Workbench of plasma chemical vapor deposition equipment

Abstract

According to the technical scheme, the plasma chemical vapor deposition equipment workbench is characterized in that the plasma chemical vapor deposition equipment workbench comprises a containing box, a containing plate is movably arranged in the containing box in a sleeved mode, and plasma chemical vapor deposition equipment is fixedly connected to the top face of the containing plate; the grid baffle is movably arranged in the placing box in a sleeved mode, and sealing gaskets are fixedly connected to the left side, the right side and the bottom face of the grid baffle; and the adjusting assembly is arranged in the containing box and used for adjusting the position of the containing plate, by arranging the containing box, when a worker fixes a grid baffle into the containing box, a sealing gasket can seal the space between the containing box and the grid baffle at the moment, so that wet gas entering the containing box is reduced, and the working efficiency is improved. Therefore, the plasma chemical vapor deposition equipment is prevented from being damped and damaged or short-circuited, and the service life of the plasma chemical vapor deposition equipment is prolonged.

Description

Technical Field

[0001] The utility model relates to the technical field of equipment workbenches, in particular to a plasma chemical vapor deposition equipment workbench. Background Art

[0002] Plasma chemical vapor deposition equipment is a process test instrument used in the fields of power and electrical engineering, electronics and communication technology. In the current semiconductor and flat panel manufacturing, plasma enhanced chemical vapor deposition has become one of the most widely used methods for depositing thin film materials due to its fast deposition, low temperature and good repeatability. The workbench is made of high-quality cold-rolled steel plate, and the surface is made of electrostatic spraying. The solid workbench frame is firm and stable, and the workbench surface can evenly bear a load of 1000kg. The desktop is made of a variety of materials and is suitable for office spaces in various industries.

[0003] For example, the Chinese patent with publication number CN214991843U proposes a workbench and plasma chemical vapor deposition equipment, wherein the component table includes: a support column; a bearing platform arranged on the support column; an electromagnet and an electrostatic adsorption device arranged on the bearing platform, wherein the electromagnet is arranged between the bearing platform and the electrostatic adsorption device, and the electromagnet and the electrostatic adsorption device are insulated from each other, and an insulating layer is arranged on the surface of the electrostatic adsorption device away from the electromagnet. By arranging the electromagnet on the workbench, when working, the electromagnet first adsorbs the object to be adsorbed onto the electrostatic adsorption device, and then the electrostatic adsorption device fixes the object to be adsorbed by electrostatic adsorption. The above-mentioned adsorption method can enhance the stability of adsorption, thereby solving the problem of poor mask effect caused by the unstable gap between the mask plate and the workbench. However, in the actual application of this scheme, if the plasma chemical vapor deposition equipment is used or stored in relatively humid air for a long time, it is very easy to cause the plasma chemical vapor deposition equipment to be damaged by moisture or short-circuit, thereby affecting the service life of the plasma chemical vapor deposition equipment. In order to solve the above problems, we have proposed a plasma chemical vapor deposition equipment workbench. Utility Model Content

[0004] In view of the deficiencies in the prior art, the utility model provides a plasma chemical vapor deposition equipment workbench, which solves the problems mentioned in the background technology.

[0005] The above technical objectives of the utility model are achieved through the following technical solutions:

[0006] A plasma chemical vapor deposition equipment workbench comprises: a placement box, the interior of which is movably sleeved with a placement plate, the top surface of which is fixedly connected with a plasma chemical vapor deposition equipment; a baffle plate, the baffle plate is movably sleeved inside the placement box, the left and right sides of the baffle plate and the bottom surface are both fixedly connected with sealing gaskets; an adjustment component, which is arranged inside the placement box and is used to adjust the position of the placement plate.

[0007] By adopting the above technical solution and setting an adjustment component, the adjustment component can adjust the position of the placement plate so that the placement plate can be moved out of the placement box, thereby making it convenient for staff to use the plasma chemical vapor deposition equipment on the top surface of the placement plate later.

[0008] Preferably, the adjustment component includes: two adjustment grooves, the two adjustment grooves are respectively opened on the bottom surface of the placement box, the top surface of the adjustment groove is fixedly connected with a screw slide, the top surface of the slider of the screw slide is fixedly connected to the bottom surface of the placement plate; two limit grooves, the two limit grooves are opened on the bottom surface of the placement box, the bottom surface of the placement plate is fixedly connected with two limit blocks, the limit blocks are slidably installed together with the limit grooves; a positioning member, the positioning member is arranged inside the placement box, and is used to position the baffle plate.

[0009] By adopting the above technical solution and providing a positioning piece, the positioning piece can position the baffle plate so that the baffle plate can be fixed inside the placement box.

[0010] Preferably, the positioning member comprises: two positioning grooves, the two positioning grooves are respectively opened on the left and right sides of the placement box, and the left and right sides of the baffle plate are fixedly connected with positioning blocks, and the positioning blocks are movably mounted together with the positioning grooves.

[0011] By adopting the above technical solution and setting up a placement box, when the staff fixes the baffle plate inside the placement box, the sealing gasket can seal the placement box and the baffle plate, thereby reducing the entry of humid gas into the interior of the placement box, thereby avoiding the plasma chemical vapor deposition equipment from being damaged by moisture or short-circuiting, and improving the service life of the plasma chemical vapor deposition equipment.

[0012] Preferably, a mounting groove is provided on the bottom surface of the positioning groove, and a driving motor is fixedly connected to the interior of the mounting groove.

[0013] By adopting the above technical solution and setting a screw slide, the slider of the screw slide can drive the placement plate to move, so that the plasma chemical vapor deposition equipment can be moved out of the placement box, thereby facilitating the staff to operate the plasma chemical vapor deposition equipment later.

[0014] Preferably, an adjusting rod is rotatably installed inside the positioning groove, the bottom end of the adjusting rod is fixedly connected to the top end of the driving shaft of the driving motor, an adjusting hole is opened on the top surface of the positioning block, and the adjusting rod is threadedly connected to the adjusting hole.

[0015] By adopting the above technical solution and setting a driving motor, the driving shaft of the driving motor can drive the adjusting rod to move. At this time, the rotating adjusting rod can drive the positioning block to move, so that the moving positioning block can drive the baffle plate to move, thereby facilitating the later adjustment of the position of the baffle plate inside the placement box.

[0016] Preferably, a sealing strip is fixedly connected to one side of the placement box, and supporting legs are fixedly connected to four corners of the bottom surface of the placement box.

[0017] By adopting the above technical solution, a limit block is provided, and the limit block is slidably installed inside the limit groove, so that the limit block can limit the placement plate.

[0018] In summary, the utility model mainly has the following beneficial effects:

[0019] By setting a placement box, when the staff fixes the baffle plate inside the placement box, the sealing gasket can seal the placement box and the baffle plate, thereby reducing the entry of humid gas into the interior of the placement box, thereby avoiding the plasma chemical vapor deposition equipment from being damaged by moisture or short-circuiting, and improving the service life of the plasma chemical vapor deposition equipment. By setting a screw slide, the slider of the screw slide can drive the placement plate to move, so that the plasma chemical vapor deposition equipment can be moved out of the placement box, thereby facilitating the staff to operate the plasma chemical vapor deposition equipment later. By setting a drive motor, the drive shaft of the drive motor can drive the adjustment rod to move. At this time, the rotating adjustment rod can drive the positioning block to move, so that the moving positioning block can drive the baffle plate to move, thereby facilitating the later adjustment of the position of the baffle plate inside the placement box. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a three-dimensional structural schematic diagram of the utility model;

[0021] Figure 2 It is a schematic diagram of the baffle structure of the utility model;

[0022] Figure 3 It is a schematic diagram of the placement box structure of the utility model;

[0023] Figure 4 It is a schematic diagram of the limit block structure of the utility model;

[0024] Figure 5 yes Figure 4 Schematic diagram of the locally enlarged structure of A in the middle.

[0025] Figure numerals: 1. placement box; 2. placement plate; 3. plasma chemical vapor deposition equipment; 4. baffle plate; 5. sealing gasket; 6. adjustment groove; 7. screw slide; 8. limit groove; 9. limit block; 10. positioning groove; 11. positioning block; 12. installation groove; 13. drive motor; 14. adjustment rod; 15. adjustment hole; 16. sealing strip; 17. support leg. DETAILED DESCRIPTION

[0026] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0027] refer to Figure 1 , Figure 2 , Figure 3 and Figure 4 A plasma chemical vapor deposition equipment workbench comprises a placement box 1, an internal movable sleeve of the placement box 1 is provided with a placement plate 2, a plasma chemical vapor deposition equipment 3 is fixedly connected to the top surface of the placement plate 2, a baffle plate 4 is provided inside the placement box 1, and a sealing gasket 5 is fixedly connected to the left and right sides and the bottom surface of the baffle plate 4, an adjustment component is arranged inside the placement box 1 for adjusting the position of the placement plate 2, the adjustment component comprises two adjustment grooves 6, the two adjustment grooves 6 are respectively opened on the bottom surface of the placement box 1, a screw slide 7 is fixedly connected to the top surface of the adjustment groove 6, and the top surface of the slider of the screw slide 7 is fixedly connected to the bottom surface of the placement plate 2 Together, two limit grooves 8 are provided on the bottom surface of the placement box 1, and two limit blocks 9 are fixedly connected to the bottom surface of the placement plate 2. The limit blocks 9 are slidably installed together with the limit grooves 8. A positioning piece is provided inside the placement box 1 for positioning the baffle plate 4. By setting the placement box 1, when the staff fixes the baffle plate 4 inside the placement box 1, the sealing gasket 5 can seal between the placement box 1 and the baffle plate 4, thereby reducing the entry of humid gas into the interior of the placement box 1, thereby avoiding the plasma chemical vapor deposition equipment 3 from being damaged by moisture or short-circuiting, and improving the service life of the plasma chemical vapor deposition equipment 3.

[0028] refer to Figure 2 , Figure 3 , Figure 4 and Figure 5The positioning member includes two positioning grooves 10, which are respectively arranged on the left and right sides of the placement box 1. The left and right sides of the baffle plate 4 are fixedly connected with positioning blocks 11, and the positioning blocks 11 are movably sleeved together with the positioning groove 10. The bottom surface of the positioning groove 10 is provided with a mounting groove 12, and the inside of the mounting groove 12 is fixedly connected with a driving motor 13. An adjusting rod 14 is rotatably installed inside the positioning groove 10, and the bottom end of the adjusting rod 14 is fixedly connected to the top end of the driving shaft of the driving motor 13. An adjusting hole 15 is provided on the top surface of the positioning block 11, and the outer circular wall surface of the adjusting rod 14 and the inner circular wall surface of the adjusting hole 15 are both provided with threads. The adjusting rod 14 and the adjusting hole 15 are threadedly connected together. A sealing strip 16 is fixedly connected to one side of the placement box 1, and the four corner positions of the bottom surface of the placement box 1 are fixedly connected with supporting legs 17. By setting a limit block 9, the limit block 9 is slidably installed in the limit groove 8, so that the limit block 9 can limit the placement plate 2.

[0029] Working principle: Please refer to Figure 1-Figure 5 As shown, when in use, by setting a screw slide 7, the slider of the screw slide 7 can drive the placement plate 2 to move, so that the plasma chemical vapor deposition equipment 3 can be moved out of the placement box 1, so as to facilitate the staff to operate the plasma chemical vapor deposition equipment 3 in the later stage, and by setting a drive motor 13, the drive shaft of the drive motor 13 can drive the adjustment rod 14 to move. At this time, the rotating adjustment rod 14 can drive the positioning block 11 to move, so that the moving positioning block 11 can drive the baffle plate 4 to move, so as to facilitate the later adjustment of the position of the baffle plate 4 inside the placement box 1.

[0030] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A plasma chemical vapor deposition equipment workbench, characterized in that: include: A placement box (1), wherein a placement plate (2) is movably sleeved inside the placement box (1), and a plasma chemical vapor deposition device (3) is fixedly connected to the top surface of the placement plate (2); A baffle plate (4), the baffle plate (4) being movably sleeved inside the placement box (1), and sealing pads (5) being fixedly connected to the left and right sides and the bottom surface of the baffle plate (4); An adjustment component is arranged inside the placement box (1) and is used to adjust the position of the placement plate (2).

2. A plasma chemical vapor deposition equipment workbench according to claim 1, characterized in that: The adjustment component comprises: Two adjustment grooves (6), the two adjustment grooves (6) are respectively arranged on the bottom surface of the placement box (1), the top surface of the adjustment grooves (6) is fixedly connected with a screw slide (7), and the top surface of the slider of the screw slide (7) is fixedly connected with the bottom surface of the placement plate (2); Two limiting grooves (8), both of which are arranged on the bottom surface of the placement box (1), and two limiting blocks (9) are fixedly connected to the bottom surface of the placement plate (2), and the limiting blocks (9) are slidably mounted together with the limiting grooves (8); A positioning member, the positioning member is arranged inside the placement box (1) and is used to position the baffle plate (4).

3. A plasma chemical vapor deposition equipment workbench according to claim 2, characterized in that: The positioning member comprises: Two positioning grooves (10), the two positioning grooves (10) are respectively arranged on the left and right sides of the interior of the placement box (1), and the left and right sides of the baffle plate (4) are fixedly connected with positioning blocks (11), and the positioning blocks (11) are movably sleeved together with the positioning grooves (10).

4. A plasma chemical vapor deposition equipment workbench according to claim 3, characterized in that: A mounting groove (12) is provided on the bottom surface of the positioning groove (10), and a driving motor (13) is fixedly connected to the interior of the mounting groove (12).

5. A plasma chemical vapor deposition equipment workbench according to claim 4, characterized in that: An adjusting rod (14) is rotatably mounted inside the positioning groove (10), the bottom end of the adjusting rod (14) is fixedly connected to the top end of the driving shaft of the driving motor (13), an adjusting hole (15) is formed on the top surface of the positioning block (11), and the adjusting rod (14) is threadedly connected to the adjusting hole (15).

6. The plasma chemical vapor deposition equipment workbench according to claim 1, characterized in that: A sealing strip (16) is fixedly connected to one side of the placement box (1), and support legs (17) are fixedly connected to the four corners of the bottom surface of the placement box (1).

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