Tray structure for silicon carbide epitaxial equipment
By designing a tray structure for silicon carbide epitaxial equipment, and utilizing the combined spherical and flat designs of screws and grooves, the effect of quickly adjusting the level of the graphite wafer carrier is achieved, which solves the difficulty of level adjustment in the existing technology. problems and improve the process yield.
Patent Information
- Application Number
- CN202421152609.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-05-24
- Publication Date
- 2025-01-14
- Estimated Expiration
- 2034-05-24
AI Technical Summary
In existing silicon carbide epitaxial equipment, the horizontal accuracy requirements of graphite wafer carrier disks are getting higher and higher, resulting in the difficulty of quickly adjusting the horizontality and affecting the process yield.
Design a tray structure. Three screw holes are provided on the air-floating tray, distributed at the vertices of the triangle. The first screw and the second screw are threadedly connected in the screw holes. Corresponding grooves are provided on the lower surface of the wafer carrier. The screws and the concave The groove design is a combination of spherical and flat surfaces, allowing rapid rotation to adjust the level of the wafer carrier.
By rotating the first screw and the second screw, the level of the wafer carrier can be quickly and accurately adjusted, improving the yield of the silicon carbide epitaxial process and reducing the difficulty of on-site processing.
Smart Images

Figure CN222355111U_ABST