Copper foil cleaning device for graphene production

By designing an automated copper foil cleaning device, the cleaning blocks driven by the slider and motor slide on the surface of the copper foil for cleaning, the problem of troublesome and energy consumption of copper foil cleaning in graphene production is solved, and the processing efficiency is improved.

CN222469930UActive Publication Date: 2025-02-14安徽景锐新材料科技有限公司
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Patent Information

Application Number
CN202421198604.7
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-05-29
Publication Date
2025-02-14
Estimated Expiration
2034-05-29

AI Technical Summary

Technical Problem

During the graphene production process, users need to hold tweezers to hold cleaning cotton blocks to clean the surface of the copper foil, which is troublesome and consumes a lot of energy, affecting processing efficiency.

Method used

A copper foil cleaning device for graphene production is designed, including a cleaning tank, a skateboard, a cleaning block and a motor. The cleaning blocks driven by the skateboard and a motor are slid on the surface of the copper foil to avoid manual operation by the user.

Benefits of technology

Automatic cleaning of the copper foil surface is realized, reducing the user's operating burden and energy consumption, and improving the efficiency of graphene processing.

✦ Generated by Eureka AI based on patent content.

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Abstract

The copper foil cleaning device for graphene production comprises a cleaning tank, the bottom of an inner cavity of the cleaning tank is fixedly connected with a placing table, a first sliding plate is arranged in the inner cavity of the cleaning tank, sliding grooves are formed in the front face and the back face of the cleaning tank, the first sliding plate is clamped with the sliding grooves, and the placing table is fixedly connected with the placing table. A cleaning block is arranged below the first sliding plate. According to the copper foil cleaning device, copper foil is placed on the top of the placing table, a first sliding plate is started, a cleaning block slides downwards through limiting of a sliding rod, so that the cleaning block is attached to the surface of the copper foil, a motor is started, and through limiting of a limiting frame and a limiting strip, the first sliding plate slides in an inner cavity of a sliding groove; and the first sliding plate drives the cleaning block to slide on the surface of the copper foil through the sliding rod, so that the copper foil can be cleaned through the cleaning structure, the situation that a user needs to hold tweezers to clamp a cleaning cotton block to clean the copper foil is avoided, and the graphene processing efficiency is improved.
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Description

Technical Field

[0001] The utility model belongs to the technical field of graphene production, and particularly relates to a copper foil cleaning device for graphene production. Background Art

[0002] In graphene production, roll-to-roll equipment using a tubular furnace atmospheric deposition method is generally used to produce large-area graphene. That is, the copper foil is transferred to a quartz heating tube by a reel-driven roller for graphene growth, and then rolled up on the other side of the quartz heating tube. When producing graphene, the user is required to hold a cleaning cotton block with tweezers to clean the surface of the copper foil.

[0003] At present, when graphene is produced, the surface of the copper foil needs to be cleaned. It is troublesome for the user to use tweezers to hold the cleaning cotton block for cleaning, and the user will consume a lot of energy if the copper foil is cleaned for a long time and multiple times. Therefore, a copper foil cleaning device for graphene production is needed. The copper foil can be cleaned through a cleaning structure, which avoids the need for the user to hold the cleaning cotton block with tweezers to clean the copper foil, thereby improving the efficiency of graphene processing. Utility Model Content

[0004] The purpose of the utility model is to provide a copper foil cleaning device for graphene production, which can clean the copper foil through a cleaning structure, avoiding the need for users to hold a cleaning cotton block with tweezers to clean the copper foil, thereby improving the graphene processing efficiency and solving the above-mentioned background technical problems.

[0005] The utility model solves the above-mentioned technical problems with the following technical solutions: a copper foil cleaning device for graphene production, comprising a cleaning tank, a placing table fixedly connected to the bottom of the inner cavity of the cleaning tank, a slide plate 1 being arranged in the inner cavity of the cleaning tank, slide grooves being provided on the front and back of the cleaning tank, the slide plate 1 being engaged with the slide grooves, a cleaning block being arranged below the slide plate 1, two symmetrical sliding rods being welded to the top of the cleaning block, the top of the sliding rods being penetrated to the top of the slide plate 1 and being slidably connected to the slide plate 1, a cylinder being fixedly installed on the top of the slide plate 1 by bolts, the output end of the cylinder being penetrated to the bottom of the slide plate 1 and being fixedly connected to the cleaning block, the slide plate 1 A rotating shaft is penetrated through the front side of the cleaning tank, and the rotating shaft is rotatably connected to the skateboard one. Two symmetrical gears are welded on the surface of the rotating shaft, and the gears are located outside the cleaning tank. Racks are welded on the front and back sides of the cleaning tank, and the gears are meshed with the racks. Two symmetrical limit frames are welded on the front side of the cleaning tank, and the rack is located between the two symmetrical limit frames. A skateboard two is arranged on the front side of the cleaning tank, and two symmetrical limit strips are welded on the side of the skateboard two close to the cleaning tank, and the limit frames are adapted to the limit strips. A motor is fixedly installed on the front side of the skateboard two by bolts, and the output shaft of the motor penetrates through the back of the skateboard two and is fixedly connected to the rotating shaft.

[0006] Preferably, a non-slip pad is fixedly connected to the top of the placement table, and the surface of the non-slip pad is provided with non-slip grooves, and the placement table is an I-beam.

[0007] Preferably, a water outlet is provided through the right side of the cleaning tank, the water outlet is cylindrical, and a rubber sleeve is provided on the surface of the water outlet.

[0008] Preferably, the slide plate slides in the inner cavity of the slide groove, the top of the cleaning block is a fixed plate, and the bottom of the cleaning block is arc-shaped.

[0009] Preferably, the second slide plate is attached to the front side of the limiting frame, the second slide plate is rectangular, the limiting strip is cylindrical, and the inner cavity of the limiting frame is arc-shaped.

[0010] 1. The beneficial effects of the utility model are as follows: the utility model places the copper foil on the top of the placement table, starts the slide plate 1, and through the limitation of the slide bar, makes the cleaning block slide downward, so that the cleaning block is attached to the surface of the copper foil, starts the motor, and through the limitation of the limit frame and the limit bar, makes the slide plate 1 slide in the inner cavity of the slide groove, so that the slide plate 1 drives the cleaning block to slide on the surface of the copper foil through the slide bar, so that the copper foil can be cleaned by the cleaning structure, avoiding the need for the user to hold the cleaning cotton block with tweezers to clean the copper foil, thereby improving the purpose of graphene processing efficiency.

[0011] 2. The utility model places the copper foil on the top of the anti-skid pad by setting the anti-skid pad. The anti-skid pattern on the surface of the anti-skid pad increases the friction between the anti-skid pad and the copper foil, avoiding the copper foil from being offset due to the sliding of the cleaning block when the cleaning block slides on the surface of the copper foil, thereby ensuring the stability of the copper foil on the top of the placement table. BRIEF DESCRIPTION OF THE DRAWINGS

[0012] in:

[0013] Figure 1 It is a three-dimensional schematic diagram of an embodiment of the utility model;

[0014] Figure 2 This is a three-dimensional disassembly schematic diagram of an embodiment of the utility model;

[0015] Figure 3 A schematic top view of an embodiment of the utility model;

[0016] Figure 4 This is an embodiment of the utility model Figure 2 A partial enlarged view of point A in the middle.

[0017] In the accompanying drawings, the components represented by the reference numerals are listed as follows:

[0018] 1. Cleaning trough, 2. Placing table, 3. Slide plate 1, 4. Slide trough, 5. Cleaning block, 6. Slide rod, 7. Cylinder, 8. Rotating shaft, 9. Gear, 10. Rack, 11. Limiting frame, 12. Slide plate 2, 13. Limiting strip, 14. Motor, 15. Anti-slip pad, 16. Water outlet. DETAILED DESCRIPTION

[0019] Hereinafter, an embodiment of a copper foil cleaning device for graphene production of the present invention will be described with reference to the accompanying drawings.

[0020] Embodiment 1:

[0021] Figure 1-4The utility model shows a copper foil cleaning device for graphene production according to an embodiment of the present invention, which comprises: a cleaning tank 1, a water outlet 16 is provided through the right side of the cleaning tank 1, the water outlet 16 is cylindrical, and a rubber sleeve is provided on the surface of the water outlet 16, a placing table 2 is fixedly connected to the bottom of the inner cavity of the cleaning tank 1, an anti-skid pad 15 is fixedly connected to the top of the placing table 2, and the surface of the anti-skid pad 15 is provided with anti-skid patterns, and the placing table 2 is an I-shaped steel, and the copper foil is placed on the anti-skid pad 15 through the setting of the anti-skid pad 15. The top of the anti-skid pad 15 and the anti-skid pattern on the surface of the anti-skid pad 15 increase the friction between the anti-skid pad 15 and the copper foil, so as to prevent the copper foil from being offset due to the sliding of the cleaning block 5 when the cleaning block 5 slides on the surface of the copper foil, thereby ensuring the stability of the copper foil on the top of the placement table 2. The inner cavity of the cleaning tank 1 is provided with a slide plate 3, and the front and back sides of the cleaning tank 1 are provided with slide grooves 4, and the slide plate 3 is engaged with the slide groove 4. A cleaning block 5 is provided below the slide plate 3, and two pairs of The top of the slide bar 6 passes through the top of the slide plate 3 and is slidably connected to the slide plate 3. The top of the slide plate 3 is fixedly installed with a cylinder 7 by bolts. The output end of the cylinder 7 passes through the bottom of the slide plate 3 and is fixedly connected to the cleaning block 5. The front of the slide plate 3 is penetrated by a rotating shaft 8, and the rotating shaft 8 is rotatably connected to the slide plate 3. Two symmetrical gears 9 are welded on the surface of the rotating shaft 8. The gear 9 is located outside the cleaning tank 1. Racks 10 are welded on the front and back of the cleaning tank 1. The gear 9 is meshed with the rack 10. Two symmetrical limit frames 11 are welded on the front of the cleaning tank 1. The rack 10 is located between the two symmetrical limit frames 11. A slide plate 2 12 is provided on the front of the cleaning tank 1. Two symmetrical limit strips 13 are welded on the side of the slide plate 2 12 close to the cleaning tank 1. The limit frame 11 is adapted to the limit strip 13. A motor 14 is fixedly installed on the front of the slide plate 2 12 by bolts. The output shaft of the motor 14 passes through the back of the slide plate 2 12 and is fixedly connected to the rotating shaft 8.

[0022] Embodiment 2:

[0023] Figure 1-4The utility model shows a copper foil cleaning device for graphene production according to an embodiment of the present invention, which comprises: a cleaning tank 1, a placing table 2 is fixedly connected to the bottom of the inner cavity of the cleaning tank 1, a slide plate 3 slides in the inner cavity of the slide groove 4, the top of the cleaning block 5 is a fixed plate, the bottom of the cleaning block 5 is arc-shaped, the inner cavity of the cleaning tank 1 is provided with a slide plate 3, the front and back sides of the cleaning tank 1 are provided with slide grooves 4, the slide plate 3 is engaged with the slide groove 4, a cleaning block 5 is provided below the slide plate 3, two symmetrical sliding rods 6 are welded to the top of the cleaning block 5, the top of the sliding rod 6 penetrates to the top of the slide plate 3 and is slidably connected to the slide plate 3, a cylinder 7 is fixedly installed on the top of the slide plate 3 by bolts, the output end of the cylinder 7 penetrates to the bottom of the slide plate 3 and is fixedly connected to the cleaning block 5, a rotating shaft 8 is penetrated through the front of the slide plate 3, and the rotating shaft 8 is connected to the slide plate A 3 rotation connection, two symmetrical gears 9 are welded on the surface of the rotating shaft 8, the gear 9 is located outside the cleaning tank 1, and racks 10 are welded on the front and back of the cleaning tank 1, the gear 9 is meshed with the rack 10, and two symmetrical limit frames 11 are welded on the front of the cleaning tank 1, and the rack 10 is located between the two symmetrical limit frames 11, and a slide plate 2 12 is arranged on the front of the cleaning tank 1, and the slide plate 2 12 is attached to the front of the limit frame 11, the slide plate 2 12 is rectangular, the limit bar 13 is cylindrical, and the inner cavity of the limit frame 11 is arc-shaped, and two symmetrical limit bars 13 are welded on the side of the slide plate 2 12 close to the cleaning tank 1, and the limit frame 11 is adapted to the limit bar 13, and a motor 14 is fixedly installed on the front of the slide plate 2 12 by bolts, and the output shaft of the motor 14 passes through the back of the slide plate 2 12 and is fixedly connected to the rotating shaft 8.

[0024] Working principle: When the utility model is used, the user places the copper foil on the top of the placement table 2, starts the cylinder 7, and through the limit of the slide bar 6, the cleaning block 5 slides downward and fits on the top of the copper foil, starts the motor 14, and the shaft 8 drives the gear 9 to rotate. Through the limit of the limit frame 11 and the limit bar 13, the shaft 8 drives the slide plate 3 to slide in the inner cavity of the slide groove 4, so that the slide plate 3 drives the cleaning block 5 to slide on the top of the copper foil through the slide bar 6 to clean the copper foil, avoiding the need for the user to hold the cleaning cotton block with tweezers to clean the copper foil, thereby improving the graphene processing efficiency. Through the setting of the anti-skid pad 15, the anti-skid pattern on the surface of the anti-skid pad 15 will increase the friction between the anti-skid pad 15 and the copper foil, avoiding the copper foil from being offset due to the sliding of the cleaning block 5 when the cleaning block 5 slides on the surface of the copper foil, thereby ensuring the stability of the copper foil on the top of the placement table 2.

[0025] In summary, the copper foil cleaning device for graphene production places the copper foil on the top of the placement table 2, starts the slide plate 3, and limits the sliding bar 6 to make the cleaning block 5 slide downward so that the cleaning block 5 fits the surface of the copper foil. The motor 14 is started, and the slide plate 3 slides in the inner cavity of the slide groove 4 through the limiting of the limiting frame 11 and the limiting bar 13, so that the slide plate 3 drives the cleaning block 5 to slide on the surface of the copper foil through the sliding bar 6, so that the copper foil can be cleaned by the cleaning structure, avoiding the need for the user to hold the cleaning cotton block with tweezers to clean the copper foil, thereby improving the purpose of graphene processing efficiency.

Claims

1. A copper foil cleaning device for graphene production, characterized in that: The cleaning tank (1) comprises a cleaning tank (1): a placing table (2) is fixedly connected to the bottom of the inner cavity of the cleaning tank (1), a slide plate (3) is arranged in the inner cavity of the cleaning tank (1), slide grooves (4) are provided on the front and back of the cleaning tank (1), the slide plate (3) is engaged with the slide groove (4), a cleaning block (5) is arranged below the slide plate (3), two symmetrical sliding rods (6) are welded to the top of the cleaning block (5), the top of the sliding rod (6) passes through the top of the slide plate (3) and is slidably connected to the slide plate (3), a cylinder (7) is fixedly installed on the top of the slide plate (3) by bolts, the output end of the cylinder (7) passes through the bottom of the slide plate (3) and is fixedly connected to the cleaning block (5), a rotating shaft (8) is arranged on the front of the slide plate (3), and the rotating shaft (8) is rotatably connected to the slide plate (3), Two symmetrical gears (9) are welded on the surface of the rotating shaft (8), and the gears (9) are located outside the cleaning tank (1). Racks (10) are welded on the front and back of the cleaning tank (1), and the gears (9) mesh with the racks (10). Two symmetrical limit frames (11) are welded on the front of the cleaning tank (1), and the racks (10) are located between the two symmetrical limit frames (11). A slide plate 2 (12) is arranged on the front of the cleaning tank (1), and two symmetrical limit bars (13) are welded on the side of the slide plate 2 (12) close to the cleaning tank (1), and the limit frames (11) are matched with the limit bars (13). A motor (14) is fixedly installed on the front of the slide plate 2 (12) by bolts, and the output shaft of the motor (14) passes through the back of the slide plate 2 (12) and is fixedly connected to the rotating shaft (8).

2. A copper foil cleaning device for graphene production according to claim 1, characterized in that: The top of the placement platform (2) is fixedly connected with an anti-skid pad (15), the surface of the anti-skid pad (15) is provided with anti-skid patterns, and the placement platform (2) is an I-shaped steel.

3. A copper foil cleaning device for graphene production according to claim 2, characterized in that: A water outlet (16) is provided through the right side of the cleaning tank (1); the water outlet (16) is cylindrical, and a rubber sleeve is provided on the surface of the water outlet (16).

4. A copper foil cleaning device for graphene production according to claim 3, characterized in that: The slide plate 1 (3) slides in the inner cavity of the slide groove (4), the top of the cleaning block (5) is a fixed plate, and the bottom of the cleaning block (5) is arc-shaped.

5. A copper foil cleaning device for graphene production according to claim 4, characterized in that: The second slide plate (12) is fitted on the front side of the limiting frame (11); the second slide plate (12) is rectangular, the limiting strip (13) is cylindrical, and the inner cavity of the limiting frame (11) is arc-shaped.