Hydrofluoric acid storage device for semiconductor preparation

Abstract

The hydrofluoric acid storage device comprises an acid liquid tank, a sealing groove is formed in the upper end of the acid liquid tank, a liquid discharging opening is formed in the side wall of the middle of the lower end of the acid liquid tank, a sealing piston is inserted into the liquid discharging opening, and a liquid discharging pipe is fixedly connected to the outer side of the lower end of the liquid discharging opening of the acid liquid tank. The liquid discharging pipe is of an L-shaped structure, the end of the horizontal part of the liquid discharging pipe extends out of the lower portion of the acid liquid tank, a fixing frame is clamped to the corners of the lower end of the interior of the acid liquid tank, and connecting columns are fixedly connected to the four corners of the upper end of the fixing frame; the acid liquor tank has the beneficial effects that the detachable fixed frame is arranged at the lower end in the acid liquor tank and is used for blocking the corners of the lower end in the acid liquor tank, so that the fixed frame can be lifted out of the acid liquor tank during cleaning, and materials at the fixed frame and the lower end in the acid liquor tank can be cleaned; and cleaning with tools is facilitated.

Description

Technical Field

[0001] The utility model relates to a hydrofluoric acid storage device, in particular to a hydrofluoric acid storage device used for semiconductor preparation, belonging to the technical field of hydrofluoric acid storage. Background Art

[0002] During the preparation of semiconductor silicon wafers, hydrofluoric acid is usually used to etch the material, and during the etching process, the hydrofluoric acid is usually stored in a tank structure.

[0003] At present, when hydrofluoric acid is stored for etching, the part that is separated from the material will settle at the lower end of the inner part of the tank structure, and needs to be cleaned later. However, the inner corners of the tank structure are mostly vertical, which is more troublesome to clean using tools. Utility Model Content

[0004] The utility model aims to solve the shortcomings in the prior art and proposes a hydrofluoric acid storage device for semiconductor preparation.

[0005] In order to achieve the above purpose, the utility model adopts the following technical solutions:

[0006] A hydrofluoric acid storage device for semiconductor preparation is designed, comprising an acid tank, wherein a sealing groove is provided at the upper end of the acid tank, a drain port is provided on the middle side wall of the lower end of the acid tank, and a sealing piston is inserted into the drain port, a drain pipe is fixedly connected to the outer side of the lower end of the drain port of the acid tank, the drain pipe is in an L-shaped structure, and the end of the horizontal part extends out of the bottom of the acid tank, a fixing frame is clamped at the corner of the lower end of the acid tank, the upper four corners of the fixing frame are fixedly connected with connecting columns, the upper ends of the four connecting columns are commonly fixedly connected to the connecting frame, and the two sides of the connecting frame are fixedly connected with sleeve plates.

[0007] Preferably, a sealing frame is fixedly connected to the lower end of the connecting frame, and the sealing frame is clamped in the interior of the sealing groove.

[0008] Preferably, both sides of the front and rear parts of the acid tank are longitudinally fixedly connected with fixed plates, and the side of the fixed plate away from the acid tank is fixedly connected with a baffle, and a slide plate is commonly arranged and slidably connected between the two fixed plates on the same side, and both sides of the slide plate are clamped on the same side sleeve plate.

[0009] Preferably, the middle part of the side of the slide away from the acid tank is rotatably connected to a rotating plate via a rotating shaft, and both sides of the rotating plate are against the side of the baffle plate on the same side close to the acid tank.

[0010] Preferably, the four connecting columns are respectively clamped at the four corners inside the acid tank.

[0011] Preferably, the four corners of the lower end of the acid tank are fixedly connected with supporting feet, and the lower ends of the four supporting feet are lower than the lower end of the horizontal part of the drain pipe.

[0012] The utility model proposes a hydrofluoric acid storage device for semiconductor preparation, which has the beneficial effect that a detachable fixing frame is arranged at the inner lower end of an acid liquid tank, and the inner lower end corners of the acid liquid tank are blocked by the fixing frame. When cleaning, the fixing frame can be lifted out from the inner part of the acid liquid tank, and the materials of the fixing frame and the inner lower end of the acid liquid tank can be cleaned up, so that cleaning with tools is convenient. BRIEF DESCRIPTION OF THE DRAWINGS

[0013] Figure 1 This is a schematic diagram of the structure of a hydrofluoric acid storage device for semiconductor preparation proposed by the utility model;

[0014] Figure 2 This is a schematic diagram of the installation structure of a slide plate on an acid tank when cleaning a hydrofluoric acid storage device for semiconductor preparation proposed by the utility model;

[0015] Figure 3 This is a front cross-sectional structural schematic diagram of a hydrofluoric acid storage device for semiconductor preparation proposed by the utility model;

[0016] Figure 4 This is a schematic diagram of a side cross-section structure of a hydrofluoric acid storage device for semiconductor preparation proposed by the utility model;

[0017] Figure 5 The utility model is a schematic diagram of the distribution structure of a fixed frame and connections of a hydrofluoric acid storage device for semiconductor preparation.

[0018] In the figure: acid tank 1, sealing tank 2, fixed frame 3, connecting column 4, connecting frame 5, sleeve plate 6, sealing frame 7, sealing piston 8, discharge pipe 9, fixed plate 10, baffle 11, slide plate 12, rotating shaft 13, rotating plate 14, support leg 15. DETAILED DESCRIPTION

[0019] The technical solutions in the embodiments of the present invention will be described clearly and completely below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, rather than all of the embodiments.

[0020] Reference Figure 1-5A hydrofluoric acid storage device for semiconductor preparation comprises an acid tank 1, a sealing groove 2 is provided at the upper end of the acid tank 1, a drain port is provided on the side wall of the middle part of the lower end of the acid tank 1, and a sealing piston 8 is inserted into the drain port, a drain pipe 9 is fixedly connected to the outer side of the lower end of the drain port of the acid tank 1, the drain pipe 9 is L-shaped and the end of the horizontal part extends below the acid tank 1, a fixing frame 3 is clamped at the corner of the lower end of the acid tank 1, and connecting columns 4 are fixedly connected at the four corners of the upper end of the fixing frame 3, and the upper ends of the four connecting columns 4 are fixedly connected to a connecting frame 5, and both sides of the connecting frame 5 are fixedly connected to sleeve plates 6, and the sleeve plates 6 can be grasped when in use to facilitate the fixing frame 3 to be lifted out of the acid tank 1.

[0021] The four connecting columns 4 are respectively connected to the four corners inside the acid tank 1 to prevent the decomposed materials from falling on the corners at the upper end of the fixed frame 3. The four corners of the lower end of the acid tank 1 are fixedly connected with supporting legs 15. The lower ends of the four supporting legs 15 are lower than the lower end of the horizontal part of the drain pipe 9, which can support the acid tank 1. The lower end of the connecting frame 5 is fixedly connected with a sealing frame 7, which is connected to the inside of the sealing groove 2. The connecting frame 5 can be connected to the upper end of the acid tank 1. Both sides of the front and rear parts of the acid tank 1 are longitudinally fixedly connected with a fixing plate 10. The fixed plate 10 is fixedly connected to the side away from the acid tank 1 with a baffle plate 11, and a slide plate 12 is commonly set and slidably connected between the two fixed plates 10 on the same side. Both sides of the slide plate 12 are clamped on the sleeve plate 6 on the same side. The middle part of the side of the slide plate 12 away from the acid tank 1 is rotatably connected to a rotating plate 14 through a rotating shaft 13. Both sides of the rotating plate 14 are against the side of the baffle plate 11 on the same side close to the acid tank 1. When in use, the two sleeve plates 6 can be clamped, so that the connecting frame 5 can be fixed to the upper end of the acid tank 1, and the fixed frame 3 can be fixed to the inner lower end of the acid tank 1.

[0022] Working principle: When in use, pour hydrofluoric acid into the acid tank 1, and use the clamping structure to lower the processing surface of the semiconductor material to be processed into the hydrofluoric acid. The hydrofluoric acid will decompose part of the material on the processing surface to perform etching, and the decomposed part of the material will sink into the lower end of the acid tank 1. When cleaning the acid tank 1 later, pour out the hydrofluoric acid in the acid tank 1, rotate the rotating plate 14 from a horizontal state to a vertical state, and pull the slide plate 12 away from the acid tank 1 through the rotating plate 14 until the slide plate 12 is against the baffle 11, and then turn the rotating plate 14 back to the water. In a flat state, the rotating plate 14 is pressed against the side of the baffle 11 away from the acid tank 1 to fix the position of the slide plate 12, and then the sleeve plate 6 is grasped, and the connecting frame 5 is pulled upward through the sleeve plate 6 to lift the fixed frame 3 out of the acid tank 1, and the foreign matter at the lower end of the inside of the acid tank 1, the fixed frame 3 and the outside of the connecting column 4 are cleaned up, and then the fixed frame 3 is snapped back to the lower end of the inside of the acid tank 1, and the connecting frame 5 is pressed against the upper end of the acid tank 1, and the slide plate 12 is snapped on the sleeve plate 6 to fix the position of the connecting frame 5, and the fixed frame 3 is fixed at the corner of the lower end of the inside of the acid tank 1.

[0023] The above description is only a preferred specific implementation manner of the present invention, but the protection scope of the present invention is not limited thereto. Any technician familiar with the technical field can make equivalent replacements or changes within the technical scope disclosed by the present invention according to the technical scheme and the utility model concept of the present invention, which should be covered by the protection scope of the present invention.

Claims

1. A hydrofluoric acid storage device for semiconductor preparation, characterized in that: The invention comprises an acid tank (1), wherein a sealing groove (2) is provided at the upper end of the acid tank (1), a drainage port is provided on the side wall at the middle part of the lower end of the acid tank (1), and a sealing piston (8) is inserted into the drainage port, a drainage pipe (9) is fixedly connected to the outer side of the lower end of the drainage port of the acid tank (1), the drainage pipe (9) is in an L-shaped structure, and the end of the horizontal part extends below the acid tank (1), a fixing frame (3) is clamped at the corner of the lower end of the acid tank (1), and the four corners of the upper end of the fixing frame (3) are fixedly connected to connecting columns (4), the upper ends of the four connecting columns (4) are commonly fixedly connected to a connecting frame (5), and both sides of the connecting frame (5) are fixedly connected to sleeve plates (6).

2. A hydrofluoric acid storage device for semiconductor preparation according to claim 1, characterized in that: The lower end of the connection frame (5) is fixedly connected to a sealing frame (7), and the sealing frame (7) is clamped inside the sealing groove (2).

3. A hydrofluoric acid storage device for semiconductor preparation according to claim 1, characterized in that: Both sides of the front and rear parts of the acid tank (1) are longitudinally fixedly connected with fixed plates (10), and the side of the fixed plate (10) away from the acid tank (1) is fixedly connected with a baffle (11), and a slide plate (12) is commonly sleeved and slidably connected between the two fixed plates (10) on the same side, and both sides of the slide plate (12) are clamped on the sleeve plate (6) on the same side.

4. A hydrofluoric acid storage device for semiconductor preparation according to claim 3, characterized in that: The middle part of the side of the slide plate (12) away from the acid tank (1) is rotatably connected to a rotating plate (14) via a rotating shaft (13), and both sides of the rotating plate (14) abut against the side of the baffle plate (11) on the same side close to the acid tank (1).

5. A hydrofluoric acid storage device for semiconductor preparation according to claim 1, characterized in that: The four connecting columns (4) are respectively clamped at the four corners inside the acid tank (1).

6. A hydrofluoric acid storage device for semiconductor preparation according to claim 1, characterized in that: Support legs (15) are fixedly connected at the four corners of the lower end of the acid tank (1), and the lower ends of the four support legs (15) are all lower than the lower end of the horizontal part of the drainage pipe (9).

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