Surface cleanliness on-line detection device for quartz wafers

By integrating a visual inspection module with an online inspection device for cleaning mechanisms, the problems of low efficiency and poor accuracy in detecting surface contamination of quartz wafers have been solved, achieving efficient and accurate detection of the cleanliness of quartz wafer surfaces.

CN123029044APending Publication Date: 2026-11-03ZHEJIANG LANJINGXIN MICROELECTRONICS CO LTD
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Patent Information

Application Number
CN202611255610.5
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2026-08-18
Publication Date
2026-11-03

AI Technical Summary

Technical Problem

Existing quartz wafer surface contamination detection equipment suffers from low detection efficiency, high subjectivity, and easy omission of transparent or semi-transparent organic contaminants and trace inorganic contaminants. Furthermore, fine particulate matter in the detection environment is prone to deposit on the camera lens, leading to image quality degradation and affecting the accuracy and reliability of the detection.

Method used

An online inspection device integrating a visual inspection module and a cleaning mechanism was designed. By combining a multi-angle limiting mechanism, negative pressure adsorption and rotation cleaning, it can achieve efficient and accurate inspection of the surface of quartz crystal wafers, eliminate blind spots, and ensure image acquisition clarity and inspection consistency.

Benefits of technology

It significantly improves the efficiency and accuracy of quartz wafer surface cleanliness testing, reduces the frequency of manual maintenance, extends equipment lifespan, and enhances the continuity and reliability of testing.

✦ Generated by Eureka AI based on patent content.

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Abstract

The application discloses a surface cleanliness on-line detection device for a quartz wafer, which comprises a workbench and an isolation chamber, a supporting plate is installed on the top of the workbench, a transmission table, a positioning guide rail and a group of fixed sliding rails are arranged on the supporting plate respectively, the fixed sliding rails are located on the two sides of the positioning guide rail, the transmission table is arranged vertically with the positioning guide rail and the fixed sliding rails respectively, a movable seat is arranged on the transmission table, an extension frame is movably arranged on the positioning guide rail, and a moving plate is movably arranged on the fixed sliding rails, compared with the prior art, the application has the advantages that the detection precision and the operation stability are improved significantly, the multi-angle limiting mechanism cooperates with the reset shaft to dynamically adjust, the detection dead angle is effectively eliminated, the defect recognition rate is improved, the cleaning mechanism is combined with the negative pressure adsorption and the rotary cleaning, the visual detection module is regularly maintained, and the efficiency, the accuracy and the long-term operation reliability of the wafer surface cleanliness on-line detection are ensured.
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Description

Technical Field

[0001] This invention relates to the field of quartz crystal production technology, and in particular to an online detection device for the surface cleanliness of quartz wafers. Background Technology

[0002] Quartz wafers are the core basic material for electronic components such as quartz crystal resonators, filters, and oscillators. The cleanliness of their surface directly affects the electrical performance, frequency stability, and lifespan of the devices. During the processing of wafers, such as cutting, grinding, polishing, cleaning, and coating, various contaminants inevitably remain on the surface. These mainly include particulate matter such as grinding powder and polishing residue, organic contaminants such as cleaning agents, wax, and oil, and inorganic contaminants such as metal ions. If these contaminants are not effectively detected and removed before subsequent processes, they will lead to decreased electrode adhesion, abnormally increased contact resistance, or even short-circuit failure of the finished product, seriously restricting the product yield and production efficiency.

[0003] Currently, the detection of surface contamination in quartz wafers mainly relies on two methods: manual visual inspection and machine vision. Traditional manual inspection involves inspectors observing each wafer individually with the aid of a light source and a magnifying glass. This method suffers from drawbacks such as low efficiency, high subjectivity, and fatigue from prolonged operation, making it difficult to meet the needs of mass production. Existing quartz wafer surface contamination detection equipment mostly uses a fixed camera to capture images of the wafer surface from a single angle. The relative position of the camera to the wafer and the shooting angle remain unchanged. This single-angle imaging method has significant limitations. Different contaminants exhibit different optical response characteristics under different lighting angles and shooting angles. A fixed viewing angle cannot comprehensively capture the optical information of various contaminants on the wafer surface. In particular, for transparent or semi-transparent organic contaminant films and trace inorganic contaminant residues, a single viewing angle is prone to missed detection. During the long-term operation of a multi-angle detection and analysis system, fine particles such as grinding powder and polishing residues in the detection environment inevitably float and deposit on the camera lens surface, leading to decreased lens transmittance, blurred imaging, and deteriorated image quality. This directly affects the accuracy and reliability of multi-angle detection and analysis. Therefore, an online surface cleanliness detection device for quartz wafers is proposed. Summary of the Invention

[0004] This invention addresses the problem of deviations in the feedback of quartz wafer detection by providing an online surface cleanliness detection device for quartz wafers.

[0005] The technical solution adopted by the present invention to solve the above-mentioned technical problems is: an online detection device for the surface cleanliness of quartz wafers, including a workbench and an isolation chamber; The workbench is topped with a support plate, on which a transmission platform, a positioning guide rail, and a set of fixed slide rails are respectively mounted. The fixed slide rails are located on both sides of the positioning guide rail. The transmission platform is perpendicular to the positioning guide rail and the fixed slide rails respectively. A movable seat is mounted on the transmission platform. A telescopic frame is movably mounted on the positioning guide rail. A movable plate is movably mounted on each of the set of fixed slide rails. A transmission mechanism is mounted on the top of each movable plate. A limit mechanism is mounted on the movable seat. Both the transmission mechanism and the limit mechanism are used to engage the tray. A storage slot is provided on the tray. A detection platform is mounted at the bottom of the telescopic frame. The inspection platform is equipped with a set of visual inspection modules at its bottom, and a cleaning mechanism is installed at the bottom of the inspection platform for regular maintenance and cleaning of the visual inspection modules. Through integrated layout and the synergistic effect of multiple mechanisms, the inspection accuracy and operational stability are significantly improved. The isolation chamber, combined with the movable door and the viewing window, balances operational flexibility and environmental cleanliness. The transmission mechanism achieves adaptive centering and precise limiting of the tray, ensuring a smooth and reliable transport process. The multi-angle limiting mechanism, combined with the dynamic adjustment of the reset axis, effectively eliminates blind spots in the inspection and improves the defect recognition rate. The cleaning mechanism, through a combination of negative pressure adsorption and rotational cleaning, regularly maintains the visual inspection modules, ensuring image acquisition clarity and inspection consistency, thus guaranteeing the high efficiency, accuracy, and long-term operational reliability of online inspection of wafer surface cleanliness.

[0006] A further preferred embodiment of the present invention is as follows: the isolation chamber is provided with movable doors on both sides, and the movable doors are provided with viewing windows. The isolation chamber is provided with an audible and visual alarm mechanism. The moving plate works synchronously with the clamping plates on both sides to apply a uniform and symmetrical clamping force to the pallet, which effectively prevents skewing and shifting during the conveying process, improves the straightness and positional accuracy of the conveying, and has adaptive adjustment capability, which can be compatible with pallets of different widths, thereby enhancing the versatility and operating efficiency of the system.

[0007] A further preferred embodiment of the present invention is as follows: A transmission rod is provided on both sides of the movable plate, and a clamping plate is installed on the outside of the transmission rod. The clamping plate abuts against both sides of the pallet. The movable plate, together with the clamping plates on both sides, forms a transmission mechanism for auxiliary limiting and conveying. The snap-fit ​​plate accurately snaps into the positioning groove to achieve self-locking limiting, preventing the pallet from moving forward and backward or shifting left and right. Meanwhile, the buffer rod absorbs impact energy when snapping or disengaging, ensuring both accurate positioning and load-bearing stability, and protecting the components from hard impact damage.

[0008] A further preferred embodiment of the present invention is as follows: a fixed shaft is installed inside the clamping plate, and a snap-fit ​​plate is installed on the fixed shaft. Positioning grooves are opened on both sides of the bearing tray. The snap-fit ​​plate is snapped into the positioning groove for auxiliary limiting. Buffer plugs are movably arranged at both ends of the bearing tray. The buffer plugs abut against the snap-fit ​​plate. The limiting shaft is driven to rotate at multiple angles through the hinge plate. With the extension and retraction of the reset shaft, the limiting shaft can optimize the contact posture in real time according to the contour of the bearing tray.

[0009] A further preferred embodiment of the present invention is as follows: the limiting mechanism at the top of the movable seat includes a rotating platform, the rotating platform being mounted on the top of the movable seat, a movable frame being movably mounted on the rotating platform, a limiting shaft being mounted on the movable frame, a hinge plate being disposed inside the movable frame, a reset shaft being movably mounted on the hinge plate, a transmission frame being movably mounted inside the movable frame, a fixed shaft being disposed inside the transmission frame, and the fixed shaft being movably engaged on the top movable end of the retractable reset shaft, a limiting shaft for engaging the pallet being mounted on the top of the reset shaft, the rotation of the hinge plate being used to drive the angle adjustment of the top limiting shaft, the engaging platform being able to adjust the lateral spacing along the slide groove, improving the compatibility of the mechanism with pallets of different specifications and the ability to quickly change production; the built-in reset component can absorb the impact caused by positional deviation, preventing hard damage; and the limiting rollers convert sliding friction into rolling friction, reducing contact resistance and wear, and ensuring the smoothness of the transfer process.

[0010] A further preferred embodiment of the present invention is as follows: a sliding groove is provided at the top of the limiting shaft, and a set of locking platforms is provided inside the sliding groove. A reset component is movably provided on the locking platform, and a limiting roller is rotatably provided on the reset component. The locking platform is used to abut against both ends of the pallet for limiting the transport of the pallet. The component can drive the docking plate to extend and retract back and forth according to the position of the pallet, so as to realize the adaptive feeding of the limiting component.

[0011] A further preferred embodiment of the present invention is as follows: a swing frame is movably provided on the outside of the movable frame, the swing frame is arranged parallel to the end face of the limiting shaft, a telescopic component is provided at the rear end of the swing frame, and a docking plate is installed on the telescopic component. A limiting component is movably provided on the docking plate, and a set of positioning slides is movably provided on the limiting component. This component can drive the docking plate to extend and retract back and forth according to the position of the support tray, realizing the adaptive feeding of the limiting component. Through active propulsion and retraction actions, it ensures rapid response during limiting operation and interference-free operation during disengagement, further optimizing the flexibility and reliability of the limiting process.

[0012] A further preferred embodiment of the present invention is as follows: a limiting groove is provided at one end of the pallet, and a set of snap-fit ​​end blocks are movably arranged on the limiting component. The limiting component is snapped inside the limiting groove, thereby achieving end-limiting locking of the pallet by snapping inside the limiting groove, ensuring the absolute fixation of the pallet during transportation and inspection, and preventing accidental displacement.

[0013] A further preferred embodiment of the present invention is as follows: the bottom of the visual inspection module is provided with several straight grooves, and lighting tubes are provided inside the straight grooves. Several cameras are provided inside the visual inspection module for transmitting images to the processing center. By providing uniform supplementary lighting through the straight groove lighting tubes, interference caused by uneven ambient light is effectively eliminated, significantly improving image clarity and contrast. Multiple cameras work together to achieve multi-angle, synchronous, and comprehensive detection of the appearance, size, and positional deviations of objects, improving the coverage and accuracy of automated detection.

[0014] A further preferred embodiment of the present invention is as follows: a cleaning mechanism is movably arranged inside the connecting plate, and the cleaning mechanism includes a transmission plate. A fixed ring frame is arranged inside the transmission plate. A negative pressure pipe is installed inside the fixed ring frame, and an abutment shaft is installed inside the negative pressure pipe. A rotating disk is rotatably arranged on the fixed ring frame. A plurality of arc-shaped grooves are opened on the rotating disk, and a plurality of hollow tubes for blocking are arranged inside the arc-shaped grooves. The abutment shaft and the negative pressure pipe at the bottom form a sealed cavity. The negative pressure pipe at the bottom is connected to an external conveying pipe. The hollow tubes are in communication with the sealed cavity. A cleaning disc is mounted on the rotating disk, and several cleaning blocks and dust collection grooves are provided on the cleaning disc. A dust collection ring is provided at the bottom of the transmission plate, and the bottom of the dust collection ring is connected to an external conveying pipe. The dust generated during cleaning is poured into the dust collection ring through the arc-shaped grooves and dust collection grooves by using negative pressure. The rotation of the rotating disk drives the cleaning blocks on the cleaning disc to perform physical wiping. At the same time, the negative pressure provided by the dust collection ring and the external conveying pipe guides the dust generated during cleaning into the dust collection ring through the arc-shaped grooves and dust collection grooves, ensuring the long-term clarity and consistency of image acquisition and detection.

[0015] Compared with the prior art, the advantages of the present invention are as follows: 1. The bottom of the inspection station of this invention integrates a visual inspection module and a cleaning mechanism. During the cleaning process, the cleaning mechanism simultaneously removes dust, and the rotating disk drives the cleaning block to perform regular maintenance on the visual inspection module, ensuring the cleanliness of the camera and lighting tube surfaces, guaranteeing the clarity of image acquisition and the accuracy of inspection, while reducing the frequency of manual maintenance and improving the continuity and reliability of automated inspection.

[0016] 2. In the limiting mechanism at the top of the movable seat of the present invention, the limiting shaft is dynamically adjusted at multiple angles by rotating the hinge plate. Combined with the extension and self-adaptive function of the reset shaft, the limiting shaft can optimize the contact posture in real time according to the actual contour and thickness changes of the tray, so as to achieve wide coverage detection of various parts of the tray edge, effectively eliminate the dead angle caused by fixed angle detection, and significantly reduce the probability of missing edge defects and thickness abnormalities.

[0017] 3. In this invention, the transverse spacing of the carding platform along the slide groove can be flexibly adjusted to adapt to different specifications of support trays. The reset component effectively absorbs the impact energy caused by position deviation and size fluctuation through adaptive compression or rebound, avoiding damage from hard pressure. The limiting roller transforms sliding friction into rolling friction, greatly reducing contact resistance, reducing wear, and extending the service life of the equipment.

[0018] 4. The clamping plates on both sides of the moving plate of the present invention achieve synchronous centering and clamping under the drive of the transmission rod. With the precise engagement of the snap-fit ​​plate and the positioning groove of the pallet, a mechanical self-locking limit is formed, which effectively prevents the pallet from tilting or moving during the conveying process. At the same time, the clamping plate has an adaptive adjustment capability, which can be compatible with pallets of different widths, significantly improving the straightness of the conveying path, positioning accuracy and equipment versatility.

[0019] 5. This invention integrates the transmission platform, positioning guide rail, and fixed slide rail onto the support plate, and sets the transmission platform and guide rail vertically to form a compact and orderly working unit, which significantly optimizes the utilization rate of the internal space of the equipment. With the movable doors and viewing windows on both sides of the isolation chamber, it is not only convenient for multi-directional material feeding and discharge and emergency operation, but also effectively maintains the airtightness and cleanliness of the isolation environment, greatly improving the applicability and ease of operation of the device. Attached Figure Description

[0020] The present invention will be further described in detail below with reference to the accompanying drawings and preferred embodiments. However, those skilled in the art will understand that these drawings are drawn only for the purpose of explaining the preferred embodiments and therefore should not be regarded as a limitation on the scope of the present invention. In addition, unless specifically indicated, the drawings are only schematic representations of the composition or structure of the described objects and may contain exaggerated displays, and the drawings are not necessarily drawn to scale.

[0021] Figure 1 This is a schematic diagram of the overall structure of the present invention; Figure 2 This is a schematic diagram of the disassembled structure of the workbench and isolation chamber of the present invention; Figure 3 This is a schematic diagram of the top structure of the workbench of the present invention; Figure 4 This is a schematic diagram of the fixed slide rail structure of the present invention; Figure 5For the present invention Figure 4 A magnified view of the structure at point A in the middle; Figure 6 This is a schematic diagram of the top structure of the transmission station of the present invention; Figure 7 For the present invention Figure 6 A magnified schematic diagram of the structure at point B in the middle; Figure 8 This is a schematic diagram of a partial structure of the limiting shaft of the present invention; Figure 9 This is a schematic diagram of a partial structure of the positioning track of the present invention; Figure 10 This is a partial structural diagram of the testing station of the present invention; Figure 11 This is a schematic diagram of the disassembled structure of the connecting plate of the present invention; Figure 12 This is a schematic diagram of the disassembled transmission plate structure of the present invention; Figure 13 For the present invention Figure 12 A magnified schematic diagram of the structure at point C.

[0022] In the diagram: 1. Workbench; 2. Fixed slide rail; 3. Transfer table; 4. Positioning guide rail; 5. Support tray; 11. Isolation chamber; 12. Support plate; 21. Moving plate; 22. Clamping plate; 23. Snap-fit ​​plate; 31. Rotary table; 311. Movable seat; 32. Swing frame; 33. Movable frame; 34. Transmission frame; 35. Connecting plate; 351. Limiting assembly; 36. Limiting shaft; 361. Reset shaft; 37. Snap-fit ​​table; 371. Limiting roller; 38. Hinge plate; 41. Telescopic frame; 42. Inspection table; 43. Vision inspection module; 44. Connecting plate; 45. Transmission plate; 46. Fixed ring frame; 461. Dust suction ring; 47. Abutment shaft; 48. Rotary disk; 481. Hollow tube; 49. Cleaning disk; 51. Storage slot; 52. Buffer rod; 53. Limiting slot. Detailed Implementation

[0023] Preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings. Those skilled in the art will appreciate that these descriptions are merely descriptive and exemplary and should not be construed as limiting the scope of protection of the present invention.

[0024] It should be noted that similar labels in the following figures indicate similar items; therefore, once an item is defined in one figure, it may not be further defined and explained in subsequent figures.

[0025] This embodiment mainly describes the title of the device for online detection of surface cleanliness of quartz wafers. Please refer to [link / reference]. Figures 1-13Specifically, it is as follows: an online detection device for the surface cleanliness of quartz wafers, including a workbench 1 and an isolation chamber 11; A support plate 12 is installed on the top of the workbench 1. A transmission table 3, a positioning guide rail 4, and a set of fixed slide rails 2 are respectively installed on the support plate 12. The fixed slide rails 2 are located on both sides of the positioning guide rail 4. The transmission table 3 is perpendicular to the positioning guide rail 4 and the fixed slide rail 2 respectively. A movable seat 311 is installed on the transmission table 3. A telescopic frame 41 is movably installed on the positioning guide rail 4. A movable plate 21 is movably installed on each set of fixed slide rails 2. A transmission mechanism is installed on the top of each movable plate 21. A limit mechanism is installed on the movable seat 311. Both the transmission mechanism and the limit mechanism are used to engage the support tray 5. A storage slot 51 is opened on the support tray 5. A detection table 42 is installed at the bottom of the telescopic frame 41. The bottom of the inspection table 42 is equipped with a set of visual inspection modules 43. A cleaning mechanism is installed at the bottom of the inspection table 42 for the regular maintenance and cleaning of the visual inspection modules 43. Through integrated layout and the synergistic effect of multiple mechanisms, the inspection accuracy and operational stability are significantly improved. The isolation chamber 11, with its movable door and transparent window, balances operational flexibility and environmental cleanliness. The transmission mechanism enables the self-adaptive centering and precise limiting of the tray 5, ensuring a smooth and reliable transport process. The multi-angle limiting mechanism, with the dynamic adjustment of the reset axis 361, effectively eliminates blind spots in the inspection and improves the defect recognition rate. The cleaning mechanism, through a combination of negative pressure adsorption and rotational cleaning, regularly maintains the visual inspection modules 43, ensuring image acquisition clarity and inspection consistency, thus guaranteeing the high efficiency, accuracy, and long-term operational reliability of online inspection of wafer surface cleanliness.

[0026] like Figure 1 and Figure 2 Isolation room 11 has movable doors on both sides, which facilitates entry and exit or the transfer of items from different directions, significantly improving operational flexibility and emergency passage efficiency. It is especially suitable for scenarios with limited space or multi-workstation collaborative operations. The movable doors are equipped with viewing windows, which not only ensure convenient observation but also avoid the risk of interference or contamination to the isolation environment caused by frequent door opening. Isolation room 11 is equipped with an audible and visual alarm mechanism, which can quickly issue warnings with dual signals of sound and light in case of abnormality, ensuring that abnormal information can still be detected in a timely manner in noisy or poor visibility environments, effectively shortening the response time.

[0027] like Figure 3 and Figure 4As shown, both sides of the movable plate 21 are equipped with transmission rods, and clamping plates 22 are installed on the outside of the transmission rods. The clamping plates 22 abut against both sides of the pallet 5. The movable plate 21 and the clamping plates 22 on both sides form a transmission mechanism for auxiliary limiting and conveying. With the movement of the clamping plates 22, the clamping plates 22 on both sides can move synchronously under the drive of the movable plate 21, ensuring that a uniform and symmetrical clamping force is applied to both sides of the pallet 5 to effectively prevent the pallet 5 from tilting or moving during the conveying process. This significantly improves the straightness and positional accuracy of the conveying path. It not only realizes the active limiting and auxiliary conveying of the pallet 5, but also has a certain adaptive adjustment capability, which can be compatible with pallets 5 of different widths and specifications, reducing the replacement and adjustment time, thereby improving the versatility, reliability and operating efficiency of the conveying system.

[0028] like Figure 4 and Figure 5 As shown, a fixed shaft is installed inside the clamping plate 22, and a snap-fit ​​plate 23 is installed on the fixed shaft. Positioning grooves are opened on both sides of the pallet 5. The snap-fit ​​plate 23 is snapped into the positioning groove for auxiliary limiting. Buffer rods 52 are movably set at both ends of the pallet 5. The buffer rods 52 abut against the snap-fit ​​plate 23. When the pallet 5 enters the conveying position, the snap-fit ​​plate 23 can be snapped into the preset positioning grooves on both sides of the pallet 5 to achieve precise mechanical positioning and self-locking limiting. This effectively prevents the pallet 5 from moving forward or backward or shifting left or right during conveying or operation, greatly improving positioning accuracy and load-bearing stability. The buffer rods 52 movably set at both ends of the pallet 5 always abut against the snap-fit ​​plate 23. Utilizing the extensibility or elasticity of the buffer rods 52, they absorb impact energy when the snap-fit ​​plate 23 is snapped into or out of the positioning groove.

[0029] like Figure 6 and Figure 7As shown, the limiting mechanism at the top of the movable seat 311 includes a rotating platform 31, which is mounted on the top of the movable seat 311. A movable frame 33 is movably mounted on the rotating platform 31, and a limiting shaft 36 is mounted on the movable frame 33. A hinge plate 38 is provided inside the movable frame 33, and a reset shaft 361 is movably mounted on the hinge plate 38. A transmission frame 34 is movably mounted inside the movable frame 33, and a fixed shaft is provided inside the transmission frame 34. The fixed shaft is movably engaged with the movable end of the retractable reset shaft 361. A limiting shaft 36 is engaged with a support plate 5 at the top of the reset shaft 361. The 38-axis rotation is used to adjust the angle of the top limiting shaft 36. The rotation of the hinge plate 38 drives the limiting shaft 36 to dynamically adjust multiple angles. Combined with the extension and retraction of the reset shaft 361, the limiting shaft 36 is no longer limited to a single fixed detection angle. Instead, it can optimize the contact posture and detection angle in real time according to the actual contour and thickness changes of the pallet 5. This achieves wide coverage and multi-angle detection of various parts of the edge of the pallet 5, effectively eliminating the detection blind spots caused by fixed angles, greatly reducing the probability of missing thickness abnormalities or edge defects, and significantly improving the comprehensiveness and accuracy of the detection.

[0030] like Figure 8 As shown, a sliding groove is provided at the top of the limiting shaft 36, and a set of locking platforms 37 is provided inside the sliding groove. A reset component is movably mounted on the locking platform 37, and a limiting roller 371 is rotatably mounted on the reset component. The locking platform 37 is used to abut against both ends of the pallet 5 for limiting the transport of the pallet. The locking platform 37 can be flexibly adjusted along the direction of the sliding groove, so as to quickly adjust the lateral spacing of the locking platform 37 according to the actual width and positioning requirements of the pallet 5, thereby improving the compatibility and adaptability of the limiting mechanism to pallets 5 of different specifications. It can achieve rapid production changeover without frequent replacement of parts. The reset component can adaptively compress or rebound, absorbing the impact energy of the pallet 5 caused by position deviation or size fluctuation, avoiding hard pressure that could cause edge damage to the pallet 5 or deformation of the limiting components. The setting of the limiting roller 371 transforms the sliding friction between the locking platform 37 and the pallet 5 into rolling friction, greatly reducing contact resistance, allowing the pallet 5 to smoothly enter and exit the limiting area during transport, while reducing friction and wear.

[0031] like Figure 6 and Figure 7The movable frame 33 is externally equipped with a swing frame 32, which is parallel to the end face of the limiting shaft 36. A telescopic component is provided at the rear end of the swing frame 32, and a docking plate 35 is installed on the telescopic component. A limiting component 351 is movably installed on the docking plate 35, and a set of positioning slides is movably installed on the limiting component 351. The telescopic component at the rear end of the swing frame 32 can drive the docking plate 35 to extend and retract back and forth according to the actual position and size changes of the support pallet 5, providing a flexible adaptive feed stroke for the limiting component 351. When the support pallet 5 enters the limiting area, the telescopic component can actively push the docking plate 35, so that the limiting component 351 quickly approaches the end face of the support pallet 5. When the support pallet 5 is disengaged, the telescopic component can drive the docking plate 35 to retract, avoiding interference.

[0032] like Figure 4 As shown, a limiting groove 53 is provided at one end of the tray 5, and a set of snap-fit ​​end blocks are movably provided on the limiting component 351. The limiting component 351 is snapped inside the limiting groove 53 to play the role of limiting and locking.

[0033] A further preferred embodiment of the present invention is as follows: the bottom of the visual inspection module 43 is provided with several straight grooves, and lighting tubes are installed inside the straight grooves. Several cameras are installed inside the visual inspection module 43 for transmitting images to the processing center. The lighting tubes are set so that the illumination light can be uniformly and concentratedly irradiated onto the surface of the tray 5 and the item to be tested along the direction of the straight grooves, effectively eliminating imaging interference caused by uneven ambient light or shadows. This provides stable and sufficient supplementary lighting conditions for the several cameras inside the visual inspection module 43, significantly improving the clarity and contrast of image acquisition. Moreover, multiple cameras can work together to simultaneously acquire image information from different angles or different areas, and transmit the acquired images to the processing center in real time for comprehensive analysis and judgment. This achieves comprehensive, rapid, and accurate detection of appearance defects, positional deviations, or dimensional abnormalities of the tray 5 and the transported items, effectively improving the coverage and accuracy of automated inspection, and ensuring the reliability of quality control during production and transportation.

[0034] A further preferred embodiment of the present invention is as follows: a cleaning mechanism is movably disposed inside the connecting plate 44, and the cleaning mechanism includes a transmission plate 45. A fixing ring frame 46 is disposed inside the transmission plate 45. A negative pressure pipe is installed inside the fixing ring frame 46, and an abutment shaft 47 is installed inside the negative pressure pipe. A rotating disk 48 is rotatably disposed on the fixing ring frame 46. A plurality of arc-shaped grooves are formed on the rotating disk 48, and a plurality of hollow tubes 481 for blocking are disposed inside the arc-shaped grooves. The abutment shaft 47 and the bottom negative pressure pipe form a sealed cavity. The bottom negative pressure pipe is connected to an external conveying pipe, and the hollow tubes 481... The cleaning mechanism is movably installed inside the connecting plate 44, and the transmission plate 45 drives the fixed ring frame 46 and the rotating disk 48 to move as a whole. At the same time, the sealing cavity is formed by the abutment shaft 47 and the bottom negative pressure pipe. The bottom negative pressure pipe is connected to the external conveying pipe to provide a continuous negative pressure source. Under negative pressure, the hollow tube 481 can deform and shrink, and the internal conveying channel can be opened. After cleaning, the hollow tube 481 can accumulate inside the arc groove under the action of air pressure, which plays a role in sealing and separating, and accumulating dust inside the dust suction ring 461. A cleaning disc 49 is installed on the rotating disc 48. The cleaning disc 49 is equipped with several cleaning blocks and several dust collection grooves. A dust collection ring 461 is provided at the bottom of the transmission plate 45. The bottom of the dust collection ring 461 is connected to an external conveying pipe. It is used to use negative pressure to pour the dust generated during cleaning into the dust collection ring 461 along the arc-shaped groove and the dust collection groove. When the rotating disc 48 rotates, the cleaning blocks on the top of the cleaning disc 49 can clean the vision inspection module 43. The several dust collection grooves on the cleaning disc 49 cooperate with the dust collection ring 461 at the bottom of the transmission plate 45. The bottom of the dust collection ring 461 is connected to an external conveying pipe. With the help of negative pressure, the dust generated during cleaning is guided into the dust collection ring 461 through the arc-shaped groove and the dust collection groove.

[0035] During operation, the pallet 5 enters the isolation chamber 11 through the movable door. Driven by the transfer table 3, the movable seat 311 is conveyed along the fixed slide rail 2. The moving plate 21, in conjunction with the clamping plates 22 on both sides, moves synchronously to apply a uniform clamping force to the pallet 5. Simultaneously, the locking plate 23 engages with the positioning grooves on both sides of the pallet 5 to achieve self-locking and limiting. The buffer rod 52 absorbs impact energy to ensure smooth conveying. After the pallet 5 reaches the detection position, the limiting mechanism operates, the rotating table 31 drives the movable frame 33 to swing, and the hinge plate 38 rotates, causing the reset shaft 361 to extend and retract, allowing the limiting shaft 36 to adaptively adjust its posture at multiple angles. The locking table 37 adjusts the lateral spacing along the slide rail and abuts into the limiting grooves 53 at both ends of the pallet 5. The limiting rollers 371 reduce friction, and the telescopic assembly drives the docking. Plate 35 pushes the limiting component 351 into the limiting groove 53 to lock it, eliminating blind spots in the inspection. Then, the telescopic frame 41 drives the inspection table 42 to descend. The visual inspection module 43, in conjunction with the lighting tube, provides supplemental lighting. Multiple cameras collect images and transmit them to the processing center for defect analysis. During operation, the cleaning mechanism is regularly operated and maintained. The transmission plate 45 drives the rotating disk 48 to rotate. The cleaning block on the cleaning disk 49 wipes the visual inspection module 43. At the same time, the external delivery pipe generates negative pressure in the sealed cavity through the negative pressure pipe, causing the hollow tube 481 to deform and pass through, sucking the cleaning dust into the suction ring 461 through the arc groove and the suction groove and then discharging it. If the inspection is abnormal, the sound and light alarm mechanism immediately issues a sound and light warning. The entire process is completed collaboratively in the closed environment of the isolation room 11, ensuring efficient and accurate inspection.

[0036] In the description of this invention, it should be noted that the terms "upper," "lower," "front," "rear," "inner," and "outer," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship in which the product of this invention is usually placed when in use. They are only for the convenience of describing this invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limiting this invention.

[0037] The present invention has been described in detail above. Specific examples have been used to illustrate the principles and implementation methods of the present invention. The description of the above embodiments is only for the purpose of helping to understand the present invention and its core ideas. It should be noted that for those skilled in the art, several improvements and modifications can be made to the present invention without departing from the principles of the present invention, and these improvements and modifications also fall within the protection scope of the claims of the present invention.

Claims

1. An online detection device for the surface cleanliness of quartz wafers, characterized in that, Including workbenches and isolation rooms; The workbench is topped with a support plate, on which a transmission platform, a positioning guide rail, and a set of fixed slide rails are respectively mounted. The fixed slide rails are located on both sides of the positioning guide rail. The transmission platform is perpendicular to the positioning guide rail and the fixed slide rails respectively. A movable seat is mounted on the transmission platform. A telescopic frame is movably mounted on the positioning guide rail. A movable plate is movably mounted on each of the set of fixed slide rails. A transmission mechanism is mounted on the top of each movable plate. A limit mechanism is mounted on the movable seat. Both the transmission mechanism and the limit mechanism are used to engage the tray. A storage slot is provided on the tray. A detection platform is mounted at the bottom of the telescopic frame. The bottom of the inspection platform is equipped with a set of visual inspection modules, and a cleaning mechanism is installed at the bottom of the inspection platform for regular maintenance and cleaning of the visual inspection modules.

2. The online surface cleanliness detection device for quartz wafers according to claim 1, characterized in that, The isolation room has movable doors on both sides, and each movable door has a viewing window. The isolation room is equipped with an audible and visual alarm mechanism.

3. The online surface cleanliness detection device for quartz wafers according to claim 1, characterized in that, Both sides of the movable plate are provided with transmission rods, and clamping plates are installed on the outside of the transmission rods. The clamping plates abut against both sides of the support tray. The movable plate and the clamping plates on both sides form a transmission mechanism for auxiliary limiting and conveying.

4. The online surface cleanliness detection device for quartz wafers according to claim 1, characterized in that, The clamping plate has a fixed shaft installed inside, and a snap-fit ​​plate is installed on the fixed shaft. The support tray has positioning grooves on both sides. The snap-fit ​​plate is snapped into the positioning groove for auxiliary limiting. The support tray has buffer rods movably installed at both ends, and the buffer rods abut against the snap-fit ​​plate.

5. The online surface cleanliness detection device for quartz wafers according to claim 1, characterized in that, The limiting mechanism at the top of the movable seat includes a rotating platform, which is mounted on the top of the movable seat. A movable frame is movably mounted on the rotating platform, and a limiting shaft is mounted on the movable frame. A hinge plate is installed inside the movable frame, and a reset shaft is movably mounted on the hinge plate. A transmission frame is movably mounted inside the movable frame, and a fixed shaft is installed inside the transmission frame. The fixed shaft is movably engaged with the top movable end of the retractable reset shaft. A limiting shaft with a support plate is mounted on the top of the reset shaft. The rotation of the hinge plate is used to adjust the angle of the top limiting shaft.

6. The online surface cleanliness detection device for quartz wafers according to claim 5, characterized in that, The top of the limiting shaft is provided with a sliding groove, and a set of locking platforms are provided inside the sliding groove. A reset component is movably provided on the locking platform, and a limiting roller is rotatably provided on the reset component. The locking platform is used to abut against both ends of the pallet for limiting the transport of the pallet.

7. The online surface cleanliness detection device for quartz wafers according to claim 5, characterized in that, The movable frame is externally provided with a swing frame, which is parallel to the end face of the limiting shaft. The rear end of the swing frame is provided with a telescopic component, and a docking plate is installed on the telescopic component. A limiting component is movably provided on the docking plate, and a set of positioning slides is movably provided on the limiting component.

8. The online surface cleanliness detection device for quartz wafers according to claim 7, characterized in that, The tray has a limiting groove at one end, and a set of snap-fit ​​end blocks are movably disposed on the limiting component, and the limiting component is snapped inside the limiting groove.

9. The online surface cleanliness detection device for quartz wafers according to claim 1, characterized in that, The visual inspection module has several straight grooves at its bottom, and lighting tubes are installed inside the straight grooves. The visual inspection module also has several cameras installed inside, which are used to transmit images to the processing center.

10. The online surface cleanliness detection device for quartz wafers according to claim 1, characterized in that, The connecting plate is equipped with a cleaning mechanism, which includes a transmission plate. The transmission plate has a fixed ring frame inside, a negative pressure pipe is installed inside the fixed ring frame, and an abutment shaft is installed inside the negative pressure pipe. A rotating disk is rotatably mounted on the fixed ring frame. The rotating disk has several arc-shaped grooves, and several hollow tubes for blocking are installed inside the arc-shaped grooves. The abutment shaft and the negative pressure pipe at the bottom form a sealed cavity. The negative pressure pipe at the bottom is connected to an external delivery pipe, and the hollow tubes are in communication with the sealed cavity. A cleaning disc is installed on the rotating disk, and several cleaning blocks are provided on the cleaning disc. Several dust suction grooves are provided on the cleaning disc, and a dust suction ring is provided at the bottom of the transmission plate. The bottom of the dust suction ring is connected to an external conveying pipe, which is used to pour the dust generated during cleaning along the arc-shaped groove and the dust suction groove into the interior of the dust suction ring by means of negative pressure.