Slide holder positioning mechanism of cleaning machine

Abstract

The utility model relates to the technical field of cleaning machines, in particular to a slide holder positioning mechanism of a cleaning machine, which comprises a workbench, a positioning component and a cleaning component, the cleaning component comprises a support frame, a motor, a threaded rod, a first slide block, an output head and a water supply component, the inverted L-shaped support frame is arranged on the workbench, and the motor is arranged on the support frame. A sliding groove is formed in the center of the lower portion of the top wall of the supporting frame, the threaded rod and a first sliding block are arranged in the sliding groove, the first sliding block is in threaded connection with the threaded rod, and the output end of the motor penetrates through the sliding groove of the supporting frame and is connected with the threaded rod. The handle drives the positive and negative tooth screw rod to rotate, the two sets of second sliding blocks drive the centering frame to move oppositely to stably clamp materials, the equipment can clamp the materials of different specifications, the water supply assembly and the first motor are started, the first motor drives the threaded rod to rotate, the first sliding blocks drive the output head to move and wash the materials, and use is convenient.

Description

Technical Field

[0001] The utility model relates to the technical field of cleaning machines, in particular to a wafer stage positioning mechanism of a cleaning machine. Background Art

[0002] As we all know, cleaning machines are needed in the semiconductor processing process of the chip industry. However, existing cleaning machines are not convenient for carrying semiconductors of different specifications. It is inconvenient to replace fixtures or carrying devices of corresponding specifications. Moreover, after cleaning, the corresponding carrying devices are not convenient to dry quickly for the continued processing of subsequent materials, and the processing efficiency is low. Utility Model Content

[0003] 1. Technical issues to be resolved

[0004] In view of the deficiencies in the prior art, the utility model provides a wafer stage positioning mechanism for a cleaning machine.

[0005] (II) Technical solution

[0006] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a wafer stage positioning mechanism of a cleaning machine, comprising a workbench, a positioning assembly and a cleaning assembly, the cleaning assembly comprising a support frame, a motor, a threaded rod, a first slider, an output head and a water supply assembly, an inverted L-shaped support frame is arranged on the workbench, a slide groove is arranged at the center below the top wall of the support frame, the threaded rod and the first slider are arranged in the slide groove, the first slider is threadedly connected to the threaded rod, the output end of the motor passes through the slide groove of the support frame and is connected to the threaded rod, the output head is arranged below the first slider The output head is provided on the workbench, and a water supply component connected with the output head is also provided on the workbench. The positioning component is also provided under the output head. The positioning component includes a crossbeam, a positive and negative threaded screw, a handle, a second slider and a centering frame. The crossbeam is connected with the side wall of the support frame, and a centering groove is provided on the crossbeam. Two groups of symmetrically arranged second sliders and positive and negative threaded screws are provided in the centering groove. The second slider is threadedly connected with the positive and negative threaded screw, and one end of the positive and negative threaded screw passes through the side wall of the centering groove and is connected with the handle. The centering frame is provided on the second slider, and the centering frame is L-shaped.

[0007] In order to facilitate the stability of the centering clamping, the utility model is improved in that the side wall of the centering frame is provided with a friction pad.

[0008] In order to provide stable support for the materials, the utility model is improved in that a support block is arranged above the bottom wall of the centering frame.

[0009] While providing stable support for the material, it is ensured that the contact point between the support block and the material is quickly dried. The utility model has the following improvements: the support block is hemispherical and the support blocks are arranged in a plurality of groups.

[0010] Preferably, the crossbeam is provided with a drainage hole penetrating the centering groove.

[0011] Preferably, a waste liquid frame is provided on the workbench below the crossbeam.

[0012] (III) Beneficial effects

[0013] Compared with the prior art, the utility model provides a wafer stage positioning mechanism for a cleaning machine, which has the following beneficial effects:

[0014] The wafer stage positioning mechanism of the cleaning machine drives the forward and reverse threaded screws to rotate through the handle, and the two sets of second slide blocks drive the centering frame to move towards each other to stably clamp the material. The equipment can clamp materials of different specifications. The water supply component and the first motor are started, the first motor drives the threaded rod to rotate, and the first slide block drives the output head to move and rinse the material. It is easy to use. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 This is a schematic diagram of the main structure of the utility model;

[0016] Figure 2 This is a bottom view schematic diagram of the structure of the utility model;

[0017] Figure 3 It is a partial top view schematic diagram of the structure of the utility model;

[0018] Figure 4 It is a partial bottom view of the structure of the utility model.

[0019] In the figure: 1. workbench; 2. support frame; 3. motor; 4. threaded rod; 5. first slider; 6. output head; 7. water supply assembly; 8. crossbeam; 9. positive and negative thread screws; 10. handle; 11. second slider; 12. centering frame; 13. friction pad; 14. support block; 15. waste liquid frame. DETAILED DESCRIPTION

[0020] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0021] See also Figure 1-4A wafer stage positioning mechanism of a cleaning machine comprises a workbench 1, a positioning assembly and a cleaning assembly, wherein the cleaning assembly comprises a support frame 2, a motor 3, a threaded rod 4, a first slider 5, an output head 6 and a water supply assembly 7, wherein the workbench 1 is provided with an inverted L-shaped support frame 2, a slide groove is provided at the center below the top wall of the support frame 2, the threaded rod 4 and the first slider 5 are provided in the slide groove, the first slider 5 is threadedly connected to the threaded rod 4, the output end of the motor 3 passes through the slide groove of the support frame 2 and is connected to the threaded rod 4, the output head 6 is provided below the first slider 5, and the workbench 1 is also provided with a The water supply component 7 connected to the output head 6, the positioning component is also arranged below the output head 6, the positioning component includes a crossbeam 8, a positive and negative threaded screw 9, a handle 10, a second slider 11 and a centering frame 12, the crossbeam 8 is connected to the side wall of the support frame 2, the crossbeam 8 is provided with a centering groove, two groups of symmetrically arranged second sliders 11 and positive and negative threaded screws 9 are provided in the centering groove, the second slider 11 is threadedly connected with the positive and negative threaded screw 9, one end of the positive and negative threaded screw 9 passes through the side wall of the centering groove and is connected to the handle 10, the second slider 11 is provided with the centering frame 12, and the centering frame 12 is L-shaped.

[0022] During actual use, the gap between the two sets of centering frames 12 is relatively large at first. The handle 10 is used to drive the positive and negative threaded screws 9 to rotate, and the positive and negative threaded screws 9 drive the two sets of second slide blocks 11 to move toward each other in the centering groove of the beam 8. The support frame 2 provides stable support for the beam 8 on the workbench 1. After the two sets of centering frames 12 are adjusted to appropriate positions, the materials are placed on the centering frames 12 and the handle 10 is continued to be turned until the side walls of the two sets of centering frames 12 clamp and fix the materials. The water supply assembly 7 and the motor 3 are started. The motor 3 drives the threaded rod 4 on the top wall of the support frame 2 to rotate. The first slide block 5 drives the output head 6 to move under the drive of the threaded rod 4. The water supply assembly 7 includes a water tank, a water pump and a connecting pipe, which are commercially available equipment. The output head 6 outputs liquid to clean the surface of the material.

[0023] In actual use, it is necessary to ensure that the material is stably clamped, and for this purpose, the side wall of the centering frame 12 is provided with a friction pad 13 .

[0024] If the material is placed directly on the bottom wall of the centering frame 12, water may easily remain on the bottom wall of the centering frame 12 after flushing. In order to solve the above problem, a support block 14 is arranged above the bottom wall of the centering frame 12. The support block 14 is hemispherical. The support block 14 is arranged in several groups. The hemispherical support block 14 provides stable support for the material while reducing the contact area with the material. The water remaining on the top wall of the support block 14 is more easily blown dry due to gravity and the curved surface.

[0025] In actual use, water is prone to accumulate in the centering tank. In order to solve the above problem, a drainage hole penetrating the centering tank is provided on the crossbeam 8, and a waste liquid frame 15 is provided on the workbench 1 below the crossbeam 8 to facilitate the collection of waste liquid.

[0026] In order to explain in detail the possible application scenarios, technical principles, specific schemes that can be implemented, and the purposes and effects that can be achieved, the following is a detailed description of the specific embodiments listed in conjunction with the accompanying drawings. The embodiments described herein are only used to more clearly illustrate the technical solutions of the present application, and are therefore only used as examples, and cannot be used to limit the scope of protection of the present application.

[0027] Reference to "embodiment" herein means that the specific features, structures or characteristics described in conjunction with the embodiment may be included in at least one embodiment of the present application. The term "embodiment" appearing in various places in the specification does not necessarily refer to the same embodiment, nor does it particularly limit its independence or association with other embodiments. In principle, in the present application, as long as there is no technical contradiction or conflict, the various technical features mentioned in the embodiments can be combined in any way to form a corresponding implementable technical solution.

[0028] Unless otherwise defined, the technical terms used in this document have the same meanings as those generally understood by those skilled in the art to which this application belongs; the use of relevant terms in this document is only for describing specific embodiments and is not intended to limit this application.

[0029] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A wafer stage positioning mechanism for a cleaning machine, comprising a workbench (1), a positioning component and a cleaning component, characterized in that: The cleaning assembly comprises a support frame (2), a motor (3), a threaded rod (4), a first slider (5), an output head (6) and a water supply assembly (7); an inverted L-shaped support frame (2) is arranged on the workbench (1); a slide groove is arranged at the center below the top wall of the support frame (2); the threaded rod (4) and the first slider (5) are arranged in the slide groove; the first slider (5) is threadedly connected to the threaded rod (4); the output end of the motor (3) passes through the slide groove of the support frame (2) and is connected to the threaded rod (4); the output head (6) is arranged below the first slider (5); and the workbench (1) is also provided with a water supply assembly (7) connected to the output head (6). The positioning assembly is also arranged below the output head (6), and the positioning assembly comprises a crossbeam (8), a positive and negative threaded screw (9), a handle (10), a second slider (11) and a centering frame (12). The crossbeam (8) is connected to the side wall of the support frame (2). A centering groove is arranged on the crossbeam (8). Two groups of symmetrically arranged second sliders (11) and positive and negative threaded screws (9) are arranged in the centering groove. The second slider (11) is threadedly connected to the positive and negative threaded screw (9). One end of the positive and negative threaded screw (9) passes through the side wall of the centering groove and is connected to the handle (10). The centering frame (12) is arranged on the second slider (11), and the centering frame (12) is L-shaped.

2. The wafer stage positioning mechanism of a cleaning machine according to claim 1, characterized in that: The side wall of the centering frame (12) is provided with a friction pad (13).

3. The wafer stage positioning mechanism of a cleaning machine according to claim 2, characterized in that: A support block (14) is arranged above the bottom wall of the centering frame (12).

4. The wafer stage positioning mechanism of a cleaning machine according to claim 3, characterized in that: The support blocks (14) are hemispherical in shape, and the support blocks (14) are arranged in a plurality of groups.

5. The wafer stage positioning mechanism of a cleaning machine according to claim 4, characterized in that: The cross beam (8) is provided with a drainage hole penetrating the centering groove.

6. The wafer stage positioning mechanism of a cleaning machine according to claim 5, characterized in that: A waste liquid frame (15) is provided on the workbench (1) below the crossbeam (8).

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