Waste liquid treatment equipment for semiconductor wet etching

Abstract

The utility model relates to the technical field of waste liquid recovery, in particular to waste liquid treatment equipment for semiconductor wet etching, which comprises a recovery box and a mounting frame fixedly mounted on the side wall of the recovery box. Through the arrangement of the ventilation holes, the air outlets, the exhaust fan, the mounting frame, the combined frame plate, the activated carbon filter screen plate and the connecting blocks, when waste liquid enters the recycling box and emits harmful gas, the exhaust fan is started to exhaust the harmful gas in the recycling box into the mounting frame through the ventilation holes and the air outlets; the harmful gas is blown to the activated carbon filter screen plate arranged in the combined frame plate under the action of the exhaust fan, and the activated carbon component of the activated carbon filter screen plate adsorbs harmful substances in the harmful gas, so that the harmful gas is converted into harmless gas after passing through the activated carbon filter screen plate and is discharged to the outside; and harmful gas generated by volatilization of the waste liquid is prevented from being spread to the outside without treatment to pollute the working environment and harm the body health of workers.

Description

Technical Field

[0001] The utility model relates to the technical field of waste liquid recovery, in particular to waste liquid treatment equipment used for semiconductor wet etching. Background Art

[0002] Wet etching is a chemical process that involves the selective removal of material from a substrate using a liquid etchant. These etchants usually consist of a mixture of chemicals such as acids, bases, or solvents, which react with the substrate material to form soluble products that can be easily washed off. The etching process is driven by a chemical reaction at the substrate-etchant interface, and the etching rate is determined by the reaction kinetics and the concentration of the reacting species in the solution.

[0003] After searching, the publication number is: CN220034183U, which discloses a metal etching processing waste liquid recovery device. Through the arrangement of a first filter frame, a pH meter, a drain valve pipe, a receiving hopper and a second filter frame, the first filter frame filters the waste liquid to be recovered, removes the impurities in the waste liquid, and is conducive to the subsequent waste liquid recovery. The pH meter measures the pH of the waste liquid, which is convenient for accurately adding reagents for recovery. The waste liquid flows into the receiving hopper with the help of the drain valve pipe, and the treated waste liquid is recovered. The second filter frame filters the waste liquid again to improve the waste liquid recovery effect. The photoresist (photoresist) used in the process of photolithography, etching, etc. contains volatile organic solvents, such as butyl acetate, etc., and the organic matter and solvent will volatilize in the air, causing air pollution. If the photoresist waste liquid is not professionally treated and is directly discharged into the water or land, it will cause damage to the water source or land ecological environment. At the same time, some components in the photoresist waste liquid may be corrosive or toxic, causing direct harm to the human body and the ecological environment. However, in the above-mentioned prior art, the toxic gases generated by the waste liquid cannot be filtered when the waste liquid is recycled. The toxic gases evaporate into the air, polluting the working environment and endangering the health of the workers.

[0004] In order to solve the above problems, the utility model provides a waste liquid treatment device for semiconductor wet etching. Utility Model Content

[0005] In view of the shortcomings of the prior art, the utility model provides a waste liquid treatment equipment for semiconductor wet etching to solve the technical problem in the prior art that "the toxic gas generated by the waste liquid cannot be filtered when the waste liquid is recycled in the above-mentioned prior art, and the toxic gas evaporates into the air, polluting the working environment and endangering the health of the workers."

[0006] In order to achieve the above objectives, the present invention is implemented through the following technical solutions:

[0007] A waste liquid treatment device for semiconductor wet etching comprises a recovery box and a mounting frame, wherein the mounting frame is fixedly mounted on the side wall of the recovery box, a placement plate is arranged in the recovery box, a plurality of ventilation holes are provided on the upper end surface of the placement plate, an air outlet is provided on the side wall of the recovery box, an exhaust fan is fixedly mounted in the air outlet, a self-locking motor is fixedly mounted on the side wall of the mounting frame, a transmission cavity is provided in the mounting frame, a transmission rod is fixedly connected to the output end of the self-locking motor, two No. 1 gears are fixedly sleeved on the transmission rod, the two No. 1 gears are meshedly connected with the No. 2 gear, the centers of the two No. 2 gears are fixedly connected with threaded rods, the two threaded rods are commonly threadedly sleeved with a combination frame plate, an activated carbon filter screen plate is arranged in the combination frame plate, the activated carbon filter screen plate is fixedly connected to the side wall of the combination frame plate through a plurality of connecting blocks, and a lower plate hole matching the combination frame plate is provided on the lower end surface of the mounting frame.

[0008] As a preferred technical solution of the utility model, a servo motor is fixedly installed on the upper end surface of the recycling box, a rotating rod is fixedly connected to the output end of the servo motor, and a plurality of stirring blades are symmetrically fixedly connected to the lower end of the rotating rod, a taking port is provided on the side wall of the recycling box, a door panel is hingedly connected to the taking port, the placement plate is fixedly connected to the inner wall of the recycling box, a liquid inlet hole is provided on the upper end surface of the placement plate, a first filter frame plate is arranged in the liquid inlet hole, the first filter frame plate overlaps the upper end surface of the placement plate, a drain port is provided in the recycling box, a drain valve pipe is fixedly installed in the drain port, a frame groove is provided on the side wall of the recycling box, a recycling frame is placed in the frame groove, the frame groove and the drain port are connected to each other, and a second filter frame plate is fixedly installed in the recycling frame.

[0009] As a preferred technical solution of the utility model, a through hole matching the rotating rod is opened at the center of the placement plate, and the rotating rod is slidably connected to the inner wall of the through hole.

[0010] As a preferred technical solution of the utility model, the upper ends of the side walls on both sides of the combined frame plate are both raised portions, and the raised portions are slidably connected to the inner wall of the installation frame.

[0011] As a preferred technical solution of the utility model, the lower plate hole is a long rectangular hole, the combined frame plate is a hollow rectangular frame plate, and handles are fixedly installed on the side walls of the door plate and the recovery frame.

[0012] As a preferred technical solution of the utility model, one end of the transmission rod facing away from the self-locking motor is rotatably connected to the inner wall of the transmission cavity.

[0013] The utility model provides a waste liquid treatment device for semiconductor wet etching, which has the following beneficial effects:

[0014] 1. By setting ventilation holes, air outlets, exhaust fans, installation frames, combined frame plates, activated carbon filter plates, and connecting blocks, when waste liquid enters the recovery box and emits harmful gases, the exhaust fan is started to discharge the harmful gases in the recovery box through multiple ventilation holes and air outlets into the installation frame. Under the action of the exhaust fan, the harmful gases are blown to the activated carbon filter plates set in the combined frame plates. The activated carbon components of the activated carbon filter plates can adsorb harmful substances in the harmful gases, so that the harmful gases are converted into harmless gases after passing through the activated carbon filter plates and discharged to the outside world, thus avoiding the harmful gases generated by the volatilization of the waste liquid from being spread to the outside world without treatment to pollute the working environment and endanger the health of the staff;

[0015] 2. By setting a self-locking motor, a transmission rod, a No. 1 gear, a No. 2 gear, a threaded rod, and a combination frame plate, when the activated carbon filter plate needs to be replaced, the self-locking motor is started so that its output end drives the transmission rod to rotate, so that the two No. 1 gears respectively drive the two No. 2 gears to rotate synchronously, so that the two threaded rods move the combination frame plate downward in the installation frame under the rotation of the No. 2 gear. When the activated carbon filter plate drops out of the installation frame, the staff separates the activated carbon filter plate from the combination frame plate by removing multiple connecting blocks. At this time, a new activated carbon filter plate is replaced and installed on the combination frame plate through multiple connecting blocks to continue filtering and removing harmful gases, thereby extending the life of filtering and removing harmful gases in the installation frame, which is more practical. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 This is a three-dimensional structural schematic diagram of a waste liquid treatment device for semiconductor wet etching proposed by the utility model;

[0017] Figure 2 This is a front structural cross-sectional view of a waste liquid treatment device for semiconductor wet etching proposed by the utility model;

[0018] Figure 3 This is a top view of the structural cross-section of a recovery box in a waste liquid treatment device for semiconductor wet etching proposed by the utility model;

[0019] Figure 4 This is a front structural cross-sectional view of a mounting frame in a waste liquid treatment device for semiconductor wet etching proposed by the utility model;

[0020] Figure 5 for Figure 4 Front structural cross-sectional view of the middle combined frame plate descending in the installation frame;

[0021] Figure 6 This is a three-dimensional structural schematic diagram of a mounting frame in a waste liquid treatment device for semiconductor wet etching proposed by the utility model;

[0022] Figure 7The utility model is a schematic diagram of the three-dimensional structure of a combined frame plate in a waste liquid treatment device for semiconductor wet etching.

[0023] In the figure: 1 recovery box, 2 servo motor, 3 rotating rod, 4 stirring blade, 5 drain valve pipe, 6 door plate, 7 recovery frame, 8 placement plate, 9 liquid inlet hole, 10 ventilation hole, 11 first filter frame plate, 12 liquid inlet pipe, 13 air outlet, 14 exhaust fan, 15 installation frame, 16 self-locking motor, 17 transmission chamber, 18 transmission rod, 19 No. 1 gear, 20 No. 2 gear, 21 threaded rod, 22 combination frame plate, 23 activated carbon filter screen plate, 24 connecting block, 25 lower plate hole. DETAILED DESCRIPTION

[0024] In order to make the technical problems, technical solutions and beneficial effects to be solved by the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not used to limit the present invention.

[0025] Thus, a feature indicated in this specification will be used to illustrate one of the features of an embodiment of the utility model, rather than implying that each embodiment of the utility model must have the described feature. In addition, it should be noted that this specification describes many features. Although some features can be combined together to illustrate possible system designs, these features can also be used in other combinations that are not explicitly described. Thus, unless otherwise stated, the described combinations are not intended to be limiting.

[0026] The principle and structure of the present invention are described in detail below with reference to the accompanying drawings and embodiments:

[0027] refer to Figure 1-7 A waste liquid treatment device for semiconductor wet etching comprises a recovery box 1 and a mounting frame 15. The mounting frame 15 is fixedly mounted on the side wall of the recovery box 1. A placement plate 8 is arranged in the recovery box 1. A plurality of ventilation holes 10 are provided on the upper end surface of the placement plate 8. An air outlet 13 is arranged on the side wall of the recovery box 1. An exhaust fan 14 is fixedly mounted in the air outlet 13. A self-locking motor 16 is fixedly mounted on the side wall of the mounting frame 15. A transmission cavity 17 is arranged in the mounting frame 15. The output end of the self-locking motor 16 is fixedly connected to a transmission cavity 17. A movable rod 18, the transmission rod 18 is fixedly sleeved with two No. 1 gears 19, the two No. 1 gears 19 are meshedly connected with a No. 2 gear 20, the centers of the two No. 2 gears 20 are fixedly connected with a threaded rod 21, the two threaded rods 21 are commonly threadedly sleeved with a combination frame plate 22, an activated carbon filter plate 23 is arranged in the combination frame plate 22, the activated carbon filter plate 23 is fixedly connected to the side wall of the combination frame plate 22 through a plurality of connecting blocks 24, and a lower plate hole 25 matching the combination frame plate 22 is opened on the lower end surface of the mounting frame 15.

[0028] When the waste liquid enters the recovery box 1 through the liquid inlet pipe 12, the harmful gas volatilized by the waste liquid will be discharged outwardly through the multiple ventilation holes 10 and the air outlet 13 by the exhaust fan 14, and the harmful gas enters the installation frame 15 through the air outlet 13. At this time, under the action of the exhaust fan 14, the harmful gas is blown to the activated carbon filter plate 23. After passing through the activated carbon filter plate 23, the harmful gas will be filtered and the harmful substances in the gas will be adsorbed by the activated carbon components therein, so that the harmful gas is converted into harmless gas after passing through the activated carbon filter plate 23 and discharged to the outside, thereby avoiding the harmful gas generated by the volatilization of the waste liquid from spreading to the outside without treatment to pollute the working environment and endanger the health of the staff. When the screen plate 23 is replaced, the self-locking motor 16 is started to drive the transmission rod 18 to rotate at its output end, so that the two No. 1 gears 19 respectively drive the two No. 2 gears 20 to rotate synchronously, so that the two threaded rods 21 move the combined frame plate 22 downward in the installation frame 15 under the rotation of the No. 2 gear 20. When the activated carbon filter screen plate 23 descends out of the installation frame 15, the staff separates the activated carbon filter screen plate 23 from the combined frame plate 22 by removing the multiple connecting blocks 24. At this time, the new activated carbon filter screen plate 23 is replaced and installed on the combined frame plate 22 through the multiple connecting blocks 24 to continue filtering and removing harmful gases, thereby extending the life of filtering and removing harmful gases in the installation frame 15, which is more practical.

[0029] Furthermore, a servo motor 2 is fixedly installed on the upper end surface of the recycling box 1, a rotating rod 3 is fixedly connected to the output end of the servo motor 2, and a plurality of stirring blades 4 are symmetrically fixedly connected to the lower end of the rotating rod 3, a taking port is opened on the side wall of the recycling box 1, a door panel 6 is hingedly connected to the taking port, a placement plate 8 is fixedly connected to the inner wall of the recycling box 1, a liquid inlet hole 9 is opened on the upper end surface of the placement plate 8, a first filter frame plate 11 is arranged in the liquid inlet hole 9, the first filter frame plate 11 overlaps the upper end surface of the placement plate 8, a drain port is opened in the recycling box 1, a drain valve pipe 5 is fixedly installed in the drain port, a frame groove is opened on the side wall of the recycling box 1, a recycling frame 7 is placed in the frame groove, the frame groove and the drain port are connected to each other, and a second filter frame plate is fixedly installed in the recycling frame 7.

[0030] When the waste liquid enters the recovery box 1, it will first pass through the liquid inlet hole 9. The first filter frame plate 11 in the liquid inlet hole 9 will filter the waste liquid for the first time. Then, the servo motor 2 is started so that its output end drives the rotating rod 3, so that multiple stirring blades 4 stir the waste liquid in the recovery box 1. Then, reagents are added to the recovery box 1 to accelerate the reaction and separation of harmful substances in the waste liquid. After the reaction is completed, the drain valve pipe 5 is opened to allow the waste liquid to enter the frame tank through the drain port. The harmful substances in the reaction of the waste liquid will be filtered by the second filter frame plate, and the rest of the waste liquid will enter the recovery frame 7 to wait for the staff to perform subsequent treatment on the filtered waste liquid.

[0031] Furthermore, a through hole matching the rotating rod 3 is opened at the center of the placement plate 8, and the rotating rod 3 is slidably connected to the inner wall of the through hole.

[0032] By providing a through hole and making the rotating rod 3 slidably connected to the inner wall of the through hole, the rotating rod 3 can rotate and slide in the inner wall of the through hole;

[0033] Furthermore, the upper ends of the side walls of the combined frame plate 22 are both protrusions, and the protrusions are slidably connected to the inner wall of the installation frame 15 .

[0034] By setting the upper ends of the side walls of the combined frame plate 22 as raised parts, when the combined frame plate 22 moves downward in the installation frame 15 under the rotation of the threaded rods 21, the raised parts on both sides will abut against the inner wall of the installation frame 15 when the combined frame plate 22 drops to the lowest height, thereby preventing the combined frame plate 22 from continuing to drop and detaching from the two threaded rods 21 and falling to the ground;

[0035] Furthermore, the lower plate hole 25 is a long rectangular hole, the combined frame plate 22 is a hollow rectangular frame plate, and handles are fixedly installed on the side walls of the door plate 6 and the recovery frame 7.

[0036] By providing a handle, the staff can use the handle to open the door panel 6 or pull the recovery frame 7 out of the frame slot;

[0037] Furthermore, one end of the transmission rod 18 facing away from the self-locking motor 16 is rotatably connected to the inner wall of the transmission cavity 17 .

[0038] By making the end of the transmission rod 18 away from the self-locking motor 16 rotatably connected to the inner wall of the transmission chamber 17, the end of the transmission rod 18 away from the self-locking motor 16 can rotate on the inner wall of the transmission chamber 17;

[0039] Further, the manufacturer of the self-locking motor 16 is Shenzhen Lisan Electromechanical Co., Ltd., and the model is LS60A30;

[0040] Furthermore, the drain valve tube 5 has been fully disclosed in publication number: CN220034183U and will not be described in detail here.

[0041] The working principle of the utility model is as follows: when the waste liquid enters the recovery box 1 through the liquid inlet pipe 12, the harmful gas volatilized by the waste liquid will be discharged outward through the multiple ventilation holes 10 and the air outlet 13 by the exhaust fan 14, and the harmful gas will enter the installation frame 15 through the air outlet 13. At this time, under the action of the exhaust fan 14, the harmful gas is blown to the activated carbon filter plate 23. After passing through the activated carbon filter plate 23, the harmful gas will be filtered and the harmful substances in the gas will be adsorbed by the activated carbon component therein, so that the harmful gas is converted into harmless gas after passing through the activated carbon filter plate 23 and discharged to the outside, thereby avoiding the harmful gas generated by the volatilization of the waste liquid from being spread to the outside without treatment to pollute the working environment and endanger the health of the staff;

[0042] Compared with the prior art, ventilation holes 10, air outlets 13, exhaust fans 14, mounting frames 15, combined frame panels 22, activated carbon filter panels 23, and connecting blocks 24 are provided. When waste liquid enters the recovery box 1 and emits harmful gas, the exhaust fan 14 is started to discharge the harmful gas in the recovery box 1 through the multiple ventilation holes 10 and the air outlets 13 into the mounting frame 15. The harmful gas is blown toward the activated carbon filter panel 23 provided in the combined frame panel 22 by the exhaust fan 14. The activated carbon component of the activated carbon filter panel 23 can adsorb harmful substances in the harmful gas, so that the harmful gas is converted into harmless gas after passing through the activated carbon filter panel 23 and discharged to the outside, thereby preventing the harmful gas generated by the volatilization of the waste liquid from spreading to the outside without treatment to pollute the working environment and endanger the health of the staff.

[0043] The above is only a specific implementation of the utility model, but the protection scope of the utility model is not limited thereto. Any technician familiar with the technical field can easily think of various equivalent modifications or replacements within the technical scope disclosed by the utility model, and these modifications or replacements should be included in the protection scope of the utility model. Therefore, the protection scope of the utility model should be based on the protection scope of the claims.

Claims

1. A waste liquid treatment device for semiconductor wet etching, comprising a recovery box (1) and a mounting frame (15), characterized in that: The installation frame (15) is fixedly installed on the side wall of the recycling box (1); a placement plate (8) is arranged in the recycling box (1); a plurality of ventilation holes (10) are provided on the upper end surface of the placement plate (8); an air outlet (13) is provided on the side wall of the recycling box (1); an exhaust fan (14) is fixedly installed in the air outlet (13); a self-locking motor (16) is fixedly installed on the side wall of the installation frame (15); a transmission cavity (17) is provided in the installation frame (15); an output end of the self-locking motor (16) is fixedly connected to a transmission rod (18); a transmission rod (18) is fixedly installed on the transmission rod (18); Two first gears (19) are fixedly sleeved, and the two first gears (19) are meshedly connected with a second gear (20). The centers of the two second gears (20) are fixedly connected with threaded rods (21). The two threaded rods (21) are commonly threadedly sleeved with a combination frame plate (22). An activated carbon filter plate (23) is arranged inside the combination frame plate (22). The activated carbon filter plate (23) is fixedly connected to the side wall of the combination frame plate (22) through a plurality of connection blocks (24). The lower end surface of the installation frame (15) is provided with a lower plate hole (25) matching the combination frame plate (22).

2. The waste liquid treatment equipment for semiconductor wet etching according to claim 1, characterized in that: A servo motor (2) is fixedly mounted on the upper end surface of the recovery box (1); a rotating rod (3) is fixedly connected to the output end of the servo motor (2); a plurality of stirring blades (4) are symmetrically fixedly connected to the lower end of the rotating rod (3); a taking port is provided on the side wall of the recovery box (1); a door panel (6) is hingedly connected to the taking port; the placement plate (8) is fixedly connected to the inner wall of the recovery box (1); a liquid inlet hole (9) is provided on the upper end surface of the placement plate (8); a first filter frame plate (11) is arranged in the liquid inlet hole (9); the first filter frame plate (11) overlaps the upper end surface of the placement plate (8); a liquid discharge port is provided in the recovery box (1); a liquid discharge valve pipe (5) is fixedly mounted in the liquid discharge port; a frame groove is provided on the side wall of the recovery box (1); a recovery frame (7) is placed in the frame groove; the frame groove and the liquid discharge port are communicated with each other; a second filter frame plate is fixedly mounted in the recovery frame (7).

3. The waste liquid treatment equipment for semiconductor wet etching according to claim 2, characterized in that: A through hole matching the rotating rod (3) is provided at the center of the placement plate (8), and the rotating rod (3) is slidably connected to the inner wall of the through hole.

4. The waste liquid treatment equipment for semiconductor wet etching according to claim 1, characterized in that: The upper ends of the side walls on both sides of the combined frame plate (22) are both protrusions, and the protrusions are slidably connected to the inner wall of the installation frame (15).

5. The waste liquid treatment equipment for semiconductor wet etching according to claim 2, characterized in that: The lower plate hole (25) is a long rectangular hole, the combined frame plate (22) is a hollow rectangular frame plate, and handles are fixedly mounted on the side walls of the door plate (6) and the recovery frame (7).

6. The waste liquid treatment equipment for semiconductor wet etching according to claim 1, characterized in that: One end of the transmission rod (18) facing away from the self-locking motor (16) is rotatably connected to the inner wall of the transmission chamber (17).

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