Annealing mechanism, annealing device and solar cell production system

Abstract

According to the annealing mechanism, the annealing device and the solar cell production system, the beam expanding module is introduced, light is expanded, and the emitting range of light beams is enlarged. Meanwhile, the reshaper is arranged on the downstream of the beam expanding module, the light rays subjected to beam expanding are reshaped to form strip-shaped light spots, and therefore the light rays irradiated on the workpiece to be annealed through the emergent assembly are also in a strip shape. Through the design, the action range of light rays on the workpiece to be annealed can be lengthened, so that the repetition probability of a scanning path can be reduced in the annealing process, the workpiece to be annealed is heated more uniformly, and the annealing quality is improved; meanwhile, the annealing area can be enlarged, the scanning repetition frequency is reduced, and the annealing efficiency is improved.

Description

Technical Field

[0001] The present application relates to the technical field of solar cells, and in particular to an annealing mechanism, an annealing device and a solar cell production system. Background Art

[0002] Solar cells refer to devices that use the photovoltaic effect to convert light energy into electrical energy through semiconductor films, such as perovskite solar cells. Since the crystallinity of semiconductor films has a great influence on the performance of solar cells, laser annealing devices are usually used to anneal semiconductor films during the precursor solution preparation process. However, due to the limitations of the structure of traditional annealing devices, annealing has problems such as uneven heating and low annealing efficiency. Utility Model Content

[0003] Based on this, it is necessary to provide an annealing mechanism, an annealing device and a solar cell production system to improve heating uniformity and annealing efficiency.

[0004] In a first aspect, the present application provides an annealing mechanism, which includes: a beam expansion module, used to receive and expand the light; a shaper, located downstream of the beam expansion module, used to shape the light so that the shaped light forms a strip-shaped light spot; and an output component, used to irradiate the shaped light onto a workpiece to be annealed.

[0005] The above-mentioned annealing mechanism introduces a beam expansion module to expand the light and increase the emission range of the light beam. At the same time, a shaper is set downstream of the beam expansion module to shape the light after expansion to form a strip-shaped light spot, so that the light irradiated on the workpiece to be annealed through the emission component is also in the shape of a strip. Such a design can lengthen the range of action of the light on the workpiece to be annealed, so that during the annealing process, the probability of repetition of the scanning path can be reduced, so that the workpiece to be annealed is heated more evenly and the annealing quality is improved; at the same time, the annealing area can be expanded, the number of scanning repetitions can be reduced, and the annealing efficiency can be improved.

[0006] In some embodiments, the annealing mechanism further includes a polarizer, which is located between the beam expander and the shaper on the propagation path of the light and is used to polarize the light after the beam expansion. In this design, a polarizer is introduced between the beam expander and the shaper to obtain a linearly polarized light beam, which is focused into an elongated light spot extending along the polarization direction, which is beneficial to improving the annealing effect on the workpiece to be annealed.

[0007] In some embodiments, the annealing mechanism further includes a reflection component, which is used to reflect the light after at least passing through the beam expansion module to the shaper. In this design, the reflection component is introduced to change the path of the light, so that the beam expansion module and the shaper can be distributed on the same side of the reflection component, shortening the length of the overall structure of the annealing mechanism, facilitating compact structure distribution, and improving space utilization.

[0008] In some embodiments, the reflective assembly includes a first reflector and a second reflector that are spaced apart, the beam expansion module and the shaper are located on the same side of the reflective assembly, the reflective surfaces of the first reflector and the second reflector face each other, and the reflective surface of the first reflector is tilted toward the beam expansion module, and the reflective surface of the second reflector is tilted toward the shaper. In this way, the reflective assembly is designed as a first reflector and a second reflector, so that the light after beam expansion can be better reflected back, the light propagation path is changed, the overall size of the annealing mechanism is shortened, and the structural distribution is more reasonable and compact.

[0009] In some embodiments, the emission assembly includes a rotating mirror and a field lens. The rotating mirror is configured to be rotatable around its own axis, and is used to receive the shaped light and refract it on the field lens. The field lens is used to project the light onto the workpiece to be annealed. With such a design, the rotating mirror and the field lens are introduced, so that the emitted light can be better scanned on the workpiece to be annealed, and the uniformity of annealing is improved, thereby improving the annealing effect.

[0010] In a second aspect, the present application provides an annealing device, comprising: an operating platform having an annealing station; an annealing mechanism such as any of the above, wherein an output component is used to irradiate the shaped light onto a workpiece to be annealed located at the annealing station.

[0011] With such a design and the above annealing mechanism, the range of action of the light on the workpiece to be annealed can be extended, so that during the annealing process, the probability of repetition of the scanning path can be reduced, the workpiece to be annealed can be heated more evenly, and the annealing quality can be improved; at the same time, the annealing area can be expanded, the number of scanning repetitions can be reduced, and the annealing efficiency can be improved.

[0012] In some embodiments, the annealing device further comprises a conveying mechanism for conveying the workpiece to be annealed to the annealing station. With such a design, the conveying mechanism is used to stably convey the workpiece to be annealed to the annealing station, realize automatic loading, and improve the automation and processing efficiency of annealing.

[0013] In some embodiments, the annealing device further includes a lifting mechanism, a lifting port is provided on the surface of the operating platform, a conveying mechanism is provided in the lifting port and is drivingly connected to the lifting mechanism, and the lifting mechanism is used to drive the conveying mechanism to move up and down relative to the surface of the operating platform. With such a design, by lowering the conveying mechanism, the workpiece to be annealed is supported on the surface of the operating platform, reducing the deformation of the workpiece to be annealed during the annealing process, facilitating more uniform annealing heating, and improving the annealing effect.

[0014] In some embodiments, the lifting openings include multiple lifting openings, all of which are sequentially distributed along a direction intersecting with the conveying direction of the conveying mechanism, and each lifting opening has a conveying mechanism. In this design, multiple lifting openings are arranged in a direction intersecting with the conveying direction, so that the same workpiece to be annealed can be supported on multiple conveying mechanisms, which is conducive to improving the stability of conveying.

[0015] In some embodiments, the annealing device further comprises: a positioning assembly, which is used to position the workpiece to be annealed on the annealing station. With such a design, the workpiece to be annealed can be stably and accurately positioned on the annealing station through the positioning assembly, which is conducive to improving the accuracy of annealing.

[0016] In some embodiments, the positioning assembly includes a driving member and a positioning member driven by the driving member, the annealing station has a receiving opening at least at one end along the conveying direction of the conveying mechanism, the positioning member is arranged in the receiving opening, and one end of the positioning member can protrude out of the receiving opening and move toward one side of the annealing station under the action of the driving member. In such a design, the driving member drives one end of the positioning member to protrude out of the receiving opening and move toward one side of the annealing station, so that the positioning member conflicts with the workpiece to be annealed located in the annealing station, thereby achieving effective positioning.

[0017] In some embodiments, the positioning assembly further includes a base, the positioning member is rotatably connected to the base, one end of the positioning member is connected to the driving member, and the other end is used to abut against the workpiece to be annealed on the annealing station. With such a design, the introduction of the base makes the rotation of the positioning member more stable, which is conducive to improving the stability of the workpiece to be annealed on the annealing station.

[0018] In some embodiments, the annealing device further includes a support member, which is disposed on at least one side of the conveying mechanism along its conveying direction, and is used to support the workpiece to be annealed that is input into or output from the conveying mechanism. In this design, the support member is introduced to support the workpiece to be annealed during the conveying process, thereby reducing deformation caused by gravity and further improving the annealing effect.

[0019] In some embodiments, the annealing device further includes a stopper disposed on the operating platform, the stopper being located on at least one side of the conveying mechanism intersecting with its own conveying direction. With such a design, the stopper is introduced to limit the deviation of the workpiece to be annealed along the direction intersecting with the conveying direction, so that the workpiece to be annealed is accurately conveyed to the annealing station, thereby improving the annealing effect.

[0020] In some embodiments, the annealing device further includes: a visual component for obtaining processing image information of the workpiece to be annealed. With such a design, the introduction of the visual component facilitates real-time acquisition of processing image information during the annealing process, timely adjustment of the annealing process, and improvement of the annealing effect.

[0021] In some embodiments, the annealing device further includes: a temperature measuring component for obtaining temperature information of the workpiece to be annealed. With such a design, the introduction of the temperature component facilitates real-time acquisition of temperature information during the annealing process, timely adjustment of annealing process parameters, and improvement of annealing effects; it also increases the diversity of the process.

[0022] In some embodiments, the annealing device further includes: a dust removal component for removing dust from the annealing process of the workpiece to be annealed. With such a design, the dust removal component can timely remove impurities generated during the annealing process, reduce the impact of the generated impurities on the annealing, and help improve the annealing effect.

[0023] In a third aspect, the present application provides a solar cell production system, the solar cell production system comprising any one of the above annealing devices. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 Schematic diagram of the structure of the annealing mechanism described in some embodiments of the present application.

[0025] Figure 2 This is a perspective view of the structure of the annealing device described in some embodiments of the present application.

[0026] Figure 3 It is a schematic diagram of the structure of the positioning assembly described in some embodiments of the present application.

[0027] Figure 4 This is another perspective view of the structure of the annealing device described in some embodiments of the present application.

[0028] 100, annealing device; 10, annealing mechanism; 11, light source; 12, beam expansion module; 13, polarizer; 14, reflection component; 141, first reflection mirror; 142, second reflection mirror; 143, reflection surface; 15, shaper; 16, emission component; 161, rotating mirror; 162, field mirror; 20, operating platform; 21, annealing station; 22, first bracket; 23, second bracket; 24, lifting port; 25 , accommodating opening; 30, conveying mechanism; 31, conveying surface; 40, lifting mechanism; 41, lifting seat; 42, lifting rod; 50, positioning assembly; 51, base; 511, opening; 52, positioning member; 53, driving member; 54, resistance wheel; 60, supporting member; 61, guide wheel; 70, limiting member; 80, visual assembly; 81, temperature measuring member; 82, dust removal assembly; 200, workpiece to be annealed; X, conveying direction. DETAILED DESCRIPTION

[0029] In order to make the above-mentioned purposes, features and advantages of the present application more obvious and easy to understand, the specific implementation methods of the present application are described in detail below in conjunction with the accompanying drawings. In the following description, many specific details are set forth to facilitate a full understanding of the present application. However, the present application can be implemented in many other ways different from those described herein, and those skilled in the art can make similar improvements without violating the connotation of the present application, so the present application is not limited by the specific embodiments disclosed below.

[0030] In the description of the present application, it should be understood that if the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc. appear, the orientation or position relationship indicated by these terms is based on the orientation or position relationship shown in the accompanying drawings, which is only for the convenience of describing the present application and simplifying the description, and does not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present application.

[0031] In addition, if the terms "first" or "second" appear, these terms are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of the features. In the description of this application, if the term "plurality" appears, the meaning of "plurality" is at least two, such as two, three, etc., unless otherwise clearly and specifically defined.

[0032] In this application, unless otherwise clearly specified and limited, if the terms "installed", "connected", "connected", "fixed" and the like appear, these terms should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integrated connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements, unless otherwise clearly defined. For ordinary technicians in this field, the specific meanings of the above terms in this application can be understood according to the specific circumstances.

[0033] In the present application, unless otherwise clearly specified and limited, if there is a description that a first feature is "above" or "below" a second feature, etc., or similar descriptions appear, it may mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Moreover, the first feature being "above", "above" and "above" the second feature may mean that the first feature is directly above or obliquely above the second feature, or simply means that the first feature is higher in level than the second feature. The first feature being "below", "below" and "below" the second feature may mean that the first feature is directly below or obliquely below the second feature, or simply means that the first feature is lower in level than the second feature.

[0034] It should be noted that if an element is referred to as being "fixed to" or "disposed on" another element, it may be directly on the other element or there may be a central element. If an element is considered to be "connected to" another element, it may be directly connected to the other element or there may be a central element at the same time. If any, the terms "vertical", "horizontal", "upper", "lower", "left", "right" and similar expressions used in this application are for illustrative purposes only and do not represent the only implementation method.

[0035] With the development of science, the development of new energy sources has made continuous breakthroughs. For example, solar cells represented by silicon-based and perovskite cells have made disruptive progress. Solar cells refer to devices that use the photovoltaic effect to convert light energy into electrical energy through semiconductor films. Their main core components are semiconductor films, such as perovskite films.

[0036] Since the crystallinity of semiconductor thin films has a great influence on the performance of solar cells, laser annealing devices are usually used to anneal semiconductor thin films during the precursor solution preparation process. During the annealing process, traditional devices use the emitted circular light spots to scan and anneal the semiconductor thin films. Since the circular light spot easily causes repeated paths when scanning back and forth, the number of local irradiation increases, resulting in greater local heating, which in turn causes uneven annealing of the semiconductor film; at the same time, since the range of action of the circular light spot is relatively narrow, the number of back and forth scans increases, reducing the annealing efficiency.

[0037] Based on this, in order to solve the problems of uneven heating and low annealing efficiency in the annealing process of traditional devices, the present application provides an annealing mechanism, which introduces a beam expansion module to expand the light and increase the emission range of the light beam. At the same time, a shaper is set downstream of the beam expansion module to shape the light after expansion to form a strip-shaped light spot, so that the light irradiated on the workpiece to be annealed through the emission component is also in the shape of a strip. With such a design, the range of action of the light on the workpiece to be annealed can be extended, so that during the annealing process, the probability of repetition of the scanning path can be reduced, the workpiece to be annealed can be heated more evenly, and the annealing quality can be improved; at the same time, the annealing area can be expanded, the number of scanning repetitions can be reduced, and the annealing efficiency can be improved.

[0038] According to some embodiments of this application, please refer to Figure 1 The present application provides an annealing mechanism 10, which includes: a beam expansion module 12, a shaper 15 and an emission assembly 16. The beam expansion module 12 is used to receive and expand the light; the shaper 15 is located downstream of the beam expansion module 12, and is used to shape the light so that the shaped light forms a strip-shaped light spot; the emission assembly 16 is used to irradiate the shaped light onto the workpiece 200 to be annealed.

[0039] The annealing mechanism 10 may include a light source 11 or may not include the light source 11. If the light source 11 is not included, an additional light source 11 needs to be purchased during the annealing operation. The light source 11 refers to a device that can emit light, such as a laser generator. The beam expansion module 12 refers to a device that can expand the light beam and increase the emission range of the light beam. For example, when the light emitted by the light source 11 can form a circular light spot, the diameter of the circular light spot becomes larger after the light passes through the beam expansion module 12.

[0040] The beam expansion module 12 may be a beam expander, which is a lens structure capable of changing the beam diameter and divergence angle.

[0041] The shaper 15 refers to a component that can change the shape of the light spot formed by the projection of light. For example, the light emitted by the light source 11 can form a circular light spot, and after passing through the shaper 15, the light can form a strip light spot. When the light spot irradiated on the workpiece 200 to be annealed is a strip light spot, the length direction of the strip light spot can be consistent with the width direction of the workpiece 200 to be annealed. In this way, when scanning, the strip light spot anneals the workpiece 200 to be annealed in a translation manner, so that it is heated evenly. At the same time, when scanning back and forth, compared with the circular light spot, the strip light spot is easier to control, so that the probability of scanning path repetition is lower, and the uniformity of heating is further improved.

[0042] Among them, the strip-shaped light spot refers to a light spot that is in the shape of a strip, which can also be understood as: the length of the light spot is much greater than its width. For example, the strip-shaped light spot can be, but is not limited to, a regular shape such as a rectangular light spot, an elliptical light spot, etc.; it can also be an irregular long strip structure.

[0043] The output component 16 refers to a component that can irradiate the shaped light onto the workpiece 200 to be annealed, and its structure can have various designs. For example, the output component 16 can be a lens with a refractive function. At this time, in order to achieve a scanning effect, the workpiece 200 to be annealed can move back and forth under a power device such as a cylinder or a motor; or, the output component 16 has a lens with a scanning function, such as a hexagonal prism, or a lens that changes its own refractive index.

[0044] Such a design can extend the range of action of the light on the workpiece 200 to be annealed, so that during the annealing process, the probability of repetition of the scanning path can be reduced, so that the workpiece 200 to be annealed is heated more evenly and the annealing quality is improved; at the same time, the annealing area can be expanded, the number of scanning repetitions can be reduced, and the annealing efficiency can be improved.

[0045] According to some embodiments of the present application, optionally, please refer to Figure 1 The annealing mechanism 10 further includes a polarizer 13, which is located between the beam expansion module 12 and the shaper 15 on the propagation path of the light and is used to polarize the expanded light.

[0046] The polarizer 13 refers to a component that can transform the light emitted by the light source 11 into a linearly polarized beam, wherein the linearly polarized beam can be focused into an elongated light spot extending along the polarization direction, so as to obtain a diffraction-limited focused light spot as much as possible, which is conducive to improving the annealing effect.

[0047] Meanwhile, the introduction of the polarizer 13 between the beam expansion module 12 and the shaper 15 can improve the transmission performance of the light. In addition, the formed linear polarized light beam can reduce the noise and instability of the light source 11, thereby improving the reliability and stability of the light source 11.

[0048] The propagation path of the light refers to the path formed after the light is emitted from the light source 11 to the time it irradiates the workpiece 200 to be annealed, which may be composed of two, three or more linear paths at an angle.

[0049] In this design, a polarizer 13 is introduced between the beam expansion module 12 and the shaper 15 to obtain a linearly polarized light beam and focus it into an elongated light spot extending along the polarization direction, which is beneficial to improving the annealing effect on the workpiece 200 to be annealed.

[0050] According to some embodiments of the present application, optionally, please refer to Figure 1The annealing mechanism 10 further includes a reflection component 14 , which is used to reflect the light after at least passing through the beam expansion module 12 to the shaper 15 .

[0051] The reflective component 14 refers to a component that can reflect light and change the original path of the light. It can be composed of one or more plane mirrors, so that the light after passing through the beam expander module 12 can be reflected to the shaper 15 located on the same side.

[0052] It is not difficult to understand that when the beam expander module 12 and the shaper 15 are located on the same side of the reflective component 14, the three should not be located on the same straight line, so that the incident light and the outgoing light of the reflective component 14 will not be collinear, that is, in the direction perpendicular to the light emitted by the light source 11, the beam expander module 12 and the shaper 15 are spaced apart.

[0053] In addition, the light at least after passing through the beam expander module 12 should be understood as follows: the light emitted by the light source 11 can directly reach the reflective component 14 after passing through the beam expander module 12; or it can reach the reflective component 14 after passing through other components.

[0054] With such a design, the reflective component 14 is introduced to change the path of the light, so that the beam expander module 12 and the shaper 15 can be distributed on the same side of the reflective component 14, shortening the length of the overall structure of the annealing mechanism 10, facilitating compact distribution of the structure, and improving space utilization.

[0055] According to some embodiments of the present application, optionally, please refer to Figure 1 The reflective assembly 14 includes a first reflector 141 and a second reflector 142 that are spaced apart. The beam expander module 12 and the shaper 15 are located on the same side of the reflective assembly 14. The reflective surfaces 143 of the first reflector 141 and the second reflector 142 face each other, and the reflective surface 143 of the first reflector 141 is tilted toward the beam expander module 12, and the reflective surface 143 of the second reflector 142 is tilted toward the shaper 15.

[0056] The first reflector 141 and the second reflector 142 are structures capable of reflecting light. Since the reflective surface 143 of the first reflector 141 and the reflective surface 143 of the second reflector 142 are arranged in the same direction, when the light reaches the reflective surface 143 of the first reflector 141, it will be reflected to the reflective surface 143 of the second reflector 142. Since the reflective surface 143 of the first reflector 141 is also tilted toward the beam expander module 12, and the reflective surface 143 of the second reflector 142 is tilted toward the shaper 15, the light expanded by the beam expander module 12 will reach the reflective surface 143 of the first reflector 141, and will be reflected by the reflective surface 143 of the first reflector 141 to the reflective surface 143 of the second reflector 142; finally, it will be reflected by the reflective surface 143 of the second reflector 142 to the shaper 15.

[0057] It should be noted that the respective inclination angles of the reflection surface 143 of the first reflector 141 and the reflection surface 143 of the second reflector 142 can be adjusted according to actual annealing, as long as the light passing through the beam expansion module 12 is reflected onto the shaper 15. Specifically, in some embodiments, the end of the reflection surface 143 of the first reflector 141 close to the beam expansion module 12 and the end of the reflection surface 143 of the second reflector 142 close to the shaper 15 are inclined along the sides away from each other. In addition, the light reflected by the second reflector 142 can be parallel to the light incident on the first reflector 141.

[0058] When the annealing mechanism 10 further includes a polarizer 13, it can be located between the beam expander module 12 and the shaper 15 on the light propagation path. At this time, the reflection surface 143 of the first reflection mirror 141 is tilted toward the polarizer 13 while facing the second reflection mirror 142.

[0059] In this design, the reflective component 14 is designed as a first reflector 141 and a second reflector 142, so that the light after expansion can be better reflected back, changing the light propagation path, shortening the overall size of the annealing mechanism 10, and making the structural distribution more reasonable and compact.

[0060] According to some embodiments of the present application, the emission assembly 16 optionally includes a rotating mirror 161 and a field lens 162. The rotating mirror 161 is used to receive the shaped light and refract it on the field lens 162. The field lens 162 is used to project the light onto the workpiece 200 to be annealed.

[0061] The rotating mirror 161 refers to a component that can refract the shaped light. Since the angle of the light after refraction can be changed by changing the incident angle of the light on the rotating mirror 161, the rotating mirror 161 is designed to rotate around its own axis. In this way, the incident angle of the light on the rotating mirror 161 can be changed by rotation, so that the emission direction of the refracted light changes, thereby realizing scanning of the workpiece 200 to be annealed.

[0062] The rotating mirror 161 can have various designs, which can be not only Figure 1 The hexagonal prism shown in the figure may also be other prisms, such as triangular prism, quadrangular prism, pentaprism, etc.

[0063] The field lens 162 refers to a component that can project the light refracted by the rotating mirror 161 onto the workpiece 200 to be annealed, wherein the field lens 162 is a type of lens that can increase the scanning area of ​​the light refracted by the rotating mirror 161. Since the specific structure of the field lens 162 is not the object to be improved in this embodiment, it can directly refer to existing products or documents.

[0064] With such a design, the rotating mirror 161 and the field lens 162 are introduced, so that the emitted light can be better scanned on the workpiece 200 to be annealed, thereby improving the uniformity of annealing and thus enhancing the annealing effect.

[0065] According to some embodiments of this application, please refer to Figure 2 The present application provides an annealing device 100, which comprises: an operating platform 20 and any of the above annealing mechanisms 10. The operating platform 20 has an annealing station 21; the emission component 16 is used to irradiate the shaped light onto the workpiece 200 to be annealed located at the annealing station 21.

[0066] The operating platform 20 refers to a structure that provides support for the annealing operation of the workpiece 200 to be annealed, and its shape can be designed in various ways, for example: it can be, but not limited to, a truncated cone, a rectangular parallelepiped, a cube, a cylinder, etc.; of course, it can also be an irregular structure.

[0067] The annealing station 21 refers to the position where the workpiece 200 to be annealed is annealed, which may be on the surface of the operating platform 20 or above the operating platform 20, for example, a space above the operating platform 20. At this time, in order to effectively support the workpiece 200 to be annealed, a pallet may be fixed on the operating platform 20 so that the pallet supports the workpiece 200 to be annealed in the space; or, when the conveying equipment conveys the workpiece 200 to be annealed to the space, it stops running.

[0068] With such a design, the above annealing mechanism 10 can extend the range of action of the light on the workpiece 200 to be annealed, so that during the annealing process, the probability of repetition of the scanning path can be reduced, so that the workpiece 200 to be annealed is heated more evenly, and the annealing quality is improved; at the same time, the annealing area can be expanded, the number of scanning repetitions can be reduced, and the annealing efficiency can be improved.

[0069] According to some embodiments of the present application, optionally, the annealing device 100 further includes a conveying mechanism 30 for conveying the workpiece 200 to be annealed to the annealing station 21 .

[0070] The conveying mechanism 30 refers to a device that can drive the workpiece 200 to be annealed to move and reach the annealing station 21. It can be a device with telescopic function such as a cylinder, an electric cylinder, a hydraulic cylinder, etc., or a combination of a motor and a transmission structure.

[0071] Among them, the transmission structure can have a variety of designs, for example: it can be a combination of belts and rollers, in which case the motor drives the roller to rotate, driving the belt to rotate; it can also be a combination of chains and rollers; or, it can be a number of parallel rollers connected by belts or chains, in which case the motor can drive each roller to rotate, driving the workpiece 200 to be annealed on the surface of the roller to move; or, it can be a combination of a screw and a slider, using a motor to drive the screw to rotate, so that the slider moves, etc.

[0072] In addition, the conveying mechanism 30 can be fixedly installed on the operating platform 20, or can be movably installed on the operating platform 20. For example, when the conveying mechanism 30 conveys the workpiece 200 to be annealed to a specific position, the conveying mechanism 30 descends below the surface of the operating platform 20, so that the workpiece 200 to be annealed is located on the annealing station 21 on the surface of the operating platform 20, etc.

[0073] With such a design, the conveying mechanism 30 is utilized to stably convey the workpiece 200 to be annealed to the annealing station 21 , thereby realizing automatic loading and improving the automation and processing efficiency of annealing.

[0074] According to some embodiments of the present application, optionally, the annealing device 100 further includes a lifting mechanism 40, and a lifting port 24 is provided on the surface of the operating platform 20. The conveying mechanism 30 is provided in the lifting port 24 and is drivingly connected to the lifting mechanism 40, and the lifting mechanism 40 is used to drive the conveying mechanism 30 to move up and down relative to the surface of the operating platform 20.

[0075] The lifting mechanism 40 refers to a device that can drive the conveying mechanism 30 to move up and down, and its structure has various designs, for example: it can be a device with telescopic function such as a cylinder, an electric cylinder, a hydraulic cylinder, etc.; it can also be a combination of a motor and other structures, for example: the motor drives the screw to rotate, driving the slider to move up and down; or, the motor drives the roller to rotate, so that the belt or chain moves up and down; or, the motor drives the gear to rotate, driving the rack to move up and down, etc.

[0076] Specifically in some embodiments, the lifting structure may include a driver, a base 51 and a lifting rod 42. The base 51 is fixed under the operating platform 20. The driver is installed on the base 51 and is connected to the lifting rod 42. The lifting rod 42 is connected to the conveying mechanism 30.

[0077] The conveying surface 31 refers to a plane on the conveying mechanism 30 on which the workpiece 200 to be annealed can be placed and on which the workpiece 200 to be annealed can be driven to move. For example, when the conveying mechanism 30 is a belt conveying device, the conveying surface 31 can be the surface of the belt.

[0078] The lifting port 24 is a structure that can accommodate the conveying mechanism 30 and allow the conveying mechanism 30 to move up and down inside. When the conveying mechanism 30 conveys the workpiece 200 to be annealed to the top of the annealing station 21, the lifting mechanism 40 drives the conveying mechanism 30 to descend, so that the conveying surface 31 of the conveying mechanism 30 is lower than or flush with the surface of the operating platform 20, so that the workpiece 200 to be annealed is located on the annealing station 21, and the annealing station 21 is on the surface of the operating platform 20.

[0079] When the annealing operation is completed, the lifting mechanism 40 drives the conveying mechanism 30 to rise above the surface of the operating platform 20, so that the workpiece 200 to be annealed is located on the conveying surface 31, so that the workpiece after annealing is output outward.

[0080] In addition, the position of the lifting port 24 may have an overlapping area with the annealing station 21, for example, the lifting port 24 is opened in the area where the annealing station 21 is located, so that after the conveying mechanism 30 descends, the workpiece 200 to be annealed can stay stably on the annealing station 21. Of course, the position of the lifting port 24 may not have an overlapping area with the annealing station 21, for example, two lifting ports 24 are respectively located on opposite sides of the annealing station 21, and at this time, the workpiece 200 to be annealed is supported on two conveying mechanisms 30. When the two conveying mechanisms 30 descend, the workpiece 200 to be annealed can also stay stably on the annealing station 21.

[0081] With such a design, by lowering the conveying mechanism 30 , the workpiece 200 to be annealed is supported on the surface of the operating platform 20 , which reduces the deformation of the workpiece 200 to be annealed during the annealing process, facilitates more uniform annealing heat, and improves the annealing effect.

[0082] According to some embodiments of the present application, optionally, please refer to Figure 2 The lifting openings 24 include a plurality of lifting openings, all of which are sequentially distributed along a direction intersecting with a conveying direction X of the conveying mechanism 30 , and each lifting opening 24 has a conveying mechanism 30 .

[0083] The lifting ports 24 are distributed in sequence along a direction intersecting the conveying direction X, which means that the same workpiece 200 to be annealed can be supported on multiple conveying mechanisms 30 at the same time, so as to improve the stability of conveying.

[0084] When the lifting ports 24 are spaced apart from each other, there is also a certain distance between the extended conveying mechanisms 30. Thus, when taking out the annealed workpiece, a fork arm or other structure can be inserted into the gap between the conveying mechanisms 30 to lift the workpiece.

[0085] With such a design, a plurality of lifting ports 24 are arranged in a direction intersecting with the conveying direction X, so that the same workpiece 200 to be annealed can be supported on a plurality of conveying mechanisms 30 , which is beneficial to improving the stability of conveying.

[0086] According to some embodiments of the present application, optionally, please refer to Figure 2 The annealing device 100 further includes a positioning assembly 50 , which is used to position the workpiece 200 to be annealed on the annealing station 21 .

[0087] The positioning assembly 50 refers to a structure that limits the workpiece 200 to be annealed on the annealing station 21. There are many ways to position it, such as: a pin hole positioning method, when the workpiece 200 to be annealed is located on the annealing station 21, the pin shaft is pushed out and inserted into the positioning hole on the workpiece 200 to be annealed; or, a permanent magnet and a metal body are arranged between the workpiece 200 to be annealed and the annealing station 21, so that the workpiece 200 to be annealed is magnetically attracted to the annealing station 21; or, a butt contact method is used to clamp the workpiece 200 to be annealed on the annealing station 21, etc.

[0088] With such a design, the workpiece 200 to be annealed can be stably and accurately positioned on the annealing station 21 through the positioning assembly 50, which is beneficial to improving the annealing accuracy.

[0089] According to some embodiments of the present application, optionally, please refer to Figure 2 and Figure 3 The positioning assembly 50 includes a driving member 53 and a positioning member 52 driven by the driving member 53. The annealing station 21 has a receiving opening 25 at at least one end along the conveying direction X of the conveying mechanism 30. The positioning member 52 is disposed in the receiving opening 25, and one end of the positioning member 52 can protrude out of the receiving opening 25 and move toward one side of the annealing station 21 under the action of the driving member 53.

[0090] The positioning member 52 refers to a component that can contact the workpiece 200 to be annealed under the action of the driving member 53, so that the workpiece 200 to be annealed is positioned on the annealing station 21. The movement of the positioning member 52 toward the side of the annealing station 21 can be a rotational movement; it can also be an inclined upward translational movement. For example, the driving member 53 is a cylinder, and its telescopic shaft can be arranged in the receiving port 25 to be inclined toward the side of the annealing station 21.

[0091] When the driving member 53 drives one end of the positioning member 52 to move along the side away from the annealing station 21, the workpiece 200 to be annealed can be released. At this time, one end of the positioning member 52 can be retracted into the receiving opening 25, lower than or flush with the surface of the operating platform 20; of course, one end of the positioning member 52 can also be higher than the surface of the operating platform 20, but cannot be higher than the conveying surface 31 of the conveying mechanism 30 after being extended.

[0092] In order to reduce the contact friction between the positioning member 52 and the workpiece 200 to be annealed, a contact wheel may be rotatably provided at one end of the positioning member 52 , and the contact wheel is used to contact with the workpiece 200 to be annealed.

[0093] The driving member 53 may be a device with telescopic function such as a cylinder, a hydraulic cylinder, an electric cylinder, or the like, or may be a motor.

[0094] In addition, the receiving port 25 may be provided at one end of the annealing station 21 along the conveying direction X, or may be provided at both ends of the annealing station 21 along the conveying direction X. When the receiving port 25 is provided at only one end of the annealing station 21 along the conveying direction X, a fixed structure may be provided at the other end of the annealing station 21 to serve as a support point for the other side of the workpiece 200 to be annealed.

[0095] With such a design, the driving member 53 drives one end of the positioning member 52 to protrude out of the receiving opening 25 and move toward one side of the annealing station 21, so that the positioning member 52 contacts the workpiece 200 to be annealed located in the annealing station 21, thereby achieving effective positioning.

[0096] According to some embodiments of the present application, optionally, please refer to Figure 3 The positioning assembly 50 also includes a base 51 , a positioning member 52 is rotatably connected to the base 51 , and one end of the positioning member 52 is connected to the driving member 53 , and the other end is used to abut against the workpiece 200 to be annealed on the annealing station 21 .

[0097] The base 51 is a structure that provides a support base for the rotation of the positioning member 52, and can be fixed on the inner wall of the receiving opening 25, or can be located outside the receiving opening 25 and fixed on the bottom of the operating platform 20. In order to make the positioning member 52 rotate more smoothly on the base 51, an opening 511 is provided on one end of the base 51, and the positioning member 52 is rotatably connected to the inner wall of the opening 511.

[0098] With such a design, the base 51 is introduced, so that the rotation of the positioning member 52 is more stable, which is beneficial to improving the stability of the workpiece 200 to be annealed on the annealing station 21 .

[0099] According to some embodiments of the present application, optionally, please refer to Figure 2 The annealing device 100 further includes a support member 60 , which is disposed on at least one side of the conveying mechanism 30 along its own conveying direction X. The support member 60 is used to support the workpiece 200 to be annealed that is input into or output from the conveying mechanism 30 .

[0100] The support member 60 refers to a structure that can support the workpiece 200 to be annealed during transportation. For example, when the workpiece 200 to be annealed is input onto the conveying mechanism 30, the portion of the workpiece 200 to be annealed that has not reached the conveying mechanism 30 can be supported on the support member 60; when the workpiece 200 to be annealed is output from the conveying mechanism 30, the portion that has extended out of the conveying mechanism 30 can also be supported on the support member 60.

[0101] Specifically, in some embodiments, the support members 60 are disposed on both sides of the conveying mechanism 30 along the conveying direction X. Meanwhile, when the operating platform 20 is provided with a receiving opening 25 , the support members 60 may be located on a side of the receiving opening 25 away from the conveying mechanism 30 .

[0102] In addition, in order to reduce the movement friction of the workpiece 200 to be annealed on the support member 60 , a guide wheel 61 may be provided at one end of the support member 60 , and the guide wheel 61 is used to support the workpiece 200 to be annealed.

[0103] Optionally, on one side of the conveying direction X of the conveying mechanism 30 , the number of the supporting member 60 may be one or more. When the number of the supporting members 60 is more than one, the distribution thereof may be in various ways, such as matrix distribution, linear distribution, and the like.

[0104] With such a design, the support member 60 is introduced to support the workpiece 200 to be annealed during the conveying process, thereby reducing deformation caused by gravity and further improving the annealing effect.

[0105] According to some embodiments of the present application, optionally, please refer to Figure 4 The annealing device 100 further includes a stopper 70 disposed on the operating platform 20 , and the stopper 70 is located on at least one side of the conveying mechanism 30 that intersects with the conveying direction X thereof.

[0106] The limiter 70 refers to a structure that can limit the deviation of the workpiece 200 to be annealed along the direction intersecting the conveying direction X. It can be fixedly arranged on the operating platform 20, or can be installed on the operating platform 20 in a lifting manner. For example, when the workpiece 200 to be annealed moves on the conveying mechanism 30, the limiter 70 can extend out of the operating platform 20; when the conveying of the workpiece 200 to be annealed is completed, the limiter 70 can be lowered and hidden in the operating platform 20, etc. For details, please refer to Figure 4 .

[0107] The shape of the limiting member 70 may also be designed in a variety of ways, for example, it may be designed as a cylindrical structure, or a roller structure, etc.

[0108] In addition, the number of the limiting member 70 on the side intersecting the conveying direction X may be one or more. When there are more than one limiting member 70 , all the limiting members 70 may be distributed along the conveying direction X at intervals.

[0109] With such a design, the limiting member 70 is introduced to limit the deviation of the workpiece 200 to be annealed in a direction intersecting with the conveying direction X, so that the workpiece 200 to be annealed can be accurately conveyed to the annealing station 21, thereby improving the annealing effect.

[0110] According to some embodiments of the present application, optionally, please refer to Figure 2 The annealing device 100 further includes: a visual component 80 for acquiring processing image information of the workpiece 200 to be annealed.

[0111] The visual component 80 refers to a device that can obtain image information of the workpiece 200 to be annealed during the annealing process in real time, for example, it can be but is not limited to a CCD (Charge Coupled Device) camera, etc.

[0112] To facilitate acquisition of image information, the annealing device 100 may further include a first bracket 22 disposed on the operating platform 20 , the visual component 80 is disposed on the first bracket 22 , and a detection end thereof is disposed toward the annealing station 21 .

[0113] With such a design, the visual component 80 is introduced to facilitate real-time acquisition of processing image information during the annealing process, timely adjustment of the annealing process, and improvement of the annealing effect.

[0114] According to some embodiments of the present application, optionally, please refer to Figure 2 The annealing device 100 further includes: a temperature measuring component 81 for obtaining temperature information of the workpiece 200 to be annealed.

[0115] The temperature measuring component 81 is capable of obtaining temperature information of the workpiece 200 to be annealed during the annealing process, and may be, but is not limited to, a temperature sensor or the like.

[0116] To facilitate obtaining temperature information, the annealing device 100 may further include a second bracket 23 disposed on the operating platform 20, and the temperature measuring element 81 is disposed on the second bracket 23, with its detection end disposed toward the annealing station 21. Of course, the annealing mechanism 10 may also be disposed on the second bracket 23.

[0117] Such a design introduces a temperature component, which makes it easy to obtain temperature information during the annealing process in real time, adjust the annealing process parameters in time, and improve the annealing effect; at the same time, it also increases the diversity of the process.

[0118] According to some embodiments of the present application, optionally, please refer to Figure 1 The annealing device 100 further includes: a dust removal component 82 for removing dust during the annealing process of the workpiece 200 to be annealed.

[0119] The dust removal component 82 is used to remove impurities generated by the workpiece 200 to be annealed during the annealing process. The dust removal method of the dust removal component 82 can be blowing or suction.

[0120] With such a design, impurities generated during the annealing process can be removed in time through the dust removal component 82, thereby reducing the impact of the impurities on the annealing process, which is beneficial to improving the annealing effect.

[0121] According to some embodiments of the present application, the present application provides a solar cell production system, which includes any of the above annealing devices 100. The workpiece 200 to be annealed may be a semiconductor film, and in some embodiments, the workpiece 200 to be annealed is a perovskite film.

[0122] According to some embodiments of this application, please refer to Figures 1 to 4 The present application provides an annealing device 100, including an operating platform 20 and an annealing mechanism 10 and a conveying mechanism 30 arranged on the operating platform 20. The annealing mechanism 10 includes a light source 11 capable of emitting laser light, a beam expansion module 12, a polarizer 13, a first reflector 141, a second reflector 142, a shaper 15 and an output component 16. The output component 16 includes a rotating mirror 161 and a field lens 162. During the annealing process, the laser light is emitted by the light source 11, and after being expanded and collimated by the beam expansion module 12, the diameter of the laser light is increased to prepare for subsequent beam shaping and diffusion. Then the laser light passes through the polarizer 13 to filter out the linearly polarized light, and then passes through the first reflector 141 and the second reflector 142 to change the direction of the laser light, making the device structure more compact. The shaper 15 can shape the incoming circular light spot into a rectangular light spot, and then after being refracted and diffused by the rotating mirror 161 and the field lens 162, it is incident on the perovskite solar cell to form a beam of rectangular light spots.

[0123] The technical features of the above-described embodiments may be arbitrarily combined. To make the description concise, not all possible combinations of the technical features in the above-described embodiments are described. However, as long as there is no contradiction in the combination of these technical features, they should be considered to be within the scope of this specification.

[0124] The above-described embodiments only express several implementation methods of the present application, and the descriptions thereof are relatively specific and detailed, but they cannot be construed as limiting the scope of the patent application. It should be pointed out that, for a person of ordinary skill in the art, several variations and improvements can be made without departing from the concept of the present application, and these all belong to the protection scope of the present application. Therefore, the protection scope of the patent application shall be subject to the attached claims.

Claims

1. An annealing mechanism, characterized in that: The annealing mechanism comprises: A beam expansion module (12), used for receiving light and expanding the light; A shaper (15), located downstream of the beam expansion module (12), is used to shape the light so that the shaped light forms a stripe-shaped light spot; The emission component (16) is used to irradiate the shaped light onto the workpiece (200) to be annealed.

2. The annealing mechanism according to claim 1, characterized in that: The annealing mechanism further comprises a polarizer (13), which is located between the beam expansion module (12) and the shaper (15) on the propagation path of the light and is used to polarize the light after beam expansion.

3. The annealing mechanism according to claim 1, characterized in that: The annealing mechanism further comprises a reflection component (14), wherein the reflection component (14) is used to reflect the light at least after passing through the beam expansion module (12) onto the shaper (15).

4. The annealing mechanism according to claim 3, characterized in that: The reflective component (14) comprises a first reflective mirror (141) and a second reflective mirror (142) which are arranged at an interval; the beam expander module (12) and the shaper (15) are located on the same side of the reflective component (14); the reflective surfaces (143) of the first reflective mirror (141) and the second reflective mirror (142) face each other, and the reflective surface (143) of the first reflective mirror (141) is arranged tilted toward the beam expander module (12); and the reflective surface (143) of the second reflective mirror (142) is arranged tilted toward the shaper (15).

5. The annealing mechanism according to any one of claims 1 to 4, characterized in that: The emission assembly (16) comprises a rotating mirror (161) and a field lens (162); the rotating mirror (161) is configured to be rotatable around its own axis and is used to receive shaped light and refract it onto the field lens (162); the field lens (162) is used to project the light onto the workpiece (200) to be annealed.

6. An annealing device, characterized in that: The annealing device comprises: An operating platform (20) having an annealing station (21); According to the annealing mechanism according to any one of claims 1 to 5, the emission component (16) is used to irradiate the shaped light onto the workpiece (200) to be annealed located at the annealing station (21).

7. The annealing device according to claim 6, characterized in that: The annealing device also includes: A conveying mechanism (30) is used to convey the workpiece (200) to be annealed to the annealing station (21).

8. The annealing device according to claim 7, characterized in that: The annealing device further comprises a lifting mechanism (40), a lifting opening (24) is provided through the surface of the operating platform (20), the conveying mechanism (30) is arranged in the lifting opening (24) and is drivingly connected to the lifting mechanism (40), and the lifting mechanism (40) is used to drive the conveying mechanism (30) to move up and down relative to the surface of the operating platform (20).

9. The annealing device according to claim 8, characterized in that: The lifting openings (24) include a plurality of lifting openings (24), all of which are sequentially distributed along a direction intersecting a conveying direction (X) of the conveying mechanism (30), and each of the lifting openings (24) has the conveying mechanism (30).

10. The annealing device according to claim 7, characterized in that: The annealing device further comprises: a positioning assembly (50), wherein the positioning assembly (50) is used to position the workpiece (200) to be annealed on the annealing station (21).

11. The annealing device according to claim 10, characterized in that: The positioning assembly (50) comprises a driving member (53) and a positioning member (52) driven by the driving member (53); the annealing station (21) has a receiving opening (25) at at least one end along the conveying direction (X) of the conveying mechanism (30); the positioning member (52) is arranged in the receiving opening (25); and one end of the positioning member (52) can protrude out of the receiving opening (25) and move toward one side of the annealing station (21) under the action of the driving member (53).

12. The annealing device according to claim 11, characterized in that: The positioning assembly (50) further comprises a base (51), the positioning member (52) being rotatably connected to the base (51), and one end of the positioning member (52) being connected to the driving member (53), and the other end being used for abutting against the workpiece (200) to be annealed on the annealing station (21).

13. The annealing device according to claim 7, characterized in that: The annealing device further comprises a support member (60), wherein the support member (60) is arranged on at least one side of the conveying mechanism (30) along its own conveying direction (X), and the support member (60) is used to support the workpiece (200) to be annealed that is input into or output from the conveying mechanism (30).

14. The annealing device according to claim 7, characterized in that: The annealing device further comprises a stopper (70) arranged on the operating platform (20), wherein the stopper (70) is located on at least one side of the conveying mechanism (30) intersecting with its own conveying direction (X).

15. The annealing device according to any one of claims 6 to 14, characterized in that: The annealing device also includes: a visual component (80) for acquiring processing image information of the workpiece to be annealed (200); and / or, a temperature measuring element (81), used for acquiring temperature information of the workpiece (200) to be annealed; and / or, A dust removal component (82) is used for removing dust during the annealing process of the workpiece (200) to be annealed.

16. A solar cell production system, characterized in that: The solar cell production system comprises the annealing device according to any one of claims 6-15.

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