Chamber air inlet structure and semiconductor process equipment

Abstract

The utility model provides a chamber air inlet structure and semiconductor process equipment, relates to the technical field of semiconductor processing, and aims to solve the problem that microwaves of a microwave module enter a semiconductor process chamber. The chamber air inlet structure is configured to be connected between a generation chamber and a process chamber of the microwave module and comprises a vent hole penetrating from top to bottom, and the axis of the vent hole comprises at least one of a broken line and an arc line. The chamber air inlet structure can effectively prevent microwaves of the microwave module from entering the semiconductor process chamber.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor processing, in particular to a chamber air intake structure and semiconductor process equipment. Background Art

[0002] In semiconductor processing equipment, plasma is generated by a microwave module. The microwave module includes a microwave source, a generating cavity and a waveguide, and the microwave source is connected to the generating cavity through a waveguide. If the UV (Ultraviolet) generated by the microwave module is irradiated on the wafer, it will damage the wafer; in addition, the normal working pressure of the microwave module is usually around 2T-8T, while the chamber pressure of the etching equipment is generally less than 2T. In order to meet the operation of the equipment, the pressure in the microwave module needs to be reduced to below 2T, but the existing air intake structure is difficult to achieve this function. Utility Model Content

[0003] The first purpose of the utility model is to provide a chamber air intake structure to solve the technical problem of microwaves of the existing microwave module entering into the semiconductor process chamber.

[0004] The chamber air intake structure provided by the utility model is configured to be connected between the generating chamber and the process chamber of the microwave module, and the chamber air intake structure includes a through vent hole, the vent hole connects the generating chamber and the process chamber, and the axis of the vent hole includes at least one of a broken line and an arc line.

[0005] The beneficial effects brought by the chamber air intake structure of the utility model are:

[0006] In a preferred technical solution, the vent hole is configured so that electromagnetic waves incident from one end of the vent hole are directly incident on the side wall of the vent hole.

[0007] In a preferred technical solution, the axis of the vent hole is a broken line, and the vent hole includes an inclined portion and a vertical portion;

[0008] A vertical projection of one opening of the vent hole is located outside the outline of another opening of the vent hole.

[0009] In a preferred technical solution, the end surfaces where the orifice contours at both ends of the vent hole are located are perpendicular to the vertical portion, the vent hole can be divided into two symmetrical parts by a vertical section, the contour lines of the vertical portion located on the vertical section are respectively a first vertical line and a second vertical line, the contour lines of the inclined portion located on the vertical section are respectively a first oblique line and a second oblique line, the first oblique line and the first vertical line intersect to form a first obtuse angle, the second oblique line and the second vertical line intersect to form a second obtuse angle, and the opening of the second obtuse angle faces the first obtuse angle;

[0010] The angle between the first oblique line and the end face where the aperture contour of the inclined portion is located is α, the distance between the corner point of the first obtuse angle and the end face where the aperture contour of the inclined portion is located is h, the line connecting the end point of the second vertical line located at the aperture of the vertical portion and the corner point of the first obtuse angle is the third oblique line, the angle between the third oblique line and the first vertical line is β, the apertures of the vertical portion and the inclined portion are both d, then h / tanα-d / sinα>h·tanβ.

[0011] In the preferred technical solution, the surfaces where the orifice contours at both ends of the vent are located are perpendicular to the vertical portion, the inverse tangent value of the ratio of the diameter of the vent to the minimum depth of the vertical portion is β, the complementary angle between the axis of the inclined portion and the axial angle of the chamber air intake structure is α, the projection length of the inclined portion on the axial line of the chamber air intake structure is h, and the apertures of the vertical portion and the inclined portion are both d, h / tanα-d / sinα>h·tanβ.

[0012] In a preferred technical solution, the inclined portion and the vertical portion are arranged sequentially along the air intake direction.

[0013] In a preferred technical solution, the diameter of the ventilation holes is 1.72 mm to 2.03 mm; and / or the plurality of ventilation holes are evenly distributed in the circumferential direction of the chamber air intake structure, and the circumferential direction is the circumferential direction of the central axis of the chamber air intake structure.

[0014] In a preferred technical solution, the number of the vents is 8.

[0015] In a preferred technical solution, the chamber air intake structure includes a retaining frame and an air intake member, the retaining frame is configured to be installed on the chamber upper cover, the air intake member is detachably connected to the retaining frame, and the air vent is provided on the air intake member.

[0016] In a preferred technical solution, the retaining frame is annular, and the inner circumferential surface of the retaining frame is provided with a mounting opening and a first inner flange, the mounting opening extends along the axial direction of the retaining frame, the first inner flange extends along the circumferential direction of the retaining frame, and the mounting opening and the first inner flange are arranged along the circumferential direction of the retaining frame; the outer circumferential surface of the air intake member is provided with a lug, and the lug is configured to pass through the mounting opening and be able to move along the upper surface of the first inner flange so that the air intake member can rotate relative to the retaining frame.

[0017] In a preferred technical solution, the inner circumferential surface of the retaining frame is further provided with a second inner flange, the second inner flange and the first inner flange are arranged along the circumferential direction of the retaining frame, and the upper surface of the second inner flange is higher than the upper surface of the first inner flange.

[0018] In a preferred technical solution, a recessed portion is provided on the end of the upper surface of the first inner flange away from the mounting opening, and the recessed portion cooperates with the lug.

[0019] In a preferred technical solution, the air inlet member is provided with a first outer flange, and the upper surface of the first outer flange is configured to be adjacent to the upper surface of the first inner flange.

[0020] In a preferred technical solution, a first alignment mark is provided on the bottom surface of the air inlet member, and the first alignment mark portion is configured to be aligned with a second alignment mark provided on the chamber upper cover.

[0021] In a preferred technical solution, the retaining frame is further provided with a positioning pin, and the positioning pin is configured to cooperate with the chamber upper cover or the microwave module.

[0022] In a preferred technical solution, the outer peripheral surface of the retaining frame is further provided with a second outer flange, and the second outer flange is configured to be sealed and connected to the bottom of the microwave module.

[0023] The second purpose of the utility model is to provide a semiconductor process equipment to solve the technical problem of microwaves of a microwave module entering into a semiconductor process chamber.

[0024] The semiconductor process equipment provided by the utility model includes:

[0025] A microwave module, the microwave module comprising a microwave source, a generating cavity and a waveguide, the microwave source being connected to the generating cavity via the waveguide;

[0026] a process chamber; and,

[0027] The above-mentioned chamber air intake structure is arranged between the generating chamber and the process chamber.

[0028] The beneficial effects brought by the chamber air intake structure and semiconductor process equipment of the utility model are:

[0029] By providing an air vent whose axis includes at least one of a broken line and an arc line in a chamber air intake structure connected to the microwave module and the chamber upper cover, the microwaves generated by the microwave module cannot pass through the air vent in a straight line, thereby significantly reducing or even eliminating the damage of the microwaves of the microwave module to the wafer. BRIEF DESCRIPTION OF THE DRAWINGS

[0030] In order to more clearly illustrate the technical solutions in the embodiments or background technologies of the present invention, the drawings required for use in the embodiments or background technology descriptions are briefly introduced below. Obviously, the drawings described below are merely embodiments of the present invention, and ordinary technicians in this field can obtain other drawings based on the provided drawings without paying any creative work.

[0031] Figure 1 It is a structural schematic diagram of a process chamber and a microwave module mentioned in the related art;

[0032] Figure 2 It is a structural schematic diagram of a process chamber and a microwave module mentioned in the related art;

[0033] Figure 3 A schematic diagram of the structure of the chamber air intake structure and the process chamber provided in the first embodiment of the utility model;

[0034] Figure 4 for Figure 3 A partial enlarged view of

[0035] Figure 5 A cross-sectional view of an air intake member in a chamber air intake structure provided in Embodiment 1 of the utility model;

[0036] Figure 6 A partial cross-sectional view of the air intake member at the vent hole in the chamber air intake structure provided in the first embodiment of the utility model;

[0037] Figure 7 A top view of an air intake member in a chamber air intake structure provided in Embodiment 1 of the utility model;

[0038] Figure 8 A bottom view of the air intake member in the chamber air intake structure provided in the first embodiment of the utility model;

[0039] Fig. 9 A schematic diagram of the structure of a retainer in a chamber air intake structure provided in Embodiment 1 of the utility model;

[0040] Fig.10 A top view of a retainer in a chamber air intake structure provided in Embodiment 1 of the utility model;

[0041] Fig.11 A cross-sectional view of a retaining frame in a chamber air intake structure provided in Embodiment 1 of the present utility model.

[0042] Description of reference numerals:

[0043] 100-process chamber; 110-chamber cover;

[0044] 200-microwave module; 210-microwave source; 220-generating cavity; 230-waveguide;

[0045] 300-air inlet; 310-air vent; 311-inclined portion; 313-vertical portion; 320-lug; 330-first alignment mark; 340-first outer flange;

[0046] 400-cage; 410-mounting opening; 420-first inner flange; 430-second inner flange; 440-recessed portion; 450-second outer flange; 460-positioning pin;

[0047] 600-Gas ratio adjustment gasket. DETAILED DESCRIPTION

[0048] Figure 1 It is a structural schematic diagram of a process chamber and a microwave module mentioned in the related art; Figure 2 Schematic diagram of the structure of a process chamber and a microwave module mentioned in the related art; Figure 1 and Figure 2 As shown, in the related art, a high-pressure function is achieved by setting a gas ratio adjustment gasket 600 between the microwave module 200 and the chamber upper cover 110. Generally speaking, the diameter of the through hole on the gas ratio adjustment gasket 600 is 5 mm. With such an inner hole, the porosity is low, for example, only 5% of the area can flow gas. Since the etching rate loss is proportional to the blocking area, the etching rate loss of this solution is relatively large. Moreover, the gas ratio adjustment gasket 600 is located below the microwave module 200. Before removal, the microwave module 200 needs to be removed first, and its removal and maintenance are difficult.

[0049] In order to make the above-mentioned purposes, features and advantages of the utility model more obvious and easy to understand, the specific embodiments of the utility model are described in detail below in conjunction with the accompanying drawings. It should be understood that the specific embodiments described here are only used to explain the utility model and are not used to limit the utility model.

[0050] Embodiment 1:

[0051] Figure 3 A schematic diagram of the structure of the chamber air intake structure and the process chamber provided in the first embodiment of the utility model; Figure 4 for Figure 3 A partial enlarged view of Figure 5 A cross-sectional view of an air intake member in a chamber air intake structure provided in Embodiment 1 of the present utility model; Figure 3-Figure 5 As shown, the chamber air intake structure provided in the first embodiment of the utility model is configured to be connected between the generating chamber 220 of the microwave module 200 and the process chamber, and the chamber air intake structure includes a through vent hole 310, and the vent hole 310 connects the generating chamber 220 and the process chamber 100, and the axis of the vent hole 310 includes at least one of a broken line and an arc line.

[0052] By providing an air vent 310 whose axis includes at least one of a broken line and an arc line in the chamber air intake structure connected to the generating cavity 220 of the microwave module 200 and the process chamber 100, the microwaves generated by the microwave module 200 cannot pass through the air vent 310 in a straight line, thereby significantly reducing or even eliminating the damage of the microwaves of the microwave module 200 to the wafer.

[0053] Figure 6 A partial cross-sectional view of the air intake member at the vent hole in the chamber air intake structure provided in the first embodiment of the utility model; Figure 5 and Figure 6 As shown, preferably, the vent hole 310 is configured so that the electromagnetic waves injected from one end of the vent hole 310 are directly incident on the side wall of the vent hole 310 .

[0054] The vent hole 310 is arranged so that the electromagnetic waves entering from one end of the vent hole 310 are directly projected onto the side wall of the vent hole 310, so that the electromagnetic waves, especially the microwaves generated by the microwave system, cannot directly pass through the two openings of the vent hole 310, thereby eliminating the total amount of microwaves directly passing through the chamber air intake structure. Even if microwaves enter the semiconductor process chamber 100, they are reflected microwaves, which significantly reduces the energy of the microwaves entering the semiconductor process chamber 100 and significantly weakens the damage to the wafer.

[0055] like Figure 5 and Figure 6 As shown, preferably, the axis of the vent hole 310 is a broken line, and the vent hole 310 includes an inclined portion 311 and a vertical portion 313; along the radial direction of the chamber air intake structure, the vertical projection of one opening of the vent hole 310 is outside the contour of the other opening contour.

[0056] Specifically, in this embodiment, each vent hole 310 in this embodiment includes only one vertical portion 313 and one inclined portion 311. Therefore, the vertical projection of one opening of the vent hole 310 is outside the outline of the vertical projection of another opening of the vent hole 310, that is, the two openings of the vent hole 310 do not overlap in the vertical projection. Moreover, the vent hole 310 includes the vertical portion 313 and the inclined portion 311, so the microwaves entering the vent hole 310 from any end will be directly emitted from the other end. Therefore, the total amount of microwaves emitted into the process chamber 100 can be reduced, reducing the damage to the wafer.

[0057] In this embodiment, along the radial direction of the chamber air intake structure, the line connecting any position of one orifice contour of the vent 310 and any position of the other orifice contour is located on one side of the boundary area between the inclined portion 311 and the vertical portion 313. Specifically, the set of lines connecting any position of one orifice contour of the vent 310 and a point on the other orifice contour can be an oblique conical side surface stretched along the inclination angle. There are countless points on the other orifice contour, and accordingly, countless oblique conical side surfaces can be generated. All of these countless oblique cones are on the same side of the boundary area between the inclined portion 311 and the vertical portion 313 in the radial direction of the chamber air intake structure, for example, all oblique cones are on the radial outside of the boundary area or on the radial inside of the boundary area.

[0058] by Figure 6 As shown in the example, Figure 6 What is shown is a partial enlarged view of the vent. In the figure, the junction area between the inclined portion 311 and the vertical portion 313 is a Y-shape inclined to the upper right, and the open part of the Y-shape. The leftmost end of the illustrated junction area is the location of the points where the two β angles are opposite to each other. In the figure, the positions where the two dimension leaders of the obliquely marked dimension d are connected to the area of ​​the section line respectively form a triangular area with a larger top and a smaller bottom with the right end of the edge of the hole of the vertical portion 313 in the figure, that is, the area surrounded by the thick lines in the figure. The set of lines connecting any position of the hole of the inclined portion 311 and the right end of the edge of the hole of the vertical portion 313, that is, the oblique cone, is within the area of ​​the triangle. The rightmost area of ​​the triangle, that is, the thick oblique line on the right side, is also on the left side of the leftmost end of the illustrated junction area. The oblique cone formed by the line connecting any position of the opening contour of the inclined portion 311 and other positions of the opening contour of the vertical portion 313 is only further to the left than the triangle surrounded by the above-mentioned thick lines, so it is also on the left side of the leftmost end of the intersection area in the figure. Figure 6 The content shown in the figure is based on the fact that any position of the orifice contour of the vent hole 310 and any position of the orifice contour of the other hole are both on the left side of the leftmost end of the junction area, so they are both on the left side of the junction area. That is, along the radial direction of the chamber air intake structure, they are outside the junction area. Of course, in another implementation, any position of the orifice contour of the vent hole 310 and any position of the orifice contour of the other hole can also be located at the radial inner side of the chamber air intake structure at the junction area between the inclined portion 311 and the vertical portion 313.

[0059] By configuring the vent 310 to be a combination of the inclined portion 311 and the vertical portion 313, the angle variation of the airflow in the small space of the vent 310 can be reduced, so as to reduce the energy loss of the airflow and ensure the airflow speed. Moreover, by using the solid part of the boundary area of ​​the inclined portion 311 and the vertical portion 313 on one side to block the line connecting any position of one hole contour of the vent 310 and any position of the other hole contour, microwaves can be prevented from being directly emitted from one end of the vent 310 to the other end of the vent 310, thereby preventing microwaves from directly passing through the vent 310 and being emitted into the semiconductor process chamber 100, thereby reducing damage to the wafer.

[0060] In another implementation, the axis of the vent 310 may be an arc, such as a circular arc, as long as the electromagnetic wave is not directly emitted from one end of the vent 310 to the other end. Alternatively, the axis of the vent 310 may be a combination of a broken line and an arc, which may also achieve the same technical effect.

[0061] like Figure 6 As shown, preferably, the end surfaces where the orifice contours at both ends of the vent hole 310 are located are perpendicular to the vertical portion 313, and the vent hole 310 can be divided into two symmetrical parts by a vertical section, and the contour lines of the vertical portion 313 located in the vertical section are respectively the first vertical line and the second vertical line, and the contour lines of the inclined portion 311 located in the vertical section are respectively the first oblique line and the second oblique line, the first oblique line and the first vertical line intersect to form a first obtuse angle, the second obtuse line and the second vertical line intersect to form a second obtuse angle, the opening of the second obtuse angle faces the first obtuse angle, and the angle of the first obtuse angle is the angle of α in the figure + 90°;

[0062] The angle between the first oblique line and the end face where the aperture contour of the inclined portion 311 is located is α, the distance between the corner point of the first obtuse angle and the end face where the aperture contour of the inclined portion 311 is located is h, the line connecting the end point of the second vertical line located at the aperture of the vertical portion 313 and the corner point of the first obtuse angle is the third oblique line, the angle between the third oblique line and the first vertical line is β, the apertures of the vertical portion 313 and the inclined portion 311 are both d, then h / tanα-d / sinα>h·tanβ.

[0063] in, Figure 6The cut surface is the vertical section, and the first vertical line and the second vertical line are the vertical lines on the left and right sides of the vertical portion 313 in the figure, respectively, and the first oblique line and the second oblique line are the oblique lines on the left and right sides of the inclined portion 311 in the figure. The angle between the first oblique line and the end face where the orifice contour of the inclined portion 311 is located is α, and d / sinα is the maximum size of the orifice of the inclined portion 311 on the end face. h / tanα is the projection length of the length of the inclined portion 311 on the end face. The angle between the third oblique line and the first vertical line is β, so h·tanβ is the projection length of the aperture of the vertical portion 313 on the end face where the orifice contour of the inclined portion 311 is located after conversion of h / H in the figure.

[0064] By setting the dimensions and angles of the vertical portion 313 and the inclined portion 311 to h / tanα-d / sinα>h·tanβ, the entity of the opening area of ​​the first obtuse angle can be used to block the microwaves emitted from one end of the vent 310 to prevent the microwaves from directly passing through the vent 310 in a straight line and entering the semiconductor process chamber 100.

[0065] like Figure 6 As shown, preferably, the surfaces where the orifice contours at both ends of the vent hole 310 are located are perpendicular to the vertical portion 313, the arc tangent value of the ratio of the diameter of the vent hole 310 to the minimum depth of the vertical portion 313 is β, the complementary angle between the axis of the inclined portion 311 and the axial angle of the chamber air intake structure is α, the projection length of the inclined portion 311 on the axial line of the chamber air intake structure is h, and the apertures of the vertical portion 313 and the inclined portion 311 are both d, and h / tanα-d / sinα>h·tanβ.

[0066] The minimum depth of the vertical portion 313 is Figure 6 , which is the distance H between the left end of the boundary area between the vertical portion 313 and the inclined portion 311 and the orifice of the vertical portion 313; and the angle between the axis of the inclined portion 311 and the axial direction of the chamber air intake structure, and the angle between the axis of the inclined portion 311 and the orifice of the inclined portion 311, are complementary angles, that is, the angle between the axis of the inclined portion 311 and the orifice of the inclined portion 311 is α; the projection of the inclined portion 311 on the axial direction of the chamber air intake structure is Figure 6 The h in.

[0067] By setting the dimensions and angles of the vertical portion 313 and the inclined portion 311 to h / tanα-d / sinα>h·tanβ, the entity of the opening area of ​​the first obtuse angle can be used to block the microwaves emitted from one end of the vent 310 to prevent the microwaves from directly passing through the vent 310 in a straight line and entering the semiconductor process chamber 100.

[0068] like Figure 5 and Figure 6 As shown, preferably, the inclined portion 311 and the vertical portion 313 are arranged in sequence along the air intake direction.

[0069] That is, in this embodiment, the inclined portion 311 is located at the upper portion of the vent hole 310, and the vertical portion 313 is located at the lower portion of the vent hole 310. More specifically, along the direction in which the gas passes, the inclined portion 311 gradually approaches the center of the chamber air intake structure.

[0070] The inclined portion 311 and the vertical portion 313 are arranged in sequence along the air intake direction, that is, the gas leaves the vent hole 310 in the axial direction of the chamber air intake structure, which is the same as the original air intake direction, so as to better distribute the gas evenly into the chamber, thereby broadening the application scope of the chamber air intake structure.

[0071] In another implementation, the vertical portion 313 may be located at an upper portion of the vent hole 310 and the inclined portion 311 may be located at a lower portion of the vent hole 310 .

[0072] Figure 7 A top view of an air intake member in a chamber air intake structure provided in Embodiment 1 of the utility model; Figure 8 A bottom view of the air intake member in the chamber air intake structure provided in the first embodiment of the utility model; Figure 7 and Figure 8 As shown, preferably, the diameter of the vent hole 310 is 1.72 mm to 2.03 mm; and / or, the plurality of vent holes 310 are evenly distributed in the circumferential direction of the chamber air intake structure, and the circumferential direction is the circumferential direction of the central axis of the chamber air intake structure.

[0073] If the diameter of the vent hole 310 is selected to be 2.3 mm, the equipment structure cannot meet the size requirement. When the diameter is selected to be 2.1 mm, the wall thickness of the air inlet member 300 cannot be met, and the rounded corners of the inclined portion 311 and the end face of the chamber air inlet structure cannot be achieved. When the diameter is selected to be 2 mm, the structure can block ultraviolet rays. Distributing multiple vent holes 310 axially in the chamber air inlet structure can make the airflow more evenly distributed on the lower surface of the chamber air inlet structure when leaving the vent holes 310, so as to improve the uniformity of gas delivery to the semiconductor process chamber 100.

[0074] like Figure 7 and Figure 8 As shown, preferably, the number of the vent holes 310 is 8.

[0075] Selecting eight vent holes 310 can make the porosity of the chamber air intake structure reach 16.6%, which is a significant improvement compared to related technologies and can effectively reduce the loss of etching rate.

[0076] By using the vent holes 310 of the above size and number, when the pressure of the semiconductor process chamber 100 is 0.1T to 1.5T, the pressure of the microwave system can be within the normal operating range of 2T to 8T, meeting the high-pressure use requirements of the microwave system.

[0077] like Figure 4 As shown, preferably, the chamber air intake structure includes a retaining frame 400 and an air intake member 300 , the retaining frame 400 is configured to be installed on the chamber upper cover 110 , the air intake member 300 is detachably connected to the retaining frame 400 , and the air vent 310 is provided on the air intake member 300 .

[0078] In this embodiment, a stepped hole is provided at the bottom of the microwave module 200 , and the retaining frame 400 is installed between the chamber upper cover 110 and a larger diameter section of the stepped hole.

[0079] The air inlet member 300 is detachably connected to the retaining frame 400. If the air inlet member 300 needs to be maintained, the air inlet member 300 and the retaining frame 400 need to be separated, while the retaining frame 400 is still located on the chamber cover 110, thereby improving the convenience of maintenance.

[0080] Fig. 9 A schematic diagram of the structure of a retainer in a chamber air intake structure provided in Embodiment 1 of the utility model; Fig.10 A top view of a retainer in a chamber air intake structure provided in Embodiment 1 of the present utility model; Figure 7 and Fig. 9 , Fig.10 As shown, preferably, the retaining frame 400 is annular, and the inner circumferential surface of the retaining frame 400 is provided with a mounting port 410 and a first inner flange 420, the mounting port 410 extends along the axial direction of the retaining frame 400, the first inner flange 420 extends along the circumferential direction of the retaining frame 400, and the mounting port 410 and the first inner flange 420 are arranged along the circumferential direction of the retaining frame 400; the outer circumferential surface of the air intake member 300 is provided with a lug 320, and the lug 320 is configured to pass through the mounting port 410 and be able to move along the upper surface of the first inner flange 420 so that the air intake member 300 can rotate relative to the retaining frame 400.

[0081] Specifically, the retainer 400 is roughly annular, and the mounting opening 410 on the inner circumference of the retainer 400 is two notches. Correspondingly, the first inner flange 420 is also divided into two sections, wherein the mounting opening 410 is not necessarily a groove provided on the inner circumference of the retainer 400, but the mounting opening 410 is recessed outward relative to the first inner flange 420, and a notch is formed between the ends of the first inner flange 420. The first inner flange 420 and the mounting opening 410 are spaced apart.

[0082] The installation opening 410 extends along the axial direction of the retainer 400, which means that if the end faces of the retainer 400 are facing upward and downward respectively, the gap serving as the installation opening 410 is along the up-down direction, that is, it penetrates along the axial direction of the retainer 400. The first inner flange 420 extends along the circumferential direction of the retainer 400, which means that the length direction of the first inner flange 420 extends along the axial direction of the retainer 400, and the first inner flange 420 protrudes inwardly along the radial direction of the retainer 400. The two sections of the first inner flange 420 are symmetrically arranged along the center of the retainer 400, and the two installation openings 410 are also symmetrically arranged along the center of the retainer 400. The lug 320 on the outer circumferential surface of the air inlet member 300 is arc-shaped, and correspondingly, the installation opening 410 is also an arc-shaped gap, and the size of the installation opening 410 is slightly larger than the size of the lug 320, so that the lug 320 can pass through the installation opening 410.

[0083] By providing a mounting opening 410 and a first inner flange 420 on the inner circumferential surface of the retaining frame 400, and providing a lug 320 on the outer circumferential surface of the air intake member 300, the lug 320 can be used to pass through the mounting opening 410, and then the air intake member 300 can be rotated relative to the retaining frame 400 so that the lug 320 can rest on the first inner flange 420, thereby achieving axial support of the air intake member 300 by the retaining frame 400. As a result, the air intake member 300 can be disassembled and assembled by simply moving the air intake member 300 axially and rotating it circumferentially relative to the retaining frame 400, thereby significantly improving the convenience of loading and unloading.

[0084] In this embodiment, two first inner flanges 420 and mounting openings 410 are alternately provided. In fact, if the inner circumference of the first inner flange 420 and the outer circumference of the air intake member 300 can be directly matched radially, only one section of the first inner flange 420 and one mounting opening 410 can be provided, wherein the cross section of the first inner flange 420 is rectangular. Correspondingly, a lug 320 is provided on the air intake member 300. Axial positioning is achieved by the lug 320 and the first inner flange 420. If the air intake member 300 has a tendency to rotate in a vertical plane relative to the retaining frame 400, the inner circumference of the first inner flange 420 and the outer circumference of the air intake member 300 can cooperate to suppress the movement tendency.

[0085] like Fig. 9 and Fig.10 As shown, preferably, the inner circumferential surface of the retaining frame 400 is further provided with a second inner flange 430 , and the second inner flange 430 and the first inner flange 420 are arranged along the circumferential direction of the retaining frame 400 , and the upper surface of the second inner flange 430 is higher than the upper surface of the first inner flange 420 .

[0086] Specifically, in this embodiment, the inner circumferential surface of the retainer 400 is sequentially arranged with a mounting opening 410, a first inner flange 420, a second inner flange 430, a mounting opening 410, a first inner flange 420 and a second inner flange 430. The first inner flange 420 and the second inner flange 430 are disposed on both sides of the mounting opening 410 in the circumferential direction.

[0087] Since the upper surface of the second inner flange 430 is higher than the first inner flange 420, when the lug 320 rotates on the first inner flange 420, the second inner flange 430 can limit the extreme position of the movement of the lug 320, so that the lug 320 does not need to rotate a long distance to stop, and it is also avoided that the lug 320 rotates again to above the installation port 410 and causes the lug 320 to fall from the installation port 410, thereby reducing unnecessary labor required for the installation process and improving installation efficiency.

[0088] like Fig. 9 and Fig.10 As shown, preferably, a recessed portion 440 is provided at one end of the upper surface of the first inner flange 420 away from the installation opening 410 , and the recessed portion 440 cooperates with the lug 320 .

[0089] In this embodiment, the profile of the recessed portion 440 may be consistent with that of the lug 320, and the size may be equal to or slightly larger than that of the lug 320 to accommodate the bottom of the lug 320. The recessed portion 440 is disposed at one end of the upper surface of the first inner flange 420 away from the mounting opening 410, which means that the recessed portion 440 is located at one end of the first inner flange 420 adjacent to the second inner flange 430. That is, the side wall at one end of the second inner flange 430 may position the lug 320 located in the recessed portion 440.

[0090] By providing the recessed portion 440, when the lug 320 is rotated to the end of the first inner flange 420 that faces away from the mounting opening 410, the bottom of the lug 320 can be embedded in the recessed portion 440, and the lug 320 can be positioned in two opposite rotational directions by means of the recessed portion 440 to prevent the lug 320 from falling out of the recessed portion 440.

[0091] like Figure 7 and Fig. 9 , Fig.10 Preferably, the air inlet member 300 is provided with a first outer flange 340 , and an upper surface of the first outer flange 340 is configured to be adjacent to a lower surface of the first inner flange 420 .

[0092] In this embodiment, the first outer flange 340 is an annular flange disposed on the lower portion of the outer circumference of the air inlet member 300. The distance between the upper surface of the first outer flange 340 and the lower surface of the lug 320 is equal to the thickness of the first inner flange 420, or in other words, equal to the height of the first inner flange 420.

[0093] By setting the first outer flange 340 and making the upper surface of the first outer flange 340 adjacent to the lower surface of the first inner flange 420, the first outer flange 340 and the lug 320 are used to clamp the first inner flange 420 to achieve positioning of the air intake member 300 in both the upward and downward directions, thereby preventing the air intake member 300 from shaking during the operation of the equipment and interfering with the stability of the airflow.

[0094] like Figure 8 As shown, preferably, a first alignment mark 330 is provided on the bottom surface of the air inlet member 300 , and the first alignment mark 330 is configured to be aligned with a second alignment mark (not shown) provided on the chamber cover 110 .

[0095] Specifically, in this embodiment, the first alignment mark 330 can be a notch set on the bottom surface of the air inlet piece 300. The notch starts from the edge of the bottom surface of the air inlet piece 300 and extends radially along the air inlet piece 300. It only needs to serve as a marking and does not need to extend too long to the center of the bottom surface of the air inlet piece 300.

[0096] The second alignment mark on the bottom surface of the chamber cover 110 may be a recessed portion 440 disposed on the chamber cover 110 or a mark distinguished by color.

[0097] By setting a first alignment mark 330 on the bottom surface of the air inlet member 300, which cooperates with the second alignment mark set on the chamber cover 110, when assembling the air inlet member 300 on the retaining frame 400, when observing from the bottom of the retaining frame 400, it is sufficient to align the first alignment mark 330 with the second alignment mark, and there is no need for the radially overlapping structures of the air inlet member 300 and the retaining frame 400 to collide, thereby reducing the loss of related parts during the assembly process, which not only shortens the assembly time and improves the assembly efficiency, but also improves the service life of the parts.

[0098] like Fig.11 As shown, preferably, the retaining frame 400 is further provided with a positioning pin 460 , and the positioning pin 460 is configured to cooperate with the chamber upper cover 110 or the microwave module 200 .

[0099] Specifically, in this embodiment, the positioning pin 460 is disposed at the lower end of the retaining frame 400 , the positioning pin 460 may be a cylindrical pin, and a positioning hole is disposed at the bottom of the chamber upper cover 110 .

[0100] By providing the positioning pins 460 , the alignment accuracy between the retaining frame 400 and the microwave module 200 can be improved, thereby improving the positioning accuracy of the air inlet hole of the air inlet member 300 relative to the inner wall of the semiconductor process chamber 100 , so as to improve the gas uniformity in the process chamber 100 .

[0101] Fig.11A cross-sectional view of a retainer in a chamber air intake structure provided in Embodiment 1 of the present utility model; Figure 9-11 As shown, preferably, the outer circumferential surface of the retaining frame 400 is further provided with a second outer flange 450 , and the second outer flange 450 is configured to be sealed and connected to the bottom of the microwave module 200 .

[0102] Specifically, in this embodiment, the outer peripheral surface of the second outer flange 450 is an arc-shaped surface recessed inwardly. By setting this arc-shaped surface, an O-ring (not shown in the figure) can be set between the outer peripheral surface of the second outer flange 450 and the larger diameter section of the step hole at the bottom of the microwave module 200 to achieve a sealed connection between the second outer flange 450 and the bottom of the microwave module 200.

[0103] Embodiment 2:

[0104] Embodiment 2 also provides a semiconductor process equipment, including a microwave module 200, a process chamber 100 and a chamber air intake structure, wherein the microwave module 200 includes a microwave source 210, a generating cavity 220 and a waveguide 230, and the microwave source 210 is connected to the generating cavity 220 via the waveguide 230; the chamber air intake structure is arranged between the generating cavity 220 and the process chamber 100.

[0105] By providing the above chamber air intake structure in the semiconductor process equipment, the semiconductor process equipment accordingly has all the advantages of the above chamber air intake structure, which will not be described one by one here.

[0106] Although the utility model is disclosed as above, the utility model is not limited thereto. Any person skilled in the art can make various changes and modifications without departing from the spirit and scope of the utility model. Therefore, the protection scope of the utility model shall be subject to the scope defined by the claims.

[0107] Finally, it should be noted that, in this article, relational terms such as first and second, etc. are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Moreover, the term "comprises" or any other variant thereof is intended to cover non-exclusive inclusion, so that a process, method, article or device including a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to such process, method, article or device. In the absence of further restrictions, the elements defined by the sentence "comprises a ..." do not exclude the presence of other identical elements in the process, method, article or device including the elements.

[0108] In the above embodiments, the descriptions of directions such as “upper” and “lower” are all based on the drawings.

[0109] The above description of the disclosed embodiments enables professionals in the field to implement or use the utility model. Various modifications to these embodiments will be apparent to professionals in the field, and the general principles defined herein can be implemented in other embodiments without departing from the spirit or scope of the utility model.

[0110] Therefore, the present invention will not be limited to the embodiments shown herein but will be accorded the widest scope consistent with the principles and novel features disclosed herein.

Claims

1. A chamber air intake structure, configured to be connected between a generating chamber (220) of a microwave module (200) and a process chamber (100), characterized in that: The chamber air intake structure includes a through vent hole (310), the vent hole (310) connects the generating chamber (220) and the process chamber (100), and the axis of the vent hole (310) includes at least one of a broken line and an arc line.

2. The chamber air intake structure according to claim 1, characterized in that: The vent hole (310) is configured so that electromagnetic waves incident from one end of the vent hole (310) are all directly incident on the side wall of the vent hole (310).

3. The chamber air intake structure according to claim 2, characterized in that: The axis of the vent hole (310) is a broken line; the vent hole (310) comprises an inclined portion (311) and a vertical portion (313); and a vertical projection of an opening of the vent hole (310) is located outside the contour of another opening of the vent hole (310).

4. The chamber air intake structure according to claim 3, characterized in that: The end surfaces of the hole contours at both ends of the vent hole (310) are perpendicular to the vertical portion (313), the vent hole (310) can be divided into two symmetrical parts by a vertical section, the contour lines of the vertical portion (313) located on the vertical section are respectively a first vertical line and a second vertical line, the contour lines of the inclined portion (311) located on the vertical section are respectively a first oblique line and a second oblique line, the first oblique line and the first vertical line intersect to form a first obtuse angle, the second oblique line and the second vertical line intersect to form a second obtuse angle, and the opening of the second obtuse angle faces the first obtuse angle; The angle between the first oblique line and the end face where the aperture contour of the inclined portion (311) is located is α, the distance between the corner point of the first obtuse angle and the end face where the aperture contour of the inclined portion (311) is located is h, the line connecting the end point of the second vertical line located at the aperture of the vertical portion (313) and the corner point of the first obtuse angle is the third oblique line, the angle between the third oblique line and the first vertical line is β, the apertures of the vertical portion (313) and the inclined portion (311) are both d, and h / tanα-d / sinα>h·tanβ is satisfied.

5. The chamber air intake structure according to claim 3, characterized in that: The surfaces where the hole contours at both ends of the vent hole (310) are located are perpendicular to the vertical portion (313), the arctangent value of the ratio of the diameter of the vent hole (310) to the minimum depth of the vertical portion (313) is β, the complementary angle between the axis of the inclined portion (311) and the axial angle of the chamber air intake structure is α, the projection length of the inclined portion (311) on the axial line of the chamber air intake structure is h, and the apertures of the vertical portion (313) and the inclined portion (311) are both d, and h / tanα-d / sinα>h·tanβ.

6. The chamber air intake structure according to claim 4 or 5, characterized in that: The inclined portion (311) and the vertical portion (313) are arranged in sequence along the air intake direction.

7. The chamber air intake structure according to claim 1, characterized in that: The diameter of the ventilation hole (310) is 1.72 mm to 2.03 mm; and / or the plurality of ventilation holes (310) are evenly distributed in the circumferential direction of the chamber air intake structure, and the circumferential direction is the circumferential direction of the central axis of the chamber air intake structure.

8. The chamber air intake structure according to claim 7, characterized in that: The number of the ventilation holes (310) is 8.

9. The chamber air intake structure according to any one of claims 1 to 5 or claim 7 or 8, characterized in that: The chamber air intake structure comprises a retaining frame (400) and an air intake member (300), wherein the retaining frame (400) is configured to be installed on a chamber upper cover (110), the air intake member (300) is detachably connected to the retaining frame (400), and the air vent (310) is provided on the air intake member (300).

10. The chamber air intake structure according to claim 9, characterized in that: The retaining frame (400) is annular, and the inner circumferential surface of the retaining frame (400) is provided with a mounting opening (410) and a first inner flange (420), the mounting opening (410) extends along the axial direction of the retaining frame (400), and the first inner flange (420) extends along the circumferential direction of the retaining frame (400), and the mounting opening (410) and the first inner flange (420) are arranged along the circumferential direction of the retaining frame (400); the outer circumferential surface of the air intake member (300) is provided with a lug (320), and the lug (320) is configured to pass through the mounting opening (410) and be able to move along the upper surface of the first inner flange (420) so that the air intake member (300) can rotate relative to the retaining frame (400).

11. The chamber air intake structure according to claim 10, characterized in that: The inner circumferential surface of the retaining frame (400) is also provided with a second inner flange (430), and the second inner flange (430) and the first inner flange (420) are arranged along the circumferential direction of the retaining frame (400), and the upper surface of the second inner flange (430) is higher than the upper surface of the first inner flange (420).

12. The chamber air intake structure according to claim 10 or 11, characterized in that: A recessed portion (440) is provided at one end of the upper surface of the first inner flange (420) away from the installation opening (410), and the recessed portion (440) cooperates with the lug (320).

13. The chamber air intake structure according to claim 10 or 11, characterized in that: The air inlet member (300) is provided with a first outer flange (340), and the upper surface of the first outer flange (340) is configured to be adjacent to the lower surface of the first inner flange (420).

14. The chamber air intake structure according to claim 9, characterized in that: A first alignment mark (330) is provided on the bottom surface of the air inlet member (300), and the first alignment mark (330) is configured to be aligned with a second alignment mark provided on the chamber upper cover (110).

15. The chamber air intake structure according to claim 9, characterized in that: The retaining frame (400) is also provided with a positioning pin (460), and the positioning pin (460) is configured to cooperate with the chamber upper cover (110) or the microwave module (200).

16. The chamber air intake structure according to claim 9, characterized in that: The outer peripheral surface of the retaining frame (400) is also provided with a second outer flange (450), and the second outer flange (450) is configured to be sealed and connected to the bottom of the microwave module (200).

17. A semiconductor process equipment, characterized in that: include: A microwave module (200), the microwave module (200) comprising a microwave source (210), a generating cavity (220) and a waveguide (230), the microwave source (210) being connected to the generating cavity (220) via the waveguide (230); a process chamber (100); and, The chamber air intake structure according to any one of claims 1 to 16, wherein the chamber air intake structure is arranged between the generating chamber (220) and the process chamber (100).

Images