Polishing solution cooling crystallization device

Abstract

The utility model provides a polishing liquid cooling crystallization device which comprises a tank body and a cooling mechanism, the bottom of the tank body is connected with the cooling mechanism, the tank body and the cooling mechanism define a crystallization cavity, a liquid inlet and a liquid outlet are formed in the two ends of the tank body respectively, the liquid inlet and the liquid outlet are both communicated with the crystallization cavity, and the liquid outlet is provided with a filter element. The face, facing the groove body, of the cooling mechanism is connected with a baffle set, the baffle set comprises a plurality of baffles, the inner side wall of the groove body is connected with an isolation plate set, the isolation plate set comprises a plurality of isolation plates, and one isolation plate is arranged between every two adjacent baffles. The cooling mechanism is arranged, the influence of temperature on solubility is utilized, polishing liquid is evenly and fully cooled, polishing liquid crystals are separated out in the polishing liquid cooling and crystallizing device, the crystals are separated from the polishing liquid, the polishing liquid can be effectively prevented from being separated out and crystallized in a liquid barrel and a polishing machine table pipeline, and the polishing quality is improved. And the negative influence of scratches on the sapphire substrate is effectively reduced.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductors, in particular to a polishing liquid cooling and crystallization device. Background Art

[0002] The substrate material of LED chips is mainly sapphire substrate, and the surface of the substrate must have extremely high flatness and cleanliness, so the substrate needs to be polished. Currently, the most effective and commonly used polishing technology uses a combination of mechanical polishing and chemical reaction polishing.

[0003] Chemical reaction polishing requires the use of alkaline solutions to participate in chemical reactions. The most effective polishing liquid is aluminum oxide polishing liquid. However, when the polishing liquid polishes the sapphire substrate, the alkaline substances in it will react chemically with the surface of the sapphire substrate, causing the aluminum hydroxide polymer in the polishing liquid to increase. When it exceeds the solubility of the polishing liquid, polishing liquid crystals will precipitate. After a long period of accumulation, a large number of crystals will exist in the polishing machine pipeline and liquid barrel. During the polishing operation, the crystals are easy to fall off from the pipeline and liquid barrel, causing scratches on the surface of the sapphire substrate, affecting the yield of the sapphire substrate.

[0004] In the prior art, the main methods to prevent the polishing liquid from scratching the sapphire substrate are to regularly clean the machine and regularly replace the polishing machine pipeline. Regularly cleaning the machine mainly involves filtering the polishing liquid during the polishing operation, while regularly replacing the polishing machine pipeline is cumbersome and inefficient. The existing methods do not fundamentally improve the generation of crystals in the polishing machine pipeline and liquid barrel. Utility Model Content

[0005] In view of the deficiencies of the prior art, the purpose of the utility model is to provide a polishing liquid cooling crystallization device, aiming to solve the problem in the prior art that it is difficult to fundamentally improve the precipitation of polishing liquid crystals in the polishing machine pipeline and liquid barrel.

[0006] In order to achieve the above purpose, the utility model is implemented through the following technical solutions:

[0007] A polishing liquid cooling and crystallization device comprises a trough body and a cooling mechanism, wherein the bottom of the trough body is connected to the cooling mechanism and enclosed with the cooling mechanism to form a crystallization cavity, wherein the cooling mechanism is used to cool the polishing liquid in the crystallization cavity, wherein a liquid inlet and a liquid outlet are respectively arranged at both ends of the trough body, wherein the liquid inlet and the liquid outlet are both connected to the crystallization cavity, and a filter element is arranged at the liquid outlet, wherein the cooling mechanism is connected to a baffle group on one side facing the trough body, wherein the baffle group comprises a plurality of baffles, and wherein the baffles are used to block precipitated crystals, wherein an isolation plate group is connected to the inner side wall of the trough body, wherein the isolation plate group comprises a plurality of isolation plates, and an isolation plate is arranged between adjacent baffles to guide the polishing liquid to flow toward the cooling mechanism.

[0008] Compared with the prior art, the utility model has the following beneficial effects: by setting the cooling mechanism, the influence of temperature on solubility is utilized to uniformly and fully cool the polishing liquid, so that the polishing liquid crystals are precipitated in the polishing liquid cooling and crystallization device, and the crystals are blocked and filtered to separate the crystals from the polishing liquid. After the polishing liquid is collected in the reflux tank of the polishing machine, the polishing liquid is passed into the polishing liquid cooling and crystallization device, which can effectively prevent the polishing liquid from precipitating crystals in the liquid barrel and the polishing machine pipeline, extend the time interval for replacing the pipeline of the machine, and during the polishing operation, greatly reduce the risk of crystals falling off the machine, effectively reduce the negative impact of scratches on the sapphire substrate, by setting the filter element, impurities brought out of the polishing liquid from the machine can be filtered, and the crystals generated by cooling can be further filtered, by setting the baffle group and the isolation plate group, the precipitated crystals are blocked, the crystals are separated from the polishing liquid, and the flow path of the polishing liquid in the polishing liquid cooling and crystallization device is extended, effectively guiding the flow direction of the polishing liquid so that it is fully in contact with the cooling mechanism, and further improving the cooling crystallization effect.

[0009] Furthermore, the heights of the plurality of baffles gradually decrease along the direction from the liquid inlet to the liquid outlet.

[0010] Furthermore, the cooling mechanism comprises a copper plate, the bottom of the trough body is connected to the copper plate, a plurality of injection holes are arranged on the side wall of the copper plate, and the injection holes penetrate the copper plate.

[0011] Furthermore, injection tubes are provided at both ends of the injection hole, and a portion of the injection tube is placed in the injection hole so that external coolant passes through and is discharged from the injection hole.

[0012] Furthermore, two ends of the isolation plate are respectively connected to opposite side walls of the trough body, and one end of the isolation plate facing away from the cooling mechanism is at the same height as the top end of the trough body.

[0013] Furthermore, a plurality of positioning grooves are provided on a side of the copper plate facing the crystallization chamber, and the positioning grooves are used to connect the baffle.

[0014] Furthermore, a filtering area is provided at one end of the crystallization chamber facing the liquid outlet, and a filter screen is disassembled and connected in the filtering area.

[0015] Furthermore, the plurality of baffles and the plurality of isolation plates are parallel to each other. BRIEF DESCRIPTION OF THE DRAWINGS

[0016] Figure 1 It is a schematic structural diagram of the first perspective of the polishing liquid cooling crystallization device in the embodiment of the utility model;

[0017] Figure 2It is a schematic structural diagram of the second viewing angle of the polishing liquid cooling crystallization device in the embodiment of the utility model;

[0018] Figure 3 It is a schematic diagram of a partially disassembled structure of a polishing liquid cooling crystallization device in an embodiment of the utility model;

[0019] Figure 4 It is a third perspective structural schematic diagram of the polishing liquid cooling crystallization device in the embodiment of the utility model;

[0020] Figure 5 A schematic diagram of the flow direction of the polishing liquid in the polishing liquid cooling crystallization device in the embodiment of the utility model;

[0021] Description of main component symbols:

[0022] Tank 100 Liquid inlet 110 Liquid outlet 120 Filter Elements 121 Filter area 130 Baffle set 200 Bezel 210 Isolation board set 300 Isolation board 310 Cooling mechanism 400 Copper Plate 410 Filling hole 411 Injection tube 420

[0023] The following specific implementation manner will further illustrate the present utility model in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION

[0024] In order to facilitate the understanding of the present invention, the present invention will be described more fully below with reference to the relevant drawings. Several embodiments of the present invention are given in the drawings. However, the present invention can be implemented in many different forms and is not limited to the embodiments described herein. On the contrary, the purpose of providing these embodiments is to make the disclosure of the present invention more thorough and comprehensive.

[0025] It should be noted that when an element is referred to as being "fixed to" another element, it may be directly on the other element or there may be a central element. When an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are for illustrative purposes only.

[0026] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those commonly understood by those skilled in the art in the technical field of the present invention. The terms used herein in the specification of the present invention are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more related listed items.

[0027] See also Figures 1 to 5The polishing liquid cooling crystallization device in the embodiment of the utility model comprises a tank body 100 and a cooling mechanism 400. The bottom of the tank body 100 is connected to the cooling mechanism 400 and enclosed with the cooling mechanism 400 to form a crystallization chamber. The cooling mechanism 400 is used to cool the polishing liquid in the crystallization chamber. The two ends of the tank body 100 are respectively provided with a liquid inlet 110 and a liquid outlet 120. The liquid inlet 110 and the liquid outlet 120 are both connected to the crystallization chamber. The liquid outlet 120 is provided with a filter element 121. A filter area 130 is provided at one end of the crystallization chamber facing the liquid outlet 120. The filter screen is detachably connected in the filter area 130. The cooling mechanism 400 is connected to a baffle group 200 facing one side of the tank body 100. The baffle group 200 00 includes a plurality of baffles 210, and the baffles 210 are used to block the precipitated crystals. The height of the baffles 210 gradually decreases from the liquid inlet 110 to the liquid outlet 120. The inner wall of the tank body 100 is connected to an isolation plate group 300. The isolation plate group 300 includes a plurality of isolation plates 310. The two ends of the isolation plates 310 are respectively connected to the opposite side walls of the tank body 100. The end of the isolation plate 310 facing away from the cooling mechanism 400 is at the same height as the top of the tank body 100. An isolation plate 310 is arranged between adjacent baffles 210 to guide the polishing liquid to flow toward the cooling mechanism 400. The plurality of baffles 210 and the plurality of isolation plates 310 are parallel. Preferably, there is a certain distance between the bottom end of the isolation plate 310 and the cooling mechanism 400 so that the polishing liquid passes from under the isolation plate 310, and the filtering area 130 is located between the liquid outlet 120 and the baffle 210 closest to the liquid outlet 120. The filtering area 130 is disassembled and connected to a filter screen parallel to the baffle 210, and the top of the filter screen is flush with the top of the tank body 100. The bottom end of the filter screen is disassembled and connected to the cooling mechanism 400, and the opposite sides of the filter screen are respectively disassembled and connected to the opposite side walls of the tank body 100. After use, the polishing liquid is collected from the polishing machine to the polishing machine reflux tank, and the polishing liquid cooling and crystallization device is arranged between the polishing machine reflux tank and the polishing machine liquid barrel, that is, the polishing liquid will be processed by the polishing liquid cooling and crystallization device before entering the polishing machine liquid barrel, and the polishing machine liquid barrel is connected to the polishing machine pipeline to reuse the treated polishing liquid.

[0028] Understandably, see Figure 5The polishing liquid enters the polishing liquid cooling and crystallization device from the liquid inlet 110. The cooling mechanism 400 is in direct contact with the polishing liquid to conduct low temperature. The polishing liquid is affected by the low temperature at the bottom of the crystallization chamber, and its solubility changes, resulting in crystals precipitating. The polishing liquid contacts the first baffle 210, that is, the baffle 210 close to the liquid inlet 110. Since the height of the baffle 210 close to the liquid inlet 110 is higher, the blocking effect on the crystals is more obvious. More crystals will be deposited between the liquid inlet 110 and the first baffle 210. As the liquid level of the polishing liquid rises, the polishing liquid overflows the first baffle 210 and contacts the cooling mechanism 400 again to continue to precipitate crystals. Due to the effect of the isolation plate 310, the polishing liquid that has been cooled and crystallized passes through the bottom of the isolation plate 310. Afterwards, as the second baffle 210 overflows and passes over the second baffle 210, the cooperation of the baffle group 200 and the isolation plate group 300 increases the flow path of the polishing liquid in the polishing liquid cooling and crystallization device. The isolation plate 310 is arranged between two adjacent baffles 210, and can guide the polishing liquid to flow to the cooling mechanism 400 to prevent the newly entered polishing liquid from being unable to contact the cooling structure 400 after the liquid level of the polishing liquid between the adjacent baffles 210 increases. At the same time, it can also increase the flow time of the polishing liquid in the polishing liquid cooling and crystallization device. Since the bottom of the polishing liquid cooling and crystallization device is the cooling mechanism 400, the contact area between the polishing liquid and the cooling mechanism 400 is large, and the contact time is longer after the flow time is increased. Therefore, the cooling effect is good, and a large amount of aluminum hydroxide crystals can be precipitated.

[0029] Furthermore, if the polishing liquid cooling crystallization device works for a long time, the flow rate of the polishing liquid is large, and the crystals in the device are large, the filter element 210 in the liquid outlet 120 is at risk of being blocked by the crystals and impurities. Therefore, installing a filter in the filtration area 130 can reduce this risk and play a role of multi-stage filtration. The installation of the filter is more flexible and does not require precise installation, which is convenient for operators to maintain and replace.

[0030] The cooling mechanism 400 includes a copper plate 410, the bottom of the tank body 100 is connected to the copper plate 410, a plurality of positioning grooves are provided on the side of the copper plate 410 facing the crystallization chamber, the positioning grooves are used to connect the baffle 210, a plurality of injection holes 411 are provided on the side wall of the copper plate 410, the injection holes 411 penetrate the copper plate 410, injection tubes 420 are provided at both ends of the injection holes 411, and the injection tubes 420 are partially placed in the injection holes 411 so that the external coolant passes through and is discharged from the injection holes 411. Preferably, the baffle 210 is detachably connected to the copper plate 410, the injection tube 420 is provided with a sealing ring, the column liquid tube 420 is detachable, and the sealing ring is detachable. It can be understood that the copper plate 410 forms a sealed structure with the trough body 100, the copper plate 410 has good thermal conductivity and a large contact area with the polishing liquid, and the injection hole 411 directly provides a channel for the flow of coolant, so that the heat exchange efficiency of the cooling mechanism 400 is high and easy to maintain. According to the flow rate of the polishing liquid and the processing conditions of the polishing machine, the number of baffles 210 can be reduced or increased, and when maintaining the polishing liquid cooling crystallization device, the baffle group 200 is removed from the copper plate 410 to facilitate the cleaning of the crystals.

[0031] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic representation of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner.

[0032] The above-mentioned embodiments only express several implementation methods of the utility model, and the descriptions thereof are relatively specific and detailed, but they cannot be understood as limiting the scope of the patent of the utility model. It should be pointed out that, for ordinary technicians in this field, several variations and improvements can be made without departing from the concept of the utility model, and these all belong to the protection scope of the utility model. Therefore, the protection scope of the utility model patent shall be based on the attached claims.

Claims

1. A polishing liquid cooling crystallization device, characterized in that: It includes a trough body and a cooling mechanism, the bottom of the trough body is connected to the cooling mechanism, and the crystallization cavity is formed together with the cooling mechanism, the cooling mechanism is used to cool the polishing liquid in the crystallization cavity, the two ends of the trough body are respectively provided with a liquid inlet and a liquid outlet, the liquid inlet and the liquid outlet are both connected to the crystallization cavity, the liquid outlet is provided with a filter element, the cooling mechanism is connected to a baffle group facing the trough body, the baffle group includes a plurality of baffles, and the baffles are used to block the precipitated crystals, the inner side wall of the trough body is connected to an isolation plate group, the isolation plate group includes a plurality of isolation plates, and an isolation plate is arranged between adjacent baffles to guide the polishing liquid to flow toward the cooling mechanism.

2. The polishing liquid cooling crystallization device according to claim 1, characterized in that: The heights of the plurality of baffles gradually decrease in a direction from the liquid inlet to the liquid outlet.

3. The polishing liquid cooling crystallization device according to claim 1, characterized in that: The cooling mechanism comprises a copper plate, the bottom of the tank body is connected to the copper plate, a plurality of injection holes are arranged on the side wall of the copper plate, and the injection holes penetrate through the copper plate.

4. The polishing liquid cooling crystallization device according to claim 3 is characterized in that: Both ends of the injection hole are provided with injection tubes, and the injection tube is partially placed in the injection hole so that the external cooling liquid passes through and is discharged from the injection hole.

5. The polishing liquid cooling crystallization device according to claim 1, characterized in that: Two ends of the isolation plate are respectively connected to opposite side walls of the trough body, and one end of the isolation plate facing away from the cooling mechanism is at the same height as the top end of the trough body.

6. The polishing liquid cooling crystallization device according to claim 3, characterized in that: A plurality of positioning grooves are provided on one side of the copper plate facing the crystallization chamber, and the positioning grooves are used to connect the baffle.

7. The polishing liquid cooling crystallization device according to claim 1, characterized in that: A filtering area is arranged at one end of the crystallization chamber facing the liquid outlet, and a filter screen is disassembled and connected in the filtering area.

8. The polishing liquid cooling crystallization device according to claim 1, characterized in that: The plurality of baffles and the plurality of isolation plates are parallel to each other.

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