Sample deposition table lifting structure of MPCVD chemical vapor deposition equipment

Abstract

The utility model discloses a sample deposition table lifting structure of MPCVD (micro plasma chemical vapor deposition) equipment, which comprises a support frame, sliding rails are fixed on two sides above the support frame, sliding blocks are sleeved on the outer sides of the sliding rails, hydraulic cylinders are mounted on two sides above the support frame, hydraulic rods are mounted above the hydraulic cylinders, and the hydraulic rods are fixed on the support frame. A connecting disc is fixed to the outer side of the hydraulic rod, and a guide rod is fixed to one side of the connecting disc. According to the sample deposition table lifting structure of the MPCVD equipment, the hydraulic rod, the connecting disc, the guide rod and the limiting sleeve are used in cooperation, the guide rod is installed on one side of the hydraulic rod through the connecting disc in the using process of the sample deposition table lifting structure, and the guide rod can ascend and descend in the limiting sleeve; the guide rod provides a clear and stable path for the lifting motion of the lifting table, and in the lifting process, the lifting table moves along the guide rod, so that the lifting table is effectively prevented from deviating from the preset path, and the stability and accuracy of the lifting motion are ensured.

Description

Technical Field

[0001] The utility model relates to the technical field related to lifting mechanisms, in particular to a lifting structure for a sample deposition platform of an MPCVD chemical vapor deposition device. Background Art

[0002] Chemical vapor deposition equipment is an important technology for preparing high-quality diamond films and other materials. In this equipment, the sample deposition table is a key component used to support and position the sample to be deposited. The lifting structure of the deposition table is responsible for accurately adjusting the distance between the sample and the plasma source to optimize the deposition process. The deposition table usually has a lifting function that can accurately adjust the distance between the sample and the plasma source. This function is crucial to optimizing the deposition process because changes in distance will directly affect the plasma density, temperature and composition distribution, thereby affecting the deposition rate, crystal structure and material properties.

[0003] In the existing sample deposition table lifting structure of the chemical vapor deposition equipment, there is no guiding mechanism for the deposition table, which is easy to deviate from the predetermined path, resulting in a lack of accuracy during the lifting process. Therefore, it is necessary to propose a sample deposition table lifting structure of the MPCVD chemical vapor deposition equipment. Utility Model Content

[0004] The purpose of the utility model is to provide a sample deposition table lifting structure of an MPCVD chemical vapor deposition device to solve the problems raised in the above-mentioned background technology.

[0005] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a lifting structure of a sample deposition table of an MPCVD chemical vapor deposition device, comprising a support frame, slide rails are fixed on both sides of the upper part of the support frame, and sliders are sleeved on the outer sides of the slide rails. Hydraulic cylinders are installed on both sides of the upper part of the support frame, and a hydraulic rod is installed above the hydraulic cylinder. A connecting plate is fixed to the outer side of the hydraulic rod, a guide rod is fixed on one side of the connecting plate, and a limit sleeve is sleeved on one side of the upper part of the guide rod. A lifting platform is fixed above the hydraulic rod, and an insulating substrate is fixed above the lifting platform.

[0006] Preferably, the lifting platform forms a sliding structure through a slider and a slide rail, and the slide rail is arranged in an "I"-shaped structure.

[0007] Preferably, the lifting platform forms a lifting structure through a hydraulic rod and a hydraulic cylinder, and the hydraulic cylinder is symmetrically arranged with respect to the central axis of the support frame.

[0008] Preferably, the outer diameter of the guide rod matches the inner diameter of the limiting sleeve, and the connecting plate and the guide rod are connected by welding.

[0009] Preferably, the insulating substrate is made of aluminum oxide material, and the lower side of the insulating substrate is in contact with the upper side of the lifting platform.

[0010] Preferably, a fixing plate is installed above the insulating substrate, bolts penetrate both sides of the fixing plate, and a sample slot is opened above the fixing plate.

[0011] Preferably, the fixing plate is threadedly connected to the insulating substrate via bolts, and the bolts are symmetrically arranged with respect to the central axis of the fixing plate.

[0012] Compared with the prior art, the beneficial effects of the utility model are:

[0013] 1. A lifting structure of a sample deposition platform of an MPCVD chemical vapor deposition device, through the coordinated use of a hydraulic rod, a connecting plate, a guide rod and a limit sleeve, during the use of the device, the guide rod is installed to one side of the hydraulic rod through the connecting plate, and the guide rod can be lifted and lowered in the limit sleeve, and the guide rod provides a clear and stable path for the lifting and lowering movement of the lifting platform. During the lifting and lowering process, the lifting platform moves along the guide rod, effectively preventing the predetermined path from being deviated, and ensuring the stability and accuracy of the lifting and lowering movement;

[0014] 2. A sample deposition platform lifting structure of an MPCVD chemical vapor deposition device, through the arrangement of a lifting platform and an insulating substrate, during the use of the device, the insulating substrate is fixed above the lifting platform, and the material of the insulating substrate is alumina, which provides good insulation performance. During the chemical vapor deposition process, if the lifting platform is conductive, the device may be damaged due to charge accumulation or current leakage. The use of the insulating substrate can effectively avoid such electrical safety problems and improve the stability of the chemical vapor deposition device;

[0015] 3. The sample deposition table lifting structure of the MPCVD chemical vapor deposition equipment is provided with an insulating substrate, a fixing plate and bolts. During the use of the device, the fixing plate is fixed above the insulating substrate by bolts, and the sample is placed in the sample groove on the fixing plate to ensure that the sample can be stably fixed on the lifting table, so that the sample remains fixed during the chemical vapor deposition lifting process, thereby realizing precise chemical vapor deposition operation. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic diagram of the overall structure of the utility model;

[0017] Figure 2 This is a schematic diagram of the structure of the lifting platform of the utility model;

[0018] Figure 3 This is a schematic diagram of the guide rod structure of the utility model;

[0019] Figure 4 This is a schematic diagram of the fixed plate structure of the utility model.

[0020] In the figure: 1. support frame; 2. slide rail; 3. slide block; 4. hydraulic cylinder; 5. hydraulic rod; 6. connecting plate; 7. guide rod; 8. limit sleeve; 9. lifting platform; 10. insulating substrate; 11. fixing plate; 12. bolt; 13. sample slot. DETAILED DESCRIPTION

[0021] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0022] See also Figure 1-3 The utility model provides a technical solution: a lifting structure of a sample deposition platform of an MPCVD chemical vapor deposition equipment, comprising a support frame 1, slide rails 2 are fixed on both sides of the upper part of the support frame 1, and a slider 3 is sleeved on the outer side of the slide rail 2. Hydraulic cylinders 4 are installed on both sides of the upper part of the support frame 1, and a hydraulic rod 5 is installed above the hydraulic cylinder 4. A connecting plate 6 is fixed on the outer side of the hydraulic rod 5, and a guide rod 7 is fixed on one side of the connecting plate 6. The outer diameter of the guide rod 7 coincides with the inner diameter of the limit sleeve 8. The connecting plate 6 and the guide rod 7 are welded and connected. The guide rod 7 can provide a guiding effect for the lifting platform 9. A limit sleeve 8 is sleeved on one side of the upper part of the guide rod 7. A lifting platform 9 is fixed above the hydraulic rod 5. The lifting platform 9 forms a lifting structure through the hydraulic rod 5 and the hydraulic cylinder 4. The hydraulic cylinder 4 is symmetrically arranged with the central axis of the support frame 1, and the lifting platform 9 can be automatically lifted and lowered. The lifting platform 9 forms a sliding structure with the slide rail 2 through the slider 3, and the slide rail 2 is an "I"-shaped structure, which makes the lifting of the lifting platform 9 more stable.

[0023] See also Figure 1 and Figure 4 An insulating substrate 10 is fixed on the top of the lifting platform 9. The insulating substrate 10 is made of alumina material. The bottom of the insulating substrate 10 is in contact with the top of the lifting platform 9. The material of the insulating substrate 10 is alumina, which provides good insulation performance. A fixing plate 11 is installed on the top of the insulating substrate 10. The fixing plate 11 is threadedly connected to the insulating substrate 10 through bolts 12. The bolts 12 are symmetrically arranged with respect to the central axis of the fixing plate 11. The fixing plate 11 is fixed to the insulating substrate 10 through the bolts 12. Bolts 12 penetrate both sides of the top of the fixing plate 11. A sample slot 13 is opened above the fixing plate 11.

[0024] Working principle: When using the sample deposition platform lifting structure of the MPCVD chemical vapor deposition equipment, first turn on the external power supply. An insulating substrate 10 is fixed on the top of the lifting platform 9. The material of the insulating substrate 10 is alumina. Alumina provides good insulation performance to prevent the lifting platform 9 from being conductive during the chemical vapor deposition process. Then put the sample into the sample slot 13 on the fixed plate 11 so that the sample remains fixed during the lifting process of the chemical vapor deposition. Then turn on the switch of the hydraulic cylinder 4 so that the hydraulic rod 5 drives the lifting platform 9 to move up and down. The guide rod 7 on one side of the hydraulic rod 5 moves up and down in the limit sleeve 8. The guide rod 7 provides a clear and stable path for the lifting movement of the lifting platform 9. Cut off the external power supply of the device when not in use. The model of the hydraulic cylinder 4 is MOB50. In this way, the use process of the sample deposition platform lifting structure of the MPCVD chemical vapor deposition equipment is completed.

[0025] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A sample deposition platform lifting structure of an MPCVD chemical vapor deposition device, comprising a support frame (1), characterized in that: Slide rails (2) are fixed on both sides of the upper part of the support frame (1), and sliding blocks (3) are sleeved on the outer sides of the slide rails (2). Hydraulic cylinders (4) are installed on both sides of the upper part of the support frame (1), and a hydraulic rod (5) is installed above the hydraulic cylinder (4). A connecting plate (6) is fixed on the outer side of the hydraulic rod (5), and a guide rod (7) is fixed on one side of the connecting plate (6). A limiting sleeve (8) is sleeved on one side of the upper part of the guide rod (7). A lifting platform (9) is fixed above the hydraulic rod (5), and an insulating substrate (10) is fixed above the lifting platform (9).

2. The sample deposition platform lifting structure of the MPCVD chemical vapor deposition equipment according to claim 1, characterized in that: The lifting platform (9) forms a sliding structure through a sliding block (3) and a sliding rail (2), and the sliding rail (2) is arranged in an "I"-shaped structure.

3. The sample deposition stage lifting structure of the MPCVD chemical vapor deposition equipment according to claim 1, characterized in that: The lifting platform (9) forms a lifting structure through a hydraulic rod (5) and a hydraulic cylinder (4), and the hydraulic cylinder (4) is symmetrically arranged with respect to the central axis of the support frame (1).

4. The sample deposition stage lifting structure of the MPCVD chemical vapor deposition equipment according to claim 1, characterized in that: The outer diameter of the guide rod (7) matches the inner diameter of the limiting sleeve (8), and the connecting plate (6) and the guide rod (7) are connected by welding.

5. The sample deposition stage lifting structure of the MPCVD chemical vapor deposition equipment according to claim 1, characterized in that: The insulating substrate (10) is made of an aluminum oxide material, and the bottom of the insulating substrate (10) is in contact with the top of the lifting platform (9).

6. The sample deposition stage lifting structure of the MPCVD chemical vapor deposition equipment according to claim 1, characterized in that: A fixing plate (11) is installed above the insulating substrate (10), bolts (12) penetrate through both sides of the fixing plate (11), and a sample slot (13) is provided above the fixing plate (11).

7. The sample deposition stage lifting structure of the MPCVD chemical vapor deposition equipment according to claim 6, characterized in that: The fixing plate (11) is threadedly connected to the insulating substrate (10) via bolts (12), and the bolts (12) are symmetrically arranged with respect to the central axis of the fixing plate (11).

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