Coating furnace and coating equipment

Abstract

The present application proposes a coating furnace body and coating equipment with a self-cleaning function. The coating furnace body includes a furnace tube, a first sealing component, a plasma generator and a second sealing component, and a reaction chamber is formed inside the furnace tube. The present application arranges a plasma generator outside the furnace tube, and arranges a first sealing component and a second sealing component at both ends of the furnace tube to ensure the sealing of the furnace tube during cleaning, and connects the plasma generator to the plasma air inlet on the first sealing component, so that the plasma generated by the plasma generator enters the reaction chamber and is evenly distributed, and the plasma can react with the amorphous silicon film in the reaction chamber, thereby removing the amorphous silicon film on all quartz parts in the reaction chamber, thereby achieving the purpose of online cleaning and simultaneous cleaning.

Description

Technical Field

[0001] The present application relates to the technical field of solar cell production equipment, and in particular to a coating furnace and coating equipment. Background Art

[0002] In the production process of solar cells, coating equipment can be used to complete the coating (thin film deposition) process. At present, the coating furnace body of the coating equipment is mainly made of quartz material (the coating furnace body made of quartz material is also called a quartz tube), and the coating furnace body is equipped with quartz parts such as quartz boats, boat supports and paddles. Quartz will be coated with amorphous silicon film during continuous work, and will slag over a long period of time, affecting the product process. The most common way to clean quartz parts in the industry is offline cleaning. Offline cleaning can often only clean quartz parts such as quartz boats, boat supports, paddles, etc. that are easy to disassemble. If the coating furnace body (quartz tube) needs to be cleaned, the coating furnace body (quartz tube) also needs to be disassembled and moved, which results in large losses. The offline cleaning method is relatively cumbersome, and it is impossible to clean all quartz parts at the same time. Utility Model Content

[0003] In view of this, the present application proposes a coating furnace body and a coating device to perform online cleaning (i.e., cleaning is possible without disassembling the coating furnace body or the quartz parts in the coating furnace body) and simultaneous cleaning of the coating furnace body and the quartz parts in the coating furnace body.

[0004] In one embodiment of the present application, a coating furnace body is provided, which includes a furnace tube, a first sealing component, a plasma generator, a second sealing component and a heating furnace. A reaction chamber is formed inside the furnace tube, and a furnace door is provided at one end of the furnace tube to open and close the reaction chamber. The heating furnace sleeve is arranged on the outer peripheral side of the furnace tube for heating the furnace tube. The first sealing component is arranged between the furnace door and the furnace tube to seal the reaction chamber, and a plasma air inlet is provided on the first sealing component, and the plasma air inlet is connected to the reaction chamber. The plasma generator is arranged outside the reaction chamber and connected to the plasma air inlet, and the plasma generator is used to generate plasma and transport the plasma into the reaction chamber through the plasma air inlet. The second sealing component is arranged at the other end of the furnace tube to seal the reaction chamber, and an air outlet is provided on the second sealing component, and the air outlet is used to extract the waste gas in the reaction chamber. The first sealing component and / or the second sealing component are provided with a process air inlet, and the process air inlet is used to connect the process gas source to transport the process gas into the reaction chamber.

[0005] In one embodiment, the plasma generator is a remote plasma source, which includes a gas ionization chamber and a connecting tube, one end of which is connected to the gas ionization chamber, and the other end of which is connected to the plasma inlet.

[0006] In one embodiment, the first sealing assembly includes a first flange and a second flange. The second flange is fixed to an end of the furnace tube away from the second sealing assembly, and the first flange is fixedly connected to the second flange. The plasma inlet is arranged on the peripheral side of the first flange.

[0007] In one embodiment, the first sealing assembly further includes a first sealing member, and the first sealing member is located between the first flange and the second flange. The first flange and the second flange are both provided with a first cooling channel surrounding the center thereof, and the peripheral side surface of the first flange and the peripheral side surface of the second flange are both provided with a first water inlet joint and a first water outlet joint. One end of the first cooling channel is connected to the first water inlet joint, and the other end of the first cooling channel is connected to the first water outlet joint. The first water inlet joint is used to introduce coolant, and the first water outlet joint is used to discharge the coolant after absorbing heat.

[0008] In one embodiment, the second sealing assembly includes a third flange and a fourth flange. The third flange is fixed to an end of the furnace tube away from the furnace door, and the fourth flange is provided with an air outlet and at least one process air inlet, and the fourth flange is fixed to the third flange.

[0009] In one embodiment, the second sealing assembly further includes a second sealing member, and the second sealing member is located between the third flange and the fourth flange. The third flange and the fourth flange are both provided with a second cooling channel surrounding the center thereof, and the peripheral side surface of the third flange and the peripheral side surface of the fourth flange are both provided with a second water inlet joint and a second water outlet joint. One end of the second cooling channel is connected to the second water inlet joint, and the other end of the second cooling channel is connected to the second water outlet joint. The second water inlet joint is used to introduce coolant, and the second water outlet joint is used to discharge the coolant after absorbing heat.

[0010] In one embodiment, the furnace tube is a quartz tube.

[0011] In one embodiment, the first sealing assembly and / or the second sealing assembly is provided with an installation opening, and the installation opening is used for installing a thermocouple.

[0012] The present application also proposes a coating device, which includes the coating furnace body as described above. A supporting paddle, a boat support and a carrying boat are arranged in the reaction chamber. The supporting paddle is used to support the boat support, the boat support is used to carry the carrying boat, and the carrying boat is used to carry the sheet material.

[0013] In one embodiment, the supporting paddle extends along the extension direction of the reaction chamber to the furnace door, and extends through the furnace door to the outside of the reaction chamber.

[0014] The coating furnace body of the present application is provided with a plasma generator on the outside of the furnace tube, and a first sealing component and a second sealing component are respectively provided at both ends of the furnace tube to ensure the sealing of the furnace tube during cleaning, and the plasma generator is connected to the plasma air inlet on the first sealing component, so that the plasma generated by the plasma generator enters the reaction chamber and is evenly distributed, which can improve the uniformity of the plasma in the reaction chamber, and the plasma can react with the amorphous silicon film in the reaction chamber, thereby removing the amorphous silicon film on all quartz parts in the reaction chamber, achieving the purpose of online cleaning and simultaneous cleaning. The coating furnace body of the present application is simple in structure, can clean quartz parts quickly and easily, has low cost, and has a wide range of applications. The coating equipment of the present application has both a process mode and a cleaning mode, and the process mode and the cleaning mode can be switched with each other, so the operation is convenient. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic structural diagram of a coating furnace body according to one embodiment of the present application.

[0016] Figure 2 for Figure 1 The schematic diagram of the structure of the coating furnace body after removing the heating furnace from another perspective.

[0017] Figure 3 for Figure 1 The schematic diagram of the structure of the coating furnace body after removing the heating furnace from another perspective.

[0018] Figure 4 for Figure 1 The schematic diagram of the structure of the coating furnace body after removing the heating furnace from another perspective.

[0019] Figure 5 for Figure 1 The schematic diagram of the structure of the flange and cooling channel of the coating furnace body is shown.

[0020] Figure 6 This is a schematic diagram of the module composition of a coating device according to one embodiment of the present application.

[0021] Main component symbols

[0022] 100: coating furnace body; 10: furnace tube; 20: first sealing assembly; 30: plasma generator; 40: second sealing assembly; 50: heating furnace; 60: supporting paddle; 70: boat support; 80: carrying boat; 11: furnace door; 101: reaction chamber; 21: plasma air inlet; 22: first flange; 23: second flange; 24: first sealing member; 25: first water inlet joint; 26: first water outlet joint; 220: first cooling channel; 31: gas ionization chamber; 32: connecting pipe; 41: air outlet; 42: third flange; 43: fourth flange; 44: second sealing member; 45: second water inlet joint; 46: second water outlet joint; 401: process air inlet; 420: first cooling channel; 200: coating equipment.

[0023] The following specific implementation manner will further illustrate the embodiments of the present application in conjunction with the above-mentioned drawings. DETAILED DESCRIPTION

[0024] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as those generally understood by those skilled in the art of the technical field of the present application embodiments. The terms used herein are only for the purpose of describing specific embodiments and are not intended to limit the present application embodiments. The raw materials, reagents or instruments used without indicating the manufacturer are conventional products that can be purchased commercially.

[0025] It should be noted that all directional indications in the embodiments of the present application (such as up, down, left, right, front, back, etc.) are only used to explain the relative position relationship, movement status, etc. between the components under a certain specific posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.

[0026] Some embodiments of the present application are described in detail below in conjunction with the accompanying drawings. In the absence of conflict, the following embodiments and features in the embodiments can be combined with each other.

[0027] See also Figures 1 to 3 In a first aspect, the present application provides a coating furnace body 100 with a self-cleaning function, which can be applied to a coating device 200 (see Figure 5 ) to deposit a thin film on the surface of a sheet material (not shown). The sheet material may be, but is not limited to, a silicon wafer, and the process for depositing the thin film may be, but is not limited to, low pressure chemical vapor deposition (LPCVD). The coating furnace body 100 includes a furnace tube 10, a first sealing assembly 20, a plasma generator 30, a second sealing assembly 40, and a heating furnace 50.

[0028] like Figures 1 to 3As shown, the furnace tube 10 may be cylindrical, and its interior is hollow to form a reaction chamber 101. In other embodiments, the furnace tube 10 may also be a square tube, or other shapes. The sheet material is placed in the reaction chamber 101 to deposit a thin film on its surface. Along the extension direction of the furnace tube 10, a furnace door 11 is provided at one end of the furnace tube 10 to open or close the reaction chamber 101. The material of the furnace tube 10 may be quartz. The heating furnace 50 is sleeved on the outer peripheral side of the furnace tube 10. When a thin film deposition process is required for the sheet material, the heating furnace 50 can be used to heat the furnace tube 10.

[0029] like Figure 1 As shown, the first sealing component 20 is disposed between the furnace door 11 and the furnace tube 10 to seal the reaction chamber 101. The first sealing component 20 is provided with a plasma inlet 21, which is connected to the reaction chamber 101. The plasma inlet 21 may protrude from the surface of the first sealing component 20 and extend for a distance.

[0030] like Figure 1 As shown, the plasma generator 30 is disposed outside the reaction chamber 101 and connected to the plasma inlet 21. The plasma generator 30 can ionize the incoming gas source to generate plasma, and the plasma is transported to the reaction chamber 101 through the plasma inlet 21. The gas source can be CF 4 (carbon tetrafluoride) and / or NF 3 (nitrogen trifluoride), CF 4 NF 3 After ionization, F + (Plasma), F + React with the amorphous silicon layer in the reaction chamber 101, so that the amorphous silicon layer can be removed and self-cleaning is completed. The plasma generator 30 is arranged outside the reaction chamber 101, and the ionization of the gas is completed outside the reaction chamber 101, so that the gas transported to the reaction chamber 101 is plasma, which can better control the concentration of the plasma, improve the cleaning effect, and has high safety. In addition, the plasma generator 30 is set separately from the reaction chamber 101, which can not only reduce the impact of the reaction chamber 101 on the plasma generator 30 when executing the process, which is beneficial to improve the service life of the plasma generator 30, but also simplify the structure of the reaction chamber 101, and is convenient for installation and disassembly, and is easy to repair. Connecting the plasma generator 30 directly to the plasma inlet 21 on the first sealing component 20 can shorten the transmission distance of the plasma and reduce the loss.

[0031] like Figure 1 As shown, the second sealing assembly 40 is disposed at the other end of the furnace tube 10 (i.e., the end without the furnace door 11) to seal the reaction chamber 101. Figure 4As shown, the second sealing component 40 is provided with an outlet 41, and the outlet 41 is used to extract the waste gas in the reaction chamber 101. The plasma inlet 21 and the outlet 41 are respectively arranged on the first sealing component 20 and the second sealing component 40 at both ends of the furnace tube 10, and the plasma generator 30 is connected to the plasma inlet 21 on the first sealing component 20, so that after the plasma enters the reaction chamber 101, it can be evenly distributed along the extension direction of the reaction chamber 101 (from the plasma inlet 21 to the outlet 41), which is conducive to the removal of the amorphous silicon layer and makes the cleaning more thorough.

[0032] like Figure 1 As shown, the second sealing assembly 40 is provided with a process gas inlet 401. In other embodiments, the first sealing assembly 20 is provided with a process gas inlet 401. In other embodiments, both the first sealing assembly 20 and the second sealing assembly 40 are provided with a process gas inlet 401. The process gas inlet 401 is used to connect to a process gas source (a device for providing process gas) to deliver the process gas into the reaction chamber 101. The process gas may be, but is not limited to, a precursor gas, a purge gas, a reaction gas, etc., and the types of the above gases may be adjusted according to the specific deposition process.

[0033] A plasma generator 30 is arranged outside the furnace tube 10, and a first sealing assembly 20 and a second sealing assembly 40 are respectively arranged at both ends of the furnace tube 10 to ensure the sealing of the furnace tube 10 during cleaning, and the plasma generator 30 is connected to the plasma inlet 21 on the first sealing assembly 20, so that the plasma generated by the plasma generator 30 enters the reaction chamber 101 and is evenly distributed. The plasma can react with the amorphous silicon film in the reaction chamber 101, thereby removing the amorphous silicon film on all quartz parts in the reaction chamber 101, thereby achieving the purpose of online cleaning and simultaneous cleaning.

[0034] In some embodiments, the plasma generator 30 is a remote plasma source (RPS). Figure 1 As shown, the plasma generator 30 (RPS) of this embodiment includes a gas ionization chamber 31 and a connecting pipe 32. The gas ionization chamber 31 is used to ionize the gas source to generate plasma. One end of the connecting pipe 32 is connected to the gas ionization chamber 31, and the other end is connected to the plasma inlet 21. The RPS has a compact structure and is easy to maintain. The generated plasma has highly concentrated energy and has a significant treatment effect on the amorphous silicon film.

[0035] In some embodiments, Figure 1As shown, the first sealing assembly 20 includes a first flange 22 and a second flange 23. The second flange 23 is fixed to one end of the furnace tube 10 away from the second sealing assembly 40, and the first flange 22 is fixedly connected to the second flange 23. The furnace door 11 is covered with the first flange 22, and the plasma air inlet 21 is provided on the peripheral side of the first flange 22. When the first sealing assembly 20 is provided with a process air inlet (not shown in the figure), the process air inlet (not shown in the figure) can be provided on the peripheral side of the second flange 23. By providing the first flange 22 and the second flange 23, the sealing of the reaction chamber 101 can be ensured.

[0036] Furthermore, if Figure 1 As shown, the first sealing assembly 20 also includes a first sealing member 24. The first sealing member 24 is located between the first flange 22 and the second flange 23. The material of the first sealing member 24 can be rubber, and the first sealing member 24 has good elasticity and sealing performance. When the first flange 22 and the second flange 23 are fastened, the first sealing member 24 is squeezed and deformed, and fills in the gap between the two flanges, which can compensate for the unevenness or misalignment between the two flanges to a certain extent, thereby further improving the sealing of the connection.

[0037] Furthermore, if Figure 1 and Figure 5 As shown, the first flange 22 and the second flange 23 are both provided with a first cooling channel 220 surrounding the center thereof. The first flange 22 is provided with a first water inlet joint 25 and a first water outlet joint 26 on the peripheral side, and the second flange 23 is also provided with a first water inlet joint 25 and a first water outlet joint 26 on the peripheral side. One end of the first cooling channel 220 is connected to the first water inlet joint 25, and the other end of the first cooling channel 220 is connected to the first water outlet joint 26. The first water inlet joint 25 is used to pass the coolant, and the first water outlet joint 26 is used to flow out the coolant after absorbing heat. The coolant flows in the first cooling channel 220 to cool the first sealing member 24. The coolant may be, but is not limited to, water.

[0038] In some embodiments, Figure 1 As shown, the second sealing assembly 40 includes a third flange 42 and a fourth flange 43. The third flange 42 is fixed to the end of the furnace tube 10 away from the furnace door 11, and the fourth flange 43 is fixed to the third flange 42. In addition to the gas outlet 41, the fourth flange 43 is also provided with at least one process gas inlet 401. The process gas inlet 401 may protrude from the surface of the fourth flange 43 and extend a distance in a direction away from the third flange 42. By providing the third flange 42 and the fourth flange 43, the sealing of the reaction chamber 101 can be ensured.

[0039] Furthermore, if Figure 1As shown, the second sealing assembly 40 also includes a second sealing member 44. The second sealing member 44 is located between the third flange 42 and the fourth flange 43. The material of the second sealing member 44 can be rubber, and the second sealing member 44 has good elasticity and sealing performance. When the third flange 42 and the fourth flange 43 are fastened, the second sealing member 44 is squeezed and deformed, and fills in the gap between the two flanges, which can compensate for the unevenness or misalignment between the two flanges to a certain extent, thereby further improving the sealing of the connection.

[0040] Furthermore, if Figure 1 and Figure 4 As shown, the gas outlet 41 penetrates the third flange 42, the second sealing member 44 and the fourth flange 43 along the thickness direction of the third flange 42. The gas outlet 41 can be connected to an external vacuum pump (not shown) to remove the waste gas in the reaction chamber 101.

[0041] Furthermore, if Figure 1 and Figure 5 As shown, the third flange 42 and the fourth flange 43 are both provided with a second cooling channel 420 surrounding the center thereof. The third flange 42 is provided with a second water inlet joint 45 and a second water outlet joint 46 on the peripheral side, and the fourth flange 43 is also provided with a second water inlet joint 45 and a second water outlet joint 46 on the peripheral side. One end of the second cooling channel 420 is connected to the second water inlet joint 45, and the other end of the second cooling channel 220 is connected to the second water outlet joint 46. The second water inlet joint 45 is used to pass the coolant, and the second water outlet joint 46 is used to flow out the coolant after absorbing heat. The coolant flows in the second cooling channel 420 to cool the second sealing member 44. The coolant may be, but is not limited to, water.

[0042] See also Figure 6 In a second aspect, the present application provides a coating device 200, which includes the coating furnace body 100 as described above. Figures 1 to 3 As shown, a supporting paddle 60, a boat support 70 and a carrying boat 80 are provided in the reaction chamber 101 of the coating furnace body 100. The supporting paddle 60 is used to support the boat support 70, the boat support 70 is used to carry the carrying boat 80, and the carrying boat 80 is used to carry sheet materials (not shown). The boat support 70 can extend along the extension direction of the reaction chamber 101, and the boat support 70 can carry multiple carrying boats 80, and the multiple carrying boats 80 can be arranged in sequence along the extension direction of the reaction chamber 101. Each carrying boat 80 can carry multiple sheet materials, and the sheet materials can be but are not limited to silicon wafers. The materials of the supporting paddle 60, the boat support 70 and the carrying boat 80 can all be quartz.

[0043] When the sheet material is placed on the carrier boat 80 in the reaction chamber 101 and process gas (such as precursor gas, purge gas, reaction gas, etc., and the type of each gas can be adjusted according to the specific deposition process) is introduced into the reaction chamber 101, a thin film can be deposited on the surface of the sheet material, which is the process mode of the coating equipment 200. After the coating is completed, the sheet material is moved out of the reaction chamber 101. When the reaction chamber 101 needs to be cleaned, the amorphous silicon film can be removed by turning on the plasma generator 30. This is the cleaning mode of the coating equipment 200. The coating equipment 200 of the present application has both a process mode and a cleaning mode, and the process mode and the cleaning mode can be switched with each other, which is convenient to operate.

[0044] like Figures 1 to 3 As shown, the support paddle 60 extends to the furnace door 11 along the extension direction of the reaction chamber 101, and extends to the outside of the reaction chamber 101 through the furnace door 11. That is, a part of the support paddle 60 is located in the reaction chamber 101, and the rest passes through the furnace door 11 and is located outside the reaction chamber 101. The cross-sectional shape of the support paddle 60 along its extension direction can be rectangular, circular, triangular, etc., and this application does not impose any specific restrictions on this.

[0045] The coating furnace body 100 of the present application is provided with a plasma generator 30 on the outside of the furnace tube 10, and a first sealing component 20 and a second sealing component 40 are respectively provided at both ends of the furnace tube 10 to ensure the sealing of the furnace tube 10 during cleaning, and the plasma generator 30 is connected to the plasma air inlet 21 on the first sealing component 20, so that the plasma generated by the plasma generator 30 enters the reaction chamber 101 and is evenly distributed, and the plasma can react with the amorphous silicon film of the reaction chamber 101, thereby removing the amorphous silicon film on all quartz parts in the reaction chamber 101, and achieving the purpose of online cleaning and simultaneous cleaning. The coating furnace body 100 of the present application is simple in structure, can clean quartz parts quickly and easily, has low cost, and has a wide range of applications. The coating equipment 200 of the present application has both a process mode and a cleaning mode, and the process mode and the cleaning mode can be switched with each other, and the operation is convenient.

[0046] The above descriptions are some specific implementations of the present application, but they are not limited to these implementations in actual application. For ordinary technicians in this field, other variations and changes made according to the technical concept of the present application should all fall within the protection scope of the present application.

Claims

1. A coating furnace body, characterized in that: include: A furnace tube, a reaction chamber is formed inside, and a furnace door is provided at one end of the furnace tube to open and close the reaction chamber; A heating furnace, sleeved on the outer peripheral side of the furnace tube, used for heating the furnace tube; a first sealing component, disposed between the furnace door and the furnace tube to seal the reaction chamber, the first sealing component being provided with a plasma air inlet, the plasma air inlet being communicated with the reaction chamber; a plasma generator, disposed outside the reaction chamber and connected to the plasma inlet, the plasma generator being used to generate plasma and transport the plasma into the reaction chamber through the plasma inlet; A second sealing component is arranged at the other end of the furnace tube to seal the reaction chamber, and a gas outlet is arranged on the second sealing component, and the gas outlet is used to extract the waste gas in the reaction chamber; Wherein, the first sealing component and / or the second sealing component is provided with a process gas inlet, and the process gas inlet is used to connect to a process gas source to transport the process gas into the reaction chamber.

2. The coating furnace body according to claim 1, characterized in that: The plasma generator is a remote plasma source, which includes a gas ionization chamber and a connecting tube, one end of the connecting tube is connected to the gas ionization chamber, and the other end of the connecting tube is connected to the plasma gas inlet.

3. The coating furnace body according to claim 1, characterized in that: The first sealing assembly includes a first flange and a second flange, the second flange is fixed to one end of the furnace tube away from the second sealing assembly, the first flange is fixedly connected to the second flange, the furnace door cover is arranged on the first flange, and the plasma air inlet is arranged on the peripheral side of the first flange.

4. The coating furnace body according to claim 3, characterized in that: The first sealing assembly further includes a first sealing member, the first sealing member being located between the first flange and the second flange; The first flange and the second flange are both provided with a first cooling channel surrounding the center thereof, and the peripheral side surface of the first flange and the peripheral side surface of the second flange are both provided with a first water inlet joint and a first water outlet joint; Among them, one end of the first cooling channel is connected to the first water inlet joint, and the other end of the first cooling channel is connected to the first water outlet joint. The first water inlet joint is used to introduce coolant, and the first water outlet joint is used to discharge the coolant after absorbing heat.

5. The coating furnace body according to claim 1, characterized in that: The second sealing assembly includes a third flange and a fourth flange. The third flange is fixed to an end of the furnace tube away from the furnace door. The fourth flange is provided with the air outlet and at least one process air inlet. The fourth flange is fixed to the third flange.

6. The coating furnace body according to claim 5, characterized in that: The second sealing assembly further includes a second sealing member, the second sealing member being located between the third flange and the fourth flange; The third flange and the fourth flange are both provided with a second cooling flow channel surrounding the center thereof, and the peripheral side surface of the third flange and the peripheral side surface of the fourth flange are both provided with a second water inlet joint and a second water outlet joint; Among them, one end of the second cooling channel is connected to the second water inlet joint, and the other end of the second cooling channel is connected to the second water outlet joint. The second water inlet joint is used to introduce coolant, and the second water outlet joint is used to discharge the coolant after absorbing heat.

7. The coating furnace body according to claim 1, characterized in that: The furnace tube is a quartz tube.

8. The coating furnace body according to claim 1, characterized in that: The first sealing component and / or the second sealing component is provided with an installation opening, and the installation opening is used for installing a thermocouple.

9. A coating device, characterized in that: It comprises a coating furnace body as described in any one of claims 1 to 8, wherein a supporting paddle, a boat support and a carrying boat are provided in the reaction chamber, the supporting paddle is used to support the boat support, the boat support is used to carry the carrying boat, and the carrying boat is used to carry sheet materials.

10. The coating device according to claim 9, characterized in that: The supporting paddle extends to the furnace door along the extension direction of the reaction chamber, and extends to the outside of the reaction chamber through the furnace door.

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