Silicon wafer battery piece edge covering equipment

Abstract

The utility model discloses edge covering equipment for a silicon wafer battery piece, which comprises a positioning station for adjusting the posture of the silicon wafer battery piece in a horizontal plane; the chamfering and edge covering station is used for carrying out edge covering on the chamfered position of the silicon wafer battery piece; the long edge wrapping station is used for wrapping the long edge of the silicon wafer battery piece; the short edge wrapping station is used for wrapping the short edge of the silicon wafer battery piece; adsorption structures are adopted between the positioning station and the chamfering and edge covering station, between the chamfering and edge covering station and the long edge covering station, and between the long edge covering station and the short edge covering station to adsorb silicon wafers and battery pieces for transferring; the posture of the silicon wafer battery piece is adjusted through the positioning station so that the silicon wafer battery piece can be located at the preset position, then the silicon wafer battery piece is adsorbed and sequentially transferred between the stations through the transferring mechanisms, chamfering and edge covering of the long edge and the short edge are carried out, edge covering of the edge of the silicon wafer battery piece is achieved, meanwhile, reliability, accuracy and stability of edge covering are effectively guaranteed, and consistency is good.

Description

Technical Field

[0001] The utility model relates to the technical field of solar photovoltaic cell production equipment, in particular to silicon cell edge wrapping equipment. Background Art

[0002] In the manufacturing process of photovoltaic silicon wafer cells, coating the edges of the silicon wafer cells with ink is a necessary step before electroplating.

[0003] The ink coating on the edge of silicon wafer and cell is usually achieved by applying ink around the edge with a dispensing head. Not only is the speed slow, but the ink output and the final ink size formed on the edge are difficult to meet the precision requirements. The edge coating can also be achieved by linearly contacting the ink coating roller with the edge of the silicon wafer and cell, which greatly improves the efficiency compared to the dispensing method.

[0004] In the prior art, due to the deviation of silicon wafers and solar cells during transportation and the shape errors of the silicon wafers and solar cells themselves, it is very easy to cause uneven ink coating or even partial inking failure during ink coating. Utility Model Content

[0005] In order to solve the above problems, the present application provides a silicon wafer and cell edge wrapping device with a reasonable structure, so as to realize the edge wrapping of all circumferential edges of the silicon wafer and cell, and effectively ensure the reliability and accuracy of the edge wrapping with good consistency.

[0006] The technical solution adopted by the utility model is as follows:

[0007] A silicon wafer cell edge wrapping device, comprising:

[0008] Positioning station, to adjust the posture of silicon wafer and solar cell in the horizontal plane;

[0009] The chamfering and edging station is used to perform edging on the chamfers of silicon wafers and solar cells;

[0010] The long edge wrapping station wraps the long edges of the silicon wafer and solar cell;

[0011] The short edge hemming station is used to hem the short edges of silicon wafers and solar cells;

[0012] Adsorption structures are used between the positioning station and the chamfering and edging station, between the chamfering and edging station and the long side edging station, and between the long side edging station and the short side edging station to adsorb the silicon wafers and cells for transfer.

[0013] As a further improvement of the above technical solution:

[0014] The chamfering and hemming station, the long side hemming station and the short side hemming station are arranged on the three sides of the U-shape to form a U-shaped layout; a corner transfer station is arranged at the corner between the chamfering and hemming station and the long side hemming station, and a transfer and distance adjustment station is arranged at the corner between the long side hemming station and the short side hemming station.

[0015] A transfer station is arranged before the chamfering and hemming station and between the positioning station; it also includes a linear transfer mechanism 1, which adsorbs the silicon wafer battery cell on the positioning station and rotates it 90 degrees and then places it on the transfer station.

[0016] The structure of the positioning station is as follows: it includes an XY bidirectional slide, a rotating disk is installed on the top surface of the XY bidirectional slide, and a supporting adsorption platform is installed on the top surface of the rotating disk; it also includes a visual system located above the supporting adsorption platform.

[0017] The structure of the linear transfer mechanism 1 is as follows: it includes a linear drive component, a transfer seat is installed on the side of the linear drive component, a rotating component is installed at the bottom of the transfer seat, a bracket is installed on the bottom of the rotating component, and a suction cup for adsorbing silicon wafers and battery cells is installed on the bottom of the bracket.

[0018] The silicon wafers and solar cells are transported and loaded between the transfer station and the chamfering and edging station, and between the chamfering and edging station and the corner transfer station via a second linear transfer mechanism; the silicon wafers and solar cells are transported and loaded between the corner transfer station and the long side edging station, and between the long side edging station and the transfer and distance adjustment station via a third linear transfer mechanism; the silicon wafers and solar cells are transported and loaded between the transfer and distance adjustment station and the short side edging station, and between the short side edging station and the rear unloading mechanism via a fourth linear transfer mechanism.

[0019] The linear transfer mechanism 2, the linear transfer mechanism 3 and the linear transfer mechanism 4 have the same structure, and all of them perform linear transfer after adsorbing from the bottom surface of the silicon wafer and battery cell; the structure of the linear transfer mechanism 2 is: it includes a moving guide mechanism installed on the side of the frame, and a moving seat is slidably mounted on the moving guide mechanism, and a support is installed on the moving seat through a jacking driving power, and the support is located above the top of the moving seat, and the top surface of the support adsorbs the silicon wafer and battery cell.

[0020] The corner transfer station absorbs the silicon wafer and battery cell and then rotates horizontally 90°, and the transfer and distance adjustment station absorbs the silicon wafer and battery cell and then rotates horizontally 180°; the axial direction of the chamfering ink roller in the chamfering and hemming station, the axial direction of the long side ink roller in the long side hemming station, and the axial direction of the short side ink roller in the short side hemming station are respectively arranged along the conveying direction.

[0021] The corner transfer station includes a rotating drive component 1, a rotating frame arranged in a cross-shaped structure is installed at the bottom end of the rotating drive component 1, and a suction cup for adsorbing silicon wafers and battery sheets is installed on the bottom surface of the end of the rotating frame 1;

[0022] The transfer and distance adjustment station includes two rotating drive components, and two rotating frames arranged in a cross-shaped structure are installed at the bottom of the second rotating drive component. Distance adjustment driving power is installed at both ends of the rotating frame. The distance adjustment driving power is provided with two output ends that move towards or away from each other and are respectively installed with distance adjustment frames. A suction cup for adsorbing silicon wafers and battery cells is installed on the bottom surface of a single distance adjustment frame.

[0023] The chamfering and hemming stations, the long side hemming stations and the short side hemming stations all include two groups of hemming mechanisms arranged at intervals. The structure of a single group of hemming mechanisms is as follows: it includes a base, on which vertical seats are installed at intervals, a rotating shaft driven by a rotating transmission assembly is installed between the vertical seats on both sides, an ink roller is mounted on the rotating shaft, and an ink cartridge is arranged correspondingly below the ink roller; an inverted L-shaped vertical plate is installed on the single-side vertical seat, a micrometer is spirally installed on the vertical plate, a floating knife seat is floatingly installed below the vertical plate via an elastic member, and a scraper is installed between the floating knife seats on both sides via a knife holder; the downward end of the micrometer abuts against the top surface of the floating knife seat.

[0024] Compared with the prior art, the utility model has the following beneficial effects:

[0025] The utility model has a compact layout and is easy to use. The posture of the silicon wafer battery sheet is adjusted by the positioning station to make it located at a preset position, and then each group of transfer mechanisms is adsorbed and sequentially transferred between each station to perform chamfering, long edge and short edge hemming. While realizing the hemming of all circumferential edges of the silicon wafer battery sheet, the reliability, accuracy and stability of the hemming are effectively guaranteed, and the consistency is good.

[0026] The utility model also has the following advantages:

[0027] Each group of transfer mechanisms uses an adsorption structure to adsorb silicon wafers and solar cells, effectively preventing the position shift of the silicon wafers and solar cells during the transfer and transportation process, helping to ensure the accuracy and stability of the hemming at each hemming station. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a schematic diagram of the layout between various workstations of the utility model.

[0029] Figure 2 It is a structural schematic diagram of the positioning station of the utility model.

[0030] Figure 3 It is a structural schematic diagram of a linear transfer mechanism 1 of the utility model.

[0031] Figure 4 It is a structural schematic diagram of the second linear transfer mechanism of the utility model.

[0032] Figure 5 It is a structural schematic diagram of the chamfering and hemming station of the utility model.

[0033] Figure 6 It is a structural schematic diagram of the corner transfer station of the utility model.

[0034] Figure 7 It is a structural schematic diagram of the long side hemming station of the utility model.

[0035] Figure 8 It is a structural schematic diagram of the transfer and distance adjustment station of the utility model.

[0036] Fig. 9 It is a structural schematic diagram of the short side hemming station of the utility model.

[0037] Fig.10 It is a structural schematic diagram of the hemming mechanism of the utility model.

[0038] Among them: 1. Loading mechanism; 2. Positioning station; 3. Transfer station; 4. Chamfering and edging station; 5. Corner transfer station; 6. Long side edging station; 7. Transfer and distance adjustment station; 8. Short side edging station; 9. Unloading mechanism; 10. Silicon wafer battery cell; 11. Linear transfer mechanism 1; 12. Linear transfer mechanism 2; 13. Linear transfer mechanism 3; 14. Linear transfer mechanism 4;

[0039] 21. XY bidirectional slide; 22. Rotating plate; 23. Support adsorption table; 24. Vision system;

[0040] 40. Base; 41. Scraper; 42. Chamfered ink roller; 43. Rotating assembly 1; 44. Ink cartridge; 45. Stand; 46. Floating knife seat; 47. Elastic member; 48. Stand plate; 49. Micrometer; 411. Knife holder; 421. Rotating shaft;

[0041] 51. Rotation drive assembly 1; 52. Rotation frame 1;

[0042] 61. Long side ink roller; 62. Rotating component 2;

[0043] 71. Rotation drive assembly 2; 72. Rotation frame 2; 73. Pitch adjustment drive power; 74. Pitch adjustment frame;

[0044] 81. Short side ink roller;

[0045] 111. Linear drive assembly; 112. Transfer seat; 113. Rotation assembly; 114. Bracket; 121. Lifting drive power; 122. Moving seat; 123. Moving guide mechanism; 124. Support. DETAILED DESCRIPTION

[0046] The specific implementation of the present utility model is described below in conjunction with the accompanying drawings.

[0047] like Figure 1As shown, the silicon wafer cell edge wrapping equipment of this embodiment includes:

[0048] Positioning station 2, adjusting the posture of the silicon wafer cell 10 in a horizontal plane;

[0049] The chamfering and edging station 4 is used to perform edging on the chamfered corners of the silicon wafer cell 10;

[0050] The long edge wrapping station 6 wraps the long edges of the silicon wafer cell 10;

[0051] The short edge hemming station 8 is used to hem the short edges of the silicon wafer cell 10;

[0052] Adsorption structures are used between the positioning station 2 and the chamfering and edging station 4, between the chamfering and edging station 4 and the long side edging station 6, and between the long side edging station 6 and the short side edging station 8 to adsorb the silicon wafer battery cell 10 for transfer.

[0053] In this embodiment, the posture of the silicon wafer battery cell 10 is adjusted by positioning station 2 so that it is located at a preset position, and then each group of transfer mechanisms adsorbs it and sequentially transfers it between each station to perform chamfering, long edge and short edge hemming, thereby achieving hemming of all circumferential edges of the silicon wafer battery cell 10.

[0054] In this embodiment, each group of transfer mechanisms uses an adsorption structure to adsorb the silicon wafer battery cell 10, which effectively prevents the position of the silicon wafer battery cell 10 from shifting during the transfer and transportation process, and helps to ensure the accuracy and stability of the hemming at each hemming station.

[0055] The chamfering and hemming station 4, the long side hemming station 6, and the short side hemming station 8 are arranged on the three sides of the U-shape, forming a U-shaped layout. The overall layout is compact, reasonable, and occupies a small area. A corner transfer station 5 is arranged at the corner between the chamfering and hemming station 4 and the long side hemming station 6, and a transfer and distance adjustment station 7 is arranged at the corner between the long side hemming station 6 and the short side hemming station 8.

[0056] In this embodiment, each edge wrapping station forms an overall U-shaped layout, combined with the layout of the corner transfer station 5 and the transfer and distance adjustment station 7 at the corner to timely adjust the posture of the silicon wafer battery cell 10, effectively ensuring the smooth transfer and edge wrapping of the silicon wafer battery cell 10.

[0057] Of course, in actual use, the chamfering and edging station 4, the long side edging station 6, and the short side edging station 8 can also be arranged in a linear layout; and an adjustment station for adjusting the posture of the silicon wafer cell 10 can be arranged between each edging station according to actual needs.

[0058] A transfer station 3 is arranged before the chamfering and hemming station 4 and between the positioning station 2 .

[0059] In this embodiment, the transfer station 3 serves as a temporary storage for the silicon wafer battery cells 10.

[0060] It also includes a linear transfer mechanism 11, which absorbs the silicon wafer battery cell 10 on the positioning station 2 and rotates it 90 degrees and then places it on the transfer station 3.

[0061] In this embodiment, the transfer station 3 realizes the connection of different flow and adsorption modes between the linear transfer mechanism 1 11 and the linear transfer mechanism 2 12 .

[0062] In the present embodiment, the linear transfer mechanism 11 is used for the connection and transfer of the positioning station 2. In conjunction with the use of the positioning station 2, the linear transfer mechanism 11 mainly adopts the structure of upper adsorption and transfer; the linear transfer mechanism 2 12 and the subsequent linear transfer mechanism 3 13 and the linear transfer mechanism 4 14 are used in conjunction with the connection of the edge wrapping, and mainly adopt the structure of lower adsorption and transfer.

[0063] like Figure 2 As shown, the structure of the positioning station 2 is: including an XY bidirectional slide 21, a rotating disk 22 is installed on the top surface of the XY bidirectional slide 21, and a supporting adsorption platform 23 is installed on the top surface of the rotating disk 22; it also includes a visual system 24 located above the supporting adsorption platform 23.

[0064] In this embodiment, combined with the image acquisition of the visual system 24, the XY bidirectional slide 21 and the rotating disk 22 work to drive the silicon wafer battery cell 10 on the supporting adsorption platform 23 to move in the X and Y directions and rotate in the horizontal plane, thereby adjusting the silicon wafer battery cell 10 to a preset posture and position, which is convenient for the adsorption and transfer of the rear linear transfer mechanism 11.

[0065] In this embodiment, the silicon wafer cell 10 can be loaded and placed on the supporting adsorption platform 23 of the positioning station 2 via the external loading mechanism 1 .

[0066] like Figure 3 As shown, the structure of the linear transfer mechanism 11 is: it includes a linear drive component 111, a transfer seat 112 is installed on the side of the linear drive component 111, a rotating component 113 is installed at the bottom of the transfer seat 112, a bracket 114 is installed on the bottom surface of the rotating component 113, and a suction cup for adsorbing the silicon wafer battery cell 10 is installed on the bottom surface of the bracket 114.

[0067] In this embodiment, after the linear transfer mechanism 11 absorbs the silicon wafer battery cell 10 at the positioning station 2, the rotating assembly 113 works to rotate the silicon wafer battery cell 10 90° and then places it at the transfer station 3.

[0068] exist Figure 3In the embodiment shown, the transfer seat 112 of the linear transfer mechanism 11 can be an inverted T-shaped structure, one end of the bottom surface of the transfer seat 112 is installed with a bracket 114 via a rotating assembly 113, and the other end of the bottom surface of the transfer seat 112 is directly installed with the bracket 114. In actual use, only the end with the bracket 114 is used to load materials to the positioning station 2, and the end with the rotating assembly 113 is used to unload materials from the positioning station 2; during one action of the linear transfer mechanism 11, the two ends act separately to improve efficiency.

[0069] In actual use, according to actual action requirements, a driving force for lifting up and down can be added to the transfer seat 112 in the linear transfer mechanism 11.

[0070] The silicon wafer battery cells 10 are transported and transferred between the transfer station 3 and the chamfering and edging station 4, and between the chamfering and edging station 4 and the corner transfer station 5 via the second linear transfer mechanism 12; the silicon wafer battery cells 10 are transported and transferred between the corner transfer station 5 and the long side edging station 6, and between the long side edging station 6 and the transfer and distance adjustment station 7 via the third linear transfer mechanism 13; the silicon wafer battery cells 10 are transported and transferred between the transfer and distance adjustment station 7 and the short side edging station 8, and between the short side edging station 8 and the rear unloading mechanism 9 via the fourth linear transfer mechanism 14.

[0071] In this embodiment, three stop points can be set for the linear transfer mechanism 12 in the linear moving direction, corresponding to the transfer station 3, the chamfering and hemming station 4, and the corner transfer station 5 respectively. When the linear transfer mechanism 12 is in the adsorption state, the chamfering and hemming station 4 hems the silicon wafer battery cell 10.

[0072] The linear transfer mechanism 3 13 and the linear transfer mechanism 4 14 may also be arranged in the same manner as the linear transfer mechanism 2 12 .

[0073] The second linear transfer mechanism 12 , the third linear transfer mechanism 13 , and the fourth linear transfer mechanism 14 have the same structure, and all of them perform linear transfer after adsorbing from the bottom surface of the silicon wafer battery cell 10 .

[0074] like Figure 4 As shown, the structure of the linear transfer mechanism 12 is as follows: it includes a moving guide mechanism 123 installed on the side of the frame, a moving seat 122 is slidably mounted on the moving guide mechanism 123, a support 124 is installed on the moving seat 122 via a lifting driving power 121, the support 124 is located above the top of the moving seat 122, and the top surface of the support 124 adsorbs the silicon wafer battery cell 10.

[0075] In this embodiment, the transfer station 3 can be the initial stop position of the linear transfer mechanism 12, that is, after the linear transfer mechanism 11 adsorbs the silicon wafer battery cell 10 at the positioning station 2, it is transferred to the initial stop position of the linear transfer mechanism 12 to adsorb the silicon wafer battery cell 10, thereby realizing the transfer and connection of the silicon wafer battery cell 10 between the linear transfer mechanism 11 and the linear transfer mechanism 2 12.

[0076] In this embodiment, the moving seat 122 moves along the moving guide mechanism 123 to achieve linear transfer, and cooperates with the lifting driving power 121 to complete the edge wrapping, transfer and connection of the silicon wafer battery cell 10.

[0077] In this embodiment, the lifting driving power 121 can be an existing linear driving power such as a cylinder.

[0078] like Figure 6 As shown, the corner transfer station 5 includes a rotation drive assembly 51, a rotation frame 52 arranged in a cross-shaped structure is installed at the bottom end of the rotation drive assembly 51, and a suction cup for adsorbing the silicon wafer battery cell 10 is installed on the bottom surface of the end of the rotation frame 52.

[0079] like Figure 8 As shown, the transfer and distance adjustment station 7 includes a rotating drive component 71, and a rotating frame 72 arranged in a cross-shaped structure is installed at the bottom end of the rotating drive component 71. The ends of the rotating frame 72 are installed with distance adjustment driving power 73. The distance adjustment driving power 73 is provided with two output ends that move towards or away from each other and are respectively installed with distance adjustment frames 74. The bottom surface of a single distance adjustment frame 74 is installed with a suction cup for adsorbing silicon wafers and battery cells 10.

[0080] In the present embodiment, the transfer and distance adjustment station 7 can not only drive the silicon wafer battery cell 10 to rotate in the horizontal plane through the operation of the rotation drive component 2 71, but also adjust the distance between two silicon wafer battery cells 10 through the operation of the distance adjustment drive power 73, so as to facilitate the simultaneous hemming of the two silicon wafer battery cells 10 by the same group of short edge ink rollers 81 in the subsequent short edge hemming station 8.

[0081] The distance adjustment driving power 73 can be a dual-output linear power component such as an existing clamping finger cylinder.

[0082] The corner transfer station 5 absorbs the silicon wafer battery cell 10 and then rotates horizontally 90°, and the transfer and distance adjustment station 7 absorbs the silicon wafer battery cell 10 and then rotates horizontally 180°; the axial direction of the chamfering ink roller 42 in the chamfering and hemming station 4, the axial direction of the long side ink roller 61 in the long side hemming station 6, and the axial direction of the short side ink roller 81 in the short side hemming station 8 are respectively arranged along the conveying direction, effectively ensuring the smooth and smooth connection between the working processes.

[0083] The chamfering and hemming station 4, the long side hemming station 6, and the short side hemming station 8 all include two sets of hemming mechanisms arranged at intervals, such as Fig.10 As shown, the structure of a single-group hemming mechanism can be: comprising a base 40, on which stand seats 45 are installed at intervals, a rotating shaft 421 driven to rotate by a rotating transmission assembly is installed between the stand seats 45 on both sides, an ink roller is mounted on the rotating shaft 421, and an ink cartridge 44 is arranged correspondingly below the ink roller; an inverted L-shaped stand plate 48 is installed on each of the single-side stand seats 45, a micrometer 49 is spirally installed on the stand plate 48, a floating knife seat 46 is floatingly installed below the stand plate 48 via an elastic member 47, and a scraper 41 is installed between the floating knife seats 46 on both sides via a knife holder 411; the downward end of the micrometer 49 abuts against the top surface of the floating knife seat 46; in actual use, the actual relative position of the floating knife seat 46 relative to the stand plate 48 can be adjusted by rotating the micrometer 49, the spacing distance of the scraper 41 on the floating knife seat 46 relative to the ink roller can be adjusted, and then the thickness of the ink layer on the ink roller can be adjusted via the scraper 41 to meet the hemming requirements of different ink thicknesses on silicon wafers and cells.

[0084] According to the use requirements of the workstations, corresponding ink rollers are mounted on the rotating shaft 421 in the chamfering and hemming workstation 4 , the long edge hemming workstation 6 , and the short edge hemming workstation 8 , and corresponding scrapers 41 are arranged on the tool holder 411 .

[0085] exist Figure 5 In the illustrated embodiment, the chamfering and edging station 4 includes chamfering ink rollers 42 arranged at the four corners on both sides of the silicon wafer cell 10. The chamfering ink rollers 42 can be respectively mounted on the two ends of the same rotating shaft 421. The chamfering ink rollers 42 are driven to rotate by a rotating component 43, and corresponding scrapers 41 are also spaced apart above the chamfering ink rollers 42.

[0086] exist Figure 7 In the illustrated embodiment, the long side hemming station 6 includes long side ink rollers 61 arranged on both sides of the long sides of the silicon wafer battery cell 10. A single long side ink roller 61 is sleeved on the corresponding rotating shaft 421. The long side ink roller 61 is driven to rotate by the rotating component 2 62. A corresponding scraper can also be arranged above the long side ink roller 61.

[0087] exist Fig. 9 In the illustrated embodiment, the short edge hemming station 8 includes short edge ink rollers 81 arranged on both sides of the short edges of two silicon wafer cells 10. A single short edge ink roller 81 is sleeved on a corresponding rotating shaft 421. The short edge ink roller 81 is driven to rotate by a rotating transmission assembly, and a corresponding scraper is arranged above the short edge ink roller 81.

[0088] The chamfering and hemming station 4, the long edge hemming station 6, and the short edge hemming station 8 in this embodiment can also be set with reference to the existing hemming mechanism, such as the disclosed structure in the existing public patent (application number: 2023204381261, application date: 2023.03.09, name: silicon wafer hemming device). Of course, while the corresponding edges are hemmed by the rotation of the ink roller, a driving mechanism for moving toward and away from the ink roller can also be set. For example, the two bases 40 in the hemming station are driven by the driving mechanism to move toward or away from each other, so that they can approach the silicon wafer battery cell 10 from far to near before hemming, and move away from the silicon wafer battery cell 10 after hemming, effectively ensuring the smoothness of the hemming action.

[0089] The utility model realizes the hemming of all circumferential edges of a silicon wafer and a solar cell, and effectively ensures the reliability, accuracy and stability of the hemming with good consistency.

[0090] The various embodiments in this specification are described in a progressive manner, and each embodiment focuses on the differences from other embodiments. The same or similar parts between the various embodiments can be referenced to each other.

[0091] The above description is an explanation of the utility model, not a limitation of the utility model. The scope of the utility model is defined by the claims. Any form of modification can be made within the protection scope of the utility model.

Claims

1. A silicon wafer solar cell edge wrapping device, characterized in that: include: A positioning station (2) is used to adjust the posture of the silicon wafer battery cell (10) in a horizontal plane; A chamfering and edging station (4) is used to perform edging on the chamfered corners of the silicon wafer battery cell (10); A long edge wrapping station (6) is used to wrap the long edges of the silicon wafer battery cell (10); A short edge wrapping station (8) is used to wrap the short edges of the silicon wafer battery cell (10); Adsorption structures are used between the positioning station (2) and the chamfering and edge wrapping station (4), between the chamfering and edge wrapping station (4) and the long side edge wrapping station (6), and between the long side edge wrapping station (6) and the short side edge wrapping station (8) to adsorb the silicon wafer battery sheet (10) for transfer.

2. The silicon wafer solar cell edge wrapping equipment according to claim 1, characterized in that: The chamfering and hemming station (4), the long side hemming station (6), and the short side hemming station (8) are arranged on three sides of the U-shape to form a U-shaped layout; a corner transfer station (5) is arranged at the corner between the chamfering and hemming station (4) and the long side hemming station (6), and a transfer and distance adjustment station (7) is arranged at the corner between the long side hemming station (6) and the short side hemming station (8).

3. The silicon wafer solar cell edge wrapping device according to claim 2, characterized in that: A transfer station (3) is arranged before the chamfering and edging station (4) and between the positioning station (2); and also includes a linear transfer mechanism (11), which absorbs the silicon wafer battery cell (10) on the positioning station (2), rotates it 90 degrees, and then places it on the transfer station (3).

4. The silicon wafer solar cell edge wrapping equipment according to claim 1 or 3, characterized in that: The structure of the positioning station (2) is as follows: it includes an XY bidirectional slide (21), a rotating disk (22) is installed on the top surface of the XY bidirectional slide (21), and a supporting adsorption platform (23) is installed on the top surface of the rotating disk (22); and it also includes a visual system (24) located above the supporting adsorption platform (23).

5. The silicon wafer solar cell edge wrapping device according to claim 3, characterized in that: The structure of the linear transfer mechanism (11) is as follows: it comprises a linear drive component (111), a transfer seat (112) is installed on the side of the linear drive component (111), a rotating component (113) is installed on the bottom of the transfer seat (112), a bracket (114) is installed on the bottom surface of the rotating component (113), and a suction cup for adsorbing silicon wafer battery cells (10) is installed on the bottom surface of the bracket (114).

6. The silicon wafer solar cell edge wrapping device according to claim 3, characterized in that: The silicon wafer battery cell (10) is transported and loaded between the transfer station (3) and the chamfering and edging station (4), and between the chamfering and edging station (4) and the corner transfer station (5) via a second linear transfer mechanism (12); the silicon wafer battery cell (10) is transported and loaded between the corner transfer station (5) and the long side edging station (6), and between the long side edging station (6) and the transfer and distance adjustment station (7) via a third linear transfer mechanism (13); the silicon wafer battery cell (10) is transported and loaded between the transfer and distance adjustment station (7) and the short side edging station (8), and between the short side edging station (8) and the rear unloading mechanism (9) via a fourth linear transfer mechanism (14).

7. The silicon wafer solar cell edge wrapping device according to claim 6, characterized in that: The linear transfer mechanism 2 (12), the linear transfer mechanism 3 (13), and the linear transfer mechanism 4 (14) have the same structure, and all of them are linearly transferred after adsorbing from the bottom surface of the silicon wafer battery cell (10); the structure of the linear transfer mechanism 2 (12) is as follows: it includes a moving guide mechanism (123) installed on the side of the frame, a moving seat (122) is slidably mounted on the moving guide mechanism (123), a support (124) is installed on the moving seat (122) via a lifting driving power (121), the support (124) is located above the top of the moving seat (122), and the top surface of the support (124) adsorbs the silicon wafer battery cell (10).

8. The silicon wafer solar cell edge wrapping device according to claim 2, characterized in that: The corner transfer station (5) absorbs the silicon wafer battery cell (10) and then rotates horizontally by 90°, and the transfer and distance adjustment station (7) absorbs the silicon wafer battery cell (10) and then rotates horizontally by 180°; the axial direction of the chamfering ink roller (42) in the chamfering and hemming station (4), the axial direction of the long side ink roller (61) in the long side hemming station (6), and the axial direction of the short side ink roller (81) in the short side hemming station (8) are arranged along the conveying direction respectively.

9. The silicon wafer solar cell edge wrapping equipment according to claim 2 or 8, characterized in that: The corner transfer station (5) comprises a rotating drive assembly (51), a rotating frame (52) arranged in a cross-shaped structure is installed at the bottom end of the rotating drive assembly (51), and a suction cup for adsorbing silicon wafers and battery cells (10) is installed on the bottom surface of the end of the rotating frame (52); The transfer and distance adjustment station (7) comprises a second rotary drive assembly (71), a second rotary frame (72) arranged in a cross-shaped structure is installed at the bottom end of the second rotary drive assembly (71), and both ends of the second rotary frame (72) are installed with a distance adjustment driving power (73), and the distance adjustment driving power (73) is provided with two output ends that move towards or away from each other and are respectively installed with distance adjustment frames (74), and a suction cup for adsorbing silicon wafers and battery cells (10) is installed on the bottom surface of each distance adjustment frame (74).

10. The silicon wafer solar cell edge wrapping equipment according to claim 1, characterized in that: The chamfering and edge wrapping station (4), the long edge wrapping station (6) and the short edge wrapping station (8) all include two groups of edge wrapping mechanisms arranged at intervals. The structure of a single group of edge wrapping mechanisms is as follows: it includes a base (40), on which vertical seats (45) are installed at intervals, a rotating shaft (421) driven to rotate by a rotating transmission component is installed between the vertical seats (45) on both sides, an ink roller is mounted on the rotating shaft (421), and an ink cartridge (44) is arranged below the ink roller; an inverted L-shaped vertical plate (48) is installed on the single-side vertical seat (45), a micrometer (49) is spirally installed on the vertical plate (48), a floating knife seat (46) is floatingly installed below the vertical plate (48) via an elastic member (47), and a scraper (41) is installed between the floating knife seats (46) on both sides via a knife holder (411); the downward end of the micrometer (49) abuts against the top surface of the floating knife seat (46).

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