Semiconductor part cleaning table
By introducing a drying box and a drying mechanism into the semiconductor parts cleaning table, and drying is performed using an electric heating box and a blower, the problem of lack of a drying device in the prior art is solved, and the cleaning efficiency and practicality are improved.
Patent Information
- Application Number
- CN202323478007.8
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-20
- Publication Date
- 2024-12-20
- Estimated Expiration
- 2033-12-20
AI Technical Summary
The existing semiconductor parts cleaning devices lack drying devices, which leads to the inability to drying treatment after cleaning, and are poor in practicality.
A semiconductor parts cleaning table is designed, including a drying box and a drying mechanism, which uses an electric heating box and a blower to provide heat and air circulation, and the semiconductor parts are dried through a drying cover to improve cleaning efficiency.
Effective drying of semiconductor parts is achieved, and the practicality and efficiency of the cleaning table are improved.
Smart Images
Figure CN222197955U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of semiconductor production, in particular to a semiconductor parts cleaning station. Background Art
[0002] In the process of oxidation regeneration of semiconductor boards, we first receive the board materials to be processed from customers, test the size, film thickness and surface roughness of the incoming parts, and analyze and evaluate them. The test data is used as the basis for formulating the anodizing production process parameters and the quality inspection and confirmation after anodizing; the second operation is to use acetone solution soaking and white cleaning cloth wiping method to clean the film deposited on the surface of the parts during production, in preparation for removing the oxide film; then it is cleaned to wash away the impurities and oxides on the surface, in preparation for the subsequent anodizing coating.
[0003] The Chinese patent application with application number CN202022218264.8 discloses a semiconductor equipment parts cleaning station, including: a box, a heating water tank and a pipeline, a heating water tank is fixedly installed on the left side of the box, and a heating rod is installed on the heating water tank cover; pipelines are fixedly installed on both sides of the box, and the upper ends of the pipelines extend to the middle of the box through the through holes on the side walls of the box and are fixedly connected to the water pipes; multiple nozzles are evenly arranged on the water pipes; a hot air blower 1 is fixedly installed on the top of the box, a hot air blower 2 is installed on the side walls of the box, a cylinder is fixedly installed on the four corners of the box, and a filter plate is hinged on the cylinder, a waste water tank is provided at the bottom of the box, and a water outlet is provided below the waste water tank; a box door is provided outside the box, and the box door is hinged to the box through a rotating shaft. The utility model has good cleaning effect and saves costs.
[0004] However, the existing cleaning device still has some defects. There is no drying device. After the semiconductor parts are cleaned, they cannot be dried, which has poor practicality. Utility Model Content
[0005] In view of the above-mentioned deficiencies in the prior art, the utility model provides a semiconductor parts cleaning station, which aims to solve the problems of having no drying device, being unable to dry the semiconductor parts after cleaning, and having poor practicality.
[0006] In order to achieve the above-mentioned utility model object, the technical solution adopted by the utility model is: a semiconductor parts cleaning station, comprising a base, a cleaning box is installed on the upper surface of the base, a cleaning mechanism is installed inside the cleaning box, a fixed box is connected to the upper surface of the cleaning box, a scrubbing mechanism is connected inside the fixed box, a fixing mechanism is connected to the bottom of the fixed box, a drying box is connected to one side of the fixed box, a drying mechanism is installed on the upper surface of the drying box, and a placing mechanism is installed inside the drying box;
[0007] The cleaning mechanism includes a filter screen installed inside the cleaning box, a pump body is connected below the filter screen, a water supply pipe is connected to one side of the pump body, the other end of the water supply pipe extends into the fixed box and is connected to a flushing rack, a water leakage port is connected to the top of the cleaning box, a water inlet is connected to one side of the cleaning box, and a drain port is connected to the bottom of the cleaning box.
[0008] Furthermore, the scrubbing mechanism includes an electric push rod installed on the top of the fixed box, the protruding end of the electric push rod is connected to a placement plate, the upper surface of the placement plate is connected to a scrubbing motor, and the output end of the scrubbing motor is connected to a brush disc.
[0009] Furthermore, the drying mechanism includes an electric heating box installed on the upper surface of the drying box, a blower is connected to one side of the electric heating box, an exhaust pipe is connected to the other side of the electric heating box, and the bottom end of the exhaust pipe extends into the interior of the drying box and is connected to a drying hood.
[0010] Furthermore, the placement mechanism includes a water leakage plate installed inside the drying box, the water leakage plate is provided with a drainage port, the upper surface of the water leakage plate is connected to a placement frame, and the interior of the drying box is connected to an auxiliary frame.
[0011] Furthermore, the fixing mechanism includes a fixing seat installed inside the fixing box, a threaded rod is installed on the fixing seat, one end of the threaded rod is connected to a fixing handle, the other end of the threaded rod is connected to a fixing plate, and one side of the fixing plate is connected to a cross plate.
[0012] The beneficial effects of the utility model are:
[0013] The utility model provides a semiconductor parts cleaning table. When in actual use, the semiconductor parts are placed on a horizontal plate, the fixed handle is rotated to drive the threaded rod to rotate, and then the fixed plate is driven to fix the semiconductor parts. The brush plate is driven by an electric push rod to clean the semiconductor parts. While brushing, the cleaning liquid inside the cleaning box is extracted by a pump body, and then the surface of the semiconductor parts is cleaned by a flushing rack. The cleaning liquid after cleaning can be filtered through a filter net to improve the utilization rate of the cleaning liquid. After cleaning, the semiconductor parts are placed on a placement frame, the blower is started, and the heat of the electric heating box is used to dry the semiconductor parts through a drying cover to improve the cleaning efficiency. BRIEF DESCRIPTION OF THE DRAWINGS
[0014] Figure 1 It is a cross-sectional view of a semiconductor parts cleaning station of the utility model;
[0015] Figure 2 A semiconductor parts cleaning station of the utility model Figure 1 Enlarged view of point A in the middle.
[0016] Reference table of reference numerals:
[0017] 1. Base; 2. Cleaning box; 3. Cleaning mechanism; 301. Filter; 302. Pump body; 303. Water supply pipe; 304. Flushing rack; 305. Leakage port; 306. Water inlet; 307. Drain port; 4. Scrubbing mechanism; 401. Electric push rod; 402. Placement plate; 403. Scrubbing motor; 404. Brush plate; 5. Fixing mechanism; 501. Fixing seat; 502. Threaded rod; 503. Fixing handle; 504. Fixing plate; 505. Horizontal plate; 6. Drying box; 7. Drying mechanism; 701. Electric heating box; 702. Blower; 703. Exhaust pipe; 704. Drying hood; 8. Placement mechanism; 801. Leakage plate; 802. Drain port; 803. Placement frame; 804. Auxiliary rack; 9. Fixing box. DETAILED DESCRIPTION
[0018] The specific implementation of the utility model is further described below in conjunction with the accompanying drawings, wherein the same parts are represented by the same reference numerals.
[0019] It should be noted that the words "front", "rear", "left", "right", "up" and "down" used in the following description refer to directions in the drawings, and the words "inside" and "outside" refer to directions toward or away from the geometric center of a specific component, respectively.
[0020] In order to make the contents of the present invention more clearly understood, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings in the embodiments of the present invention.
[0021] like Figure 1 to Figure 2 As shown, a semiconductor parts cleaning station comprises a base 1, a cleaning box 2 is installed on the upper surface of the base 1, a cleaning mechanism 3 is installed inside the cleaning box 2, a fixing box 9 is connected to the upper surface of the cleaning box 2, a brushing mechanism 4 is connected inside the fixing box 9, a fixing mechanism 5 is connected to the bottom of the fixing box 9, a drying box 6 is connected to one side of the fixing box 9, a drying mechanism 7 is installed on the upper surface of the drying box 6, and a placing mechanism 8 is installed inside the drying box 6;
[0022] The cleaning mechanism 3 includes a filter screen 301 installed inside the cleaning box 2, a pump body 302 is connected below the filter screen 301, a water supply pipe 303 is connected to one side of the pump body 302, the other end of the water supply pipe 303 extends into the fixed box 9 and is connected to a flushing rack 304, a water leakage port 305 is connected to the top of the cleaning box 2, a water inlet 306 is connected to one side of the cleaning box 2, and a drain port 307 is connected to the bottom of the cleaning box 2.
[0023] Specifically, the cleaning liquid in the cleaning box 2 is extracted by the pump body 302, and then the surface of the semiconductor parts is cleaned by the flushing rack 304. The cleaning liquid after cleaning can be filtered by the filter net 301 to improve the utilization rate of the cleaning liquid.
[0024] The scrubbing mechanism 4 includes an electric push rod 401 installed on the top of the fixed box 9, the protruding end of the electric push rod 401 is connected to a placement plate 402, the upper surface of the placement plate 402 is connected to a scrubbing motor 403, and the output end of the scrubbing motor 403 is connected to a brush disc 404.
[0025] Specifically, the brush plate 404 is driven by the electric push rod 401 to clean the semiconductor parts.
[0026] The drying mechanism 7 includes an electric heating box 701 installed on the upper surface of the drying box 6. A blower 702 is connected to one side of the electric heating box 701, and an exhaust pipe 703 is connected to the other side of the electric heating box 701. The bottom end of the exhaust pipe 703 extends into the interior of the drying box 6 and is connected to a drying hood 704.
[0027] Specifically, the blower 702 is started to use the heat of the electric heating box 701 to dry the semiconductor parts through the drying hood 704, thereby improving the cleaning efficiency.
[0028] The placement mechanism 8 includes a water-leakage plate 801 installed inside the drying box 6 , on which a drainage port 802 is provided. The upper surface of the water-leakage plate 801 is connected to a placement frame 803 , and the interior of the drying box 6 is connected to an auxiliary frame 804 .
[0029] Specifically, after cleaning, the semiconductor parts are placed on the placement frame 803, and the water stains on the parts fall to the bottom of the drying box 6 through the drainage port 802.
[0030] The fixing mechanism 5 includes a fixing seat 501 installed inside the fixing box 9, a threaded rod 502 is installed on the fixing seat 501, one end of the threaded rod 502 is connected to a fixing handle 503, the other end of the threaded rod 502 is connected to a fixing plate 504, and one side of the fixing plate 504 is connected to a horizontal plate 505.
[0031] The working principle of the utility model is that in actual use, the semiconductor parts are placed on the horizontal plate 505, the fixed handle 503 is rotated to drive the threaded rod 502 to rotate, and then the fixed plate 504 is driven to fix the semiconductor parts, and the brush plate 404 is driven by the electric push rod 401 to clean the semiconductor parts. While brushing, the cleaning liquid inside the cleaning box 2 is extracted by the pump body 302, and then the surface of the semiconductor parts is cleaned by the flushing rack 304. The cleaning liquid after cleaning can be filtered through the filter net 301 to improve the utilization rate of the cleaning liquid. After cleaning, the semiconductor parts are placed on the placement frame 803, the blower 702 is started, and the heat of the electric heating box 701 is used to dry the semiconductor parts through the drying cover 704 to improve the cleaning efficiency.
[0032] The above description is only a preferred embodiment of the present utility model patent and is not intended to limit the present utility model patent. Any modifications, equivalent substitutions and improvements made within the spirit and principles of the present utility model patent shall be included in the protection scope of the present utility model patent.
Claims
1. A semiconductor parts cleaning station, characterized in that: The utility model comprises a base (1), a cleaning box (2) is installed on the upper surface of the base (1), a cleaning mechanism (3) is installed inside the cleaning box (2), a fixing box (9) is connected to the upper surface of the cleaning box (2), a brushing mechanism (4) is connected inside the fixing box (9), a fixing mechanism (5) is connected to the bottom of the fixing box (9), a drying box (6) is connected to one side of the fixing box (9), a drying mechanism (7) is installed on the upper surface of the drying box (6), and a placing mechanism (8) is installed inside the drying box (6); The cleaning mechanism (3) comprises a filter screen (301) installed inside the cleaning box (2); a pump body (302) is connected below the filter screen (301); a water supply pipe (303) is connected to one side of the pump body (302); the other end of the water supply pipe (303) extends into the fixed box (9) and is connected to a flushing rack (304); a water leakage port (305) is connected to the top of the cleaning box (2); a water inlet (306) is connected to one side of the cleaning box (2); and a water discharge port (307) is connected to the bottom of the cleaning box (2).
2. A semiconductor parts cleaning station according to claim 1, characterized in that: The scrubbing mechanism (4) comprises an electric push rod (401) mounted on the top of a fixed box (9); the protruding end of the electric push rod (401) is connected to a placement plate (402); the upper surface of the placement plate (402) is connected to a scrubbing motor (403); and the output end of the scrubbing motor (403) is connected to a brush plate (404).
3. A semiconductor parts cleaning station according to claim 1, characterized in that: The drying mechanism (7) comprises an electric heating box (701) installed on the upper surface of the drying box (6); one side of the electric heating box (701) is connected to a blower (702); the other side of the electric heating box (701) is connected to an exhaust pipe (703); the bottom end of the exhaust pipe (703) extends into the interior of the drying box (6) and is connected to a drying cover (704).
4. A semiconductor parts cleaning station according to claim 1, characterized in that: The placement mechanism (8) comprises a water leakage plate (801) installed inside the drying box (6), the water leakage plate (801) is provided with a drainage port (802), the upper surface of the water leakage plate (801) is connected to a placement frame (803), and the interior of the drying box (6) is connected to an auxiliary frame (804).
5. A semiconductor parts cleaning station according to claim 1, characterized in that: The fixing mechanism (5) comprises a fixing seat (501) installed inside the fixing box (9), a threaded rod (502) being installed on the fixing seat (501), one end of the threaded rod (502) being connected to a fixing handle (503), the other end of the threaded rod (502) being connected to a fixing plate (504), and one side of the fixing plate (504) being connected to a transverse plate (505).