Cooling structure for magnetron sputtering process cavity partition plate

Abstract

The utility model relates to the technical field of magnetron sputtering coating, in particular to a cooling structure for a magnetron sputtering process cavity partition plate, which comprises a process cavity, a water inlet pipe joint and a water outlet pipe joint, and further comprises the process cavity partition plate arranged in the process cavity, and a cooling water channel is arranged in the process cavity partition plate. One end of the cooling water channel is communicated with the water inlet pipe joint, and the other end of the cooling water channel is communicated with the water outlet pipe joint to form a circulation loop. The cooling water channel is arranged in the process cavity partition plate, the cooling water channel, the water inlet pipe connector and the water outlet pipe connector form a circulation loop, the cooling channel is integrated on the process cavity partition plate, holes do not need to be formed in the bottom plate of the process cavity, and therefore the structural strength of the process cavity is improved; and the problems that in the prior art, the risk of internal leakage occurs in the circulation process of cooling water in the partition plate, and installation and replacement are not easy can be solved.

Description

Technical Field

[0001] The utility model relates to the technical field of magnetron sputtering coating, in particular to a cooling structure for a partition plate of a magnetron sputtering process chamber. Background Art

[0002] In the existing magnetron sputtering coating system, the process chamber includes a cathode chamber and a molecular pump chamber. The cathode chamber is used to assemble the sputtering cathode, and the molecular pump chamber is used to assemble the molecular pump cover assembly. The cathode chamber and the molecular pump chamber are separated by a partition. During the magnetron sputtering coating process, the process chamber is generally accompanied by a high temperature environment of more than 150°C. Therefore, the partition used to isolate the cathode chamber and the molecular pump chamber is generally cooled by cooling water. The existing partition cooling method is generally to weld a section of cooling water pipe between the partition and the process chamber bottom plate, and assemble a water pipe joint on the atmospheric side of the process chamber bottom plate.

[0003] In the prior art, welding a cooling water pipe between the partition and the process chamber bottom plate not only increases the difficulty of welding, but also increases the risk of internal leakage; at the same time, because the water pipe joint is installed on the process chamber bottom plate, it will also cause the installation to remain unchanged and difficult to replace. Utility Model Content

[0004] In view of the shortcomings of the existing background technology, the purpose of the utility model is to provide a cooling structure for the partition of the magnetron sputtering process chamber with a simple structure and easy use. A cooling water channel is provided in the process chamber partition of the utility model, and a circulation loop is formed with the water inlet pipe joint and the water outlet pipe joint. The cooling channel is integrated into the process chamber partition as an integral design, and there is no need to open a hole in the process chamber bottom plate, which not only increases the structural strength of the process chamber, but also can solve the risk of internal leakage of cooling water during the circulation of the partition and the problem of difficulty in installation and replacement in the prior art; the cooling structure for the partition of the magnetron sputtering process chamber is simple, reliable, and low in cost, which saves costs to a great extent and improves work efficiency.

[0005] To achieve the above, the technical solution of the utility model is: a cooling structure for a magnetron sputtering process chamber partition, including a process chamber, a water inlet pipe joint and a water outlet pipe joint, characterized in that: it also includes a process chamber partition, the process chamber partition is arranged in the process chamber, and a cooling water channel is provided in the process chamber partition, one end of the cooling water channel is connected to the water inlet pipe joint, and the other end of the cooling water channel is connected to the water outlet pipe joint to form a circulation loop.

[0006] Furthermore, the water inlet pipe joint and the water outlet pipe joint are arranged on the side wall of the process chamber, the water inlet pipe joint is connected to the external cooling water inlet pipe, and the water outlet pipe joint is connected to the external cooling water outlet pipe.

[0007] Furthermore, the water inlet pipe joint and the water outlet pipe joint are arranged on the same side wall of the process chamber, and the water outlet pipe joint is located above the water inlet pipe joint.

[0008] Furthermore, the process chamber partition and the cooling water channel are an integrated structure.

[0009] Furthermore, a plurality of process chamber partitions are provided in the process chamber, and intervals are provided between adjacent process chamber partitions.

[0010] Furthermore, a long through groove is provided in the middle of the process chamber partition, and through holes are provided in the upper and lower parts of the process chamber partition, and the through holes are arranged on both sides of the long through groove along the length direction of the long through groove.

[0011] Furthermore, the long through groove is a square structure, the through hole is a waist-shaped hole structure, and the multiple through holes are equally spaced and evenly distributed.

[0012] Furthermore, the cooling water channel includes channel I, channel II, channel III, channel IV and channel V which are connected in sequence, channel I is connected to the water outlet pipe joint, channel V is connected to the water inlet pipe joint, and channel I and channel V are both L-shaped structures.

[0013] Furthermore, the channel II is arranged at the top of the process chamber partition, and the channel IV is arranged at the bottom of the process chamber partition, and both the channel II and the channel IV are located outside the through hole.

[0014] Furthermore, a mounting seat is provided at the bottom of the process chamber, and the mounting seat includes a base plate, a support plate and a reinforcement plate. The base plate is installed on the floor of the process chamber, the bottom of the support plate is vertically installed on the base plate, one side of the support plate is connected to the side wall of the process chamber, and the other side of the support plate is provided with a reinforcement plate.

[0015] The advantages of adopting the technical solution of the utility model are:

[0016] A cooling water channel is provided in the process chamber partition of the utility model, and a circulation loop is formed with the water inlet pipe joint and the water outlet pipe joint. The cooling channel is integrated on the process chamber partition as an integral design, and there is no need to open a hole in the process chamber bottom plate, which not only increases the structural strength of the process chamber, but also solves the risk of internal leakage of cooling water during the circulation of the cooling water in the partition and the problem of difficulty in installation and replacement in the prior art; the cooling structure for the magnetron sputtering process chamber partition is simple, reliable, and low in cost, which saves costs to a great extent and improves work efficiency. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] In order to more clearly illustrate the technical solutions in the present invention or the prior art, the drawings required for use in the embodiments or the description of the prior art will be briefly introduced below. Obviously, the drawings in the following description are only for the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0018] Figure 1 This is a schematic diagram of the cooling structure of the partition plate of the magnetron sputtering process chamber of the utility model;

[0019] Figure 2 This is a schematic diagram of the process chamber partition structure of the utility model.

[0020] The markings in the above figure are respectively: 1. process chamber; 2. water inlet pipe joint; 3. water outlet pipe joint; 4. process chamber partition; 5. cooling water channel; 51. channel I; 52. channel II; 53. channel III; 54. channel IV; 55. channel V; 6. long through groove; 7. through hole; 8. mounting seat; 81. bottom plate; 82. support plate; 83. reinforcement plate. DETAILED DESCRIPTION

[0021] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with specific embodiments.

[0022] It should be noted that, unless otherwise defined, the technical terms or scientific terms used in the present invention should be understood by people with ordinary skills in the field to which the present invention belongs. The words "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. "Include" or "comprise" and similar words mean that the elements or objects appearing before the word include the elements or objects listed after the word and their equivalents, without excluding other elements or objects. "Connect" or "connected" and similar words are not limited to physical or mechanical connections, but may include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship may also change accordingly.

[0023] like Figure 1 , Figure 2As shown, a cooling structure for a magnetron sputtering process chamber partition includes a process chamber 1, a water inlet pipe joint 2 and a water outlet pipe joint 3, and also includes a process chamber partition 4. The process chamber partition 4 is arranged in the process chamber 1, and a cooling water channel 5 is arranged in the process chamber partition 4. One end of the cooling water channel 5 is connected to the water inlet pipe joint 2, and the other end of the cooling water channel 5 is connected to the water outlet pipe joint 3 to form a circulation loop. The process chamber partition of the utility model is provided with a cooling water channel, and a circulation loop is formed with the water inlet pipe joint and the water outlet pipe joint. The cooling channel is integrated in the process chamber partition as an integral design, and there is no need to open a hole in the process chamber bottom plate, which not only increases the structural strength of the process chamber, but also can solve the risk of internal leakage during the circulation of cooling water in the partition and the problem of difficulty in installation and replacement in the prior art; the cooling structure for the magnetron sputtering process chamber partition is simple, reliable, and low in cost, which saves costs to a great extent and improves work efficiency.

[0024] The water inlet pipe joint 2 and the water outlet pipe joint 3 are arranged on the side wall of the process chamber 1, the water inlet pipe joint 2 is connected to the external cooling water inlet pipe, and the water outlet pipe joint 3 is connected to the external cooling water outlet pipe. The water inlet pipe joint 2 and the water outlet pipe joint 3 are arranged on the same side wall of the process chamber 1, and the water outlet pipe joint 3 is located above the water inlet pipe joint 2.

[0025] The process chamber partition plate 4 and the cooling water channel 5 are an integrated structure. A plurality of process chamber partition plates 4 are arranged in the process chamber 1, and intervals are arranged between adjacent process chamber partition plates 4.

[0026] A long through slot 6 is provided in the middle of the process chamber partition 4, and through holes 7 are provided at the upper and lower parts of the process chamber partition 4. The through holes 7 are arranged on both sides of the long through slot 6 along the length direction of the long through slot 6. The long through slot 6 is a square structure, and the through holes 7 are waist-shaped hole structures. A plurality of through holes 7 are evenly distributed at equal intervals.

[0027] The cooling water channel 5 includes a channel I51, a channel II52, a channel III53, a channel IV54 and a channel V55 which are connected in sequence, the channel I51 is connected to the outlet pipe joint 3, the channel V55 is connected to the inlet pipe joint 2, and the channel I51 and the channel V55 are both L-shaped structures. The channel II52 is arranged at the top of the process chamber partition 4, the channel IV54 is arranged at the bottom of the process chamber partition 4, and the channel II52 and the channel IV54 are both located outside the through hole 7.

[0028] A mounting seat 8 is provided at the bottom of the process chamber 1. The mounting seat 8 includes a bottom plate 81, a support plate 82 and a reinforcing plate 83. The bottom plate 81 is installed on the floor of the process chamber 1. The bottom of the support plate 82 is vertically installed on the bottom plate 81. One side of the support plate 82 is connected to the side wall of the process chamber 1. The other side of the support plate 82 is provided with a reinforcing plate 83. The side of the reinforcing plate 83 is connected to the support plate 82, and the bottom of the reinforcing plate 83 is connected to the bottom plate 81. The provision of the reinforcing plate 83 increases the structural strength of the mounting seat.

[0029] Specifically, the utility model partition cooling structure is composed of a process chamber partition, a water inlet pipe joint and a water outlet pipe joint, wherein a cooling water channel is provided in the process chamber partition to ensure that the cooling water can circulate; the water inlet pipe joint is connected to the external cooling water inlet pipe to provide circulating cold water for the process chamber partition; the water outlet pipe joint is connected to the external cooling water outlet pipe to discharge the cooling water heated by the process chamber partition out of the partition, so that the process chamber partition maintains a constant temperature. In addition, the water inlet and outlet pipe joints are located on the side of the process chamber for easy installation and replacement; the partition cooling water channel is integrated, and there is no need to drill holes in the process chamber bottom plate, reducing the risk of internal leakage.

[0030] Those skilled in the art should understand that the discussion of any of the above embodiments is merely illustrative and is not intended to imply that the scope of the present invention is limited to these examples; under the concept of the present invention, the technical features in the above embodiments or different embodiments can also be combined, the steps can be implemented in any order, and there are many other variations of the different aspects of the present invention as described above, which are not provided in detail for the sake of simplicity. Therefore, any omissions, modifications, equivalent substitutions, improvements, etc. made within the spirit and principles of the present invention should be included in the scope of protection of the present invention.

Claims

1. A cooling structure for a partition plate of a magnetron sputtering process chamber, comprising a process chamber (1), a water inlet pipe joint (2) and a water outlet pipe joint (3), characterized in that: The invention also comprises a process chamber partition (4), wherein the process chamber partition (4) is arranged in the process chamber (1), and a cooling water channel (5) is arranged in the process chamber partition (4), wherein one end of the cooling water channel (5) is connected to the water inlet pipe joint (2), and the other end of the cooling water channel (5) is connected to the water outlet pipe joint (3) to form a circulation loop.

2. A cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 1, characterized in that: The water inlet pipe joint (2) and the water outlet pipe joint (3) are arranged on the side wall of the process chamber (1); the water inlet pipe joint (2) is connected to an external cooling water inlet pipe, and the water outlet pipe joint (3) is connected to an external cooling water outlet pipe.

3. A cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 2, characterized in that: The water inlet pipe joint (2) and the water outlet pipe joint (3) are arranged on the same side wall of the process chamber (1), and the water outlet pipe joint (3) is located above the water inlet pipe joint (2).

4. A cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 3, characterized in that: The process chamber partition (4) and the cooling water channel (5) are an integrated structure.

5. A cooling structure for a partition plate of a magnetron sputtering process chamber according to any one of claims 2 to 4, characterized in that: A plurality of process chamber partitions (4) are arranged in the process chamber (1), and intervals are arranged between adjacent process chamber partitions (4).

6. A cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 5, characterized in that: The process chamber partition (4) is provided with a long through groove (6) in the middle, and through holes (7) are provided at the upper and lower parts of the process chamber partition (4). The through holes (7) are arranged on both sides of the long through groove (6) along the length direction of the long through groove (6).

7. A cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 6, characterized in that: The long through groove (6) is a square structure, the through hole (7) is a waist-shaped hole structure, and the plurality of through holes (7) are evenly distributed and equally spaced from each other.

8. A cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 7, characterized in that: The cooling water channel (5) comprises a channel I (51), a channel II (52), a channel III (53), a channel IV (54) and a channel V (55) which are connected in sequence, the channel I (51) is connected to the water outlet pipe joint (3), the channel V (55) is connected to the water inlet pipe joint (2), and the channel I (51) and the channel V (55) are both L-shaped structures.

9. A cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 8, characterized in that: The channel II (52) is arranged at the top of the process chamber partition (4), and the channel IV (54) is arranged at the bottom of the process chamber partition (4). Both the channel II (52) and the channel IV (54) are located outside the through hole (7).

10. The cooling structure for a partition plate of a magnetron sputtering process chamber according to claim 1, characterized in that: A mounting seat (8) is provided at the bottom of the process chamber (1), and the mounting seat (8) comprises a bottom plate (81), a support plate (82) and a reinforcing plate (83); the bottom plate (81) is installed on the floor of the process chamber (1); the bottom of the support plate (82) is vertically installed on the bottom plate (81); one side of the support plate (82) is connected to the side wall of the process chamber (1); and the other side of the support plate (82) is provided with a reinforcing plate (83).

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