Processing and manufacturing system for high-emissivity layer of blackbody radiation source

Abstract

The utility model relates to the technical field of blackbody radiation sources, in particular to a processing and manufacturing system for a high-emissivity layer of a blackbody radiation source, which comprises a pulse laser, an optical shutter, a filter, a beam expander and a deformation device. Wherein the tunable pulse laser is used for emitting pulse laser; the optical shutter is used for controlling the exposure time of the pulse laser; the filter is used for filtering stray light; the beam expander is used for carrying out beam expansion on the pulse laser after stray light filtering; the deformation device is used for shaping the expanded pulse laser; and processing micropores in the surface of the radiation source substrate by the shaped pulse laser, and taking the radiation source substrate with the micropores as a high-emissivity layer of the blackbody radiation source. According to the utility model, the micropore groups are processed on the surface of the radiation source substrate through the pulse laser, so that the infrared emissivity can be improved, the temperature uniformity cannot be changed, the temperature uniformity can be further improved, and the improvement efficiency is not limited by the thickness of a paint film and the bonding degree of the paint film and the substrate.

Description

Technical Field

[0001] The utility model relates to the technical field of black body radiation sources, in particular to a processing and manufacturing system for a high emissivity layer of a black body radiation source. Background Art

[0002] With the rapid development of infrared technology and measurement and control technology, the requirements for black bodies as standard sources for measuring infrared radiation characteristics are becoming more and more stringent, among which the infrared emissivity index is one of the most important characteristics of black bodies. The traditional method for increasing the infrared emissivity of black body radiation sources is to spray high emissivity black paint on the surface of metal or non-metal radiation source substrates. The disadvantage of this method of increasing infrared emissivity is that it is limited by the thickness of the paint film and the degree of adhesion between the paint film and the substrate. The inconsistent thickness of the paint film can easily cause changes in the temperature uniformity of the black body radiation source.

[0003] Therefore, there is an urgent need for a new method to increase the infrared emissivity of a blackbody radiation source. Utility Model Content

[0004] In view of the above problems, the utility model proposes a processing and manufacturing system for a high emissivity layer of a blackbody radiation source, which uses a pulsed laser to process a group of micropores on the surface of a radiation source substrate to replace the traditional method of spraying high emissivity black paint to improve infrared emissivity.

[0005] The utility model provides a processing and manufacturing system for a high emissivity layer of a black body radiation source, comprising a pulse laser, an optical shutter, a filter, a beam expander, and a deformation device; wherein:

[0006] Tunable pulse laser is used to emit pulsed laser;

[0007] The optical shutter is used to control the exposure time of the pulsed laser;

[0008] The filter is used to filter stray light;

[0009] The beam expander is used to expand the pulsed laser beam after filtering out stray light;

[0010] The deformation device is used to shape the pulsed laser after beam expansion;

[0011] The shaped pulse laser processes microholes on the surface of the radiation source substrate, and the radiation source substrate with the microholes is used as a high emissivity layer of a black body radiation source.

[0012] Preferably, the processing and manufacturing system of the high emissivity layer of the black body radiation source further comprises a polarization control unit for deflecting the pulsed laser.

[0013] Preferably, the processing and manufacturing system of the high emissivity layer of the blackbody radiation source also includes a semi-transparent and semi-reflective mirror and a CCD detection module. The semi-transparent and semi-reflective mirror is located in the beam deflection direction of the polarization control unit, and the CCD detection module is located in the reflection direction of the semi-transparent and semi-reflective mirror; the semi-transparent and semi-reflective mirror is used to allow the deflected pulsed laser to pass through and be incident on the surface of the radiation source substrate, and to reflect the reflected light from the surface of the radiation source substrate to the CCD detection module.

[0014] Preferably, the processing and manufacturing system of the high emissivity layer of the blackbody radiation source further includes a double-layer workbench, the double-layer workbench includes an upper platform, a lower platform and pillars, the pillars are supported between the upper platform and the lower platform, the radiation source substrate is placed on the upper surface of the lower platform, the pulse laser, optical shutter, filter, beam expander, deformation device, and polarization control unit are respectively placed on the upper surface of the upper platform, a light hole is opened on the upper surface of the upper platform at a position corresponding to the polarization control unit, the semi-transparent and semi-reflective mirror and the CCD detection module are respectively fixedly connected to the bottom surface of the upper platform through a bracket, and the semi-transparent and semi-reflective mirror is located below the light hole.

[0015] Preferably, a two-dimensional movable platform is installed on the upper surface of the lower platform, and the radiation source substrate is placed on the upper surface of the two-dimensional movable platform.

[0016] Preferably, the deformable device is a wavefront corrector.

[0017] Preferably, the polarization control unit is a light wave polarization controller.

[0018] Compared with the traditional method of spraying high-emissivity black paint, the utility model uses pulsed laser to process micropore groups on the surface of the radiation source substrate. The micropore groups can improve the infrared emissivity. Compared with the traditional spraying method, it will not cause changes in temperature uniformity, and can further improve temperature uniformity. The efficiency improvement will not be limited by the thickness of the paint film and the degree of adhesion between the paint film and the substrate. BRIEF DESCRIPTION OF THE DRAWINGS

[0019] Figure 1 It is a structural schematic diagram of a processing and manufacturing system for a high emissivity layer of a blackbody radiation source provided in an embodiment of the utility model;

[0020] Figure 2 It is a schematic structural diagram of a high emissivity layer of a black body radiation source provided according to an embodiment of the utility model;

[0021] Figure 3 yes Figure 2 Schematic diagram of the cross-sectional structure.

[0022] The reference numerals therein include: tunable pulse laser 1, optical shutter 2, filter 3, beam expander 4, first deformation device 5, second deformation device 6, polarization control unit 7, semi-transparent and semi-reflective mirror 8, CCD detection module 9, two-dimensional moving platform 10, double-layer workbench 11, upper platform 11a, lower platform 11b, pillar 11c, radiation source substrate 12, micropore 13, first bracket 14, and second bracket 15. DETAILED DESCRIPTION

[0023] Hereinafter, embodiments of the present utility model will be described with reference to the accompanying drawings. In the following description, the same modules are represented by the same reference numerals. In the case of the same reference numerals, their names and functions are also the same. Therefore, the detailed description thereof will not be repeated.

[0024] In order to make the purpose, technical solution and advantages of the utility model more clear, the utility model is further described in detail below in conjunction with the accompanying drawings and specific embodiments. It should be understood that the specific embodiments described here are only used to explain the utility model and do not constitute a limitation of the utility model.

[0025] Figure 1 The structure of the processing and manufacturing system of the high emissivity layer of the blackbody radiation source provided by the embodiment of the utility model is shown, including a tunable pulse laser 1, an optical shutter 2, a filter 3, a beam expander 4, a first deformation device 5, a second deformation device 6, a polarization control unit 7, a semi-transparent and semi-reflective mirror 8, a CCD detection module 9, a two-dimensional mobile platform 10 and a double-layer workbench 11; wherein the double-layer workbench 11 includes an upper platform 11a, a lower platform 11b and a pillar 11c, the upper platform 11a is located above the lower platform 11b, the pillar 11c is supported between the upper platform 11a and the lower platform 11b, the tunable pulse laser 1, the optical shutter 2, the filter 3, the beam expander 4, the first deformation device 5, the second deformation device 6, the polarization control unit 7, the semi-transparent and semi-reflective mirror 8, the CCD detection module 9, the two-dimensional mobile platform 10 and the double-layer workbench 11; wherein the double-layer workbench 11 includes an upper platform 11a, a lower platform 11b and a pillar 11c, the upper platform 11a is located above the lower platform 11b, the pillar 11c is supported between the upper platform 11a and the lower platform 11b, The sheet 3, the beam expander 4, the first deformation device 5, the second deformation device 6, and the polarization control unit 7 are placed in sequence on the upper surface of the upper platform 11a. A light hole that penetrates the thickness of the upper platform 11a is also opened on the surface of the upper platform 11a at a position corresponding to the polarization control unit 7. The semi-transparent and semi-reflective mirror 8 is fixed to the bottom surface of the upper platform 11a through the first bracket 14 and is located below the light hole. The CCD detection module 9 is fixed to the bottom surface of the upper platform 11a through the second bracket 15 and is located in the reflection direction of the semi-transparent and semi-reflective mirror 8. The two-dimensional mobile platform 10 is fixed to the upper surface of the lower platform 11b, and the radiation source substrate 12 to be processed is placed on the two-dimensional mobile platform 10.

[0026] The pulse laser emitted by the tunable pulse laser 1 controls the laser exposure time through the optical shutter 2, filters out stray light through the filter 3, and is expanded by the beam expander 4 to transform the point light source into a surface light source. The distortion is eliminated by the first deformation device 5 and the second deformation device 6. The pulse laser is folded and changed in direction by the polarization control unit 7, passes through the light-through hole, and is incident on the surface of the radiation source substrate 12 through the half-head half-reflecting mirror 8. The surface of the radiation source substrate 12 is processed by the field effect generated by the pulse laser, and finally a micropore group consisting of a plurality of micropores 13 is formed on the surface of the radiation source substrate 12; the CCD detection module 9 detects the processed micropores 13 through the half-transparent half-reflecting mirror 8.

[0027] The first deformation device 5 and the second deformation device 6 both adopt wavefront correctors, which change the phase structure of the incident light wavefront by changing the optical path of the light wavefront transmission or the refractive index of the transmission medium, thereby correcting the light wavefront phase.

[0028] The polarization control unit 7 uses a light wave polarization controller. The reason for using the light wave polarization controller is to keep the shape of the elliptically polarized laser unchanged and reduce the interference and diffraction caused by the strong correlation of the laser and the influence of some stray light. The light wave polarization controller includes but is not limited to Agilent's HP11896A.

[0029] The two-dimensional moving platform 10 is a common xy two-axis moving platform on the market. The two-dimensional moving platform 10 drives the radiation source substrate 12 to move two-dimensionally in the horizontal direction to achieve the processing of microholes 13 at different positions.

[0030] The CCD detection module 9 includes but is not limited to using a KEYENCE CA-HF2100M camera. The CCD detection module 9 images the processed micropores 13 and transmits the images to a computer. The micropores 13 are detected by detection software installed on the computer. The detection contents include whether the morphology of the micropores is regular, whether the micropores 13 pass through the radiation source substrate 12 and cause damage to the radiation source substrate 12, whether the aperture of the micropores 13 meets the requirements, etc. The detection software uses the existing Canny edge detection algorithm for image detection, so it will not be repeated here.

[0031] The infrared emissivity of the black body radiation source is related to the depth L and radius R of the microhole 13, so the depth L and radius R of the microhole 13 are adjusted to obtain the desired infrared emissivity. The utility model controls the depth L and radius R of the processed microhole 13 by adjusting the power of the tunable pulse laser 1.

[0032] The calculation formula of infrared emissivity is as follows:

[0033] ;

[0034] Wherein, A is the opening area of ​​the micropore 13, S is the entire inner surface area of ​​the micropore 13, and L is the depth of the micropore 13. is the default emissivity of the substrate material (as can be seen from the default emissivity table of materials), and A and S are calculated based on R.

[0035] It should be understood that the various forms of processes shown above can be used to reorder, add or delete steps. For example, the steps described in the utility model disclosure can be performed in parallel, sequentially or in different orders, as long as the desired results of the technical solution disclosed in the utility model can be achieved, and this document does not limit this.

[0036] The above specific implementations do not constitute a limitation on the protection scope of the present utility model. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present utility model shall be included in the protection scope of the present utility model.

Claims

1. A processing and manufacturing system for a high emissivity layer of a blackbody radiation source, characterized in that: It includes tunable pulse laser, optical shutter, filter, beam expander and deformation device; among them, The tunable pulse laser is used to emit pulse laser; The optical shutter is used to control the exposure time of the pulsed laser; The filter is used to filter stray light; The beam expander is used to expand the pulsed laser beam after the stray light is filtered out; The deformation device is used to shape the pulsed laser after beam expansion; The shaped pulse laser processes microholes on the surface of the radiation source substrate, and the radiation source substrate with the microholes is used as a high emissivity layer of a black body radiation source.

2. The processing and manufacturing system of the high emissivity layer of the black body radiation source according to claim 1, characterized in that: It also includes a polarization control unit for folding the pulsed laser.

3. The processing and manufacturing system of the high emissivity layer of the black body radiation source according to claim 2, characterized in that: It also includes a semi-transparent and semi-reflective mirror and a CCD detection module, wherein the semi-transparent and semi-reflective mirror is located in the light beam deflection direction of the polarization control unit, and the CCD detection module is located in the reflection direction of the semi-transparent and semi-reflective mirror; the semi-transparent and semi-reflective mirror is used to allow the deflected pulsed laser to pass through and be incident on the surface of the radiation source substrate, and to reflect the reflected light from the surface of the radiation source substrate to the CCD detection module.

4. The processing and manufacturing system of the high emissivity layer of the black body radiation source according to claim 3, characterized in that: The invention further comprises a double-layer workbench, wherein the double-layer workbench comprises an upper platform, a lower platform and pillars, wherein the pillars are supported between the upper platform and the lower platform, the radiation source substrate is placed on the upper surface of the lower platform, the tunable pulse laser, the optical shutter, the filter, the beam expander, the deformation device and the polarization control unit are respectively placed on the upper surface of the upper platform, a light-through hole is provided on the upper surface of the upper platform at a position corresponding to the polarization control unit, the semi-transparent and semi-reflective mirror and the CCD detection module are respectively fixedly connected to the bottom surface of the upper platform through a bracket, and the semi-transparent and semi-reflective mirror is located below the light-through hole.

5. The processing and manufacturing system of the high emissivity layer of the black body radiation source according to claim 4, characterized in that: A two-dimensional moving platform is installed on the upper surface of the lower platform, and the radiation source substrate is placed on the upper surface of the two-dimensional moving platform.

6. The processing and manufacturing system of the high emissivity layer of the black body radiation source according to claim 1, characterized in that: The deformation device is a wavefront corrector.

7. The processing and manufacturing system of the high emissivity layer of the black body radiation source according to claim 2, characterized in that: The polarization control unit is a light wave polarization controller.

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