Epitaxial furnace bearing disc positioning device

Abstract

The utility model discloses an epitaxial furnace bearing plate positioning device which comprises a handle, a first positioning part and a second positioning part, the first positioning part is located below the second positioning part, the first positioning part is used for being matched with a rotating base of an epitaxial furnace in a contact mode, and the second positioning part is used for being matched with a substrate bearing plate in a contact mode. When the first positioning part is in contact positioning with the rotary base of the epitaxial furnace, the substrate bearing disc is shifted to be in contact with the second positioning part for positioning, so that the substrate bearing disc is coaxial with the rotary base of the epitaxial furnace. The rotary base of the epitaxial furnace is used as an assistance to ensure that the liner bearing disc is shifted to a correct position, so that the probability of poor quality of the silicon carbide epitaxial wafer caused by human factors is reduced.

Description

Technical Field

[0001] The utility model relates to the field of semiconductors, in particular to a positioning device for a carrier plate of an epitaxial furnace. Background Art

[0002] Silicon carbide epitaxial growth has been commercialized, and CVD (chemical vapor deposition) is usually used to grow silicon carbide epitaxial wafers. Currently, most commercial epitaxial furnaces are horizontal reactor epitaxial furnaces, and a small number are vertical reactor epitaxial furnaces. During the use of epitaxial furnaces for silicon carbide epitaxial growth, the quality of silicon carbide epitaxial wafers is often poor because the personnel fail to move the carrier plate for the silicon carbide wafer to the correct position. Utility Model Content

[0003] In view of the deficiencies in the prior art, the utility model provides an epitaxial furnace carrier plate positioning device, which mainly solves the problem of reducing the probability of poor quality of silicon carbide epitaxial wafers caused by human factors.

[0004] In order to achieve the above object, the utility model is realized by the following technical solutions:

[0005] The epitaxial furnace carrier positioning device includes a handle, a first positioning portion, and a second positioning portion. The first positioning portion is located below the second positioning portion. The first positioning portion is used to contact and match with the rotating base of the epitaxial furnace. The second positioning portion is used to contact and match with the substrate carrier. While the first positioning portion is in contact and positioning with the rotating base of the epitaxial furnace, the substrate carrier is moved to contact with the second positioning portion for positioning, thereby achieving coaxiality between the substrate carrier and the rotating base of the epitaxial furnace.

[0006] Furthermore, the first positioning portion and the second positioning portion are both arc-shaped, and the center of the circle where the first positioning portion is located and the center of the circle where the second positioning portion is located are located on the same vertical line.

[0007] Furthermore, the first positioning portion includes a plurality of first positioning protrusions for contacting the outer peripheral surface of the rotating base of the epitaxial furnace, and each of the first positioning protrusions is located on the same arc line.

[0008] Furthermore, the second positioning portion includes a plurality of second positioning protrusions for contacting the outer peripheral surface of the substrate carrier plate, and each second positioning protrusion is located on the same arc line.

[0009] Furthermore, it also includes a third positioning portion connected to the top of the second positioning portion, and the third positioning portion is used to contact and match with the cover ring to assist in positioning the cover ring.

[0010] Furthermore, the height of the third positioning portion is 4 mm to 6 mm.

[0011] Furthermore, the third positioning portion includes at least two positioning protrusions.

[0012] Furthermore, the third positioning portion is arc-shaped, and the center of the circle where the third positioning portion is located and the center of the circle where the second positioning portion is located are located on the same vertical line.

[0013] The utility model has the following beneficial effects:

[0014] The epitaxial furnace carrier plate positioning device includes a first positioning part and a second positioning part. With the assistance of the rotating base of the epitaxial furnace, the first positioning part is contacted and positioned with the rotating base, and then the substrate carrier plate is moved to contact and position with the second positioning part, thereby ensuring that the pad carrier plate is moved to the correct position and reducing the probability of poor quality of silicon carbide epitaxial wafers caused by human factors. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a perspective schematic diagram of the epitaxial furnace carrier plate positioning device according to an embodiment of the utility model;

[0016] Figure 2 yes Figure 1 A top view of a positioning device for a carrier plate of an epitaxial furnace;

[0017] Figure 3 yes Figure 1 Front view of the epitaxial furnace carrier plate positioning device. DETAILED DESCRIPTION

[0018] The utility model is further described below in conjunction with the accompanying drawings and embodiments.

[0019] In the description of the present invention, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and therefore should not be understood as a limitation on the present invention.

[0020] like Figures 1 to 3 As shown, the positioning device for the epitaxial furnace liner carrier plate includes a handle 1, a first positioning portion 2, and a second positioning portion 3. The first positioning portion 2 is located below the second positioning portion 3. The first positioning portion 2 is used for contacting and matching with the rotating base of the epitaxial furnace, and the second positioning portion 3 is used for contacting and matching with the substrate carrier plate. When the first positioning portion 2 is in contact and positioning with the rotating base of the epitaxial furnace, the substrate carrier plate is moved to contact with the second positioning portion 3 for positioning, thereby achieving coaxiality between the substrate carrier plate and the rotating base of the epitaxial furnace.

[0021] A driving device can be provided on the epitaxial furnace equipment, and the handle 1 is connected to the driving device. The driving device automatically drives the first positioning part 2 to contact the rotating base, and then the substrate carrier is moved by the manipulator, and the substrate carrier contacts the second positioning part 3 to achieve positioning. The driving device and the manipulator can be controlled by the control system of the epitaxial furnace equipment to achieve automation. The handle 1 can also be held and the substrate carrier can be manually moved by a lever.

[0022] Preferably, the first positioning portion 2 and the second positioning portion 3 are both arc-shaped, and the center of the circle where the first positioning portion 2 is located and the center of the circle where the second positioning portion 3 is located are located on the same vertical line. That is to say, from a top view, Figure 2 The circle where the first positioning part 2 is located and the circle where the second positioning part 3 is located are concentric circles, and the radius of the concentric circles can be adjusted according to the size of different wafers. The first positioning part 2 is connected to the second positioning part 3 through a plurality of ribs 4.

[0023] The shapes of the first positioning portion 2 and the second positioning portion 3 are not limited to arc shapes. For example, the first positioning portion 2 includes a plurality of first positioning protrusions 5 for contacting the outer peripheral surface of the rotating base of the epitaxial furnace, and each first positioning protrusion 5 is located on the same arc line. The second positioning portion 3 includes a plurality of second positioning protrusions 5 for contacting the outer peripheral surface of the substrate carrier disk, and each second positioning protrusion 5 is located on the same arc line.

[0024] It also includes a third positioning portion connected to the top of the second positioning portion 3, and the third positioning portion is used to contact and match with the cover ring to assist in positioning the cover ring. Since the thickness of the cover ring increases due to attachments after use, the height of the third positioning portion is preferably 4mm to 6mm. The third positioning portion can include at least two positioning protrusions 5 as shown in the figure, and the two positioning protrusions 5 assist in positioning the cover ring by contacting with the cover ring. The third positioning portion can also adopt other structural forms, such as arc-shaped, and the center of the circle where the third positioning portion is located is on the same vertical line as the circle where the second positioning portion 3 is located.

[0025] The epitaxial furnace liner carrier plate positioning device described in this embodiment is manufactured in one piece, has a simple structure and low cost, and through its auxiliary positioning, the small carrier plate of the epitaxial furnace carrying the silicon carbide wafer is positioned in a reasonable area, reducing the probability of poor quality of silicon carbide epitaxial wafers caused by human factors.

[0026] As described above, the embodiments are only used to illustrate the technical solutions of the utility model, rather than to limit it. Although the utility model has been described in detail with reference to the aforementioned embodiments, ordinary technicians in the field should understand that they can still modify the technical solutions recorded in the aforementioned embodiments, or replace some of the technical features therein with equivalents. These modifications or replacements do not make the corresponding technical solutions deviate from the spirit and scope of the technical solutions of the embodiments of the utility model. Therefore, all other embodiments obtained by ordinary technicians in the field without making creative work belong to the protection scope of the utility model.

Claims

1. An epitaxial furnace carrier plate positioning device, characterized in that: It includes a handle, a first positioning part, and a second positioning part. The first positioning part is located below the second positioning part. The first positioning part is used to contact and match with the rotating base of the epitaxial furnace. The second positioning part is used to contact and match with the substrate carrier. When the first positioning part contacts and positions the rotating base of the epitaxial furnace, the substrate carrier is moved to contact and position with the second positioning part, thereby achieving coaxiality between the substrate carrier and the rotating base of the epitaxial furnace.

2. The epitaxial furnace carrier plate positioning device according to claim 1, characterized in that: The first positioning portion and the second positioning portion are both arc-shaped, and the center of the circle where the first positioning portion is located and the center of the circle where the second positioning portion is located are located on the same vertical line.

3. The epitaxial furnace carrier plate positioning device according to claim 1, characterized in that: The first positioning portion includes a plurality of first positioning protrusions for contacting the outer peripheral surface of the rotating base of the epitaxial furnace, and each of the first positioning protrusions is located on the same arc line.

4. The epitaxial furnace carrier plate positioning device according to claim 1, characterized in that: The second positioning portion includes a plurality of second positioning protrusions for contacting the outer peripheral surface of the substrate carrier plate, and each second positioning protrusion is located on the same arc line.

5. The epitaxial furnace carrier plate positioning device according to claim 1, characterized in that: It also includes a third positioning portion connected to the top of the second positioning portion, and the third positioning portion is used to contact and match with the cover ring to assist in positioning the cover ring.

6. The epitaxial furnace carrier plate positioning device according to claim 5, characterized in that: The height of the third positioning portion is 4 mm to 6 mm.

7. The epitaxial furnace carrier plate positioning device according to claim 5, characterized in that: The third positioning portion includes at least two positioning protrusions.

8. The epitaxial furnace carrier plate positioning device according to claim 5, characterized in that: The third positioning portion is arc-shaped, and the center of the circle where the third positioning portion is located and the center of the circle where the second positioning portion is located are located on the same vertical line.

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