Crucible for crystal growth and crystal growth equipment
By designing a structure with uneven wall thickness in the crucible and adjusting the fluid flow field in the growth chamber, the problem of insufficient growth efficiency and quality of semiconductor crystals in the prior art is solved, and higher efficiency and higher quality crystal growth are achieved.
CN222684841UActive Publication Date: 2025-03-28MEISHAN BOYA ADVANCED MATERIALS CO LTD
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Patent Information
- Application Number
- CN202421505981.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-06-28
- Publication Date
- 2025-03-28
- Estimated Expiration
- 2034-06-28
AI Technical Summary
Technical Problem
The prior art is difficult to achieve high efficiency and high quality growth during semiconductor crystal growth, especially in regulating the fluid flow field in the growth chamber and reducing impurity content and defects.
Method used
By redesigning the structure of the crucible, the thickness of its side walls is uneven, thereby adjusting the fluid flow field in the growth chamber to form a fast path to ensure smooth crystal growth.
Benefits of technology
It achieves higher efficiency and higher quality crystal growth, reduces the impurity content and defects in the crystal, and improves the melting efficiency.
✦ Generated by Eureka AI based on patent content.
Abstract
The embodiment of the utility model provides a crucible for crystal growth and crystal growth equipment. On any section perpendicular to the axis of the crucible, the wall thickness of the crucible comprises a first wall thickness value and a second wall thickness value, the first wall thickness value is the maximum value of the wall thickness of the crucible, the second wall thickness value is the minimum value of the wall thickness of the crucible, and the first wall thickness value is different from the second wall thickness value. The crystal growth equipment comprises a seed crystal support crucible, the shortest distance between a seed crystal support and the inner wall of the crucible is between a first distance and a second distance, the first distance is the maximum value of the shortest distance, and the second distance is the minimum value of the shortest distance; the first distance is different from the second distance.
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