Rotary supporting structure of tray and semiconductor epitaxy equipment

Abstract

The utility model discloses a rotary supporting structure of a tray. The rotary supporting structure comprises a rotary shaft; the supporting arms are distributed on the side wall of the rotating shaft in a scattering mode, each supporting arm comprises a first end and a second end, the first ends are connected with the rotating shaft, and the second ends extend outwards along the rotating shaft; and the multiple adjusting columns have different heights, the adjusting columns with different heights can be arranged at the second ends of the supporting arms in a replaceable mode, and the top faces of the multiple adjusting columns are located in the same horizontal plane so as to jointly support a tray. According to the utility model, the up-and-down jumping of the tray during rotation can be effectively reduced, and the equipment stability and the uniformity and film forming quality of an epitaxial film are improved. The height and levelness of the rotary supporting structure are adjusted by arranging the adjusting columns with different heights, so that the top surfaces of the multiple adjusting columns are located in the same horizontal plane to jointly support the tray, and vertical jumping of the tray during rotation is eliminated.

Description

Technical Field

[0001] The utility model relates to the field of semiconductor equipment manufacturing, in particular to a rotating support structure of a tray and semiconductor epitaxial equipment. Background Art

[0002] In the technical field of semiconductor equipment manufacturing, epitaxial equipment includes a reaction chamber, in which a tray is provided, whose upper surface is used to carry wafers, and whose lower surface is supported by a rotating support structure. When the process reaction is carried out in the reaction chamber, the rotating support structure drives the tray to rotate, and then drives the wafer carried on the upper surface of the tray to rotate, so that an epitaxial film is deposited on the upper surface of the wafer; the rotation stability of the tray has an important influence on the quality of the epitaxial film. If there is a jump in the rotation of the tray, the generated epitaxial film will be uneven, affecting the film quality; when the rotation stability is worse, the wafer may also fall off the tray.

[0003] like Figure 1 As shown, the current rotating support structure is a quartz welding part, including a rotating shaft 151 and three supporting arms 152. The supporting arms 152 should be uniformly welded on the rotating shaft 151 in the circumferential direction, and the tops of the three supporting arms 152 should be in the same horizontal plane to jointly support the tray 170. However, as a high-temperature welding part, the rotating support structure has poor processing accuracy and repeatability. The poor processing accuracy of the supporting arms 152 makes the heights of the supporting arms 152 not completely the same. The poor welding accuracy when the supporting arms 152 are welded on the rotating shaft 151 makes the heights of the connecting ends of the supporting arms 152 and the rotating shaft 151 inconsistent, or the angles between the supporting arms 152 and the rotating shaft 151 are not completely the same, resulting in inconsistent heights of the tops of the supporting arms 152. Therefore, after the rotating support structure and the tray 170 are installed in the reaction chamber, the tops of the supporting arms 152 are inconsistent, which causes the tray 170 to jump up and down when the rotating support structure drives the tray 170 to rotate, which will also affect the uniformity and film formation quality of the epitaxial thin film of the wafer.

[0004] Therefore, increasing the stability of the tray during rotation is of great significance to improving the uniformity and film quality of the epitaxial thin film of the wafer carried on the upper surface of the tray. Utility Model Content

[0005] The utility model aims to improve the rotating support structure of a tray, eliminate the up and down jumping of the tray during rotation, and improve the film forming quality of the wafer carried on the upper surface of the tray.

[0006] To achieve the above-mentioned purpose, the first aspect of the utility model proposes a rotating support structure for a pallet, comprising: a rotating shaft; a plurality of support arms, which are scatteredly distributed around the rotating shaft, each of the support arms comprising a first end and a second end, the first end being connected to the top of the rotating shaft; a plurality of adjustment columns, the adjustment columns having different heights, the second end of each of the support arms being replaceable with an adjustment column of a different height so that the top surfaces of the plurality of adjustment columns are located in the same horizontal plane to jointly support a pallet.

[0007] Optionally, the top surface of the adjusting column is a plane, and the bottom is a conical column.

[0008] Optionally, the second end of the support arm is provided with a tapered hole matching with the bottom of the adjustment column, and the adjustment column is connected to the support arm by inserting the bottom of the adjustment column into the tapered hole.

[0009] Optionally, the bottom of the tray is provided with a plurality of mounting grooves matching with the top surfaces of the adjusting columns.

[0010] Optionally, the mounting groove at the bottom of the tray is a waist-shaped groove.

[0011] Optionally, the length direction of the waist-shaped groove is arranged along the radial direction of the tray.

[0012] Optionally, the width of the waist-shaped groove is 0.05 mm to 0.1 mm.

[0013] Optionally, the adjustment column is made of silicon carbide, and the support arm is made of quartz.

[0014] Optionally, the height difference between the plurality of adjustment columns is 0 mm to 0.4 mm.

[0015] Optionally, the top surface of each of the adjustment columns has a center, and a circle formed by the centers of the plurality of adjustment columns is concentric with the tray.

[0016] Optionally, at least one adjustment column connected to the second end of the support arm is a special-shaped structure.

[0017] Optionally, the top surface of the adjustment column of the special-shaped structure deviates from its bottom, and the center of its bottom is parallel to the center of its top surface, so that the circle formed by the multiple adjustment columns connected to the second end of the support arm is concentric with the tray.

[0018] Optionally, the adjustment column of the special-shaped structure includes: an adjustment part and a positioning part, the center of the adjustment part is the center of the top surface of the special-shaped structure, and the center of the positioning part is the center of the bottom of the special-shaped structure; the adjustment part is higher than the positioning part, and the adjustment part and the positioning part form a groove so that the adjustment part protrudes upward to match the installation groove at the bottom of the tray; the positioning part protrudes downward to match the second end of the support arm.

[0019] Optionally, the rotating shaft is connected to the first ends of the plurality of support arms by welding.

[0020] Optionally, there are at least three support arms, and the support arms are evenly spaced and connected to the side wall of the rotating shaft.

[0021] The second aspect of the utility model proposes a semiconductor epitaxial device, including a reaction chamber, and arranged in the reaction chamber: the above-mentioned rotating support structure of the tray, and a tray located above the rotating support structure; wherein the tray is used to place wafers.

[0022] Compared with the prior art, the technical solution of the utility model has at least the following beneficial effects:

[0023] In the rotating support structure of the tray provided by the utility model, by arranging adjustment columns of different heights at the top of each support arm, the top surfaces of the multiple adjustment columns are located in the same horizontal plane, so that the supporting tray is not prone to jumping up and down after being placed on the rotating support structure.

[0024] Furthermore, by providing an adjustment column with a special-shaped structure, the rotation center of the rotating support structure of the pallet is made concentric with the center of the pallet, thereby eliminating the jumping of the pallet in the horizontal plane when rotating;

[0025] The structure of the tapered column and the tapered hole enables the support arm and the adjustment column to be automatically aligned, and the positions of the two after assembly are relatively fixed, thereby reducing the installation gap and improving the overall accuracy of the rotating support structure;

[0026] The mounting groove at the bottom of the tray is set as a waist-shaped groove, and the length direction of the waist-shaped groove is set along the radial direction of the tray. This can allow a certain degree of horizontal position deviation of the adjustment column and minimize the serious slippage of the tray relative to the adjustment column to affect the rotation stability of the tray. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] Figure 1 A structural diagram of a rotating support structure of a tray of a semiconductor epitaxial device;

[0028] Figure 2 This is a structural diagram of a semiconductor epitaxial device of the utility model;

[0029] Figure 3This is a structural diagram of a rotating support structure of a tray of the utility model;

[0030] Figure 4 This is a structural diagram of another rotating support structure of a tray of the utility model;

[0031] Figure 5 This is a connection structure diagram of a support arm and an adjustment column of the utility model;

[0032] Figure 6 This is a bottom view of a tray of the utility model;

[0033] Figure 7 This is a schematic diagram of the installation of a tray and an adjustment column of the utility model;

[0034] Figure 8 This is a schematic diagram of another special-shaped adjusting column of the utility model. DETAILED DESCRIPTION

[0035] The technical scheme, structural features, achieved objectives and effects of the embodiments of the present invention will be described in detail below in conjunction with the accompanying drawings in the embodiments of the present invention.

[0036] It should be noted that the drawings are in a very simplified form and use non-precise proportions. They are only used to conveniently and clearly assist in explaining the implementation methods of the utility model, and are not used to limit the conditions for the implementation of the utility model. Therefore, they have no substantive technical significance. Any structural modification, change in proportional relationship or adjustment of size should still fall within the scope of the technical content disclosed by the utility model without affecting the efficacy and purpose that can be achieved by the utility model.

[0037] It should be noted that, in the present utility model, the terms "comprises", "includes" or any other variations thereof are intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only the elements explicitly listed, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device.

[0038] An embodiment of the utility model provides a rotating support structure of a tray, which is used to support the tray and drive the tray to rotate. The tray is used to carry wafers and drives the wafers to rotate under the action of the rotating support structure. The purpose of the utility model is to improve the problem of up and down jumping of the tray during rotation caused by the low processing accuracy of the rotating support structure in the prior art.

[0039] The technical solution of the utility model will be described in detail below with reference to the accompanying drawings.

[0040] like Figure 2As shown, a semiconductor epitaxial device includes: a reaction chamber 110 made of metal material, which provides a basis for assembling other components of the entire semiconductor device, and the reaction chamber 110 is provided with an air inlet 111 and an air outlet 112 on both sides thereof for introducing process gas; an upper cover 120 and a lower cover 130 which can transmit heat radiation, which are arranged on the upper and lower sides of the reaction chamber 110, and a corresponding opening 160 is arranged on the upper surface of the reaction chamber 110, and the upper cover 120 can be embedded in the opening 160 and is airtightly connected to the reaction chamber 110 through a sealing strip 161, and the reaction chamber 110, the upper cover 120 and the lower cover 130 enclose a processing space 140 The processing chamber 110 further includes a tray 170 located in the processing space 140, the upper surface of which is used to carry the wafer 190, and the lower surface is supported by a rotating support structure 150. The surface of the wafer 190 to be processed faces the upper cover 120. The rotating support structure 150 can drive the tray 170 to rotate. A film transfer port 180 is provided on one side of the reaction chamber 110 in a direction perpendicular to the air inlet direction and below the plane where the air inlet and the air outlet are located. The film transfer port 180 can also be at other positions. When the wafer 190 needs to be transferred before or after the process reaction, the rotating support structure 150 can drive the tray 170 to descend to the position of the film transfer port 180 to facilitate the delivery of the wafer 190. During the process reaction, the rotating support structure 150 drives the tray 170 to rotate, thereby driving the wafer 190 carried on the upper surface of the tray 170 to rotate, and an epitaxial film is deposited on the upper surface of the wafer 190.

[0041] As described in the background technology, the poor processing accuracy of the support arms 152 makes the heights of the support arms 152 not exactly the same, and the poor welding accuracy when welding the support arms 152 to the rotating shaft 151 makes the heights of the connecting ends of the support arms 152 and the rotating shaft 151 inconsistent, or the angles between the support arms 152 and the rotating shaft 151 are not exactly the same, resulting in inconsistent heights of the top ends of the support arms 152. Therefore, when the rotating support structure 150 drives the tray 170 to rotate, the tray 170 will jump up and down. In order to solve this technical problem, the utility model arranges adjustment columns of different heights between the multiple support arms and the tray, so that the top surfaces of the multiple adjustment columns are located in the same horizontal plane, and the multiple adjustment columns jointly support the tray.

[0042] The technical solution of the utility model is described in detail as follows:

[0043] See also Figure 3 and Figure 4The rotating support structure of the tray provided by the utility model includes: a vertically arranged rotating shaft 153, and three support arms 154 fixedly connected to the rotating shaft 153; the support arms 154 are scatteredly distributed around the rotating shaft 153, and each of the support arms 154 has a first end 1541 and a second end 1542. The first end 1541 of each of the support arms 154 is connected to the top of the rotating shaft 153 by welding, and the second end 1542 of each of the support arms 154 extends outward along the rotating shaft 153, so that the support arms 154 are inclined upward at a certain angle to the horizontal plane, forming a claw-shaped support structure for conveniently lifting the tray 170. The rotating support structure also includes: an adjustment column 155 arranged at the second end 1542 of the support arm 154, each second end 1542 is provided with an adjustment column 155, and the adjustment column 155 has a plurality of different heights. By replacing the adjustment columns 155 of different heights at the second end 1542 of each support arm 154, the top surfaces of the three adjustment columns 155 are located in the same horizontal plane to jointly support the tray 170, so that the tray 170 is in a horizontal state, and the tray 170 is not prone to jumping up and down.

[0044] When the processing accuracy of the support arms 154 is poor, resulting in the heights of the three support arms 154 being inconsistent (e.g. Figure 3 ), or the difference in welding precision between the support arm 154 and the rotating shaft 153 causes the welding heights of the first ends 1541 of the support arms 154 to be inconsistent, or the difference in welding precision between the support arm 154 and the rotating shaft 153 causes the angles between the support arms 154 and the rotating shaft 153 to be different (as shown in FIG. Figure 4As shown in the figure, when the heights of the second ends 1542 of the three support arms 154 are inconsistent, the second ends 1542 of the three support arms 154 are not in the same horizontal plane. If the tray 170 is directly mounted on the second ends 1542 of the support arms 154, when the rotating shaft 154 rotates to drive the tray 170 to rotate, since the second ends 1542 of the three support arms 154 are not in the same plane, the tray 170 mounted on the top surfaces of the three second ends 1542 is not in a horizontal state, and it will jump up and down during rotation. Each of the second ends 1542 of the three support arms 154 is provided with an adjustment column 155, and the adjustment columns 155 have different heights. By selecting the adjustment columns 155 of appropriate heights, for example, in this embodiment, by providing three adjustment columns 155 with heights of 5.99 mm, 6.00 mm, and 6.01 mm, respectively, on the second ends 1542 of the support arms 154, the top surfaces of the three adjustment columns 155 are located at the same horizontal plane to jointly support the tray 170. At this time, the tray 170 is in a horizontal state, eliminating the up and down bouncing of the tray 170 when rotating. In other embodiments, it is also possible to provide a variety of adjustment columns 155 of different heights for selection according to the machining accuracy of the support arms 154 and the rotating shaft 153. Generally, the height difference between the welded support arms 154 is within 0.4 mm, so the height difference between the multiple adjustment columns 155 is set to 0 mm to 0.4 mm, which can meet the requirement of adjusting the tray 170 to a horizontal state.

[0045] The adjustment column 155 disposed at the second end 1542 of the support arm 154 is replaceable. When assembling the rotating support structure of the tray and the tray 170, the most suitable height of the adjustment column 155 can be replaced by testing the rotation stability of the tray 170 multiple times. The rotation stability of the tray 170 can be tested by measuring the height of the edge of the rotating tray 170 using a laser sensor disposed on the top wall of the semiconductor epitaxial device. Alternatively, in other embodiments, other devices and methods capable of measuring rotation stability can also be used, and the present invention does not limit this.

[0046] The adjusting column 155 is made of silicon carbide, and the supporting arm 154 is made of quartz. On the one hand, since quartz has good light transmittance and poor heat absorption capacity, if the supporting arm 154 made of quartz directly contacts the high-temperature (1100°C to 1200°C) tray 170, the temperature of the supporting arm 154 is lower than the temperature of the tray 170, which will affect the temperature of the tray 170. Moreover, the second end 1542 of the supporting arm 154 directly contacts the high-temperature tray 170. Under high temperature, the second end 1542 will also melt and adhere, affecting the levelness of the tray 170, and further affecting the film forming effect of the wafer 190 on the upper surface of the tray 170. On the other hand, considering that quartz is easy to wear, and the tray 1 170 rotates under the action of the rotating support structure. In this process, there is much friction between the tray 170 and the rotating support structure. If the support arm 154 is used to directly contact the tray 170, the second end 1542 of the support arm 154 is easy to wear and thus affect the height of the support arm 154 and the horizontality of the tray 170. Moreover, the support arm 154 welded on the rotating shaft 153 is not easy to replace. Therefore, the utility model adopts the adjustment column 155 made of silicon carbide. On the one hand, it eliminates the up and down jumping of the tray 170 when rotating. On the other hand, silicon carbide does not affect the temperature of the tray 170 and is not easily affected by the high temperature of the tray 170 and melted. Moreover, when wear occurs, the adjustment column 155 is easy to replace. Of course, in other embodiments, other materials that meet the requirements can also be used as the adjustment column 155.

[0047] Further, in order to improve the fixity of the relative position between the adjusting column 155 and the second end 1542 of the supporting arm 154 and reduce the influence on the rotation stability of the tray 170, the adjusting column 155 and the second end 1542 of the supporting arm 154 are connected by a conical structure. Figure 5The bottom of the adjusting column 155 is a conical column, and the second end 1542 of the supporting arm 154 is provided with a conical hole matching with the conical column at the bottom of the adjusting column 155. The adjusting column 155 and the supporting arm 154 are connected by inserting the conical column at the bottom of the adjusting column 155 into the conical hole at the second end 1542 of the supporting arm 154. When the adjustment column 155 is set on the second end 1542 of the support arm 154, considering that the support arm 154 is made of quartz and is not easy to perform complex processing, and in order to facilitate the replacement of the adjustment column 155 to select the most suitable height, a hole is opened on the second end 1542 of the support arm 154, and the bottom surface of the adjustment column 155 is set to a cylindrical structure, which is a more convenient and easy-to-operate method. However, when the adjustment column 155 is installed on the support arm 154, there is an installation gap between the two, which produces a new installation error and reduces the overall accuracy of the rotating support structure. Therefore, in this embodiment, the adjustment column 155 and the second end 1542 of the support arm 154 are installed by setting a conical structure. The structure of the conical column and the conical hole can make the second end 1542 of the support arm and the adjustment column 155 automatically align, that is, the symmetry axes of the two are automatically aligned, and the positions of the two after assembly are relatively fixed, which reduces the installation gap and improves the overall accuracy of the rotating support structure.

[0048] The tray 170 and the adjustment column 155 are fixedly mounted via a groove structure. Specifically, the top surface of the adjustment column 155 is a plane, and the bottom of the tray 170 is provided with a mounting groove 171 that matches the top surface of the adjustment column 155. The adjustment column 155 and the tray 170 are fixed by mounting the top surface of each adjustment column 155 in the corresponding mounting groove 171 at the bottom of the tray 170. Preferably, the number of the mounting grooves 171 is consistent with the number of the support arms 154. In this embodiment, there are three evenly distributed mounting grooves 171. In other embodiments, the number of the mounting grooves 171 may not be limited, but it is necessary to ensure that each adjustment column 155 has a corresponding mounting groove 171.

[0049] When the support arm 154 is welded on the rotating shaft 153, due to the problems of machining accuracy and welding accuracy, the height of the second end 1542 of the support arm 154 may deviate from the original design position. Therefore, the adjustment column 155 of different heights is provided to compensate for the height deviation. Figure 4 As shown, the horizontal position of the second end 1542 of the support arm 154 may also be slightly deflected relative to the original design position. This deflection may occur in two directions, one is the radial direction of the tray 170, and the other is the circumferential direction of the tray 170. In this case, after the adjustment column 155 is installed on the second end 1542 of the support arm 154, the deflection of the horizontal position still exists, so the size of the installation groove 171 is set to be slightly larger than the top surface of the adjustment column 155, so as to smoothly install the top surface of the adjustment column 155 in the installation groove 171 at the bottom of the tray 170. Further, as Figure 6 As shown, a waist-shaped groove can be used as the installation groove 171, and the length direction of the waist-shaped groove is set along the radial direction of the tray 170, so as to accommodate the large error of the adjustment column 155 in the radial direction of the tray 170, and can also prevent the adjustment column 155 from seriously slipping relative to the tray 170 when the tray 170 is driven by the adjustment column 155 to rotate along the circumference of the tray 170, thereby affecting the rotation stability of the tray 170; in this embodiment, the width of the waist-shaped groove is set to 0.05mm~0.1mm, which can allow a certain degree of circumferential position deviation of the adjustment column 155, and minimize the serious slippage of the tray 170 relative to the adjustment column 155 to affect the rotation stability of the tray 170. In other embodiments, according to different processing accuracies, installation grooves 171 of different sizes can also be set to achieve a more stable rotation effect.

[0050] It should be noted that although Figure 4 The adjustment column 155 shown is obviously tilted relative to the tray 170, but the figure is only a schematic diagram. It is intended to highlight the poor welding accuracy of the support arm 154 relative to the rotating shaft 153, which causes the height inconsistency of the support arm 154, and thus the error is magnified. In practice, despite the above-mentioned poor welding accuracy and the poor processing accuracy of the support arm 154, which causes the second end 1542 to be uneven, causing the adjustment column 155 to tilt relative to the tray 170, the inclination is actually relatively slight and the mounting groove 171 has a certain depth and the size of the mounting groove 171 is slightly larger than the adjustment column 155 to accommodate the adjustment column 155. Therefore, the degree of inclination does not affect the fit between the adjustment column 155 and the mounting groove 171.

[0051] Further, after the three adjustment columns 155 are installed on the second ends 1542 of the three support arms 154, the circle formed by the top centers of the three adjustment columns 155 is controlled to be concentric with the tray 170. Specifically, Figure 7 As shown, the top surface of each adjustment column 155 has a center 1551. After the adjustment column 155 of appropriate height is installed on the second end 1542 of the support arm 154, the three centers 1551 of the three adjustment columns 155 are controlled to be located in a horizontal plane and form a circle. The center of the circle is at the same position as the center of the tray 170, that is, the rotation center of the rotating support structure is concentric with the center of the tray 170, so that the tray 170 will not jump in the horizontal plane when it is driven to rotate by the rotating support structure.

[0052] In other embodiments, when the adjustment column 155 with a symmetrical structure is installed on the second end 1542 of the support arm 154, the circle formed by the top centers of the three adjustment columns 155 cannot be concentric with the tray 170. This situation may be caused by the obvious deviation of the horizontal position of the second end 1542 of the support arm 154 relative to the original design position. This deviation may be caused by the poor processing accuracy of the support arm 154, which makes the lengths of each support arm 154 inconsistent. At this time, if the adjustment column 155 with a symmetrical structure (the symmetrical structure refers to the bottom center and the top surface center of the adjustment column 155 are on the same axis) is directly installed on the support arm 154 with obvious horizontal position deviation, the circle formed by the top centers of the three adjustment columns 155 will be obviously not concentric with the tray 170, that is, the center of the tray 170 is not concentric with the rotation center of the rotating support structure, so that the tray 170 will jump in the horizontal plane when rotating, affecting the rotation stability of the tray 170, thereby affecting the film formation uniformity and film formation quality. At this time, a special-shaped adjustment column 155 can be selected to eliminate the vibration of the tray 170 in the horizontal plane caused by the non-concentricity between the rotation center of the three support arms 154 and the center of the tray 170; Figure 8As shown, the top surface of the adjustment column 155 of the special-shaped structure deviates from the bottom thereof, and the bottom center 1552 thereof is parallel to the top surface center 1553 thereof, so that the bottom center 1552 thereof is parallel to the top surface center 1553 thereof but not on the same axis, and the adjustment column 155 of the special-shaped structure also has a variety of heights, and in order to adjust the various deviations of the support arm 154 relative to the original design position, the bottom center 1552 and the top surface center 1553 are designed to have a variety of spacing distances, and the adjustment column 155 of a suitable height and a suitable shape is selected and arranged on the second end 1542 of the support arm 154, The heights of the three adjustment columns 155 are made to be in the same horizontal plane, and by selecting adjustment columns 155 with a bottom center 1552 and a top surface center 1553 with appropriate spacing, the placement position of the tray 170 on the three adjustment columns 155 is changed, so that the circle formed by the top surface centers 1553 (1551) of the three adjustment columns 155 is concentric with the tray 170. At this time, the rotation center of the entire rotating support structure is concentric with the tray 170, and the tray 170 will not jump up and down or in the horizontal plane during rotation; the three adjustment columns 155 include at least one adjustment column with a special-shaped structure. For example, in this embodiment, the adjustment column 155 is arranged on the second end 1542 of the support arm 154, and the circle formed by the top surface centers of the three adjustment columns 155 is concentric with the tray 170. At this time, the rotation center of the entire rotating support structure is concentric with the tray 170, thereby eliminating the bounce in the horizontal plane of the tray 170 during rotation.

[0053] Furthermore, the adjustment column 155 of the special-shaped structure includes an adjustment portion 1555 and a positioning portion 1554, the adjustment portion 1555 is higher than the positioning portion 1554, the center of the adjustment portion 1555 is the top surface center 1553, and the center of the positioning portion 1554 is the bottom center 1552; the adjustment portion 1555 cooperates with the mounting groove 171 at the bottom of the tray 170 to install the adjustment column 155 at the bottom of the tray 170, and the positioning portion 1554 cooperates with the second end 1542 of the support arm 154 to set the adjustment column 155 at the second end 1542 of the support arm 154; the adjustment portion 1555 and the positioning portion 1554 form a groove, so that the adjustment portion 1555 protrudes upward to match the mounting groove 171 at the bottom of the tray 170; the positioning portion 1554 protrudes downward to match the second end 1542 of the support arm 154. It should be pointed out that although in the above embodiment only three support arms 154 are evenly spaced and welded on the side wall of the rotating shaft 153, this is not a limitation of the present embodiment. In other embodiments, four, five or more support arms 154 may be welded on the rotating shaft 153 as needed. It is only necessary to set corresponding mounting grooves 171 at the bottom of the tray 170. In order to ensure the stability of rotation, the support arms 154 may also be evenly spaced and welded on the side wall of the rotating shaft 153.

[0054] In addition, although in the above-mentioned embodiment, only one adjustment column 155 is provided at the second end 1542 of each support arm 154, in other embodiments, two conical holes can be provided on each second end 1542, and two adjustment columns 155 are correspondingly provided. The two adjustment columns 155 are matched with a mounting groove 171 at the bottom of the tray 170. This can not only strengthen the connection between the adjustment column 155 and the tray 170, but also prevent the rotation effect of the tray 170 from being affected when one of the adjustment columns 155 is worn.

[0055] The embodiment of the utility model also provides a semiconductor epitaxial device, including a reaction chamber 110, and arranged in the reaction chamber 110: the above-mentioned rotating support structure of the tray, and the tray 170 located above the rotating support structure; wherein the tray 170 is used to place the wafer 190. During the process reaction, the rotating support structure of the tray drives the tray 170 to rotate, and then drives the wafer 190 carried on the upper surface of the tray 170 to rotate, and an epitaxial film is deposited on the upper surface of the wafer 190; the multiple adjustment columns 155 in the rotating support structure of the tray are in the same horizontal plane and the circle formed by the multiple adjustment columns 155 is concentric with the tray 170, so that when the tray 170 rotates, there is no up and down jump or jump in the horizontal plane, and it has a certain rotation stability, and the rotation of the tray 170 does not affect the film quality of the wafer 190.

[0056] Although the content of the utility model has been described in detail through the above optional embodiments, it should be appreciated that the above description should not be considered as a limitation of the utility model. After reading the above content, a variety of modifications and substitutions of the utility model will be obvious to those skilled in the art. Therefore, the protection scope of the utility model should be limited by the attached claims.

Claims

1. A rotating support structure for a tray, characterized in that: include: Axis of rotation; A plurality of support arms are scatteredly distributed around the rotating shaft, each of the support arms comprises a first end and a second end, and the first end is connected to the top of the rotating shaft; A plurality of adjustment columns are provided, each of the adjustment columns has different heights, and the second end of each of the support arms can be replaced with an adjustment column of different heights, so that the top surfaces of the plurality of adjustment columns are located in the same horizontal plane to jointly support a tray.

2. A rotating support structure for a pallet as claimed in claim 1, characterized in that: The top surface of the adjusting column is a plane, and the bottom is a conical column.

3. A rotating support structure for a pallet as claimed in claim 2, characterized in that: The second end of the support arm is provided with a tapered hole matched with the bottom of the adjustment column, and the adjustment column is connected to the support arm by inserting the bottom of the adjustment column into the tapered hole.

4. A rotating support structure for a pallet as claimed in claim 2, characterized in that: The bottom of the tray is provided with a plurality of mounting grooves matched with the top surfaces of the adjusting columns.

5. A rotating support structure for a tray as claimed in claim 4, characterized in that: The mounting groove at the bottom of the tray is a waist-shaped groove.

6. A rotating support structure for a pallet as claimed in claim 5, characterized in that: The length direction of the waist-shaped groove is arranged along the radial direction of the tray.

7. A rotating support structure for a pallet as claimed in claim 6, characterized in that: The width of the waist-shaped groove is 0.05mm to 0.1mm.

8. The rotating support structure of a pallet according to claim 1, characterized in that: The adjusting column is made of silicon carbide, and the supporting arm is made of quartz.

9. The rotating support structure of a tray according to claim 1, characterized in that: The height difference between the plurality of adjusting columns is 0 mm to 0.4 mm.

10. The rotating support structure of a tray according to claim 1, characterized in that: The top surface of each of the adjustment posts has a center, and a circle formed by the centers of the plurality of adjustment posts is concentric with the tray.

11. The rotating support structure of a tray according to claim 2, characterized in that: At least one adjustment column connected to the second end of the support arm is a special-shaped structure.

12. A rotating support structure for a pallet as claimed in claim 11, characterized in that: The top surface of the adjustment column of the special-shaped structure deviates from its bottom, and the center of the bottom is parallel to the center of the top surface, so that the circle formed by the multiple adjustment columns connected to the second end of the support arm is concentric with the tray.

13. The rotating support structure of a tray according to claim 12, characterized in that: The adjustment column of the special-shaped structure includes: an adjustment part and a positioning part, the center of the adjustment part is the center of the top surface of the special-shaped structure, and the center of the positioning part is the center of the bottom of the special-shaped structure; the adjustment part is higher than the positioning part, and the adjustment part and the positioning part form a groove so that the adjustment part protrudes upward to match the installation groove at the bottom of the tray; the positioning part protrudes downward to match the second end of the support arm.

14. The rotating support structure of a tray according to claim 1, characterized in that: The rotating shaft is connected to the first ends of the plurality of supporting arms by welding.

15. The rotating support structure of a tray according to claim 1, characterized in that: There are at least three support arms, which are evenly spaced and connected to the side wall of the rotating shaft.

16. A semiconductor epitaxial device, characterized in that: It comprises a reaction chamber, and arranged in the reaction chamber: a rotating support structure of a tray as described in any one of claims 1 to 15, and a tray located above the rotating support structure; wherein the tray is used to place wafers.

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