Heating cabin and annealing equipment
By designing a heating chamber with adjustable fixtures, the problems of difficulty in installing the heating pipes and uneven heat radiation in the wafer annealing furnace are solved, and the stable installation of the heating pipes and uniformity of the wafer heating are achieved.
Patent Information
- Application Number
- CN202421854363.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-02
- Publication Date
- 2025-04-15
- Estimated Expiration
- 2034-08-02
AI Technical Summary
When installing the heating pipe, the existing wafer annealing furnaces cause the heating pipe to be broken due to the extrusion of the sealing ring, and the heating pipe needs to penetrate through the sides of the heating chamber to have installation holes in advance, resulting in cumbersome and inconvenient processing and high cost. At the same time, the position of the heating pipe after installation cannot be adjusted, resulting in uneven heat radiation.
A heating chamber is designed, arranged on the side of the furnace body, including a fixing frame, a heating pipe group and a fixing member. By adjusting the fixing member, the distance between the heating pipe and the furnace body can be adjusted, thereby adjusting the degree of heat radiation and ensuring uniformity of wafer heating.
It solves the problem that the heating pipe is prone to break during installation, simplifies the installation process of the heating pipe, reduces costs, and achieves the uniformity of wafer heating by adjusting the position of the heating pipe.
Smart Images

Figure CN222758372U_ABST
Abstract
Description
Technical Field
[0001] The utility model relates to the technical field of heat treatment, in particular to a heating chamber and annealing equipment. Background Art
[0002] In the manufacture of semiconductor devices, the wafer needs to be heat treated to eliminate defects inside the wafer and optimize the grain boundary structure and crystal quality. Annealing is a common wafer heat treatment method. Annealing furnace is a common equipment used for annealing wafers. By heating the wafer and keeping it warm under certain conditions, the lattice structure can be changed, impurities and stress can be eliminated, and the electrical properties and structural integrity of the wafer can be improved.
[0003] The basic structure of a wafer annealing furnace is usually composed of a heating chamber, a control system, a feeding device and a discharging device. The heating chamber is used to uniformly heat and keep the wafers warm, and the heating temperature, time, atmosphere and other parameters are controlled by the control system to achieve the desired annealing effect for the wafers. Existing wafer annealing furnaces generally have multiple heating tubes arranged on the top and / or bottom sides of the interior. The heating tubes penetrate the side of the heating chamber along the arrangement direction and the end wires are exposed to the outside for connection. A quartz tube is provided on the outside of the heating tube. In order to ensure the vacuum and cleanliness of the heating chamber, a sealing ring is provided at the joint of the quartz tube and the heating chamber to achieve sealing. Therefore, when installing the heating tube, the heating tube will be broken under the squeezing action of the sealing ring. At the same time, since the heating tube needs to pass through the side of the heating cavity, it is necessary to pre-open an installation hole for the heating tube to pass through when manufacturing the heating cavity, and open them separately according to different needs. The number of layers, number and arrangement of heating tubes in different wafer annealing furnaces are all different, which leads to the problems of complicated and inconvenient processing and high cost. At the same time, the position of the heating tube is fixed after installation and cannot be adjusted again. There is a problem of uneven heating of the wafer by the heat radiation of the lamp due to distance.
[0004] In view of this, it is necessary to improve the wafer annealing furnace in the prior art to solve the above problems. Utility Model Content
[0005] The utility model aims to disclose the problem that the existing wafer annealing furnace needs to provide a sealing ring at the junction of the heating cavity and the quartz tube, so the heating tube may be broken under the squeezing action of the sealing ring when installing the heating tube, and the heating tube needs to pass through the side of the heating cavity during installation, and installation holes need to be opened according to different needs, which leads to the problem of complicated and inconvenient processing and high cost. At the same time, the position of the heating tube is fixed after installation and cannot be adjusted again, so there is a problem that the heat radiation of the lamp tube heats the wafer unevenly due to the distance.
[0006] To achieve the above purpose, the utility model discloses a heating chamber, which is arranged on the side of the furnace body, and the heating chamber comprises:
[0007] A fixing frame arranged on the side of the furnace body, a plurality of heating tube groups arranged inside the fixing frame, and two fixing members respectively arranged at both ends of the heating tube groups;
[0008] The fixing member comprises: a fixing block sleeved on the outer side of the end of the heating tube group and two fixing columns respectively embedded in the fixing block on both sides to form a common clamping tube core included in the heating tube group, and the distance between the tube core and the furnace body is adjusted by adjusting the depth of the fixing column embedded in the fixing block.
[0009] As a further improvement of the present invention, the heating tube group includes: a tube body and a protective tube sleeved on the outside of the tube body, the end of the tube body extends outward to form a tube core, and a pipeline connected to the tube body is formed on the outside of the tube core, and the fixing piece is sleeved on the outside of the end of the protective tube.
[0010] As a further improvement of the present invention, the fixing member further comprises: a sleeve disposed inside the fixing block and in contact with the end of the protection tube, the sleeve being provided with a through opening for the fixing column to pass through.
[0011] As a further improvement of the present invention, an opening is provided on a side of the fixing block for the pipeline to extend out of the heating chamber.
[0012] As a further improvement of the present invention, the fixing block is provided with an inner side wall forming a screw interface with an internal thread, and the outer side wall of the fixing column is provided with an external thread matching the internal thread.
[0013] As a further improvement of the present invention, a first sealing groove is recessed inwardly on the inner side of the fixing block, and the fixing member further comprises: a first sealing ring which is arranged in the first sealing groove and contacts the protection tube.
[0014] As a further improvement of the present invention, a gap is formed between the protection tube and the tube body for the tube body to move.
[0015] As a further improvement of the present invention, a second sealing ring groove is recessed inwardly on the outer side of the fixing block, and the fixing member further includes: a second sealing ring arranged in the second sealing groove.
[0016] Based on the same inventive concept, the utility model also discloses an annealing device, comprising:
[0017] A furnace body and a heating chamber body as described in any one of the above inventions.
[0018] As a further improvement of the present invention, the annealing equipment further comprises: a heat conducting plate arranged between the heating chamber and the furnace body.
[0019] Compared with the prior art, the beneficial effects of the utility model are:
[0020] In the present application, two fixing members are respectively arranged at the ends of both ends of the heating tube group, and the fixing members include: a fixing block sleeved on the outer side of the heating tube group and two fixing columns (i.e., a first fixing column and a second fixing column) respectively embedded in the fixing block and forming a tube core contained in the heating tube group. By adjusting the depth of the first fixing column and the second fixing column respectively embedded in the fixing block, the distance between the tube core and the furnace body can be adjusted, thereby achieving the purpose of adjusting the distance between the tube body and the furnace body, and then adjusting the degree of heat radiation of the tube body to the furnace body to ensure the uniformity of wafer heating, and finally solving the problem that the position of the heating tube in the existing wafer annealing furnace is fixed after installation and the position of the heating tube cannot be adjusted again, resulting in uneven heating of the wafer by the heat radiation of the lamp tube due to the distance. BRIEF DESCRIPTION OF THE DRAWINGS
[0021] Figure 1 A three-dimensional diagram of the annealing device shown in the present invention at a viewing angle;
[0022] Figure 2 A three-dimensional diagram of a heating chamber at a viewing angle;
[0023] Figure 3 A three-dimensional diagram of the fixing frame and the protective cover at a certain viewing angle;
[0024] Figure 4 A three-dimensional diagram of the heating tube assembly and two fixing members at a certain viewing angle;
[0025] Figure 5 A three-dimensional diagram of a heating tube assembly at a viewing angle;
[0026] Figure 6 A three-dimensional diagram of a portion of a heating tube assembly, two fixing columns and a sleeve at one viewing angle;
[0027] Figure 7 A stereogram of a fixed block at one viewing angle;
[0028] Figure 8 It is a stereoscopic image of the fixed block at another viewing angle. DETAILED DESCRIPTION
[0029] The present invention is described in detail below in conjunction with the various embodiments shown in the accompanying drawings, but it should be noted that these embodiments are not limitations of the present invention, and any equivalent transformations or substitutions in functions, methods, or structures made by ordinary technicians in the field based on these embodiments are all within the scope of protection of the present invention.
[0030] It should be understood that, in the present application, the terms "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "axial", "radial", etc., indicating the orientation or position relationship, are based on the orientation or position relationship shown in the accompanying drawings, and are only for the convenience of describing the present technical solution and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present technical solution.
[0031] It should be noted that, in this application, "lateral" refers to the Figure 1 The X-axis is the direction of the vertical axis. Figure 1 The Y-axis is shown in the vertical direction. Figure 1 The direction of the Z axis shown in .
[0032] Please refer to Figures 1 to 8 As shown, the utility model shows a heating chamber 10 and an annealing device 100. The heating chamber 10 is arranged on the side of the furnace body 20, thereby constituting the annealing device 100. The annealing device 100 is used to anneal the wafer 30. A hollow cavity A is formed inside the furnace body 20, and the wafer 30 is accommodated in the hollow cavity A. The wafer 30 accommodated in the furnace body 20 is heated and kept warm by the heating chamber 10, thereby achieving annealing of the wafer 30, thereby changing the lattice structure of the wafer to eliminate impurities and stress.
[0033] Ginseng Figure 1 As shown, the annealing device 100 includes at least one heating chamber 10 and a furnace body 20. The heating chamber 10 is disposed on the side of the furnace body 20 and can be configured in multiples. Figure 1 The heating chambers 10 shown are configured as two, for example, and the two heating chambers 10 are respectively arranged at the top and bottom of the furnace body 10, so as to heat the wafers 30 accommodated in the furnace body 20 at both sides of the furnace body 10 at the same time, and ensure the uniformity and effect of heating. Of course, more sides or other sides of the furnace body 10 (for example, Figure 1In the perspective shown in , the furnace body 10 heats the wafer 30 accommodated in the furnace body 20 along the left side and / or right side shown in the horizontal direction, and / or the front side and / or rear side shown in the vertical direction) to ensure better heating uniformity and heating effect, which is not specifically limited in this embodiment. A heat conducting plate (not shown) is provided between the heating chamber 10 and the furnace body 20, and the heat emitted by the heating tube group 12 contained in the heating chamber 10 can be evenly transferred to the inside of the furnace body 20 through the heat conducting plate to ensure heating uniformity and effect.
[0034] Ginseng Figure 2 and Figure 3 As shown, the heating chamber body 10 includes: a fixing frame 11 arranged on the side of the furnace body 10, a plurality of heating tube groups 12 arranged inside the fixing frame 11, and two fixing members 13 respectively arranged at the ends of the two ends of the heating tube group 12. Among them, the fixing frame 11 can be regarded as a plate-like body with a hollow middle portion, and a heating area B for arranging and setting the heating tube group 12 is formed in the middle of the fixing frame 11. The heating tube group 12 is arranged in the heating area B through the fixing members 13 at both ends thereof, so there is no need to open a mounting hole for the heating tube group 12 to pass through the side of the fixing frame 11, and the fixing frame 11 and the heating tube group 12 can be directly installed through the fixing members 13, thereby solving the problem that the existing wafer annealing furnace needs to pass through the side of the heating cavity when installing the heating tube, and needs to open mounting holes according to different needs, which is complicated and inconvenient to process and has high cost. A protective cover 14 is provided on the top of the fixing frame 11. The protective cover 14 is provided with a pipeline 121 included in the heating tube group 12 to pass through so as to connect a power source to supply power to the heating tube group 12. The protective cover 14 is provided on the top of the fixing frame 11 to protect the arranged heating tube group 12. The protective cover 14 can also be detachably assembled with the fixing frame 11 to facilitate the replacement of the protective cover 14 and the heating tube group 12.
[0035] Meanwhile, the heating tube group 12 is configured to be multiple and arranged, and multiple layers of the heating tube group 12 can be stacked. When the fixing frame 11 is arranged at the top and / or bottom of the furnace body 20, the multiple heating tube groups 12 can be stacked in multiple layers, and can be arranged horizontally and / or vertically, and arranged in sequence along the plane formed by the horizontal and vertical directions; when the fixing frame 11 is arranged at the left side and / or right side of the furnace body 20, the multiple heating tube groups 12 can be stacked in multiple layers, and can be arranged vertically and / or vertically, and arranged in sequence along the plane formed by the vertical and vertical directions. For example, when the heating tube group 12 is stacked in two layers, the first layer of the heating tube group 12 and the second layer of the heating tube group 12 are both arranged horizontally or vertically, or the first layer of the heating tube group 12 is arranged horizontally or vertically, and the second layer of the heating tube group 12 is arranged vertically or horizontally, and this embodiment does not specifically limit this.
[0036] Ginseng Figures 4 to 6As shown, taking a heating tube assembly 12 as an example, two fixing members 13 are respectively arranged at both ends of the heating tube assembly 12, and the fixing member 13 at one end is taken as an example for exemplary description. The fixing member 13 comprises: a fixing block 131 sleeved on the outer side of the end of the heating tube assembly 12, and two fixing columns (i.e., a first fixing column 132 and a second fixing column 133) respectively embedded in the fixing block 131 on both sides and forming a common clamping of the tube core 122 included in the heating tube assembly 12, and the distance between the tube core 122 and the furnace body 20 is adjusted by adjusting the depth of the fixing column embedded in the fixing block 131.
[0037] Specifically, the heating tube assembly 12 includes: a tube body 123 and a protective tube 124 sleeved on the outside of the tube body 123, the end of the tube body 123 extends outward to form a tube core 122, and a pipeline 121 connected to the tube body 123 is formed on the outside of the tube core 122, and the fixing member 13 is sleeved on the outside of the end of the protective tube 124. The tube body 123 refers to a component in the heating tube assembly 12 that heats and releases heat radiation; the tube core 122 is configured as two and is respectively arranged at the two ends of the tube body 123, and is a component connecting the tube body 123 and the pipeline 121; the pipeline 121 is also configured as two, and is a component that transmits external electrical energy to the tube body 123; the protective tube 124 is sleeved on the outside of the tube body 123 to protect the tube body 123. Taking the example of the heating chamber 10 being arranged on the top of the furnace body 20, the first fixing column 132 and the second fixing column 133 are respectively embedded in the fixing block 131 on both sides vertically. Based on this, by adjusting the depth of the first fixing column 132 and the second fixing column 133 respectively embedded in the fixing block 131, the distance between the tube core 122 and the furnace body 20 can be adjusted, thereby achieving the purpose of adjusting the distance between the tube body 123 and the furnace body 20, and then adjusting the degree of heat radiation of the tube body 123 to the furnace body 20 to ensure the uniformity of heating the wafer 30, and finally solving the problem that the position of the heating tube in the existing wafer annealing furnace is fixed after installation and the position of the heating tube cannot be adjusted again, resulting in uneven heating of the wafer by the heat radiation of the lamp tube due to distance reasons.
[0038] More specifically, Figure 7 and Figure 8As shown, the fixing block 131 is provided with a screw-on interface (i.e., the first screw-on interface 1311 and the second screw-on interface 1312) with an internal thread (not shown) formed on the inner side wall, and the outer side wall of the fixing column (i.e., the first fixing column 132 and the second fixing column 133) is formed with an external thread (not shown) adapted to the internal thread (not shown). The first fixing column 132 is screwed to the first screw-on interface 1311, and the second fixing column 133 is screwed to the second screw-on interface 1312. The first fixing column 132 and the second fixing column 133 jointly clamp the tube core 122, and then by adjusting the screwing degree of the first fixing column 132 screwed into the first screw-on interface 1311 and adjusting the screwing degree of the second fixing column 133 screwed into the second screw-on interface 1312, the vertical position of the tube core 122 jointly clamped by the first fixing column 132 and the second fixing column 133 is adjusted, thereby achieving the purpose of adjusting the distance between the tube body 123 and the furnace body 20. It should be noted that the above example uses the first fixing column 132 and the second fixing column 133 as examples in which the outer walls are both provided with external threads, that is, the first fixing column 132 and the second fixing column 133 can be regarded as bolts, and the depth of the first fixing block 132 and the second fixing block 133 respectively embedded in the fixing block 131 can also be adjusted in any other manner, which is not specifically limited in this embodiment. At the same time, a gap C is formed between the protective tube 124 and the tube body 123 for the tube body 123 to move, thereby providing space for the tube body 123 to move vertically under the adjustment of the first fixing column 132 and the second fixing column 133.
[0039] Ginseng Figure 6 As shown, the fixing member 13 further includes: a sleeve 134 disposed inside the fixing block 131 and in contact with the end of the protection tube 124, and the sleeve 134 is provided with through holes (i.e., first through holes and second through holes, both of which are not marked) for the fixing columns (i.e., the first fixing column 132 and the second fixing column 133) to pass through. The fixing block 131 is sleeved on the outside of the protection tube 124, the sleeve 134 is disposed inside the fixing block 131 and located on the outside of the tube core 122, the first fixing column 132 passes through the first through hole, and the second fixing column 133 passes through the second through hole, so that the first fixing column 132 and the second fixing column 133 jointly clamp the tube core 122. At the same time, the sleeve 134 is in contact with the end of the protection tube 124, thereby facilitating the positioning between the fixing member 13 and the heating tube assembly 12 when assembling the fixing member 13 and the heating tube assembly 12, and reducing the risk of collision when assembling the protection tube 124, thereby reducing loss. The fixing block 131 and the shaft sleeve 134 can be assembled in a detachable manner or in a fixed manner, which is not specifically limited in this embodiment, and the shaft sleeve 134 can be made of a plastic material. In addition, an opening 1313 is provided on the side of the fixing block 131 for the pipeline 121 to extend out of the heating chamber 10. The pipeline 121 can extend out of the heating chamber 10 through the opening 1313 and be connected to a power source to transmit electrical energy to the pipe body 123.
[0040] Ginseng Figure 7As shown, the inner side of the fixing block 131 is recessed inward to form a first sealing groove 1314, and the fixing member 13 also includes: a first sealing ring (not shown) disposed in the first sealing groove 1314 and in contact with the protection tube 124. The first sealing ring is accommodated in the first sealing groove 1314, and when the fixing block 131 is sleeved on the outside of the protection tube 124, the first sealing ring is in contact with the outer wall of the protection tube 124, thereby achieving the sealing of the end of the protection tube 124, so as to achieve the purpose of isolating the internal gas of the protection tube 124 from the external gas. When the fixing block 13 is sleeved on the outside of the protection tube 124, the first sealing ring is accommodated in the first sealing groove 1314, reducing the extrusion of the first sealing ring on the protection tube 124, so as to solve the problem that the heating tube will be broken under the extrusion of the sealing ring when installing the heating tube due to the need to set a sealing ring at the junction of the heating chamber and the quartz tube in the existing wafer annealing furnace. At the same time, the outer side of the fixing block 131 is recessed inward to form a second sealing groove 1315. The fixing block 131 also includes: a second sealing ring (not shown) arranged in the second sealing groove 1315, thereby achieving sealing of the first rotary interface to further achieve the purpose of isolating the internal gas of the protective tube 124 from the external gas.
[0041] The series of detailed descriptions listed above are only specific descriptions of feasible implementation methods of the utility model. They are not intended to limit the protection scope of the utility model. Any equivalent implementation methods or changes that do not deviate from the technical spirit of the utility model should be included in the protection scope of the utility model.
[0042] In addition, it should be understood that although the present specification is described according to implementation modes, not every implementation mode contains only one independent technical solution. This description of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment may also be appropriately combined to form other implementation modes that can be understood by those skilled in the art.
Claims
1. A heating chamber, arranged on the side of a furnace, characterized in that: The heating chamber comprises: A fixing frame arranged on the side of the furnace body, a plurality of heating tube groups arranged inside the fixing frame, and two fixing members respectively arranged at both ends of the heating tube groups; The fixing member comprises: a fixing block sleeved on the outer side of the end of the heating tube group and two fixing columns respectively embedded in the fixing block on both sides to form a common clamping tube core included in the heating tube group, and the distance between the tube core and the furnace body is adjusted by adjusting the depth of the fixing column embedded in the fixing block.
2. The heating chamber according to claim 1, characterized in that: The heating tube group includes: a tube body and a protective tube sleeved on the outside of the tube body, the end of the tube body extends outward to form a tube core, and a pipeline connected to the tube body is formed on the outside of the tube core, and the fixing piece is sleeved on the outside of the end of the protective tube.
3. The heating chamber according to claim 2, characterized in that: The fixing member further comprises: a shaft sleeve which is arranged inside the fixing block and contacts the end of the protection tube, and the shaft sleeve is provided with a through opening for the fixing column to pass through.
4. The heating chamber according to claim 2, characterized in that: The side of the fixing block is provided with an opening for the pipeline to extend out of the heating chamber.
5. The heating chamber according to claim 1, characterized in that: The fixing block is provided with an inner side wall to form a screw interface with an internal thread, and the outer side wall of the fixing column is provided with an external thread matching the internal thread.
6. The heating chamber according to claim 2, characterized in that: The inner side of the fixing block is inwardly concavely provided with a first sealing groove, and the fixing member further comprises: a first sealing ring which is arranged in the first sealing groove and contacts with the protection tube.
7. The heating chamber according to claim 2, characterized in that: A gap is formed between the protection tube and the tube body for the tube body to move.
8. The heating chamber according to claim 1, characterized in that: The outer side of the fixing block is inwardly concavely provided with a second sealing groove, and the fixing member further comprises: a second sealing ring arranged in the second sealing groove.
9. An annealing device, characterized in that: include: A furnace body and a heating chamber body as claimed in any one of claims 1 to 8.
10. The annealing equipment according to claim 9, characterized in that: The annealing equipment further includes: a heat conducting plate disposed between the heating chamber and the furnace body.