the filter chamber, and the cross-section of the cleaning plate is arc-shaped; Furthermore, the cleaning plate has a hollow interior forming a cleaning cavity, which is connected to an external water supply device. The cleaning plate has flushing nozzles evenly distributed on the surface near the filter chamber, and the flushing nozzles are connected to the interior of the cleaning cavity.

[0012] Preferably, the first partition includes first partitions uniformly disposed on the side wall of the sedimentation tank, all of which are on the same horizontal plane; and the ends of the first partitions are provided with first rotating shafts, which are all connected to a first power assembly disposed on the side wall of the sedimentation tank and are driven to rotate. The second partition includes second partitions evenly arranged on the side wall of the sedimentation tank. The second partitions are all located below the first partitions and are all on the same horizontal plane. The ends of the second partitions are provided with second rotating shafts, which are all connected to the second power components provided on the side wall of the sedimentation tank and are driven to rotate.

[0013] Preferably, the bottom of the sedimentation tank is uniformly provided with floating troughs, and the bottom of the floating troughs is provided with impact chambers. The impact chambers are connected to external water supply equipment, and the top of the impact chambers are connected to the interior of the floating troughs through uniformly provided impact holes.

[0014] Preferably, cleaning rods are evenly provided at the ends of the second partition, the ends of the cleaning rods are bent, and the cleaning rods correspond to the floating grooves; the distance between the ends of the cleaning rods and the second rotating shaft is less than the distance between the bottom of the floating groove and the second rotating shaft.

[0015] The beneficial effects of this invention are as follows: 1. The present invention discloses a device for removing impurities from desulfurized gypsum. A slurry containing a large amount of residue mixed in a sedimentation zone is pumped into a filter chamber via a sewage pump. The slurry is then filtered using a filter assembly, further separating the residue from the sedimentation zone. The purified slurry is then pumped into a recovery tank, and subsequently into a recovery pool for further processing of the desulfurized gypsum. Through the filter assembly, the gypsum components contained in the residue that would otherwise be discarded are further recovered, increasing the yield of the final desulfurized gypsum and reducing resource waste. The filtered residue is then sent to a solid waste treatment facility for further processing, minimizing environmental pollution.

[0016] 2. The impurity removal device for desulfurized gypsum described in this invention, through the action of the first and second partitions, enables a more stable separation of impurities separated during the settling process and the extraction of usable slurry. This reduces the likelihood of impurities that have separated during settling being re-mixed into the gypsum slurry during the agitation caused by pumping the slurry, thus minimizing the adverse effects on subsequent deep purification. Furthermore, the amount of gypsum slurry contained in the separated impurities is reduced, resulting in more thorough impurity separation and improved purification efficiency of the desulfurized gypsum slurry. Attached Figure Description

[0017] The invention will now be further described with reference to the accompanying drawings.

[0018] Figure 1 This is a perspective view of the present invention; Figure 2 This is a cross-sectional view of the present invention; Figure 3 yes Figure 2 A magnified view of a section at point A in the middle; Figure 4 This is a partial schematic diagram showing the first and second partitions in a separated state in this invention; Figure 5 yes Figure 2 A magnified view of a section at point B in the middle; Figure 6 This is a perspective view of the second partition in this invention; Figure 7 This is a perspective view of the filter chamber in this invention; Figure 8 This is a cross-sectional view of the filter chamber in this invention; Figure 9 yes Figure 8 A magnified view of a section at point C; In the diagram: Sedimentation tank 1, first partition 11, first baffle 111, first rotating shaft 112, second partition 12, second baffle 121, second rotating shaft 122, cleaning rod 123, floating zone 13, recovery zone 14, sedimentation zone 15, floating trough 16, impact chamber 161, impact hole 162, recovery tank 2, recovery pipe 21, sewage tank 3, sewage pipe 31, filter chamber 4, recovery trough 41, cleaning plate 42, cleaning chamber 421, flushing nozzle 422, filter assembly 5, fixed base 51, filter chamber 52, filter hole 521, filter element 53, treatment pipe 54, discharge pipe 55, limiting rod 56, impact block 561, limiting ring 57. Detailed Implementation

[0019] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0020] Example 1: A purification device for desulfurized gypsum is disclosed. The purification of desulfurized gypsum mainly involves processes such as washing, sedimentation, and filtration to remove impurities from the gypsum and improve its purity. During the washing process, water can be used for multiple rinses to remove impurities from the gypsum. Sedimentation and filtration can separate suspended solids and solid particles from the gypsum, achieving the removal of impurities and obtaining a more purified desulfurized gypsum slurry. However, during the settling and stratification process, the denser residues accumulate at the bottom, while the less dense floating impurities rise to the surface. When separating the gypsum slurry located in the middle, it is inevitable that the entire sediment will be agitated, causing impurities of different densities at the surface and bottom to mix back into the slurry, increasing the workload of the subsequent impurity removal process. Furthermore, in the sludge and residue accumulated at the bottom, large pieces of gypsum are adhered to, making it difficult to separate them from the residue using conventional filtration methods. They can usually only be recycled as waste along with the sludge, which results in a waste of resources and insufficient recycling of gypsum.

[0021] To effectively solve the above problems, see the attached diagram in the instruction manual. Figures 1-9 As shown, a device for removing impurities from desulfurized gypsum includes a sedimentation treatment system and a washing and filtration system. The sedimentation treatment system performs preliminary impurity removal treatment on the desulfurized gypsum slurry, and the washing and filtration system performs washing and filtration treatment on the desulfurized gypsum slurry after the sedimentation treatment system. The sedimentation treatment system includes a sedimentation tank 1. The sedimentation tank 1 is provided with a first partition 11 and a second partition 12 from top to bottom. The first partition 11 and the second partition 12 divide the sedimentation tank 1 into a floating zone 13, a recovery zone 14 and a sedimentation zone from top to bottom. The opening and closing of the first partition 11 and the second partition 12 is controlled by a controller. A recovery tank 2 is provided on one side of the sedimentation tank 1, and a sewage discharge tank 3 is provided on the other side. The recovery tank 2 is connected to the recovery area 14 through the recovery pipe 21, and the sewage discharge tank 3 is connected to the floating area 13 through the sewage discharge pipe 31. A filter chamber 4 is provided in the inner wall of the sedimentation tank 1 near the recovery tank 2. The filter chamber 4 is connected to the sedimentation zone 15 through a sewage pump. A filter assembly 5 is provided inside the filter chamber 4. A recovery tank 41 is provided at the bottom of the filter chamber 4. The recovery tank 41 is connected to the recovery tank 2 through a recovery pump. The specific workflow is as follows: First, the raw materials are crushed and mixed with water to prepare a slurry. Then, a preliminary screening is performed to remove large pieces of residue, and the slurry is put into sedimentation tank 1. The amount of slurry put into sedimentation tank 1 is controlled, and water is added to adjust the concentration of the slurry. Finally, the liquid level of the slurry is higher than the first partition 11. In the initial state, the first partition 11 and the second partition 12 are kept unobstructed, so that the slurry between the different layers can flow freely. During the settling process, the processing personnel add various agents and catalysts into the sedimentation tank 1 to adjust parameters such as the pH value of the slurry. During the settling process, because the impurities in the slurry have different densities, under the action of buoyancy, some of the less dense impurities will float to the surface and be located on the upper side of the first partition 11, in the floating zone 13; while the denser sludge residues and other impurities will sink and accumulate in the sedimentation zone 15 at the bottom, located on the lower side of the second partition 12, thus achieving the natural separation of impurities in the slurry. After a sufficiently long settling time, floating impurities in the slurry concentrate in the floating zone 13, while larger particles of residue with higher density concentrate in the sedimentation zone 15. At this point, the controller controls the first partition 11 and the second partition 12 to switch to a blocking state, preventing mutual flow between the floating zone 13, the recovery zone 14, and the sedimentation zone 15. In this way, the liquid in the floating zone 13 can be first extracted to the sewage tank 3 through the sewage pipe 31, thereby removing the floating residue in the sedimentation tank 1. The residue will then be sent to the waste treatment area for harmless treatment. Then, the slurry in the recovery area 14 is pumped into the recovery tank 2 and sent to the washing and filtration system. The existing desulfurized gypsum purification equipment in the washing and filtration system, such as centrifugal dewatering equipment, stirring equipment and belt filter equipment, will perform deep multi-stage impurity removal on the slurry after preliminary impurity removal, and finally obtain desulfurized gypsum with higher purity for production. Finally, the slurry containing a large amount of residue in the sedimentation zone 15 is pumped into the filter chamber 4 by a sewage pump and filtered by the filter assembly 5. This further separates the residue from the slurry in the sedimentation zone 15. The purified slurry then enters the recovery tank 41 and is subsequently pumped into the recovery pool 2 for further processing of the desulfurized gypsum. Through the action of the filter assembly 5, the gypsum components contained in the residue that should have been discarded are further recovered, improving the yield of the final desulfurized gypsum and reducing resource waste. The filtered and separated residue waste is sent to a solid waste treatment facility for processing, reducing environmental pollution. Through the action of the first partition 11 and the second partition 12, the impurities separated during the settling process are more stably separated from the slurry during the extraction of usable slurry. This reduces the possibility of impurities that have separated during settling being re-mixed into the gypsum slurry during the agitation caused by pumping the slurry, which could adversely affect subsequent deep purification. Furthermore, the amount of gypsum slurry contained in the separated impurities is reduced, resulting in more thorough separation of impurities and improved purification efficiency of desulfurized gypsum slurry.

[0022] Example 2: Based on Embodiment 1, regarding the specific structure of the filter assembly 5 in Embodiment 1, any related device capable of effectively removing impurities from the slurry containing mixed residues in the sedimentation zone 15 can be applied to this application. Here, a possible experimental solution is provided; specifically, the filter assembly 5 includes a fixed base 51, which is connected to a drive device provided at the end of the filter chamber 4. The drive device here can be a motor device, and the output end of the drive device is fixedly connected to the middle part of the fixed base 51. A filter chamber 52 is provided on the end surface of the fixed seat 51 near the sedimentation zone 15. The vertical cross section of the filter chamber 52 is annular. The combination of the filter chamber 52 and the fixed seat 51 forms a hollow cylindrical structure. Filter holes 521 are evenly provided on the side wall of the filter chamber 52. An annular filter element 53 is fixedly provided on the inner wall of the filter chamber 52. The filter element 53 can be an annular filter screen or filter cloth to separate large particles of residue and slurry. A treatment pipe 54 is rotatably installed at the center of the end of the filter chamber 52 near the sedimentation zone 15. The treatment pipe 54 is connected to the sedimentation zone 15, and a sewage pump is installed in the middle of the treatment pipe 54. A discharge pipe 55 is also provided on the side wall of the filter chamber 52. A control valve is installed inside the discharge pipe 55, and the discharge pipe 55 passes through the filter element 53 and is connected to the area surrounded by the filter element 53. Specific workflow: Based on the specific workflow in Example 1, during the impurity removal process, the residue and part of the slurry in the sedimentation zone 15 are pumped into the treatment pipe 54 by the sewage pump, and then flow into the filter chamber 52 along the treatment pipe 54; during this process, the drive device starts and drives the fixed seat 51 and the filter chamber 52 to rotate relative to the treatment pipe 54; during the rotation of the filter chamber 52, the slurry and residue inside the filter chamber 52 are continuously agitated. During the rotation and tumbling process, the gypsum components that are agglomerated in the residue and the gypsum components that are adhered to large pieces of debris are separated and removed, and mixed with water into the gypsum slurry; The gypsum slurry can pass through the evenly distributed filter holes on the filter element 53, and then through the evenly distributed filter holes 521 on the filter chamber 52, and fall into the recovery tank 41. The recovery pump connected to the recovery tank 41 pumps the filtered slurry into the recovery pool 2 to participate in the subsequent purification process, thereby improving the recovery rate of gypsum components contained in the precipitated residue, reducing the amount of waste residue, and reducing the workload of subsequent harmless treatment of waste residue. The rotation and tumbling of the filter chamber 52 causes the residue to tumble inside. Under the influence of gravity, the slurry contained in the residue mainly permeates out through the filter element 53 near the bottom of the filter chamber 52. As the filter chamber 52 rotates, the main part of the filter element 53 that performs the filtration function will continuously change, so that different parts of the annular filter element 53 take turns to perform the filtration and impurity removal function. On the one hand, this avoids the residue from accumulating in a local area of ​​the filter element 53, causing blockage and affecting the filtration and impurity removal efficiency. On the other hand, as the annular filter element 53 rotates, the residue continues to tumble on the filter element 53. The mutual scraping action between the residue and the filter element 53 in contact with it reduces the adhesion and blockage of the residue on the filter element 53, and also allows the gypsum component adhering to the residue to be further fully detached and dissolved into the slurry, thereby achieving full recycling. Furthermore, when too much impurity and residue accumulates in the filter chamber 52, causing excessive load on the drive equipment, the input to the processing pipe 54 is stopped, and the control valve in the discharge pipe 55 is opened. As the filter chamber 52 rotates, the internal residue can flow through the discharge pipe 55 into the recovery tank 41. At the same time, the recovery pump is turned off, and the impurity removal pump connected to the recovery tank 41 is turned on to pump the residue accumulated in the filter chamber 52 to the waste disposal site for subsequent harmless treatment. This also empties the internal filter chamber 4, ensuring that the filtration and impurity removal process can continue.

[0023] Example 3: Based on Embodiment 2, a limiting rod 56 is provided inside the filter chamber 52. The limiting rod 56 is arranged in a ring and contacts the surface of the filter element 53 near the central axis inside the filter chamber 52. One end of the limiting rod 56 is connected to a rotating device inside the fixed base 51, and the other end is rotatably connected to the inner wall of the end of the filter chamber 52. The rotating device here can be a micro motor device, and the rotating device is controlled by a controller. Limiting rings 57 are evenly arranged on the inner surface of the annular filter element 53. The limiting rings 57 are located in the gap between the limiting rod 56 and the filter element 53, and the limiting rings 57 and the filter element 53 are fixedly connected to each other. The limiting rings 57 are made of elastic material. An impact block 561 is provided on the limiting rod 56 at the part corresponding to the limiting ring 57. The end of the impact block 561 is arc-shaped and is distributed in a ring on the surface of the limiting rod 56. Specific workflow: Based on the specific workflow in Example 1, because the filter element 53 is elastic, it may be damaged under the impact of the residue accumulated inside, and may even be damaged and fall off on the inner wall of the connected filter chamber 52; therefore, in order to ensure the limiting of the filter element 53, limiting rings 57 are evenly arranged on the inner surface of the filter element 53. The limiting rings 57 are fixedly installed on the filter chamber 52 by bolts or other fasteners, so that the filter element 53 located in the gap between the limiting rings 57 and the inner wall of the filter chamber 52 is fixedly limited; because the limiting rings 57 are elastic, the parts other than the fixed connection points will also vibrate when impacted, causing the connected filter element 53 to vibrate; Furthermore, an annular limiting rod 56 is provided so that the limiting ring 57 is located between the limiting rod 56 and the inner wall of the filter chamber 52 and is limited; a gap is maintained between the limiting rod 56 and the limiting ring 57 to reduce contact wear. Only when the limiting ring 57 is subjected to excessive deformation and bending will the limiting rod 56 abut against the limiting ring 57 to limit the deformation range of the limiting ring 57, thereby ensuring the smooth progress of the filtration and impurity removal process. Furthermore, when accumulated residue adheres tightly to a localized area of ​​the filter element 53, and rotation of the filter chamber 52 fails to detach it, the rotating device is activated to drive the limiting rod 56 to rotate. The rotating limiting rod 56 is located in the gap between the accumulated residue and the filter element 53, thus disrupting the bonding relationship between the accumulated residue and the filter element 53 during rotation, accelerating the dispersion and detachment of the adhered residue. During rotation, the impact block 561 on the limiting rod 56 repeatedly impacts the limiting ring 57, causing the elastic limiting ring 57 to vibrate. The vibration is transmitted along the contact area to the limiting ring 57, causing the connected filter element 53 to vibrate as well, thereby accelerating the detachment of the inner ring surface of the filter element 53 along with the adhered residue, ensuring the passability of the filter element 53. This also allows the residue inside the filter chamber 52 to smoothly detach from the filter element 53 and leave the filter chamber 52 for proper separation when the discharge pipe 55 is subsequently opened, ensuring the continuous operation of the filter chamber 52.

[0024] Example 4: Based on Embodiment 3, a cleaning plate 42 is provided on the upper side of the filter chamber 52. The cleaning plate 42 is connected to the inner wall of the filter chamber 4. The cleaning plate 42 has an arc-shaped cross section and is hollow inside to form a cleaning chamber 421. The cleaning chamber 421 is connected to an external water supply device, which is connected to the cleaning water source through a water pump. A flushing nozzle 422 is evenly provided on the surface of the cleaning plate 42 near the filter chamber 52. The flushing nozzle 422 can be an existing electric nozzle device. The flushing nozzle 422 is connected to the inside of the cleaning chamber 421. Specific workflow: Based on the specific workflow in Example 3, in order to facilitate the smooth discharge of residue accumulated during continuous filtration inside the filter chamber 52, while closing the processing pipe 54 and opening the discharge pipe 55, cleaning water is injected into the cleaning chamber 421; then, the flushing nozzle 422 is activated, impacting the corresponding part of the filter chamber 52 from top to bottom. The impact smoothly passes through the filter holes 521 and impacts the filter element 53 from the outside to the inside, so that the residue adhering to the top part of the filter element 53 is simultaneously subjected to downward gravity and the impact of the downward flow of cleaning water. In conjunction with the impact block 561 on the rotating limit rod 56, the limit ring 57 and the filter element 53 vibrate; thus, the residue and impurities adhering to the filter element 53 are separated from the filter element 53 and fall downward; the incoming flushing water also dilutes the residue, increases its fluidity, and accelerates the flow of residue inside the filter chamber 52 through the discharge pipe 55, which plays a more thorough role in cleaning and emptying the inside of the filter chamber 52, ensuring that the filter chamber 52 can be quickly put back into use.

[0025] Example 5: Based on Embodiment 4, regarding the structure for controlling the on / off state of the first partition 11 and the second partition 12, a possible implementation is provided here, but it is not the optimal implementation. Specifically, the first partition 11 includes first partitions 111 uniformly arranged on the side wall of the sedimentation tank 1, all of which are on the same horizontal plane; and the ends of the first partitions 111 are provided with first rotating shafts 112, which are all connected to the first power assembly provided on the side wall of the sedimentation tank 1 and are driven to rotate. The second partition 12 includes second partitions 121 evenly arranged on the side wall of the sedimentation tank 1. The second partitions 121 are all located below the first partitions 111 and are all on the same horizontal plane. The ends of the second partitions 121 are provided with second rotating shafts 122. The second rotating shafts 122 are all connected to the second power components provided on the side wall of the sedimentation tank 1 and are driven to rotate. The first power components and the second power components can be micro motors installed in the side wall of the sedimentation tank 1. Under the control action, they control the corresponding first rotating shaft 112 or second rotating shaft 122 to rotate, thereby controlling the rotation of the first partitions 111 and the second partitions 121. Specific workflow: Based on the specific workflow in Example 1, in the initial state, the first partition 111 in the first partition 11 remains vertical, and the second partition 121 in the second partition 12 remains vertical. In this way, the poured slurry can flow smoothly between the first partition 111 or the second partition 121, achieving smooth stratification of internal impurities. After standing for a predetermined time, when the first partition 11 and the second partition 12 need to be separated, the first power component and the second power component are activated, causing the first rotating shaft 112 to drive the first partition 111 to rotate and maintain a horizontal state. At this time, the horizontally arranged first partition 111 contacts end to end, achieving separation between the upper floating zone 13 and the lower recovery zone 14. Similarly, the second partition 12 repeats the action of the first partition 11. The horizontally arranged second partition 121 separates the free flow between the lower sedimentation zone 15 and the upper recovery zone 14, allowing the material flow in different zones to flow to the corresponding processing sites, reducing mutual interference, and making the impurity removal process smoother.

[0026] Example 6: Based on Example 1, a floating trough 16 is uniformly arranged at the bottom of the sedimentation tank 1. An impact chamber 161 is arranged on the lower side of the bottom of the floating trough 16. The impact chamber 161 is connected to an external water supply device, that is, an external cleaning water source can be pumped into the impact chamber 161. The top of the impact chamber 161 is connected to the inside of the floating trough 16 through a uniformly arranged impact hole 162. A control valve is arranged inside the impact hole 162. The impact hole 162 is tilted towards the direction close to the filter chamber 4. Cleaning rods 123 are evenly provided at the ends of the second partition 121. The ends of the cleaning rods 123 are bent, and the cleaning rods 123 correspond to the floating groove 16. The distance between the ends of the cleaning rods 123 and the second rotating shaft 122 is smaller than the distance between the bottom of the floating groove 16 and the second rotating shaft 122, so that when the first partition 111 rotates, the ends of the cleaning rods 123 at the ends rotate and pass through the floating groove 16, and do not collide with the bottom of the floating groove 16. Specific workflow: Based on the specific workflow in Example 1, during the settling process, the long-term accumulation of residues and sludge at the bottom of the sedimentation zone 15 may cause them to adhere tightly to the bottom of the sedimentation zone 15, increasing the difficulty for the sewage pump to send the accumulated residues into the treatment pipe 54. Therefore, floating troughs 16 are evenly arranged at the bottom of the sedimentation zone 15, and the floating troughs 16 are located in the gap between the bottom of the sedimentation zone 15 and the accumulated residue. In this way, when the incoming cleaning water fills the impact chamber 161, the control valve in the impact hole 162 is opened, so that the cleaning water flowing out of the impact hole 162 tilts and impacts the accumulated residue. The tilting impact on the gap between the accumulated residue and the bottom of the sedimentation zone 15 accelerates the breaking of the adhesion between the accumulated residue and the bottom of the sedimentation zone 15, so that the accumulated residue can be smoothly separated from the sedimentation zone 15 and flow towards the filter chamber 4 along with the mixed cleaning water. Furthermore, the first partition 111 can be controlled to rotate downwards. After rotating through the floating tank 16, it rotates back to its original position, thus oscillating back and forth at the bottom of the sedimentation zone 15 with a rotation angle of less than half a circumference. This effectively avoids collisions between adjacent first partitions 111 while stirring the residue and some slurry in the sedimentation zone 15, accelerating the fluidity of the residue. The cleaning rod 123 at the end is embedded in the accumulated residue, causing the clumps of residue to be broken up. The dispersed residue mixes with the flowing washing water, improving fluidity, so that the treatment pipe 54 can smoothly extract the residue from the bottom sedimentation zone 15 and send it to the filter chamber 4 for filtration and impurity removal.

[0027] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the present invention as claimed. The scope of protection of the present invention is defined by the appended claims and their equivalents.

Claims

1. A device for removing impurities from desulfurized gypsum, comprising a sedimentation system and a washing and filtration system, wherein the sedimentation system performs preliminary impurity removal treatment on the desulfurized gypsum slurry, and the washing and filtration system performs washing and filtration treatment on the desulfurized gypsum slurry after sedimentation treatment; characterized in that... ; The sedimentation treatment system includes a sedimentation tank (1), and the sedimentation tank (1) is provided with a first partition (11) and a second partition (12) from top to bottom. The first partition (11) and the second partition (12) divide the internal area of ​​the sedimentation tank (1) into a floating zone (13), a recovery zone (14) and a sedimentation zone (15) from top to bottom. The opening and closing of the first partition (11) and the second partition (12) is controlled by a controller. A recycling tank (2) is provided on one side of the sedimentation tank (1), and a sewage discharge tank (3) is provided on the other side. The recycling tank (2) is connected to the recycling area (14) through a recycling pipe (21), and the sewage discharge tank (3) is connected to the floating area (13) through a sewage discharge pipe (31). A filter chamber (4) is provided in the inner wall of one side of the sedimentation tank (1). The filter chamber (4) is connected to the sedimentation zone (15) through a sewage pump. A filter assembly (5) is provided inside the filter chamber (4). A recycling tank (41) is provided at the bottom of the filter chamber (4). The recycling tank (41) is connected to the recycling tank (2) through a recycling pump.

2. The impurity removal device for desulfurized gypsum according to claim 1, characterized in that: The filter assembly (5) includes a fixed base (51), which is connected to a driving device provided at the end of the filter chamber (4). A filter chamber (52) is provided on the side surface of the fixed base (51) near the sedimentation zone (15). The vertical cross-section of the filter chamber (52) is annular. Filter holes (521) are uniformly provided on the side wall of the filter chamber (52). An annular filter element (53) is provided on the inner wall of the filter chamber (52). A treatment pipe (54) is rotatably installed at the center of the end of the filter chamber (52) near the sedimentation zone (15). The treatment pipe (54) communicates with the filter chamber (4), and the sewage pump is installed in the middle of the treatment pipe (54). A discharge pipe (55) is also provided on the side wall of the filter chamber (52). A control valve is provided inside the discharge pipe (55), and the discharge pipe (55) passes through the filter element (53) and communicates with the area surrounded by the filter element (53).

3. The impurity removal device for desulfurized gypsum according to claim 2, characterized in that: The filter chamber (52) is provided with a limiting rod (56) inside, and the limiting rod (56) is arranged in a ring around the center of the fixed base (51); and the limiting rod (56) is in contact with the inner ring surface of the filter element (53).

4. The impurity removal device for desulfurized gypsum according to claim 3, characterized in that: One end of the limiting rod (56) is connected to the rotating device inside the fixed base (51), and the other end is rotatably connected to the inner wall of the filter chamber (52). The rotating device is controlled by the controller.

5. The impurity removal device for desulfurized gypsum according to claim 4, characterized in that: Limiting rings (57) are uniformly arranged on the inner ring surface of the annular filter element (53). The limiting rings (57) are located in the gap between the limiting rod (56) and the filter element (53), and the limiting rings (57) are fixedly connected to the filter element (53).

6. The impurity removal device for desulfurized gypsum according to claim 5, characterized in that: An impact block (561) is provided on the limiting rod (56) at a position corresponding to the limiting ring (57). The end of the impact block (561) is arc-shaped, and the limiting rod (56) is made of elastic material.

7. The impurity removal device for desulfurized gypsum according to claim 2, characterized in that: A cleaning plate (42) is provided on the upper side of the filter chamber (52). The cleaning plate (42) is connected to the inner wall of the filter cavity (4). The cross-section of the cleaning plate (42) is arc-shaped. Furthermore, the cleaning plate (42) is hollow inside to form a cleaning cavity (421), which is connected to the external water supply equipment. The cleaning plate (42) has flushing nozzles (422) evenly arranged on the surface of the side of the cleaning plate (42) near the filter chamber (52), and the flushing nozzles (422) are connected to the inside of the cleaning cavity (421).

8. The impurity removal device for desulfurized gypsum according to claim 1, characterized in that: The first partition (11) includes a first partition (111) uniformly arranged on the side wall of the sedimentation tank (1), and the first partition (111) is all on the same horizontal plane; and the end of the first partition (111) is provided with a first rotating shaft (112), and the first rotating shaft (112) is connected to a first power assembly provided on the side wall of the sedimentation tank (1) and is driven to rotate. The second partition (12) includes second partitions (121) uniformly arranged on the side wall of the sedimentation tank (1). The second partitions (121) are all located below the first partition (111) and are all on the same horizontal plane. The ends of the second partitions (121) are provided with second rotating shafts (122). The second rotating shafts (122) are all connected to the second power assembly provided on the side wall of the sedimentation tank (1) and are driven to rotate.

9. The impurity removal device for desulfurized gypsum according to claim 8, characterized in that: The sedimentation tank (1) has a floating trough (16) evenly arranged at the bottom. The bottom of the floating trough (16) has an impact chamber (161) arranged on the lower side. The impact chamber (161) is connected to the external water supply equipment, and the top of the impact chamber (161) is connected to the interior of the floating trough (16) through evenly arranged impact holes (162).

10. The impurity removal device for desulfurized gypsum according to claim 9, characterized in that: The second partition (121) is uniformly provided with cleaning rods (123) at its end. The cleaning rods (123) are bent at their ends and correspond to the floating groove (16). The distance between the end of the cleaning rod (123) and the second rotating shaft (122) is less than the distance between the bottom of the floating groove (16) and the second rotating shaft (122).