Experimental photoresist stripping and cleaning all-in-one machine

Abstract

The utility model relates to the technical field of panel preparation, and provides an experimental photoresist stripping and cleaning all-in-one machine which comprises a spraying tank, a stripping assembly, a residual liquid removing assembly and a cleaning assembly, a clamping tool is arranged in the spraying tank, and the clamping tool is used for vertically fixing a substrate in the spraying tank; the stripping assembly comprises a first spraying end, and the first spraying end is arranged in the spraying tank and faces the side, provided with photoresist, of the substrate so as to spray stripping liquid towards the substrate. According to the photoresist stripping and cleaning all-in-one machine for the experiment, through the arrangement of the stripping assembly, the residual liquid removing assembly and the cleaning assembly, in the experiment process of verifying the stripping effect of the stripping liquid temperature and pressure on the positive photoresist, the substrate can be cleaned through the cleaning liquid so as to replace the residual stripping liquid on the surface of the substrate, and then pure water cleaning is conducted; and metal corrosion caused by hydroxyl released by amine in residual stripping liquid on the surface of the substrate when encountering water due to direct water washing is prevented.

Description

Technical Field

[0001] The utility model relates to the technical field of panel preparation, in particular to an experimental photoresist stripping and cleaning integrated machine. Background Art

[0002] In the panel preparation process, photolithography is usually used to make pattern circuits of different film layers. Positive photoresist is a must in the photolithography process. The photolithography process includes processes such as coating, photoresist coating, development, etching, and photoresist stripping. Photoresist stripping refers to the stripping and removal of unnecessary photoresist film layers after etching to form a fine circuit. Photoresist stripping and removal technology occupies a very important position in the microelectronics industry. The quality of stripping directly affects the yield of the product. At present, industrial water generally adopts a wet stripping process, that is, using a stripping liquid to dissolve and remove the photoresist. For example, the photoresist stripping method and photoresist stripping device with the publication number CN103995441A strip the photoresist on the surface of the substrate by using a photoresist stripping liquid.

[0003] The stripping solution is mainly composed of organic solvents and additives. The organic solvents include alcohol amines, amides and alcohol ether solvents. The alcohol amines mainly act on the connections between photoresist molecules to break them to form disintegrated small molecule photoresists, and the small molecule photoresists continue to dissolve in amide and alcohol ether solvents.

[0004] After the substrate has gone through the stripping process, a small amount of stripping liquid remains on the surface of the substrate, so the substrate surface needs to be cleaned. At this time, if pure water is used directly for cleaning, when the pure water contacts the stripping liquid on the surface of the substrate, the amine in the stripping liquid instantly releases a large amount of hydroxide ions when it meets water. The hydroxide ions will corrode the metal on the surface of the substrate, such as the aluminum film layer, and thus have an adverse effect on the substrate. Utility Model Content

[0005] In view of this, the utility model proposes an experimental photoresist stripping and cleaning all-in-one machine, which can be used to clean the substrate with a cleaning liquid to replace the stripping liquid remaining on the surface of the substrate during the experiment of verifying the effect of the stripping liquid temperature and pressure on the positive photoresist stripping, and then perform pure water cleaning to prevent direct water washing from causing metal corrosion due to the release of hydroxide by the amine in the stripping liquid remaining on the substrate surface when it comes into contact with water.

[0006] The technical solution of the utility model is implemented as follows: The utility model provides an experimental photoresist stripping and cleaning integrated machine, including a spray tank, a stripping component, a residual liquid removal component and a cleaning component, wherein:

[0007] A clamping tool is provided in the spray tank, and the clamping tool is used to fix the substrate upright in the spray tank;

[0008] The stripping assembly includes a first spray end, which is disposed in a spray tank and faces a side of the substrate having the photoresist so as to spray a stripping liquid toward the substrate;

[0009] The residual liquid removal assembly includes a second spray end, which is disposed in the spray tank and faces the side of the substrate having the photoresist, and is used to spray a cleaning liquid onto the substrate to remove the stripping liquid remaining on the substrate;

[0010] The cleaning component comprises at least two third spray ends, each of which is arranged in a spray tank and faces two sides of the substrate respectively, and the third spray end is used for spraying pure water to the substrate for cleaning.

[0011] On the basis of the above technical solution, preferably, the stripping assembly further includes a first liquid storage tank and a first delivery pump, wherein:

[0012] The first liquid storage tank is arranged opposite to the spray tank and is connected to the first spray end through a pipeline, and the first liquid storage tank is used to store the stripping liquid;

[0013] The first delivery pump is arranged on a pipeline connecting the first liquid storage tank and the first spray end, and the first delivery pump is used to deliver the stripping liquid in the first liquid storage tank to the first spray end.

[0014] Further preferably, the stripping assembly further comprises a heating assembly, and the heating assembly is disposed in the first liquid storage tank to heat the stripping liquid.

[0015] Further preferably, the stripping assembly further comprises a stripping liquid reflux pipe, and the stripping liquid reflux pipe connects the first liquid storage tank and the spray tank, so that the stripping liquid in the spray tank can flow back into the first liquid storage tank.

[0016] On the basis of the above technical solution, preferably, the residual liquid removal component includes a second liquid storage tank and a second delivery pump, wherein:

[0017] The second liquid storage tank is arranged opposite to the spray tank and is connected to the second spray end through a pipeline, and the second liquid storage tank is used to store the cleaning liquid;

[0018] The second delivery pump is arranged on a pipeline connecting the second liquid storage tank and the second spray end, and the second delivery pump is used to deliver the cleaning liquid in the second liquid storage tank to the second spray end.

[0019] Further preferably, the cleaning assembly includes a third liquid storage tank and a third delivery pump, wherein:

[0020] The third liquid storage tank is arranged opposite to the spray tank and is connected to the third spray end through a pipeline, and the third liquid storage tank is used to store pure water;

[0021] The third delivery pump is arranged on a pipeline connecting the third liquid storage tank and the third spray end, and the third delivery pump is used to deliver the pure water in the third liquid storage tank to the third spray end.

[0022] More preferably, it also includes a return pipe group, and the second liquid storage tank, the third liquid storage tank and the spray tank are connected through the return pipe group, so that the cleaning liquid and pure water sprayed by the spray tank can flow back to the second liquid storage tank and the third liquid storage tank respectively.

[0023] Further preferably, the return water pipe group includes a cleaning liquid return water end, a pure water return water end and a return water inlet end, the cleaning liquid return water end is connected to the second liquid storage tank, the pure water return water end is connected to the third liquid storage tank, the return water inlet end is connected to the spray tank, and the return water inlet end is connected to the cleaning liquid return water end and the pure water return water end.

[0024] More preferably, the number of the return water inlet ends is at least two, and they are respectively arranged on both sides of the base plate in the spray tank.

[0025] The experimental photoresist stripping and cleaning integrated machine of the utility model has the following beneficial effects compared with the prior art:

[0026] (1) By setting up a stripping component, a residual liquid removal component and a cleaning component, during the experiment of verifying the effect of the temperature and pressure of the stripping liquid on the positive photoresist stripping, the substrate can be cleaned with a cleaning liquid to replace the stripping liquid remaining on the substrate surface, and then pure water cleaning is performed to prevent metal corrosion caused by the release of hydroxide by the amine in the stripping liquid remaining on the substrate surface when it meets water due to direct water washing;

[0027] (2) A stripping liquid reflux pipe and a reflux pipe group are provided so that the stripping liquid can be refluxed to the first liquid storage tank through the stripping liquid reflux pipe for recycling. When the amine content is low, the stripping liquid can be replaced. Accordingly, the cleaning liquid and pure water in the cleaning process can be recovered, and the cleaning liquid can be refluxed to the second liquid storage tank, and the pure water can be refluxed to the third liquid storage tank, so as to save the cost of the experiment and make the experimental process more green and environmentally friendly. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the utility model or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the utility model. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0029] Figure 1 It is a structural schematic diagram of the experimental photoresist stripping and cleaning all-in-one machine of the present invention. DETAILED DESCRIPTION

[0030] The following will be combined with the implementation of the utility model to clearly and completely describe the technical solutions in the implementation of the utility model. Obviously, the described implementation is only a part of the implementation of the utility model, not all of the implementations. Based on the implementation of the utility model, all other implementations obtained by ordinary technicians in this field without creative work are within the scope of protection of the utility model.

[0031] like Figure 1 As shown, the experimental photoresist stripping and cleaning integrated machine of the utility model comprises a spray tank 1, a stripping component 2, a residual liquid removal component 3 and a cleaning component 4.

[0032] A clamping tool 11 is provided in the spray tank 1, and the clamping tool 11 is used to fix the substrate upright in the spray tank 1. The spray tank 1 is the main place for photoresist stripping and cleaning of the substrate. It can be set to a cylindrical or square shape. On its outer side, a warehouse door for taking and placing the substrate needs to be set. In addition, the clamping tool 11 can be set to multiple and fixed on the inner wall of the spray tank 1. The edge of the substrate is clamped to make it stand upright in the spray tank 1. The clamping tool 11 can be set to a manual clamp or an electric clamp.

[0033] The stripping component 2 includes a first spray end 21, which is arranged in the spray tank 1 and faces the side of the substrate with the photoresist to spray the stripping liquid toward the substrate. In this embodiment, a plurality of first spray ends 21 are provided on the stripping component 2 and are arranged in an array on the side of the substrate with the photoresist. When the photoresist stripping operation is performed, the stripping liquid is sprayed toward the substrate from the first spray end 21. For the convenience of explanation, the side of the substrate with the photoresist is regarded as the front side and the other side as the back side.

[0034] The residual liquid removal assembly 3 includes a second spray end 31, which is disposed in the spray tank 1 and faces the side of the substrate having the photoresist. The second spray end 31 is used to spray cleaning liquid onto the substrate to remove residual stripping liquid on the substrate.

[0035] After the photoresist stripping on the substrate is completed, the residual liquid removal component 3 can spray the cleaning liquid toward the substrate through the second spray end 31. The cleaning liquid is preferably isopropyl alcohol. The photoresist remaining on the front side of the substrate is cleaned and replaced by the cleaning liquid. In this embodiment, the number of second spray ends 31 may be less than the first spray end 21, but in order to fully cover the front side of the substrate for stripping liquid removal, the second spray end 31 needs to spray the cleaning liquid from the top of the substrate.

[0036] The cleaning component 4 includes at least two third spray ends 41 , each of which is disposed in the spray tank 1 and faces two sides of the substrate respectively, and the third spray ends 41 are used to spray pure water onto the substrate for cleaning.

[0037] At least two third spray ends 41 are provided because the substrate needs to be cleaned with pure water from both the front and back sides, thereby achieving an overall cleaning operation of the substrate.

[0038] Through the above-mentioned settings, during the experimental process of verifying the effect of stripping solution temperature and pressure on positive photoresist stripping, the substrate can be cleaned with a cleaning solution to replace the stripping solution remaining on the substrate surface, and then pure water cleaning can be performed to prevent direct water washing from causing metal corrosion due to the release of hydroxide by amines in the stripping solution remaining on the substrate surface when it comes into contact with water.

[0039] In this embodiment, the stripping component 2 also includes a first liquid storage tank 22 and a first delivery pump 23. The first liquid storage tank 22 is arranged opposite to the spray tank 1 and is connected to the first spray end 21 through a pipeline. The first liquid storage tank 22 is used to store the stripping liquid. The first delivery pump 23 is arranged on the pipeline connecting the first liquid storage tank 22 and the first spray end 21. The first delivery pump 23 is used to deliver the stripping liquid in the first liquid storage tank 22 to the first spray end 21.

[0040] A filling port is also provided on the first liquid storage tank 22, and the filling port is closed by a cover plate, which is used for filling the stripping liquid into the first liquid storage tank 22. At the same time, a discharge pipe is provided at the bottom of the first liquid storage tank 22, which is used for discharging the stripping liquid in the first liquid storage tank 22. When the stripping component 2 is in use, the stripping liquid can be delivered by the first delivery pump 23, and a pressure gauge is provided on the connecting pipeline between the first liquid storage tank 22 and the spray tank 1. The stripping liquid delivery pressure is detected by the pressure gauge, and the pressure is adjusted by the first delivery pump 23 to adjust the spray pressure of the stripping liquid for conducting corresponding experiments. In addition, the first delivery pump 23 can selectively use a magnetic pump.

[0041] In this embodiment, the stripping assembly 2 further includes a heating assembly 24 , and the heating assembly 24 is disposed in the first liquid storage tank 22 to heat the stripping liquid.

[0042] Specifically, the heating component 24 includes a temperature sensor and a heating rod. The detection end of the temperature sensor and the heating rod are both placed in the first liquid storage tank 22 and extend into the stripping liquid. During the stripping operation of the photoresist, the temperature of the stripping liquid will also have a great influence on the stripping efficiency. The set heating rod and temperature sensor allow the user to customize the temperature of the stripping liquid, and then combine with the pressure adjustment to complete the stripping test of temperature and pressure parameter adjustment, thereby obtaining better stripping parameters.

[0043] As a preferred embodiment, the stripping component 2 also includes a stripping liquid reflux pipe 25, which connects the first liquid storage tank 22 and the spray tank 1, so that the stripping liquid in the spray tank 1 can flow back to the first liquid storage tank 22. The stripping effect of the stripping liquid is positively correlated with its amine content, but during the stripping process, the amine content gradually decreases. Therefore, the stripping liquid can flow back to the first liquid storage tank 22 through the stripping liquid reflux pipe 25 for recycling, and can be replaced when the amine content is low.

[0044] It should be noted that a valve needs to be provided on the stripping liquid reflux pipe 25 , and the valve is opened when the stripping liquid needs to be refluxed, and the valve is closed in other cases to prevent other cleaning liquids and pure water from entering the first liquid storage tank 22 .

[0045] Similarly, the residual liquid removal component 3 includes a second liquid storage tank 32 and a second delivery pump 33. The second liquid storage tank 32 is arranged opposite to the spray tank 1 and is connected to the second spray end 31 through a pipeline. The second liquid storage tank 32 is used to store cleaning liquid. The second delivery pump 33 is arranged on the pipeline connecting the second liquid storage tank 32 and the second spray end 31. The second delivery pump 33 is used to deliver the cleaning liquid in the second liquid storage tank 32 to the second spray end 31.

[0046] Different from the stripping assembly 2, there is no need to set a pressure gauge on the connecting pipeline between the second liquid storage tank 32 and the spray tank 1. Similarly, the second liquid storage tank 32 is also provided with a filling port and a sealing cover, as well as a discharge pipe.

[0047] Correspondingly, the cleaning component 4 includes a third liquid storage tank 42 and a third delivery pump 43. The third liquid storage tank 42 is arranged opposite to the spray tank 1 and is connected to the third spray end 41 through a pipeline. The third liquid storage tank 42 is used to store pure water. The third delivery pump 43 is arranged on the pipeline connecting the third liquid storage tank 42 and the third spray end 41. The third delivery pump 43 is used to deliver the pure water in the third liquid storage tank 42 to the third spray end 41.

[0048] In this embodiment, the configuration of the cleaning component 4 is basically the same as that of the residual liquid removal component 3, which is reflected in the specific structure of the second liquid storage tank 32 and the third liquid storage tank 42. The biggest difference is that the third spray end 41 is arranged on both sides of the substrate, while the second spray end 31 is only arranged on the front of the substrate.

[0049] As a preferred embodiment, a return pipe group 5 is also provided, and the second liquid storage tank 32, the third liquid storage tank 42 and the spray tank 1 are connected through the return pipe group 5, so that the cleaning liquid and pure water sprayed by the spray tank 1 can flow back to the second liquid storage tank 32 and the third liquid storage tank 42 respectively.

[0050] The cleaning liquid and pure water in the cleaning process can be recovered by the provided return pipe group 5, and the cleaning liquid can be returned to the second liquid storage tank 32, and the pure water can be returned to the third liquid storage tank 42, so as to save the cost used in the experiment.

[0051] Specifically, the return water pipe group 5 includes a cleaning liquid return water end, a pure water return water end and a return water inlet end. The cleaning liquid return water end is connected to the second liquid storage tank 32, the pure water return water end is connected to the third liquid storage tank 42, the return water inlet end is connected to the spray tank 1, and the return water inlet end is connected to the cleaning liquid return water end and the pure water return water end.

[0052] Valves are provided on the cleaning liquid return end, the pure water return end and the return water inlet end. When it is necessary to return the liquid to the second liquid storage tank 32, the valve on the pure water return end is closed, and the valves on the cleaning liquid return end and the return water inlet end are opened, so that the cleaning liquid can return to the second liquid storage tank 32. Correspondingly, when it is necessary to return the liquid to the third liquid storage tank 42, the valve on the cleaning liquid return end is closed, and the valves on the pure water return end and the return water inlet end are opened, so that the pure water can return to the third liquid storage tank 42.

[0053] As a preferred embodiment, the number of the return water inlet ends is at least two, and they are respectively arranged on both sides of the base plate in the spray tank 1.

[0054] Since pure water cleans both sides of the substrate, in order to improve the pure water return efficiency and avoid pure water accumulation on the back side of the substrate, two return water inlet ends are set to allow the cleaning pure water on both sides of the substrate to return.

[0055] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the protection scope of the present invention.

Claims

1. An experimental photoresist stripping and cleaning all-in-one machine, characterized in that: It comprises a spray tank (1), a stripping component (2), a residual liquid removal component (3) and a cleaning component (4), wherein: A clamping tool (11) is provided in the spray tank (1), and the clamping tool (11) is used to vertically fix the substrate in the spray tank (1); The stripping assembly (2) comprises a first spray end (21), which is arranged in the spray tank (1) and faces a side of the substrate having the photoresist, so as to spray a stripping liquid toward the substrate; The residual liquid removal component (3) comprises a second spray end (31), the second spray end (31) being arranged in the spray tank (1) and facing the side of the substrate having the photoresist, the second spray end (31) being used for spraying a cleaning liquid onto the substrate to remove the stripping liquid remaining on the substrate; The cleaning component (4) comprises at least two third spray ends (41), each of the third spray ends (41) is arranged in the spray tank (1) and faces two sides of the substrate respectively, and the third spray ends (41) are used to spray pure water onto the substrate for cleaning.

2. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 1, characterized in that: The stripping assembly (2) further comprises a first liquid storage tank (22) and a first delivery pump (23), wherein: The first liquid storage tank (22) is arranged opposite to the spray tank (1) and is connected to the first spray end (21) through a pipeline, and the first liquid storage tank (22) is used to store the stripping liquid; The first delivery pump (23) is arranged on a pipeline connecting the first liquid storage tank (22) and the first spray end (21), and the first delivery pump (23) is used to deliver the stripping liquid in the first liquid storage tank (22) to the first spray end (21).

3. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 2, characterized in that: The stripping assembly (2) further comprises a heating assembly (24), wherein the heating assembly (24) is arranged in the first liquid storage tank (22) to heat the stripping liquid.

4. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 2, characterized in that: The stripping assembly (2) further comprises a stripping liquid return pipe (25), wherein the stripping liquid return pipe (25) connects the first liquid storage tank (22) and the spray tank (1), so that the stripping liquid in the spray tank (1) can return to the first liquid storage tank (22).

5. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 1, characterized in that: The residual liquid removal assembly (3) comprises a second liquid storage tank (32) and a second delivery pump (33), wherein: The second liquid storage tank (32) is arranged opposite to the spray tank (1) and is connected to the second spray end (31) through a pipeline. The second liquid storage tank (32) is used to store cleaning liquid. The second delivery pump (33) is arranged on a pipeline connecting the second liquid storage tank (32) and the second spray end (31), and the second delivery pump (33) is used to deliver the cleaning liquid in the second liquid storage tank (32) to the second spray end (31).

6. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 5, characterized in that: The cleaning assembly (4) comprises a third liquid storage tank (42) and a third delivery pump (43), wherein: The third liquid storage tank (42) is arranged opposite to the spray tank (1) and is connected to the third spray end (41) through a pipeline. The third liquid storage tank (42) is used to store pure water. The third delivery pump (43) is arranged on a pipeline connecting the third liquid storage tank (42) and the third spray end (41), and the third delivery pump (43) is used to deliver pure water in the third liquid storage tank (42) to the third spray end (41).

7. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 6, characterized in that: The invention also comprises a return pipe group (5), wherein the second liquid storage tank (32), the third liquid storage tank (42) and the spray tank (1) are connected via the return pipe group (5), so that the cleaning liquid and pure water sprayed by the spray tank (1) can flow back to the second liquid storage tank (32) and the third liquid storage tank (42) respectively.

8. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 7, characterized in that: The return water pipe group (5) comprises a cleaning liquid return water end, a pure water return water end and a return water inlet end, the cleaning liquid return water end is connected to the second liquid storage tank (32), the pure water return water end is connected to the third liquid storage tank (42), the return water inlet end is connected to the spray tank (1), and the return water inlet end is connected to the cleaning liquid return water end and the pure water return water end.

9. The experimental photoresist stripping and cleaning integrated machine as claimed in claim 8, characterized in that: The number of the return water inlet ends is at least two, and they are respectively arranged on both sides of the base plate in the spray tank (1).

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