Nitrogen charging oven with diversion function for wafer processing

By designing a nitrogen-filling oven with flow-driving function in the wafer drying device, combining the ratchet feeding mechanism and the large-diameter suction mechanism, the problem of unsmooth airflow in the existing device is solved, and efficient wafer drying and Safe operation process.

CN222528136UActive Publication Date: 2025-02-25JIANGSU SUXIN SEMICON CO LTD
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Patent Information

Application Number
CN202420763624.8
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2024-04-15
Publication Date
2025-02-25
Estimated Expiration
2034-04-15

AI Technical Summary

Technical Problem

The existing wafer drying device cannot effectively combine the drying structure with the nitrogen-filling structure, resulting in poor airflow transmission and slow oxygen discharge, which affects the wafer drying effect.

Method used

A nitrogen-filled oven with flow-guided function for wafer processing is designed, using a ratchet feeding mechanism and a large-diameter suction mechanism. Combined with the characteristic that the nitrogen density is less than oxygen, nitrogen is input from the top and gradually extrudes oxygen through Gas sensors monitor internal gas content.

Benefits of technology

It significantly accelerates the air discharge efficiency, ensures smooth gas flow during wafer drying, avoids oxygen residues affecting the drying effect, and improves operational safety and baking efficiency.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of wafer semiconductor processing, in particular to a nitrogen charging oven with a flow guide function for wafer processing, which comprises a nitrogen charging oven and ratchet wheel type feeding mechanisms horizontally arranged in the nitrogen charging oven. The ratchet wheel type feeding mechanism comprises a transmission rod, ratchet wheels, an outer wheel, pawls, a conveying belt and a motor, the ratchet wheels are installed at the two ends, located in the nitrogen charging oven, of the transmission rod, the outer wheels are arranged on the outer sides of the ratchet wheels in a sleeving mode, the pawls are arranged on the inner sides of the outer wheels, and the pawls and the ratchet wheels form ratchet wheel connection; according to the utility model, the problems in the prior art that the nitrogen charging branch pipes and the branch heating nets are overlapped up and down are solved, so that nitrogen can be pre-heated to a certain extent during transmission, the relative temperature of the nitrogen can be ensured, and on one hand, the damage of wafers caused by the influence of large temperature difference on baking during subsequent heating can be avoided; in addition, nitrogen can be better located on the upper portion through heating, and air is relatively and sufficiently extruded out.
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Description

Technical Field

[0001] The utility model relates to the technical field of wafer semiconductor processing, in particular to a nitrogen-filled oven with a flow-guiding function for wafer processing. Background Art

[0002] Wafer refers to the silicon wafer used to make silicon semiconductor circuits. Its original material is silicon. High-purity polysilicon is dissolved and mixed with silicon crystal seeds, and then slowly pulled out to form cylindrical single crystal silicon. After grinding, polishing and slicing, the silicon crystal rod is formed into a silicon wafer, that is, a wafer;

[0003] When electronic components are dried in an oven, the sealed or unsealed mounted devices on the surface may be severely damaged due to the overpressure of water vapor adsorbed in the air, or oxidized and damaged by oxygen in the air. In order to prevent such situations from happening, electronic components are usually stored in an oven with low relative humidity and low oxygen, which often requires the oven to be purged with dry gas, usually nitrogen.

[0004] Although the existing device can evaporate water vapor when drying wafers, it cannot combine the drying structure with the nitrogen filling structure through structural improvements; furthermore, the air in the existing device will be affected by the internal structure when exhausting, resulting in poor air flow transmission and slow oxygen exhaust, which can easily affect the wafer drying effect.

[0005] Therefore, in view of this, the existing structure and defects are studied and improved, and a nitrogen-filled oven with a diversion function for wafer processing is proposed, in order to achieve a more practical purpose. Utility Model Content

[0006] The utility model aims to provide a nitrogen-filled oven with a flow-guiding function for wafer processing, so as to solve the problems raised in the above-mentioned background technology.

[0007] To achieve the above-mentioned purpose, the utility model provides the following technical solutions: a nitrogen-filled oven with a diversion function for wafer processing, comprising a nitrogen-filled oven and a ratchet-type loading mechanism, wherein the ratchet-type loading mechanism is horizontally arranged inside the nitrogen-filled oven, and the ratchet-type loading mechanism comprises a transmission rod, a ratchet, an outer wheel, a pawl, a transmission belt and a motor, wherein the transmission rod is located inside the nitrogen-filled oven, ratchets are installed at both ends thereof, and the outer side of the ratchet is sleeved with an outer wheel, and a pawl is arranged on the inner side of the outer wheel to form a ratchet connection with the ratchet, the outer wall of the outer wheel is sleeved with a transmission belt, and one end of the transmission rod is extended and connected with a motor;

[0008] The inner wall of the nitrogen-filling oven is paved with heat-insulating cotton, the top wall of the groove end of the nitrogen-filling oven is provided with a sub-heating net, and the side wall of the groove end of the nitrogen-filling oven is installed with an air-filling mechanism, the air-filling mechanism comprises a nitrogen-filling channel, a nitrogen-filling branch pipe and a nitrogen-filling main pipe, one end of the nitrogen-filling channel close to the sub-heating net is connected to the nitrogen-filling branch pipe, and the other end of the nitrogen-filling channel is connected to the nitrogen-filling main pipe;

[0009] An air suction mechanism is arranged at the inner bottom of the nitrogen-filled oven, and a main heating net is laid at the rear side of the nitrogen-filled oven.

[0010] Further, the air suction mechanism includes a total air suction channel, a negative pressure fan, a sub-air suction channel, a limit plate and an air suction corresponding groove, a negative pressure fan is arranged on the outside of the total air suction channel, and the inside of the negative pressure fan is connected with the total air suction channel, the other end of the total air suction channel is connected with the sub-air suction channel, and the top of the sub-air suction channel is provided with an air suction corresponding groove, and the size of the air suction corresponding groove and the notch at the bottom of the nitrogen-filled oven match each other, and a limit plate is arranged on the top of the other end of the air suction channel;

[0011] A filter side screen is arranged on the outside of the nitrogen filling oven close to the negative pressure fan, a cabinet door is installed on the front side of the nitrogen filling oven, and a maintenance cover door is arranged on the outside of the nitrogen filling oven.

[0012] Furthermore, an operation panel is installed on the outer surface of the nitrogen-filled oven.

[0013] Furthermore, gas sensors are installed on the upper and lower side walls of the nitrogen-filled oven respectively.

[0014] Furthermore, the transmission rod forms a ratchet and pawl transmission structure through the ratchet and the outer wheel, and the ratchet and the pawl are meshed with each other, and the outer wheel and the transmission belt are in contact with each other.

[0015] Furthermore, the nitrogen charging channel, the nitrogen charging branch pipe and the nitrogen charging main pipe are interconnected, and the nitrogen charging branch pipes are arranged and distributed in a U shape, and the nitrogen charging branch pipes and the sub-heating network are arranged in parallel up and down.

[0016] The utility model provides a nitrogen-filled oven with a flow-guiding function for wafer processing, which has the following features:

[0017] Beneficial effects:

[0018] 1. The utility model utilizes the gas density characteristic that the density of nitrogen is less than that of oxygen, inputs nitrogen from the top, and gradually squeezes out oxygen from the bottom. With a large-caliber air intake mechanism, the air exhaust efficiency can be greatly accelerated. In addition, with a gas sensor, the internal gas content ratio is monitored, so that the operator can accurately control the internal situation.

[0019] 2. The utility model cooperates with the ratchet pawl transmission structure to enable the entire wafer to achieve unidirectional movement outward through transmission during loading, which can avoid high temperatures after drying and easy burns to operators when picking up the wafer. The ratchet pawl structure can combine automatic and manual methods without affecting the rotation direction of the motor to ensure safety during loading and unloading.

[0020] 3. The utility model cooperates with the upper and lower overlapping structures of the nitrogen filling branch pipe and the sub-heating network, so that the nitrogen can be subjected to a certain preheating treatment during transmission, and the relative temperature of the nitrogen can be guaranteed. On the one hand, it can avoid that the large temperature difference during subsequent heating affects the baking condition and causes damage to the wafer. In addition, the nitrogen can be better placed in the upper part by heating, and the air can be relatively fully squeezed out. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] The disclosure of the present invention will become easier to understand with reference to the accompanying drawings. It is easy for those skilled in the art to understand that these drawings are only used to illustrate the technical solution of the present invention and are not intended to limit the scope of protection of the present invention. In the drawings:

[0022] Figure 1 It is a right-side perspective structural diagram of a nitrogen-filled oven with a flow-guiding function for wafer processing according to the utility model;

[0023] Figure 2 It is a left-side perspective structural diagram of a nitrogen-filled oven with a flow-guiding function for wafer processing according to the utility model;

[0024] Figure 3 It is a bottom-up three-dimensional structural schematic diagram of a nitrogen-filled oven with a flow-guiding function for wafer processing according to the utility model;

[0025] Figure 4 It is a three-dimensional structural schematic diagram of an air suction mechanism of a nitrogen-filled oven with a flow-guiding function for wafer processing according to the utility model;

[0026] Figure 5 The utility model is a nitrogen-filled oven with a flow-guiding function for wafer processing. Figure 1 Schematic diagram of the local enlarged structure at point A in the middle.

[0027] In the figure: 1. Nitrogen charging oven; 101. Filter side screen; 102. Cabinet door; 103. Maintenance cover door; 104. Insulation cotton; 2. Suction mechanism; 201. Main suction channel; 202. Negative pressure fan; 203. Branch suction channel; 204. Limit plate; 205. Suction corresponding slot; 3. Operation panel; 4. Charging mechanism; 401. Nitrogen charging channel; 402. Nitrogen charging branch pipe; 403. Nitrogen charging main pipe; 5. Ratchet feeding mechanism; 501. Transmission rod; 502. Ratchet; 503. Outer wheel; 504. Ratchet; 505. Conveyor belt; 506. Motor; 6. Main heating network; 7. Gas sensor; 8. Branch heating network. DETAILED DESCRIPTION

[0028] The following will be combined with the drawings in the embodiments of the utility model to clearly and completely describe the technical solutions in the embodiments of the utility model. Obviously, the described embodiments are only part of the embodiments of the utility model, not all of the embodiments. Based on the embodiments in the utility model, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0029] See also Figure 1-3 The utility model provides a technical solution: a nitrogen-filled oven with a diversion function for wafer processing, comprising a nitrogen-filled oven 1 with an inner wall paved with heat-insulating cotton 104, a sub-heating net 8 provided on the top wall of the groove end of the nitrogen-filled oven 1, and a gas-filling mechanism 4 installed on the side wall of the groove end of the nitrogen-filled oven 1, the gas-filling mechanism 4 comprising a nitrogen-filling channel 401, a nitrogen-filling branch pipe 402 and a nitrogen-filling main pipe 403, the nitrogen-filling channel 401 is connected to the nitrogen-filling branch pipe 402 at one end close to the sub-heating net 8, and the other end of the nitrogen-filling channel 401 is connected to the nitrogen-filling main pipe 403;

[0030] An air suction mechanism 2 is provided at the inner bottom of the nitrogen filling oven 1, and a main heating net 6 is laid on the rear side of the nitrogen filling oven 1;

[0031] An operation panel 3 is installed on the outer surface of the nitrogen-filled oven 1;

[0032] Gas sensors 7 are respectively installed on the upper and lower side walls of the nitrogen-filled oven 1;

[0033] The nitrogen filling channel 401, the nitrogen filling branch pipe 402 and the nitrogen filling main pipe 403 are interconnected, and the nitrogen filling branch pipe 402 is arranged in a U shape, and the nitrogen filling branch pipe 402 and the sub-heating net 8 are arranged in parallel up and down; with the nitrogen filling branch pipe 402 and the sub-heating net 8 overlapping structure in the upper and lower positions, the nitrogen can be subjected to a certain preheating treatment during transmission, and the relative temperature of the nitrogen can be guaranteed. On the one hand, it can avoid that the temperature difference during subsequent heating affects the baking condition and causes damage to the wafer. In addition, the nitrogen can be better placed in the upper part by heating, and the air can be relatively fully squeezed out;

[0034] See also Figure 4 The utility model provides a technical solution: a nitrogen-filled oven with a flow-guiding function for wafer processing, comprising an air suction mechanism 2 including a total air suction channel 201, a negative pressure fan 202, a sub-air suction channel 203, a limit plate 204 and an air suction corresponding groove 205, the outside of the total air suction channel 201 is provided with a negative pressure fan 202, and the inside of the negative pressure fan 202 is connected with the total air suction channel 201, the other end of the total air suction channel 201 is connected with the sub-air suction channel 203, and the top of the sub-air suction channel 203 is provided with an air suction corresponding groove 205, and the sizes of the air suction corresponding groove 205 and the bottom notch of the nitrogen-filled oven 1 match each other, and a limit plate 204 is provided on the top of the other end of the air suction channel 203;

[0035] A filter side screen 101 is provided on the outside of the nitrogen filling oven 1 near the negative pressure fan 202, a cabinet door 102 is installed on the front side of the nitrogen filling oven 1, and a maintenance cover door 103 is provided on the outside of the nitrogen filling oven 1;

[0036] By taking advantage of the fact that the density of nitrogen is lower than that of oxygen, nitrogen is input from the top and oxygen is gradually squeezed out from the bottom. With the large-caliber air intake mechanism 2, the air exhaust efficiency can be greatly accelerated. In addition, with the gas sensor 7, the internal gas content ratio is monitored, so that the operator can accurately control the internal situation.

[0037] The bottom adopts an embedded suction corresponding groove 205 to ensure that the suction mechanism 2 and the bottom of the nitrogen-filled oven 1 are embedded, so that the structure of the connecting joint is stable, and it is not easy to leak during gas transmission, and the sealing is good; and in combination with the gauze of the gas outlet, impurities can be adsorbed and filtered when the gas is output;

[0038] See also Figure 5 The utility model provides a technical solution: a nitrogen-filled oven with a diversion function for wafer processing, comprising a nitrogen-filled oven 1 and a ratchet-type loading mechanism 5, wherein the ratchet-type loading mechanism 5 is horizontally arranged inside the nitrogen-filled oven 1, and the ratchet-type loading mechanism 5 comprises a transmission rod 501, a ratchet 502, an outer wheel 503, a pawl 504, a transmission belt 505 and a motor 506, wherein the transmission rod 501 is located inside the nitrogen-filled oven 1, and ratchet wheels 502 are installed at both ends thereof, and the outer side of the ratchet wheel 502 is sleeved with an outer wheel 503, and a pawl 504 is arranged on the inner side of the outer wheel 503, forming a ratchet connection with the ratchet wheel 502, and the outer wall of the outer wheel 503 is sleeved with a transmission belt 505, and one end of the transmission rod 501 is extended and connected with a motor 506;

[0039] The transmission rod 501 forms a ratchet and pawl transmission structure between the ratchet 502 and the outer wheel 503, and the ratchet 502 and the pawl 504 are meshed with each other, and the outer wheel 503 and the transmission belt 505 are in contact with each other;

[0040] With the transmission structure of the ratchet 502 and the pawl 504, the entire wafer can be driven during loading, and the one-way rotation locking structure of the ratchet can be used to achieve one-way movement outward, which can avoid the high temperature after drying, and the operator may be easily burned when picking it up. The ratchet and pawl structure can combine automatic and manual methods without affecting the rotation direction of the motor to ensure the safety during loading and unloading. When loading, the wafer plate can be placed on the top of the conveyor belt 505 by manual pushing, and with the assistance of the inner outer wheel 503 of the conveyor belt 505, it is also convenient to push the wafer plate inward.

[0041] Working principle: For this type of wafer processing, a nitrogen-filled oven with a diversion function is first used to collect the wafers to be processed onto a baking tray, and then the baking tray is placed on the upper surface of the conveyor belt 505, and then the baking tray is pushed inward to transport the baking tray inward, and then the cabinet door 102 is used to seal the working space of the nitrogen-filled oven 1, and then nitrogen is transported to the inside from the top nitrogen-filled branch pipe 402 through the nitrogen-filling main pipe 403 and the negative pressure fan 202 at the same time, and the air is squeezed downward with the negative pressure fan 202 and discharged through the filter side gauze 101, and when multiple groups of nitrogen-filled branch pipes 402 are output, the sub-heating nets 8 in the multiple groups of nitrogen-filled branch pipes 402 will be started to The output nitrogen is preheated, and in the process of inputting nitrogen to squeeze out the air, the nitrogen content in the nitrogen-filled oven 1 can be detected by the gas sensors 7 at the upper and lower ends. When the gas sensors 7 at the top and bottom detect that the content reaches a certain content, the nitrogen input control can be stopped, and the main heating net 6 at the rear side is started to heat and dry the entire device. After the heating and drying operation is completed and the standard for removal is met, the outer motor 506 can be controlled to drive the transmission rod 501 to rotate through the motor 506, so that the ratchet 502 rotates counterclockwise, and the ratchet 504 is driven to rotate by the ratchet 502, so that the outer wheel 503 gradually transfers the baking tray out, which is also convenient for observing the baking situation.

[0042] The above description is only a specific implementation method of the utility model, but the protection scope of the utility model is not limited to this. Any changes or substitutions that can be thought of by any technician familiar with the field within the technical scope disclosed by the utility model without creative work should be included in the protection scope of the utility model. Therefore, the protection scope of the utility model should be based on the protection scope defined in the claims.

Claims

1. A nitrogen-filled oven with a flow-guiding function for wafer processing, comprising a nitrogen-filled oven (1) and a ratchet-type loading mechanism (5), characterized in that: A ratchet-type feeding mechanism (5) is horizontally arranged inside the nitrogen-filling oven (1), and the ratchet-type feeding mechanism (5) comprises a transmission rod (501), a ratchet wheel (502), an outer wheel (503), a ratchet pawl (504), a transmission belt (505) and a motor (506). The transmission rod (501) is located inside the nitrogen-filling oven (1), and ratchet wheels (502) are installed at both ends thereof, and the outer side of the ratchet wheel (502) is sleeved with an outer wheel (503), and a ratchet pawl (504) is arranged on the inner side of the outer wheel (503) to form a ratchet connection with the ratchet wheel (502), and the outer wall of the outer wheel (503) is sleeved with a transmission belt (505), and one end of the transmission rod (501) is extended to be connected with a motor (506); The inner wall of the nitrogen-filling oven (1) is paved with heat-insulating cotton (104), the top wall of the groove end of the nitrogen-filling oven (1) is provided with a sub-heating net (8), and the side wall of the groove end of the nitrogen-filling oven (1) is installed with an air-charging mechanism (4), the air-charging mechanism (4) comprising a nitrogen-charging channel (401), a nitrogen-charging branch pipe (402) and a nitrogen-charging main pipe (403), one end of the nitrogen-charging channel (401) close to the sub-heating net (8) is connected to the nitrogen-charging branch pipe (402), and the other end of the nitrogen-charging channel (401) is connected to the nitrogen-charging main pipe (403); An air suction mechanism (2) is arranged at the inner bottom of the nitrogen filling oven (1), and a main heating net (6) is laid on the rear side of the nitrogen filling oven (1).

2. The nitrogen-filled oven with flow-guiding function for wafer processing according to claim 1, characterized in that: The air suction mechanism (2) comprises a total air suction channel (201), a negative pressure fan (202), a branch air suction channel (203), a limit plate (204) and an air suction corresponding groove (205); the negative pressure fan (202) is arranged on the outside of the total air suction channel (201), and the inside of the negative pressure fan (202) is connected with the total air suction channel (201); the other end of the total air suction channel (201) is connected with the branch air suction channel (203), and the top of the branch air suction channel (203) is provided with an air suction corresponding groove (205); the sizes of the air suction corresponding groove (205) and the bottom notch of the nitrogen filling oven (1) match each other; and the limit plate (204) is arranged on the top of the other end of the air suction channel (203); A filter side screen (101) is arranged on the outside of the nitrogen filling oven (1) close to the negative pressure fan (202), a cabinet door (102) is installed on the front side of the nitrogen filling oven (1), and a maintenance cover door (103) is arranged on the outside of the nitrogen filling oven (1).

3. The nitrogen-filled oven with flow-guiding function for wafer processing according to claim 1, characterized in that: An operation panel (3) is installed on the outer surface of the nitrogen-filled oven (1).

4. The nitrogen-filled oven with flow-guiding function for wafer processing according to claim 1, characterized in that: Gas sensors (7) are respectively installed on the upper and lower side walls of the nitrogen-filled oven (1).

5. The nitrogen-filled oven with a flow-guiding function for wafer processing according to claim 1, characterized in that: The transmission rod (501) forms a ratchet and pawl transmission structure through the ratchet (502) and the outer wheel (503), and the ratchet (502) and the pawl (504) are meshed with each other, and the outer wheel (503) and the transmission belt (505) are in contact with each other.

6. The nitrogen-filled oven with flow-guiding function for wafer processing according to claim 1, characterized in that: The nitrogen charging channel (401), the nitrogen charging branch pipe (402) and the nitrogen charging main pipe (403) are interconnected, and the nitrogen charging branch pipes (402) are arranged and distributed in a U shape, and the nitrogen charging branch pipes (402) and the sub-heating network (8) are arranged in parallel up and down.