Structure for improving pollution of spray head

Abstract

The utility model provides a structure for improving nozzle pollution. The structure comprises a nozzle placing box, the movable spray head is arranged in the spray head placing box and is used for spraying cleaning liquid; the first flow guide plate and the second flow guide plate are arranged in the direction of the spray head, a downward first opening is formed between the first flow guide plate and the second flow guide plate, and the cleaning liquid flows to the first opening from the space between the first flow guide plate and the second flow guide plate; the third flow guide plate is arranged below the opening, the third flow guide plate is obliquely arranged downwards, a second opening is formed between the third flow guide plate and the first flow guide plate, the non-fixed end of the third flow guide plate extends out of the non-fixed end of the first flow guide plate, and the cleaning liquid is guided to the second opening from the first opening. The guide plate is arranged along the spraying direction of the nozzle, so that a liquid column is prevented from directly impacting a plane, and splashing caused by impacting is avoided; meanwhile, a liquid slow-flow exhaust structure is designed at the bottom of the nozzle placement box, so that liquid is smoothly discharged from the bottom, and water vapor is prevented from sublimating and discharging.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a structure for improving nozzle pollution. Background Art

[0002] As technology nodes continue to advance, the requirements for the environmental mist (water vapor) of the developing unit and the cleanliness of the nozzles in each process are becoming increasingly higher.

[0003] When the DEV (development) unit of the prior art is operating in each process of the wafer, the escaping environment contains a large amount of water vapor of the developer and pure water. During non-operation time, liquid is also sprayed in the nozzle placement box to keep the nozzle clean.

[0004] The water vapor generated by spraying liquid will escape and condense on the surface of the nozzle, which will affect the quality of advanced process products.

[0005] In order to solve the above problems, it is necessary to propose a new structure for improving nozzle contamination. Utility Model Content

[0006] In view of the above-mentioned shortcomings of the prior art, the purpose of the present invention is to provide a structure for improving nozzle contamination, which is used to solve the problem in the prior art that water vapor generated by spraying liquid will escape and condense on the nozzle surface, which will affect the quality of advanced process products.

[0007] In order to achieve the above-mentioned purpose and other related purposes, the utility model provides a structure for improving nozzle pollution, comprising:

[0008] Nozzle placement box;

[0009] A movable nozzle disposed in the nozzle placement box, the nozzle being used to spray cleaning liquid;

[0010] A first and a second guide plate are arranged along the direction of the nozzle, a first opening downward is formed between the first and the second guide plates, and the cleaning liquid flows from the space between the first and the second guide plates to the position of the first opening;

[0011] a third guide plate disposed below the opening, the third guide plate being tilted downward to form a second opening with the first guide plate, and the non-fixed end of the third guide plate extending beyond the non-fixed end of the first guide plate, the cleaning liquid being guided from the first opening to the second opening;

[0012] a fourth guide plate disposed between the first and third guide plates, wherein the non-fixed end of the fourth guide plate extends to a position close to the non-fixed end of the first guide plate, and a third opening is formed between the fourth guide plate and the first guide plate;

[0013] The bottom of the nozzle placement box is provided with a flow guide surface, and the lowest end of the flow guide surface is provided with a drain groove;

[0014] The cleaning liquid is guided from the second opening to the guide surface, and then guided to the drain groove;

[0015] An exhaust mechanism is arranged on the nozzle placement box.

[0016] Preferably, the cleaning liquid is pure water.

[0017] Preferably, the exhaust mechanism includes a first exhaust pump disposed on the nozzle placement box and close to the first opening.

[0018] Preferably, the exhaust mechanism includes a second exhaust pump disposed on the nozzle placement box and close to the first and fourth guide plate fixed ends.

[0019] Preferably, the fixed ends of the first to fourth guide plates are all fixed to the inner surface of the nozzle placement box.

[0020] Preferably, the guide parts of the first to fourth guide plates are straight plates.

[0021] Preferably, a fifth guide plate is further provided between the drain groove and the third guide plate, one end of the fifth guide plate is fixedly connected to the non-fixed end of the third guide plate, and the other end is fixedly connected to the inner surface of the nozzle placement box above the drain groove.

[0022] Preferably, the structure is used in a developing unit in a photolithography machine.

[0023] As described above, the structure of improving nozzle pollution of the utility model has the following beneficial effects:

[0024] The utility model adopts a guide plate arranged in accordance with the spraying direction of the nozzle to prevent the liquid column from directly hitting the plane and prevent splashing caused by the impact; at the same time, a liquid slow-flow exhaust structure is designed at the bottom of the nozzle placement box to allow the liquid to be discharged smoothly from the bottom, preventing water vapor from sublimating and being discharged. BRIEF DESCRIPTION OF THE DRAWINGS

[0025] Figure 1 Shown is a schematic diagram of the structure of the utility model for improving nozzle pollution. DETAILED DESCRIPTION

[0026] The following is an explanation of the implementation of the present invention through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific implementations, and the details in this specification can also be modified or changed in various ways based on different viewpoints and applications without departing from the spirit of the present invention.

[0027] See also Figure 1 The utility model provides a structure for improving the pollution of the nozzle 102, including:

[0028] A nozzle placement box 101;

[0029] A movable nozzle 102 is disposed in the nozzle placement box 101, and the nozzle 102 is used to spray the cleaning liquid;

[0030] When the nozzle 102 is working in the process chamber, it is moved from the nozzle placement box 101 (for example, by a robotic arm) to a desired position; when the nozzle 102 is not working, it needs to be placed in the nozzle placement box 101, and in order to clean the nozzle 102, a cleaning liquid needs to be sprayed intermittently.

[0031] In some embodiments, the cleaning liquid is pure water. The cleaning liquid here can also be an organic solvent or the like.

[0032] The first and second guide plates (103, 104) are arranged along the direction of the nozzle 102, and a first opening A facing downward is formed between the first and second guide plates (103, 104), and the cleaning liquid flows from the space between the first and second guide plates (103, 104) to the position of the first opening A; the arrangement of the first and second guide plates (103, 104) enables both the normally sprayed and splashed cleaning liquid to flow from the space between the first and second guide plates (103, 104) to the position of the first opening A;

[0033] A third guide plate 105 is disposed below the opening, the third guide plate 105 is tilted downward to form a second opening B with the first guide plate 103, and the non-fixed end of the third guide plate 105 extends beyond the non-fixed end of the first guide plate 103, and the cleaning liquid is guided from the first opening A to the second opening B;

[0034] A fourth guide plate 106 is disposed between the first and third guide plates, wherein a non-fixed end of the fourth guide plate 106 extends to a position close to a non-fixed end of the first guide plate 103, and a third opening C is formed between the fourth guide plate 106 and the first guide plate 103;

[0035] In some embodiments, the fixed ends of the first to fourth guide plates are all fixed (eg, welded, bolted, clamped, etc.) to the inner surface of the nozzle placement box 101 .

[0036] In some embodiments, the guide parts of the first to fourth guide plates are straight plates.

[0037] The bottom of the nozzle placement box 101 is provided with a guide surface, and the lowest end of the guide surface is provided with a drain groove 110;

[0038] The cleaning liquid is guided from the second opening B to the guide surface, and then guided to the drain groove 110;

[0039] In some embodiments, a fifth guide plate 107 is further arranged between the drain groove 110 and the third guide plate 105 , one end of the fifth guide plate 107 is fixedly connected to the non-fixed end of the third guide plate 105 , and the other end is fixedly connected to the inner surface of the nozzle placement box 101 above the drain groove 110 .

[0040] The liquid can be directed to the drain groove 110 by means of the staggered multiple guide plates, and a barrier effect can be formed on water vapor, thereby reducing the backflow of water vapor to the nozzle 102 .

[0041] The exhaust mechanism disposed on the nozzle placement box 101 can further exhaust the water vapor to prevent the water vapor from contaminating the nozzle 102 .

[0042] In some embodiments, the exhaust mechanism includes a first exhaust pump 108 disposed on the nozzle placement box 101 and close to the first opening A.

[0043] In some embodiments, the exhaust mechanism includes a second exhaust pump 109 disposed on the nozzle placement box 101 and close to the first and fourth guide plate fixing ends.

[0044] It should be noted that the number and installation positions of the air pumps may also be other settings and are not specifically limited here.

[0045] In some embodiments, the structure is used in a developer unit in a lithography machine.

[0046] The utility model adopts a guide plate arranged in accordance with the spraying direction of the nozzle to prevent the liquid column from directly hitting the plane and prevent splashing caused by the impact; at the same time, a liquid slow-flow exhaust structure is designed at the bottom of the nozzle placement box 101 to allow the liquid to be discharged smoothly from the bottom, preventing water vapor from sublimating and being discharged.

[0047] It should be noted that the illustrations provided in this embodiment are only used to schematically illustrate the basic concept of the present invention. Therefore, the drawings only show components related to the present invention rather than being drawn according to the number, shape and size of components in actual implementation. In actual implementation, the type, quantity and proportion of each component may be changed arbitrarily, and the component layout may also be more complicated.

[0048] In summary, the utility model adopts a guide plate arranged in accordance with the spraying direction of the nozzle to prevent the liquid column from directly hitting the plane and prevent splashing caused by the impact; at the same time, a liquid slow-flow exhaust structure is designed at the bottom of the nozzle placement box to allow the liquid to be discharged smoothly from the bottom, preventing water vapor from sublimating and being discharged. Therefore, the utility model effectively overcomes various shortcomings in the prior art and has a high industrial utilization value.

[0049] The above embodiments are merely illustrative of the principles and effects of the present invention, and are not intended to limit the present invention. Anyone familiar with the technology may modify or alter the above embodiments without departing from the spirit and scope of the present invention. Therefore, all equivalent modifications or alterations made by a person of ordinary skill in the art without departing from the spirit and technical concept disclosed in the present invention shall still be covered by the claims of the present invention.

Claims

1. A structure for improving nozzle pollution, characterized in that: include: Nozzle placement box; A movable nozzle disposed in the nozzle placement box, the nozzle being used to spray cleaning liquid; A first and a second guide plate are arranged along the direction of the nozzle, a first opening downward is formed between the first and the second guide plates, and the cleaning liquid flows from the space between the first and the second guide plates to the position of the first opening; a third guide plate disposed below the opening, the third guide plate being tilted downward to form a second opening with the first guide plate, and the non-fixed end of the third guide plate extending beyond the non-fixed end of the first guide plate, the cleaning liquid being guided from the first opening to the second opening; a fourth guide plate disposed between the first and third guide plates, wherein the non-fixed end of the fourth guide plate extends to a position close to the non-fixed end of the first guide plate, and a third opening is formed between the fourth guide plate and the first guide plate; The bottom of the nozzle placement box is provided with a flow guide surface, and the lowest end of the flow guide surface is provided with a drain groove; The cleaning liquid is guided from the second opening to the guide surface, and then guided to the drain groove; An exhaust mechanism is arranged on the nozzle placement box.

2. The structure for improving nozzle pollution according to claim 1, characterized in that: The cleaning liquid is pure water.

3. The structure for improving nozzle pollution according to claim 1, characterized in that: The exhaust mechanism includes a first exhaust pump which is arranged on the nozzle placement box and is close to the first opening.

4. The structure for improving nozzle pollution according to claim 1, characterized in that: The exhaust mechanism includes a second exhaust pump which is arranged on the nozzle placement box and is close to the first and fourth guide plate fixing ends.

5. The structure for improving nozzle pollution according to claim 1, characterized in that: The fixed ends of the first to fourth guide plates are all fixed to the inner surface of the nozzle placement box.

6. The structure for improving nozzle pollution according to claim 1, characterized in that: The guide parts of the first to fourth guide plates are straight plates.

7. The structure for improving nozzle pollution according to claim 1, characterized in that: A fifth guide plate is also provided between the drain groove and the third guide plate, one end of the fifth guide plate is fixedly connected to the non-fixed end of the third guide plate, and the other end is fixedly connected to the inner surface of the nozzle placement box above the drain groove.

8. The structure for improving nozzle pollution according to claim 1, characterized in that: The structure is used for a developing unit in a photolithography machine.

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