Distance measuring assembly of exposure equipment and exposure equipment
By designing the distance measuring components in the exposure equipment, high-precision distance measurement and adjustment between the mask plate and the silicon wafer is achieved, the problem of the silicon wafer being sucked up when the mask plate is raised is solved, and the production capacity and exposure quality are improved.
Patent Information
- Application Number
- CN202420377473.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-02-28
- Publication Date
- 2025-02-11
- Estimated Expiration
- 2034-02-28
AI Technical Summary
In the photovoltaic industry, the silicon wafer is easily absorbed when the mask plate is raised rapidly, causing the silicon wafer to move or break, which in turn affects production capacity and exposure quality.
A range-finding assembly of an exposure device is designed, and the distance-finding device is connected to the mounting part through a range-finding device to realize diffuse or specular reflection measurement method, accurately measure the distance between the mask plate and the silicon wafer, ensuring high-precision alignment.
By accurately measuring and adjusting the distance between the mask plate and the silicon wafer, the risk of the mask plate absorbing the silicon wafer during the lifting process is avoided, and the production capacity and exposure quality are improved.
Smart Images
Figure CN222460593U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of exposure equipment, in particular to a distance measuring component of exposure equipment and the exposure equipment. Background Art
[0002] With the continuous development of the photovoltaic industry, the production capacity requirements of the equipment are getting higher and higher. However, with the increase in production capacity, various problems also arise. In order to improve production capacity, after completing an exposure process, the mask plate needs to be lifted up quickly so that the silicon wafer can be safely removed. Because the mask plate is lifted too quickly, the mask plate will also suck up the silicon wafer adsorbed on the suction cup, which may cause the silicon wafer to move at the least or break at the worst.
[0003] In the related art, the production capacity is reduced by reducing the mask lifting speed to avoid adsorbing the silicon wafer together; or by increasing the exposure Gap value (i.e., the spacing value between the mask plate and the silicon wafer), the initial distance between the mask plate and the silicon wafer is increased to avoid adsorbing the silicon wafer together, sacrificing the exposure quality. Utility Model Content
[0004] The utility model aims to solve at least one of the technical problems existing in the prior art. To this end, the utility model proposes a distance measuring assembly of an exposure device, wherein a distance measuring instrument can move along a first connecting member relative to a first base plate along a first direction, thereby adjusting the position of the distance measuring instrument; and the distance measuring instrument is connected to a first mounting portion or a second mounting portion to realize a diffuse reflection measurement method or a specular reflection measurement method.
[0005] The utility model also provides an exposure device.
[0006] According to an embodiment of the utility model, the distance measuring component of the exposure equipment includes: a first base plate, the first base plate is arranged opposite to the mask plate; a plurality of mounting seats, the plurality of mounting seats are connected to the first base plate, the mounting seats include: a first connecting member and a second connecting member, the first connecting member is perpendicular to the second connecting member, the first connecting member is connected to the first base plate, and the first connecting member can move along a first direction relative to the first base plate, the second connecting member includes: a first mounting portion and a second mounting portion; a rangefinder, the rangefinder is connected to the first mounting portion or the second mounting portion; wherein, when the rangefinder is connected to the first mounting portion, the rangefinder adopts a diffuse reflection measurement method; when the rangefinder is connected to the second mounting portion, the rangefinder adopts a mirror reflection measurement method.
[0007] According to some embodiments of the utility model, the rangefinder can move along the first direction relative to the first base plate with the first connecting member, so as to adjust the position of the rangefinder; the rangefinder is connected to the first mounting portion or the second mounting portion to realize a diffuse reflection measurement method or a mirror reflection measurement method.
[0008] According to some embodiments of the present invention, there are at least two first mounting portions, and there are at least two second mounting portions, wherein an acute angle is formed between two of the first mounting portions and two of the second mounting portions.
[0009] According to some embodiments of the present utility model, a third mounting portion is provided on the rangefinder, and the third mounting portion is connected to the first mounting portion or the second mounting portion.
[0010] According to some embodiments of the utility model, the ranging component of the exposure device also includes: an adjusting member, which is clamped between the first connecting member and the first base plate, the adjusting member is slidably connected to the first base plate and can slide in a second direction relative to the first base plate, and the first connecting member is slidably connected to the adjusting member and can move in a first direction relative to the first base plate.
[0011] According to some embodiments of the utility model, the ranging component of the exposure device also includes: a first fastener, a first circular hole is arranged on the first base plate, a first waist hole is arranged on the adjusting member, the first waist hole extends along the second direction and corresponds to the first circular hole, the first fastener passes through the first waist hole and the first circular hole and is fixedly connected to the first base plate, and the first waist hole can move along the second direction relative to the first fastener.
[0012] According to some embodiments of the utility model, the ranging component of the exposure device also includes: a second fastener, a second circular hole is arranged on the adjusting member, a second waist hole is arranged on the first connecting member, the second waist hole extends along the first direction and corresponds to the second circular hole, the second fastener passes through the second waist hole and the second circular hole and is fixedly connected to the adjusting member, and the second waist hole can move along the first direction relative to the second fastener.
[0013] According to some embodiments of the utility model, the ranging assembly of the exposure equipment also includes: a vertical plate and a second base plate, the vertical plate extends on a vertical plane, the vertical plate is perpendicular to the first base plate and is fixedly connected to the first base plate, and the second base plate is parallel to the first base plate and is fixedly connected to the vertical plate.
[0014] According to some embodiments of the utility model, the second base plate is provided with a first part and a second part, the upper surface of the first part is higher than the second part in the height direction to form a step between the first part and the second part, and the lower end of the vertical plate is connected to the second part and abuts against the step.
[0015] According to some embodiments of the utility model, it also includes: a third fastener, a fourth mounting portion is arranged on the second portion, a fifth mounting portion is arranged on the vertical plate, and the third fastener passes through the fourth mounting portion and is fixedly connected to the fifth mounting portion.
[0016] According to the exposure equipment of the second aspect of the utility model, the exposure equipment includes: a placement platform for carrying a silicon wafer; an exposure device for exposing the silicon wafer; a mask plate; an alignment device for fixing the mask plate and driving the mask plate to move to align with the silicon wafer; and a distance measuring component of the exposure equipment for measuring the distance between the mask plate and the silicon wafer.
[0017] Additional aspects and advantages of the present invention will be given in part in the following description, and in part will become apparent from the following description, or will be learned through the practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] The above and / or additional aspects and advantages of the present invention will become apparent and easily understood from the description of the embodiments in conjunction with the following drawings, in which:
[0019] Figure 1 This is a schematic diagram of the connection of a mask plate and a distance measuring component in one direction according to an embodiment of the utility model;
[0020] Figure 2 is a schematic diagram of connection of the mask plate and the distance measuring component in another direction according to an embodiment of the utility model;
[0021] Figure 3 is a schematic diagram of the connection of the mask plate and the distance measuring component in another direction according to an embodiment of the utility model;
[0022] Figure 4 is an exploded view of a distance measuring component in one direction according to an embodiment of the utility model;
[0023] Figure 5 is an exploded view of the distance measuring component according to an embodiment of the utility model in another direction;
[0024] Figure 6 is a structural schematic diagram of a mounting base according to an embodiment of the utility model;
[0025] Figure 7 is a schematic diagram of the connection between the rangefinder and the first mounting portion according to an embodiment of the utility model;
[0026] Figure 8 is a schematic diagram of the connection between the rangefinder and the second mounting portion according to an embodiment of the utility model;
[0027] Fig. 9is an exploded view of a mounting base, an adjusting member and a rangefinder according to an embodiment of the utility model;
[0028] Fig.10 It is an exploded view of the mounting seat and the adjusting member according to the embodiment of the utility model.
[0029] Reference numerals:
[0030] 100. Distance measuring component;
[0031] 11. first bottom plate; 111. first round hole; 12. vertical plate; 121. fifth mounting portion; 13. second bottom plate; 131. first portion; 132. second portion; 133. step; 134. fourth mounting portion;
[0032] 20, mounting seat; 21, first connecting member; 211, second waist hole; 22, second connecting member; 221, first mounting portion; 222, second mounting portion;
[0033] 30. Distance meter; 31. Third mounting part;
[0034] 40. adjusting member; 41. first waist hole; 42. second round hole;
[0035] 200. Mask plate; 300. Placement platform. DETAILED DESCRIPTION
[0036] The embodiments of the present utility model are described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present utility model are described in detail below.
[0037] Reference below Figure 1-Figure 10 The distance measuring component 100 of the exposure device according to the embodiment of the utility model is described, and an exposure device having the distance measuring component 100 is also proposed.
[0038] Figure 1-Figure 10 The first direction is the length direction of the mask plate 200. Figure 1-Figure 10 The second direction in FIG. 5 is the width direction of the mask plate 200 .
[0039] like Figure 1-Figure 4 As shown, the distance measuring assembly 100 of the exposure device includes: a first base plate 11, a mounting seat 20 and a distance meter 30. The distance meter 30 is fixed on the first base plate 11 by connecting with the mounting seat 20, so that the distance meter 30 is fixedly installed.
[0040] The first base plate 11 is arranged opposite to the mask plate 200, the silicon wafer is arranged between the first base plate 11 and the mask plate 200, and the rangefinder 30 is installed on the first base plate 11 to measure the minimum distance between the mask plate 200 and the silicon wafer. When the mask plate 200 is aligned with the silicon wafer, the center of the mask plate 200 can be overlapped with the center of the silicon wafer with high precision, ensuring that the positioning pattern on the mask plate 200 can be aligned with the positioning pattern of the silicon wafer after the final exposure, meeting the demand for high-precision pattern alignment.
[0041] A plurality of mounting seats 20 are connected to the first base plate 11, and there may be a plurality of rangefinders 30. A plurality of rangefinders 30 are respectively mounted on the plurality of mounting seats 20, and the plurality of rangefinders 30 are spaced apart from each other. The plurality of rangefinders 30 are all arranged opposite to the mask plate 200, and respectively measure the distance between different positions on the mask plate 200 and the silicon wafer, so as to ensure the measurement accuracy of the rangefinder 30.
[0042] like Figure 5 As shown, the mounting base 20 includes: a second connecting member 22 and a first connecting member 21, the first connecting member 21 is perpendicular to the second connecting member 22, and the first connecting member 21 is connected to the first bottom plate 11. Specifically, the first connecting member 21 and the second connecting member 22 can be integrally formed, or the first connecting member 21 and the second connecting member 22 are welded. The first connecting member 21 is perpendicular to the second connecting member 22. After the first connecting member 21 is connected to the first bottom plate 11, the second connecting member 22 extends in a vertical plane, and the rangefinder 30 is mounted on the second connecting member 22, so that the light emitted by the rangefinder 30 extends in a vertical plane, thereby ensuring the measurement accuracy of the rangefinder 30.
[0043] The first connecting member 21 can move along the first direction relative to the first base plate 11. Specifically, the rangefinder 30 is fixedly connected to the second connecting member 22, and the second connecting member 22 is fixedly connected to the first connecting member 21. When the first connecting member 21 moves along the first direction relative to the first base plate 11, the rangefinder 30 moves with the first connecting member 21, and the position of the rangefinder 30 in the first direction is adjusted to ensure the position accuracy of the rangefinder 30.
[0044] like Figure 6 and Figure 7As shown, the second connecting member 22 includes: a first mounting portion 221 and a second mounting portion 222, and the rangefinder 30 is connected to the first mounting portion 221 or the second mounting portion 222. Specifically, the first mounting portion 221 and the second mounting portion 222 are arranged at intervals, and the rangefinder 30 can be connected to the first mounting portion 221, or the rangefinder 30 can be connected to the second mounting portion 222. When the rangefinder 30 is connected to the first mounting portion 221, the rangefinder 30 measures the gap between the mask plate 200 and the silicon wafer by a diffuse reflection measurement method; when the rangefinder 30 is connected to the second mounting portion 222, the rangefinder 30 measures the gap between the mask plate 200 and the silicon wafer by a mirror reflection measurement method.
[0045] Thus, the rangefinder 30 can move along the first direction relative to the first base plate 11 along with the first connecting member 21, so as to adjust the position of the rangefinder 30; the rangefinder 30 is connected to the first mounting portion 221 or the second mounting portion 222 to realize the diffuse reflection measurement method or the mirror reflection measurement method.
[0046] Further, there are at least two first mounting parts 221, and at least two second mounting parts 222, wherein an acute angle is formed between two first mounting parts 221 and two second mounting parts 222. Specifically, two first mounting parts 221 may coincide with the diagonal line of the rangefinder 30, and two second mounting parts 222 may coincide with the diagonal line of the rangefinder 30, wherein an acute angle is formed between a line connecting the two first mounting parts 221 and a line connecting the two second mounting parts 222, and the acute angle is the inclination angle of the mirror reflection.
[0047] Furthermore, the rangefinder 30 is provided with a third mounting portion 31, and the third mounting portion 31 is fixedly connected to the first mounting portion 221 or the second mounting portion 222. There are at least two third mounting portions 31, and at least two third mounting portions 31 can be detachably connected to at least two first mounting portions 221, respectively, so that the rangefinder 30 adopts a diffuse reflection measurement method. At least two third mounting portions 31 can be detachably connected to at least two second mounting portions 222, respectively, so that the rangefinder 30 adopts a mirror reflection measurement method. By connecting the third mounting portion 31 to different positions on the mounting seat 20, the rangefinder 30 can select a diffuse reflection or mirror reflection measurement method.
[0048] like Figure 5 , Fig. 9 and Fig.10As shown, the distance measuring assembly 100 of the exposure device further includes: an adjusting member 40, the adjusting member 40 is sandwiched between the first connecting member 21 and the first bottom plate 11, the adjusting member 40 is slidably connected to the first bottom plate 11 and can slide relative to the first bottom plate 11 in the second direction, and the first connecting member 21 is slidably connected to the adjusting member 40 and can move relative to the first bottom plate 11 in the first direction. Specifically, the adjusting member 40 is located between the first connecting member 21 and the first bottom plate 11, the first connecting member 21 is slidably connected to the adjusting member 40, and the first connecting member 21 can move relative to the adjusting member 40 in the first direction, so that the distance meter 30 moves in the first direction, so as to adjust the position of the distance meter 30 in the first direction; the adjusting member 40 is slidably connected to the first bottom plate 11, so that the adjusting member 40 can move relative to the first bottom plate 11 in the second direction, and the first connecting member 21 moves along the second direction with the adjusting member 40, and the distance meter 30 also moves in the second direction, so as to adjust the position of the distance meter 30 in the second direction.
[0049] In some embodiments, the distance measuring assembly 100 of the exposure device further includes: a first fastener, a first circular hole 111 is provided on the first base plate 11, a first waist hole 41 is provided on the adjusting member 40, the first waist hole 41 extends along the second direction and corresponds to the first circular hole 111, the first fastener passes through the first waist hole 41 and the first circular hole 111 and is fixedly connected to the first base plate 11, and the first waist hole 41 can move relative to the first fastener along the second direction. Specifically, the first circular hole 111 on the first base plate 11 is smaller than the first waist hole 41 on the adjusting member 40, the size of the first fastener in the second direction is smaller than the first waist hole 41, the first waist hole 41 is an oblong hole, the length direction of the first waist hole 41 is the second direction, the first waist hole 41 corresponds to the first circular hole 111, the first fastener passes through the first waist hole 41 and the first circular hole 111 and is fixedly connected to the first base plate 11, and the first waist hole 41 moves relative to the first fastener along the second direction, so that the rangefinder 30 moves along the second direction, and the position of the rangefinder 30 in the second direction is adjusted.
[0050] In some embodiments, the distance measuring assembly 100 of the exposure device further includes: a second fastener, a second circular hole 42 is provided on the adjusting member 40, a second waist hole 211 is provided on the first connecting member 21, the second waist hole 211 extends along the first direction and corresponds to the second circular hole 42, the second fastener passes through the second waist hole 211 and the second circular hole 42 and is fixedly connected to the adjusting member 40, and the second waist hole 211 can move relative to the second fastener along the first direction. Specifically, the second circular hole 42 on the adjusting member 40 is smaller than the second waist hole 211 on the first connecting member 21, the size of the second fastener in the first direction is smaller than the second waist hole 211, the second waist hole 211 is an oblong hole, the length direction of the second waist hole 211 is the first direction, the second waist hole 211 corresponds to the second circular hole 42, the second fastener passes through the second waist hole 211 and the second circular hole 42 and is fixedly connected to the first connecting member 21, and the second waist hole 211 moves relative to the second fastener along the first direction, so that the rangefinder 30 moves along the first direction, and the position of the rangefinder 30 in the first direction is adjusted.
[0051] like Figure 4 and Figure 5 As shown, the distance measuring assembly 100 of the exposure equipment further includes: a vertical plate 12 and a second bottom plate 13. The vertical plate 12 extends on a vertical plane. The vertical plate 12 is perpendicular to the first bottom plate 11 and is fixedly connected to the first bottom plate 11. The second bottom plate 13 is parallel to the first bottom plate 11 and is fixedly connected to the vertical plate 12. Specifically, the vertical plate 12 is connected between the first bottom plate 11 and the second bottom plate 13. The vertical plate 12 extends on a vertical plane. The first bottom plate 11 is located above the second bottom plate 13. The first bottom plate 11 and the second bottom plate 13 are parallel. The vertical plate 12, the first bottom plate 11 and the second bottom plate 13 are in a "Z" shape. The upper end of the vertical plate 12 is connected to the first bottom plate 11, and the lower end of the vertical plate 12 is connected to the second bottom plate 13, so that the first bottom plate 11 has a certain height, which is convenient for the distance meter 30 to measure the distance between the mask plate 200 and the silicon wafer.
[0052] according to Figure 5 As shown, the second bottom plate 13 is provided with a first portion 131 and a second portion 132. The upper surface of the first portion 131 is higher than the second portion 132 in the height direction, so as to form a step 133 between the first portion 131 and the second portion 132. The lower end of the vertical plate 12 is connected to the second portion 132 and abuts against the step 133. Specifically, the first portion 131 is provided on a side of the second bottom plate 13 adjacent to the vertical plate 12. The lower surface of the first portion 131 is lower than the upper surface of the second portion 132. A step 133 is formed between the first portion 131 and the second portion 132. The step 133 is consistent in shape with the lower end of the vertical plate 12. When the lower end of the vertical plate 12 is connected to the second portion 132, the step 133 plays a positioning role in the connection between the vertical plate 12 and the second portion 132, so as to ensure that the vertical plate 12 and the second portion 132 are accurately positioned.
[0053] In some embodiments, the distance measuring assembly 100 further includes: a third fastener, a fourth mounting portion 134 is provided on the second portion 132, a fifth mounting portion 121 is provided on the vertical plate 12, and the third fastener passes through the fourth mounting portion 134 and is fixedly connected to the fifth mounting portion 121. Specifically, when the vertical plate 12 abuts against the step 133, the fourth mounting portion 134 and the fifth mounting portion 121 are correspondingly provided, and the third fastener passes through the fourth mounting portion 134 and is fixedly connected to the fifth mounting portion 121, so that the second bottom plate 13 and the vertical plate 12 are fixedly connected.
[0054] Among them, there can be multiple third fasteners, and there can be multiple fourth mounting parts 134 and fifth mounting parts 121. The number of third fasteners and fourth mounting parts 134 is consistent with the number of fifth mounting parts 121. The positions of multiple fourth mounting parts 134 and multiple fifth mounting parts 121 correspond one by one, and multiple third fasteners pass through multiple fourth mounting parts 134 and are fixedly connected with multiple fifth mounting parts 121 respectively.
[0055] Combination Figure 1-Figure 3 As shown, the exposure equipment includes: a distance measuring component 100, a placement platform 300, an exposure device, a mask plate 200 and an alignment device.
[0056] according to Figure 1-Figure 3 As shown, the placement platform 300 is used to carry silicon wafers; the exposure device is used to expose the silicon wafers. There are multiple placement platforms 300, and in the description of the present invention, "multiple" means two or more. Multiple placement platforms 300 are arranged at intervals, and each placement platform 300 has at least one placement area, and the silicon wafer is placed in the placement area. The placement platform 300 can be moved to move the silicon wafer to different stations so that the silicon wafer can complete the processing of different stations. The placement area on each placement platform 300 is used to place silicon wafers.
[0057] In some embodiments, the placement platform 300 includes: an adsorption device, and the silicon wafer is adsorbed on the placement platform 300 through the adsorption device. The placement platform 300 is provided with an adsorption device, and the adsorption device is used to adsorb the silicon wafer on the placement platform 300. As shown in the figure, the adsorption device is located on the surface of the placement platform 300. After the silicon wafer moves from the conveying device to the placement platform 300, the adsorption device can extract the air between the silicon wafer and the placement platform 300 to adsorb the silicon wafer on the placement platform 300, prevent the silicon wafer from sliding on the placement platform 300, ensure the stability of the position of the silicon wafer, and enable the mask plate 200 and the silicon wafer to be accurately aligned.
[0058] The alignment device is used to fix the mask plate 200 and drive the mask plate 200 to move so as to align with the silicon wafer. Specifically, the alignment device can be used to fix the mask plate 200, and the alignment device can also drive the mask plate 200 to move up and down so as to align the mask plate 200 with the silicon wafer. When the mask plate 200 is aligned with the silicon wafer, the center of the mask plate 200 and the center of the silicon wafer can be overlapped with high precision, ensuring that the positioning pattern on the mask plate 200 can be aligned with the positioning pattern of the silicon wafer after the final exposure, meeting the requirements of high-precision pattern alignment.
[0059] The distance measuring component 100 of the exposure device is used to measure the distance between the mask plate 200 and the silicon wafer, and ensure that the distance between the mask plate 200 and the silicon wafer meets the exposure requirements.
[0060] In the description of the present invention, it should be understood that the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.
[0061] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "illustrative embodiments", "examples", "specific examples", or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the utility model. In this specification, the schematic expressions of the above terms do not necessarily refer to the same embodiment or example.
[0062] Although the embodiments of the present invention have been shown and described, those skilled in the art will appreciate that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the claims and their equivalents.
Claims
1. A distance measuring component of an exposure device, characterized in that: include: A first bottom plate (11), the first bottom plate (11) being arranged opposite to the mask plate (200); A plurality of mounting seats (20), wherein the plurality of mounting seats (20) are connected to the first base plate (11), the mounting seats (20) comprising: a first connecting member (21) and a second connecting member (22), the first connecting member (21) being perpendicular to the second connecting member (22), the first connecting member (21) being connected to the first base plate (11), and the first connecting member (21) being movable along a first direction relative to the first base plate (11), and the second connecting member (22) comprising: a first mounting portion (221) and a second mounting portion (222); A rangefinder (30), the rangefinder (30) being connectable to the first mounting portion (221) or the second mounting portion (222); wherein: When the distance meter (30) is connected to the first mounting portion (221), the distance meter (30) adopts a diffuse reflection measurement method; When the distance meter (30) is connected to the second mounting portion (222), the distance meter (30) adopts a mirror reflection measurement method.
2. The distance measuring component of the exposure device according to claim 1, characterized in that: There are at least two first mounting portions (221), and there are at least two second mounting portions (222), wherein an acute angle is formed between two of the first mounting portions (221) and two of the second mounting portions (222).
3. The distance measuring component of the exposure device according to claim 1, characterized in that: The distance meter (30) is provided with a third mounting portion (31), and the third mounting portion (31) can be connected to the first mounting portion (221) or the second mounting portion (222).
4. The distance measuring component of the exposure device according to claim 1, characterized in that: Also includes: An adjusting member (40) is sandwiched between the first connecting member (21) and the first bottom plate (11); the adjusting member (40) is slidably connected to the first bottom plate (11) and can slide relative to the first bottom plate (11) along a second direction; the first connecting member (21) is slidably connected to the adjusting member (40) and can move relative to the first bottom plate (11) along a first direction.
5. The distance measuring component of the exposure device according to claim 4, characterized in that: Also includes: A first fastener, the first base plate (11) is provided with a first circular hole (111), the adjusting member (40) is provided with a first waist hole (41), the first waist hole (41) extends along the second direction and corresponds to the first circular hole (111), the first fastener passes through the first waist hole (41) and the first circular hole (111) to be fixedly connected to the first base plate (11), and the first waist hole (41) can move relative to the first fastener along the second direction.
6. The distance measuring component of the exposure device according to claim 4, characterized in that: Also includes: A second fastener, the adjusting member (40) is provided with a second circular hole (42), the first connecting member (21) is provided with a second waist hole (211), the second waist hole (211) extends along the first direction and corresponds to the second circular hole (42), the second fastener passes through the second waist hole (211) and the second circular hole (42) to be fixedly connected to the adjusting member (40), and the second waist hole (211) can move relative to the second fastener along the first direction.
7. The distance measuring component of the exposure device according to claim 1, characterized in that: Also includes: A vertical plate (12) and a second bottom plate (13), wherein the vertical plate (12) extends in a vertical plane, the vertical plate (12) is perpendicular to the first bottom plate (11) and is fixedly connected to the first bottom plate (11), and the second bottom plate (13) is parallel to the first bottom plate (11) and is fixedly connected to the vertical plate (12).
8. The distance measuring component of the exposure device according to claim 7, characterized in that: The second bottom plate (13) is provided with a first portion (131) and a second portion (132); the upper surface of the first portion (131) is higher than the second portion (132) in the height direction, so as to form a step (133) between the first portion (131) and the second portion (132); the lower end of the vertical plate (12) is connected to the second portion (132) and abuts against the step (133).
9. The distance measuring component of the exposure device according to claim 8, characterized in that: Also includes: A third fastener, a fourth mounting portion (134) is provided on the second portion (132), a fifth mounting portion (121) is provided on the vertical plate (12), and the third fastener passes through the fourth mounting portion (134) and is fixedly connected to the fifth mounting portion (121).
10. An exposure device, characterized in that: include: A placement platform (300) for carrying a silicon wafer; An exposure device, used for exposing the silicon wafer; Mask plate (200); An alignment device, used for fixing the mask plate (200) and driving the mask plate (200) to move so as to align with the silicon wafer; The distance measuring component (100) of the exposure equipment according to any one of claims 1 to 9 is used to measure the distance between the mask plate (200) and the silicon wafer.